KR20110061318A - Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus - Google Patents
Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus Download PDFInfo
- Publication number
- KR20110061318A KR20110061318A KR1020090117929A KR20090117929A KR20110061318A KR 20110061318 A KR20110061318 A KR 20110061318A KR 1020090117929 A KR1020090117929 A KR 1020090117929A KR 20090117929 A KR20090117929 A KR 20090117929A KR 20110061318 A KR20110061318 A KR 20110061318A
- Authority
- KR
- South Korea
- Prior art keywords
- slit
- light beam
- light
- plate
- micro mirror
- Prior art date
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The present invention relates to an optical beam position measuring apparatus for receiving and measuring a light beam modulated by a digital micro mirror device of a maskless exposure apparatus, wherein the optical beam position measuring apparatus is a part of the light beams modulated by the digital micro mirror device. And a photo sensor for detecting light passing through the first slit, the slit plate having a first slit formed thereon to selectively pass the light; A blocking plate is provided so that the position of the light beam can be measured more accurately.
Description
The present invention relates to an optical beam position measuring apparatus for measuring the position of a light beam reflected by a micromirror of a digital micromirror device (DMD) used in a maskless exposure apparatus.
In general, a method of forming a pattern on a substrate is first applied to the substrate with a photosensitive material, the photosensitive material is exposed through a photomask on which the pattern is formed to change the chemical properties of the portion corresponding to the pattern on the photosensitive material, and the chemical properties are changed. A method of forming a pattern on a substrate by selectively removing remaining portions except portions is widely used.
In recent years, substrates have been gradually enlarged, and patterns formed on the substrates have been increasingly formed. Accordingly, a maskless exposure apparatus using no photo mask is used, and a maskless exposure apparatus is a digital micromirror device ( A pattern is formed on the substrate by irradiating the substrate with a light beam modulated to form a pattern through a digital micro mirror device.
One aspect of the present invention is to provide a light beam position measuring apparatus for a digital micromirror device of a maskless exposure apparatus capable of measuring the position of a light beam more accurately.
An optical beam position measuring apparatus for a digital micromirror device according to an embodiment of the present invention receives a light beam modulated by the digital micromirror device and has a slit plate having a first slit formed to selectively pass a portion of the light beam. And a blocking plate having a photo sensor for measuring light passing through the first slit, and a second slit having a shape corresponding to the second slit.
The blocking plate is also disposed between the digital micro mirror device and the slit plate.
The blocking plate is also disposed between the slit plate and the photo sensor.
The second slit also has a wider width than the first slit.
In addition, a maskless exposure apparatus according to an embodiment of the present invention includes a light source for generating light, a digital micro mirror device for receiving and modulating light from the light source, and a light beam position measurement for measuring light transmitted from the digital micro mirror device. And a light beam positioning device comprising: a slit plate formed with a first slit for receiving a light beam modulated by the digital micromirror device and selectively allowing a portion of the light beam to pass therethrough; And a blocking plate having a photosensor for measuring light and a second slit of a shape corresponding to the second slit.
As described above, most of the light beams passing through the slit plate and transmitted to the photo sensor through the area except the first slit can be blocked by the blocking plate, thereby accurately positioning the position of the light beam reflected by each micromirror. It can be measured.
Hereinafter, an optical beam measuring apparatus for a digital micromirror device according to an embodiment of the present invention will be described in detail with reference to the accompanying drawings.
As shown in FIG. 1, the light
The
In this case, since the positional errors may occur due to the precision of the
The light beam
The
At this time, the
Therefore, the light beam
The blocking
Therefore, since most of the light beams traveling from the
In addition, since the blocking
In the present embodiment, the blocking
It is apparent to those skilled in the art that the present invention is not limited to the above-described embodiments, and that various modifications and variations can be made without departing from the spirit and scope of the present invention. Accordingly, such modifications or variations are intended to fall within the scope of the appended claims.
1 is a schematic diagram of a digital micromirror device and a light beam position measuring apparatus according to an embodiment of the present invention.
2 is a schematic diagram of a digital micromirror device and a light beam position measuring apparatus according to another embodiment of the present invention.
Explanation of symbols on the main parts of the drawings
10: light source 20: digital micro mirror device
21: micro mirror 30: light beam position measuring device
31:
32: photo sensor 33: blocking plate
33a: second slit
Claims (7)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090117929A KR20110061318A (en) | 2009-12-01 | 2009-12-01 | Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020090117929A KR20110061318A (en) | 2009-12-01 | 2009-12-01 | Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20110061318A true KR20110061318A (en) | 2011-06-09 |
Family
ID=44395805
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020090117929A KR20110061318A (en) | 2009-12-01 | 2009-12-01 | Light beam position measuring apparatus for digital micro mirror device of maskless exposure apparatus |
Country Status (1)
Country | Link |
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KR (1) | KR20110061318A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101422615B1 (en) * | 2013-02-04 | 2014-07-23 | 연세대학교 산학협력단 | Source array detecting Device, System and Method |
US9891537B2 (en) | 2016-03-09 | 2018-02-13 | Samsung Electronics, Co., Ltd. | Maskless lithographic apparatus measuring accumulated amount of light |
-
2009
- 2009-12-01 KR KR1020090117929A patent/KR20110061318A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101422615B1 (en) * | 2013-02-04 | 2014-07-23 | 연세대학교 산학협력단 | Source array detecting Device, System and Method |
US9891537B2 (en) | 2016-03-09 | 2018-02-13 | Samsung Electronics, Co., Ltd. | Maskless lithographic apparatus measuring accumulated amount of light |
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