KR20110038484A - Substrate processing equipment - Google Patents

Abstract

PURPOSE: A substrate processing device is provided to increase operation time by arranging an adhesion member with elasticity between a rotation axis and a shaft. CONSTITUTION: A chamber has a reaction space. A substrate receiving unit(200) is located in the reaction space. A rotation axis unit(400) includes a rotation axis, a shaft, an adhesion body, and an adhesion member(440). The rotation axis is extended to the lower center region of the substrate receiving unit. The adhesion member includes an elastic unit and closely adheres the rotation axis to the shaft.

Description

Substrate Processing Unit {SUBSTRATE PROCESSING EQUIPMENT}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate processing apparatus, and more particularly, to a substrate processing apparatus having a substrate placing portion and rotating means for placing and rotating a substrate in a chamber.

Generally, a substrate processing apparatus refers to an apparatus for depositing a film on a semiconductor substrate or etching a film deposited on a semiconductor substrate. A film is formed and etched through such a substrate processing apparatus to produce a semiconductor device, a flat panel display panel, an optical device, a solar cell, and the like.

In the case of depositing a thin film on a substrate through a substrate processing apparatus, the substrate is placed on a substrate mounting portion inside the substrate processing apparatus, and then a predetermined film is formed on the surface of the substrate through a chemical or physical method. Generally, a process gas is injected into the reaction space of the substrate processing apparatus to form a predetermined film on the substrate surface.

However, recently, due to the increase in the size of the substrate it is difficult to uniformly spray the process gas on the surface of the substrate. This caused a problem that the uniformity of the film formed on the semiconductor substrate worsened. Accordingly, in the related art, the uniformity of the thin film thickness deposited on the substrate is improved by rotating the semiconductor substrate.

At this time, the substrate was placed on the substrate settled portion, and the substrate settled portion was connected to the rotating shaft to perform rotation. Then, the rotary shaft was rotated by receiving a rotational force from an external drive motor. In this case, conventionally, the O-ring was used as a connection portion between the rotating shaft and the drive motor. However, in the case of the O-ring, there is a disadvantage that it quickly wears out due to prolonged use, and deteriorates quickly when exposed to high temperature. Thus, a problem arises in that the O-ring is damaged because the heated heat of the substrate seat is transferred through the rotation shaft. This causes a problem that the substrate settle portion rotates to one side rather than rotating on the horizontal plane. This caused a problem that the uniformity of the thickness of the thin film deposited on the substrate was lowered.

One technical problem of the present invention to solve the above problems is to improve the uniformity of the thin film deposited on the substrate by preventing wobbling, that is, precession of the rotation axis through the fastening means of the material and form different from the conventional O-ring It is to provide a substrate processing apparatus that can be made.

A chamber having a reaction space according to an embodiment of the present invention, a rotation shaft connected to the substrate settled portion positioned in the reaction space and a lower center region of the substrate settled portion, and a shaft to which one end of the rotation shaft is inserted and fixed; It provides a substrate processing apparatus including a tubular contact body and a rotating shaft including an elastic part provided in at least one of the upper and lower portions of the contact body and the contact member for tightly coupling between the rotating shaft and the shaft. do.

The rotating shaft is made of a quartz material, the shaft is made of a sus material, the contact member is preferably made of the same material as the shaft.

The elastic portion may be manufactured by cutting any one of the upper and lower regions of the contact body in the longitudinal direction to form a plurality of cutting regions, and bending the cutting region at least once.

The contact member may be located in an upper region of the shaft, and the rotation shaft may include a jig for closely contacting the shaft and the rotation shaft in a lower region of the shaft.

The close contact member is formed in the upper contact area of the body and the first elastic portion for tightly coupling between the rotating shaft and the shaft in the upper region of the shaft, and the lower contact of the rotating body formed in the lower region of the shaft It is possible to include a second elastic portion for tightly coupling between the shaft.

The close contact member includes a first close contact member for tightly coupling between the rotary shaft and the shaft in an upper region of the shaft, and a second close contact member for tightly coupled between the rotary shaft and the shaft in a lower region of the shaft. It is possible.

It may include a driving means for applying a rotational force to the rotating shaft portion and a heating means located in the lower portion of the chamber to heat the reaction space.

The chamber has a chamber body, an upper dome covering an upper region of the chamber body, and a lower dome covering a lower region of the chamber body, wherein the lower dome comprises an inverted conical bottom plate and a bottom plate. An extension tube protruding from the center may be provided, and the shaft may be fixedly coupled to the extension tube.

In addition, the substrate settled portion in which the substrate is placed, and the rotating shaft connected to the lower center region of the substrate settled portion, the shaft to which one end of the rotating shaft is inserted and fixed, the tubular close contact body, the upper and lower portion of the contact body Provided is a substrate supporting apparatus including a rotating shaft portion including an elastic member provided in at least one of the areas in close contact with the rotating shaft and the shaft.

The rotating shaft is made of a quartz material, the shaft is made of a sus material, the close contact member is made of the same material as the shaft, the elastic portion in the longitudinal direction of any one of the upper and lower regions of the contact body Cutting to form a plurality of cutting regions, and can be produced by bending the cutting region at least one or more times.

As described above, the fragile rotary shaft may be fixed to the lower region by using a shaft. In addition, by inserting the rotating shaft inside the shaft to support and fix it, by placing a close contact member having the same elasticity as the shaft between the rotating shaft and the shaft can increase the operating time of the equipment, it can reduce the maintenance cost and time of the equipment In addition, the thin film having a uniform thickness may be deposited by preventing shaking of the rotating shaft, that is, precession of the rotating shaft.

Hereinafter, with reference to the accompanying drawings will be described an embodiment of the present invention in more detail. It will be apparent to those skilled in the art that the present invention may be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete, It is provided to let you know. Like numbers refer to like elements in the figures.

1 is a cross-sectional conceptual view of a substrate processing apparatus according to an embodiment of the present invention. 2 is an exploded conceptual view of a rotating shaft unit according to an exemplary embodiment. 3 is a conceptual cross-sectional view of a rotating shaft unit according to an embodiment. 4 is a perspective conceptual view of a rotating shaft unit according to an exemplary embodiment. 5 and 6 are conceptual cross-sectional views of a rotating shaft unit according to a modified example of the embodiment.

As shown in FIGS. 1 to 4, the substrate processing apparatus of this embodiment includes a chamber 100 having an internal reaction space, a substrate placing part 200 for placing the substrate 10 in the chamber 100, and a chamber ( 100, a heating means 300 for heating the reaction space, a rotating shaft portion 400 connected to the substrate set-up portion 200, and driving means for applying a rotational force to the rotating shaft portion 400 500.

In addition, as shown in Figure 1 may be further provided with an upper heating means 600 located on the upper portion of the chamber 100 for heating the reaction space. Of course, although not shown, a plasma generating device for generating a plasma in the reaction space may be provided.

The chamber 100 includes a chamber body 110 forming an internal space, an upper dome 120 and a lower dome 130.

The chamber body 110 is manufactured in a cylindrical shape with upper and lower portions opened. That is, it is manufactured in the form of a circular band. Of course, the present invention is not limited thereto and may be manufactured in a polygonal cylindrical shape. Part or all of the chamber body 110 is preferably made of a metallic material. In this embodiment, the chamber body 110 is manufactured using a material such as aluminum or stainless steel. At this time, the chamber body 110 serves as a side wall surface of the interior space of the chamber 100. Although not shown, a part of the chamber body 110 may be formed with a substrate entrance through which the substrate enters and a final connection portion of the gas supply device for supplying the reaction gas into the reaction space.

The upper dome 120 becomes the upper cover of the chamber body 110 (ie, the upper wall of the chamber 100). The upper dome 120 has a lower region of the dome, that is, an edge region of the dome is attached to the upper surface of the chamber body 110 to seal the upper region of the reaction space. At this time, the upper dome 120 is effectively attached to the chamber body 110 detachably.

The upper dome 120 is made of a material having excellent thermal conductivity so that the heat of the upper heating means 600 can be effectively transferred to the reaction space. That is, the upper dome 120 may be made of a translucent plate (for example, quartz) capable of transferring radiant heat well to the reaction space. Through this, radiant heat conducted in the reaction space of the chamber 100 toward the upper dome 120 passes through the upper dome 120. In addition, the transmitted radiant heat may be reflected by the upper heating means 600 to pass through the upper dome 120 to be conducted to the reaction space of the chamber 100. Of course, the present invention is not limited thereto, and the upper dome 120 may be manufactured of a ceramic material.

The lower dome 130 becomes a lower cover of the chamber body 110 (ie, the bottom surface of the chamber 100). The lower dome 130 is attached to the lower surface of the chamber body 110 to seal the lower region of the reaction space.

The lower dome 130 is made of a light transmissive plate. Through this, the lower dome 130 is effective to transmit the radiant heat of the heating means 300 located outside the chamber 100 to the reaction space inside the chamber 100. In this embodiment, it is effective to use quartz as the lower dome 130. Thus, the lower dome 130 acts as a window. Of course, only a part of the lower dome 130 may be made of a light transmissive plate, and the remaining areas may be made of an excellent opaque plate of thermal conductivity.

The lower dome 130 has a bottom plate 131 inclined downward as shown in FIG. 1, and an extension tube 132 protruding downward from the center of the bottom plate. The bottom plate 131 is manufactured in the shape of an inverted conical shape whose upper and lower portions are opened.

Thus, the chamber 100 having a reaction space is manufactured through the combination of the chamber body 110, the upper dome 120 and the lower dome 130. The chamber 100 may be provided with a pressure regulator, a pressure measuring device and various devices for checking the inside of the chamber. In addition, a view port may be installed to look inside the reaction space from the outside of the chamber. In addition, exhaust means for exhausting impurities and unreacted materials in the chamber 100 may be further provided.

In the present embodiment, the heating means 300 is disposed below the chamber 100 and heats the inside of the chamber 100.

As shown in FIG. 1, the heating means 300 includes at least one lamp heater 310, a power supply 320 that provides power to the lamp heater 310, and the lamp heater 310 as a chamber. 100) a support portion 330 fixed to the lower region.

The lamp heater 310 uses a lamp heater in the form of a bulb or a circular strip. In the present embodiment, a plurality of lamp heaters 310 are disposed in a band shape in the center area and the edge area. In this case, as shown in FIG. 1, it is effective that the lamp heaters 310 disposed in the center area are disposed below the lamp heaters 310 disposed in the edge area. Accordingly, it is effective that the support portion 330 has a stepped shape. In addition, the power of the power supply 320 is provided to the lamp heater 310 through the support 330. Therefore, it is effective that a socket to which the lamp heater 310 is coupled is provided at one side of the support part 330.

As described above, the lamp heater 310 is disposed below the lower dome 130 made of quartz. Through this, the radiant heat of the lamp heater 310 is transmitted through the lower dome 130 to the reaction space of the chamber 100. In this case, only the region of the lower dome 130 adjacent to the lamp heater 310 may be formed of quartz.

In this embodiment, the upper heating means 600 is arranged in the upper region of the chamber. As such, since the heat source is also provided in the upper region of the chamber 100, the inside of the chamber 100 may be uniformly heated, and heat loss to the upper portion of the chamber 100 may be blocked. In addition, the upper heating means 600 may be positioned on the substrate 10 to provide thermal energy directly to the substrate 10. Therefore, as shown in the present exemplary embodiment, since the temperature change is not suddenly provided to the substrate 10 through the upper heating means 600 having the electric heat source, damage to the substrate due to rapid thermal change may be prevented. .

The upper heating means 600 is manufactured in a cup shape covering the upper dome 120 of the chamber 100. In addition, it is effective that the inner surface has a reflective coating. Through this, it is possible to reduce the loss of radiant heat energy by the heating means 300 disposed below.

In addition, although not shown, the upper heating means 600 may be manufactured in a form in which a plurality of plates are stacked. In this case, a heat insulating material or a cooling passage may be formed between the plate and the plate. In addition, a separate protective plate for protecting the chamber 100 from external impact may be further provided.

As described above, the heating means 300 under the chamber 100 and the upper heating means 600 above the chamber 100 may be maintained at the process temperature inside the chamber 100.

In addition, a substrate mounting part 200 is disposed in the internal space of the chamber 100 to accommodate the substrate 10.

The substrate setter 200 includes a susceptor. At this time, it is effective that the susceptor is manufactured in substantially the same plate shape as the substrate 10. In addition, it is effective to manufacture the substrate setter 200 with a material having excellent thermal conductivity. At least one substrate settling region is provided in the substrate setter 200. As a result, at least one substrate 10 may be placed on the substrate setter 200.

In the present exemplary embodiment, the substrate mounting part 200 is supported in the reaction space of the chamber 100, and the rotating shaft part 400 is rotated.

As shown in FIGS. 2 and 3, the rotating shaft part 400 includes a rotating shaft 410 connected and extended in the lower center area of the substrate mounting part 200, and the substrate mounting part 200 at the top of the rotating shaft 410. A plurality of support shafts 420 extending to the edge region of the substrate supporting the edge region of the substrate setter 200, a shaft 430 to which one end of the rotation shaft 410 is inserted and fixed, and the rotation shaft 410 and the And a close contact member 440 for tightly coupling between the shafts 430, and a jig 450 provided below the shaft 430 to support the rotation shaft 410.

In this embodiment, the inside of the hollow shaft is made of the rotating shaft 410, and the quartz (Quartz) is used as the material of the rotating shaft 410.

This means that when depositing a thin film on a substrate using the substrate processing apparatus of this embodiment, the environment in the chamber must be very clean. This is because a defective thin film is formed on the substrate when there is an impurity on the surface of the substrate. Particularly, in the epi process, a small particle may cause bonding to the entire thin film. Therefore, quartz is used as the material of the rotating shaft 410 to minimize particle generation in the chamber 100. In addition, wiring to be connected to a sensor for measuring process conditions inside the chamber passes inside the rotation shaft 410. Therefore, the rotating shaft 410 is manufactured in the form of a tube having an empty inside.

One end of the rotation shaft 410 is fixed to the lower center area of the substrate setter 200. In addition, a plurality of support shafts 420 extend from the upper region of the rotation shaft 410 to the edge region of the substrate setter 200. As a result, the substrate mounting portion 200 may be positioned on the reaction space of the chamber 100 by the rotation shaft 410 and the support shaft 420. At this time, it is effective that the support shaft 420 is also made of a quartz material.

Here, the rotation axis 410 of the present embodiment is extended to the lower region of the chamber 100 to minimize the influence of the heat. That is, as shown in Figure 1 extends long into the extension tube 132 of the lower dome 130. Therefore, at least a portion of the rotation shaft 410 may be supported by the lower dome 130 of the chamber 100. If the rotating shaft 410 is not supported and fixed in the extension tube 132, the rotating shaft 410 may be rotated by tilting or tilting to one side.

In addition, in order to apply a rotational force to the rotary shaft 410 of the quartz material, the rotary shaft 410 should be connected and fixed to the lower driving means 500. However, there is a problem that it is difficult to connect the rotary shaft 410 made of quartz material with the driving means 500.

However, as mentioned above, in the case of using quartz as a material of the rotating shaft 410, it was difficult to fix the rotating shaft 410 to the lower end of the chamber 100. In other words, quartz is easily broken by an external impact.

In this embodiment, the shaft 430 is inserted between the rotary shaft 410 and the extension tube 132 of the lower dome 130 to fix the rotary shaft 410, and the shaft 430 is fixed to the driving means 500. The rotational force of the driving means 500 may be provided to the rotation shaft 410. In addition, the shaft 430 may be supported by the lower side of the extension pipe 132 to prevent the rotation shaft 410 from tilting and rotating.

At this time, it is preferable to use a sus material as the shaft 430 to minimize particle generation, suppress the influence of heat, and improve the coupling characteristics.

The shaft 430 includes a tubular shaft body 431 having an upper and lower part open, and at least one fixing protrusion 432 for fixing the shaft body 431 to the driving means 500. The rotating shaft 410 is inserted and fixed inside the shaft body 431. In addition, the fixing protrusion 432 is provided in the form of a protrusion extending in an outward direction from the bottom outer surface of the shaft body 431. Of course, the present invention is not limited thereto and may be manufactured in a strip form. In addition, the fixing protrusion 432 is effectively fixed to the driving means 500 by a separate fixing means (for example, bolts, nuts, screws, etc.). To this end, a predetermined groove may be formed in the fixing protrusion 432.

In this embodiment, the contact member 440 is used instead of the conventional O-ring for tightly coupling the shaft 430 and the rotation shaft 410. Preferably, it is effective to use the contact member 440 of the same material as the malleable shaft 430. That is, it is preferable to manufacture the contact | adherence member 440 from a sus material.

1 and 3, the contact member 440 is located at an upper region of the shaft 430. That is, the upper portion of the shaft 430 is in close contact with the rotating shaft 410 and the shaft 430. At this time, as shown in the figure, a jig 450 is provided in the lower region of the shaft 430. At this time, the jig 450 is effectively made of Teflon material. One end of the jig 450 may extend to an area between the shaft 430 and the rotation shaft 410 to tightly fix the shaft 430 and the rotation shaft 410. Through this, the rotation shaft 410 may be prevented from shaking or tilting even by the jig 450.

As shown in FIGS. 2 to 4, the adhesion member 440 may include a tubular adhesion body 441 having an upper and lower portions and a plurality of portions of at least one of the upper and lower portions of the adhesion body 441. And a resilient portion 442 which is bent at least one time.

The close contact body 441 is manufactured in a tubular shape and the rotation shaft 410 penetrates into the close contact body 441. In this embodiment, the use of the sus material as the close body 441 can improve the assembly, prevent the occurrence of contamination, it is possible to suppress the rise in cost.

As shown in FIG. 4, elastic portions 442 are formed in upper and lower regions of the contact body 441, respectively. Of course, the present invention is not limited thereto, and the elastic portion 442 may be formed in the upper or lower region.

The elastic portion 442 cuts the upper and lower regions of the contact body 441 in the longitudinal direction, respectively, to form a plurality of cut regions. And this cut | disconnected area | region is bent and produced. At this time, it is effective that the bending directions of adjacent cutting regions differ from each other. That is, if one cutting region is bent in the center direction of the contact body 441 (that is, in the direction of the rotation axis 410), the adjacent cutting area is bent in the outward direction of the contact body 441 (that is, in the direction of the shaft 430). It is effective. Of course, the present invention is not limited thereto, and it is effective that the bending directions of the cut regions are the same. And it is effective that the number of times of bending of the said cutting area | region is also at least 1 time.

At this time, it is effective that the length of the cut direction in the vertical direction does not exceed 1/4 of the length of the vertical direction of the entire close contact body 441. Preferably, the vertical length of the cut region is effectively 1/10 to 1/4 of the vertical length of the contact body 441. At this time, when the range is smaller than the above range, the bending area becomes small, which causes a problem that the rotation shaft 410 and the shaft 430 cannot be smoothly supported. In addition, when the size is larger than the above range, the size of the area of the contact body 441 that is not cut is reduced, thereby causing a problem that sufficient force is not provided to the elastic portion 442.

As described above, the elastic portion 442 has elasticity by bending the cut region of the contact body 441. Through this, the rotation shaft 410 may be fixed to the shaft 430 by the elastic force of the elastic portion 442. In addition, the elastic part 442 may prevent the inclination of the rotation shaft 410 by pushing both sides with a uniform force in the space between the rotation shaft 410 and the shaft 430. Through this, it is possible to prevent shaking of the substrate setter 200 due to the inclination of the rotation shaft 410.

In addition, in the present embodiment, as described above, the contact member 440 including the elastic portion 442 and the contact body 441 uses the same material as the shaft 430. Through this, the adhesion member 440 may be prevented from being easily deteriorated by heat. Therefore, the service life of the contact member 440 can be increased compared to the existing O-ring. Through this, the reliability of the device can be improved.

In addition, in the conventional O-ring, when used for a long time is deteriorated by heat is attached to the shaft 430 or the rotating shaft 410. Therefore, it was not easy to remove this O-ring during maintenance. As a result, the maintenance cost such as replacing the entire shaft 430 as well as the maintenance time increases. However, as in this embodiment, the elastic member 442 and the contact member 440 made of a sus material can be easily attached and detached, thereby reducing maintenance costs and time required for maintenance.

At this time, the contact member 440 is not limited to the above-described embodiment, various modifications are possible.

As in the modified example of FIG. 5, the contact member 440 may be provided in the entire space between the shaft 430 and the rotation shaft 410.

At this time, the elastic portion 442 is formed in the upper and lower regions of the contact member 440, respectively. Here, the upper region of the shaft 430 and the rotation shaft 410 are tightly fixed by the elastic portion 442 formed in the upper region of the adhesive member 440, and the elastic portion 442 formed in the lower region of the adhesive member 440. The lower region of the shaft 430 and the rotating shaft 410 is fixed by the). In this case, as illustrated in FIG. 5, the bending area of the elastic part 442 may be a plurality. As described above, the rotation shaft 410 may be prevented from shaking by closely fixing the rotation shaft 410 in the upper and lower regions of the shaft 430 with one contact member 440. Here, it is effective that the length of the contact member 440 is equal to or slightly less than the shaft 430 (within about 10% range). In addition, when the close contact member 440 is provided in the entire space between the shaft 430 and the rotation shaft 410, the jig 450 which is located below the shaft 430 may be omitted.

In addition, as shown in the modification of FIG. 6, first and second contact members 440a and 440b may be positioned in upper and lower regions of the shaft 430. Through this, the rotation shaft 410 may be in close contact with the first and second contact members 440a and 440b in the upper and lower regions of the shaft 430, respectively. Also in this case, the jig 450 can be omitted. Here, the first and second close contact members 440a and 440b respectively include the close contact body 441 and the elastic parts 420 respectively formed at upper and lower regions of the close contact body 441. At this time, the pushing force (that is, the elastic force) of the elastic portion 420 formed on the upper and lower portions of the contact body 441 may be opposite to each other. That is, as shown in FIG. 6, the bending portion of the elastic portion 442 formed at the upper portion of the close contact body 441 is in contact with the shaft 430, and the bending portion of the elastic portion 442 formed at the lower portion thereof is the rotating shaft 410. You can also contact.

Some or all of the descriptions of the above-described modifications may be applied to the above-described embodiments, and some or all of the descriptions may be applied to each of the modifications.

In this embodiment, the driving means 500 for applying a rotational force to the rotary shaft 410 coupled as described above is provided. Although not shown, the driving means 500 includes a motor unit generating a rotational force and a central axis extending from the motor unit and connected to the rotation shaft 410. In this case, the aforementioned shaft 430 is connected and fixed to the central axis. Thus, the rotational force of the central axis is transmitted to the shaft 430, the rotation shaft 410 is rotated by the rotation of the shaft 430. Accordingly, the substrate setter 200 connected to the rotation shaft 410 rotates. Although not shown, the driving means 500 includes a housing surrounding the central axis and a magnetic seal sealing the space between the central axis and the housing. This prevents the vacuum inside the chamber from being broken by the driving means 500 provided outside the chamber. Of course, a sealing means (eg, bellows) for sealing may be provided between the lower dome 130 and the housing of the chamber 100.

The present invention is not limited to the above-described embodiments, but may be implemented in various forms. That is, the above embodiments are provided to make the disclosure of the present invention complete and to fully inform those skilled in the art the scope of the present invention, and the scope of the present invention should be understood by the claims of the present application. .

1 is a cross-sectional conceptual view of a substrate processing apparatus according to an embodiment of the present invention.

2 is an exploded conceptual view of a rotating shaft unit according to an embodiment;

3 is a conceptual cross-sectional view of a rotating shaft unit according to an embodiment.

4 is a perspective conceptual view of a rotating shaft unit according to an embodiment;

5 and 6 are conceptual cross-sectional views of a rotating shaft according to a modification of the embodiment.

<Explanation of symbols for major symbols in the drawings>

100: chamber 110: chamber body

120: upper dome 130: lower dome

200: substrate mounting portion 300: heating means

400: rotating shaft portion 410: rotating shaft

430: shaft 440: contact member

450: jig 500: driving means

Claims (10)

A chamber having a reaction space; A substrate setter positioned in the reaction space; And A rotating shaft connected to the lower center region of the substrate settled portion; A shaft to which one end of the rotating shaft is inserted and fixed; And a rotating shaft portion including a tubular adhesion body and an adhesion member provided in an at least one region of the upper and lower portions of the adhesion body to closely couple the rotating shaft and the shaft. The method according to claim 1, The rotating shaft is made of a quartz material, the shaft is made of a material material, the contact member is made of the same material as the shaft substrate processing apparatus. The method according to claim 1, The elastic part is a substrate processing apparatus manufactured by cutting any one of the upper and lower regions of the contact body in the longitudinal direction to form a plurality of cut regions, and bending the cut region at least one or more times. The method according to claim 1, The contact member is located in the upper region of the shaft, The rotating shaft unit includes a jig for closely contacting the shaft and the rotating shaft in the lower region of the shaft. The method according to claim 1, The contact member is formed in the upper region of the contact body and the first elastic portion for tightly coupling between the rotating shaft and the shaft in the upper region of the shaft, And a second elastic part formed in the lower area of the close contact body and tightly coupled between the rotating shaft and the shaft in the lower area of the shaft. The method according to claim 1, The close contact member includes a first close contact member for tightly coupling between the rotary shaft and the shaft in an upper region of the shaft, and a second close contact member for tightly coupled between the rotary shaft and the shaft in a lower region of the shaft. Processing unit. The method according to claim 1, Drive means for applying rotational force to the rotating shaft; And And heating means positioned under the chamber to heat the reaction space. The method according to claim 1, The chamber has a chamber body, an upper dome covering an upper region of the chamber body, and a lower dome covering a lower region of the chamber body, wherein the lower dome comprises an inverted conical bottom plate and a bottom plate. Has an extension tube protruding from the center; And a shaft fixed to the inner side of the extension tube. A substrate mounting portion on which a substrate is placed; And A rotating shaft connected to the lower center region of the substrate settled portion; A shaft to which one end of the rotating shaft is inserted and fixed; And a rotating shaft portion including a tubular adhesion body and an adhesive member provided in an at least one region of the upper and lower portions of the adhesion body to closely couple the rotating shaft to the shaft. The method according to claim 9, The rotating shaft is made of a quartz material, the shaft is made of a sus material, the contact member is made of the same material as the shaft, The elastic part is a substrate supporting apparatus manufactured by cutting any one of the upper and lower regions of the contact body in the longitudinal direction to form a plurality of cutting regions, and bending the cutting region at least one or more times.

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