KR20100134455A - Transistor manufacturing method for improving breakdown characteristics - Google Patents

Abstract

A transistor manufacturing method for improving breakdown characteristics of the present invention includes forming a gate stack on a semiconductor substrate, and having a relatively high first injection energy and a relatively low first dose with respect to the semiconductor substrate exposed by the gate stack. Performing a first ion implantation, and performing a second ion implantation for the source / drain regions on the exposed portion of the semiconductor substrate on which the first ion implantation is performed, with an implantation energy lower than the first implantation energy and a higher dose than the first dose And performing heat treatment on the semiconductor substrate on which the first ion implantation and the second ion implantation are performed.

Description

Method of fabricating transistor for improving breakdown characteristics

The present invention relates to a method for manufacturing a semiconductor device, and more particularly, to a transistor manufacturing method for improving breakdown characteristics.

Recently, as the integration degree of a semiconductor device is rapidly increased, the size of a transistor constituting the semiconductor device is also rapidly decreasing. As the size of the transistor becomes smaller, the width of the gate becomes narrower, and accordingly, the channel length overlapping the gate becomes shorter. If the channel length becomes shorter than a certain level, a short channel effect appears. The short channel effect is known to adversely affect the operation characteristics of the device. For example, when the channel length decreases so that the source region and the drain region are too close, the switching function by the gate may be lost. Therefore, various methods have been applied for suppressing short channel effects while maintaining the density of devices, and continuous research is being conducted.

One of the methods for suppressing the short channel effect is to form source / drain regions into shallow junctions with very shallow depths. However, when the source / drain regions are formed by the shallow junction under the same dose condition, the overall concentration is lowered, resulting in a problem that the on-operation characteristics of the device, in particular, the amount of on-current is reduced. Therefore, in order to form the source / drain regions of the shallow junction, the injection energy must be small while the dose amount must be high.

1 is a graph showing the concentration distribution according to the depth of the source / drain region formed under such a low injection energy and a high dose condition. As shown in FIG. 1, when ion implantation is performed at a low implantation energy and a high dose condition to form a shallow junction to form a source / drain region, the concentration is the highest at the vicinity of the surface, and the depth increases as the depth is increased. Indicating concentration profile 110 is reduced. However, in this case, there is a problem in that the depth decreases as the depth increases, that is, the concentration gradient sharply appears. If the concentration gradient is steep, the intensity of the electric field is increased, resulting in low breakdown voltage between the source region and the drain region, or between the source / drain region and the semiconductor substrate, resulting in poor device reliability.

An object of the present invention is to provide a method of manufacturing a transistor capable of forming a source / drain region of a shallow junction without deterioration of breakdown voltage characteristics.

According to an embodiment of the present invention, a method of manufacturing a transistor includes: forming a gate stack on a semiconductor substrate, and applying a relatively high first injection energy and a relatively low first dose to a semiconductor substrate exposed by the gate stack. Performing ion implantation, and performing second ion implantation for the source / drain region on the exposed portion of the semiconductor substrate on which the first ion implantation is performed, with an implantation energy lower than the first implantation energy and a dose higher than the first dose And performing heat treatment on the semiconductor substrate on which the first ion implantation and the second ion implantation are performed.

In one example, the first ion implantation and the second ion implantation may be performed using a beam line implantation method.

The first ion implantation by the beam line implantation method may be performed by implanting the dopant B under an implantation energy of 15 KeV to 30 KeV and a dose condition of 1.0e13 to 1.0e14 atoms / cm 2.

The first ion implantation by the beam line implantation method may be performed by implanting dopant BF2 under implantation energy of 65 KeV to 130 KeV and a dose condition of 1.0e12 to 1.0e13 atoms / cm 2.

The first ion implantation by the beam line implantation method may be performed by implanting the dopant P under an implantation energy of 30 KeV to 50 KeV and a dose condition of 1.0e13 to 1.0e14 atoms / cm 2.

The first ion implantation by the beam line implantation method may be performed by implanting the dopant As under an implantation energy of 70 KeV to 90 KeV and a dose condition of 1.0e12 to 1.0e13 atoms / cm 2.

The second ion implantation by the beam line implantation method may be performed by implanting the dopant BF under an implantation energy of 5 KeV to 10 KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2.

The second ion implantation by the beam line implantation method may be performed by implanting the dopant BF2 under the implantation energy of 7KeV to 20KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2.

The second ion implantation by the beam line implantation method may be performed by implanting the dopant P under an implantation energy of 3 KeV to 10 KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2.

The second ion implantation by the beam line implantation method may be performed by implanting dopant As under implantation energy of 5KeV to 20KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2.

In one example, the second ion implantation may be performed using a plasma doping method or a cluster ion beam implantation method.

The second ion implantation using the plasma doping method may be performed by implanting the dopant B2H6 under an implantation energy of 3 KeV to 10 KeV and a dose condition of 1.0e16 to 1.0e17 atoms / cm 2.

The second ion implantation using the plasma doping method may be performed by implanting the dopant BF3 under a dosing condition of 5KeV to 15KeV and a dose condition of 1.0e16 to 1.0e17 atoms / cm 2.

The second ion implantation by the cluster ion beam implantation method may be performed by implanting dopant B18H22 under a dosing condition of 20KeV to 50KeV and 1.0e15 to 1.0e16 atoms / cm 2.

In one example, the heat treatment may be performed for 15 seconds to 30 seconds at a temperature of 900 to 1100 ℃ by a rapid heat treatment method using a lamp.

In one example, the heat treatment may be performed for 1 second to 30 seconds at a temperature of 1000 to 1150 ℃ by a rapid heat treatment method using a heat block.

In another embodiment of the present invention, a transistor manufacturing method includes forming a first gate stack and a second gate stack in a first region and a second region of a semiconductor substrate, and exposing a first mask layer pattern. And implanting p-type impurity ions at a relatively high first implantation energy and a relatively low first dose to the semiconductor substrate of the first region exposed by the first mask film pattern and the first gate stack. Performing a first ion implantation, and performing a second ion implantation for the p-type source / drain region on the exposed portion of the semiconductor substrate on which the first ion implantation is performed, the implantation energy lower than the first implantation energy and the higher than the first dose Implanting p-type impurity ions into the dose, removing the first mask pattern, forming a second mask pattern exposing the second region, and forming a second mask layer Performing a third ion implantation for implanting n-type impurity ions at a relatively high second implantation energy and a relatively low second dose to the semiconductor substrate in the second region exposed by the turn and the second gate stack; The fourth ion implantation for the n-type source / drain region is performed by implanting n-type impurity ions with an implantation energy lower than the second implantation energy and a dose higher than the second dose to the exposed portion of the semiconductor substrate on which the third ion implantation is performed. And removing the second mask layer pattern, and performing heat treatment on the semiconductor substrate on which the first to fourth ion implantations have been performed.

In one example, the first to fourth ion implantation may be performed using a beam line implantation method.

The first ion implantation by the beam line implantation method may be performed by implanting the dopant B under an implantation energy of 15 KeV to 30 KeV and a dose condition of 1.0e13 to 1.0e14 atoms / cm 2.

The first ion implantation by the beam line implantation method may be performed by implanting the dopant BF2 under a implantation energy of 65 KeV to 130 KeV and a dose condition of 1.0e12 to 1.0e13 atoms / cm 2.

The second ion implantation by the beam line implantation method may be performed by implanting the dopant BF under an implantation energy of 5 KeV to 10 KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2.

The second ion implantation by the beam line implantation method may be performed by implanting the dopant BF2 under the implantation energy of 7KeV to 20KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2.

The third ion implantation by the beam line implantation method may be performed by implanting the dopant P under an implantation energy of 30 KeV to 50 KeV and a dose condition of 1.0e13 to 1.0e14 atoms / cm 2.

The third ion implantation by the beam line implantation method may be performed by implanting the dopant As under an implantation energy of 70 KeV to 90 KeV and a dose condition of 1.0e12 to 1.0e13 atoms / cm 2.

The fourth ion implantation by the beam line implantation method may be performed by implanting the dopant P under an implantation energy of 3 KeV to 10 KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2.

The fourth ion implantation by the beam line implantation method may be performed by implanting dopant As under implantation energy of 5 KeV to 20 KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2.

In one example, the second ion implantation may be performed using a plasma doping method or a cluster ion beam implantation method.

The second ion implantation using the plasma doping method may be performed by implanting the dopant B2H6 under an implantation energy of 3 KeV to 10 KeV and a dose condition of 1.0e16 to 1.0e17 atoms / cm 2.

The second ion implantation using the plasma doping method may be performed by implanting the dopant BF3 under a dosing condition of 5KeV to 15KeV and a dose condition of 1.0e16 to 1.0e17 atoms / cm 2.

The second ion implantation by the cluster ion beam implantation method may be performed by implanting the dopant B18H22 under the implantation energy of 20 KeV to 50 KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2.

In one example, the heat treatment may be performed for 15 seconds to 30 seconds at a temperature of 900 to 1100 ℃ by a rapid heat treatment method using a lamp.

In one example, the heat treatment may be performed for 1 second to 30 seconds at a temperature of 1000 to 1150 ℃ by a rapid heat treatment method using a heat block.

According to the present invention, the concentration gradient can be smoothed by performing ion implantation with relatively high implantation energy and low dose before ion implantation for forming source / drain regions, thereby degrading breakdown characteristics due to rapid concentration gradient. The advantage is that it can be suppressed.

2 to 6 are cross-sectional views illustrating a method of manufacturing a transistor according to the present invention.

Referring to FIG. 2, a first gate stack 310 and a second gate stack 410 are formed on a semiconductor substrate 200 such as a silicon substrate. The semiconductor substrate 200 has a first region 300 and a second region 400. The first region 300 is a region where the p-type transistor is formed, and the second region 400 is a region where the n-type transistor is formed. The first gate stack 310 is formed on the semiconductor substrate 200 in the first region 300, and the second gate stack 410 is formed on the semiconductor substrate 200 in the second region 400. The first gate stack 310 has a structure in which the first gate insulating layer 311, the first gate conductive layer 312, and the first gate capping layer 313 are sequentially stacked. The second gate stack 410 has a structure in which the second gate insulating film 411, the second gate conductive film 412, and the second gate capping film 413 are sequentially stacked.

Next, a first gate spacer layer 320 and a second gate spacer layer 420 are formed on sidewalls of the first gate stack 310 and sidewalls of the second gate stack 410, respectively. Next, the first mask layer pattern 210 is formed to cover the second region 400 and expose the surface of the semiconductor substrate 200 on which the p-type source / drain region is to be formed. The first mask layer pattern 210 may be formed of a photoresist layer.

Next, as indicated by arrows in the drawing, the p-type impurity ions are formed on the semiconductor substrate 200 exposed by the first mask layer pattern 210, the first gate stack 310, and the first gate spacer layer 320. A first ion implantation to inject 331 is performed. The first ion implantation is intended to mitigate the concentration gradient of the p-type source / drain region. The first ion implantation energy is higher than the implantation energy during ion implantation to form the p-type source / drain region, and the p-type source / drain region is formed. It is carried out under a first dose condition lower than the concentration at the time of ion implantation. The first ion implantation extends the tail portion, that is, the tail portion of the lower end portion, in the concentration profile, thereby alleviating the applied electric field, thereby improving breakdown characteristics. Furthermore, since the semiconductor substrate 200 can be maintained in a crystallized state by performing at a low dose condition, the tail portion can be extended to a desired depth.

The first ion implantation may be performed using a conventional ion implantation apparatus, that is, using a beam line implantation method. In this case, boron (B) is used as the p-type impurity ion 331, and in this case, B or BF2 may be used as a source for forming the beam line. When using B as a source for forming a beam line, the first ion implantation is performed under conditions such that the concentration gradient is gentle enough that the electric field is reduced to prevent deterioration of the breakdown characteristics, such as an injection energy of 15 KeV to 30 KeV and 1.0e13. To a dose condition of 1.0e14 atoms / cm 2. When BF2 is used as a source for forming the beam line, the first ion implantation is performed under an implantation energy of 65 KeV to 130 KeV and a dose condition of 1.0e12 to 1.0e13 atoms / cm 2.

Referring to FIG. 3, after the first ion implantation is performed, as shown by an arrow in the figure, a second ion implantation for forming a p-type source / drain region is performed. The second ion implantation is performed at a lower implantation energy than the first implantation energy and a higher dose condition than the first dose. As the second ion implantation is performed at a relatively low implantation energy and a relatively high dose condition, the peak concentration and the concentration at the tail portion are not affected by the second ion implantation. Is maintained. The second ion implantation may be performed using a beam line implantation method, a plasma doping method, or a cluster ion beam implantation method. As the p-type impurity ion 331 implanted by the second ion implantation, boron B is used.

When using the beam line injection method, BF or BF2 may be used as a source for forming the beam line. When using BF as a source for forming a beam line, the second ion implantation is performed by implanting dopant BF under an implantation energy of 5KeV to 10KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2. When BF2 is used as a source for forming the beam line, the second ion implantation is performed under an implantation energy of 7KeV to 20KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2. When using the plasma doping method, B2H6 or BF3 may be used as a source for plasma formation. When B2H6 is used as a source for plasma formation, the second ion implantation is performed under an implantation energy of 3KeV to 10KeV and a dose condition of 1.0e16 to 1.0e17 atoms / cm 2. When BF3 is used as a source for plasma formation, the second ion implantation is performed at an implantation energy of 5 KeV to 15 KeV and a dose condition of 1.0e16 to 1.0e17 atoms / cm 2. In the case of using the cluster ion beam implantation method, B18H22 is used as a source for forming the cluster ion beam, in which case the second ion implantation is performed under an implantation energy of 20KeV to 50KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2. .

Referring to FIG. 4, after implanting the p-type impurity ion 331 into the source / drain region of the first region 300 by performing the first and second ion implantation, the first mask layer pattern 210 (see FIG. 3). ). The second mask layer pattern 220 is formed to cover the first region 300 and expose the surface of the semiconductor substrate 200 on which the n-type source / drain region is to be formed. The second mask layer pattern 220 may be formed as a photoresist layer. Next, as indicated by arrows in the drawing, n-type impurity ions are formed on the semiconductor substrate 200 exposed by the second mask layer pattern 220, the second gate stack 410, and the second gate spacer layer 420. A third ion implantation to inject 431 is performed. The third ion implantation is intended to mitigate the concentration gradient of the n-type source / drain region, and the second implantation energy higher than the implantation energy at the time of ion implantation for the formation of the n-type source / drain region and the formation of the n-type source / drain region The second dose is lower than the concentration at the time of ion implantation. The third ion implantation extends the tail portion, that is, the tail portion of the lower end portion, in the concentration profile, thereby alleviating the applied electric field, thereby improving breakdown characteristics. Furthermore, since the semiconductor substrate 200 can be maintained in a crystallized state by performing at a low dose condition, the tail portion can be extended to a desired depth.

The third ion implantation may be performed using a beam line implantation method. In this case, as the n-type impurity ion 431, phosphorus (P) or asic (As) may be used. When phosphorus P is used as the n-type impurity ion 431, the third ion implantation is performed under an implantation energy of 30 KeV to 50 KeV and a dose condition of 1.0e13 to 1.0e14 atoms / cm 2. In the case of using Asonic (As) as the n-type impurity ion 431, the third ion implantation is performed under a implantation energy of 70 KeV to 90 KeV and a dose condition of 1.0e12 to 1.0e13 atoms / cm 2.

Referring to FIG. 5, after the third ion implantation is performed, as shown by the arrow in FIG. 5, the fourth ion implantation for forming the n-type source / drain region is performed. The fourth ion implantation is performed by using a beam line implantation method with a implantation energy lower than the second implantation energy during the third ion implantation and a dose condition higher than the second dose. As such, as the fourth ion implantation is performed at a relatively low implantation energy and a relatively high dose condition, the peak concentration and the concentration at the tail portion are not affected by the fourth ion implantation. Is maintained. The n-type impurity implanted by the fourth ion implantation may use a temperature phosphor (P) or an asnic (As). In the case of using the phosphorus (P), the fourth ion implantation is performed under an implantation energy of 3 KeV to 10 KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2. When using Asonic (As), the fourth ion implantation is performed under the implantation energy of 5KeV to 20KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2.

Referring to FIG. 6, after implanting n-type impurity ions (431 in FIG. 5) into the source / drain regions of the second region 400 by performing the third and fourth ion implantation, the second mask layer pattern (FIG. 5, 220) is removed. Next, heat treatment is performed to activate the implanted p-type impurity ion (331 in FIG. 5) and n-type impurity ion (431 in FIG. 5). In one example, the heat treatment is performed for 15 seconds to 30 seconds at a temperature of 900 to 1100 ℃ by Rapid Thermal Processing (RTP) method using a lamp (lamp). In another example, the heat treatment is performed for 1 second to 30 seconds at a temperature of 1000 to 1150 ° C. by a rapid heat treatment (RTP) method using a heat block. By the heat treatment, the p-type source / drain region 340 is formed in the first region 300, and the n-type source / drain region 440 is formed in the second region 400.

Figure 7 is a graph shown for comparing the concentration profile of the source / drain region formed in accordance with the present invention compared with the conventional case.

As shown in FIG. 7, when ion implantation for reducing concentration gradient, ie, first ion implantation or third ion implantation, is performed (620) according to the present invention, ions for forming source / drain regions as in the conventional case. It was found that the concentration gradient according to the depth was alleviated as compared with the case where implantation, ie, only the second ion implantation or the fourth ion implantation was performed (610), and thus, in the present invention, degradation of the breakdown characteristic of the device can be prevented. Can be.

1 is a graph showing a concentration profile of a source / drain region formed by a conventional transistor manufacturing method.

2 to 6 are cross-sectional views illustrating a method of manufacturing a transistor according to the present invention.

7 is a graph showing the concentration profile of the source / drain regions formed by the transistor manufacturing method according to the present invention in comparison with the conventional case.

Claims (32)

Forming a gate stack on the semiconductor substrate; Performing first ion implantation with a relatively high first implantation energy and a relatively low first dose on the semiconductor substrate exposed by the gate stack; Performing a second ion implantation for a source / drain region on an exposed portion of the semiconductor substrate on which the first ion implantation has been performed with an implantation energy lower than the first implantation energy and a dose higher than the first dose; And And heat-treating the semiconductor substrate on which the first ion implantation and the second ion implantation are performed. The method of claim 1, The method of claim 1, wherein the first ion implantation and the second ion implantation are performed using a beam line implantation method. The method of claim 2, The first ion implantation by the beam line implantation method is performed by implanting the dopant B under the implantation energy of 15KeV to 30KeV and the dose conditions of 1.0e13 to 1.0e14 atoms / cm 2. The method of claim 2, The first ion implantation by the beam line implantation method is performed by implanting the dopant BF2 under the implantation energy of 65KeV to 130KeV and the dose conditions of 1.0e12 to 1.0e13 atoms / cm 2. The method of claim 2, The first ion implantation by the beam line implantation method is performed by implanting the dopant P under implantation energy of 30 KeV to 50 KeV and a dose condition of 1.0e13 to 1.0e14 atoms / cm 2. The method of claim 2, The first ion implantation by the beam line implantation method is performed by implanting the dopant As under the implantation energy of 70KeV to 90KeV and the dose conditions of 1.0e12 to 1.0e13 atoms / cm 2. The method of claim 2, The second ion implantation by the beam line implantation method is performed by implanting the dopant BF under the implantation energy of 5KeV to 10KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 2, The second ion implantation by the beam line implantation method is performed by implanting the dopant BF2 under the implantation energy of 7KeV to 20KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 2, The second ion implantation by the beam line implantation method is performed by implanting the dopant P under the implantation energy of 3KeV to 10KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 2, The second ion implantation by the beam line implantation method is performed by implanting the dopant As under the implantation energy of 5KeV to 20KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 1, The second ion implantation is performed using a plasma doping method or a cluster ion beam implantation method. The method of claim 11, The second ion implantation using the plasma doping method is performed by implanting the dopant B2H6 under the implantation energy of 3KeV to 10KeV and the dose conditions of 1.0e16 to 1.0e17 atoms / cm 2. The method of claim 11, The second ion implantation using the plasma doping method is performed by implanting the dopant BF3 at a dose condition of 5KeV to 15KeV and a dose condition of 1.0e16 to 1.0e17 atoms / cm 2. The method of claim 11, The second ion implantation by the cluster ion beam implantation method is performed by implanting the dopant B18H22 under the implantation energy of 20KeV to 50KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 1, The heat treatment is a rapid heat treatment method using a lamp for a transistor manufacturing method performed for 15 seconds to 30 seconds at a temperature of 900 to 1100 ℃. The method of claim 1, The heat treatment is a rapid heat treatment method using a heat block transistor manufacturing method performed for 1 to 30 seconds at a temperature of 1000 to 1150 ℃. Forming a first gate stack and a second gate stack in the first region and the second region of the semiconductor substrate; Forming a first mask layer pattern exposing the first region; The first ion implantation implants p-type impurity ions with a relatively high first implantation energy and a relatively low first dose to the semiconductor substrate of the first region exposed by the first mask layer pattern and the first gate stack. Performing; The second ion implantation for the p-type source / drain region is applied to the exposed portion of the semiconductor substrate on which the first ion implantation is performed, and the p-type impurity ion is implanted at a dose lower than the first implantation energy and a dose higher than the first dose. Performing by injection; Removing the first mask layer pattern; Forming a second mask layer pattern exposing the second region; A third ion implantation implanting n-type impurity ions with a relatively high second implantation energy and a relatively low second dose to the semiconductor substrate of the second region exposed by the second mask film pattern and the second gate stack Performing; The fourth ion implantation for the n-type source / drain region is applied to the exposed portion of the semiconductor substrate on which the third ion implantation is performed, and the n-type impurity ion is implanted at a dose higher than the second implantation energy and a dose higher than the second dose. Performing by injection; Removing the second mask layer pattern; And And heat-treating the semiconductor substrate on which the first to fourth ion implantation is performed. The method of claim 17, The first to fourth ion implantation is performed using a beam line implantation method. The method of claim 18, The first ion implantation by the beam line implantation method is performed by implanting the dopant B under the implantation energy of 15KeV to 30KeV and the dose conditions of 1.0e13 to 1.0e14 atoms / cm 2. The method of claim 18, The first ion implantation by the beam line implantation method is performed by implanting the dopant BF2 under the implantation energy of 65KeV to 130KeV and the dose conditions of 1.0e12 to 1.0e13 atoms / cm 2. The method of claim 18, The second ion implantation by the beam line implantation method is performed by implanting the dopant BF under the implantation energy of 5KeV to 10KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 18, The second ion implantation by the beam line implantation method is performed by implanting the dopant BF2 under the implantation energy of 7KeV to 20KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 18, The third ion implantation by the beam line implantation method is performed by implanting the dopant P under implantation energy of 30 KeV to 50 KeV and a dose condition of 1.0e13 to 1.0e14 atoms / cm 2. The method of claim 18, The third ion implantation by the beam line implantation method is performed by implanting the dopant As under the implantation energy of 70KeV to 90KeV and the dose conditions of 1.0e12 to 1.0e13 atoms / cm 2. The method of claim 18, The fourth ion implantation by the beam line implantation method is performed by implanting the dopant P under implantation energy of 3 KeV to 10 KeV and a dose condition of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 18, The fourth ion implantation by the beam line implantation method is performed by implanting the dopant As under the implantation energy of 5KeV to 20KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 17, The second ion implantation is performed using a plasma doping method or a cluster ion beam implantation method. The method of claim 27, The second ion implantation using the plasma doping method is performed by implanting the dopant B2H6 under the implantation energy of 3KeV to 10KeV and the dose conditions of 1.0e16 to 1.0e17 atoms / cm 2. The method of claim 27, The second ion implantation using the plasma doping method is performed by implanting the dopant BF3 at a dose condition of 5KeV to 15KeV and a dose condition of 1.0e16 to 1.0e17 atoms / cm 2. The method of claim 27, The second ion implantation by the cluster ion beam implantation method is performed by implanting the dopant B18H22 under the implantation energy of 20KeV to 50KeV and the dose conditions of 1.0e15 to 1.0e16 atoms / cm 2. The method of claim 17, The heat treatment is a rapid heat treatment method using a lamp for a transistor manufacturing method performed for 15 seconds to 30 seconds at a temperature of 900 to 1100 ℃. The method of claim 17, The heat treatment is a rapid heat treatment method using a heat block transistor manufacturing method performed for 1 to 30 seconds at a temperature of 1000 to 1150 ℃.

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