KR20120136518A - Conductive film - Google Patents
Conductive film Download PDFInfo
- Publication number
- KR20120136518A KR20120136518A KR1020110055501A KR20110055501A KR20120136518A KR 20120136518 A KR20120136518 A KR 20120136518A KR 1020110055501 A KR1020110055501 A KR 1020110055501A KR 20110055501 A KR20110055501 A KR 20110055501A KR 20120136518 A KR20120136518 A KR 20120136518A
- Authority
- KR
- South Korea
- Prior art keywords
- refractive index
- layer
- index layer
- transparent conductive
- conductive film
- Prior art date
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Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B33/00—Layered products characterised by particular properties or particular surface features, e.g. particular surface coatings; Layered products designed for particular purposes not covered by another single class
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
- G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
- G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
- G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
- G06F3/0412—Digitisers structurally integrated in a display
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
- H01B5/00—Non-insulated conductors or conductive bodies characterised by their form
- H01B5/14—Non-insulated conductors or conductive bodies characterised by their form comprising conductive layers or films on insulating-supports
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- G—PHYSICS
- G06—COMPUTING; CALCULATING OR COUNTING
- G06F—ELECTRIC DIGITAL DATA PROCESSING
- G06F2203/00—Indexing scheme relating to G06F3/00 - G06F3/048
- G06F2203/041—Indexing scheme relating to G06F3/041 - G06F3/045
- G06F2203/04103—Manufacturing, i.e. details related to manufacturing processes specially suited for touch sensitive devices
Abstract
The present invention provides a conductive film comprising a substrate, a hard coating layer, a first refractive index layer, a second refractive index layer, and a transparent conductive layer. The hard coat layer is installed on a substrate and the composition material comprises silicon. The first refractive index layer, the second refractive index layer, and the transparent conductive layer are in order on the hard coating layer, and the transparent conductive layer covers a portion of the second refractive index layer. When a light beam is incident on the transparent conductive layer at one incident angle, the transparent conductive layer reflects the light beam at the first reflectance, and when the light is incident on the second refractive index layer at the same incident angle, the second refractive index layer is second Reflecting the light beam with reflectance, the difference value between the first reflectance and the second reflectance is less than the first threshold, so that the conductive film according to the invention can eliminate the display difference between the etched and unetched regions. .
Description
FIELD OF THE INVENTION The present invention relates to conductive membranes, and more particularly to conductive membranes that can eliminate display differences between etched and non-etched regions.
With advances in manufacturing technology and constant expansion of various applications, electronic products have become increasingly versatile and provide usability such as high consistency, which makes the user's operation easier. For example, to provide more convenient and intuitive control electronics for users, current electronic information products are increasingly installing touch display panels more and more instead of adopting traditional push key type control buttons.
Currently, the touch panel may be divided into touch panels of roughly resistive, capacitive, infrared, and ultrasonic types, and the most common products may be regarded as resistive touch panels and capacitive touch panels. In today's applications, capacitive touch panels are applied to multi-point touch characteristics to provide an intelligent operation, so capacitive touch panels are becoming increasingly popular among the market and users. However, the capacitive touch panel has a disadvantage that it must be made of a conductor material, and thus, the electronic product must be manipulated by touching the touch panel with a finger. On the other hand, based on the resistive touch panel, the user can operate and control electronic products regardless of what kind of material the user touches the touch panel, thereby improving convenience in using the touch panel. In addition, resistive touch panels are also used in most of the current intermediate product lines for reasons of low cost and mature power generation technology.
According to the traditional touch panel, a conductive film deposited directly on the surface of the glass substrate is provided, and thus, when the conductive film is touched, functions such as signal input and touch position sensing are achieved.
However, the conductive film must undergo a yellow light developing and etching process to obtain a circuit pattern thereon, thereby forming a correlated driving electrical circuit. However, in the actual fabrication process, the etching process may leave an etching trace on the surface, for example, a stepped structure may be formed on the transparent conductive layer. Optical analysis, however, shows that due to the large difference in reflectance between the glass substrate partially exposed by etching and the transparent conductive layer that is not etched, there may be a clear gap in the spectrum, which may result in an image or area that is unclear to the user. In addition to this, the quality of electronic products may be degraded as well as distinct boundaries.
Therefore, the present inventor proposes the present invention that can be improved to the above-described drawbacks while the design is reasonable given the possibility of improvement of the drawbacks described above.
The embodiment according to the present invention adjusts and changes the constituent material and the thickness of the hard coating layer so that the etched conductive film and the non-etched conductive film have similar refractive indices, and furthermore, the traces remaining during the manufacturing process cannot be visually detected. The present invention provides a conductive film which also improves the display effect of the optical image.
The present invention provides a conductive film comprising a substrate, a hard coating layer, a first refractive index layer, a second refractive index layer, and a transparent conductive layer. The hard coat layer is installed on a substrate and the composition material comprises silicon. The first refractive index layer, the second refractive index layer, and the transparent conductive layer are sequentially installed on the hard coating layer, and a portion of the second refractive index layer is covered with the transparent conductive layer. When a light ray enters the transparent conductive layer at one incident angle, the transparent conductive layer reflects the light at the first reflectance, and when the light is incident on the second refractive index layer at the incident angle, the second refractive index layer is Reflects the light beam at two reflectances, the difference value between the first reflectance and the second reflectance being less than the first threshold.
According to an embodiment of the present invention, the thickness of the hard coat layer is in the range of 1 μm to 3 μm, and the weight ratio of silicon is in the range of 5% to 25%. The thickness of the first refractive index layer is in the range of 100 GPa to 300 GPa, the refractive index of the first refractive index layer is in the range of 1.6 to 2.0, the thickness of the second refractive index layer is in the range of 500 GPa to 700 GPa, The refractive index is in the range of 1.42 to 1.46. In addition, the substrate is composed of a material in a group of glass and PET, and its refractive index has a value of 1.52.
In the conductive film according to the embodiment of the present invention, when only a portion of the transparent conductive layer of the top layer is etched after the etching process is performed by adjusting the thickness and the material of the hard coating layer, the etched conductive film and the non-etched conductive film are etched. It allows to have similar reflectance. Here, when some regions of the conductive film are etched, the reflectance when the light beam passes through the transparent conductive layer and the second refractive index layer and enters the conductive film is similar to the reflectance when the second refractive index layer passes through and enters the conductive film. . Thus, the conductive film according to the present invention can eliminate the display difference between the etched and non-etched regions, the traces remaining during the manufacturing process can not be detected by the naked eye, and also improve the display effect of the optical image.
1 is an explanatory diagram of a conductive film according to an embodiment of the present invention.
2 is a three-dimensional view of a conductive film according to an embodiment of the present invention.
BRIEF DESCRIPTION OF DRAWINGS To understand the features and the technical contents according to the present invention better, the present invention will be described with reference to the following detailed description and accompanying drawings. The accompanying drawings, however, are used only for reference and description and are not intended to limit the invention.
[Conductive Film Example]
1 and 2 together, FIG. 1 is an explanatory diagram of a conductive film according to an embodiment of the present invention. 2 is a three-dimensional view of a conductive film according to an embodiment of the present invention. As shown, the
The
In fact, when the
The
Note that the thickness of the
In fact, by adjusting the thickness and refractive index of each layer of the
The transparent
On the other hand, the refractive index of the transparent
When viewed from the point of view of reflecting light rays, when the light rays enter the
On the other hand, when viewed from the viewpoint of transmitting the light beam, when the light beam passes through the transparent
For example, the
In sum, the conductive film provided in the embodiment according to the present invention allows the etched conductive film and the non-etched conductive film to have similar reflectance and transmittance by selecting a reflective conductive structure and a transparent conductive layer having a refractive index and thickness within a specific range. In particular, the conductive film produced according to the specification of the present invention has the effect that the traces remaining during the manufacturing process cannot be visually detected when the light beam enters the conductive film through the transparent film, whether it is a transparent conductive layer or a substrate. Has Thus, the conductive film of the present invention makes it possible to eliminate the display difference between the etched and non-etched regions, to prevent traces remaining in the manufacturing process with the naked eye, and to improve the display effect of the optical image.
Although only preferred embodiments according to the present invention have been described, this cannot limit the scope of the present invention, and therefore, all technical changes having equivalent effects to those based on the specification and the contents of the present invention are all within the scope of the present invention. Included.
1: conductive film 10: substrate
12: hard coat layer 14: first refractive index layer
16: second refractive index layer 18: transparent conductive layer
20: adhesive layer R1, R2: reflectance
T1, T2: refractive index
Claims (9)
A hard coating layer disposed on the substrate, the composition material comprising silicon;
A first index of refraction layer disposed on the hard coating layer;
A second refractive index layer disposed on the first refractive index layer; And
A transparent conductive layer disposed on the second refractive index layer and covering a portion of the second refractive index layer,
When a light ray enters the transparent conducting layer at one incident angle, the transparent conducting layer reflects the light at the first reflectance, and when the light enters the second refractive index layer at the same incident angle, the second refractive index layer is And reflect the light beam at a second reflectance, wherein a difference value between the first reflectance and the second reflectance is less than a first threshold.
And the weight ratio of silicon in the composition material of the hard coat layer is in the range of 5% to 25%.
The thickness of the hard coat layer is a conductive film, characterized in that in the range of 1μm to 3μm.
The thickness of the first refractive index layer is in the range of 100 GPa to 300 GPa, and the refractive index of the first refractive index layer is in the range of 1.6 to 2.0.
And the thickness of the second refractive index layer is in the range of 500 GPa to 700 GPa, and the refractive index of the second refractive index layer is in the range of 1.42 to 1.46.
And said first threshold is 0.5.
When a light beam is incident on the transparent conductive layer at one incident angle, the light beam has a first transmittance in the transparent conductive layer, and when the light is incident on the second refractive index layer at the incident angle, the light beam is at a second refractive index. A conductive film having a second transmittance in the layer, wherein the difference value between the first and second transmittances is less than the second threshold.
And said second threshold is 0.5.
And the substrate is composed of a group of materials consisting of glass and PET, the refractive index of which has a value of 1.52.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110055501A KR20120136518A (en) | 2011-06-09 | 2011-06-09 | Conductive film |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020110055501A KR20120136518A (en) | 2011-06-09 | 2011-06-09 | Conductive film |
Publications (1)
Publication Number | Publication Date |
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KR20120136518A true KR20120136518A (en) | 2012-12-20 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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KR1020110055501A KR20120136518A (en) | 2011-06-09 | 2011-06-09 | Conductive film |
Country Status (1)
Country | Link |
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KR (1) | KR20120136518A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015020318A1 (en) * | 2013-08-05 | 2015-02-12 | (주)엘지하우시스 | Transparent conductive film and method for manufacturing same |
-
2011
- 2011-06-09 KR KR1020110055501A patent/KR20120136518A/en not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015020318A1 (en) * | 2013-08-05 | 2015-02-12 | (주)엘지하우시스 | Transparent conductive film and method for manufacturing same |
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