KR20080113394A

KR20080113394A - Exposure apparatus

Info

Publication number: KR20080113394A
Application number: KR1020087024076A
Authority: KR
Inventors: 노부히토 사지
Original assignee: 닛본 세이고 가부시끼가이샤
Priority date: 2006-05-16
Filing date: 2007-04-12
Publication date: 2008-12-30
Also published as: CN101416115A; JP2007310007A; CN101416115B; WO2007132610A1

Abstract

When performing pattern exposure by carrying out the relative movement of a board | substrate and a mask, the exposure apparatus which can shield a non-exposed area | region appropriately is provided.

During exposure of the exposure area, by moving the blind member 20 to the upstream side with respect to the exposure light EL, irrespective of the number of exposure areas, one blind member 20 is used to expose the non-exposed areas. Can be avoided.

Description

Exposure apparatus {EXPOSURE APPARATUS}

BACKGROUND OF THE INVENTION Field of the Invention The present invention relates to an exposure apparatus and, for example, relates to an exposure apparatus suitable for exposure-transferring a mask pattern of a mask onto a substrate of a large flat panel display such as a liquid crystal display or a plasma display.

A large flat panel display such as a liquid crystal display or a plasma display used in a large-sized thin TV or the like is manufactured by carrying out proximity exposure transfer of a pattern of a mask on a substrate by a split sequential exposure method. As a conventional dividing sequential exposure apparatus of this kind, for example, a mask smaller than the substrate as the exposed material is used, the mask is held at the mask stage, the substrate is held at the work stage, and both are disposed to face each other in close proximity, By moving the work stage with respect to the mask in this state and irradiating the substrate with light for pattern exposure from the mask side for each step, the plurality of mask patterns drawn on the mask are exposed and transferred onto the substrate so that a plurality of displays or the like can be applied to one substrate. It is known to manufacture. In particular, in the technique of Patent Document 1, a mask pattern can be exposed on a large substrate by synchronously moving a smaller mask and a light source with respect to the substrate.

Patent Document 1: Japanese Patent Application Laid-Open No. 11-237744

Disclosure of the Invention

Problems to be Solved by the Invention

By the way, when a plurality of panels are cut out from the large glass substrate, the exposure pattern is exposed and transferred to the region on the glass substrate corresponding to the panel, but the region corresponding to the adjacent panels is a non-exposure region in which exposure light should not be irradiated. to be. Therefore, it is conceivable to form a light blocking member between the light source and the glass substrate so as to cover the non-exposed area so that the exposure light does not reach the non-exposed area. By the way, when the kind and number of panels cut out from one glass substrate differ, it is necessary to form the light-shielding member of many various shapes accordingly, and there exists a problem of cost increase and space increase.

Therefore, in view of the problems of the prior art, an object of the present invention is to provide an exposure apparatus capable of properly shielding a non-exposed area using a light shielding member when performing pattern exposure by relatively moving a substrate and a mask. do.

Means to solve the problem

The object mentioned above is achieved by the following structures.

(1) an irradiation unit for irradiating light for exposure,

A substrate driver which holds a substrate having an exposed area and a non-exposed area, and moves the substrate in a predetermined direction across the exposure light emitted from the irradiation part;

A first light blocking member disposed between the irradiation section and the substrate and extending in a direction crossing the predetermined direction to shield light;

A first driving unit for moving the first light blocking member to a position to block the light for exposure emitted from the irradiation unit;

A second light blocking member disposed between the irradiation section and the substrate and extending in a direction crossing the predetermined direction to shield light;

A second driving part for holding the second light blocking member and moving the light blocking member independently of the first light blocking member to a position for blocking light for exposure;

The first driving part drives the first light blocking member so as to traverse light from the irradiation part and move in a direction opposite to the predetermined direction at least once while irradiating light to the exposure area from the irradiation part. ,

And the second driving unit drives the second light blocking member in accordance with the operation of the first light blocking member.

(2) The exposure apparatus according to the exposure apparatus (1), wherein the first light shielding member has one band-shaped light shielding portion, and the second light shielding member has two band-shaped shielding portions.

(3) The exposure apparatus according to (1), wherein the first light blocking member has a variable width in the predetermined direction.

(4) The exposure apparatus according to (1), wherein the first light blocking member forms an edge in accordance with the intermediate imaging region.

(5) The exposure apparatus according to (1), wherein part of the light directed from the irradiator to the exposure area is shielded according to the speed or acceleration of the first light blocking member.

(6) The exposure apparatus according to (1), wherein the first and second driving units drive the first and second light blocking members so that the exposure amount in the exposure area of the substrate is constant.

(7) The exposure area of the substrate has a crossing portion that is shielded by moving the first light blocking member while traversing light from the irradiation part while irradiating light from the irradiation part to the exposure area,

The said 1st and 2nd drive part drives the said 1st and 2nd light shielding members so that the exposure amount in the said exposure area may be equivalent to the exposure amount in the crossing part, The exposure apparatus as described in (6) characterized by the above-mentioned. .

Effects of the Invention

According to the exposure apparatus of the present invention, the first drive unit is configured to move in a direction opposite to the predetermined direction at least once while traversing light from the irradiation unit while irradiating light to the exposure area from the irradiation unit. Since the first light blocking member is driven, only the single first light blocking member can appropriately shield the exposure light so that it does not reach, regardless of the width or number of the non-exposed areas. Moreover, since it is a compact and lightweight structure, simplification and compactness of the whole exposure apparatus can be aimed at. In addition, since the second driving part drives the second light blocking member in accordance with the operation of the first light blocking member, for example, the first light blocking member crosses the light from the irradiation part and is opposite to the predetermined direction. By moving so as to block a part of the light from the irradiation section, it is possible to suppress the unevenness of the exposure dose.

It is preferable that the first light shielding member has one band-shaped light shielding portion, and the second light shielding member has two band-shaped light shielding portions. The second light blocking member may have an inverted c-shape or a w-shape.

If the width | variety in the said predetermined direction is made variable, the said 1st light-shielding member can implement appropriate light-shielding regardless of the width | variety of a non-exposure area. Moreover, if the width is made small when crossing the light from the irradiation section and moving in the direction opposite to the predetermined direction, the decrease in the exposure amount in the exposure area can also be suppressed.

The first light shielding member is preferable because an edge is formed in accordance with the intermediate image forming region, since the blurring of the boundary can be suppressed.

According to the speed or acceleration of the first light blocking member, if a part of the light from the irradiation part toward the exposure area is shielded, the reduction of the exposure amount when crossing the light from the irradiation part and moving in the direction opposite to the predetermined direction is suppressed. can do.

1 is a top view of the exposure apparatus according to the first embodiment.

2 is a side view illustrating a state at the time of exposure of the exposure apparatus according to the present embodiment.

3 is a perspective view showing a blind, an aperture member, and a substrate.

4 is a view of the blind 20, the aperture member 30, and the substrate W in the Z axis direction.

5 is a flowchart showing an exposure operation.

6 is a time chart diagram of the movement of the blinds 20.

7 is a view of the substrate W viewed in the Z axis direction.

8 is a time chart diagram of blind 20 movement according to a modification.

9 is a time chart diagram of blind 20 movement according to a modification.

10 is a time chart diagram of blind 20 movement according to a modification.

11 is a time chart diagram of blind 20 movement according to a modification.

12 is a time chart diagram of blind 20 movement according to a modification.

FIG. 13: is the figure which looked at the blind 20 which concerns on another modified example to the Y-axis direction.

FIG. 14: is the figure which looked at the blind 20 which concerns on another modified example to the Y-axis direction.

Explanation of the sign

1: Base

2: substrate chuck

2a: rail

10: holding device

11: arm

12: holding part

13: Z axis moving device

14: θ axis moving device

15: Y axis moving device

20: blind

20a-20d: wing member

21, 22: Plate

30: absence of aperture

31, 32: vertical member

33, 34: horizontal member

35: connecting member

EG: edge

EL: Light for exposure

ER1: exposure area

ER2: exposure area

ER3: exposure area

FP: intermediate imaging position

GS1: Guide Rail

GS2: Guide Rails

L: mask conveying line

LM1, LM2: Linear Motor

LS: Light source

M: Mask

NR1: non-exposed area

NR2: non-exposed area

NR3: non-exposed area

NR4: non-exposed area

OPU: Exposure Unit

Implement the invention Best form for

EMBODIMENT OF THE INVENTION Hereinafter, preferred embodiment of this invention is described with reference to drawings. 1 is a top view of the exposure apparatus according to the present embodiment, and FIG. 2 is a side view illustrating a state during exposure of the exposure apparatus according to the present embodiment. In the following embodiments, the horizontal plane is defined in the X axis direction and the Y axis direction, and the Z axis direction defines the vertical direction.

In FIG. 1, on the base 1, the substrate W on a large thin plate is held by a substrate chuck (substrate driver 2), and moves from left to right along with the substrate chuck 2 along the rail 2a. It is possible. On the base 1, the holding | maintenance apparatus 10 which adsorbs-holds the mask M is seven on the left side (upstream side), and the right side (downstream side) through a mask conveyance line (also called mask conveyance path: L). ) Are arranged six (13 total). Compared with the board | substrate W hold | maintained by the holding apparatus 10, the small mask M is alternately arrange | positioned in zigzag form with the mask conveyance line L in between. In addition, in FIG. 1, the seven holding apparatuses 10 of the left side and the three holding apparatuses 10 from the upper right side are in an exposure position, and the three holding apparatuses 10 from the lower right side receive a mask. (Iii) in position. 1, MS1 and MS2 are mask stockers, RBT is a carrier robot, and AM represents a carrier arm.

Each holding | maintenance apparatus 10 is a direction orthogonal to the left-right direction (FIG. 1 mask conveyance line L of FIG. 1 which becomes the X-axis direction on the base 1, and the board | substrate W is left along the X-axis direction. Arm 11 arranged to be movable with respect to the frame, not shown), and a holding part 12 arranged at the tip of the arm 11 to adsorb and hold the mask M on the lower surface thereof. And the Z axis moving device 13 which drives the holding part 12 in the Z axis direction (up and down direction in FIG. 2) with respect to the arm 11, and the holding part 12 around the normal of the upper surface of the base 1. Θ axis moving device 14 which rotates and rotates, and Y axis moving device 15 which drives holding unit 12 in the Y axis direction (the paper vertical direction in FIG. 2) with respect to arm 11. The holding part 12 has a rectangular opening not shown. The base 1 is equipped with a discharge suction unit (not shown) facing the lower surface of the substrate W. As shown in FIG.

In the exposure operation | movement performed using the exposure apparatus of this embodiment, the board | substrate W is moved from left to right with the board | substrate chuck 2 along the rail 2a from the drive part not shown initially. At this time, the board | substrate W is conveyed to the X-axis direction in the state which floated from the upper surface of the discharge unit (not shown), and the damage | wound etc. are prevented from occurring in the lower surface side of the board | substrate W. As shown in FIG.

When the exposure light EL is projected from the light source LS in the upper exposure unit (irradiation unit: OPU) while moving the substrate W to a predetermined position, the exposure light EL is held by the holding device 10. The pattern M is exposed and transferred to the substrate W by passing through the mask M. FIG. At this time, the deviation of the pattern due to the movement error of the substrate W is masked by the Z-axis moving device 13, the θ-axis moving device 14, and the Y-axis moving device 15 of the holding device 10. This can be corrected by fine-adjusting the position of (M). By carrying out the continuous exposure in the same manner, the pattern can be exposed to the entire substrate W. FIG. In addition, in this embodiment, since the mask M hold | maintained on both sides of the mask conveyance line L is arrange | positioned in zigzag form, the mask M in the one side of the mask conveyance line L is spaced apart and arranged. Even if it is, the pattern can be formed on the substrate W without a gap.

By the way, when cutting out several panel from the board | substrate W, an exposure pattern is exposed-transferred to the area | region on the board | substrate W corresponding to a panel, but the area | region corresponding between adjacent panels should not irradiate exposure light. It becomes a non-exposed area. Therefore, in this embodiment, the blind 20 and the aperture member 30 are arrange | positioned between the exposure unit OPU and the board | substrate W which were fixed.

3 is a perspective view illustrating the blind, the aperture member, and the substrate, and a mask and the like are omitted. In the following description, the substrate has only one row of exposure areas for easy understanding, but there are actually multiple rows. In FIG. 3, the blind member 20 which is a 1st light shielding member has two board | plate materials (light shielding parts: 21 and 22) extended orthogonal to a X-axis direction (that is, in a Y-axis direction). The board members 21 and 22 are movable relative to each other in the X-axis direction by a driving mechanism (not shown) formed in either one, and have one straight strip shape in an overlapped state, and their ends are provided to the linear motor LM1. It is connected. The linear motor LM1 which is a 1st drive part is able to move freely to the X-axis direction along the guide rail GS1 by the driver not shown. By relatively moving the plate materials 21 and 22 in the X-axis direction, the width of the light shielding portion can be arbitrarily changed in accordance with the non-exposed area.

On the other hand, the substantially W-shaped aperture member 30, which is the second light blocking member, connects the pair of vertical members 31 and 32 extending in the X-axis direction and both ends of the vertical members 31 and 32, respectively. It consists of two strip | belt-shaped horizontal members (light shielding parts 33 and 34) extended in the Y-axis direction, and the connection member 35 which connects the center of the vertical member 31 to the linear motor LM2. The linear motor LM2 which is a 2nd drive part is able to move freely in the X-axis direction along the guide rail GS2 by the driver not shown. The blind member 20 and the aperture member 30 are able to move freely to the position which can shield the exposure light EL.

Next, the operation | movement of the blind member 20 and the aperture member 30 at the time of exposure is demonstrated. FIG. 4 is a view of the blind member 20, the aperture member 30, and the substrate W in the Z axis direction, and schematically shows the operation during exposure. 5 is a flowchart showing an exposure operation. Moreover, when the optical system which has intermediate image formation is used, the operation | movement of the blind member 20 and the aperture member 30 and the direction in which the light-shielding non-exposed area | region (shadow) move may be reversed, and it is easy to understand here. For the sake of simplicity, the movement of the shadow is described as the operation of the blind member 20 and the aperture member 30. Moreover, when the optical system which has intermediate image formation is used, the movement amount of the blind member 20 and the aperture member 30, and the quantity which the non-exposed area | region (shadow) which are light-shielded may differ, here it is easy to understand. In order to do this, the amount of movement of the shadow is explained as the amount of movement of the blind member 20 and the aperture member 30.

FIG. 4A illustrates the relationship between the shape and relative positions of the blind member 20, the aperture member 30, and the substrate W with respect to the exposure light EL. Here, exposure area | region ER1, ER2, ER3 of the board | substrate W is shown by hatching, and non-exposure area | region NR1, NR2, NR3, NR4 is shown to be whitened. In addition, although the detail is not shown below, the blind member 20 and the aperture member 30 drive linear motors LM1 and LM2 in FIG. It is made to be movable in the direction.

Here, when the substrate W moves in the X-axis direction (right side in the drawing) toward the irradiation area (shown by the dashed-dotted line) of the light EL for exposure, first, the first non-exposed area NR1 is the light EL for exposure. Access to the survey area. Therefore, as shown in FIG. 4 (b), the aperture member 30 is moved in the X axis direction (left side in the drawing), and the horizontal member 33 shields the exposure light EL (see FIG. 5). Step S101). In such a light shielding state, exposure of the non-exposed region NR1 can be avoided by infiltrating the substrate W below the aperture member 30.

By further moving the substrate W in the moving direction, the exposure area ER1 approaches the irradiation area of the light EL for exposure. At this time, if the aperture member 30 is stopped relative to the substrate W, and the light EL for exposure is continuously blocked by the horizontal member 33, the exposure region ER1 cannot be exposed. Therefore, as shown in Figs. 4C and 4D, the horizontal member 33 of the aperture member 30 is moved to the right side in the drawing in synchronization with the movement of the non-exposed region NR1, and the exposure light ( EL is made to irradiate exposure area ER1 (step S102, S103 of FIG. 5). The aperture member 30 is stopped when the horizontal member 33 exits the irradiation area of the exposure light EL.

As the substrate W further moves in the moving direction, as shown in FIG. 4E, the exposure of the exposure region ER1 approaches the end, and the non-exposed region NR2 is the irradiation region of the exposure light EL. Approach At this time, since the horizontal member 33 of the aperture member 30 is located on the opposite side to the irradiation area of the exposure light EL, the non-exposure area NR2 cannot be shielded using this. Therefore, as shown in FIG. 4 (f), the blind member 20 held in the upstream side of the irradiation area of the exposure light EL (including the state moving in synchronism with the substrate W, hereinafter the same) By this, the exposure light EL is shielded (step S105 in FIG. 5). Exposure of the non-exposed area NR2 can be avoided by infiltrating the board | substrate W below the blind member 20 with light-shielding by the blind member 20. FIG.

By further moving the substrate W in the moving direction, the exposure area ER2 approaches the irradiation area of the exposure light EL. By moving the blind member 20 corresponding to the width of the non-exposed area NR2 in the same direction at the same speed as the substrate W, as shown in FIG. 4 (g), the exposure is followed by the non-exposed area NR2. The exposure of the area ER2 is performed (step S106 of FIG. 5).

By the way, in the state in which the blind member 20 is located downstream of the irradiation area of the exposure light EL, there is no light shielding portion that shields the next non-exposed area NR3. So, in this embodiment, while exposing the exposure area | region ER2, the blind member 20 is directed from the downstream side to the upstream side of the irradiation area | region of exposure light EL (from right side to left side and crossing irradiation area). Move it.

More specifically, as shown in Fig. 4 (h) and Fig. 4 (i), while exposing the exposure area ER2, the blind member 20 crosses the irradiation area of the light EL for exposure downstream. To the upstream side (step S107 in FIG. 5). At this time, by narrowing the width of the blind member 20 by overlapping the plate members 21 and 22, the influence on the exposure can be minimized.

As the substrate W further moves in the moving direction, as shown in Fig. 4 (j), the exposure of the exposure area ER2 approaches the end, and the non-exposed area NR3 is the irradiation area of the light EL for exposure. Approach At this point of time, since the blind member 20 is waiting on the upstream side of the irradiation area of the exposure light EL, the exposure light EL is shielded using this as shown in Fig. 4 (k) (Fig. 5, step S105). Exposure of the non-exposed area NR3 can be avoided by infiltrating the board | substrate W under the blind member 20 with light shielding by the blind member 20. FIG.

By further moving the substrate W in the moving direction, the exposure area ER3 approaches the irradiation area of the exposure light EL. As described above, the blind member 20 corresponding to the width of the non-exposed area NR3 is moved in the same direction at the same speed as the substrate W, so that the non-exposed area NR3 is followed by the exposure area ER3. ) Is performed (step S106 of FIG. 5).

In addition, as shown in Fig. 4 (l), the blind member 20 is moved from the downstream side to the upstream side across the irradiation area of the exposure light EL during exposure of the exposure area ER3 (step of Fig. 5). S107). At this time, by narrowing the width of the blind member 20 by overlapping the plate members 21 and 22, the influence on the exposure can be minimized.

In the case where the exposure area is 4 or more, after the exposure of all the exposure areas is completed by repeating the same operation (step S108 in FIG. 5), as shown in FIG. 4 (m), the aperture member 30 is moved in the X axis direction. The exposure light EL can be shielded by the horizontal member 34 by moving the surface thereof, so that the exposure of the non-exposed area NR4 can be avoided (step S110 in FIG. 5). The non-exposed region NR4 may be shielded by moving the blind member 20 to the upstream side.

According to this embodiment, one blind member 20 is moved irrespective of the number of exposure regions by moving the blind member 20 upstream with respect to the exposure light EL during exposure of an exposure region. Can be used to avoid exposure of the non-exposed areas. In addition, although the exposure light EL is not irradiated to the whole exposure area | region ER1 in FIG. 4, the remainder which was not exposed (upper and lower part (hatched part of the right rise of FIG. 4 (m))) is downstream (or The exposure light EL on the upstream side is exposed (see FIG. 1).

By the way, in exposure area | region (ER2 etc.) which the blind member 20 traverses and moves during exposure, average exposure amount falls rather than exposure area | region ER1 which the blind member 20 does not cross during exposure. Therefore, in this embodiment, the unbalance of the exposure amount in an exposure area is suppressed by making the blind member 20 and the aperture member 30 protrude a predetermined amount with the operation | movement of the blind member 20 to an irradiation area. . Embodiments of this embodiment will be described.

FIG. 6 is a time chart showing the positions of the blind member 20 and the aperture member 30 on the horizontal axis and the time on the vertical axis. The areas shielded by the horizontal members 33 and 34 are distinguished and shown. 7 is a view of the substrate W viewed in the Z axis direction.

First, at time t1 in FIG. 6, the non-exposed region is shielded by the aperture member 30 to enter the exposure preparation, but the blind member 20 is positioned at the upstream side of the irradiation region of the exposure light EL. Protrude as much as). When the exposure of the exposure area ER1 is started from the time t2, the point A (FIG. 7) on the preceding side of the exposure area ER1 has an exposure time (the time exposed to the exposure light EL). ET becomes Moreover, at the time t3, the horizontal member 33 of the aperture member 30 is moved to an X-axis direction, and is superimposed on the blind member 20. FIG.

At the time t4, since the blind member 20 moves upstream once for the galling, the horizontal member 33 protrudes by the width Δ upstream of the irradiation area of the exposure light EL. It is arranged. Therefore, also in point B (FIG. 7) which is in the trailing side of exposure area ER1, exposure time becomes ET. The blind member 20 moves downstream while accelerating from the upstream side. Therefore, at time t5, it moves in synchronization with the substrate W at a constant speed. As a result, the non-exposure region NR1 (point C in FIG. 7) is shielded. The width of the blind member 20 at this time is set to D1. In the meantime, the horizontal member 33 of the aperture member 30 retracts upstream.

At time t6, the exposure of the exposure area ER2 is started. At the time t7, the horizontal member 34 of the aperture member 30 is disposed to protrude to the downstream side of the irradiation area of the exposure light EL by the width Δ. The reason why the aperture member 30 protrudes on the downstream side is that the deceleration after the movement of the blind member 20 is performed in a non-exposed area. Even at the point D (FIG. 7) in which the blind member 20 does not pass in the preceding side of the exposure area ER2, the exposure time is ET. After the light-shielding of the non-exposed region NR1 is terminated at time t8, the blind member 20 overstrokes and starts to accelerate by changing direction to return to the upstream side. Therefore, at time t9, the motor moves synchronously in the opposite direction to the substrate at a constant speed. The width of the blind member 20 at this time is set to D2 (≦ D1).

Here, since the point E (cross-section part) in the center of exposure area ER2 is shielded by the blind member 20 which sprints, exposure amount falls only by the time it passes. However, at time t10, the horizontal member 34 of the aperture member 30 is evacuated to the downstream side of the irradiation area of the exposure light EL, and therefore, at the point E (FIG. 7) in the center thereof, the exposure light EL Exposure is carried out from the end of the irradiation area to the end. In other words, if the exposure time before the blind member 20 passes over the point E is ET1 and the exposure time after the blind member 20 passes, ET2 becomes ET1 + ET2 = ET to the blind member 20. Irrespective of whether or not it is shielded, the exposure dose in all exposure areas is constant. Subsequently, at time t11, the horizontal member 33 of the aperture member 30 protrudes to the upstream side of the irradiation area of the exposure light EL by the width Δ, and is placed in an exposed area ( Also at the point F (FIG. 7) on the trailing side of ER2), the exposure time is ET. The same operation is repeated below.

8-12 are charts similar to FIG. 6 concerning another embodiment, and code | symbol a-e corresponds to the dimension shown to FIG. 4 (a). In addition, in the example of FIGS. 8-11, the blind member 20 is stopped relatively with respect to the board | substrate W just before exiting the irradiation area of the exposure light EL, and is not a aperture 30 but a blind member. 20 is shielded by protruding into the irradiation area.

The amount of protrusions Δ before and after can be obtained by the following equation.

Lm = Lb × (Vw / (Vw + Vb)) (1)

Lu = Lb × (Vw / (Vw + Vb)) (2)

only,

Lm: total shading length (mm)

= Protrusion amount Δ of the blind member 20 and the aperture member 30.

Lu: rear shading length (mm)

= Protrusion amount Δ of the blind member 20 and the aperture member 30.

Vw: work movement speed (mm / s)

Vb: Blind member return speed (mm / s)

Lb: blind member return width (mm)

First, in the example of FIG. 8, the width | variety of the X-axis direction of the irradiation area | region of exposure light EL is made 50 mm, and the width | variety of the blind member 20 is made constant at 20 mm, and the blind member 20 and the board | substrate are fixed. (W) is moved in the X-axis direction at 100 mm / s, and then the blind member 20 is moved in the opposite direction at 100 mm / s, where the protrusion amount Δ of the blind member 20 is Let it be 10 mm. In this example, the exposure amount is reduced by 20% as compared with the case where the blind member 20 does not cross the exposure area.

In the example of FIG. 9, the width | variety of the X-axis direction of the irradiation area of the exposure light EL is 50 mm, and the width | variety of the blind member 20 at the time of light shielding is 20 mm, and the width at the time of return is 10 mm. The blind member 20 and the substrate W are moved in the X axis direction at 100 mm / s, and the blind member 20 is then moved at 100 mm / s in the opposite direction, at which time the blind member ( The protrusion amount Δ of 20) is 5 mm. In this example, the exposure amount is reduced by 10% as compared with the case where the blind member 20 does not cross the exposure area. That is, when the width of the blind member 20 is narrowed at the time of return, the fall of an exposure amount can be suppressed.

In the example of FIG. 10, the width | variety of the X-axis direction of the irradiation area of the exposure light EL is 50 mm, and the width | variety of the blind member 20 at the time of light shielding is 20 mm, and the width at the time of return is 10 mm. The blind member 20 and the substrate W are moved in the X-axis direction at 100 mm / s, and the blind member 20 is then moved at 200 mm / s in the opposite direction, at which time the blind member ( The protrusion amount Δ of 20) is set to 3.3 mm. In this example, the exposure amount is reduced by 6.7% as compared with the case where the blind member 20 does not cross the exposure area. That is, when the speed at the time of return of the blind member 20 is increased, the fall of an exposure amount can be suppressed.

In the example of FIG. 11, the width | variety of the X-axis direction of the irradiation area of the exposure light EL is 50 mm, and the width | variety of the blind member 20 at the time of light shielding is 20 mm, and the width at the time of return is 10 mm. After moving the blind member 20 and the substrate W in the X axis direction at 100 mm / s, the speed of the blind member 20 is increased to 200 mm / s to be fed back, and the acceleration at that time is 0.2. G is done. At this time, the protrusion amount Δ of the blind member 20 is 3.3 mm. In this example, the decrease in the exposure amount due to the acceleration and deceleration of the blind member 20 occurs, but the minimum exposure amount is 98.9% with respect to the maximum exposure amount, and the influence of acceleration is limited and practical. In this case, the example of FIG. 12 described below is preferable.

In the example of FIG. 12, the blind member 20 is overstroked relative to the example of FIG. 11, and the aperture member 30 is projected into the irradiation area and shielded from light. The protrusion amount is 3.3 mm. As is apparent from FIG. 12, the acceleration and deceleration of the blind member 20 is performed outside the irradiation area of the exposure light EL, and the exposure amount does not decrease if it moves at a constant speed in the irradiation area.

FIG. 13: is the figure which looked at the blind 20 which concerns on a modification in the Y-axis direction. The blind 20 shown in FIG. 13 has four laminated wing members 20a to 20d. As shown in FIG. 13, by moving the wing members 20a-20d relative to an X-axis direction so that they may not mutually space, the light-shielding range SR can be made into arbitrary length (in this example, from minimum to about 4 times). Can be adjusted. Moreover, the edge EG is formed using the side edges of the wing members 20a and 20b which determine both ends in the X axis direction as a tapered surface, and such edge EG is formed in the middle of the exposure apparatus in the Z axis direction. By matching with the position FP, exposure with high resolution can be performed.

FIG. 14: is the figure which looked at the blind 20 which concerns on another modified example to the Y-axis direction. The blind 20 shown in FIG. 14 has the shape which bent one board | plate material. As shown in FIG. 14, the light shielding range SR can be adjusted to arbitrary lengths by changing the bending angle (theta). In addition, the blind 20 can perform exposure with high resolution by matching the edge EG which determines both ends in an X-axis direction with the intermediate | middle imaging position FP of an exposure apparatus in a Z-axis direction.

As mentioned above, although this invention was demonstrated with reference to embodiment, it should be understood that this invention is not limited to the said embodiment, and can be changed and improved suitably. For example, the number of exposed areas and non-exposed areas is arbitrary. In addition, when a plurality of blinds are provided together, the exposure unevenness can be made less noticeable by changing the timing of returning the blinds. In addition, the width of the blind member may be fixed, not variable, and may be replaced with a blind member having a corresponding width in accordance with the non-exposed area of the substrate.

This application is based on the JP Patent application (Japanese Patent Application No. 2006-136591) of an application on May 16, 2006, The content is taken in here as a reference.

Claims

An irradiation unit for irradiating light for exposure,

The method of claim 1,

The first light blocking member has one band-shaped light blocking part, and the second light blocking member has two band-shaped light blocking parts.

The method of claim 1,

The said 1st light shielding member makes the width | variety in the said predetermined direction variable, The exposure apparatus characterized by the above-mentioned.

The method of claim 1,

The said 1st light shielding member forms the edge according to the intermediate | middle imaging area | region, The exposure apparatus characterized by the above-mentioned.

The method of claim 1,

A part of the light toward the exposure area is shielded from the irradiator according to the speed or acceleration of the first light blocking member.

The method of claim 1,

The said 1st and 2nd drive part drives the said 1st and 2nd light shielding members so that the exposure amount in the exposure area | region of the said board | substrate may become constant.

The method of claim 6,

The exposure area of the substrate has a crossing portion that is shielded by the first light blocking member moving across the light from the irradiation part while irradiating light from the irradiation part to the exposure area,

The said 1st and 2nd drive part drives the said 1st and 2nd light shielding members so that the exposure amount in the said exposure area may be equivalent to the exposure amount in the crossing part.