KR20100058984A - A robot for transferring wafer - Google Patents
A robot for transferring wafer Download PDFInfo
- Publication number
- KR20100058984A KR20100058984A KR1020080117589A KR20080117589A KR20100058984A KR 20100058984 A KR20100058984 A KR 20100058984A KR 1020080117589 A KR1020080117589 A KR 1020080117589A KR 20080117589 A KR20080117589 A KR 20080117589A KR 20100058984 A KR20100058984 A KR 20100058984A
- Authority
- KR
- South Korea
- Prior art keywords
- wafer
- arm
- arm member
- transfer robot
- blade
- Prior art date
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Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67259—Position monitoring, e.g. misposition detection or presence detection
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
- H01L21/67742—Mechanical parts of transfer devices
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J11/00—Manipulators not otherwise provided for
- B25J11/0095—Manipulators transporting wafers
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Robotics (AREA)
- Manipulator (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
The present invention relates to a wafer transfer robot, and more particularly, by installing a sensing device on a blade on which a wafer is loaded, it is always possible to accurately determine whether a wafer is loaded, and only a single sensing device is required to reduce costs. The present invention relates to a wafer transfer robot.
In general, a semiconductor device is manufactured by depositing and patterning various materials on a wafer in a thin film form. To this end, various steps such as a deposition process, an etching process, a cleaning process, and a drying process are required. In each process, the wafer is mounted and processed in a process chamber that provides optimum conditions for the process.
In recent years, with the miniaturization and high integration of semiconductor devices, high precision, complexity, and large diameter of wafers are required, and in view of the improvement of throughput associated with the increase of complex processes and sheeting, A cluster type semiconductor manufacturing apparatus which can batch process a manufacturing process is attracting attention.
Generally, a cluster type semiconductor manufacturing apparatus consists of a process facility and an equipment front end module (EFEM) for carrying in and out of a wafer. The process equipment consists of a transfer chamber, a load lock chamber, and a plurality of process chambers, the load lock chamber and the process chambers being arranged around the transfer chamber.
Meanwhile, as illustrated in FIG. 1, a transfer robot 1 for transferring a substrate is installed in the trans chamber of the wafer processing apparatus configured as described above. The transfer robot 1 has a drive unit 2 fixed to the trans chamber and a plurality of
According to such a configuration, each arm can be processed in such a manner that the wafer is loaded or unloaded into a predetermined chamber while operating up, down, left and right, and the wafer can be processed.
On the other hand, whether the wafer (W) is loaded on the blade of the transfer robot is installed by the sensor (S) in the upper or lower structure of the processing apparatus or chamber in which the transfer robot is installed to identify whether the wafer is loaded.
However, in order to detect whether the wafer is loaded on the blade of the transfer robot, a hole must be installed in the structure corresponding to that direction in each transfer direction of the transfer robot, and then a sensor must be installed in the hole. If the structure of the device is changed, the number and cost of the sensor may be increased because the sensor must be re-machined to install the sensor. In addition, there are cases where it is impossible to accurately detect whether a wafer is loaded despite the installation of a plurality of such sensors.
The problem to be solved by the present invention is to provide a wafer transfer robot that can easily and accurately detect whether the wafer is loaded.
In addition, another object of the present invention is to provide a wafer transfer robot that can reduce the cost by installing only one detection device in the transfer robot itself.
Problems to be solved by the present invention are not limited to the above-mentioned problems, and other problems not mentioned will be clearly understood by those skilled in the art from the following description.
A wafer transfer robot according to a preferred embodiment of the present invention for solving the above problems, the drive unit is installed in the wafer processing apparatus having an actuator; A rotating shaft connected to the actuator of the driving unit so as to rotate and reciprocate vertically, a first arm member whose one end is rotatably fixed to the rotating shaft, and a second arm rotatably fixed to an end of the first arm member. An arm, the arm rotatably fixed to an end of the second arm member, the arm comprising a blade for loading or unloading a wafer; And a wafer sensing device installed on the blade to detect whether the wafer is loaded on the blade of the arm.
Other specific details of the invention are included in the detailed description and drawings.
According to the wafer transfer robot according to the present invention, it is possible to easily and accurately detect whether the wafer is loaded by installing a wafer loading detection device in the transfer robot itself, and by installing only one wafer detection device at a position close to the wafer, It is possible to reduce the cost, and to completely prevent errors in the determination of wafer loading.
Advantages and features of the present invention, and means or method for achieving the same will become apparent with reference to the embodiments described below in detail in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but will be implemented in various forms, and only the present embodiments are intended to complete the disclosure of the present invention, and the general knowledge in the art to which the present invention pertains. It is provided to fully convey the scope of the invention to those skilled in the art, and the present invention is defined only by the scope of the claims. Like reference numerals refer to like elements throughout. In addition, "and / or" includes each and all combinations of one or more of the items mentioned.
The terminology used herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. In this specification, the singular also includes the plural unless specifically stated otherwise in the phrase. As used herein, “comprises” and / or “comprising” refers to the presence of one or more other components, steps, operations and / or elements. Or does not exclude additions.
Unless otherwise defined, all terms used in the present specification (including technical and scientific terms) may be used in a sense that can be commonly understood by those skilled in the art. In addition, the terms defined in the commonly used dictionaries are not ideally or excessively interpreted unless they are specifically defined clearly.
Hereinafter, with reference to the accompanying drawings, a chemical liquid supply apparatus for a substrate processing apparatus according to a preferred embodiment of the present invention will be described in detail.
Figure 2 is a perspective view showing a wafer transfer robot according to the invention, Figure 3 is a longitudinal sectional view of the arm of the wafer transfer robot according to the invention, Figure 4 is a plan view of the transfer robot of FIG.
2 to 4, the wafer transfer robot according to the preferred embodiment of the present invention basically includes a
The
The
In this embodiment, the
In particular, the wafer transfer robot according to the present invention is provided with a
In more detail, it is preferable that the wafer W is constituted at the
In particular, the
As such, the
Hereinafter, the operation of the wafer transfer robot configured as described above and its operation mode will be described in detail.
As shown in FIG. 3, a transfer robot is installed in the wafer processing apparatus, and the wafer W is loaded and unloaded between the transfer chambers (not shown) and the respective process chambers (not shown) installed in the processing apparatus. Or carry out a return.
At this time, the
In particular, during any movement or movement of the
Therefore, it is possible to detect whether or not the wafer is loaded simply and accurately by using one wafer sensing device.
Although embodiments of the present invention have been described above with reference to the accompanying drawings, those skilled in the art to which the present invention pertains may implement the present invention in other specific forms without changing the technical spirit or essential features thereof. You will understand that. It is therefore to be understood that the above-described embodiments are illustrative in all aspects and not restrictive.
1 is a perspective view showing a conventional wafer transfer robot.
Figure 2 is a perspective view showing a wafer transfer robot according to the present invention.
3 is a longitudinal sectional view of the blade of the arm of the wafer transfer robot of FIG.
4 is an enlarged plan view of the blade of the arm of the wafer transfer robot of FIG.
Explanation of symbols on main parts of drawing
10: drive unit 20: arm
30: wafer detection device
Claims (2)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080117589A KR20100058984A (en) | 2008-11-25 | 2008-11-25 | A robot for transferring wafer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020080117589A KR20100058984A (en) | 2008-11-25 | 2008-11-25 | A robot for transferring wafer |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20100058984A true KR20100058984A (en) | 2010-06-04 |
Family
ID=42360349
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020080117589A KR20100058984A (en) | 2008-11-25 | 2008-11-25 | A robot for transferring wafer |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20100058984A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022000915A (en) * | 2011-03-11 | 2022-01-04 | ブルックス オートメーション インコーポレイテッド | Substrate processing tool |
-
2008
- 2008-11-25 KR KR1020080117589A patent/KR20100058984A/en not_active Application Discontinuation
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2022000915A (en) * | 2011-03-11 | 2022-01-04 | ブルックス オートメーション インコーポレイテッド | Substrate processing tool |
US11978649B2 (en) | 2011-03-11 | 2024-05-07 | Brooks Automation Us, Llc | Substrate processing apparatus |
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