AU2010206592A1 - Large area, homogeneous array fabrication including controlled tip loading vapor deposition - Google Patents

Large area, homogeneous array fabrication including controlled tip loading vapor deposition Download PDF

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Publication number
AU2010206592A1
AU2010206592A1 AU2010206592A AU2010206592A AU2010206592A1 AU 2010206592 A1 AU2010206592 A1 AU 2010206592A1 AU 2010206592 A AU2010206592 A AU 2010206592A AU 2010206592 A AU2010206592 A AU 2010206592A AU 2010206592 A1 AU2010206592 A1 AU 2010206592A1
Authority
AU
Australia
Prior art keywords
tips
array
cantilevers
article
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2010206592A
Other languages
English (en)
Inventor
Nabil A. Amro
Raymond Sanedrin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NanoInk Inc
Original Assignee
NanoInk Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NanoInk Inc filed Critical NanoInk Inc
Publication of AU2010206592A1 publication Critical patent/AU2010206592A1/en
Abandoned legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
    • G01Q80/00—Applications, other than SPM, of scanning-probe techniques

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nanotechnology (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Radiology & Medical Imaging (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • General Health & Medical Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Micromachines (AREA)
  • Physical Vapour Deposition (AREA)
  • Apparatus Associated With Microorganisms And Enzymes (AREA)
  • Micro-Organisms Or Cultivation Processes Thereof (AREA)
AU2010206592A 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including controlled tip loading vapor deposition Abandoned AU2010206592A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US14744809P 2009-01-26 2009-01-26
US61/147,448 2009-01-26
PCT/US2010/022013 WO2010085767A1 (en) 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including controlled tip loading vapor deposition

Publications (1)

Publication Number Publication Date
AU2010206592A1 true AU2010206592A1 (en) 2011-07-28

Family

ID=41786393

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2010206592A Abandoned AU2010206592A1 (en) 2009-01-26 2010-01-25 Large area, homogeneous array fabrication including controlled tip loading vapor deposition

Country Status (8)

Country Link
US (1) US20100229264A1 (https=)
EP (1) EP2389613A1 (https=)
JP (1) JP2012515559A (https=)
KR (1) KR20110119665A (https=)
AU (1) AU2010206592A1 (https=)
CA (1) CA2750425A1 (https=)
SG (1) SG172854A1 (https=)
WO (1) WO2010085767A1 (https=)

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WO2010085769A1 (en) * 2009-01-26 2010-07-29 Nanoink, Inc. Large area, homogeneous array fabrication including homogeneous substrates
US9267963B2 (en) * 2012-11-08 2016-02-23 The Board Of Trustees Of The Leland Stanford Junior University Interferometric atomic-force microscopy device and method
US9276190B2 (en) 2013-10-01 2016-03-01 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material by modified MOCVD
US9040339B2 (en) 2013-10-01 2015-05-26 The Pen Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material
CN107210353A (zh) * 2015-02-13 2017-09-26 泽·佩恩 产生气凝胶复合的连续薄膜热电半导体材料的实用方法
CN116124838B (zh) * 2023-03-27 2025-08-22 厦门大学 一种WTe2电极单分子测试芯片及其制备方法
WO2025085812A1 (en) * 2023-10-20 2025-04-24 The Regents Of The University Of California Devices for droplet deposition and methods of making thereof

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US6827979B2 (en) * 1999-01-07 2004-12-07 Northwestern University Methods utilizing scanning probe microscope tips and products therefor or produced thereby
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US7291284B2 (en) 2000-05-26 2007-11-06 Northwestern University Fabrication of sub-50 nm solid-state nanostructures based on nanolithography
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US7279046B2 (en) * 2002-03-27 2007-10-09 Nanoink, Inc. Method and apparatus for aligning patterns on a substrate
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WO2004044552A2 (en) * 2002-11-12 2004-05-27 Nanoink, Inc. Methods and apparatus for ink delivery to nanolithographic probe systems
US20050003172A1 (en) * 2002-12-17 2005-01-06 General Electric Company 7FAstage 1 abradable coatings and method for making same
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US8192795B2 (en) * 2006-06-28 2012-06-05 Northwestern University Etching and hole arrays
US8256017B2 (en) * 2006-08-31 2012-08-28 Nanoink, Inc. Using optical deflection of cantilevers for alignment
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US8214916B2 (en) * 2009-01-26 2012-07-03 Nanoink, Inc. Large area, homogeneous array fabrication including leveling with use of bright spots

Also Published As

Publication number Publication date
WO2010085767A1 (en) 2010-07-29
CA2750425A1 (en) 2010-07-29
US20100229264A1 (en) 2010-09-09
KR20110119665A (ko) 2011-11-02
EP2389613A1 (en) 2011-11-30
JP2012515559A (ja) 2012-07-12
SG172854A1 (en) 2011-08-29

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Legal Events

Date Code Title Description
MK4 Application lapsed section 142(2)(d) - no continuation fee paid for the application