KR20110061318A - Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus - Google Patents

Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus Download PDF

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Publication number
KR20110061318A
KR20110061318A KR1020090117929A KR20090117929A KR20110061318A KR 20110061318 A KR20110061318 A KR 20110061318A KR 1020090117929 A KR1020090117929 A KR 1020090117929A KR 20090117929 A KR20090117929 A KR 20090117929A KR 20110061318 A KR20110061318 A KR 20110061318A
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KR
South Korea
Prior art keywords
slit
light beam
light
plate
micro mirror
Prior art date
Application number
KR1020090117929A
Other languages
Korean (ko)
Inventor
김을태
장상돈
Original Assignee
삼성전자주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by 삼성전자주식회사 filed Critical 삼성전자주식회사
Priority to KR1020090117929A priority Critical patent/KR20110061318A/en
Publication of KR20110061318A publication Critical patent/KR20110061318A/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention relates to an optical beam position measuring apparatus for receiving and measuring a light beam modulated by a digital micro mirror device of a maskless exposure apparatus, wherein the optical beam position measuring apparatus is a part of the light beams modulated by the digital micro mirror device. And a photo sensor for detecting light passing through the first slit, the slit plate having a first slit formed thereon to selectively pass the light; A blocking plate is provided so that the position of the light beam can be measured more accurately.

Description

LIGHT BEAM POSITION MEASURING APPARATUS FOR DIGITAL MICRO MIRROR DEVICE OF MASKLESS EXPOSURE APPARATUS}

The present invention relates to an optical beam position measuring apparatus for measuring the position of a light beam reflected by a micromirror of a digital micromirror device (DMD) used in a maskless exposure apparatus.

In general, a method of forming a pattern on a substrate is first applied to the substrate with a photosensitive material, the photosensitive material is exposed through a photomask on which the pattern is formed to change the chemical properties of the portion corresponding to the pattern on the photosensitive material, and the chemical properties are changed. A method of forming a pattern on a substrate by selectively removing remaining portions except portions is widely used.

In recent years, substrates have been gradually enlarged, and patterns formed on the substrates have been increasingly formed. Accordingly, a maskless exposure apparatus using no photo mask is used, and a maskless exposure apparatus is a digital micromirror device ( A pattern is formed on the substrate by irradiating the substrate with a light beam modulated to form a pattern through a digital micro mirror device.

One aspect of the present invention is to provide a light beam position measuring apparatus for a digital micromirror device of a maskless exposure apparatus capable of measuring the position of a light beam more accurately.

An optical beam position measuring apparatus for a digital micromirror device according to an embodiment of the present invention receives a light beam modulated by the digital micromirror device and has a slit plate having a first slit formed to selectively pass a portion of the light beam. And a blocking plate having a photo sensor for measuring light passing through the first slit, and a second slit having a shape corresponding to the second slit.

The blocking plate is also disposed between the digital micro mirror device and the slit plate.

The blocking plate is also disposed between the slit plate and the photo sensor.

The second slit also has a wider width than the first slit.

In addition, a maskless exposure apparatus according to an embodiment of the present invention includes a light source for generating light, a digital micro mirror device for receiving and modulating light from the light source, and a light beam position measurement for measuring light transmitted from the digital micro mirror device. And a light beam positioning device comprising: a slit plate formed with a first slit for receiving a light beam modulated by the digital micromirror device and selectively allowing a portion of the light beam to pass therethrough; And a blocking plate having a photosensor for measuring light and a second slit of a shape corresponding to the second slit.

As described above, most of the light beams passing through the slit plate and transmitted to the photo sensor through the area except the first slit can be blocked by the blocking plate, thereby accurately positioning the position of the light beam reflected by each micromirror. It can be measured.

Hereinafter, an optical beam measuring apparatus for a digital micromirror device according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.

As shown in FIG. 1, the light beam positioning device 30 used in the digital micromirror device 20 according to an embodiment of the present invention is a digital micromirror which is used in some configuration as a maskless exposure apparatus (not shown). It is an apparatus for measuring the position of the light beam irradiated by the mirror device 20.

The digital micromirror device 20 is a device that modulates the light emitted from the light source 10 generating the light to form a pattern in the light. 21: The light transmitted from the light source 10 is modulated to have a specific pattern by controlling the angle of the micro mirrors 21, including the micro mirror.

In this case, since the positional errors may occur due to the precision of the micromirrors 21, the position of the light beam reflected by the micromirror 21 is accurately measured through the light beam position measuring device 30 to modulate the light. This should be reflected when the pattern is formed.

The light beam position measuring device 30 receives the slit plate 31 receiving the modulated light beams from the digital micromirror device 20 and the light beam passing through the slit plate 31 to measure the light quantity of the light beam. The photo sensor 32 is included.

The slit plate 31 is formed by coating chromium (Cr) on quartz glass, and the first slit for allowing one of the light beams transmitted from the digital micro mirror device 20 to be instantaneously measured by the photo sensor 32. 31a is provided.

At this time, the first slit 31a should be formed to be very narrow in order to selectively select only one of the light beams as described above. In order to form the narrow first slit 31a, the first slit 31a may be thinly formed on the quartz glass. There is no choice but to coat chromium. When the slit plate 31 is formed by coating chromium thinly on quartz glass as described above, some of the light beams pass through the periphery of the first slit 31a of the slit plate 31 to be transmitted to the photo sensor 32. In this case, since the amount of light measured by the photo sensor generally increases, this acts as a factor that prevents the photo sensor 32 from accurately detecting the position of the light beam passing through the first slit 31 a.

Therefore, the light beam position measuring device 30 according to the present embodiment passes through the periphery of the first slit 31a of the slit plate 31 to block the light beam transmitted to the photo sensor 32. ) Is provided.

The blocking plate 33 is to prevent the light beam passing through the slit plate 31 through the periphery of the first slit 31a from being transmitted to the photo sensor 32. In the present embodiment, the blocking plate 33 is digital. It is disposed between the micromirror device 20 and the slit plate 31, and the blocking plate 33 is provided with a second slit 33a having a shape corresponding to the first slit 31a. The blocking plate 33 is arranged such that the second slit 33a is positioned on the path of travel of the light beam that travels from the digital micro mirror device 20 to the first slit 31a.

Therefore, since most of the light beams traveling from the digital micromirror device 20 to the periphery of the first slit 31a by the blocking plate 33 are blocked by the blocking plate 33, the first slit 31a The light beam passing through the periphery to the photo sensor 32 is greatly reduced, so that the light beam passing through the first slit 31 a can be measured by the photo sensor 32 more accurately.

In addition, since the blocking plate 33 is for blocking light beams traveling to the periphery of the first slit 31a, it is not necessary to form the second slit 33a as thin as the first slit 31a. The second slit 33a may be formed to have a relatively wider width than the first slit 31a, and thus, the manufacture of the blocking plate 33 may be easier than that of the slit plate 31.

In the present embodiment, the blocking plate 33 is disposed between the digital micromirror device 20 and the slit plate 31, but is not limited thereto. As shown in FIG. 2, a slit plate ( It is also possible to arrange between 31 and photo sensor 32. When the blocking plate 33 is disposed between the slit plate 31 and the photo sensor 32, the light beam passing through the first slit 31a of the slit plate 31 is the second slit of the blocking plate 33. A light beam passing through the periphery of the first slit 31a of the slit plate 31 is blocked by the blocking plate 33 so that the photo sensor 32 passes through the 33a. The light beam that passes through the periphery of the first slit 31a to the photo sensor 32 is minimized.

It is apparent to those skilled in the art that the present invention is not limited to the above-described embodiments, and that various modifications and variations can be made without departing from the spirit and scope of the present invention. Accordingly, such modifications or variations are intended to fall within the scope of the appended claims.

1 is a schematic diagram of a digital micromirror device and a light beam position measuring apparatus according to an embodiment of the present invention.

2 is a schematic diagram of a digital micromirror device and a light beam position measuring apparatus according to another embodiment of the present invention.

Explanation of symbols on the main parts of the drawings

10: light source 20: digital micro mirror device

21: micro mirror 30: light beam position measuring device

31: slit plate 31a: first slit

32: photo sensor 33: blocking plate

33a: second slit

Claims (7)

A slit plate receiving a light beam modulated by the digital micromirror device, the slit plate having a first slit formed to selectively pass a portion of the light beam, A photo sensor for measuring light passing through the first slit; And a blocking plate having a second slit of a shape corresponding to the second slit. The method of claim 1, And the blocking plate is disposed between the digital micro mirror device and the slit plate. The method of claim 1, And the blocking plate is disposed between the slit plate and the photo sensor. The method of claim 1, And said second slit has a wider width than said first slit. A light source for generating light, A digital micro mirror device for receiving and modulating light from the light source; A light beam position measuring device for measuring light transmitted from the digital micro mirror device; The optical beam position measuring device receives a light beam modulated by the digital micromirror device, and includes a slit plate having a first slit formed thereon to selectively pass a portion of the light beam, and light passing through the first slit. And a blocking plate having a photo sensor to measure and a second slit having a shape corresponding to the second slit. The method of claim 5, And the blocking plate is disposed between the digital micro mirror device and the slit plate. The method of claim 5, And the blocking plate is disposed between the slit plate and the photo sensor.
KR1020090117929A 2009-12-01 2009-12-01 Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus KR20110061318A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020090117929A KR20110061318A (en) 2009-12-01 2009-12-01 Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020090117929A KR20110061318A (en) 2009-12-01 2009-12-01 Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus

Publications (1)

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KR20110061318A true KR20110061318A (en) 2011-06-09

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101422615B1 (en) * 2013-02-04 2014-07-23 연세대학교 산학협력단 Source array detecting Device, System and Method
US9891537B2 (en) 2016-03-09 2018-02-13 Samsung Electronics, Co., Ltd. Maskless lithographic apparatus measuring accumulated amount of light

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101422615B1 (en) * 2013-02-04 2014-07-23 연세대학교 산학협력단 Source array detecting Device, System and Method
US9891537B2 (en) 2016-03-09 2018-02-13 Samsung Electronics, Co., Ltd. Maskless lithographic apparatus measuring accumulated amount of light

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