KR20100032002A - Method of manufacturing a woven wiping cloth - Google Patents
Method of manufacturing a woven wiping cloth Download PDFInfo
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- KR20100032002A KR20100032002A KR1020080090936A KR20080090936A KR20100032002A KR 20100032002 A KR20100032002 A KR 20100032002A KR 1020080090936 A KR1020080090936 A KR 1020080090936A KR 20080090936 A KR20080090936 A KR 20080090936A KR 20100032002 A KR20100032002 A KR 20100032002A
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- shrinkage
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- A—HUMAN NECESSITIES
- A47—FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
- A47L—DOMESTIC WASHING OR CLEANING; SUCTION CLEANERS IN GENERAL
- A47L13/00—Implements for cleaning floors, carpets, furniture, walls, or wall coverings
- A47L13/10—Scrubbing; Scouring; Cleaning; Polishing
- A47L13/16—Cloths; Pads; Sponges
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B37/00—Lapping machines or devices; Accessories
- B24B37/11—Lapping tools
- B24B37/20—Lapping pads for working plane surfaces
- B24B37/24—Lapping pads for working plane surfaces characterised by the composition or properties of the pad materials
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- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01D—MECHANICAL METHODS OR APPARATUS IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS
- D01D5/00—Formation of filaments, threads, or the like
- D01D5/28—Formation of filaments, threads, or the like while mixing different spinning solutions or melts during the spinning operation; Spinnerette packs therefor
- D01D5/30—Conjugate filaments; Spinnerette packs therefor
- D01D5/32—Side-by-side structure; Spinnerette packs therefor
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- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01F—CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
- D01F8/00—Conjugated, i.e. bi- or multicomponent, artificial filaments or the like; Manufacture thereof
- D01F8/04—Conjugated, i.e. bi- or multicomponent, artificial filaments or the like; Manufacture thereof from synthetic polymers
- D01F8/12—Conjugated, i.e. bi- or multicomponent, artificial filaments or the like; Manufacture thereof from synthetic polymers with at least one polyamide as constituent
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- D—TEXTILES; PAPER
- D01—NATURAL OR MAN-MADE THREADS OR FIBRES; SPINNING
- D01F—CHEMICAL FEATURES IN THE MANUFACTURE OF ARTIFICIAL FILAMENTS, THREADS, FIBRES, BRISTLES OR RIBBONS; APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OF CARBON FILAMENTS
- D01F8/00—Conjugated, i.e. bi- or multicomponent, artificial filaments or the like; Manufacture thereof
- D01F8/04—Conjugated, i.e. bi- or multicomponent, artificial filaments or the like; Manufacture thereof from synthetic polymers
- D01F8/14—Conjugated, i.e. bi- or multicomponent, artificial filaments or the like; Manufacture thereof from synthetic polymers with at least one polyester as constituent
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
- D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
- D06M11/38—Oxides or hydroxides of elements of Groups 1 or 11 of the Periodic System
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M13/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with non-macromolecular organic compounds; Such treatment combined with mechanical treatment
- D06M13/10—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with non-macromolecular organic compounds; Such treatment combined with mechanical treatment with compounds containing oxygen
- D06M13/144—Alcohols; Metal alcoholates
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M15/00—Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment
- D06M15/19—Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment with synthetic macromolecular compounds
- D06M15/37—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
- D06M15/39—Aldehyde resins; Ketone resins; Polyacetals
- D06M15/41—Phenol-aldehyde or phenol-ketone resins
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- Engineering & Computer Science (AREA)
- Textile Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Woven Fabrics (AREA)
- Chemical Or Physical Treatment Of Fibers (AREA)
- Treatments For Attaching Organic Compounds To Fibrous Goods (AREA)
Abstract
Description
본 발명은 연마용 직물의 제조방법에 관한 것으로서, 보다 구체적으로는 연마성과 클리닝이 동시에 우수하여 연마용 재료와 와이핑용 재료로 모두 사용이 가능한 연마용 직물의 제조방법에 관한 것이다.The present invention relates to a method of manufacturing a polishing fabric, and more particularly, to a method of manufacturing a polishing fabric which can be used both as a polishing material and a wiping material because of excellent polishing and cleaning at the same time.
실리콘 웨이퍼를 화학-기계적 연마하는데 사용되는 종래의 연마패드로는 폴리우레탄 등의 합성수지 패드나 부직포에 폴리우레탄 등의 합성수지를 함침시킨 패드가 널리 사용되어 왔으나, 상기의 연마패드는 연마공정에는 적합하나 바이오테크롤로지(이하 "BT"라고 한다) 산업, IT 산업 등에 사용되는 클린룸용 와이퍼는 부적합한 문제가 있었다.Conventional polishing pads used for chemical-mechanical polishing of silicon wafers have been widely used as pads in which synthetic resin pads such as polyurethane or non-woven fabrics are impregnated with synthetic resins such as polyurethane. Clean room wipers used in the biotechnology (hereinafter referred to as "BT") industry, the IT industry, etc. have been inadequate.
한편, BT 산업 등에 클린룸용 와이퍼로 사용되는 종래 와이퍼로는 해도형 필라멘트 복합사 또는 분할형 필라멘트 복합사를 경사 및/또는 위사로 사용하여 제조된 직물을 알칼리 수용액으로 처리하여 상기 복합사를 분할처리하여 제조된 극세사 직물이 주로 사용되어 왔다.Meanwhile, the conventional wiper used as a wiper for a clean room in the BT industry or the like is divided into the composite yarn by treating a fabric manufactured by using an island-in-sea filament composite yarn or a split filament composite yarn as warp and / or weft with an aqueous alkali solution. Microfiber fabrics prepared by the use have been mainly used.
그러나, 상기 극세사 직물인 와이퍼는 클린룸용 와이퍼로는 적합하지만 형태안정성이 나빠 실리콘 웨이퍼 등을 화학-기계적 연마하는데 사용되는 연마패드로는 사용이 어려운 문제점이 있었다.However, although the microfiber wiper is suitable as a wiper for a clean room, it has a problem in that it is difficult to use as a polishing pad used for chemical-mechanical polishing of a silicon wafer due to poor shape stability.
본 발명은 상기와 같은 종래의 문제점을 해결하기 위해서, 사용시 분진의 발생이 적고, 클리닝 효과와 연마효과가 동시에 우수하고, 형태안정성과 슬러리 보유능력이 뛰어나 BT 산업용 클린룸용 와이퍼는 물론 실리콘 웨이퍼 등을 화학-기계적 연마하는데 사용되는 연마재료로도 사용이 가능한 연마용 직물을 제공하고자 한다.In order to solve the above problems, the present invention has a low dust generation, excellent cleaning and polishing effects, and excellent morphological stability and slurry holding ability. It is an object of the present invention to provide an abrasive fabric that can also be used as an abrasive material for chemical-mechanical polishing.
이와 같은 과제를 달성하기 위해서, 본 발명에서는 분할형 필라멘트 복합사를 경사 및/또는 위사로 사용하여 제직된 직물을 페놀계 약제가 포함된 열수로 처리하여 직물의 폭을 30~50% 수축시켜 직물의 형태안정성을 개선한다.In order to achieve the above object, in the present invention, the woven fabric using the split filament composite yarn as warp and / or weft yarn is treated with hot water containing a phenolic agent to shrink the width of the fabric by 30 to 50%. Improve morphological stability
본 발명으로 제조된 연마용 직물은 사용시 분진의 발생이 적고, 클리닝 효과와 연마효과가 동시에 우수하고, 형태안정성과 슬러리 보유능력이 뛰어나 BT 산업 용 클린룸용 와이퍼는 물론 실리콘 웨이퍼등을 화학-기계적 연마하는데 사용되는 연마재료로도 사용이 가능하다.The abrasive fabric produced by the present invention has low dust generation, excellent cleaning and polishing effects, and excellent morphological stability and slurry holding ability, thus enabling chemical-mechanical polishing of silicon wafers as well as clean room wipers for the BT industry. It can also be used as an abrasive material.
이하, 본 발명을 상세하게 설명한다.EMBODIMENT OF THE INVENTION Hereinafter, this invention is demonstrated in detail.
본 발명에 따른 연마용 직물의 제조방법은 (ⅰ) 폴리아미드 부분(A)와 폴리에스테르 부분(B)으로 구성된 분할형 필라멘트 복합사를 경사 및 위사 중 적어도 어느 하나로 사용하여 직물을 제조하는 제직 공정; (ⅱ) 제조된 직물을 페놀계 약제가 포함된 100~120℃의 열수로 처리하는 수축공정; 및 (ⅲ) 제조된 직물을 알칼리 수용액으로 처리하여 직물 내 상기 분할형 필라멘트 복합사를 분할시키는 분할공정; 을 포함한다.The manufacturing method of the abrasive fabric according to the present invention is (i) a weaving process of manufacturing a fabric using at least one of a warp and weft of a split filament composite yarn composed of a polyamide portion (A) and a polyester portion (B) ; (Ii) shrinkage process of treating the fabric with hot water at 100-120 ° C. containing phenolic agents; And (iii) dividing the split filament composite yarn in the fabric by treating the fabric with an aqueous alkali solution. .
구체적으로, 본 발명은 폴리아미드 부분(A)와 폴리에스테르 부분(B)으로 구성된 분할형 필라멘트 복합사를 경사 및 위사 중 적어도 어느 하나로 사용하여 직물을 제직한다.Specifically, the present invention uses a split filament composite yarn composed of a polyamide portion (A) and a polyester portion (B) to weave the fabric using at least one of warp and weft yarns.
상기의 분할형 필라멘트 복합사는 도 2에 도시된 바와 같이 폴리아미드 부분(A)과 폴리에스테르 부분(B)이 교호로 배열된 구조로서 통상의 분할형 복합사와 동일한 구조이다.As shown in FIG. 2, the split filament composite yarn is a structure in which a polyamide portion (A) and a polyester portion (B) are alternately arranged, and has the same structure as a conventional split composite yarn.
상기 분할형 필라멘트 복합사내 폴리에스테르 부분(B)의 함량이 상기 복합사 전체중량대비 60~80중량%이고, 분할 후의 상기 폴리아미드 부분(A)의 섬도는 0.02~0.1데니어이고, 분할 후의 상기 폴리에스테르 부분(B)의 섬도는 0.1~0.4 데니어인 것이 바람직하다.The content of the polyester portion (B) in the split filament composite yarn is 60 to 80% by weight relative to the total weight of the composite yarn, and the fineness of the polyamide portion (A) after dividing is 0.02 to 0.1 denier, and the poly after dividing It is preferable that the fineness of ester part (B) is 0.1-0.4 denier.
도 2는 본 발명에 사용되는 분할형 필라멘트 복합사의 단면 모식도이다.2 is a schematic cross-sectional view of the divided filament composite yarn used in the present invention.
분할형 필라멘트 복합사를 구성하는 분할전인 단사섬도는 1~3데니어인 것이 바람직하고, 상기 폴리에스테르 부분(B)에는 이산화티탄 등의 무기계 입자가 분산되어 있는 것이 바람직하다.It is preferable that the single yarn fineness before splitting which comprises a split filament composite yarn is 1-3 denier, and it is preferable that inorganic particle, such as titanium dioxide, is disperse | distributed to the said polyester part (B).
직물 제직시 상기 분할형 필라멘트 복합사를 경사로만 사용하거나, 위사로만 사용하거나, 경사 및 위사로 모두 사용할 수 있다.When weaving the fabric, the split filament composite yarn may be used only as a warp yarn, as a weft yarn, or as a warp and weft yarn.
구현일례로서, 경사로는 통상의 폴리아미드 필라멘트 또는 통상의 폴리에스테르 필라멘트를 사용하고 위사로는 상기 분할형 필라멘트 복합사를 사용하여 직물을 제조한다.As an embodiment, the ramps are fabricated using conventional polyamide filaments or conventional polyester filaments and the weft yarns using the split filament composite yarn.
선택적으로 제직된 직물을 예비정련할 수도 있다.Alternatively, the woven fabric may be prerefined.
다음으로는, 본 발명에서는 제조된 직물을 페놀계 약제가 포함된 100~120℃의 열수로 처리하여 고수축 시키는 수축공정을 실시한다.Next, the present invention is subjected to a shrinkage process to treat the fabric produced by hot water of 100 ~ 120 ℃ containing a phenolic agent to high shrinkage.
상기 수축공정은 실리콘 웨이퍼 등의 연마재로 사용이 가능하도록 직물의 형태안정성을 향상시킴과 동시에 연마성과 와이퍼성을 높히기 위해서 직물의 밀도를 치밀하게 하는 목적으로 실시된다.The shrinkage process is carried out for the purpose of improving the shape stability of the fabric so that it can be used as an abrasive such as a silicon wafer and at the same time increasing the density of the fabric in order to increase the polishing and wiper properties.
페놀계 약제가 포함된 열수내 페놀계 약제의 농도는 1~10%인 것이 바람직하다.It is preferable that the density | concentration of the phenolic agent in hot water containing a phenolic agent is 1 to 10%.
상기 페놀계 약제는 분할형 필라멘트 복합사를 구성하는 폴리아미드 부분(A)의 축소를 촉진하는 역할을 한다.The phenolic agent serves to promote the shrinkage of the polyamide portion (A) constituting the split filament composite yarn.
페놀계 약제의 농도가 1% 미만인 경우에는 직물의 수축이 불충분하게 되고, 10%를 초과하는 경우에는 원사가 손상되어 수축율이 오히려 낮아지고 폐수처리 등의 환경문제도 발생될 수 있다.If the concentration of the phenolic agent is less than 1%, the shrinkage of the fabric is insufficient, if it exceeds 10% the yarn is damaged, the shrinkage rate is rather low, and environmental problems such as waste water treatment may occur.
상기 페놀계 약제의 일례로 페놀 또는 벤질알콜 등이 사용될 수 있다.Phenol or benzyl alcohol, etc. may be used as an example of the phenolic agent.
상기 수축 공정에서 사용되는 열수의 온도가 100℃ 미만인 경우에는 직물의 수축율이 낮아지고, 120℃를 초과하는 경우에는 설비 등이 복잡해지는 문제가 발생될 수 있다.When the temperature of the hot water used in the shrinkage process is less than 100 ℃ the shrinkage of the fabric is low, if it exceeds 120 ℃ may cause a problem such as complicated equipment.
상기 수축공정은 직물의 폭을 30~50%의 수축율로 수축시키고, 직물의 두께를 100~300%의 신장율로 신장시키는 조건으로 실시하는 것이 바람직하다.The shrinkage process is preferably carried out under the condition that the width of the fabric is shrunk at a shrinkage of 30 to 50%, and the thickness of the fabric is stretched at an elongation of 100 to 300%.
상기 직물폭 수축율은 하기 계산식 1로 정의된다.The fabric width shrinkage is defined by the following formula (1).
[계산식 1][Calculation 1]
상기 계산식 1에서 W0는 수축공정이전의 직물 폭이고, W1은 수축공정 이후의 직물폭 이다.In Formula 1, W0 is the width of the fabric before the shrinkage process and W1 is the width of the fabric after the shrinkage process.
상기 직물 두께 신장율은 하기 계산식 2로 정의된다.The fabric thickness elongation is defined by the following formula (2).
[계산식 2][Calculation 2]
상기 계산식 T1은 수축공정 이전의 직물 두께이고, T2는 수축공정 이후의 직물두께이다.The formula T1 is the fabric thickness before the shrinking process, and T2 is the fabric thickness after the shrinking process.
다음으로는, 수축 처리된 직물을 알칼리 수용액으로 처리하여 직물내 분할형 필라멘트 복합사를 분할시키는 분할 공정을 실시한다.Next, a process of dividing the split filament composite yarn in the fabric is performed by treating the shrink-treated fabric with an aqueous alkali solution.
연마용 직물이 연마성능 및 와이핑 성능을 극대화하기 위해서는 직물내 포함된 분할형 필라멘트 복합사를 잘 분할시켜 극세화 하는 것이 중요하다.In order to maximize the polishing performance and wiping performance of the polishing fabric, it is important to finely divide the split filament composite yarn included in the fabric by finely dividing it.
분할형 극세사는 그 특성상 충분히 분할되지 않으면 분할형 극세사의 클리닝성능을 최대화할 수 없고 또한 분할이 불균일할 경우 표면에 불균일한 줄이 나타나는 등의 외관이 불량하게 보이게 되며 또한 미세한 표면의 클리닝시 문제를 발생시킬 수 있는 요인이 될 수도 있다. Due to its characteristics, the split microfiber cannot maximize the cleaning performance of the split microfiber, and if the split is uneven, the appearance of uneven lines on the surface may appear poor, and the problem of cleaning fine surfaces may be poor. It may be a factor that can be generated.
따라서 본 발명의 연마용 직물은 가성소다로 대표되는 알카리 감량약제를 일정량 첨가하여 충분한 분할이 이루어지도록 한다. 이때 사용하는 약제의 농도는 가성소다를 기준으로는 0.3내지 3%정도가 적절하다. 0.3% 미만에서는 완전한 분할을 이루기가 어렵게 되며 3%를 초과하는 경우에는 과도한 용출로 인해서 최종 연마용 원단의 충분한 성능을 얻기가 힘들게 될 수 있다.Therefore, the abrasive fabric of the present invention is added to a certain amount of alkali reducing agent represented by caustic soda so that sufficient division is made. At this time, the concentration of the drug used is about 0.3 to 3% based on caustic soda. If it is less than 0.3%, it is difficult to achieve a complete division, and if it is more than 3%, excessive dissolution may make it difficult to obtain sufficient performance of the final polishing fabric.
용출의 과정은 90내지 98℃ 사이의 상온에서 실시하면 되나 고압의 설비를 사용하여 처리 할 수도 있다. 이는 실시하는 각 업자의 기준에 맞추어 실시할 수 있을 것이다.The dissolution process may be carried out at room temperature between 90 and 98 ° C., but may also be processed using high pressure equipment. This may be done according to the standards of each vendor.
이상으로 처리한 연마용 직물은 통상의 직물 원단의 처리법에 의해서 열고정하여 원단의 가공을 최종마무리하게 된다. The polishing fabric treated as described above is heat-set by the usual fabric fabric treatment method to finish the fabric processing.
이상에서 설명한 방법으로 제조한 본 발명의 연마용 직물은 하드디스크와 같은 자기기록매체의 와이퍼용으로 사용시 분진의 발생이 적으며 클리닝 효과가 우수 한 와이퍼로 사용이 가능하며 동시에 뛰어난 형태안정성과 슬러리 보유성이 우수함으로써 연마입자와 동시에 사용하여 연마기능이 우수한 연마포를 제조할 수 있었다. The abrasive fabric of the present invention manufactured by the method described above can be used as a wiper with low dust generation and excellent cleaning effect when used as a wiper for magnetic recording media such as a hard disk, and at the same time, excellent shape stability and slurry retention Due to the excellent properties, it was possible to produce an abrasive cloth having excellent polishing function by using the abrasive particles simultaneously.
이하, 실시예 및 비교실시예를 통하여 본 발명을 보다 구체적으로 살펴본다. 그러나 본 발명이 하기 실시예에만 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples. However, the present invention is not limited only to the following examples.
실시예Example 1 One
경사에는 통상의 75데니어/36필라멘트의 폴리에스테르 원사를 사용하고 위사로는 폴리에스테르 75중량%와 폴리아마이드 25중량%로 구성된 75데니어/36필라멘트의 분할형 필라멘트 복합사를 사용하여 5매주자직(Satin) 조직의 직물을 제직하였다. For the warp yarns, we use a conventional 75 denier / 36 filament polyester yarn and a weft yarn using 75 denier / 36 filament split filament composite yarn composed of 75 wt% polyester and 25 wt% polyamide. Satin) weaving tissue.
다음으로 고압래피드 염색기로 일반적인 정련제를 투입하여 예비정련을 실시하였다. Next, pre-refining was performed by injecting a general refining agent into a high-pressure rapid dyeing machine.
다음으로 고압래피드 염색기에 벤질알코올 성분이 5% 농도로 첨가된 110℃의 열수에서 30분간 직물을 처리하여 직물의 폭을 40% 수축시키고, 직물의 두께를 210% 신장시키는 수축공정을 실시하였다.Next, the fabric was treated for 30 minutes in a hot water at 110 ° C. in which a benzyl alcohol component was added at a 5% concentration in a high pressure rapid dyeing machine to shrink the width of the fabric by 40%, and stretch the fabric by 210%.
다음으로, 수축이 완료된 직물을 액류감량기를 이용하여 98℃온도에서 60분간 NaOH 1%용액에서 분할공정을 실시한다. Next, the shrinkage of the fabric is subjected to a division process in NaOH 1% solution for 60 minutes at 98 ℃ temperature using a liquid reducer.
다음으로 불순물을 순수를 사용하여 충분히 수세하여 제거한다. Next, impurities are sufficiently washed with pure water to remove them.
다음으로 탈수 후 텐터식 열고정기에서 170℃로 열을 가하여 열처리한다.Next, after dehydration, heat is applied by applying heat at 170 ° C. in a tenter type heat stabilizer.
다음으로 카렌더로 표면을 가열압착하여 본 발명의 연마용 직물을 제조하였다.Next, the surface was heat-pressed with a calender to prepare a polishing fabric of the present invention.
다음으로 제조된 연마용 직물을 직경 500밀리미터의 원형으로 재단한 다음 통상의 핫멜트필름을 상기 연마용 직물의 이면에 접착하고, 다시 핫멜트 필름 이면에 양면접착테이프를 부착하여 연마포를 제조한다.Next, the prepared polishing fabric is cut into a circle having a diameter of 500 millimeters, and then a normal hot melt film is adhered to the back surface of the polishing fabric, and then a double-sided adhesive tape is attached to the back surface of the hot melt film to prepare a polishing cloth.
또는 위의 원단을 폭 30 밀리미터의 폭으로 테이프상으로 재단하여 와이핑 테이프를 제조한다. Alternatively, the above fabric is cut into a tape having a width of 30 millimeters to prepare a wiping tape.
실시예Example 2 2
실시예 1에서 수축공정시 열수내 벤질알콜의 3%로 변경하여 직물의 폭을 30% 수축시키고 직물의 두께를 210% 신장시킨 것을 제외하고는 실시예1과 동일한 공정으로 연마용 직물을 제조한 다음, 이를 사용하여 실시예 1과 같이 연마포와 와이핑테이프를 제조한다.In Example 1, the polishing fabric was prepared in the same manner as in Example 1, except that 3% of the benzyl alcohol in the hot water was shrunk to shrink the width of the fabric by 30% and increase the thickness of the fabric by 210%. Next, using this to prepare a polishing cloth and a wiping tape as in Example 1.
제조된 와이핑 테이프의 각종 물성을 평가한 결과는 표 1과 같았다.The results of evaluating various physical properties of the prepared wiping tape were as shown in Table 1.
비교실시예Comparative Example 1 One
실시예 1에서 수축공정을 실시하지 않은 것을 제외하고는 실시예1과 동일한 공정으로 연마용 직물을 제조한 다음, 이를 사용하여 실시예 1과 같이 연마포와 와이핑테이프를 제조한다.Except not performing the shrinkage process in Example 1 to prepare a polishing fabric in the same process as in Example 1, using the same to prepare a polishing cloth and wiping tape as in Example 1.
제조된 와이핑 테이프의 각종 물성을 평가한 결과는 표 1과 같았다.The results of evaluating various physical properties of the prepared wiping tape were as shown in Table 1.
비교실시예Comparative Example 2 2
폴리에스테르 75중량%와 폴리아마이드 25중량%로 구성된 75데니어/36필라멘트 해도형 필라멘트 복합사를 사용하여 42게이지의 인터록환편기를 사용하여 연마용 편물을 제조하고, 상기 연마용 편물을 사용하여 실시예 1과 같은 조건으로 수축공정, 분할공정, 수세, 열처리, 표면 가열압착 공정들을 거쳐 연마포와 와이핑테이프를 제조한다.Using 75 denier / 36 filament island-in-the-sea filament composite yarn composed of 75% by weight of polyester and 25% by weight of polyamide, a polishing knitted fabric was prepared using a 42-gauge interlock ring knitting machine, and an example was used using the polishing knitted fabric. A polishing cloth and a wiping tape are manufactured through the shrinkage process, the dividing process, the water washing, the heat treatment, and the surface heat and compression process under the same conditions as those of 1.
제조된 와이핑 테이프의 각종 물성을 평가한 결과는 표 1과 같았다.The results of evaluating various physical properties of the prepared wiping tape were as shown in Table 1.
상기 표 1에서, 와이핑(Wiping) 기능에 대한 평가는 미개봉상태의 CD롬을 개봉하여 통상의 실내공간에 1일간 방치후 제조된 와이핑(Wiping) 테이프로 1회 손으로 닦았을때의 먼지제거 성능을 5회정도 실시하여 육안판정한 결과이며, 연마기능에 대한 평가는 패드(Pad) 연마 장비인 Polisher 500의 설비에서 산화세리움 슬러리를 이용하여 하드디스크 제조에 사용되는 것과 같은 원판상의 유리를 연마하여 연마율과 표면조도를 측정하였다.In Table 1, the evaluation of the wiping function (Wiping function) is a dust when the wiping (wiping) by hand with a wiping tape prepared after opening the unopened CD rom and left in a normal indoor space for 1 day It is the result of the visual judgment by performing the removal performance about 5 times. The evaluation of the polishing function is the same as the glass used in the manufacture of hard disk using the cerium oxide slurry in the facility of Polisher 500, which is a pad polishing machine. Was polished to determine the polishing rate and surface roughness.
도 1은 본 발명에 따른 제조방법으로 제조된 연마용 단면 상태를 나타내는 전자현미경 사진.1 is an electron micrograph showing a cross-sectional state for polishing prepared by the manufacturing method according to the present invention.
도 2는 본 발명에 사용되는 분할형 필라멘트 복합사의 단면모식도.Figure 2 is a schematic cross-sectional view of the divided filament composite yarn used in the present invention.
* 도면 중 주요부분에 대한 부호설명* Code description for main parts of the drawings
A : 폴리아미드 부분 B : 폴리에스테르 부분A: polyamide part B: polyester part
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| KR20230053039A (en) | 2021-10-13 | 2023-04-21 | (주)인터마루인더스트리 | Method Of Manufactoring Eco-Friendly Fine-Denier High-Density Wiper For Semiconductor Clean Room |
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| KR100868745B1 (en) * | 2005-03-09 | 2008-11-13 | 주식회사 코오롱 | Method of manufacturing for wiping knit fabric with excellent antibiosis and clearing property |
| KR100704382B1 (en) | 2005-11-07 | 2007-04-06 | 주식회사 새 한 | Manufacturing method of knit-wiper for use of lcd or semiconductor plants and knit-wiper thereby |
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| KR20230053039A (en) | 2021-10-13 | 2023-04-21 | (주)인터마루인더스트리 | Method Of Manufactoring Eco-Friendly Fine-Denier High-Density Wiper For Semiconductor Clean Room |
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