KR20100023646A - Manufacturing method of electroconductive fabric for electromagnetic interference(emi) shielding by using tin plating - Google Patents
Manufacturing method of electroconductive fabric for electromagnetic interference(emi) shielding by using tin plating Download PDFInfo
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- KR20100023646A KR20100023646A KR1020080082522A KR20080082522A KR20100023646A KR 20100023646 A KR20100023646 A KR 20100023646A KR 1020080082522 A KR1020080082522 A KR 1020080082522A KR 20080082522 A KR20080082522 A KR 20080082522A KR 20100023646 A KR20100023646 A KR 20100023646A
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- plating
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- tin
- tin plating
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- 238000007747 plating Methods 0.000 title claims abstract description 125
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 title claims abstract description 48
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 35
- 239000004744 fabric Substances 0.000 title abstract 3
- 238000000034 method Methods 0.000 claims abstract description 121
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 42
- 229910052759 nickel Inorganic materials 0.000 claims abstract description 21
- 239000002657 fibrous material Substances 0.000 claims abstract description 14
- 238000005238 degreasing Methods 0.000 claims abstract description 11
- 238000005530 etching Methods 0.000 claims abstract description 9
- 238000010306 acid treatment Methods 0.000 claims abstract description 6
- 238000006386 neutralization reaction Methods 0.000 claims abstract description 6
- 239000000835 fiber Substances 0.000 claims description 42
- 229910052802 copper Inorganic materials 0.000 claims description 32
- 239000010949 copper Substances 0.000 claims description 32
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 30
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 30
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 23
- 239000003381 stabilizer Substances 0.000 claims description 18
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims description 14
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 12
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 10
- 235000011121 sodium hydroxide Nutrition 0.000 claims description 10
- 239000003054 catalyst Substances 0.000 claims description 9
- 229940098779 methanesulfonic acid Drugs 0.000 claims description 7
- 229910001432 tin ion Inorganic materials 0.000 claims description 7
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 claims description 6
- 230000003213 activating effect Effects 0.000 claims description 5
- 238000004649 discoloration prevention Methods 0.000 claims description 5
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 claims description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 claims description 4
- 235000011114 ammonium hydroxide Nutrition 0.000 claims description 4
- 229960004106 citric acid Drugs 0.000 claims description 4
- 239000008139 complexing agent Substances 0.000 claims description 4
- 229910000365 copper sulfate Inorganic materials 0.000 claims description 4
- ARUVKPQLZAKDPS-UHFFFAOYSA-L copper(II) sulfate Chemical compound [Cu+2].[O-][S+2]([O-])([O-])[O-] ARUVKPQLZAKDPS-UHFFFAOYSA-L 0.000 claims description 4
- 150000004682 monohydrates Chemical class 0.000 claims description 4
- 230000003472 neutralizing effect Effects 0.000 claims description 4
- RRIWRJBSCGCBID-UHFFFAOYSA-L nickel sulfate hexahydrate Chemical compound O.O.O.O.O.O.[Ni+2].[O-]S([O-])(=O)=O RRIWRJBSCGCBID-UHFFFAOYSA-L 0.000 claims description 4
- 229940116202 nickel sulfate hexahydrate Drugs 0.000 claims description 4
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 claims description 4
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 claims description 4
- 229960000999 sodium citrate dihydrate Drugs 0.000 claims description 4
- HPGGPRDJHPYFRM-UHFFFAOYSA-J tin(iv) chloride Chemical compound Cl[Sn](Cl)(Cl)Cl HPGGPRDJHPYFRM-UHFFFAOYSA-J 0.000 claims description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims description 3
- 238000009713 electroplating Methods 0.000 claims description 3
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 claims description 3
- 238000009210 therapy by ultrasound Methods 0.000 claims description 3
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 claims description 2
- JZCCFEFSEZPSOG-UHFFFAOYSA-L copper(II) sulfate pentahydrate Chemical compound O.O.O.O.O.[Cu+2].[O-]S([O-])(=O)=O JZCCFEFSEZPSOG-UHFFFAOYSA-L 0.000 claims description 2
- 239000000176 sodium gluconate Substances 0.000 claims description 2
- 235000012207 sodium gluconate Nutrition 0.000 claims description 2
- 229940005574 sodium gluconate Drugs 0.000 claims description 2
- 238000001994 activation Methods 0.000 abstract description 5
- 230000007613 environmental effect Effects 0.000 abstract description 4
- 238000002845 discoloration Methods 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 238000006467 substitution reaction Methods 0.000 abstract description 2
- 239000000243 solution Substances 0.000 description 27
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 18
- 238000005406 washing Methods 0.000 description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 14
- 229910052763 palladium Inorganic materials 0.000 description 9
- 239000007788 liquid Substances 0.000 description 7
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 6
- 238000006555 catalytic reaction Methods 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000001035 drying Methods 0.000 description 4
- 230000018044 dehydration Effects 0.000 description 3
- 238000006297 dehydration reaction Methods 0.000 description 3
- VIQSRHWJEKERKR-UHFFFAOYSA-L disodium;terephthalate Chemical compound [Na+].[Na+].[O-]C(=O)C1=CC=C(C([O-])=O)C=C1 VIQSRHWJEKERKR-UHFFFAOYSA-L 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 2
- 230000004913 activation Effects 0.000 description 2
- 230000003197 catalytic effect Effects 0.000 description 2
- -1 dusts Substances 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 229960004279 formaldehyde Drugs 0.000 description 2
- 235000019256 formaldehyde Nutrition 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- PGGZKNHTKRUCJS-UHFFFAOYSA-N methanesulfonic acid;tin Chemical compound [Sn].CS(O)(=O)=O PGGZKNHTKRUCJS-UHFFFAOYSA-N 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000007254 oxidation reaction Methods 0.000 description 2
- 206010020751 Hypersensitivity Diseases 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 229910002677 Pd–Sn Inorganic materials 0.000 description 1
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 1
- HZXNLXDGUBNCJI-UHFFFAOYSA-N [Sn].CS(=O)(=O)O.[Sn] Chemical compound [Sn].CS(=O)(=O)O.[Sn] HZXNLXDGUBNCJI-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 239000012670 alkaline solution Substances 0.000 description 1
- 208000026935 allergic disease Diseases 0.000 description 1
- 230000007815 allergy Effects 0.000 description 1
- 239000003638 chemical reducing agent Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 239000000084 colloidal system Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000007598 dipping method Methods 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910021645 metal ion Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 238000010422 painting Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 229920001690 polydopamine Polymers 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 239000011734 sodium Substances 0.000 description 1
- 239000011780 sodium chloride Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000012209 synthetic fiber Substances 0.000 description 1
- 229920002994 synthetic fiber Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
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- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
- D06M10/02—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements ultrasonic or sonic; Corona discharge
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
- D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
- D06M11/38—Oxides or hydroxides of elements of Groups 1 or 11 of the Periodic Table
- D06M11/42—Oxides or hydroxides of copper, silver or gold
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
- D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
- D06M11/32—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond
- D06M11/36—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with oxygen, ozone, ozonides, oxides, hydroxides or percompounds; Salts derived from anions with an amphoteric element-oxygen bond with oxides, hydroxides or mixed oxides; with salts derived from anions with an amphoteric element-oxygen bond
- D06M11/48—Oxides or hydroxides of chromium, molybdenum or tungsten; Chromates; Dichromates; Molybdates; Tungstates
-
- D—TEXTILES; PAPER
- D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
- D06N—WALL, FLOOR, OR LIKE COVERING MATERIALS, e.g. LINOLEUM, OILCLOTH, ARTIFICIAL LEATHER, ROOFING FELT, CONSISTING OF A FIBROUS WEB COATED WITH A LAYER OF MACROMOLECULAR MATERIAL; FLEXIBLE SHEET MATERIAL NOT OTHERWISE PROVIDED FOR
- D06N2209/00—Properties of the materials
- D06N2209/04—Properties of the materials having electrical or magnetic properties
- D06N2209/048—Electromagnetic interference shielding
-
- D—TEXTILES; PAPER
- D10—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
- D10B—INDEXING SCHEME ASSOCIATED WITH SUBLASSES OF SECTION D, RELATING TO TEXTILES
- D10B2401/00—Physical properties
- D10B2401/16—Physical properties antistatic; conductive
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- Plasma & Fusion (AREA)
- Chemically Coating (AREA)
Abstract
Description
본 발명은 도전성 섬유의 제조방법에 관한 것으로, 보다 구체적으로는 환경 부하 물질을 최소화하여 친환경적이면서 제조 원가와 공정 시간이 절감되어 생산성을 향상할 수 있는 주석 도금법에 의한 전자파 차폐용 도전성 섬유의 제조방법에 관한 것이다.The present invention relates to a method for manufacturing a conductive fiber, and more particularly, to a method for manufacturing a conductive fiber for electromagnetic shielding by tin plating method which can improve productivity by minimizing environmental load material and reducing manufacturing cost and processing time. It is about.
통상적으로, 휴대폰, PDA와 같은 소형의 휴대 기기가 생활용품으로 자리 잡으면서 이동 용이성을 확보하기 위해 더욱 경박단소화되는 경향이 있을 뿐 아니라 전자파 방출의 우려도 줄이려는 노력이 이어지고 있다. 대부분의 전자제품의 하우징 재료로서 사용되는 플라스틱이 전자파를 차폐하는 기능이 미흡하여 표면가공을 통한 도전층 형성, 전도성 도료의 도장, 금속입자의 진공증착, 금속 박막 라미네이팅(laminating) 등의 방법이 활용되지만 경박단소화 설계를 고려하면 도전 섬유를 활용하는 방식이 선호된다.In general, small portable devices such as mobile phones and PDAs tend to become smaller and thinner in order to secure ease of movement as they become household items, and efforts are being made to reduce concerns about electromagnetic wave emission. Plastics, which are used as housing materials for most electronic products, lack the ability to shield electromagnetic waves, so that methods such as forming conductive layers through surface processing, painting conductive paints, vacuum deposition of metal particles, and laminating metal thin films are used. However, considering the light and thin design, the use of conductive fibers is preferred.
한국 등록특허 제0421787호에 의하면 펄프 섬유를 고해시킨 지료에 니켈 및 구리로 이루어진 군으로부터 선택되는 도전성 금속의 염을 함유하는 용액 및 상기 도전성 금속의 환원액으로 이루어지는 무전해도금액을 투입, 혼합하여 상기 고해된 펄프 섬유 상에 직접 상기 도전성 금속을 환원석출하는 과정이 개시된다.According to Korean Patent No. 0421787, a solution containing a salt of a conductive metal selected from the group consisting of nickel and copper and an electroless solution consisting of a reducing solution of the conductive metal are added and mixed to a paper material on which pulp fibers have been beaten. A process for reducing precipitation of the conductive metal directly on the beaten pulp fibers is disclosed.
한국 공개특허 제2001-0026385호에 의하면 합성섬유를 포함하는 섬유기재에 구리 및 니켈을 순차적으로 무전해 이중도금함으로써 섬유 고유의 유연성을 유지시키는 동시에 도전성을 부여하고 내산화성, 내식성 및 내마모성을 향상시켜 전자파 차폐제로서 유용하게 사용될 수 있는 도전성 섬유를 제공한다. According to Korean Patent Laid-Open Publication No. 2001-0026385, copper and nickel are sequentially electroless double-plated on a fiber substrate including synthetic fibers to maintain the inherent flexibility of the fibers and to provide conductivity and improve oxidation resistance, corrosion resistance and abrasion resistance. Provided is a conductive fiber that can be usefully used as an electromagnetic wave shielding agent.
그러나 무전해 도금법에 대한 의존도가 높을수록 포름알데하이드와 같은 독성물질이 배출될 뿐 아니라 도금 시간이 길어지고 약품 소요량이 증가하여 결국 생산성을 저하시키는 단점이 있다. However, as the dependence on the electroless plating method increases, not only toxic substances such as formaldehyde are discharged, but also the plating time becomes longer and the chemical requirements increase, resulting in lower productivity.
종래기술의 문헌정보Literature Information of the Prior Art
[문헌1] 한국 등록특허 제0421787호 “무전해 도금법을 이용한 도전용지의 제조방법”[Document 1] Korean Registered Patent No. 0421787 “Method of manufacturing conductive paper using electroless plating method”
[문헌2] 한국 공개특허 제2001-0026385호 “전자파 차단용 도전성 섬유 및 그 제조방법”[Patent 2] Korean Unexamined Patent Publication No. 2001-0026385 “Conductive Fiber for Electromagnetic Interception and Method for Manufacturing the Same”
이에 따라 본 발명은 상기와 같은 종래의 문제점을 근본적으로 해결하기 위한 것으로서, 환경 부하 물질을 최소화하여 친환경적이면서 제조 원가와 공정 시간이 절감되어 생산성을 향상할 수 있는 주석 도금법에 의한 전자파 차폐용 도전성 섬유의 제조방법을 제공하는데 그 목적이 있다.Accordingly, the present invention is to fundamentally solve the conventional problems as described above, the electromagnetic wave shielding conductive fiber by the tin plating method that can improve productivity by minimizing the environmental load material and eco-friendly and reduced manufacturing cost and processing time Its purpose is to provide a method of manufacturing.
이러한 목적을 달성하기 위해 본 발명은 섬유상에 전도성을 부여하도록 도금하는 방법에 있어서: 섬유 소재를 투입하는 제1단계; 상기 단계의 섬유 소재를 대상으로 탈지, 에칭, 중화, 산처리, 활성화를 거치는 제2단계; 상기 단계의 섬유 소재를 대상으로 적어도 전기주석 도금 또는 치환주석 도금을 병행하여 실시하는 제3단계; 및 상기 단계의 섬유 소재를 대상으로 변색방지처리를 실시하는 제4단계;를 포함하여 이루어지는 것을 특징으로 한다.In order to achieve the above object, the present invention provides a method for plating to impart conductivity on a fiber, comprising: a first step of introducing a fiber material; A second step of degreasing, etching, neutralizing, acidifying, and activating the fiber material of the step; A third step of simultaneously performing at least electro tin plating or substituted tin plating on the fiber material of the step; And a fourth step of performing a discoloration prevention treatment on the fiber material of the step.
또한, 본 발명에 상기 제2단계는 가성소다 용액에서 초음파 처리하는 탈지ㆍ에칭공정과, 염산 용액으로 중화처리하는 공정과, 염산 용액으로 산처리하는 공정과, 염화팔라듐과 염화주석 및 염산을 함유하고 있는 촉매액으로 촉매화하는 공정과, 황산 용액으로 활성화하는 공정을 포함하는 것을 특징으로 한다.In the present invention, the second step includes a degreasing and etching process for ultrasonic treatment in a caustic soda solution, a neutralization treatment with a hydrochloric acid solution, an acid treatment with a hydrochloric acid solution, and palladium chloride, tin chloride and hydrochloric acid. And a step of catalyzing with a catalyst solution and a step of activating with a sulfuric acid solution.
또한, 본 발명의 상기 제3단계는 무전해 니켈 도금공정, 무전해 동 도금공정, 전기 구리 도금공정, 치환주석 도금공정, 전기주석 도금공정의 순으로 선택적으로 실시하되, 좀 더 구체적으로 이와 같은 본 발명의 제3단계는 11가지 실시예로 구현될 수 있다.In addition, the third step of the present invention is selectively performed in the order of electroless nickel plating process, electroless copper plating process, electro copper plating process, substituted tin plating process, electro tin plating process, more specifically such a The third step of the present invention can be implemented in eleven embodiments.
한편, 이에 앞서 본 명세서 및 특허청구범위에 사용된 용어나 단어는 통상적이거나 사전적인 의미로 한정해서 해석되어서는 아니 되며, 발명자는 그 자신의 발명을 가장 최선의 방법으로 설명하기 위해 용어의 개념을 적절하게 정의할 수 있다는 원칙에 입각하여 본 발명의 기술적 사상에 부합하는 의미와 개념으로 해석되어야만 한다. 따라서 본 명세서에 기재된 실시예와 도면에 도시된 구성은 본 발명의 가장 바람직한 일 실시예에 불과할 뿐이고, 본 발명의 기술적 사상을 모두 대변하는 것은 아니므로, 본 출원시점에 있어서 이들을 대체할 수 있는 다양한 균등물과 변형예들이 있을 수 있음을 이해하여야 한다.On the other hand, the terms or words used in the present specification and claims are not to be construed as limiting the ordinary or dictionary meanings, the inventors should use the concept of the term in order to explain the invention in the best way. Based on the principle that it can be properly defined, it should be interpreted as meaning and concept corresponding to the technical idea of the present invention. Therefore, the embodiments described in the present specification and the configuration shown in the drawings are only the most preferred embodiments of the present invention, and do not represent all of the technical ideas of the present invention, and various alternatives may be substituted at the time of the present application. It should be understood that there may be equivalents and variations.
이상의 구성 및 작용에서 설명한 바와 같이, 본 발명은 환경 부하 물질을 최소화하여 친환경적이면서 제조 원가와 공정 시간이 절감되어 생산성을 향상할 수 있는 효과를 제공한다.As described in the above configuration and operation, the present invention provides an effect that can be environmentally friendly to minimize the environmental load material and to reduce the production cost and processing time to improve productivity.
이하, 첨부된 도면을 참조하여 본 발명에 따른 바람직한 실시예를 상세하게 설명한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
본 발명을 첨부된 도면을 참조하여 상세히 설명하면 다음과 같다.Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.
도 1은 본 발명의 제1실시예에 의한 제조방법을 나타내는 공정흐름도, 도 2는 본 발명의 제2실시예에 의한 제조방법을 나타내는 공정흐름도, 도 3은 본 발명의 제9실시예에 의한 제조방법을 나타내는 공정흐름도이다.1 is a process flow diagram showing a manufacturing method according to a first embodiment of the present invention, Figure 2 is a process flow diagram showing a manufacturing method according to a second embodiment of the present invention, Figure 3 is a flow chart according to a ninth embodiment of the present invention The process flow chart which shows a manufacturing method.
본 발명은 섬유상에 전도성을 부여하도록 도금하는 방법에 관련되며, 섬유 소재를 투입하는 제1단계(S100); 상기 단계의 섬유 소재를 대상으로 탈지, 에칭, 중화, 산처리, 활성화를 거치는 제2단계(S200); 상기 단계의 섬유 소재를 대상으로 적어도 니켈 혹은 동 도금후, 전기주석 도금 또는 치환주석 도금을 병행하여 실시하는 제3단계; 및 상기 단계의 섬유 소재를 대상으로 변색방지처리를 실시하는 제4단계(S400);를 포함하여 이루어진다.The present invention relates to a method of plating to impart conductivity on a fiber, the first step of injecting a fiber material (S100); A second step (S200) of degreasing, etching, neutralizing, acidifying, and activating the fiber material of the step; A third step of subjecting the fiber material of the step to at least nickel or copper plating and then performing electro tin plating or substituted tin plating in parallel; And a fourth step (S400) of performing a discoloration prevention treatment on the fiber material of the step.
섬유 소재를 투입하는 제1단계(S100)에서 폴리에스테르 섬유가 적절하나 이에 국한되는 것은 아니다. 이어서 탈지ㆍ에칭공정, 중화처리 공정, 산처리 공정과, 촉매화 공정, 활성화 공정을 포함하는 제2공정(S200)을 실시한다.Polyester fiber is appropriate in the first step (S100) of injecting the fiber material, but is not limited thereto. Subsequently, a second step (S200) including a degreasing / etching step, a neutralization step, an acid treatment step, a catalysis step, and an activation step is performed.
탈지ㆍ에칭 공정에서, 가성소다 80∼120g/L 용액을 사용하고 40∼80℃에서 0.5∼10분간 초음파 처리 후 수세 2∼3단을 실시한다. 도금 공정에 있어서 피도금체의 표면에 유지분, 먼지 또는 다른 불순물이 흡착되어 있는 경우 미도금, 도금 얼룩, 밀착 불량 등의 문제가 발생하기 쉬우므로 유기 용제 또는 알카리제의 탈지액을 사용하여 제거하는 공정을 수행한다. 폴리에스테르 섬유상의 도금에 있어서는 고농도의 수산화나트륨 또는 수산화칼륨 용액 중에 섬유를 침적시킴으로써 탈지가 가능하게 된다. 이 공정에서 폴리에스테르는 알카리 용액에서 가수분해되어 수용성의 테레프탈산나트륨과 에틸렌글리콜로 분해되고 섬유 표면은 에칭된다. 이 공정 후에는 섬유 표면에 흡착되어 있는 수용성의 테레프탈산나트륨 등을 완전히 제거하기 위해 충분하게 수세할 필요가 있다. 이 공정에서 초음파를 작용하면 섬유 표면에 흡착되어 있는 유지분, 먼지 또는 불순물이 탈착되기 쉽고, 섬유의 각 필러 사 이에 액이 침투하기 용이하여 후속된 도금 공정에서 섬유의 갈 필러에 골고루 도금 피막이 석출될 수 있고 가수분해된 수용성의 테레프탈산나트륨과 에틸렌글리콜의 탈착을 도와준다.In the degreasing and etching process, 80 to 120 g / L of caustic soda solution is used, followed by ultrasonic treatment at 40 to 80 ° C. for 0.5 to 10 minutes, followed by washing with water to two to three steps. In the plating process, if oil, dust or other impurities are adsorbed on the surface of the plated body, problems such as unplating, plating stains and poor adhesion are likely to occur. Therefore, the organic solvent or alkaline degreasing solution is used for removal. To perform the process. In plating on polyester fibers, degreasing is possible by dipping the fibers in a high concentration of sodium hydroxide or potassium hydroxide solution. In this process, the polyester is hydrolyzed in alkaline solution to break down into water-soluble sodium terephthalate and ethylene glycol and the fiber surface is etched. After this process, it is necessary to wash with water sufficiently in order to completely remove the water-soluble sodium terephthalate and the like adsorbed on the fiber surface. When ultrasonic waves are applied in this process, fats, dusts, or impurities adsorbed on the surface of the fiber are easily desorbed, and the liquid easily penetrates between the fillers of the fiber, so that the plating film is evenly deposited on the fiber filler in the subsequent plating process. And desorption of ethylene glycol with hydrolyzed, water-soluble sodium terephthalate.
중화처리 공정에서, 35∼36% 염산 20∼150㎖/L 용액을 사용하고 20∼45℃에서 0.5∼2분간 실시하며 이후에 수세 2∼3단을 실시한다. 중화공정은 탈지ㆍ에칭 공정 중에 섬유 표면에 흡착되어 있는 알카리 액을 중화시키는 공정으로서 다음 식과 같이 섬유 표면의 수산화나트륨이 염산에 의해 중화된다.In the neutralization step, 20 to 150 ml / L solution of 35 to 36% hydrochloric acid is used, and 0.5 to 2 minutes is carried out at 20 to 45 ° C, followed by 2 to 3 steps of washing with water. The neutralization step is a step of neutralizing the alkaline liquid adsorbed on the fiber surface during the degreasing and etching process, in which sodium hydroxide on the fiber surface is neutralized by hydrochloric acid as shown in the following equation.
NaOH + HCl → NaCl + H2ONaOH + HCl → NaCl + H2O
산처리 공정에서, 35-36% 염산 20∼150㎖/L 용액을 사용하고 20∼45℃에서 0.5∼2분간 실시한다. 산처리 공정은 후속 공정인 촉매화 공정에서 사용되는 팔라듐 콜로이드 액 중에서의 콜로이드 입자의 응집을 방지하기 위하여 Cl- 이온을 보충하여 주어야 할 필요가 있다. 팔라듐 콜로이드 액중에서 Cl- 이온 농도가 저하되면 콜로이드가 응집하여 촉매액의 안정성이 저하되고 연속 도금에 있어서 미도금, 도금 얼룩의 원인이 된다.In the acid treatment step, a 20-150 mL / L solution of 35-36% hydrochloric acid is used and carried out at 20-45 ° C. for 0.5-2 minutes. The acid treatment process needs to be supplemented with Cl- ions in order to prevent aggregation of the colloidal particles in the palladium colloidal liquid used in the subsequent catalysis process. When the concentration of Cl- ions in the palladium colloidal solution is lowered, the colloid aggregates, which lowers the stability of the catalyst solution and causes unplating and plating unevenness in continuous plating.
촉매화 공정에서, 염화팔라듐과 염화주석 및 염산을 함유하고 있는 Pd 콜로이드 촉매액을 사용하여 20∼45℃에서 30초∼5분간 실시하고 완료 후 수세 2∼3단을 실시한다. 촉매화 공정은 피도금체 표면에서만 선택적으로 금속이 석출되도록 팔라듐 촉매층을 형성한다. 여기서 흡착된 팔라듐 입자가 도금액 중에서 환원제의 산화반응에 대한 촉매로서 작용하게 된다. 팔라듐 촉매액은 염화 팔라듐, 염화주석 및 염산을 함유하고 있으며 필요에 따라서 분산제, 안정제 및 다른 금속 이온을 함 유하기도 한다. 이 용액 중에서 2가의 주석이 4가의 주석으로 산화하면서 방출한 전자를 2가의 팔라듐 이온이 받아서 팔라듐 금속으로 환원하는 반응이 일어난다.In the catalysis step, Pd colloidal catalyst solution containing palladium chloride, tin chloride, and hydrochloric acid is used for 30 seconds to 5 minutes at 20 to 45 ° C, followed by washing with water to two to three stages. The catalysis process forms a palladium catalyst layer to selectively deposit metal only on the surface of the plated body. The palladium particles adsorbed here act as a catalyst for the oxidation reaction of the reducing agent in the plating liquid. The palladium catalyst solution contains palladium chloride, tin chloride and hydrochloric acid and may contain dispersants, stabilizers and other metal ions, if necessary. In this solution, divalent tin is oxidized to tetravalent tin, and the electrons emitted are received by divalent palladium ions and reduced to palladium metal.
Sn2+ + Pd2+ → Sn4+ + Pd0Sn2 + + Pd2 + → Sn4 + + Pd0
활성화 공정에서, 98% 황산 10∼100㎖/L 용액을 사용하여 15~60℃에서 30초∼5분간 실시한다. 활성화 공정은 피도금체 표면에 팔라듐 촉매핵을 정착시키는 공정으로 촉매 활성도를 향상시킨다. 촉매화 공정에서 흡착된 Pd-Sn 콜로이드 입자는 촉매화 공정 후의 수세 공정에서 가수분해에 의해 2가의 주석 이온이 Sn(OH)2로 되거나 Sn(OH)4로 된다. 활성화 공정은 Sn(OH)2 혹은 Sn(OH)4 층을 제거하여 촉매활성이 높은 팔라듐 촉매층을 형성시킨다.In the activation step, it is carried out at 15 to 60 ° C. for 30 seconds to 5 minutes using a 10% to 100 ml / L solution of 98% sulfuric acid. The activation process is a process of fixing the palladium catalyst nucleus on the surface of the plated body to improve the catalytic activity. The Pd-Sn colloidal particles adsorbed in the catalysis step are converted into Sn (OH) 2 or Sn (OH) 4 by hydrolysis in the washing step after the catalysis step. The activation process removes the Sn (OH) 2 or Sn (OH) 4 layer to form a high catalytic activity palladium catalyst layer.
본 발명의 제3단계(S300)는 무전해 니켈 도금공정(S320), 무전해 동 도금공정(S340), 전기 구리 도금공정(S350), 치환주석 도금공정(S360), 전기주석 도금공정(S380)의 순으로 선택적으로 실시하되, 좀 더 구체적으로 이와 같은 본 발명의 제3단계(S300)는 <표 1>처럼 11가지 실시예로 구현될 수 있으나 이에 국한되지 않고 용도에 따라 다양한 조합을 선택할 수 있다.The third step (S300) of the present invention is an electroless nickel plating process (S320), an electroless copper plating process (S340), an electro copper plating process (S350), a substituted tin plating process (S360), an electro tin plating process (S380) Optionally, but the third step (S300) of the present invention may be implemented in 11 embodiments as shown in Table 1, but is not limited thereto, and select various combinations according to the use. Can be.
세부공정을 살피면, 무전해 니켈 도금공정(S320)은 황산니켈6수화물 0.02∼0.2mol/L + 구연산 혹은 구연산나트륨2수화물 0.02∼0.2mol/L + 차아인소다1수화물 0.02∼0.2mol/L + 소량의 안정제를 함유하고 있는 도금액에 암모니아수를 첨가하여 pH 8.0∼10.0의 범위에서 수행하고, 무전해 동 도금공정(S340)은 황산구리 0.03∼0.07mol/L, 착화제 0.3∼0.21mol/L, 포름알데하이드 0.03∼0.07mol/L, 가성소다 0.1∼0.4mol/L, 소량의 안정제를 함유하는 용액을 사용하여 수행하고, 전기 구리 도금공정(S350)은 황산동5수화물 0.03∼0.7mol/L, 황산 0.1∼2.0mol/L, 안정제를 함유하고 있는 전기 동 도금액을 사용하여, 15∼60℃에서 0.5∼20A/d㎡의 전류밀도로 30초~10분간 수행하고, 치환주석 도금공정(S360)은 5∼50g/L의 메탄설폰산, 2∼2.5g/L의 주석이온, 2∼75g/L의 티오요소, 20~120g/L의 글루콘산나트륨, 1~60g/L의 하이드로퀴논, 및 소량의 안정제를 함유하고 있는 도금액을 사용하여 수행하고, 전기주석 도금공정(S380)은 50∼150g/L의 메탄설폰산, 2∼2.5g/L의 주석이온, 소량의 안정제를 함유하고 있는 도금액을 사용하여 수행한다.In detail, the electroless nickel plating process (S320) includes nickel sulfate hexahydrate 0.02 to 0.2 mol / L + citric acid or sodium citrate dihydrate 0.02 to 0.2 mol / L + hypophosphoric monohydrate 0.02 to 0.2 mol / L + Ammonia water was added to the plating liquid containing a small amount of stabilizer to carry out in the range of pH 8.0 to 10.0, and the electroless copper plating process (S340) was 0.03 to 0.07 mol / L copper sulfate, 0.3 to 0.21 mol / L complexing agent, and form Aldehyde 0.03-0.07 mol / L, caustic soda 0.1-0.4 mol / L, using a solution containing a small amount of stabilizer, the electro-copper plating process (S350) is copper sulfate pentahydrate 0.03-0.7 mol / L, sulfuric acid 0.1 Using an electrolytic copper plating solution containing ˜2.0 mol / L and a stabilizer, 30 seconds to 10 minutes at a current density of 0.5 to 20 A / dm 2 at 15 to 60 ° C. was performed. 50 g / L methanesulfonic acid, 2-2.5 g / L tin ions, 2-75 g / L thiourea, 20-120 g / L sodium gluconate, 1-60 g / L Iroquinone and a plating solution containing a small amount of stabilizer were used, and the electro tin plating process (S380) was carried out using 50 to 150 g / L methanesulfonic acid, 2 to 2.5 g / L tin ion, and a small amount of stabilizer. It is carried out using a plating solution containing.
본 발명에서 이하의 공정은 하기의 실시예1, 실시예2, 실시예9를 예시하나 나머지 실시예의 경우에도 수행 방식은 동일하다.In the present invention, the following process illustrates the following Examples 1, 2, and 9, but the same manner as in the remaining examples.
[실시예1] 전기 주석 도금법에 의한 도전 섬유Example 1 Conductive Fiber by Electro Tin Plating
무전해 니켈 도금공정에서, 황산니켈6수화물 0.02∼0.2mol/L + 구연산 혹은 구연산나트륨2수화물 0.02∼0.2mol/L + 차아인소다1수화물 0.02∼0.2mol/L + 소량의 안정제를 함유하고 있는 도금액에 암모니아수를 첨가하여 pH를 8.0∼10.0의 범위로 조정한 후, 35∼60℃에서 1∼10분간 도금을 실시하고 수세 2∼3단을 실시한다.In electroless nickel plating process, nickel sulfate hexahydrate 0.02-0.2 mol / L + citric acid or sodium citrate dihydrate 0.02-0.2 mol / L + hypophosphoric monohydrate 0.02-0.2 mol / L + small amount of stabilizer After adding ammonia water to a plating liquid and adjusting pH to the range of 8.0-10.0, plating is performed for 1 to 10 minutes at 35-60 degreeC, and washing with water is performed 2-3 steps.
전기주석 도금공정에서, 50∼150g/L의 메탄설폰산, 2∼2.5g/L의 주석이온(메탄설폰산주석으로 첨가), 소량의 안정제를 함유하고 있는 도금액 사용하여, 15∼60℃에서 0.5~20A/d㎡의 전류밀도로 1∼10분간 도금을 실시하고 수세 2∼3단을 실시한다.In the electroplating process, use a plating solution containing 50 to 150 g / L methanesulfonic acid, 2 to 2.5 g / L tin ions (added as methanesulfonic acid tin) and a small amount of stabilizer at 15 to 60 ° C. Plating is carried out at a current density of 0.5 to 20 A / dm 2 for 1 to 10 minutes, followed by washing with water to 2 to 3 steps.
마지막으로 통상적인 변색방지처리 공정(S400)을 수행하고 수세 2∼3단을 실시한 다음 건조한다.Finally, the conventional discoloration prevention treatment step (S400) is performed, followed by washing with water and two to three steps, followed by drying.
[실시예2] 치환 주석 도금법에 의한 도전 섬유의 제조 공정Example 2 Manufacturing Process of Conductive Fiber by Substituted Tin Plating
무전해 니켈 도금공정에서, 황산니켈6수화물 0.02∼0.2mol/L + 구연산 혹은 구연산나트륨2수화물 0.02∼0.2mol/L + 차아인소다1수화물 0.02∼0.2mol/L + 소량의 안정제를 함유하고 있는 도금액에 암모니아수를 첨가하여 pH를 8.0∼10.0의 범위로 조정한 후, 35∼60℃에서 1∼10분간 도금을 실시하고 수세 2∼3단을 실시한다.In electroless nickel plating process, nickel sulfate hexahydrate 0.02-0.2 mol / L + citric acid or sodium citrate dihydrate 0.02-0.2 mol / L + hypophosphoric monohydrate 0.02-0.2 mol / L + small amount of stabilizer After adding ammonia water to a plating liquid and adjusting pH to the range of 8.0-10.0, plating is performed for 1 to 10 minutes at 35-60 degreeC, and washing with water is performed 2-3 steps.
무전해 동 도금공정에서, 황산구리 0.03∼0.07mol/L, 착화제 0.3∼0.21mol/L, 포름알데하이드 0.03∼0.07mol/L, 가성소다 0.1∼0.4mol/L, 소량의 안정제를 함유하는 용액 사용하여, 35∼60℃에서 2분∼15분간 도금을 실시하고 수세 2∼3단을 실시한다.In the electroless copper plating process, a solution containing 0.03 to 0.07 mol / L copper sulfate, 0.3 to 0.21 mol / L complexing agent, 0.03 to 0.07 mol / L formaldehyde, 0.1 to 0.4 mol / L caustic soda and a small amount of stabilizer is used. Then, plating is carried out at 35 to 60 ° C. for 2 to 15 minutes, followed by washing with water to 2 to 3 steps.
치환주석 도금공정에서, 5∼50g/L의 메탄설폰산, 2∼2.5g/L의 주석이온(메탄설폰산주석으로 첨가), 2∼75g/L의 티오요소, 20∼120g/L의 글루콘산나트륨, 1∼60g/L의 하이드로퀴논, 및 소량의 안정제를 함유하고 있는 도금액을 사용하여, 25∼60℃에서 1∼10분간 도금을 실시하고 수세 2∼3단을 실시한다.In the substituted tin plating process, 5 to 50 g / L methanesulfonic acid, 2 to 2.5 g / L tin ions (added as tin methanesulfonic acid tin), 2 to 75 g / L thiourea, and 20 to 120 g / L glue Plating is performed at 25 to 60 ° C. for 1 to 10 minutes using a plating solution containing sodium chorate, 1 to 60 g / L hydroquinone, and a small amount of stabilizer, followed by washing with water to two to three stages.
마지막으로 통상적인 변색방지처리 공정(S400)을 수행하고 수세 2∼3단을 실시한 후 탈수공정(S500)과 건조공정(S600)을 거친다.Finally, after performing the conventional discoloration prevention treatment process (S400) and performing the water washing 2-3 stages, the dehydration process (S500) and the drying process (S600).
이와 같은 치환도금은 특정의 산업용 분야에서만 제한적으로 사용되는 것이며 피막두께가 매우 얇게 유지된다.Such substitution plating is used only in certain industrial fields and the film thickness is kept very thin.
[실시예9] 무전해 동 도금 후 전기 주석 도금법에 의한 도전 섬유의 제조 공정Example 9 Manufacturing Process of Conductive Fiber by Electro Tin Plating Method after Electroless Copper Plating
무전해 동 도금공정에서, 황산구리 0.03∼0.07mol/L, 착화제 0.3∼0.21mol/L, 포름알데하이드 0.03∼0.07mol/L, 가성소다 0.1∼0.4mol/L, 소량의 안정제를 함유하는 용액을 사용하여, 35∼60℃에서 2분∼15분간 도금을 실시하고 수세 2∼3단을 실시한다.In the electroless copper plating process, a solution containing 0.03-0.07 mol / L copper sulfate, 0.3-0.21 mol / L complexing agent, 0.03-0.07 mol / L formaldehyde, 0.1-0.4 mol / L caustic soda, and a small amount of stabilizer Using it, plating is performed at 35-60 degreeC for 2 to 15 minutes, and water washing 2-3 steps are performed.
전기주석 도금공정에서, 50∼150g/L의 메탄설폰산, 2∼2.5g/L의 주석이온(메탄설폰산주석으로 첨가), 소량의 안정제를 함유하고 있는 도금액을 사용하여, 15∼60℃에서 0.5~20A/d㎡의 전류밀도로 1∼10분간 도금을 실시하고 수세 2∼3단을 실시한다.15 to 60 ° C using a plating solution containing 50 to 150 g / L methanesulfonic acid, 2 to 2.5 g / L tin ions (added with methanesulfonic acid tin) and a small amount of stabilizer in the electroplating process Plating is performed for 1 to 10 minutes at a current density of 0.5 to 20 A / dm 2, followed by two to three steps of washing with water.
마지막으로 통상적인 변색방지처리 공정(S400)을 수행하고 수세 2∼3단을 실시한 다음, 탈수공정(S500)과 건조공정(S600)을 거친다.Finally, after performing the conventional discoloration preventing treatment process (S400) and performing the water washing 2-3 stages, the dehydration process (S500) and the drying process (S600).
이와 같은 방식에 의하면 유연성이 우수한 도전 섬유를 생성할 수 있으며, 전자파 차폐용 가스캣 및 테이프에 사용될 경우 접촉 면적이 향상으로 실드 특성이 향상된다. 니켈의 사용을 최소화하거나 니켈프리(Ni-Free)가 가능하여 도전 섬유의 제조현장 및 사용자의 입장에서 니켈 알러지 대책의 수립이 용이하다.According to this method, it is possible to produce a conductive fiber having excellent flexibility, and when used in the electromagnetic shielding gasket and tape, the contact area is improved to improve the shield characteristics. By minimizing the use of nickel or using nickel-free (Ni-Free), it is easy to establish the nickel allergy countermeasure from the manufacturing site of the conductive fiber and the user.
본 발명은 기재된 실시예에 한정되는 것은 아니고, 본 발명의 사상 및 범위를 벗어나지 않고 다양하게 수정 및 변형할 수 있음은 이 기술의 분야에서 통상의 지식을 가진 자에게 자명하다. 따라서 그러한 변형예 또는 수정예들은 본 발명의 특허청구범위에 속한다 해야 할 것이다.It is apparent to those skilled in the art that the present invention is not limited to the described embodiments, and that various modifications and variations can be made without departing from the spirit and scope of the present invention. Therefore, such modifications or variations will have to belong to the claims of the present invention.
도 1은 본 발명의 제1실시예에 의한 제조방법을 나타내는 공정흐름도.1 is a process flow diagram showing a manufacturing method according to the first embodiment of the present invention.
도 2는 본 발명의 제2실시예에 의한 제조방법을 나타내는 공정흐름도.Figure 2 is a process flow diagram showing a manufacturing method according to a second embodiment of the present invention.
도 3은 본 발명의 제9실시예에 의한 제조방법을 나타내는 공정흐름도.Figure 3 is a process flow diagram showing a manufacturing method according to a ninth embodiment of the present invention.
* 도면의 주요부분에 대한 부호 설명 *Explanation of symbols on the main parts of the drawings
S100: 제1단계 S200: 제2단계S100: first step S200: second step
S300: 제3단계(제1실시예) S300: 제3단계(제2실시예)S300: third step (first embodiment) S300: third step (second embodiment)
S300: 제3단계(제9실시예) S400제4단계S300: third step (ninth embodiment) S400 fourth step
S500: 탈수공정 S600: 건조공정S500: Dehydration Process S600: Drying Process
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ITMI20101117A1 (en) * | 2010-06-18 | 2011-12-19 | Soliani Emc S R L | METALLIZATION OF TEXTILE STRUCTURES |
KR20180118554A (en) * | 2017-04-21 | 2018-10-31 | 주식회사 아모그린텍 | Method of manufacturing printed circuit nano-fiber web, printed circuit nano-fiber web thereby and electronic device comprising the same |
US11324123B2 (en) | 2017-04-21 | 2022-05-03 | Amogreentech Co., Ltd | Printed circuit nanofiber web manufacturing method |
US11359064B2 (en) | 2017-11-15 | 2022-06-14 | Amogreentech Co., Ltd. | Composition for producing graphite-polymer composite and graphite-polymer composite produced therethrough |
US11839855B2 (en) | 2017-06-09 | 2023-12-12 | Amogreentech Co., Ltd. | Filter medium, manufacturing method therefor, and filter unit including same |
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ITMI20101117A1 (en) * | 2010-06-18 | 2011-12-19 | Soliani Emc S R L | METALLIZATION OF TEXTILE STRUCTURES |
EP2397577A1 (en) * | 2010-06-18 | 2011-12-21 | Soliani EMC S.r.l. | Metallization of textile structures |
KR20180118554A (en) * | 2017-04-21 | 2018-10-31 | 주식회사 아모그린텍 | Method of manufacturing printed circuit nano-fiber web, printed circuit nano-fiber web thereby and electronic device comprising the same |
US11324123B2 (en) | 2017-04-21 | 2022-05-03 | Amogreentech Co., Ltd | Printed circuit nanofiber web manufacturing method |
US11839855B2 (en) | 2017-06-09 | 2023-12-12 | Amogreentech Co., Ltd. | Filter medium, manufacturing method therefor, and filter unit including same |
US11359064B2 (en) | 2017-11-15 | 2022-06-14 | Amogreentech Co., Ltd. | Composition for producing graphite-polymer composite and graphite-polymer composite produced therethrough |
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