KR20110103180A - Liquid crystal display and method for manufacturing the same - Google Patents

Liquid crystal display and method for manufacturing the same Download PDF

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Publication number
KR20110103180A
KR20110103180A KR1020100022383A KR20100022383A KR20110103180A KR 20110103180 A KR20110103180 A KR 20110103180A KR 1020100022383 A KR1020100022383 A KR 1020100022383A KR 20100022383 A KR20100022383 A KR 20100022383A KR 20110103180 A KR20110103180 A KR 20110103180A
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KR
South Korea
Prior art keywords
polymer layer
liquid crystal
substrate
ultraviolet
common electrode
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KR1020100022383A
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Korean (ko)
Inventor
김재훈
Original Assignee
한양대학교 산학협력단
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Priority to KR1020100022383A priority Critical patent/KR20110103180A/en
Publication of KR20110103180A publication Critical patent/KR20110103180A/en

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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/133711—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by organic films, e.g. polymeric films
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1337—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers
    • G02F1/13378—Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers by treatment of the surface, e.g. embossing, rubbing or light irradiation
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1339—Gaskets; Spacers; Sealing of cells

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Liquid Crystal (AREA)

Abstract

The liquid crystal display according to the exemplary embodiment of the present invention includes a first substrate, a pixel electrode formed on the first substrate, an alignment layer formed on the pixel electrode, a second substrate facing the first substrate, and a second substrate. A common electrode, a polymer layer formed on the common electrode, and a liquid crystal layer sandwiched between the first substrate and the second substrate, and the polymer layer includes a plurality of grooves.

Description

Liquid crystal display device and its manufacturing method {LIQUID CRYSTAL DISPLAY AND METHOD FOR MANUFACTURING THE SAME}

The present invention relates to a liquid crystal display device and a manufacturing method thereof.

The liquid crystal display is one of the most widely used flat panel display devices. The liquid crystal display includes two display panels on which electrodes are formed and a liquid crystal layer interposed therebetween to rearrange the liquid crystal molecules of the liquid crystal layer by applying a voltage to the electrode. The display device controls the amount of light transmitted.

Recently, a flexible substrate is used to reduce the weight and thickness of the liquid crystal display. However, when the liquid crystal display is manufactured using the flexible substrate, the adhesive force of the two display panels may be weakened due to the bending of the flexible substrate.

An object of the present invention is to have a strong bonding force in the bonding of the upper substrate and the lower substrate in the flexible liquid crystal display.

The liquid crystal display according to the exemplary embodiment of the present invention includes a first substrate, a pixel electrode formed on the first substrate, an alignment layer formed on the pixel electrode, a second substrate facing the first substrate, and a second substrate. A common electrode, a polymer layer formed on the common electrode, and a liquid crystal layer sandwiched between the first substrate and the second substrate, and the polymer layer includes a plurality of grooves.

The groove may be formed throughout the polymer layer.

The polymer layer may include an ultraviolet curable material having adhesion.

The ultraviolet curable material may be either a polyurethane curable by ultraviolet light or an epoxy resin curable by ultraviolet light.

The spacer may be further formed on the first substrate in the same layer as the pixel electrode to determine a thickness of the liquid crystal layer.

A method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention includes forming a pixel electrode and an alignment layer on a first substrate, forming a thin film transistor array panel, forming a common electrode on a second substrate, and coating a polymer material on the common electrode. Forming a polymer layer, imprinting with a mold including a plurality of protrusions on the polymer layer to form a plurality of grooves in the polymer layer, and irradiating the polymer layer with ultraviolet rays to maintain the shape of the groove of the polymer layer Performing a first ultraviolet irradiation process to remove the mold from the polymer layer to form a common electrode display panel, bonding the thin film transistor array panel and the common electrode display panel together, and irradiating UV light to the polymer layer to form the polymer layer. Performing a second ultraviolet irradiation process to cure.

In the first UV process and the second UV process, the intensity of the ultraviolet light is the same, and the irradiation time of the ultraviolet light may be different from each other.

The radiation intensity of the ultraviolet ray in the first ultraviolet ray process is 60mW / cm 2 , the wavelength is 365nm, the irradiation time of the ultraviolet ray is 3 minutes, the radiation intensity of the ultraviolet ray in the second ultraviolet ray process is 60mW / cm 2 , the wavelength is 365nm The irradiation time of ultraviolet rays may be 30 minutes.

The method may further include forming a liquid crystal layer on the thin film transistor array panel before the bonding of the thin film transistor array panel and the common electrode panel.

The method may further include forming a spacer on a layer such as a pixel electrode on the first substrate.

According to the exemplary embodiment of the present invention, a groove may be formed in the polymer layer having the adhesive force to align the liquid crystal without the alignment layer, and may have a strong bonding force when the thin film transistor array panel and the common electrode display panel are bonded together.

1 is a layout view of a liquid crystal display according to an exemplary embodiment of the present invention.
FIG. 2 is a cross-sectional view of the liquid crystal display of FIG. 1 taken along line II-II. FIG.
3 to 6 are diagrams sequentially illustrating a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention.

DETAILED DESCRIPTION Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings so that those skilled in the art may easily implement the present invention. The present invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein.

In the drawings, the thickness of layers, films, panels, regions, etc., are exaggerated for clarity. Like parts are designated by like reference numerals throughout the specification. When a part of a layer, film, region, plate, etc. is said to be "on" another part, this includes not only the other part being "right over" but also another part in the middle. On the contrary, when a part is "just above" another part, there is no other part in the middle.

1 is a layout view of a liquid crystal display according to an exemplary embodiment of the present invention, and FIG. 2 is a cross-sectional view of the liquid crystal display of FIG. 1 taken along line II-II.

1 and 2, a liquid crystal display according to an exemplary embodiment of the present invention includes a thin film transistor array panel 100, a common electrode panel 200 facing the same, and a gap between two substrates 100 and 200. It includes a liquid crystal layer 3 located.

First, the thin film transistor array panel 100 will be described.

The plurality of gate lines 121, the gate insulating layer 140, the plurality of semiconductors 154, the plurality of ohmic contacts 163 and 165, the plurality of data lines 171, and the plurality of gate lines 121 are disposed on the first flexible substrate 110. The drain electrode 175 is formed.

The gate line 121 transmits a gate signal and mainly extends in a horizontal direction. Each gate line 121 includes a plurality of gate electrodes 124 protruding upward.

The data line 171 transmits a data signal and extends mainly in the vertical direction and crosses the gate line 121. Each data line 171 includes a plurality of source electrodes 173 extending toward the gate electrode 124. The drain electrode 175 is separated from the data line 171 and faces the source electrode 173 around the gate electrode 124.

The semiconductor 154 is positioned over the gate electrode 124 and the ohmic contact layers 163 and 165 thereon are disposed between the semiconductor 154 and the data line 171 and the drain electrode 175 to contact each other. Lower the resistance

One gate electrode 124, one source electrode 173, and one drain electrode 175 together with the semiconductor 154 form one thin film transistor (TFT), and a channel of the thin film transistor. ) Is formed in the semiconductor 154 between the source electrode 173 and the drain electrode 175.

A passivation layer 180 is formed on the gate insulating layer 140, the data line 171, and the drain electrode 175, and a contact hole 185 exposing the drain electrode 175 is formed in the passivation layer 180.

The pixel electrode 191 and the spacer 320 made of a transparent conductive material such as ITO or IZO are formed on the passivation layer 180. The pixel electrode 191 is connected to the drain electrode 175 through the contact hole 185. The spacer 320 is formed at a portion corresponding to the data line 171 and determines the thickness of the liquid crystal layer 3.

An alignment layer 11 is formed on the pixel electrode 191 and the spacer 320 to orient the liquid crystal of the liquid crystal layer 3.

The common electrode panel 200 faces the thin film transistor array panel 100, and a plurality of light blocking members 220 called a black matrix are formed on the second flexible substrate 210, and the second flexible substrate ( The color filters 230R, 230G, and 230B are formed on the 210 and the light blocking member 220, and the common electrode 270 is formed on the color filters 230R, 230G, and 230B. However, the common electrode 270 may be formed on the thin film transistor array panel 100.

The polymer layer 25 is formed on the common electrode 270. The polymer layer 25 is made of an ultraviolet curable polymer material, and a plurality of grooves 26 are formed in the polymer layer 25. UV curable polymers include polyurethanes that can be cured by UV light, for example NOA63 polymers from Norland Optics, and epoxy resins curable by UV light, such as NOA61 and NOA68 polymers from Norland Optice. .

The groove 26 extends over the entirety of the polymer layer 25. The depth of the groove 26 is 1 μm or less, a convex portion is formed between the groove 26 and the groove 26, and the distance of one groove 26 and one convex portion is 2 μm or less.

In the polymer 25 layer, the grooves 26 are formed to orientate the liquid crystal of the liquid crystal layer 3 without the alignment layer. In addition, since the polymer 25 layer has adhesive strength, strong bonding characteristics may be maintained when the thin film transistor array panel 100 and the common electrode panel 200 are bonded together.

3 to 6 will be described with reference to FIGS. 1 and 2 with reference to FIGS. 1 and 2.

First, as shown in FIG. 3, the light blocking member 220, the color filters 230R, 230G, and 230B, and the common electrode 270 are sequentially formed on the second flexible substrate 210, and then the common electrode 270 is formed. An ultraviolet polymer material is coated thereon to form a polymer layer 25. UV curable polymers include polyurethanes that can be cured by UV light, for example NOA63 polymers from Norland Optics, and epoxy resins curable by UV light, such as NOA61 and NOA68 polymers from Norland Optice. .

Subsequently, as shown in FIGS. 4 and 5, the polymer layer 25 is imprinted with a polydimethylsiloxane (PDMS) mold 400 in which a plurality of protrusions 410 are formed on the polymer layer 25. ), A plurality of grooves 26 are formed.

At this time, a primary ultraviolet ray irradiation step of irradiating ultraviolet ray to the polymer layer 25 is performed. Ultraviolet light passes through the PDMS mold 400 to cure the polymer layer 25. Here, by controlling the intensity of the ultraviolet rays to maintain the polymer layer 25 in a completely uncured state, the radiation intensity of the ultraviolet ray is 60mW / cm 2 , the wavelength of the ultraviolet ray is 365nm, the irradiation time of the ultraviolet ray is 3 minutes to be.

As such, in the first ultraviolet irradiation process, the polymer layer 25 is cured to such an extent that the shape of the grooves 26 may be maintained in the polymer layer 25, and the adhesive force of the polymer material forming the polymer layer 25 is not lost. Do not

The PDMS mold 400 is removed from the polymer layer 25 to form the common electrode display panel 200.

Subsequently, as shown in FIG. 6, the gate line 121, the gate insulating layer 140, the semiconductor 154, the ohmic contact layers 163 and 165, the data line 171, and the like are disposed on the first flexible substrate 110. After the drain electrode 175, the passivation layer 180, the pixel electrode 191, the spacer 320, and the alignment layer 11 are formed to form the thin film transistor array panel 100, the liquid crystal layer is formed on the thin film transistor array panel 100. (3) is formed.

Then, the thin film transistor array panel 100 on which the liquid crystal layer 3 is formed and the common electrode display panel 200 are bonded to each other. In addition, the liquid crystal layer 3 may be formed by bonding the thin film transistor array panel 100 and the common electrode panel 200 and then injecting liquid crystal into the thin film transistor array panel 100 and the common electrode panel 200.

When the thin film transistor array panel 100 and the common electrode display panel 200 are bonded together, a second ultraviolet irradiation process of irradiating ultraviolet rays to the polymer layer 25 is performed to completely cure the polymer layer 25. At the same time, a certain amount of pressure is applied so that the thin film transistor array panel 100 and the common electrode display panel 200 may be uniformly bonded in all regions. Here, the radiation intensity of the ultraviolet ray of the secondary ultraviolet irradiation step is 60mW / cm 2 , the wavelength of the ultraviolet ray is 365nm, the irradiation time of the ultraviolet ray is 30 minutes, the secondary ultraviolet irradiation step compared to the primary ultraviolet irradiation step It is made the same as the ultraviolet ray intensity, and the ultraviolet ray irradiation time is made different.

As such, the grooves 26 may be formed in the polymer layer 25 having the adhesive force to align the liquid crystal without the alignment layer, and have a strong bonding force when the thin film transistor array panel 100 and the common electrode display panel 200 are bonded together. Can be.

Although the preferred embodiments of the present invention have been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concepts of the present invention defined in the following claims are also provided. It belongs to the scope of rights.

11: alignment layer 25: polymer layer
26: groove 121: gate line
171: data line 320: spacer
400: mold

Claims (13)

First substrate,
A pixel electrode formed on the first substrate,
An alignment film formed on the pixel electrode,
A second substrate facing the first substrate,
A common electrode formed on the second substrate,
A polymer layer formed on the common electrode, and
Liquid crystal layer sandwiched between the first substrate and the second substrate
Including,
The polymer layer includes a plurality of grooves. In claim 1,
The groove is formed in the entire polymer layer. In claim 2,
The polymer layer includes a UV curable material having an adhesive force. 4. The method of claim 3,
The ultraviolet curable material is a liquid crystal display device which is one of a polyurethane curable by ultraviolet light or an epoxy resin curable by ultraviolet light. In claim 1,
And a spacer disposed on the same substrate as the pixel electrode and determining a thickness of the liquid crystal layer. Forming a thin film transistor array panel by forming a pixel electrode and an alignment layer on the first substrate;
Forming a common electrode on the second substrate,
Forming a polymer layer by coating a polymer material on the common electrode;
Forming a plurality of grooves on the polymer layer by imprinting into a mold including a plurality of protrusions on the polymer layer,
Performing a first ultraviolet irradiation process of irradiating the polymer layer with ultraviolet rays to maintain the shape of the groove of the polymer layer;
Removing the mold from the polymer layer to form a common electrode panel;
Bonding the thin film transistor array panel and the common electrode panel;
Performing a second ultraviolet irradiation process of curing the polymer layer by irradiating the polymer layer with ultraviolet rays.
Method of manufacturing a liquid crystal display comprising a. In claim 6,
And the groove is formed in the entire polymer layer. In claim 7,
The polymer layer is a manufacturing method of a liquid crystal display device comprising an ultraviolet curable material having an adhesive force. 9. The method of claim 8,
The ultraviolet curable material is a method of manufacturing a liquid crystal display device which is one of a polyurethane curable by ultraviolet light or an epoxy resin curable by ultraviolet light. In claim 9,
The manufacturing method of the liquid crystal display device of the first ultraviolet light process and the second ultraviolet light process, the intensity of the ultraviolet light is the same, the irradiation time of the ultraviolet light is different. 11. The method of claim 10,
The radiation intensity of the ultraviolet ray in the first ultraviolet ray process is 60mW / cm 2 , the wavelength is 365nm, the irradiation time of the ultraviolet ray is 3 minutes,
The radiation intensity of ultraviolet rays in the second ultraviolet process is 60mW / cm 2 , the wavelength is 365nm, the irradiation time of the ultraviolet ray is a manufacturing method of the liquid crystal display device. In claim 11,
And forming a liquid crystal layer on the thin film transistor array panel before the bonding of the thin film transistor array panel and the common electrode display panel. In claim 6,
And forming a spacer in the same layer as the pixel electrode on the first substrate.
KR1020100022383A 2010-03-12 2010-03-12 Liquid crystal display and method for manufacturing the same KR20110103180A (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9638947B2 (en) 2014-10-15 2017-05-02 Samsung Display Co., Ltd. Display device including a groove patterned loof layer and manufacturing method thereof
KR20170062116A (en) * 2015-11-27 2017-06-07 엘지디스플레이 주식회사 Liquid Crystal Display Device And Method Of Fabricating The Same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9638947B2 (en) 2014-10-15 2017-05-02 Samsung Display Co., Ltd. Display device including a groove patterned loof layer and manufacturing method thereof
KR20170062116A (en) * 2015-11-27 2017-06-07 엘지디스플레이 주식회사 Liquid Crystal Display Device And Method Of Fabricating The Same

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