KR20110058985A - Method exhausting gas and device heating a substrate for performing the same - Google Patents

Abstract

PURPOSE: A gas discharging method and substrate heating device therefor are provided to quickly discharge fume around a shutter unit, thereby preventing the fume to be fixed onto the surface of the shutter unit due to external cold air. CONSTITUTION: A receiving container(100) has a cuboidal receiving space(110). The receiving container includes a hot wind inlet(120) which provides hot air. Shutter units(200a,200b) are installed on one opened side of the receiving container. A discharging unit(300) quickly discharges fume around the shutter unit. A shutter driving unit(400) individually or integrally opens the shutters of the shutter unit.

Description

TECHNICAL EXHAUSTING GAS AND DEVICE HEATING A SUBSTRATE FOR PERFORMING THE SAME}

The present invention relates to a gas exhaust method and a substrate heating apparatus for performing the same, and more particularly, a gas exhaust method capable of efficiently exhausting without fixing fumes present therein and a substrate heating method for performing the same. Relates to a device.

In general, a process of manufacturing a flat panel display including a liquid crystal display device is performed by applying a photo resist on a substrate and patterning the pattern in a pattern, and then maintaining the shape of the pattern as it is. Curing the formed substrate in a substrate heating oven.

When the photoresist is exposed for a long time at a high temperature in the substrate heating apparatus, the solvent in the photoresist is removed to fix the photoresist on the substrate. At this time, the solvent is generated as fume (fume).

When the shutter of the substrate heating device is opened to receive or ship the substrate to the substrate heating device, the fume condenses with the external cold air. The condensed fume is fixed in the shutter, around the shutter or in the substrate heating apparatus. The shutter and the fume adhered to the shutter are dropped into the substrate or the substrate heating apparatus which is released by vibration when the shutter is opened and closed. In addition, the fume fixed in the substrate heating apparatus is attached to the substrate when a new substrate is received in the substrate heating apparatus, causing secondary problems.

Accordingly, the technical problem of the present invention has been devised in view of the above, and an object of the present invention is to provide a gas exhaust method that can efficiently exhaust the gas present in the storage container without sticking.

It is another object of the present invention to provide a substrate heating apparatus suitable for carrying out the gas exhaust method.

In order to achieve the above object of the present invention, a gas exhaust method according to an embodiment is disclosed. In the above gas exhaust method, the substrate to be processed stored in the storage space of the storage container is heated by hot air provided from the outside. The gas generated from the heated to-be-processed substrate is discharged to the outside by a shutter having a heating substrate having a protrusion formed thereon and a heat insulating substrate in contact with the protrusion formed in an opening formed in one surface of the storage container.

In order to achieve the above object of the present invention, the substrate heating apparatus according to an embodiment includes a storage container, a shutter unit and an exhaust unit. The storage container includes a storage space for storing the substrate to be processed, and heats the substrate to be processed by hot air provided from the outside. The shutter unit is disposed in an opening formed on one surface of the storage container, and has a heating substrate having a protrusion and heated by hot air in the storage space, and a heat insulating substrate in contact with the protrusion. The exhaust portion is disposed adjacent to the shutter portion to exhaust the gas in the storage container.

In order to achieve the another object of the present invention described above, the substrate heating apparatus according to an embodiment includes a storage container, a shutter unit, a first exhaust unit and a blocking plate. The storage container includes a storage space for storing the substrate to be processed, and heats the substrate to be processed by hot air provided from the outside. The shutter unit is disposed in an opening portion formed on one surface of the storage container, and has a heating substrate heated by hot air in the storage space and a heat insulating substrate arranged in parallel with the heating substrate. The first exhaust part is disposed on a non-opening part other than the opening part on the one surface to exhaust the gas of the storage container. The blocking plate is disposed to be in contact with the inner surface of the non-opening portion and the heating substrate at the same time to block the outflow of the gas of the storage container.

According to such a gas exhaust method and a substrate heating method for performing the same, the fume generated by baking photoresist in a storage space of a storage container is prevented from coming into contact with external cold air around the shutter unit, whereby the fume is released into the shutter. It can be prevented from sticking to the part to increase the yield of the substrates to be processed.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the drawings. As the inventive concept allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. Like reference numerals are used for like elements in describing each drawing. In the accompanying drawings, the dimensions of the structures are shown in an enlarged scale than actual for clarity of the invention. The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component. Singular expressions include plural expressions unless the context clearly indicates otherwise.

In this application, the terms "comprises", "having", and the like are used to specify that a feature, a number, a step, an operation, an element, a part or a combination thereof is described in the specification, But do not preclude the presence or addition of one or more other features, integers, steps, operations, components, parts, or combinations thereof.

1 is a perspective view of a substrate heating apparatus according to an embodiment of the present invention.

Referring to FIG. 1, the substrate heating apparatus 1000 according to an exemplary embodiment of the present invention includes a storage container 100, a shutter unit 200, an exhaust unit 300, and a shutter driver 400.

The storage container 100 has a rectangular parallelepiped shape in which the storage space 110 is formed. The storage container 100 has one surface or a portion of the one surface of six sides of the rectangular parallelepiped shape is opened.

The storage container 100 may further have a hot air inlet 120 that can provide hot air. The hot air inlet 120 may have the storage container 100 formed on a side surface or an upper surface thereof to provide hot air from the outside to the storage space 110. The substrates to be stored in the storage container 100 are baked by the hot air provided through the hot air inlet 120.

The shutter unit 200 is mounted on one open side or one side of an opening of the storage container 100. The shutter unit 200 may include a plurality of shutters 200a and 200b. Accordingly, the shutters 200a and 200b of the shutter unit 200 may minimize external air from entering the storage space 110 or fume from the storage space 110. It can be moved individually or integrally.

The exhaust part 300 is disposed above the shutter part 200. The exhaust unit 300 is connected to the shutter unit 200 to quickly exhaust the fume in the vicinity of the shutter unit 200 when the shutter unit 200 is opened. The fume is a gas generated by baking the substrates on which the photo resist is formed in the substrate heating apparatus 1000. By exhausting the fume 300, the fume prevents the fume from coming into contact with cold air outside the shutter unit 200 and sticking to the surface of the shutter unit 200.

The shutter driver 400 is mounted outside the storage container 100 and on the side of the shutter 200 to individually or integrally open the shutters of the shutter 200. The shutter driver 400 may include a plurality of cylinders and pistons. The shutters can be opened individually or integrally by reciprocating the pistons or by applying pressure to the cylinders.

FIG. 2 is a cross-sectional view of the substrate heating apparatus of FIG. 1 taken along the line II ′. FIG.

1 and 2, the substrate heating apparatus 1000 includes a storage container 100, a shutter 200, an exhaust 300, a shutter driver 400, and a main frame 500. 1 and 2, the relationship between the storage container 100 and the shutter unit 200 will be described in more detail.

The storage container 110 includes a plurality of substrate supports 121, 122, 123, 124 that divide the storage space 110 into a plurality of sub storage spaces 111, 112, 113, 114, 115, and 116. 125). The storage spaces 111 to 116 may accommodate substrates 900a, 900b, 900c, 900d, 900e, and 900f or trays in which the substrates are stored.

For example, a first to-be-processed substrate 900a is accommodated in the first storage space 111, a second to-be-processed substrate 900b is stored in the second storage space 112, and a third storage space 113 is included. ), The third to-be-processed substrate 900c is accommodated, the fourth to-be-processed substrate 900d is stored in the fourth storage space 114, and the fifth to-be-processed substrate 900e is stored in the fifth storage space 115. The sixth substrate 900f is stored in the sixth storage space 116.

Here, although the sub storage spaces 111 to 116 are divided into six, the number of the sub storage spaces may be arbitrarily set by changing the number of the substrate supports.

The shutter unit 200 includes only the first shutter 200a or the first shutter 200a according to the size of the storage container 100 or the number of substrates to be accommodated by the storage container 100. ) And the second shutter 200b. The shutter unit 200 may include at least one second shutter 200b. As the size of the storage container 100 increases, the number of the second shutters 200b may increase.

When the shutter unit 200 includes a plurality of shutters, the shutters may be individually opened or integrally opened.

For example, when the shutter unit 200 includes one first shutter 200a and one second shutter 200b, the first shutter 200a is individually opened or the second shutter is opened. 200b may be integrally opened with the first shutter 200a.

In addition, when the shutter unit 200 includes one first shutter 200a and two second shutters 200b (for convenience of description, the two second shutters are referred to as upper and lower shutters). The first shutter 200a is individually opened, or the upper shutter 200b of the two second shutters 200b is integrally open with the first shutter 200a, or two The lower shutter 200b of the two shutters 200b may be integrally opened with the upper shutter and the first shutter 200a.

Each of the first shutter 200a and the second shutter 200b included in the shutter unit 200 corresponds to each of the sub accommodation spaces 111 to 116. Accordingly, when the first shutter 200a is opened, the first to-be-processed substrate 900a stored in the first sub storage container 111 may be taken out, and when the second shutters 200b are opened. The second to sixth processing substrates 900b to 900f stored in the second to sixth sub storage containers 112 to 116 may be withdrawn.

The main frame 500 fixes the shutter unit 200 to the storage container 100. The main frame 500 is formed along edges of one surface of each of the storage container 100 and the shutter unit 200 to have a frame shape. The main frame 500 may be formed to have a “b” shape so as to have a first surface coupled to the shutter unit 200 and a second surface coupled to the storage container 100.

In addition, the main frame 500 may be formed on a first surface coupled with the shutter unit 200 so that the shutters 200a and 200b may be moved in a direction perpendicular to the ground, that is, in a first direction D1. Movement aids such as rails may be formed.

3A is a perspective view illustrating the first shutter of FIG. 1. 3B is an exploded view illustrating the first shutter of FIG. 3A.

1 to 3B, the first shutter 200a includes a heating substrate 210, a first heat insulating substrate 220, and a first auxiliary frame 240. The heating substrate 210 and the first heat insulating substrate 220 are disposed to face each other.

The heating substrate 210 is disposed toward the storage space 110 of the storage container 100 as the first surface of the first shutter 200a. The heating substrate 210 may be heated by hot air inside the storage container 100. For example, the storage container 100 is constantly heated by the hot air provided through the hot air inlet 120 from the outside, and the first shutter 200a of the first container 200a mounted on one surface of the storage container 100 is formed. The heating substrate 210, which is one side, is heated by hot air circulated by convection in the storage container 100. That is, the heating substrate 210 is heated by the excess heat inside the storage container 100. At this time, no driving device is used to heat the heating substrate 210.

The heating substrate 210 has a plurality of protrusions 211. The protrusion 211 is formed by protruding a portion of the heating substrate 210 toward the first heat insulating substrate 220. The heating substrate 210 may be in contact with the first heat insulating substrate 220 by the protrusion 211. The heating substrate 210 may transfer heat to the first heat insulating substrate 220 by the protrusion 211.

In addition, the protrusions 211 may be formed in a streamlined shape such that the edges or ends are streamlined so that the fumes generated by the baking process in the storage container 100 may move easily without stagnating at the edges or ends of the protrusions 211. .

The first heat insulating substrate 220 is disposed toward the outside of the storage container 100 as a second surface of the first shutter 200a. As the first heat insulating substrate 220 is in contact with the protrusion 211 of the heating substrate 210, the first heat insulating substrate 220 may maintain a temperature substantially similar to the temperature in the storage container 100.

The first heat insulating substrate 220 includes at least one opening 221. The number of the openings 221 may be set in consideration of the amount of fume generated according to the size of the substrate to be processed or the size of the substrate heating apparatus. The opening 221 is formed in a part of the first heat insulating substrate 220. The opening 221 may be formed in a non-contact area between the heating substrate 210 and the first heat insulating substrate 220. The non-contact area will be described in more detail below.

In addition, the heating substrate 210 and the first heat insulating substrate 220 may be surface treated to lower the surface energy. The heating substrate 210 and the first heat insulating substrate 220 may be surface treated, and may further include, for example, a fluorine coating layer (reference numeral 350 of FIG. 6). Accordingly, the surface-treated heating substrate 210 and the first heat insulating substrate 220 may prevent the fume from sticking to the surface even when the heating substrate 210 and the first heat insulating substrate 220 are used for a long time. have. In addition, even if the fume is fixed to the surfaces of the surface-treated heating substrate 210 and the first heat insulating substrate 220, it may be much easier to remove the stuck fume.

The first auxiliary frame 240 is a means for coupling the heating substrate 210 and the first heat insulating substrate 220. The first auxiliary frame 240 is formed in a ?? shape, and each of an upper end portion, a first side end portion, and a second side end portion of the heating substrate 210 and an upper end portion and a first side end portion of the heat insulating substrate 220. And a portion of an upper surface, a first side surface, and a second side surface of the first shutter 200a by combining the second side ends.

The first auxiliary frame 240 closes the upper surface, the first side surface, and the second side surface of the first shutter 200a, so that the fume sucked between the heating substrate 210 and the second heat insulating substrate 220. It is prevented from leaking out of the first shutter 200a.

4 is an exemplary view illustrating a contact area and a non-contact area of FIGS. 3A and 3B.

1 to 4, the contact area CA, in which the heating substrate 210 and the heat insulating substrate 220 contact each other by the protrusion 211, and the heating substrate 210 and the heat insulating substrate 220. ) Will be described for the non-contact area NA that is not contacted by the protrusion 211.

The heating substrate 210 has protrusions 211 in which a portion of the heating substrate 210 protrudes toward the first heat insulating substrate 220. Each of the protrusions 211 may have the same shape or different shapes. In the present embodiment, it will be described as an example that the protrusions 211 have different shapes.

The first shutter 200a may include the contact area CA, in which the heating substrate 210 contacts the first heat insulating substrate 220 by the protrusion 211, and the first heat insulation by the protrusion 211. The non-contact area NA may not be in contact with the substrate 220.

The protrusions 211 are formed in the first direction D1. The first protrusion 211a formed in the first direction D1 may be formed to be spaced apart from the adjacent second protrusion 211b. For example, as the fume generated in the storage container 100 is sucked into the non-contact area NA between the heating substrate 210 and the first heat insulating substrate 220, a phenomenon in which a congestion occurs in a specific portion may occur. The protrusions 211a may be spaced apart from each other without being connected to the adjacent protrusions 211b so as not to occur.

In addition, the protrusions 211 may be formed to have a length of 1/2 or 2/3 of the width W of the heating substrate 210. Since the third protrusion 211c is formed to have a length of 1/2 or 2/3 of the width W of the heating substrate 210, the area of the non-contact area NA under the third protrusion 211c is reduced. Can be increased. The opening 221 may be formed in the first heat insulating substrate 220 corresponding to the non-contact area NA.

In addition, the protrusions 211 may be formed in a dot shape. Since the fourth protrusion 211d is formed in the dot shape, the contact area between the heating substrate 210 and the first heat insulating substrate 220 may be increased. For example, after considering the ease of circulation of the fume and the arrangement position of the opening 221, the fourth protrusion 211d may be further formed in a portion irrespective of the circulation of the fume and the arrangement position of the opening. have. Therefore, the fourth protrusion 211d increases the area of the contact area CA of the first shutter 200a.

5A is a perspective view illustrating the second shutter of FIG. 1. FIG. 5B is an exploded view illustrating the second shutter of FIG. 4A.

1 and 4 to 5B, the second shutter 200b includes a heating substrate 210, a second heat insulating substrate 230, and a second auxiliary frame 250. The heating substrate 210 and the second heat insulating substrate 230 are disposed to face each other.

The heating substrate 210 is disposed toward the storage space 110 of the storage container 100 as the first surface of the second shutter 200b. The heating substrate 210 may be heated by hot air inside the storage container 100. For example, the storage container 100 is constantly heated by the hot air provided through the hot air inlet 120 from the outside, and the second shutter 200b of the second container 200b mounted on one surface of the storage container 100 is formed. The heating substrate 210, which is one side, is heated by hot air circulated by convection in the storage container 100. That is, the heating substrate 210 is heated by the excess heat inside the storage container 100. At this time, no driving device is used to heat the heating substrate 210.

The heating substrate 210 has a plurality of protrusions 211. A portion of the heating substrate 210 protrudes toward the second heat insulating substrate 230 of the protrusion 211. The heating substrate 210 may be in contact with the second heat insulating substrate 230 by the protrusion 211. The heating substrate 210 may transfer heat to the second heat insulating substrate 230 by the protrusion 211.

In addition, the protrusions 211 may be formed in a streamlined shape such that the edges or ends are streamlined so that the fumes generated by the baking process in the storage container 100 can easily move without stagnating at the edges or ends of the protrusions 211. .

The second heat insulating substrate 230 is disposed toward the outside of the storage container 100 as a second surface of the second shutter 200b. The second heat insulating substrate 230 may maintain a temperature substantially similar to the temperature in the storage container 100 as the second heat insulating substrate 230 is in contact with the protrusion 211 of the heating substrate 210.

Like the first shutter 200a, the second shutter 200b includes a contact area CA in which the heating substrate 210 contacts the second heat insulating substrate 230 by the protrusion 211. The heating substrate 210 has a non-contact area NA that is not in contact with the heat insulating substrate 230 by the protrusion 211.

The heating substrate 210 and the second heat insulating substrate 230 may be surface treated to lower surface energy. The heating substrate 210 and the second heat insulating substrate 230 may be surface treated, and may further include, for example, a fluorine coating layer (reference numeral 350 of FIG. 6). Therefore, even if the surface-treated heating substrate 210 and the second heat insulating substrate 230 are used for a long time, the fume may be prevented from adhering to the surface. In addition, even if the fume is fixed to the surfaces of the surface-treated heating substrate 210 and the second heat insulating substrate 230, it may be much easier to remove the stuck fume. The second auxiliary frame 250 is a means for coupling the heating substrate 210 and the heat insulating substrate 230. The second auxiliary frame 250 may be formed in a single shape to form a part of a side surface of the second shutter 200b by combining a side end portion of the heating substrate 210 and a side end portion of the heat insulating substrate 230. Can be.

The second auxiliary frame 250 forms a part of an upper surface or a side surface of the second shutter 200b, such that the fume sucked between the heating substrate 210 and the heat insulating substrate 230 is discharged to the second shutter ( To prevent leakage to outside of 200b).

6 is a partial cross-sectional view for explaining a process of evacuating the fume according to the present embodiment.

Referring to FIGS. 1 and 6, a process in which the fume is exhausted through the exhaust unit 300 without being fixed to the shutter unit 200 according to the present embodiment will be described.

FIG. 6 illustrates that the first shutter 200a is gradually spaced apart from the second shutter 200b while moving in the first direction D1. When the first shutter 200a is opened, cool air C may flow from the outside of the shutter unit 200.

In the substrate heating apparatus according to the related art, when the shutter unit is opened, cold air introduced from the outside of the shutter unit and hot fume discharged from the storage space of the storage container may contact with the shutter unit. As the cold air contacted the hot fume near the shutter portion, the fume was condensed and fixed to the shutter portion. The stuck fume falls on the substrate to be processed every time the shutter unit is opened, which adversely affects the operation of the substrate.

However, the substrate heating apparatus 1000 according to the present exemplary embodiment may solve the problem according to the related art according to the structure of the shutter unit 200 with the flow of fume as described below. For convenience of explanation, the flow of the fume will be described by giving a reference number according to the position of the fume.

Insulating substrates 220 and 230 of the shutter unit 200 according to the present exemplary embodiment are disposed at a position farthest from the storage space 110. Since the heat insulation boards 220 and 230 are disposed at the outermost side, the temperature from the storage space 110 to the heat insulation boards 220 and 230 and between the first shutter 200a and the second shutter 200b. May maintain a temperature similar to that of the accommodation space 110. Therefore, the first fume F1 flowing out from the storage space 110 between the first shutter 200a and the second shutter 200b is not suddenly cooled and has a temperature similar to that of the storage space 110. Can be maintained.

Here, the first fume F1 flowing out between the first shutter 200a and the second shutter 200b moves in a direction intersecting the first direction, that is, in a second direction D2, to cool the first fume F1. In order to prevent contact with the air C, the fume may be sucked through the exhaust part 300 by an external device (not shown) of the substrate heating apparatus 1000. For example, the external device adjusts the pressure of the exhaust unit 300 to be lower than the pressure of the shutter unit 200 or the pressure between the first shutter 200a and the second shutter 200b. A negative pressure may be formed between the heating substrate 210 of the first shutter 200a and the first heat insulating substrate 220.

Therefore, when the first shutter 200a is opened, the first fume F1 is disposed between the first shutter 200a and the second shutter 200b rather than the second direction D2. More can be moved in the direction D1.

Most of the first fume F1 is moved in the second direction D2 so that the non-contact area defined by the protrusions 211 between the heating substrate 210 and the first heat insulating substrate 220 is formed. NA) (ie discharge path). When the first fume F1 is sucked into the non-contact area NA, the first fume F1 is sucked into the exhaust part 300 through the opening 221 formed in the heat insulating substrate 220. The non-contact area NA may be moved between the protrusions 211. The second fume F2 sucked into the exhaust part 300 is provided to the outside and subjected to secondary treatment. The third fume F3 moved to the non-contact area NA may move in the second direction D2 or may be sucked into the exhaust part 300.

For example, when the second shutter 200b is coupled to the first shutter 200a and opened integrally, the third fume F3 may continuously move in the second direction D2. In order to exhaust the third fume F3, the third fume F3 is formed in the non-contact area NA between the heating substrate 210 and the second heat insulating substrate 230 of the second shutter 200b. It is necessary to move up to the first shutter 200a to which the exhaust port 300 is coupled. Therefore, the third fume F3 may continue to move in the second direction D2 and be exhausted through the exhaust port 300.

7A to 7C are cross-sectional views illustrating the operation of the shutter unit.

Referring to FIGS. 1 to 7C, a process of pulling out the to-be-processed substrates 900a to 900f disposed in the accommodation space 110 by opening the shutter unit 200 will be described.

FIG. 7A illustrates that the substrates 900a to 900f are accommodated in the storage space 110 of the storage container 100 of the substrate heating apparatus 1000. The storage space 110 is divided into a plurality of sub storage spaces 111 to 116. Each of the plurality of substrates 900a to 900f is disposed in each of the sub accommodation spaces 111 to 116. In the present exemplary embodiment, the substrates 900a to 900f are large substrates used for a liquid crystal display.

In the process of manufacturing the liquid crystal display device, in the process of using an organic film or a photo resist, the substrates 900a to 900f are placed under high temperature and long time conditions in the substrate heating apparatus 1000. . The substrates 900a to 900f are placed under the above conditions, thereby removing the solvent (solvent, solvent) of the photoresist to fix the photoresist to the substrates 900a to 900f. Will go through. At this time, the removed sorbent is the main component of the fume, which is the main cause of yield reduction such as generating particles.

7B illustrates that the first shutter 200a of the shutter unit 200 is opened. When the first shutter 200a is opened in the first direction D1, the first to-be-processed substrate 900a accommodated in the first sub accommodation space 111 is drawn out.

The first substrate 900a is moved from the substrate heating apparatus 1000 to the second direction D2 by an arm of a robot (not shown) that transfers the substrates 900a to 900f. Can be withdrawn.

In this case, the fume may be sucked between the heating substrate 210 and the first heat insulating substrate 220 of the first shutter 200a to be exhausted to the exhaust part 300.

Subsequently, when the first to-be-processed substrate 900a is pulled out, the shutter unit 200 returns to the state of FIG. 7A.

FIG. 7C illustrates that the second shutter 200b of the shutter unit 200 is opened. When the second shutter 200b is opened in the first direction D1, the second to-be-processed substrate 900b stored in the second sub accommodation space 112 is drawn out. In this case, when the second shutter 200b is moved in the first direction D1, the second shutter 200b is combined with the first shutter 200a and moved together.

When the second shutter 200b is opened, the first shutter 200a is also moved in the first direction D1, but the sub receiving spaces 111 to 116 are to be drawn out. Only the second sub storage space 112 in which the processing substrate 900b is accommodated may be opened. In detail, although the second shutter 200b and the first shutter 200a are opened together in the first direction D1, the distance at which the first shutter 200a is moved in the first direction D1 is The same as when the first sub storage space 111 is opened. Accordingly, the second shutter 200a is moved only as long as the second sub storage space 112 is opened, and thus the original position of the first shutter 200a, that is, the position corresponding to the first sub storage space 111. In this case, only the second sub storage space 112 may be opened.

The second to-be-processed substrate 900b may be withdrawn from the substrate heating apparatus 1000 in the second direction D2 by an arm of a robot that transfers the to-be-processed substrates 900a to 900f. Here, the second to-be-processed substrate 900b is stored at a lower position than the first to-be-processed substrate 900a. Therefore, the operator can adjust the height of the robot or the height of the arm of the robot to take out the second to-be-processed substrate 900b from the substrate heating apparatus 1000. Alternatively, by further including a height adjuster mounted below the storage container 100 of the substrate heating apparatus 1000, the height of the substrate heating apparatus 1000 may be adjusted to draw out the substrate 900 to be processed. .

In this case, the fume is sucked between the heating substrate 210 and the second heat insulating substrate 230 of the second shutter 200b to prevent the non-contact between the heating substrate 210 and the second heat insulating substrate 230. A suction is performed between the heating substrate 210 and the first heat insulating substrate 220 of the first shutter 200a through the area NA. Therefore, the fume may be exhausted to the exhaust unit 300 coupled to the first shutter 200a.

Subsequently, when the second to-be-processed substrate 900b is pulled out, the shutter unit 200 returns to the state of FIG. 7A.

Since the process of drawing the third to sixth substrates 900c to 900f from the storage container 100 is the same as that of the drawing process of the second to-be-processed substrate 900b of FIG. 6C, the process is repeated. The description will be omitted.

In the substrate heating apparatus 1000 according to the present exemplary embodiment, the insulation substrates 220 and 230 are disposed outside the shutter unit 200, so that the shutters 200a and 200b are most opened from the storage space 110 when the shutters 200a and 200b open and close. By keeping the temperature up to a distance similar to the temperature of the storage space 110, it is possible to prevent the fume from being fixed to the shutter unit 200.

8 is a perspective view showing a substrate heating apparatus according to another embodiment of the present invention.

Since the substrate heating apparatus of this embodiment has the same components except that the position where the exhaust part 300 of the substrate heating apparatus 1000 of the embodiment according to FIG. 1 is disposed in the first shutter 200a is different, the same configuration The same reference numerals will be used for elements and repeated descriptions will be omitted.

Referring to FIG. 8, the substrate heating apparatus 2000 according to the present exemplary embodiment includes a storage container 100, a shutter unit 600, an exhaust unit 300, a shutter driver 400, and a main frame 500. .

The shutter unit 600 is mounted on one opened surface of the storage container 100. The shutter unit 600 may be configured of only the first shutter 600a or the first shutter 600a and the second shutter 200b. When the shutter unit 600 includes a plurality of shutters, the shutters may be individually opened or integrally opened.

The exhaust part 300 is disposed above the shutter part 600. The exhaust unit 300 is connected to the shutter unit 600 to quickly exhaust the fume in the vicinity of the shutter unit 600 when the shutter unit 600 is opened. Accordingly, the fume is prevented from meeting the cold air outside the shutter unit 600 and fixed to the surface of the shutter unit 600.

9A is a partial perspective view illustrating an example of the first shutter of FIG. 8.

8 and 9A, the first shutter 600a includes a heating substrate 210, a second heat insulating substrate 230, and a first auxiliary frame 260. The heating substrate 210 and the second heat insulating substrate 230 are disposed to face each other.

The heating substrate 210 is disposed toward the storage space 110 of the storage container 100 as the first surface of the first shutter 600a. The heating substrate 210 may be heated by hot air inside the storage container 100. That is, the storage container 100 is constantly heated by hot air provided from the outside, and the heating substrate 210 is a first surface of the first shutter 600a mounted on one surface of the storage container 100. In addition, it may be heated by the excess heat inside the storage container 100. In this case, no driving device may be used to heat the heating substrate 210.

The heating substrate 210 has a plurality of protrusions 211. The protrusion 211 protrudes toward the second heat insulating substrate 230 without a portion of the heating substrate 210 protruding toward the accommodation space 110. The heating substrate 210 may be in contact with the second heat insulating substrate 230 by the protrusion 211. The heating substrate 210 may transfer heat to the second heat insulating substrate 230 by the protrusion 211.

In addition, the protrusion 211 may be formed in a streamlined shape such that the fumes generated according to the process in the storage container 100 can easily move without stagnating in the corner of the protrusion 211.

The second heat insulating substrate 230 is disposed toward the outside of the storage container 100 as a second surface of the first shutter 600a. As the second heat insulating substrate 230 is in contact with the protrusion 211 of the heating substrate 210, the second heat insulating substrate 230 may maintain a temperature substantially similar to the temperature in the storage container 100.

The heating substrate 210 and the second heat insulating substrate 230 may be surface treated to lower surface energy. The heating substrate 210 and the second heat insulating substrate 230 may be surface treated to include, for example, a fluorine coating layer (reference numeral 350 of FIG. 6). Therefore, even if the surface-treated heating substrate 210 and the second heat insulating substrate 230 are used for a long time, it is possible to prevent the fume from sticking to the surface. In addition, even if the fume is fixed to the surfaces of the surface-treated heating substrate 210 and the second heat insulating substrate 230, it may be much easier to remove the stuck fume.

The first auxiliary frame 260 is a means for coupling the heating substrate 210 and the second heat insulating substrate 230. The first auxiliary frame 260 is formed in a ?? shape, and each of an upper end portion, a first side end portion and a second side end portion of the heating substrate 210, and an upper end portion and a first side of the second heat insulating substrate 220. An upper surface, a first side surface, and a second side surface of the first shutter 600a may be formed by combining an end portion and a second side end portion.

The first auxiliary frame 260 forms an upper surface, a first side surface, and a second side surface of the first shutter 600a to thereby absorb the fume sucked between the heating substrate 210 and the second heat insulating substrate 230. It is prevented from leaking out of the first shutter 600a.

In addition, the first auxiliary frame 260 includes at least one opening 261. The number of the openings 261 may be set in consideration of the amount of fume generated according to the size of the substrate to be processed or the size of the substrate heating apparatus. The opening 261 is formed in a portion of the first auxiliary frame 260. For example, the opening 261 may be formed at an edge of an upper surface of the first shutter 600a formed by the first auxiliary frame 260.

9B is a partial perspective view illustrating another example of the first shutter of FIG. 8.

8 and 9B, the first auxiliary frame 270 includes at least one opening 271. The number of the openings 271 may be set in consideration of the amount of fume generated according to the size of the substrate to be processed or the size of the substrate heating apparatus. The opening 271 is formed in a part of the first auxiliary frame 270. For example, the opening 271 may be formed on the first side and the second side of the first shutter 600a of the first auxiliary frame 270.

In the substrate heating apparatus 2000 according to the present exemplary embodiment, the exhaust unit 300 is coupled to the edges or side surfaces of the upper surface of the shutter unit 600 to the first and second side surfaces of the shutter unit 600. The outflowing fume can be exhausted efficiently.

10 is a perspective view of a substrate heating apparatus according to another embodiment of the present invention.

The substrate heating apparatus according to the present embodiment has substantially the same components, except that the positions where the exhaust portion and the shutter driving portion are formed are different from those of the embodiment of FIG. 1, and therefore, the same reference numerals are assigned to the same components. , Repeated descriptions will be omitted.

Referring to FIG. 10, the substrate heating apparatus 3000 according to the present exemplary embodiment includes a storage container 100, a shutter unit 700, an exhaust unit 300, a shutter driver 410, and an airflow blocking plate 800. do.

The storage container 100 has a rectangular parallelepiped shape in which the storage space 110 is formed. An opening portion 130 and a non-opening portion 131 are formed on one surface of the storage container 100. The shutter portion 700 may be disposed in the opening portion 130, and the exhaust portion 300 or the shutter driver 410 may be disposed in the non-opening portion 131. In the present embodiment, the exhaust part 300 is disposed while contacting the non-opening part 131, and the shutter driving part 410 is disposed in parallel with the exhaust part 300.

The storage container 100 has a hot air inlet 120 that can provide hot air. The hot air inlet 120 may be formed on other surfaces except for the one surface to provide hot air to the storage space 110 from the outside. The substrates to be stored in the storage container 100 are baked by the hot air provided through the hot air inlet 120.

FIG. 11 is a cross-sectional view taken along line II-II ′ of the substrate heating apparatus of FIG. 10.

10 and 11, the shutter unit 700, the exhaust unit 300, the shutter driver 410, and the airflow blocking plate 800 will be described in more detail.

The shutter unit 700 is disposed to cover the opening portion 130 of the storage container 100. For example, the shutter portion 700 is slightly larger than the opening portion 130 to completely cover the opening portion 130, and overlaps the outer surface 131a of the non-opening portion 131. May be arranged.

The shutter unit 700 includes at least one third shutter 700a. The number of the third shutters 700a may be set according to the size of the storage container 100, the size of the opening portion 130, or the number of substrates to be accommodated by the storage container 100. have. When the shutter unit 700 includes a plurality of third shutters 700a, the third shutters 700a may be individually opened or integrally opened. Since the process of opening the third shutter 700a is the same as that of the embodiment of FIG. 1, a description thereof will be omitted.

The third shutter 700a includes a heating substrate 210, a second insulating substrate 230, and an auxiliary frame 270. The heating substrate 210 and the second heat insulating substrate 230 are disposed to face each other.

The heating substrate 210 is disposed toward the storage space 110 of the storage container 100 as the first surface of the third shutter 700a. The heating substrate 210 may be heated by hot air inside the storage container 100. That is, the storage container 100 is constantly heated by hot air provided from the outside, and the heating substrate 210 which is the first surface of the third shutter 700a mounted on one surface of the storage container 100 is also It may be heated by the excess heat inside the storage container 100. In this case, no driving device may be used to heat the heating substrate 210.

The heating substrate 210 has a plurality of protrusions 211. The protrusion 211 protrudes toward the second heat insulating substrate 230 without a portion of the heating substrate 210 protruding toward the accommodation space 110. The heating substrate 210 may be in contact with the second heat insulating substrate 230 by the protrusion 211. The heating substrate 210 may transfer heat to the second heat insulating substrate 230 by the protrusion 211.

In addition, the protrusion 211 may be formed in a streamlined shape such that the fumes generated according to the process in the storage container 100 can easily move without stagnating in the corner of the protrusion 211.

In addition, the heating substrate 210 may not have the protrusion 211. The heating substrate 210 may be in full contact with the second heat insulating substrate 230.

The second heat insulating substrate 230 is disposed toward the outside of the storage container 100 as the second surface of the third shutter 700a. As the second heat insulating substrate 230 is in contact with the protrusion 211 of the heating substrate 210, the second heat insulating substrate 230 may maintain a temperature substantially similar to the temperature in the storage container 100.

The auxiliary frame 270 is a means for coupling the heating substrate 210 and the second insulating substrate 230. A cross section of the auxiliary frame 270 may be a "c" shape. Accordingly, the first surface 271 of the auxiliary frame 270 is coupled to the heating substrate 210, and the second surface 272 parallel to the first surface 271 is the second insulating substrate 230. The third surface 273 coupled to the first surface 271 and the second surface 272 perpendicular to the second surface 272 is exposed to the outside to become a part of the side surface of the third shutter portion 700a. In FIG. 10, the auxiliary frame 270 connects the side end portion of the heating substrate 210 and the side end portion of the second heat insulating substrate 230, but the upper end portion or the lower end portion of the heating substrate 210 and the first end portion are formed. 2 The upper end or the lower end of the heat insulating substrate 230 may be connected.

The exhaust part 300 is disposed at the non-opening part 131, which is a side surface 701 of the shutter part 700. The exhaust part 300 is disposed on the side surface 701 of the shutter part 700 so that the fume spilled into a minute gap A that may occur even when the shutter part 700 covers the opening part 130. Exhaust quickly. Thus, the fume is prevented from encountering the cool air at the side surface 701 of the shutter unit 700 to adhere to the surface of the shutter unit 700.

The exhaust part 300 may be disposed by the exhaust support 310. The exhaust part 300 may have a plurality of suction ports corresponding to each of the third shutters 700a.

The shutter driver 400 is disposed on the side surface 701 of the shutter unit 700 to drive the shutter unit 700. The shutter driver 400 is connected to the shutter unit 700 by a connection unit 401. The shutter driver 400 opens the third shutters 700a individually or integrally. For example, the shutter driver 400 may include a plurality of cylinders, and the shutters may be individually or integrally opened by applying pressure to the cylinders.

The airflow blocking plate 800 blocks the fume flowing into the minute gap A between the non-opening portion 131 and the shutter portion 700. The airflow blocking plate 800 may have an S shape. For example, the airflow blocking plate 800 is disposed in contact with the inner surface 131b of the non-opening portion 131 in the storage space 110 and the shutter portion 700. And a second portion 802 disposed in contact with the heating substrate 210, and a third portion 803 connecting the first portion 801 and the second portion 802.

The airflow blocking plate 800 is not completely closed by the shutter unit 700 regardless of whether the shutter unit 700 is opened, and thus, the storage container 100 and the The minute gap A between the shutter units 700 may be blocked. Accordingly, the airflow blocking plate 800 prevents the fume from leaking into the minute gap A when the substrate heating apparatus 3000 is baked and contacting with cold air outside.

In the substrate heating apparatus 3000 according to the present exemplary embodiment, the airflow blocking plate 800 is disposed between the storage container 100 and the shutter unit 700, so that the storage unit may be opened regardless of whether the shutter unit 700 is opened. It is possible to block contact between the outside of the cool air introduced through the minute gap between the container 100 and the shutter unit 700 or the fume of the storage space 110 that flows out.

According to embodiments of the present invention, the fume generated by baking photoresist in the storage space of the storage container is prevented from contacting the cold air around the shutter unit, thereby preventing the fume from sticking to the shutter unit. Thereby increasing the yield of the substrates to be processed.

Although described above with reference to the embodiments, those skilled in the art can be variously modified and changed within the scope of the present invention without departing from the spirit and scope of the invention described in the claims below. I can understand.

1 is a perspective view of a substrate heating apparatus according to an embodiment of the present invention.

FIG. 2 is a cross-sectional view of the substrate heating apparatus of FIG. 1 taken along the line II ′. FIG.

3A is a perspective view illustrating the first shutter of FIG. 1.

3B is an exploded view illustrating the first shutter of FIG. 2A.

4 is an exemplary view illustrating a contact area and a non-contact area of FIGS. 3A and 3B.

5A is a perspective view illustrating the second shutter of FIG. 1.

FIG. 5B is an exploded view illustrating the second shutter of FIG. 5A in detail.

FIG. 6 is a partial cross-sectional view for describing a process of exhausting fume by the substrate heating apparatus shown in FIG. 1.

7A to 7C are cross-sectional views for describing the operation of the shutter unit illustrated in FIG. 1.

8 is a perspective view showing a substrate heating apparatus according to another embodiment of the present invention.

9A is a partial perspective view illustrating an example of the first shutter of FIG. 8.

9B is a partial perspective view illustrating another example of the first shutter and the exhaust unit of FIG. 8.

10 is a perspective view of a substrate heating apparatus according to another embodiment of the present invention.

FIG. 11 is a cross-sectional view taken along line II-II ′ of the substrate heating apparatus of FIG. 10.

<Description of the symbols for the main parts of the drawings>

100: storage container 110: storage space

120: hot air inlet 200, 600 and 700: shutter unit

300: exhaust unit 400: shutter drive unit

500: main frame 800: airflow blocking plate

Claims (20)

Heating the processing target substrate stored in the storage space of the storage container by hot air provided from the outside; And Exhausting the gas generated from the heated target substrate to the outside by means of a shutter disposed in an opening formed on one surface of the storage container and having a heated substrate having a protrusion formed therein and a heat insulating substrate in contact with the protrusion. The method of claim 1, wherein the discharge of the gas to the outside by the shutter,  Exhausting the gas through a discharge path defined by the protrusion between the heating substrate and the thermal insulation substrate when the shutter is opened and closed to draw out the processing target substrate. . A storage container including a storage space accommodating the substrate to be processed and heating the substrate to be processed by hot air provided from the outside; A shutter unit disposed in an opening formed on one surface of the storage container, the shutter unit having a protrusion and a heating substrate heated by hot air in the storage space and a heat insulating substrate in contact with the protrusion; And A substrate heating apparatus disposed adjacent to the shutter portion, the exhaust portion for exhausting the gas in the storage container. The substrate heating apparatus of claim 3, wherein the heating substrate is disposed to face the storage space, and the heat insulating substrate is disposed to face the outside. The substrate heating apparatus of claim 3, further comprising a main frame which fixes the shutter unit to the storage container. The substrate heating apparatus of claim 3, wherein a part of the heating substrate protrudes toward the heat insulating substrate. 7. The substrate heating apparatus of claim 6, wherein the protrusion has a streamlined shape. 4. The substrate heating apparatus of claim 3, wherein the heat insulating substrate and the heating substrate are fluorine coated to lower the surface tension. The method of claim 3, wherein the shutter unit comprises a first shutter having a first opening in which the heat insulating substrate is opened, And the first opening is connected to the exhaust part. 10. The substrate heating apparatus of claim 9, wherein the first shutter includes an auxiliary frame that fixes the insulation substrate to the heating substrate, and prevents gas from flowing between the heating substrate and the insulation substrate. . 11. The substrate heating apparatus of claim 10, wherein the auxiliary frame has a second opening for connecting with the exhaust part. 10. The method of claim 9, wherein the storage container further comprises a substrate support, And the substrate support divides the storage space into sub storage spaces. The substrate heating apparatus of claim 12, wherein the shutter unit comprises at least one second shutter disposed below the first shutter. The substrate heating apparatus of claim 13, wherein the second shutter includes an auxiliary frame that fixes the thermal insulation substrate to the heating substrate and blocks the outflow of gas between the heating substrate and the thermal insulation substrate. . The substrate heating apparatus of claim 13, wherein each of the first shutter and the second shutter corresponds to the sub accommodation space. The substrate heating apparatus of claim 3, further comprising: a blocking plate disposed at an edge of the storage container and the shutter unit to block outflow of gas. A storage container including a storage space accommodating the substrate to be processed and heating the substrate to be processed by hot air provided from the outside; A shutter unit disposed in an opening portion formed on one surface of the storage container, the shutter unit having a heating substrate heated by hot air in the storage space and a heat insulating substrate arranged in parallel with the heating substrate; A first exhaust part disposed on a non-opening part other than the opening part on the one surface to exhaust gas of the storage container; And And a blocking plate disposed to be in contact with the inner surface of the non-opening portion and the heating substrate at the same time to block outflow of the gas of the storage container. 18. The substrate heating apparatus of claim 17, wherein the blocking plate has an S shape. 18. The heating substrate apparatus of claim 17, wherein the heating substrate has a protrusion, and the protrusion is in contact with the heat insulating substrate. 18. The apparatus of claim 17, further comprising: a second exhaust unit connected to the shutter unit to exhaust gas of the storage container when the shutter unit is opened and closed; And the heat insulating substrate has an opening for connecting the second exhaust part.

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