KR20100059224A - Apparatus of supplying chemical liquid - Google Patents

Apparatus of supplying chemical liquid Download PDF

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Publication number
KR20100059224A
KR20100059224A KR1020080117918A KR20080117918A KR20100059224A KR 20100059224 A KR20100059224 A KR 20100059224A KR 1020080117918 A KR1020080117918 A KR 1020080117918A KR 20080117918 A KR20080117918 A KR 20080117918A KR 20100059224 A KR20100059224 A KR 20100059224A
Authority
KR
South Korea
Prior art keywords
nozzle
chemical liquid
supply line
substrate
swing
Prior art date
Application number
KR1020080117918A
Other languages
Korean (ko)
Inventor
임주만
Original Assignee
세메스 주식회사
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 세메스 주식회사 filed Critical 세메스 주식회사
Priority to KR1020080117918A priority Critical patent/KR20100059224A/en
Publication of KR20100059224A publication Critical patent/KR20100059224A/en

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/005—Nozzles or other outlets specially adapted for discharging one or more gases
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C—APPARATUS FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05C11/00—Component parts, details or accessories not specifically provided for in groups B05C1/00 - B05C9/00
    • B05C11/10—Storage, supply or control of liquid or other fluent material; Recovery of excess liquid or other fluent material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/6715—Apparatus for applying a liquid, a resin, an ink or the like

Abstract

PURPOSE: An apparatus for supplying a chemical solution is provided to spray the chemical solution with a large pitching angle by forming a spray nozzle with a double linkage structure. CONSTITUTION: A chemical solution for processing a substrate flows through a supply line(110). A spray nozzle(120) sprays the chemical solution to the substrate. A driving part(130) pitches supplying lines. The spray nozzle includes a first nozzle(122) and a second nozzle(124). The first nozzle pitches to a second direction by the pitching of the supplying lines. The second nozzle is pitched to spray the chemical solution toward the substrate. The pitching angel of the second nozzle is larger than that of the first nozzle.

Description

Apparatus of supplying chemical liquid

The present invention relates to a chemical liquid supply apparatus, and more particularly, to a rocking type chemical liquid supply apparatus capable of injecting the chemical liquid in a wider range.

In general, a flat panel display is widely used in an information processing device to display processed information. Examples of the flat panel display include a liquid crystal display (LCD), a plasma display (PDP), and an organic light emitting diode (OLED). Can be. The flat panel display is manufactured by performing various unit processes for forming circuit patterns on the glass substrate having a large area.

The unit processes are performed through a substrate processing apparatus, and among the substrate processing apparatuses, the wet processing apparatus processes a substrate using chemical liquids including various kinds of chemical and organic solutions and deionized water on the substrate. For example, a wet cleaning apparatus used in the field of flat panel display manufacturing supplies a chemical liquid such as a cleaning liquid or an etching liquid onto a glass substrate to remove foreign substances remaining on the surface of the substrate.

Such a wet processing apparatus includes a chemical liquid supply device for supplying a chemical liquid to a substrate. The chemical liquid supply device uses a supply line through which the chemical liquid flows, and injection nozzles which are formed to face the substrate from the supply line and spray the chemical liquid. In particular, in order to improve the treatment efficiency when injecting the chemical liquid, a method of injecting the chemical liquid while the injection nozzle is swung is used.

However, the conventional method of spraying the spray nozzle while rocking has a disadvantage in that the angle at which the spray nozzle swings is rather small. Therefore, in order to supply the chemical liquid to the substrate of the enlargement trend, there is a problem in that a plurality of supply lines are configured so that the injection range of the chemical liquid corresponds to the enlarged substrate.

Therefore, the problem to be solved by the embodiment of the present invention is to provide a chemical liquid supply device that can spray the chemical liquid while swinging at a larger angle.

In order to achieve the above object of the present invention, the chemical liquid supply apparatus according to the present invention includes a supply line, an injection nozzle, and a driving unit. The supply line extends in the first direction, and the chemical liquid used for processing the substrate flows. The spray nozzle is connected to the supply line and extends toward the substrate, and sprays the chemical liquid onto the substrate. The drive oscillates the advanced line to oscillate the injection nozzle in a second direction perpendicular to the first direction. In particular, the injection nozzle is fixed to the supply line, and is slidably connected to the first nozzle and the front end of the first nozzle, which swing in the second direction by the swing of the supply line, and the swing of the first nozzle. It characterized in that it comprises a second nozzle for injecting the chemical liquid to the substrate while swinging at a larger angle than the first nozzle due to inertia.

Here, according to one embodiment is provided at the front end of the second nozzle, to form a center of gravity at the front end of the second nozzle to induce a greater inertia formed in the second nozzle by the shaking of the first nozzle It may include a rocking weight.

The chemical liquid supply apparatus according to the present invention configured as described above may spray the chemical liquid while the injection nozzle has a two-stage link structure and swings at an angle greater than the swing range of the supply flow path. Therefore, the number of supply lines can be reduced in the configuration for spraying the chemical liquid in the same area as in the related art, thereby simplifying the configuration and reducing the manufacturing cost.

Hereinafter, with reference to the accompanying drawings will be described in detail the chemical liquid supply apparatus according to an embodiment of the present invention.

As the inventive concept allows for various changes and numerous embodiments, particular embodiments will be illustrated in the drawings and described in detail in the text. However, this is not intended to limit the present invention to the specific disclosed form, it should be understood to include all modifications, equivalents, and substitutes included in the spirit and scope of the present invention. Like reference numerals are used for like elements in describing each drawing. In the accompanying drawings, the dimensions of the structures are enlarged to illustrate the invention, and are actually shown in a smaller scale than the actual dimensions in order to explain the schematic configuration. The terms first, second, etc. may be used to describe various components, but the components should not be limited by the terms. The terms are used only for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be referred to as the second component, and similarly, the second component may also be referred to as the first component.

The terminology used herein is for the purpose of describing particular example embodiments only and is not intended to be limiting of the present invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this application, the terms "comprise" or "have" are intended to indicate that there is a feature, number, step, action, component, part, or combination thereof described on the specification, and one or more other features. It is to be understood that the present invention does not exclude the possibility of the presence or the addition of numbers, steps, operations, components, parts, or combinations thereof.

On the other hand, unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as commonly understood by one of ordinary skill in the art. Terms such as those defined in the commonly used dictionaries should be construed as having meanings consistent with the meanings in the context of the related art and shall not be construed in ideal or excessively formal meanings unless expressly defined in this application. Do not.

Example

1 is a view schematically showing a chemical liquid supply apparatus according to an embodiment of the present invention, Figure 2 is a view for explaining the rocking operation of the injection nozzle of Figure 1, Figure 3 is applied to the chemical liquid supply apparatus of FIG. It is a figure which shows a substrate processing apparatus.

1, 2 and 3, the chemical liquid supply apparatus 100 according to an embodiment of the present invention is a chemical liquid to the substrate (G) in the processing process for a flat substrate (G), such as a glass substrate Can be used to spray.

The display device may be a substrate G for manufacturing a display device of the substrate G. Examples of the display device may include a liquid crystal display (LCD), a plasma display device (PDP), and an organic light emitting diode (OLED). have. In addition, examples of the plate type treatment process include an etching process for removing a film or impurities on the substrate G, a cleaning process for removing impurities on the substrate G, and a rinsing treatment of the substrate G after etching or cleaning. Rinse process. That is, the chemical liquid may be various kinds of liquid treatment materials for treating the substrate G, such as an etching liquid, a cleaning liquid, a rinse liquid, and the like.

The chemical liquid supply apparatus 100 is disposed and used in a chamber 20 that provides a processing space in the substrate processing apparatus 10 (see FIG. 3) for performing a processing process on the substrate G. In particular, the chemical liquid supply apparatus 100 is used to inject the chemical liquid to the substrate (G) to be horizontally transferred. Therefore, the feed shafts 60 having a plurality of rollers 62 are provided in the substrate processing apparatus 10 as a means for horizontally conveying the substrate G. The transfer shaft 60 may be disposed to extend in a direction perpendicular to the direction for transferring the substrate G, and a plurality of transfer shafts 60 may be disposed along the transfer direction in parallel to each other.

The chemical liquid supply device 100 is a supply line 110 through which the chemical liquid flows, the injection nozzle 120 connected to the supply line 110 to inject the chemical liquid to the substrate (G) and rocking the injection nozzle 120 It may include a driver 130 for.

The supply line 110 extends in the first direction in the chamber 20. A flow path is formed in the supply line 110 so that the chemical liquid for processing the substrate G flows. The supply line 110 may be arranged in plurality in parallel to each other. The supply line 110 flows the chemical liquid supplied from the chemical liquid supply source 30 disposed outside, and receives the chemical liquid from the chemical liquid supply source 30 through the connection line 40 and the coupler 50. The connection line 40 extends in a direction perpendicular to the supply line 110 inside the chamber 102. That is, the connection line 40 extends in a second direction perpendicular to the first direction and extends outside the chamber 20 to be connected to the chemical liquid supply source 30. The coupler 50 serves to connect the connection line 40 and the supply line 108 disposed perpendicular to each other. In particular, the coupler 50 allows the supply line 110 to be connected to the connection line 40 while swinging.

The supply line 110 is oscillated by the driver 130. Specifically, the supply line 110 swings at a predetermined angle in a second direction perpendicular to the longitudinal direction (first direction). The fluctuation of the supply line 110 may be understood through the description of the driver 130 to be described later.

The spray nozzle 120 communicates with the supply line 110 and extends toward the substrate G. The spray nozzle 120 sprays the chemical liquid flowing through the supply line 110 toward the substrate G. The spray nozzle 120 is sprayed while spreading the chemical at a predetermined angle. In addition, the injection nozzle 120 injects the chemical liquid while swinging along the supply line 110. That is, since the supply line 110 swings in the second direction, the injection nozzle 120 also swings in the second direction.

The spray nozzle 120 has a two-stage link structure for extending the swing angle. That is, the injection nozzle 120 includes a first nozzle 122 and a second nozzle 124 having a link structure. The first nozzle 122 extends from the supply line 110 and is fixed to the supply line 110. The second nozzle 124 is swingably connected to the front end of the first nozzle 122 in the second direction. In this case, since the first nozzle 122 and the second nozzle 124 are configured for chemical injection, it will be apparent that the first nozzle 122 and the second nozzle 124 communicate with each other. The configuration for connecting the first nozzle 122 and the second nozzle 124 in a swingable manner is possible in various ways. Since the first nozzle 122 is fixed to the supply line 110, the first nozzle 122 swings at the same angle as the swing angle of the supply line 110. As the second nozzle 124 is swingably connected to the distal end of the first nozzle 122 in a second direction, the second nozzle 124 oscillates with inertia due to the oscillation of the first nozzle 122, and is more than the first nozzle 122. It will swing at a great angle. As a result, the rocking angle at which the chemical liquid is injected is an angle obtained by adding the rocking angle of the second nozzle 124 to the rocking angle of the first nozzle 122, and thus, at an angle greater than the angle caused by the rocking of the supply line 110. You can swing.

On the other hand, since the second nozzle 124 swings due to the inertia caused by the shaking of the first nozzle 122, the second nozzle 124 increases the inertia applied to the second nozzle 124 for easier swinging. You have to. Thus, in the present embodiment, the swing weight 126 is provided at the tip of the second nozzle 124. The swing weight 126 forms a center of gravity at the tip of the second nozzle 124 to increase the tubular shape formed in the second nozzle 124 by the swing of the first nozzle 122. Therefore, the second nozzle 124 may be more easily swinged by the swinging weight 126.

As such, as the injection nozzle 120 has a two-stage link structure, the injection nozzle 120 has a swing angle greater than the swing angle of the supply line 110. At this time, it will be possible to increase the final swing angle by adjusting the swingable angle of the second nozzle 124. However, if the swing angle of the second nozzle 124 is too large, it may interfere with the swing of the second nozzle 124 at a uniform speed. Furthermore, when the rocking speed of the second nozzle 124 is not uniform, the uniformity of the amount of the chemical liquid supplied to the substrate G may be lowered, which may cause a defect, which is not preferable.

The driving unit 130 swings the supply line 110 in the second direction, thereby ultimately swinging the injection nozzle 120 in the second direction. The driving unit 130 may be disposed corresponding to the center of the supply line 110. The driver 130 may swing the supply line 110 in a non-contact manner with the supply line 110.

For example, the driving unit 130 may include a first magnetic body 132, a second magnetic body 134, a driving force generating unit 136, and a power switching unit 138.

The first magnetic body 132 is disposed outside the chamber 20 to be movable in the second direction. One or more first magnetic bodies 132 may be disposed. The second magnetic body 134 is disposed to face the first magnetic body 132 in the chamber 20. The first magnetic body 134 of the second magnetic body 134 has a different polarity, thereby mutual attraction force acts to move along the movement of the first magnetic body 132. One or more second magnetic bodies 134 may be disposed. Although not shown, guide rails may be provided to guide the first magnetic body 132 and the second magnetic body 134 to move in the second direction.

The driving force generator 136 is disposed outside the chamber 20 and reciprocates the first magnetic body 132 in a second direction. The driving force generator 136 may include a motor 136a, a rotating plate 136b, a first driving bar 136c, and a connecting bar 136d. The motor 136a generates a rotational force, and the rotating plate 136b rotates by the rotational force of the motor 136a. At this time, the motor 136a and the rotating plate 136b have a rotation axis in the first direction. The first driving bar 136c extends in the second direction and is fastened to the first magnetic body 132. One end of the connection bar 136d is connected to one end of the first driving bar 136c through the first connection pin 136e, and the other end is connected to the rotating plate 136b through the first connection pin 136e. In particular, the connecting bar 136d is eccentrically connected with respect to the center of the rotating plate 136b, whereby the first driving bar 136c reciprocates in the second direction as the rotating plate 136b rotates. As a result, the first magnetic body 132 reciprocates in the second direction.

The power conversion unit 138 is mechanically connected to the second magnetic material 134 and the supply line 110. The power conversion unit 138 is disposed in the chamber 20, and when the second magnetic body 134 reciprocates in the second direction along the first magnetic body 132, the power line 138 may provide a reciprocating motion of the second magnetic body 134. Switch to rotational movement for rotating 110. The power conversion unit 138 may include a second driving bar 138a and a driving plate 138b. The second driving bar 138a extends in a second direction and is fastened to the second magnetic body 134. Therefore, as the second magnetic body 134 reciprocates in the second direction, the second driving bar 138a also reciprocates in the second direction. The driving plate 138b is fixed to the supply line 110 and has a structure in which the supply line 110 passes through the center thereof. Therefore, as the driving plate 138b rotates, the supply line 110 also rotates together. In addition, the driving plate 138b is connected to the driving bar 138a through the second connection pin 138c, and in particular, is connected to the driving bar 138b so as to be eccentric with respect to the center of the driving plate 138b. Therefore, as the drive bar 138a reciprocates in the second direction, the drive plate 138b reciprocates at a predetermined angle.

As a result, the rocking operation of the supply line 110 by the driving unit 130 will be described. When the driving force generator 136 reciprocates the first magnetic body 132 in the second direction, the second magnetic body 134 is caused by magnetic force. Reciprocates in the second direction along the first magnetic body 132. As the second magnetic body 134 reciprocates in the second direction, the power switching unit 138 converts the reciprocating motion of the second magnetic body 134 into a rotational motion to supply the supply line 110 to supply the supply line 110. Swing.

On the other hand, in the present embodiment, the configuration of the driving unit 130 has been described as using a non-contact manner, that is, the first magnetic body 132 and the second magnetic body 134. However, the configuration of the driving unit 130 is not limited thereto, and may have a configuration different from that mentioned above, and may have a structure that is mechanically connected to the supply line 110 through the chamber 20.

As described above, in the chemical liquid supply apparatus according to the preferred embodiment of the present invention, the injection nozzle has a two-stage link structure so that the tip of the nozzle has a larger angle due to inertia as the rear end of the nozzle swings within the swing range of the supply flow path. Spray the chemical while shaking. Therefore, compared with the related art, the angle at which the injection nozzle is oscillated can be made larger, so that the configuration for injecting the chemical liquid in the same area can be simplified. As a result, the number of supply lines is reduced to reduce manufacturing costs and to reduce costs and manpower required for maintenance.

While the foregoing has been described with reference to preferred embodiments of the present invention, those skilled in the art will be able to variously modify and change the present invention without departing from the spirit and scope of the invention as set forth in the claims below. It will be appreciated.

1 is a view schematically showing a chemical liquid supply apparatus according to an embodiment of the present invention.

2 is a view for explaining the rocking operation of the injection nozzle of FIG.

3 is a diagram illustrating a substrate processing apparatus to which the chemical liquid supply device of FIG. 1 is applied.

Explanation of symbols on the main parts of the drawings

100: chemical supply device 110: supply line

120: injection nozzle 122: first nozzle

124: second nozzle 126: rocking weight

130: driving unit 132: first magnetic material

134: second magnetic body 136: driving force generating unit

136a: motor 136b: turntable

136c: first driving bar 136d: connecting bar

136e: first connecting pin 138: power switching unit

138a: second drive bar 138b: drive plate

138c: second connecting pin

Claims (2)

A supply line extending in the first direction and flowing with the chemical liquid used for substrate processing; An injection nozzle connected to the supply line and extending toward the substrate, for spraying the chemical liquid onto the substrate; And A driving part for oscillating the supply line to oscillate the injection nozzle in a second direction perpendicular to the first direction, The spray nozzle A first nozzle fixed to the supply line and oscillated in the second direction by oscillation of the supply line; And And a second nozzle connected to the front end of the first nozzle so as to oscillate at an angle greater than that of the first nozzle due to the inertia of the first nozzle. Chemical liquid supply device. The swing of claim 1, wherein the swing is provided at a tip of the second nozzle, and a center of gravity is formed at the tip of the second nozzle to induce greater inertia in the second nozzle by the swing of the first nozzle. A chemical liquid supply device comprising a weight.
KR1020080117918A 2008-11-26 2008-11-26 Apparatus of supplying chemical liquid KR20100059224A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
KR1020080117918A KR20100059224A (en) 2008-11-26 2008-11-26 Apparatus of supplying chemical liquid

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Application Number Priority Date Filing Date Title
KR1020080117918A KR20100059224A (en) 2008-11-26 2008-11-26 Apparatus of supplying chemical liquid

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Publication Number Publication Date
KR20100059224A true KR20100059224A (en) 2010-06-04

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KR1020080117918A KR20100059224A (en) 2008-11-26 2008-11-26 Apparatus of supplying chemical liquid

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160149409A (en) * 2015-06-18 2016-12-28 주식회사 케이씨텍 Oscillation nozzle apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160149409A (en) * 2015-06-18 2016-12-28 주식회사 케이씨텍 Oscillation nozzle apparatus

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