KR20090120039A - Wet cleaning unit for gas and wet cleaning apparatus for gas using there - Google Patents

Abstract

PURPOSE: A wet gas cleaning unit and apparatus using the same is provided to increase chemical processing efficiency, and to reduce manufacturing cost of a product drastically by installing a scattering prevention plate. CONSTITUTION: A wet gas cleaning apparatus includes a housing(11), a scrubber unit(12), a supply pipe(14), and an injection nozzle(15). The housing is installed at a movement path of the gas. The scrubber unit is installed at the housing, and includes a swirl flow generation pipe and a scattering prevention plate. A supply pipe is installed at the housing, and includes a movement way for chemicals or cleaning water. The injection nozzle is installed at the supply pipe, and sprays the cleaning water or the chemical toward gas.

Description

Wet cleaning unit for gas and wet cleaning apparatus for gas using there}

The present invention relates to a wet gas cleaning unit and a wet gas cleaning device using the same, which are manufactured in a small size so as to be installed on a moving path in a gas, and a separate installation area is provided by isolating a gas preventing unit by installing a scattering prevention plate. It does not require, the manufacturing cost is significantly reduced, the cleaning efficiency can be improved, and a wet gas cleaning unit that can significantly increase the chemical treatment efficiency by performing various types of chemical treatment collectively and using the same It relates to a wet gas cleaning device.

In general, a wet gas cleaning device is a device that neutralizes gas by injecting other polluting gases such as sulfuric acid gas and spraying washing water to clean the polluted gas or to neutralize other polluting gases.

1 is a schematic view of a conventional wet gas scrubber tower.

As shown in FIG. 1, the conventional wet gas cleaning tower 100 is connected to the first cleaning chamber 110 and the first cleaning chamber 110 in which the inlet 111 is formed and the washing water injection nozzle 112 is installed. A second cleaning chamber 120, a first chemical treatment chamber 130 installed above the second cleaning chamber 120, and a second chemical treatment chamber 140 installed above the first chemical treatment chamber 130. The second cleaning chamber 120, the first chemical treatment chamber 130, and the second chemical treatment chamber 140 are provided with fillers 121, 131, and 141 disposed at a lower portion thereof, and spray nozzles for spraying washing water or chemicals thereon. 122, 132, and 142 are provided.

In the conventional wet gas cleaning tower 100 configured as described above, when the polluted gas is introduced through the inlet 111 formed in the first cleaning chamber 110, the introduced polluted gas is injected from the washing water injection nozzle 112. The first washing is performed by the washing water, and the first washed gas passes through the filler 121 of the second washing chamber 120. In this case, the filler 121 of the second cleaning chamber 120 passes through the first cleaned gas in the state in which the washing water injected from the injection nozzle 122 installed in the upper portion is filled. The primary cleaned gas passing through the filler 121 is secondaryly cleaned by the washing water stored in the filler 121.

Subsequently, the fillers 131 and 141 of the first chemical treatment chamber 130 and the second chemical treatment chamber 140 are also filled with the respective chemicals injected from the injection nozzles 132 and 142 provided at the upper portions, and the two-washed gas is filled. Is neutralized while sequentially passing through the fillers 131 and 141 of the first chemical treatment chamber 130 and the second chemical treatment chamber 140.

However, the conventional wet gas scrubber tower 100 is installed in multiple stages when using different chemicals in the second cleaning chamber 120, the first chemical treatment chamber 130, and the second chemical treatment chamber 140. The chemical filled in the filling material 131 of the processing chamber falls into the filling material 121 of the second cleaning chamber 120, so that the chemicals are mixed in the washing water filled in the filling material 121 of the second cleaning chamber 120. In addition to being generated, the medicine filled in the filler 141 of the second chemical treatment chamber 140 falls into the filler 131 of the first chemical treatment chamber 130 and fills the filler 131 of the first chemical treatment chamber 130. There is a problem that the same chemicals have to be used because the chemical treatment efficiency of the first chemical treatment chamber 130 is significantly reduced or reacts with the type of chemicals while exploding while reacting with the chemicals. In addition, when a different type of chemical treatment is required, a separate wet gas washing tower 100 must be provided, thereby requiring a large installation area, and manufacturing cost is also significantly increased.

In addition, since the fillers 121, 131, and 141 are manufactured in large sizes, when the fillers 121, 131, and 141 are contaminated by the pollutant gas and chemicals passing through them, the washing operation is very cumbersome and the fillers 121 are required. , 131, 141) had a problem that the washing time is significantly increased.

In addition, the conventional wet gas scrubber tower 100 has a problem that not only requires a large installation area but also significantly increases the manufacturing cost due to the large production.

Figure 2 is a view schematically showing another conventional wet gas tower.

As shown in FIG. 2, the conventional wet gas washing tower 200 has an inlet 211 formed with a contaminated gas on one side thereof, and an outlet 212 formed on the other side thereof, and an inlet 211 and an outlet 212. The main body 210 including a partition plate 213 for partitioning each space is formed, and the lower end is in communication with the partitioned space of the main body 210 formed with the inlet 211 and the spiral guide vane 221a on one side The formed swirl flow generating unit 221 is installed, the washing tube 220 is installed with the injection nozzle 222 at the top, and the lower end is in communication with the partitioned space of the main body 210 formed with the discharge port 212 and spiral induction on one side A swirl flow generating unit 231 having a feather 231 a is installed, and a chemical treatment tube 230 and a cleaning tube 220 and a chemical treatment tube 230 provided with a chemical injection nozzle 232 for spraying chemicals thereon. And a guide tube 240 installed in the cleaning tube 220 to guide the gas cleaned in the chemical treatment tube 230. It is open configuration.

The conventional wet gas cleaning tower 200 as described above, when the polluted gas is introduced through the inlet 211, the introduced gas passes through the swirl flow generating unit 221 installed in the cleaning tube 220, and the spiral guide blade 221a. ) Is converted into swirl flow, and the injection nozzle 222 provided on the upper portion of the cleaning tube 220 sprays the washing water toward the gas converted into swirl flow to clean the gas.

Thereafter, the cleaned gas is introduced into the chemical processing tube 230 through the guide tube 240 and is turned by the spiral guide vane 231a while passing through the swirl flow generating unit 231 installed in the chemical processing tube 230. In the injection nozzle 222 installed in the upper portion of the chemical treatment tube 230, the chemical is injected to the gas converted into the swirl flow to neutralize the gas.

However, another conventional wet gas scrubber 200 is provided with swirl flow generating units 221 and 231 on one side of the cleaning tube 220 and the chemical treatment tube 230 to increase the flow rate of the gas. Since the time passing through the 220 and the chemical treatment tube 230 is shortened, and thus the reaction time between the washing water and the chemical agent is shortened, there is a problem that the cleaning efficiency or the neutralization efficiency of the polluted gas is significantly lowered.

In addition, the conventional wet gas scrubber 200 according to the conventional wet gas scrubbing tower 200 has a problem in that the manufacturing cost increases not only by requiring a large installation area but also by manufacturing a large size.

The present invention has been made to solve the above problems, the object of the present invention is to manufacture a compact to be installed on the movement path in the gas, by installing a scattering prevention plate to separate between each gas cleaning unit separate Wet gas cleaning unit that can significantly reduce the manufacturing cost, improve the cleaning efficiency, do not require an installation area, and can significantly increase the chemical treatment efficiency by performing various kinds of chemical treatment collectively; The present invention provides a wet gas cleaning device using the same.

According to an aspect of the present invention for achieving the above object, in the wet gas cleaning unit for cleaning the polluted gas, the housing is installed on the movement path of the gas, and installed in the housing, the spiral guide therein A scrubber comprising a swirl flow generating tube which is formed with a feather to convert gas into swirl flow, and a scattering prevention plate which is coupled to a surface into which gas enters in the swirl flow generating tube to prevent washing water or chemicals from flowing into the previous process. The swirl flow is provided with a unit, one end of which is located inside the housing and is provided with a supply pipe for providing a movement path of the washing water or medicine supplied from the outside, and the washing water or medicine supplied from the outside through the supply pipe. Wet gas tax, characterized in that it comprises an injection nozzle for injecting toward the gas diffused while being discharged from the generating tube It provides a unit.

The swirl flow generating tube may be formed in a venturi tube shape.

In addition, the scattering prevention plate may be formed with at least one protruding member protruding from the surface facing the swirl flow generating tube, the gas inlet is formed in the lower portion of the preventive piece.

In addition, it is preferable to include a shielding plate installed between the outer surface of the scrubber unit and the inner wall of the housing, the lower portion is formed with a through hole.

In addition, one end portion is penetrated through the lower portion of the housing, and more preferably includes a discharge pipe having a height greater than that of the through hole.

On the other hand, in the wet gas cleaning device for cleaning the contaminated gas, the wet gas cleaning unit manufactured by any one of claims 1 to 5, characterized in that a plurality of coupled to the gas flow path. Provide a gas cleaning device.

And, coupled to the lower portion of the housing of each of the wet gas cleaning unit, including a discharge pipe for discharging the washing water or chemicals injected by the injection nozzle, any one of the discharge pipe supply pipe of the wet gas cleaning unit The sprayed washing water or chemicals may be re-injected by the spray nozzle of the wet gas cleaning unit.

According to the present invention as described above, the gas is manufactured in a small size so as to be installed on the movement path, and by installing a scattering prevention plate to isolate each gas cleaning unit, without requiring a separate installation area, the manufacturing cost is remarkably It is possible to reduce and improve the cleaning efficiency, as well as to improve the chemical treatment efficiency by performing several kinds of chemical treatment collectively.

Hereinafter, with reference to the accompanying drawings will be described in detail an embodiment of the present invention.

Figure 3 is a schematic cross-sectional view of a wet gas cleaning unit according to an embodiment of the present invention.

As shown in FIG. 3, the wet gas cleaning unit 10 according to the exemplary embodiment of the present invention includes a housing 11, a scrubber unit 12, a shield plate 13, a supply pipe 14, and a spray nozzle ( 15) and the discharge pipe (16).

The housing 11 is installed on the movement path of the gas through which the gas moves, such as a duct, and serves to provide a movement path of the gas through the center thereof so that the gas can move.

The scrubber unit 12 has at least one swirl flow generating tube 12a having a spiral guide feather 12aa formed therein, and a rod-shaped spacer 12b and a spacer having one end coupled to the swirl flow generating tube 12a. It is comprised including the scattering prevention plate 12c couple | bonded with the other end of 12b, and is installed in the housing 11 inside.

The swirl flow generating tube 12a serves to allow the gas flowing into the housing 11 to flow into the inside or to be changed to swirl flow while passing along the linear guide vane 12aa.

Spacer member 12b is coupled to the gas entering surface of the swirl flow generating tube (12a) is coupled to a plurality of the outside, it is separated from the swirl flow generating tube (12a) and the scattering prevention plate (12c) to be described later to prevent scattering It serves to provide a drop space so that the washing water or chemicals that hit the plate (12c) can fall downward.

Shatterproof plate 12c is coupled to the other end of the bar-shaped spacer member 12b, a plurality of prevention pieces 12ca protruding on the surface facing the swirl flow generating tube 12a, the prevention piece 12ca A gas inlet 12ca 'is formed at a lower portion of the gas inlet 12 so that the gas flowing into the housing 11 passes through the gas inlet 12ca' to enter the scrubber unit 12.

In addition, the scattering prevention plate 12c serves to prevent the washing water or chemicals injected by the spray nozzle 15 from leaking out through the swirl flow generating tube 12a.

The shield plate 13 is installed between the outer surface of the scrubber unit 12 and the inner wall of the housing 11 to support the scrubber unit 12, the gas introduced into the housing 11 is the scrubber unit 12 and the housing It prevents the outflow between the inner walls of the (11).

In the shielding plate 13, a passage hole 13a is formed at a lower portion thereof.

The supply pipe 14 is connected to a washing water supply device (not shown) or a chemical supply device (not shown), one end of which penetrates one side of the housing 11 and is located in the housing 11, and the other end is installed outside. It serves to provide the rinsing water or the movement path of the chemicals.

The injection nozzle 15 is installed on one side of the supply pipe 14, and sprays the washing water or chemicals provided through the supply pipe 14 toward the gas to be diffused while being discharged to the scrubber unit 12 to clean or diffuse the gas. It acts as a neutralizer.

One end of the discharge pipe 16 is coupled through the lower portion of the housing 11, the height of one end of the discharge pipe 16 is formed to be equal to or higher than the height of the inlet formed in the shielding plate 13 is injected by the injection nozzle 15 The washing water or the chemical serves to be stored higher than the height of the inlet in the lower housing 11. This is to prevent the gas introduced into the housing 11 from flowing out through the inlet without being cleaned or neutralized.

Referring to the operation of the wet gas cleaning unit 10 according to an embodiment of the present invention having such a structure as follows.

First, when the contaminant gas inside the housing 11 is introduced, the contaminated gas is moved to the scrubber unit 12 through the gas inlet 12ca 'of the scattering preventing plate 12c and the sides of the scattering preventing plate 12c.

The contaminated gas is moved along the spiral guide vane 12aa formed inside the swirl flow generating tube 12a and is converted into swirl flow to pass through the swirl flow generating tube 12a. At this time, the gas passing through the swirling flow generating tube 12a flows into the swirling flow generating tube 12a from the housing 11 having a larger cross-sectional area than the swirling flow generating tube 12a, and then increases the flow rate. When passing through) is again discharged to the housing 11, the flow rate is significantly reduced.

That is, the flow rate is known as V (flow rate) = Q (flow rate) / A (cross-sectional area) as the gas flows through the swirl flow generating tube 12a in the housing 11, the cross-sectional area is reduced and flow rate On the other hand, when the gas is discharged from the swirl flow generating tube 12a to the housing 11, the flow rate decreases while the cross-sectional area is increased.

In this way, the speed is significantly reduced, and the washing nozzle 15 sprays the washing water or the chemical toward the gas converted into the swirl flow. As a result, not only the time for which the gas is exposed to the washing water or the chemical is significantly increased, but also the reaction area that reacts with the washing water or the chemical is significantly increased as it is converted into swirl flow.

At this time, the washing water or chemicals injected by the spray nozzle 15 mostly fall downward by the scrubber unit 12 or the shield plate 13, and some washing water or chemicals passing through the swirl flow generating tube 12a. The silver hits the shatterproof plate 12c coupled to the scrubber unit 12 so that the washing water or chemicals do not leak out to the inside of the housing 11. Accordingly, the washing water or the chemicals that have dropped into the housing prevention plate 12c and fall into the housing 11 are moved in the direction of the discharge pipe 16 through the passage hole 13a of the shielding plate 13, and is disposed below the housing 11. When the storage height of the stored washing water or chemicals exceeds the height of one end of the discharge pipe 16 coupled to the housing 11, the washing water or chemicals exceeding the height of one end of the discharge pipe 16 is discharged through the discharge pipe 16. It is discharged to the outside.

4 is a view schematically showing a wet gas cleaning device using a wet gas cleaning unit according to an embodiment of the present invention.

As shown in FIG. 4, the wet gas cleaning device 1 according to the exemplary embodiment of the present invention is provided with a plurality of wet gas cleaning units 10 coupled to and installed on a moving path of the gas through which the gas is moved, such as a duct. It is composed.

In an embodiment of the present invention, three gas cleaning units are described as being coupled, and the initial cleaning chamber 20 is coupled to the front end of the three gas cleaning units.

The initial cleaning chamber 20 is preferably installed when the amount of dust contained in the polluted gas is large, and serves to move the introduced gas to the subsequent step after the first cleaning of the introduced gas.

Each of the three gas cleaning units includes a cleaning chamber 10-1, a first chemical treatment chamber 10-2, and a second chemical treatment chamber 10-3. 15, the washing water is injected, the first chemical is injected from the injection nozzle 15 of the first chemical treatment chamber 10-2, and the second chemical is injected from the injection nozzle 15 of the second chemical treatment chamber 10-3. Is sprayed.

And, as described in the operation description of the wet gas cleaning unit 10, each wet gas cleaning unit 10 flows out the first chemical and the second chemical to the wet gas cleaning unit 10 of the front end by the shatterproof wall. By preventing the first drug and the washing water, it is possible to prevent the mixing of the first drug and the second drug in advance, so that the first drug and the second drug may be different from each other.

As described above, the operation of the wet gas cleaning apparatus 1 according to the exemplary embodiment of the present invention will be briefly described. The inflowing gas is first washed in the initial washing chamber 20 and then introduced into the washing chamber 10-1. 2nd cleaning. Thereafter, the second cleaned gas flows into the first chemical treatment chamber 10-2 and is first neutralized by the first chemical injected from the injection nozzle 15 installed in the first chemical treatment chamber 10-2. The first neutralized gas flows back into the second chemical treatment chamber 10-3, and is neutralized by the second chemical injected from the injection nozzle 15 installed in the second chemical treatment chamber 10-3. To be discharged.

Since the description of each configuration of the other wet gas cleaning unit 10 is the same as the wet gas cleaning unit 10, the description thereof will be omitted.

5 is a view schematically showing a wet gas cleaning unit 10 according to another embodiment of the present invention.

As shown in Fig. 5, the present embodiment has the same basic configuration as the embodiment of Fig. 2, but the swirl flow generating tube 12a is formed in a venturi shape.

In this way, the swirl flow generating tube 12a formed in the venturi shape increases the flow velocity of the gas flowing into the swirl flow generating tube 12a so that the gas rotates quickly along the spiral guide vane, and thus the rotational force of the gas swirl flow. This is to improve the reaction area and reaction time between the washing water and the chemical sprayed from the spray nozzle, thereby remarkably improving the gas washing efficiency and the chemical treatment efficiency.

Since the rest of the structure is the same as the above-described basic embodiment, the rest of the description will be omitted.

6 is a view schematically showing a wet gas cleaning device according to another embodiment of the present invention.

6 is basically the same as the embodiment of FIG. 4, but the discharge pipe 16 of the second chemical treatment chamber 10-3 and the supply pipe 14 of the first chemical treatment chamber 10-2 are connected to each other. 2 The chemicals ejected from the injection nozzle 15 of the chemical treatment chamber 10-3 and discharged from the discharge pipe 16 of the second chemical treatment chamber 10-3 are supplied to the first chemical treatment chamber 10-2 again to supply the chemicals. By reusing and repeating the drug is formed in a structure that can significantly improve the treatment efficiency of the drug.

Since the rest of the structure is the same as the above-described basic embodiment, the rest of the description will be omitted.

Although the present invention has been described in connection with the above-mentioned preferred embodiments, it is possible to make various modifications or variations without departing from the spirit and scope of the invention. Accordingly, the appended claims will cover such modifications and variations as fall within the spirit of the invention.

1 is a schematic view of a conventional wet gas scrubber tower,

2 is a view schematically showing another conventional wet gas tower;

3 is a cross-sectional view schematically showing a wet gas cleaning unit according to an embodiment of the present invention;

Figure 4 is a schematic view showing a wet gas cleaning device using a wet gas cleaning unit according to an embodiment of the present invention,

5 is a view schematically showing a wet gas cleaning unit according to another embodiment of the present invention;

Figure 6 schematically shows a wet gas cleaning device according to another embodiment of the present invention.

<Description of main drawing code>

1: wet gas cleaning device 10: wet gas cleaning unit

10-1: washing chamber 10-2: first chemical treatment chamber

10-3: second chemical treatment chamber 20: initial cleaning chamber

11 housing 12 scrubber unit

12a: swirl flow generating tube 12aa: spiral guide vane

12c: shatterproof plate 12ca: prevention plate

12ca ': gas inlet 12b: spacer

13: shield plate 14: supply pipe

15: injection nozzle 16: discharge pipe

Claims (7)

In the wet gas cleaning unit for cleaning the contaminated gas, A housing installed on the gas movement path; It is installed in the housing, a spiral guide vane is formed therein and is connected to the swirl flow generating tube for converting gas into swirl flow, and the surface into which gas enters in the swirl flow generating tube, and the washing water or chemicals flow into the previous process. A scrubber unit including a shatterproof plate that prevents the product from being scattered; A supply pipe having one end positioned inside the housing and providing a passage for washing water or medicine supplied from the outside; And And a spray nozzle installed in the supply pipe and spraying the washing water or the chemical supplied from the outside through the supply pipe toward the gas diffused while being discharged from the swirl flow generating tube. The method of claim 1, The swirl flow generating tube is a wet gas cleaning unit, characterized in that formed in the shape of the venturi tube. The method of claim 1, The scattering prevention plate is a wet gas cleaning unit, characterized in that at least one or more prevention pieces protrudingly formed on the surface facing the swirl flow generating tube, the gas inlet is formed in the lower portion of the prevention piece. The method of claim 1, And a shielding plate disposed between an outer surface of the scrubber unit and an inner wall of the housing and having a through hole formed at a lower portion thereof. The method of claim 4, wherein The wet gas cleaning unit, characterized in that it comprises a discharge pipe that one end is penetrated through the lower portion of the housing, the height of the penetrated one end is greater than the height of the through hole. In the wet gas cleaning device for cleaning the contaminated gas, The wet gas cleaning device, characterized in that a plurality of wet gas cleaning units manufactured by any one of claims 1 to 5 are coupled to a gas movement path. The method of claim 6, It is coupled to the lower portion of the housing of each of the wet gas cleaning unit, including a discharge pipe for discharging the cleaning water or chemicals injected by the injection nozzle to the outside, Any one of the discharge pipe is connected to the supply pipe of the wet gas cleaning unit wet gas cleaning unit, characterized in that the sprayed washing water or chemicals are re-injected by the injection nozzle of the wet gas cleaning unit.

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