KR20120021759A - Conductive film, method for manufacturing the same and touch panel having the same - Google Patents

Abstract

PURPOSE: A conductive film, a method for manufacturing the same and a touch panel having the same are provided to improve the appearance of a product using a conductive film since a conductive pattern is not outstood outside. CONSTITUTION: A conductive film comprises a base material layer, a transparent conduction layer, and an optical layer. The transparent conduction layer is formed into a transparent conductive oxide. The optical layer is arranged between the base material layer and the transparent conduction layer.

Description

CONDUCTIVE FILM, METHOD FOR MANUFACTURING THE SAME AND TOUCH PANEL HAVING THE SAME

The present invention relates to a conductive film, a method for manufacturing the same, and a touch panel including the conductive film, and more particularly, the appearance of a product using the conductive film as the pattern of the conductive film is not prominent from the outside. The present invention relates to a conductive film that can be improved, a method for manufacturing the same, and a touch panel including the conductive film.

In general, the touch panel is an input device that replaces a keyboard or a mouse, and is mounted on a display surface that is an output device so that the user can perform various input operations by directly pressing a predetermined position while looking at the display surface. So that is one device.

The touch panel is divided into a resistive type and a capacitive type according to an operation principle. The resistive type touch panel is pressed by a user while a voltage is applied to two opposing conductive layers (resistive layers). It works by reading the voltage or current change at the contact point and converting it into coordinates.

In addition, the capacitive touch panel operates by sensing a capacitance changed at a contact point pressed by a user while the charging / discharging state of the capacitance is repeated on one transparent conductive film or transparent conductive glass. In the case of the capacitive type, it can be operated by approaching sufficiently close without actually contacting, and unlike the resistive type, there is no need for physical deformation of the conductive film, and thus has excellent characteristics in terms of durability.

The capacitive method is also divided into a surface capacitive method and a projected capacitive method. In the surface capacitance method, an electrode is installed at an edge of a conductive film in which a conductive layer is uniformly stacked on one surface to detect a change in capacitance of the surface of the conductive layer when contact occurs. In the case of the projected capacitance method, a change in capacitance caused by finger contact is detected by using a conductive layer having a pattern of a certain shape, and there is an advantage of recognizing a multi touch.

In the case of the transparent conductive film used for such a touchscreen, it is generally comprised by a multilayer. The transparent conductive layer may be directly laminated on the plastic substrate, or an intermediate layer such as an organic-inorganic hybrid layer or an inorganic layer may be disposed between the substrate and the conductive layer in order to improve the physical properties of the conductive film. Representative interlayer materials include silicon oxide or aluminum oxide.

In the multilayer structure of such a transparent conductive film, light reflection occurs at the interface between the layers, and thus the light transmittance may vary according to the layer configuration. In particular, when a capacitive touch panel is manufactured by patterning a conductive layer, a situation occurs in which the conductive layer and its lower layer are simultaneously exposed and the interface between the two materials is exposed. However, since the material used as the conductive layer and the lower layer have different optical properties, the part varies depending on the pattern of light reflectivity or light transmittance of the conductive film, and as a result, the pattern shape of the conductive layer is easily noticeable. There is a problem that harms the appearance.

SUMMARY OF THE INVENTION An object of the present invention is to provide a conductive film capable of improving the appearance of a product using the conductive film as the pattern of the conductive film is not prominent from the outside, a manufacturing method thereof, and a touch panel including the conductive film. It is.

The present invention, the base layer; A transparent conductive layer formed of a transparent conductive oxide (TCO); And an optical layer positioned between the base layer and the transparent conductive layer, the optical layer having an index of refraction of (refractive index of 1-optical layer / refractive index of transparent conductive oxide) × 100% of 17% or less. to provide.

Provided is a touch panel including a conductive film according to the present invention.

The present invention, a) forming an optical layer on the base layer; And b) forming a transparent conductive layer of transparent conductive oxide (TCO) on the optical layer, wherein the optical layer located between the base layer and the transparent conductive layer is (1). -Refractive index of the optical layer / refractive index of the transparent conductive oxide) x 100% value of the conductive film is provided to have a refractive index of 17% or less.

According to the present invention, as the pattern of the conductive film is not prominent from the outside, the appearance of the product using the conductive film can be improved.

1 is a cross-sectional view of a conductive film according to an embodiment of the present invention.
2 is a graph showing the difference in light transmittance according to the refractive index of the optical layer.

The conductive film which concerns on this invention is a base material layer; A transparent conductive layer formed of a transparent conductive oxide (TCO); And an optical layer positioned between the base layer and the transparent conductive layer, the optical layer having a refractive index of (refractive index of 1-optical layer / refractive index of transparent conductive oxide) x 100% of 17% or less. When the refractive index of the substrate layer is n1, the optical layer is n2, and the conductive layer is n3, satisfying the relationship n1 < n2 < n3 can increase the light transmittance of the conductive film.

The substrate layer may be a plastic film having excellent transparency and flexibility. The plastic film may be a film formed of at least one selected from the group consisting of a single polymer, at least one polymer blend, and a polymer composite material containing an organic or inorganic additive.

As the plastic film formed of the single polymer or one or more polymer blend materials, for example, polyethylene terephthalate (PET), polyarylates, polyethersulfone (PES), polycarbonates, PC ), A film formed of one or more materials selected from polyethylenenaphthalates (PEN), polyimide (PI), polyarylates, and epoxy resins.

Here, it is preferable to use polymers, such as a polynorbornene, an aromatic florene polyester, a polythersulfone, a bisphenol a polysulfone, a polyimide, as a high heat resistant polymer which can endure high temperature.

In addition, it is preferable to use polymers such as polyethylene terephthalate, polyethylene naphthalene, polyarylate, polycarbonate, and cyclic olefin copolymer as the polymer which can be used up to a temperature of about 150 ° C.

As a plastic film formed of the polymer composite material containing the organic or inorganic additive, a plastic film in which organic or inorganic particles are dispersed in a polymer may be used.

The polymer composite material may include a polymer-clay nanocomposite, and the polymer that may be used in the polymer-clay composite may include polystyrene, polymethacrylate, polyethylene terephthalate, polyethylene naphthalene, polyarylate, polycarbonate, Cyclic olefin copolymer, polynorbornene, aromatic florene polyester, polyisulfone, polyimide, epoxy resin, polyfunctional acrylate, and the like, and clay may be used laponite, montmorillonite, megadite and the like.

In the plastic film formed of the polymer composite material containing the organic or inorganic additives, the inorganic material dispersed in the polymer is metal, glass powder, diamond powder, silicon oxide, clay, calcium phosphate, magnesium phosphate, barium sulfate, aluminum Fluoride, calcium silicate, magnesium silicate, barium silicate, barium carbonate, barium hydroxide, aluminum silicate and the like can be used.

The plastic film formed of the polymer composite material containing the organic or inorganic additive is immersed in an organic-inorganic hybrid solution of glass fiber, glass fabric or glass cloth, and then cured. The prepared plastic film can be used.

The plastic film used as the substrate layer may be manufactured through a solution casting method or a film extrusion process, and may be annealed briefly from several seconds to several minutes in the vicinity of the glass transition temperature of the film in order to minimize deformation due to temperature after the production. .

After annealing, primer coating is applied on the surface of the plastic film to improve the coating property and adhesion, or the surface is treated by plasma treatment using corona, argon, oxygen, nitrogen, or carbon dioxide, ultraviolet-ozone treatment, ion beam treatment with the reaction gas, etc. You can also do it.

The thickness of the plastic film used as the substrate layer may be 10 ~ 300 ㎛.

If the refractive index of the optical layer provided on the base layer is less than or equal to 17% of the refractive index of the transparent conductive layer, when the transparent conductive layer provided on the optical layer is patterned, the pattern may be well externally. It becomes inconspicuous. The difference with the refractive index of the transparent conductive layer may be more preferably 13% or less, even more preferably 9% or less.

Here, the difference from the refractive index is 13% or less is a numerical value obtained by calculating as follows based on the refractive index of the transparent conductive layer. In this case, the transparent conductive layer is formed of ITO (refractive index: 2.0), and the optical layer satisfies silicon oxide nitride (refractive index ≥ 1.74; X <0.48 and Y> 0.68 in SiO _x N _y or X / (X + Y) <0.42 is satisfied).

Explaining this as an example, (1-1.74 / 2.0) x 100 = 13%.

The reflection of light occurs at the interface between the two materials. At this time, the greater the difference in refractive index between the two materials, the greater the amount of reflected light, and thus the light transmittance decreases. In the case of patterning the transparent conductive layer, such an optical phenomenon occurs in the transparent conductive layer and the lower layer. If the difference in the light transmittance or the light reflectivity is large, the pattern is easily recognized, thereby deteriorating the appearance of the related product. Accordingly, the present invention provides a method in which a pattern is not easily recognized from the outside by providing an optical layer having a refractive index controlled under the transparent conductive layer.

The refractive indices of SiO ₂ or Al ₂ O ₃ (Japanese Patent 1993-027323, 2001-175811), which are conventionally used to improve the durability of conductor films, are 1.46 and 1.63, respectively, and the refractive index of ITO, which is widely used as a transparent conductor, is used. The difference with 2.0 is about 27% and 19%, respectively. However, since the refractive index of SiO is about 1.96, it is also possible to form SiO _x (where 1 ≦ X ≦ 2) having a refractive index between 1.46 and 1.96 by adjusting the oxygen content, but it is not easy to control X accurately, There is a disadvantage that the light transmittance is sharply lowered. For example, since the extinction coefficient of SiO is 0.012, which is a little smaller than the extinction coefficient of 0.018, it can be seen that the optical properties are greatly reduced when using SiO.

The present invention provides a conductive film including a base layer, a conductive layer, and an optical layer, wherein the refractive index of the optical layer has a difference within or similar to the refractive index of the conductor within 17% or similar to that of the conventional dielectric layer. There is an advantage that can reduce the degree of visible pattern. Here, in order to further reduce the degree to which the pattern of the conductive layer is noticeable, it is better to make the difference in refractive index within 13%, and even more preferably within 9%. Further, when the refractive index of the base layer is n1, the refractive index of the optical layer is n2, and the refractive index of the conductive layer is n3, satisfying the relationship n1 <n2 <n3 between them increases the light transmittance of the conductive film than without the optical layer. You can. Even when the relation between the refractive indices satisfies n1 <n3 <n2, the visibility of the conductive layer pattern can be reduced by adjusting the difference in the refractive indices in the above range. It is not recommended.

The refractive index of the polyethylene terephthalate (PET) film, which is widely used when manufacturing an optical application film, is about 1.57, and the refractive index of ITO, which is generally used as a conductive layer, is about 2.0, so the refractive index of the optical layer is silicon oxynitride (SiO _x N _y ) or aluminum oxynitride (AlO _x N _y ) can be achieved using one or more, but silicon oxynitride is more effective. The optical layer preferably has an intermediate refractive index value between the refractive index of the base layer and the refractive index of the transparent conductive layer, and thus the optical layer may have a refractive index of 1.65 to 2.0.

X of the silicon oxynitride (SiO _x N _y ) may be 0 <X <0.62, and Y may be 0.59 <Y <1.33. More preferably X may be 0 <X <0.48, Y may be 0.68 <Y <1.33, even more preferably X is 0 <X <0.35, and Y may be 0.75 <Y <1.33. Alternatively, the silicon oxynitride is preferably 0 <X / (X + Y) <0.52, more preferably 0 <X / (X + Y) <0.42, even more preferably 0 <X / ( X + Y) <0.32 is preferred.

If X and Y are 0 <X <0.62 and 0.59 <Y <1.33 or 0 <X / (X + Y) <0.52, then the refractive index can be adjusted to within 17% of ITO, which is a widely used transparency. <X <0.48 and 0.68 <Y <1.33 or 0 <X / (X + Y) <0.42 within 13%, 0 <X <0.35 and 0.75 <Y <1.33 or 0 <X / (X + Y) If <0.32, the refractive index can be adjusted within 9%. As the difference in refractive index decreases, the pattern of the conductive layer becomes less visible, thereby improving the appearance of the product using the conductive film, and increasing the light transmittance of the conductive film. Even if the refractive index (n2) of the optical layer is larger than the refractive index (n3) of the conductive layer, adjusting the refractive index within the above error can reduce the visibility of the conductive layer pattern, but the light transmittance of the conductive film is lowered. no.

In the silicon oxynitride (SiO _x N _y ), as the X and Y values or the X / (X + Y) ratios representing the oxygen and nitrogen contents are important factors controlling the refractive index, transparent conduction in the conductive film When the refractive index of the material forming the layer is determined, the X and Y values of the silicon oxynitride or the X / (X + Y) ratio are adjusted based on this to form the transparent conductive layer and the silicon oxide. The refractive index difference of the nitride is made small. By adjusting the refractive index difference between the transparent conductive layer and the optical layer in this way, when the transparent conductive layer is patterned, the pattern can be made less visible from the outside. The method of laminating the silicon oxynitride itself may use an inorganic lamination method known in the art.

The optical layer may have a thickness of about 10 nm to about 100 nm.

The thickness of the transparent conductive layer provided on the optical layer may be 10 ~ 200nm.

The transparent conductive layer may have a pattern shape. The transparent conductive layer may be patterned to form it, for example, a parallel line shape or a rhombus pattern.

The transparent conductive oxide of the transparent conductive layer may include indium tin oxide (ITO), indium zinc oxide (IZO), aluminum zinc oxide (AZO), or the like. Here, the transparent conductive oxide has a property that the light transmittance is 50% or more.

When the transparent conductive layer is formed of ITO (refractive index 2.0), the optical layer directly contacting the lower side of the transparent conductive layer is preferably formed of the silicon oxynitride (SiO _x N _y ) having a small refractive index difference from ITO. In this case, X may be 0 <X <0.62 and 0.59 <Y <1.33, or 0 <X / (X + Y) <0.52. Accordingly, when the transparent conductive layer is patterned in a later step, the pattern is less visible from the outside.

In contrast, when the transparent conductive layer is formed of ITO (refractive index 2.0), when silicon oxide or aluminum oxide is used as the optical layer, the refractive indices of silicon oxide or aluminum oxide are 1.46 and 1.63, respectively, which is the refractive index of ITO 2.0. Since it has a large difference from the above, when the capacitive touch panel is manufactured by patterning the transparent conductive layer formed of ITO, the pattern shape is easily visible from the outside, thereby lowering the appearance of the product.

The conductive film according to the present invention may further include a coating layer located between the optical layer and the base layer. In this case, the stacking order of the conductive film according to the present invention may be laminated in the order of the base layer, the coating layer, the optical layer and the transparent conductive layer.

The coating layer may be used to control the surface roughness, and at the same time may be used to improve the adhesive force when the transparent conductive layer is laminated or to improve the mechanical or electrical properties of the transparent conductive layer, which may occur in the transparent conductive film It can be used to prevent interference fringes and to improve the light transmittance and mechanical durability of the transparent conductive film.

The coating layer may include a monomer of an organic compound having two or more polymerizable unsaturated groups in a molecule, or an oligomer having a weight average molecular weight of 100 or more and 1,000 or less having two or more polymerizable unsaturated groups in a molecule; And a weight average molecular weight of 1,000 or more and 500,000 or less of an organic compound having one or more polymerizable unsaturated groups in the molecule.

In addition, the coating layer, (A) an organosilane partial hydrolyzate selected from the group consisting of compounds represented by the following formula (1) to formula (3); And / or (B) a composition for forming a coating layer containing at least one metal alkoxide partial hydrolyzate selected from the group consisting of compounds represented by the following formula (4).

(Formula 1)

(R ¹ ) _m -Si-X _(4-m)

(Formula 2)

(R ¹ ) _m -O-Si-X _(4-m)

(Formula 3)

(R ¹ ) _m -N (R ² ) -Si-X _(4-m)

(Formula 4)

M- (R ³ ) _z

In Chemical Formulas 1 to 3,

X may be the same or different from each other, hydrogen, halogen, alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl, or -N (R ² ) ₂ having 1 to 12 carbon atoms,

R ¹ may be the same or different from each other, alkyl, alkenyl, alkynyl, aryl, arylalkyl, alkylaryl, arylalkenyl, alkenylaryl, arylalkynyl, alkynylaryl, halogen, amide having 1 to 12 carbon atoms , Aldehydes, ketones, alkylcarbonyl, carboxy, mercapto, cyano, hydroxy, alkoxycarbon having 1 to 12 carbon atoms, alkoxycarbonyl having 1 to 12 carbon atoms, sulfonic acid, phosphoric acid, acryloxy, methacrylicoxy, epoxy, Or vinyl group,

R ² is hydrogen or alkyl having 1 to 12 carbon atoms,

m is an integer of 1 to 3,

In Chemical Formula 4,

M represents a metal selected from the group consisting of aluminum, zirconium, and titanium,

R ³ may be the same as or different from each other, and is a halogen, an alkyl, alkoxy, acyloxy, or hydroxy group having 1 to 12 carbon atoms,

Z is an integer of 3 or 4.

The thickness of the coating layer may be 0.1 ~ 10 mm.

The present invention provides a touch panel including the conductive film. Here, the touch panel may be a capacitive touch panel.

In the capacitive method, a conductive film processed to have a pattern of a certain shape may be used by being attached to a protective plate material such as a glass plate or a plastic plate using an adhesive or an adhesive, or a protective layer may be formed by hard coating on the conductive film. Appropriate treatment is also used here to improve optical properties to reduce glare or reflections.

Method for producing a conductive film according to the present invention, a) forming an optical layer on the base layer; And b) forming a transparent conductive layer of transparent conductive oxide (TCO) on the optical layer, wherein the optical layer located between the base layer and the transparent conductive layer is (1). -Refractive index of the optical layer / refractive index of the transparent conductive oxide) x 100% value is characterized by having a refractive index of 17% or less. Here, since all of the contents described above in the conductive film are applied, a detailed description thereof will be omitted.

In the step a), the optical layer is formed by a method selected from sol-gel, evaporation, ion plating, sputtering, and chemical vapor deposition (CVD, PECVD). can do.

In step b), the transparent conductive layer may be selected from sol-gel, evaporation, ion plating, sputtering and chemical vapor deposition (CVD, PECVD). Can be formed.

Before the step a), it may further comprise the step of forming a coating layer on the base layer. In this case, the stacking order of the conductive film according to the present invention may be laminated in the order of the base layer, the coating layer, the optical layer and the transparent conductive layer.

The coating layer may be formed by spin coating, gravure coating, capillary coating, Ti-die coating and the like known in the art.

After step b), the method may further include patterning the transparent conductive layer. The conductive layer may be patterned into various shapes such as parallel lines or rhombus shapes, depending on the design. It is possible to form a conductive pattern of a desired form through an exposure process using a photomask and a photoresist and an etching process using a chemical such as oxalic acid.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

As shown in Figure 1, the conductive film according to an embodiment of the present invention, a plastic film as a base layer, a coating layer provided on the plastic film, SiO _x N _y layer and SiO as an optical layer provided on the coating layer _and a patterned ITO layer as a transparent conductive layer provided on the _x N _y layer.

As described above, when the ITO layer is patterned by providing a SiO _x N _y layer having a small refractive index difference with ITO as an optical layer under the transparent conductive layer based on the refractive index of ITO, which is a material for forming the transparent conductive layer, This makes it less visible from the outside, improving the appearance of the product.

In addition, according to the present invention, since it is important that the refractive index of the optical layer is less than the refractive index of the transparent conductive layer and has a difference within 17%, an example of adjusting the refractive index by the sputtering method will be described through Table 1 below. 2 will be described in more detail with reference to a graph showing the difference in light transmittance according to the refractive index of the optical layer shown in FIG. 2.

Table 1 shows that the refractive index difference between the ITO layer and the optical layer can be adjusted in the range of about 4.3 to 24.4% by using a Si target and controlling the flow rates of oxygen and nitrogen, which are reactive gases (when using ITO as the conductive layer). Refractive index 2.0). Here, the correlation coefficient between the refractive index and the oxygen flow rate of the optical layer was 0.9966, which showed a very good linear relationship.

Refractive Index Control of Optical Layer by Sputtering Experiment Gas flow rate (sccm) Light transmittance (%) Refractive Index @ 633nm Composition argon Oxygen nitrogen X Y X / (X + Y) One 40 0.5 15 89.4 1.913 0.19 0.83 0.19 2 40 1.0 15 89.8 1.880 0.29 0.78 0.27 3 40 2.0 15 90.6 1.749 0.45 0.70 0.39 4 40 4.0 15 92.0 1.512 0.92 0.40 0.70

Other conditions: Target = Si, working pressure = 2.0 Torr, sputtering power = 2.0 kW

FIG. 2 is a graph showing the difference in light transmittance according to the refractive index of an optical layer. When the ITO is laminated on the optical layer, the difference in light transmittance represented by (1-pre-lamination light transmittance / post-lamination light transmittance) x 100% is shown. Shows. Here, it can be seen that when the difference in refractive index is adjusted to within 17, 13, and 9%, the difference in light transmittance can be adjusted to within about 7, 5, and 3%, respectively. Therefore, when the refractive index difference between the optical layer and the conductive layer is adjusted to within 17%, even when patterning the ITO layer as the conductive layer, the light transmittance difference is small within about 7%, and thus the visibility of the pattern is greatly reduced.

Claims (26)

A base layer;
A transparent conductive layer formed of a transparent conductive oxide (TCO); And
An optical layer positioned between the base layer and the transparent conductive layer, wherein the optical layer has a refractive index of (refractive index of 1-optical layer / refractive index of transparent conductive oxide) x 100% of 17% or less.
Conductive film comprising a. The conductive film of claim 1, wherein the transparent conductive oxide includes indium tin oxide (ITO), indium zinc oxide (IZO), or aluminum zinc oxide (AZO). The conductive film according to claim 1, wherein the transparent conductive layer has a thickness of 10 to 200 nm. The conductive film according to claim 1, wherein the transparent conductive layer has a pattern shape. The conductive film of claim 1, wherein the optical layer is formed of at least one selected from silicon oxynitride (SiO _x N _y ) and aluminum oxynitride (AlO _x N _y ). The conductive film of claim 5, wherein X of the silicon oxynitride is 0 <X <0.62, and Y is 0.59 <Y <1.33. The conductive film according to claim 1, wherein the optical layer has a thickness of 10 to 100 nm. The conductive film of claim 1, further comprising a coating layer positioned between the optical layer and the substrate layer. The method of claim 8, wherein the coating layer is a monomer of an organic compound having two or more polymerizable unsaturated groups in the molecule, or a weight average molecular weight of 100 or more and 1,000 or less oligomer having two or more polymerizable unsaturated groups in the molecule; And a cured composition for forming a coating layer containing an organic compound having a weight average molecular weight of 1,000 or more and 500,000 or less having one or more polymerizable unsaturated groups in a molecule. The method according to claim 8, wherein the coating layer is (A) at least one organosilane hydrolyzate selected from the group consisting of compounds represented by the formula (1) to formula (3); And / or (B) a conductive film formed by curing a composition for forming a coating layer containing at least one metal alkoxide partial hydrolyzate selected from the group consisting of compounds represented by the following formula (4):
(Formula 1)
(R ¹ ) _m -Si-X _(4-m)
(2)
(R ¹ ) _m -O-Si-X _(4-m)
(Formula 3)
(R ¹ ) _m -N (R ² ) -Si-X _(4-m)
(Formula 4)
M- (R ³ ) _z
In Chemical Formulas 1 to 3,
X may be the same or different from each other, hydrogen, halogen, alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl, or -N (R ² ) ₂ having 1 to 12 carbon atoms,
R ¹ may be the same or different from each other, alkyl, alkenyl, alkynyl, aryl, arylalkyl, alkylaryl, arylalkenyl, alkenylaryl, arylalkynyl, alkynylaryl, halogen, amide having 1 to 12 carbon atoms , Aldehydes, ketones, alkylcarbonyl, carboxy, mercapto, cyano, hydroxy, alkoxycarbon having 1 to 12 carbon atoms, alkoxycarbonyl having 1 to 12 carbon atoms, sulfonic acid, phosphoric acid, acryloxy, methacrylicoxy, epoxy, Or vinyl group,
R ² is hydrogen or alkyl having 1 to 12 carbon atoms,
m is an integer of 1 to 3,
In Chemical Formula 4,
M represents a metal selected from the group consisting of aluminum, zirconium, and titanium,
R ³ may be the same as or different from each other, and is a halogen, an alkyl, alkoxy, acyloxy, or hydroxy group having 1 to 12 carbon atoms,
Z is an integer of 3 or 4. The conductive film of claim 8, wherein the coating layer has a thickness of 0.1 to 10 mm. 12. A touch panel comprising the conductive film according to claim 1. a) forming an optical layer on the substrate layer; And
b) forming a transparent conductive layer of transparent conductive oxide (TCO) on the optical layer, comprising:
And the optical layer located between the base layer and the transparent conductive layer has a refractive index of (refractive index of 1-optical layer / refractive index of transparent conductive oxide) x 100% of 17% or less. The method of claim 13, wherein in the step a), the optical layer is sol-gel, evaporation, evaporation, ion plating, sputtering, chemical vapor deposition (CVD, PECVD). Method for producing a conductive film to be formed by a method selected from). The method of claim 13, wherein the optical layer is formed of at least one selected from silicon oxynitride (SiO _x N _y ) and aluminum oxynitride (AlO _x N _y ). The method of claim 15, wherein X of the silicon oxynitride is 0 <X <0.62, Y is 0.59 <Y <1.33. The method according to claim 13, wherein in the step a), the optical layer is formed to a thickness of 10 ~ 100nm. The method of claim 13, wherein in step b), the transparent conductive layer is a sol-gel method, evaporation method, ion plating method, sputtering method, chemical vapor deposition method (CVD, Method for producing a conductive film formed by a method selected from PECVD). The method of claim 13, wherein the transparent conductive oxide in step b) comprises indium tin oxide (ITO), indium zinc oxide (IZO), or aluminum zinc oxide. The method of claim 13, wherein in the step b), the transparent conductive layer is formed to a thickness of 10 to 200 nm. The method of claim 13, further comprising forming a coating layer on the substrate layer before the step a). The method of claim 21, wherein the coating layer is formed by a method selected from among spin coating, gravure coating, capillary coating, and Ti-die coating. The method of claim 21, wherein the coating layer is a monomer of an organic compound having two or more polymerizable unsaturated groups in the molecule, or a weight average molecular weight of 100 or more and 1,000 or less oligomer having two or more polymerizable unsaturated groups in the molecule; And a cured composition for forming a coating layer containing an organic compound having a weight average molecular weight of 1,000 or more and 500,000 or less having one or more polymerizable unsaturated groups in a molecule. The method according to claim 21, The coating layer, (A) an organosilane partial hydrolyzate selected from the group consisting of compounds represented by the following formula (1) to formula (3); And / or (B) a method of producing a conductive film formed by curing a composition for forming a coating layer containing at least one metal alkoxide partial hydrolyzate selected from the group consisting of compounds represented by the following formula (4):
(Formula 1)
(R ¹ ) _m -Si-X _(4-m)
(2)
(R ¹ ) _m -O-Si-X _(4-m)
(Formula 3)
(R ¹ ) _m -N (R ² ) -Si-X _(4-m)
(Formula 4)
M- (R ³ ) _z
In Chemical Formulas 1 to 3,
X may be the same or different from each other, hydrogen, halogen, alkoxy, acyloxy, alkylcarbonyl, alkoxycarbonyl, or -N (R ² ) ₂ having 1 to 12 carbon atoms,
R ¹ may be the same or different from each other, alkyl, alkenyl, alkynyl, aryl, arylalkyl, alkylaryl, arylalkenyl, alkenylaryl, arylalkynyl, alkynylaryl, halogen, amide having 1 to 12 carbon atoms , Aldehydes, ketones, alkylcarbonyl, carboxy, mercapto, cyano, hydroxy, alkoxycarbon having 1 to 12 carbon atoms, alkoxycarbonyl having 1 to 12 carbon atoms, sulfonic acid, phosphoric acid, acryloxy, methacrylicoxy, epoxy, Or vinyl group,
R ² is hydrogen or alkyl having 1 to 12 carbon atoms,
m is an integer of 1 to 3,
In Chemical Formula 4,
M represents a metal selected from the group consisting of aluminum, zirconium, and titanium,
R ³ may be the same as or different from each other, and is a halogen, an alkyl, alkoxy, acyloxy, or hydroxy group having 1 to 12 carbon atoms,
Z is an integer of 3 or 4. The method of claim 21, wherein the coating layer is formed to a thickness of 0.1 to 10 mm. The method of claim 13, further comprising patterning the transparent conductive layer after step b).

Images