KR20110119665A - 조절된 팁 로딩 증착을 포함하는 넓은 면적의 균일한 어레이 제작 - Google Patents

조절된 팁 로딩 증착을 포함하는 넓은 면적의 균일한 어레이 제작 Download PDF

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Publication number
KR20110119665A
KR20110119665A KR1020117017430A KR20117017430A KR20110119665A KR 20110119665 A KR20110119665 A KR 20110119665A KR 1020117017430 A KR1020117017430 A KR 1020117017430A KR 20117017430 A KR20117017430 A KR 20117017430A KR 20110119665 A KR20110119665 A KR 20110119665A
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South Korea
Prior art keywords
tip
array
tips
article
substrate
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KR1020117017430A
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English (en)
Korean (ko)
Inventor
나빌 아. 암로
레이몬드 세인드린
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나노잉크, 인크.
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Application filed by 나노잉크, 인크. filed Critical 나노잉크, 인크.
Publication of KR20110119665A publication Critical patent/KR20110119665A/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q80/00—Applications, other than SPM, of scanning-probe techniques

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Micromachines (AREA)
  • Physical Vapour Deposition (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Micro-Organisms Or Cultivation Processes Thereof (AREA)
KR1020117017430A 2009-01-26 2010-01-25 조절된 팁 로딩 증착을 포함하는 넓은 면적의 균일한 어레이 제작 Withdrawn KR20110119665A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US14744809P 2009-01-26 2009-01-26
US61/147,448 2009-01-26

Publications (1)

Publication Number Publication Date
KR20110119665A true KR20110119665A (ko) 2011-11-02

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ID=41786393

Family Applications (1)

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KR1020117017430A Withdrawn KR20110119665A (ko) 2009-01-26 2010-01-25 조절된 팁 로딩 증착을 포함하는 넓은 면적의 균일한 어레이 제작

Country Status (8)

Country Link
US (1) US20100229264A1 (https=)
EP (1) EP2389613A1 (https=)
JP (1) JP2012515559A (https=)
KR (1) KR20110119665A (https=)
AU (1) AU2010206592A1 (https=)
CA (1) CA2750425A1 (https=)
SG (1) SG172854A1 (https=)
WO (1) WO2010085767A1 (https=)

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WO2010085769A1 (en) * 2009-01-26 2010-07-29 Nanoink, Inc. Large area, homogeneous array fabrication including homogeneous substrates
US9267963B2 (en) * 2012-11-08 2016-02-23 The Board Of Trustees Of The Leland Stanford Junior University Interferometric atomic-force microscopy device and method
US9276190B2 (en) 2013-10-01 2016-03-01 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material by modified MOCVD
US9040339B2 (en) 2013-10-01 2015-05-26 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material
CN107210353A (zh) * 2015-02-13 2017-09-26 泽·佩恩 产生气凝胶复合的连续薄膜热电半导体材料的实用方法
CN116124838B (zh) * 2023-03-27 2025-08-22 厦门大学 一种WTe2电极单分子测试芯片及其制备方法
WO2025085812A1 (en) * 2023-10-20 2025-04-24 The Regents Of The University Of California Devices for droplet deposition and methods of making thereof

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US6635311B1 (en) 1999-01-07 2003-10-21 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or products thereby
US6827979B2 (en) * 1999-01-07 2004-12-07 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or produced thereby
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EP1146376A1 (en) * 2000-04-12 2001-10-17 Triple-O Microscopy GmbH Method and apparatus for the controlled conditioning of scanning probes
US7291284B2 (en) 2000-05-26 2007-11-06 Northwestern University Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
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US7279046B2 (en) * 2002-03-27 2007-10-09 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate
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WO2004044552A2 (en) * 2002-11-12 2004-05-27 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
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Also Published As

Publication number Publication date
WO2010085767A1 (en) 2010-07-29
CA2750425A1 (en) 2010-07-29
US20100229264A1 (en) 2010-09-09
AU2010206592A1 (en) 2011-07-28
EP2389613A1 (en) 2011-11-30
JP2012515559A (ja) 2012-07-12
SG172854A1 (en) 2011-08-29

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Date Code Title Description
PA0105 International application

Patent event date: 20110725

Patent event code: PA01051R01D

Comment text: International Patent Application

PG1501 Laying open of application
PC1203 Withdrawal of no request for examination
WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid