KR20100004141A

KR20100004141A - Dustproof mask

Info

Publication number: KR20100004141A
Application number: KR1020080064161A
Authority: KR
Inventors: 철 기 김
Original assignee: 코오롱패션머티리얼 (주)
Priority date: 2008-07-03
Filing date: 2008-07-03
Publication date: 2010-01-13

Abstract

PURPOSE: A dustproof mask is provided, which improves dust collection efficiency and makes respiration of a wearer facilitated. CONSTITUTION: A dustproof mask comprises a fibrous structure material(A); and nano-fiber web(B) which is made of nano-fibers consisting of the hydrophilic polymer and whose average diameter is 10~1,500 nanometers. The nano-fiber web has facial area leak rate of 10% or less which is measured at the facial area filtration type dustproof mask performance measuring method.

Description

Dust mask {Dustproof mask}

The present invention relates to a dust mask, and more specifically, a dust mask material is well adhered to a wearer's face bend when worn, including a nanofiber web made of a hydrophilic polymer, so that the face leakage rate is low, and thus the face part intake is excellent. It relates to a dust mask that is easy to breathe when worn with low resistance.

Recently, as the yellow dust phenomenon worsens, a dust mask (hereinafter referred to as a dust mask) is widely used as a general household product. Dust masks are also used in industrial sites such as shipyards where a lot of fine dust is generated.

The dust mask is required to effectively collect fine dust (dust) present in the atmosphere, that is, excellent dust collection efficiency, and at the same time requires a low face intake resistance to facilitate breathing when worn.

However, in general, when the density of the dust mask material is increased in order to increase the dust collection efficiency, the face air intake resistance is also increased, which makes it difficult to breathe when worn. On the contrary, when the density of the dust mask material is low to reduce the face air intake resistance, The problem of poor dust collection efficiency occurs.

In addition, the dust mask also requires a low face leakage rate to increase dust collection efficiency.

As a conventional dust mask, a dust mask made of a single material such as woven fabric, knitted fabric, nonwoven fabric, spunbond, or the like, or a dust mask having a structure in which a nonwoven fabric layer is arranged between woven fabric or knitted fabric has been widely used. The woven fabrics, knitted fabrics, nonwoven fabrics, and spunbonds were composed of short or long fibers having a single yarn fineness of 0.01 denier or more. Compared to a dust mask made of a single material such as woven fabric, knitted fabric, nonwoven fabric, and spun bond, the dust mask having a structure in which a nonwoven fabric layer as a filter material is arranged between the base fabric or the knitted fabric has an excellent dust collection efficiency and durability.

However, since the single yarn fineness of the short fibers or the long fibers constituting the materials such as nonwoven fabrics used in the conventional dust mask is 0.01 denier or more, there is a problem in that fine voids are not sufficiently formed in the material and thus dust collection efficiency is lowered.

On the other hand, in order to increase the dust density constituting the dust mask in order to increase the dust collection efficiency, as described above, there was a problem in that the intake resistance of the face increases, making it difficult to breathe when worn.

In order to solve this problem, as in Japanese Patent Application No. 1995-296507, attempts have been made to develop a technique for reducing the intake resistance of the face portion, such as a mask in which a fabric and a knitted fabric are disposed and partially bonded. However, this method can reduce the intake resistance of the face part, but has a disadvantage in that it is difficult to expect a filtration function for fine dust such as yellow sand. In order to secure filtration efficiency for fine dust, a mask made by applying a porous membrane made of polytetrafluoroethylene was developed as in Japanese Patent Application No. 1998-324929 or Japanese Patent Application No. 2007-515616. However, this method is disadvantageous in that the cost of the polytetrafluoroethylene porous membrane is limited and the production is limited.

In addition, the conventional dust mask is composed of hydrophobic synthetic fibers as in Korean Patent Application No. 1998-0050924, dust collecting efficiency is increased because the dust mask material is not closely adhered to the wearer's face bend when the wear is not closely adhered There was a problem of deterioration.

In order to solve the above problems, the present invention provides a good dust collection efficiency because the dust mask material adheres well to the face flexion part of the wearer because the face leakage rate is low. We want to provide a dust mask.

The anti-vibration mask of the present invention for achieving the above problems includes a substrate (A) as a fiber structure and a nanofiber web (B) composed of nanofibers made of hydrophilic polymer with an average diameter of 10 to 1500 nm, KS K The face leakage rate measured by the face filtration dust mask performance measurement method according to 6673 is characterized in that less than 10%.

Hereinafter, the present invention will be described in detail with reference to the accompanying drawings.

First, the dust mask according to the present invention is a nanofiber web composed of a substrate (A) which is a fiber structure and fibers having an average diameter of 10 to 1,500 nm (hereinafter referred to as "nano fibers") as shown in FIGS. 1 to 3. (B).

1 to 3 are cross-sectional schematic diagrams of a dust mask according to the present invention.

Each of the base material (A) and the nanofiber web (B) is preferably one to three layers, but the number of these layers is not particularly limited in the present invention.

According to the present invention, the anti-vibration mask may have a structure in which one layer of nanofiber webs (B) are laminated on a substrate (A) as shown in FIG. 1, and two layers of one layer of nanofiber webs (B) as shown in FIG. 2. It may be a structure arranged between the substrate (A) of, or as shown in Figure 3 each of the two nanofiber web (B) may be a structure arranged between the three substrates (A).

Nanofibers constituting the nanofiber web (B) is made of a hydrophilic polymer, the hydrophilic polymer is composed of at least one resin selected from polyvinyl alcohol and polyethylene oxide.

The average diameter of the nanofibers constituting the nanofiber web (B) is 10 ~ 1,500nm, if less than 10nm is difficult to manufacture or the face intake resistance is increased, when the dust collection efficiency exceeds 1,500nm The problem of deterioration arises.

The nanofiber web (B) is preferably formed with pores having an average diameter of 0.5 ~ 10㎛.

If the average diameter of the pores is less than 0.5㎛ high intake resistance of the face portion is difficult to breathe when manufacturing the mask, if it exceeds 10㎛ dust collection efficiency may be lowered.

The average diameter of the pores is measured by the ASTM F 316-03 method.

The weight per unit area of the nanofiber web (B) is preferably 0.1 ~ 5g / ㎡.

When the weight per unit area is less than 0.1 g / m 2, the dust collection efficiency is lowered. When the weight per unit area is more than 5 g / m 2, the inhalation resistance of the face part is increased, which may make it difficult to breathe when manufacturing a mask.

Next, the nanofiber web (B) is a stack of nanofibers having an average diameter of 10 ~ 1500nm, can be produced by the electrospinning method shown in FIG.

Figure 4 is a process schematic diagram of producing a nanofiber web (B) included in the present invention by an electrospinning method.

Specifically, the spinning solution of the hydrophilic polymer resin stored in the spinning solution main tank 1 is supplied to the nozzle 3 under high voltage using the metering pump 2, and then the spinning solution through the nozzle 3. Is electrospun onto the collector 4 under high voltage to form nanofibers, such that the nanofiber web is laminated to the collector 4.

The high voltage generated by the voltage generator 6 is applied to the nozzle 3 and the collector 4 through the voltage transfer rod 5.

There is no restriction | limiting in particular in the electrospinning apparatus used by this invention. An electrospinning apparatus using multiple nozzles as shown in FIG. 4 may be used, and other types of electrospinning apparatus may also be used. The electrospinning apparatus comprises a spinner comprising a metering pump (2) for supplying a polymer solution and a plurality of nozzles (3), a high voltage generator by the high voltage generator (6) and a collector for fixing the nanofibers that are spun and volatilized ( 4) consists of. The generated voltage for spinning the nanofibers of the present invention can be variously applied in consideration of the concentration of the polymer solution to thousands of hundreds of thousands of volts, the amount of the polymer solution supplied through the metering pump, and the thickness of the nanofibers to be obtained. .

In the case of electrospinning, the voltage is preferably 12,000 to 200,000 volts (V), and the radiation distance, which is the distance between the nozzle and the collector, is preferably 5 to 25 cm.

On the other hand, the base material (A), which is the fibrous structure, is a nonwoven fabric, a woven fabric, a knitted fabric, or a spunbond.

Looking at an example of a method of manufacturing a dust mask according to the present invention, while continuously passing the substrate (A) to the collector (4) of Figure 4 by the step of electrospinning the nanofibers on it to laminate the nanofiber web (B) Dust masks as shown in Figure 1 may be prepared.

In addition, by attaching or laminating the substrate (A) on the nanofiber web (B) laminated on the substrate (A) or by laminating and sewing can be prepared a dust mask as shown in FIG.

The dust mask according to the present invention has a face part leakage rate of 10% or less, measured by a method of measuring face filtration dust mask performance according to KS K 6673.

In addition, the dust mask according to the present invention has a face part intake resistance of 6 mmH ₂ O or less measured by a face filtration dust mask performance measuring method according to KS K 6673, and an average diameter of 0.3 to 1 μm measured by the above method. The dust collection efficiency of phosphorus fine dust is more than 95%.

The present invention includes a nanofiber web (B) made of a hydrophilic polymer, the dust mask material is well adhered to the face flexion of the wearer when worn, so that the face leakage rate is low, the dust collection efficiency is excellent, but the face intake resistance is low, breathing when worn This is an easy advantage.

Therefore, the present invention is useful as an anti-dust mask or an industrial mask in which a lot of dust is generated.

Hereinafter, the present invention will be described in detail through examples.

However, the following examples show one example of the present invention, and the protection scope of the present invention is not limited only to the following examples.

Example One

Polyvinyl alcohol was dissolved in water at a concentration of 20% (w / w) to prepare a spinning solution.

Collector 4, the voltage of 28,000 volts (V) through the nozzle 3 is applied to the spinning solution through the metering pump (2) of the electrospinning device shown in Figure 4 The nanofiber web (B) having an average diameter of 3 g / m 2 and a pore diameter of 3 μm by electrospinning on the polypropylene nonwoven substrate (A) passing through the layer was laminated with nanofibers having an average diameter of 500 nm. Was laminated on the substrate (A) to prepare a dust mask having a cross-sectional structure as shown in FIG.

The results of evaluating various physical properties of the prepared dust mask (A) were as shown in Table 1.

Example 2

Polyethylene oxide was dissolved in dimethylacetamide at a concentration of 15% (w / w) to prepare a spinning solution.

Collector 4, the voltage of 20,000 volts (V) through the nozzle 3 is applied to the spinning solution through the metering pump (2) of the electrospinning device shown in Figure 4 Nanofiber webs (B) having an average diameter of 3 g / m 2 and a pore diameter of 4 μm by electrospinning on a polyester nonwoven substrate (A) passing through the layer are laminated with nanofibers having an average diameter of 700 nm. After the laminated on the substrate (A), the polyester nonwoven substrate (A) was again laminated on the nanofiber web (B) to prepare a dust mask as shown in FIG.

Example 3

Collector 4, the voltage of 40,000 volts (V) through the nozzle 3 is applied to the spinning solution through the metering pump (2) of the electrospinning device shown in Figure 4 Nanofiber web (B) having an average diameter of 2 g / m 2 and a pore diameter of 2 μm by laminating nanofibers having an average diameter of 400 nm by electrospinning onto the substrate (A) of the nylon nonwoven fabric passing through the stomach Was laminated.

Subsequently, the substrate A, which is a nylon nonwoven fabric, is laminated on the nanofiber web B again, and then passed through the collector 4 of the electrospinning apparatus shown in FIG. Electrospinning was carried out in the same manner as described in the electrospinning conditions, and the nanofibers having an average diameter of 400 nm were laminated, and a nanofiber web (B) having a weight per unit area of 2 g / m 2 and an average diameter of pores of 2 μm was laminated again. A dustproof mask as shown in FIG. 3 was prepared by laminating the base (A), which is a nylon nonwoven fabric, on the nanofiber web (B).

Property evaluation result of dust mask division Example 1 Example 2 Example 3 Facial part leakage rate (%) as measured by the face filtration dust mask performance measurement method according to KS K 6673 7 8 7 Dust collection efficiency of fine dust with average diameter of 0.3 ~ 1㎛ measured by face filtration dust mask performance measuring method according to KS K 6673 97 95 99 Face intake resistance measured by face filtration dust mask performance measurement method according to KS K 6673 (mmH ₂ O) 7 6 8

1 to 3 is a schematic cross-sectional view of the dust mask according to the present invention.

Figure 4 is a schematic diagram of a process for producing a nanofiber web (B) included in the present invention by an electrospinning method.

5 is an electron micrograph of the surface of the nanofiber web (B) included in the present invention.

* Code description for main parts of the drawings

A: base material B: nanofiber web

1: spinning liquid main tank 2: metering pump

3: nozzle 4: collector

5: voltage transfer rod 6: voltage generator

Claims

A fiber structure comprising a base material (A) and a nanofiber web (B) composed of nanofibers composed of hydrophilic polymers with an average diameter of 10 to 1,500 nm, measured by a face filtration dust mask performance measurement method according to KS K 6673. Dust mask according to claim 1, wherein the face leakage rate is 10% or less.

The anti-vibration mask according to claim 1, wherein the hydrophilic polymer is at least one selected from polyvinyl alcohol and polyethylene oxide.

The dust mask according to claim 1, wherein the base material (A), which is a fiber structure, is one selected from the group consisting of a nonwoven fabric, a woven fabric, a knitted fabric, and a spunbond.

The dust mask according to claim 1, wherein the nanofiber web (B) has pores having an average diameter of 0.5 to 10 µm.

The dust mask according to claim 1, wherein the weight per unit area of the nanofiber web (B) is 0.1 to 5 g / m 2.

The dust mask according to claim 1, wherein the nanofiber web (B) is laminated on the substrate (A) which is a fibrous structure.

The dust mask according to claim 1, wherein the nanofiber web (B) is arranged between the substrates (A) which are fiber structures.

The dust mask according to claim 1, wherein the face air intake resistance measured by the method of measuring the face dust-proof dust mask performance according to KS K 6673 is 6 mmH ₂ O or less.

The dust mask according to claim 1, wherein the dust collecting efficiency of fine dust having an average diameter of 0.3 to 1 µm measured by a face filtration dust mask performance measuring method according to KS K 6673 is 95% or more.