KR20100003817A

KR20100003817A - Dustproof mask

Info

Publication number: KR20100003817A
Application number: KR1020080063825A
Authority: KR
Inventors: 철 기 김
Original assignee: 코오롱패션머티리얼 (주)
Priority date: 2008-07-02
Filing date: 2008-07-02
Publication date: 2010-01-12

Abstract

The present invention relates to a dust mask, comprising a base material (A) as a fiber structure and a nanofiber web (B) composed of nanofibers having an average diameter of 10 to 1,500 nm, wherein the nanofibers contain 0.1 to 0.1 weight of the nanofibers. It contains 5.0% by weight of an antistatic agent and has a surface charge half life of 30 minutes or less as measured by KS K 0555 method.

The dust mask according to the present invention is useful as a mask for semiconductor production sites, which is excellent in antistatic property and dust collection efficiency and at the same time has low face intake resistance and facilitates the wearer's breathing.

Description

Dust mask {Dustproof mask}

The present invention relates to a dust mask, and more particularly, including a nanofiber web containing an antistatic agent, while having excellent dustproof efficiency and low inspiratory resistance to the face, it is easy to breathe when worn, and particularly to an antistatic mask having excellent antistatic properties. It is about.

Recently, as the yellow dust phenomenon worsens, a dust mask (hereinafter referred to as a dust mask) is widely used as a general household product. Dust masks are also used in industrial production sites, such as semiconductor production sites and shipyards.

The dust mask is required to effectively collect fine dust (dust) present in the atmosphere, that is, excellent dust collection efficiency, and at the same time requires a low face intake resistance to facilitate breathing when worn.

In general, however, when the density of the dust mask material is increased to increase the dust collection efficiency, the face intake resistance also increases, making it difficult to breathe when worn. On the contrary, when the density of the dust mask material is lowered to decrease the face intake resistance, The problem of poor dust collection efficiency arises.

In particular, in the case of a dust mask for semiconductor production sites, antistatic properties are required to prevent the generation of static electricity.

However, the conventional dust mask has a problem that the antistatic property is mainly made of synthetic fibers.

As a conventional dust mask, a dust mask made of a single material such as woven fabric, knitted fabric, nonwoven fabric, spunbond, or the like, or a dust mask having a structure in which a nonwoven fabric layer is arranged between woven fabric or knitted fabric has been widely used. The woven fabrics, knitted fabrics, nonwoven fabrics, and spunbonds were composed of short or long fibers having a single yarn fineness of 0.01 denier or more. Compared to a dust mask made of a single material such as woven fabric, knitted fabric, nonwoven fabric, and spun bond, the dust mask having a structure in which a nonwoven fabric layer as a filter material is arranged between the base fabric or the knitted fabric has an excellent dust collection efficiency and durability.

However, since the single yarn fineness of the short fibers or the long fibers constituting the materials such as nonwoven fabrics used in the conventional dust mask is 0.01 denier or more, there is a problem in that fine voids are not sufficiently formed in the material and thus dust collection efficiency is lowered.

On the other hand, in order to increase the dust density constituting the dust mask in order to increase the dust collection efficiency, as described above, there was a problem in that the intake resistance of the face increases, making it difficult to breathe when worn.

In order to solve this problem, as in Japanese Patent Application No. 1995-296507, attempts have been made to develop a technique for reducing the intake resistance of the face portion, such as a mask in which a fabric and a knitted fabric are disposed and partially bonded. However, this method can reduce the intake resistance of the face portion, but has a disadvantage in that it is difficult to expect a filtration function for fine dust such as yellow sand. In order to secure filtration efficiency for fine dust, a mask made by applying a porous membrane made of polytetrafluoroethylene was developed as in Japanese Patent Application No. 1998-324929 or Japanese Patent Application No. 2007-515616. However, this method is disadvantageous in that the cost of the polytetrafluoroethylene porous membrane is limited and the production is limited.

The dust mask of the related art is composed of synthetic fibers having high hydrophobicity and low conductivity, as in Korean Patent Application No. 1998-0050924. There was an inappropriate problem with the mask.

The present invention is to provide a dust mask with excellent dust collection efficiency and low face intake resistance to ease the breathing when wearing, antistatic properties to solve such a conventional problem.

The dust mask of the present invention for achieving the above object comprises a nanofiber web (B) consisting of a base material (A) which is a fiber structure and nanofibers having an average diameter of 10 ~ 1500nm, the nanofibers 0.1 to 5.0% by weight of the antistatic agent is contained, the surface charge half-life measured by KS K 0555 method is characterized in that less than 30 minutes.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

First, the dust mask according to the present invention is a nanofiber web composed of a substrate (A) which is a fiber structure and fibers having an average diameter of 10 to 1,500 nm (hereinafter referred to as "nano fibers") as shown in FIGS. 1 to 3. (B).

1 to 3 are cross-sectional schematic diagrams of a dust mask according to the present invention.

Nanofibers constituting the nanofiber web (B) contains an antistatic agent of 1.0 to 5.0% by weight relative to the total weight of the nanofibers.

As the antistatic agent, a surfactant, conductive carbon, metal particles, and a conductive polymer may be used.

The conductive polymer may be polyaniline, polypyrrole, polythiophene, poly (3,4-ethylenedioxythiophene), or the like.

Silver (Ag) particles and the like may be used as the metal particles, and the surfactant may be a bio based, cationic, anionic or amphoteric surfactant.

In the present invention, the type of antistatic agent is not particularly limited.

The dust mask according to the present invention has a surface charge half life of 30 minutes or less, more preferably 5 to 30 minutes, as measured by the KS K 0555 method, and has excellent antistatic property.

When the content of the antistatic agent in the nanofibers is less than 1.0% by weight, the surface charge half-life of the dustproof mask exceeds 30 minutes, and when the content exceeds 5.0% by weight, the surface charge half-life of the dustproof mask decreases to 30 minutes or less. The problem that electrospinability falls is produced.

Each of the base material (A) and the nanofiber web (B) is preferably one to three layers, but the number of these layers is not particularly limited in the present invention.

According to the present invention, the anti-vibration mask may have a structure in which one layer of nanofiber webs (B) are laminated on a substrate (A) as shown in FIG. 1, and two layers of one layer of nanofiber webs (B) as shown in FIG. 2. It may be a structure arranged between the substrate (A) of, or as shown in Figure 3 each of the two nanofiber web (B) may be a structure arranged between the three substrates (A).

Nanofibers constituting the nanofiber web (B) is selected from polyamide resin, polysulfone resin, polyurethane resin, polyvinylidene difluoride resin, polymethyl acrylate resin, polystyrene resin, polyacrylic acid resin or It consists of resins, such as species or more.

The average diameter of the nanofibers constituting the nanofiber web (B) is 10 ~ 1,500nm, if less than 10nm is difficult to manufacture or the face intake resistance is increased, when the dust collection efficiency exceeds 1,500nm The problem of deterioration arises.

The nanofiber web (B) is preferably formed with pores having an average diameter of 0.5 ~ 10㎛.

If the average diameter of the pores is less than 0.5㎛ high intake resistance of the face portion is difficult to breathe when manufacturing the mask, if it exceeds 10㎛ dust collection efficiency may be lowered.

The average diameter of the pores is measured by the ASTM F 316-03 method.

The weight per unit area of the nanofiber web (B) is preferably 0.1 ~ 5g / ㎡.

When the weight per unit area is less than 0.1 g / m 2, the dust collection efficiency is lowered. When the weight per unit area is more than 5 g / m 2, the inhalation resistance of the face part is increased, which may make it difficult to breathe when manufacturing a mask.

Next, the nanofiber web (B) is a stack of nanofibers having an average diameter of 10 ~ 1500nm, can be produced by the electrospinning method shown in FIG.

Figure 4 is a process schematic diagram of producing a nanofiber web (B) included in the present invention by an electrospinning method.

Specifically, after supplying the spinning solution of the polymer resin containing the antistatic agent stored in the spinning liquid main tank 1 to the nozzle (3) subjected to high voltage using the metering pump (2), the nozzle (3) The spinning solution is electrospun onto the collector 4 subjected to the high voltage to form nanofibers, so that the nanofiber web is stacked on the collector 4.

The high voltage generated by the voltage generator 6 is applied to the nozzle 3 and the collector 4 through the voltage transfer rod 5.

There is no restriction | limiting in particular in the electrospinning apparatus used by this invention. An electrospinning apparatus using multiple nozzles as shown in FIG. 4 may be used, and other types of electrospinning apparatus may also be used. The electrospinning apparatus comprises a spinner comprising a metering pump (2) for supplying a polymer solution and a plurality of nozzles (3), a high voltage generator by the high voltage generator (6) and a collector for fixing the nanofibers that are spun and volatilized ( 4) consists of. The generated voltage for spinning the nanofibers of the present invention can be variously applied in consideration of the concentration of the polymer solution to thousands of hundreds of thousands of volts, the amount of the polymer solution supplied through the metering pump, and the thickness of the nanofibers to be obtained. .

In the case of electrospinning, the voltage is preferably 12,000 to 200,000 volts (V), and the radiation distance, which is the distance between the nozzle and the collector, is preferably 5 to 25 cm.

On the other hand, the base material (A), which is the fibrous structure, is a nonwoven fabric, a woven fabric, a knitted fabric, or a spunbond.

Looking at an example of a method of manufacturing a dust mask according to the present invention, while continuously passing the substrate (A) to the collector (4) of Figure 4 by the step of electrospinning the nanofibers on it to laminate the nanofiber web (B) Dust masks as shown in Figure 1 may be prepared.

In addition, by attaching or laminating the substrate (A) on the nanofiber web (B) laminated on the substrate (A) or by laminating and sewing can be prepared a dust mask as shown in FIG.

The dust mask according to the present invention has excellent surface charge half life of 30 minutes or less, more preferably 5 to 30 minutes, measured by the KS K 0555 method.

In addition, the dust mask according to the present invention has an average diameter of 0.3 ~ 1㎛ fine dust dust collecting efficiency of 95% or more measured by the face part filtration dust mask performance measurement method according to KS K 6673, face part according to KS K 6673 The face intake resistance measured by the filtration dust mask performance measurement method is 6 mm H ₂ O or less.

Since the present invention includes a nanofiber web (B) made of nanofibers containing an antistatic agent, the antistatic property is excellent, and dust collection efficiency is excellent, but the face part has low inspiratory resistance, and thus has an advantage of easy breathing when worn.

Therefore, the present invention is particularly useful as a mask for semiconductor production.

Hereinafter, the present invention will be described in detail through examples.

However, the following examples show one example of the present invention, and the protection scope of the present invention is not limited only to the following examples.

Example One

A spinning solution was prepared by adding 12 wt% of conductive carbon particles to the total weight of the solution in a solution in which a polyamide resin having a relative viscosity of 2.5 was dissolved in a formic acid solution at a concentration of 20% (w / w).

Collector 4, the voltage of 28,000 volts (V) through the nozzle 3 is applied to the spinning solution through the metering pump (2) of the electrospinning device shown in Figure 4 The nanofiber web (B) having an average diameter of 3 g / m 2 and a pore diameter of 3 μm by electrospinning on the polypropylene nonwoven substrate (A) passing through the layer was laminated with nanofibers having an average diameter of 500 nm. Was laminated on the substrate (A) to prepare a dust mask having a cross-sectional structure as shown in FIG.

The content of the conductive carbon particles in the nanofibers was 2.0% by weight.

The results of evaluating various physical properties of the prepared dust mask (A) were as shown in Table 1.

Example 2

A spinning solution by adding 14% by weight of silver (Ag) particles to the total weight of the solution to a solution of polyvinylidene difluoride having a weight average molecular weight of 520,000 in dimethylacetamide at a concentration of 15% (w / w). Was prepared.

Collector 4, the voltage of 20,000 volts (V) through the nozzle 3 is applied to the spinning solution through the metering pump (2) of the electrospinning device shown in Figure 4 Nanofiber webs (B) having an average diameter of 3 g / m 2 and a pore diameter of 4 μm by electrospinning on a polyester nonwoven substrate (A) passing through the layer are laminated with nanofibers having an average diameter of 700 nm. After the laminated on the substrate (A), the polyester nonwoven substrate (A) was again laminated on the nanofiber web (B) to prepare a dust mask as shown in FIG.

The content of silver (Ag) particles in the nanofibers was 3.0% by weight.

Example 3

15% by weight of poly (3,4-ethylenedioxythiophene) based on the total weight of the solution in a solution in which a thermoplastic polyurethane resin having a weight average molecular weight of 200,000 was dissolved in dimethylformamide at a concentration of 20% (w / w). Powder was added to prepare a spinning solution.

Collector 4, the voltage of 40,000 volts (V) through the nozzle 3 is applied to the spinning solution through the metering pump (2) of the electrospinning device shown in Figure 4 Nanofiber web (B) having an average diameter of 2 g / m 2 and a pore diameter of 2 μm by laminating nanofibers having an average diameter of 400 nm by electrospinning onto the substrate (A) of the nylon nonwoven fabric passing through the stomach Was laminated.

The content of the poly (3,4-ethylenedioxythiophene) powder in the nanofibers was 4.0 wt%.

Subsequently, the substrate A, which is a nylon nonwoven fabric, is laminated on the nanofiber web B again, and then passed through the collector 4 of the electrospinning apparatus shown in FIG. Electrospinning was carried out in the same manner as described in the electrospinning conditions, and the nanofibers having an average diameter of 400 nm were laminated, and a nanofiber web (B) having a weight per unit area of 2 g / m 2 and an average diameter of pores of 2 μm was laminated again. A dustproof mask as shown in FIG. 3 was prepared by laminating the base (A), which is a nylon nonwoven fabric, on the nanofiber web (B).

Property evaluation result of dust mask division Example 1 Example 2 Example 3 Surface charge half-life (min) measured by KS K 0555 method 20 17 14 Dust collection efficiency of fine dust with average diameter of 0.3 ~ 1㎛ measured by face filtration dust mask performance measuring method according to KS K 6673 97 95 99 Face intake resistance measured by the method of measuring the face filtration dust mask according to KS K 6673 (mmH ₂ O) 5.3 4.8 5.6

The surface charge half life was measured at a friction band voltage of 500 to 1,000 volts according to the KS K 0555 method.

1 to 3 is a schematic cross-sectional view of the dust mask according to the present invention.

Figure 4 is a schematic diagram of a process for producing a nanofiber web (B) included in the present invention by an electrospinning method.

5 is an electron micrograph of the surface of the nanofiber web (B) included in the present invention.

* Code description for main parts of the drawings

A: base material B: nanofiber web

1: spinning liquid main tank 2: metering pump

3: nozzle 4: collector

5: voltage transfer rod 6: voltage generator

Claims

It comprises a base material (A) as a fiber structure and a nanofiber web (B) composed of nanofibers having an average diameter of 10 to 1500 nm, wherein the nanofibers contain an antistatic agent of 0.1 to 5.0% by weight based on the weight of the nanofibers. Dust mask characterized in that the half-life of the surface charge half-life measured by the KS K 0555 method.

The antivibration mask according to claim 1, wherein the antistatic mask has a surface charge half-life of 5 to 30 minutes as measured by the KS K 0555 method.

The antistatic mask according to claim 1, wherein the antistatic agent is at least one selected from conductive carbon, metal particles, surfactants, and conductive polymers.

The method of claim 1, wherein the nanofibers constituting the nanofiber web (B) is a polyamide resin, polysulfone resin, polyurethane resin, polyvinylidene difluoride resin, polymethyl methacrylate resin, polystyrene resin and polyacrylic acid Dust mask characterized in that it is composed of one or more resins selected from the group consisting of resins.

The anti-vibration mask according to claim 1, wherein the base material (A), which is a fiber structure, is one selected from the group consisting of a nonwoven fabric, a woven fabric, a knitted fabric, and a spunbond.

The dust mask according to claim 1, wherein the nanofiber web (B) has pores having an average diameter of 0.5 to 10 µm.

The dust mask according to claim 1, wherein the weight per unit area of the nanofiber web (B) is 0.1 to 5 g / m 2.

The dust mask according to claim 1, wherein the nanofiber web (B) is laminated on the substrate (A) which is a fibrous structure.

The dust mask according to claim 1, wherein the nanofiber web (B) is arranged between the substrates (A) which are fiber structures.

The dust mask according to claim 1, wherein the dust mask has a dust collecting efficiency of 95% or more of fine dust having an average diameter of 0.3 to 1 µm as measured by the method of measuring face part dust mask according to KS K 6673. .

The dust mask according to claim 1, wherein the dust mask has a face part intake resistance of 6 mm H ₂ O or less measured by a method of measuring face part type dust mask performance according to KS K 6673.