KR20080093189A - Gas leakage sensing system for gas supply device and method for gas leakage sensing - Google Patents

Gas leakage sensing system for gas supply device and method for gas leakage sensing Download PDF

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Publication number
KR20080093189A
KR20080093189A KR1020070036763A KR20070036763A KR20080093189A KR 20080093189 A KR20080093189 A KR 20080093189A KR 1020070036763 A KR1020070036763 A KR 1020070036763A KR 20070036763 A KR20070036763 A KR 20070036763A KR 20080093189 A KR20080093189 A KR 20080093189A
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KR
South Korea
Prior art keywords
gas
gas line
refraction
supply device
line
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KR1020070036763A
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Korean (ko)
Inventor
김종준
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삼성전자주식회사
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Priority to KR1020070036763A priority Critical patent/KR20080093189A/en
Publication of KR20080093189A publication Critical patent/KR20080093189A/en

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M3/00—Investigating fluid-tightness of structures
    • G01M3/38—Investigating fluid-tightness of structures by using light
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17D—PIPE-LINE SYSTEMS; PIPE-LINES
    • F17D5/00—Protection or supervision of installations
    • F17D5/02—Preventing, monitoring, or locating loss
    • F17D5/06—Preventing, monitoring, or locating loss using electric or acoustic means

Abstract

The present invention relates to a gas leak detection system and a gas leak detection method of a gas supply device. The gas leak detection system of a gas supply device according to the present invention provides a passage for gas supply, and includes a gas line having some transparent pipes; ; A light emitter for irradiating light to a transparent section of the gas line; A refraction detection sensor for detecting a refraction angle of light passing through the transparent tube; And a comparator configured to determine whether the gas leaks by comparing the refraction angle detected by the refraction detection sensor with a reference refraction angle, and to generate an interlock signal when determining a gas leak in the gas line. According to the present invention, it is possible to prevent a process failure of the semiconductor manufacturing equipment and to increase the operation efficiency of the gas supply device.

Description

Gas leakage sensing system for gas supply device and method for gas leakage sensing}

1 is a structural diagram showing a gas supply apparatus according to the prior art,

2 is a structural diagram of a gas leak detection system of a gas supply device according to an embodiment of the present invention;

3 is an enlarged structural diagram of the sensor detecting unit of FIG. 2;

4 is a block diagram inside the comparator of FIG. 2,

5 is a flow chart of a gas leak detection method according to another embodiment of the present invention.

* Description of reference signs for the main parts of the drawings *

104: gas line 108: transparent tube

110: light emitter 112: refraction detection sensor

114: Comparator

The present invention relates to a gas leak detection system and an operation method of a gas supply device, and more particularly, to prevent and minimize process defects in a semiconductor manufacturing facility, and to increase the operation efficiency of the gas supply device. It relates to a leak detection system and a method of operation.

In general, in the semiconductor industry, as semiconductor devices become highly integrated and highly functional, a more efficient semiconductor manufacturing apparatus is required. Particularly, among the semiconductor manufacturing apparatuses, a manufacturing apparatus using gas is widely used, and an etching process using gas may correspond to this.

Therefore, a gas supply device for supplying a gas to a process chamber, which is a space where the process is performed, is required to perform a process using gas. However, when gas is supplied to the process chamber through the gas supply device, the gas often leaks to the outside during gas supply.

Hereinafter, the gas supply apparatus according to the prior art will be described.

1 is a structural diagram showing a gas supply device 30 according to the prior art.

As shown in FIG. 1, the gas supply device 30 includes a flow controller 10, a gas line 12, and a process chamber 14.

The flow controller 10 is provided to be connected through the process chamber 14 and the gas line 12. The flow controller 10 is provided with a temperature controller (not shown) therein, for example, when the H 2 O (A) in the liquid state is introduced through the inlet of the flow controller 10, the temperature A high temperature is applied to the H 2 O (A) in the liquid state through a control device, and the gas is converted into H 2 O (A ′) in the gas state and output.

The gas line 12 is provided between the flow controller 10 and the process chamber 14. The gas line 12 serves as a passage through which the gaseous H 2 O (A ′) output through the flow controller 10 moves to the process chamber 14.

The process chamber 14 has one end connected to an opposite end of the gas line 12 connected to the flow controller 10. The gaseous H 2 O (A ′) output from the flow controller 10 is supplied to the process chamber 14 through the gas line 12. For example, a process of spraying the gaseous H 2 O (A ′) on the wafer in the process chamber 14 may be performed.

As such, when the gas is supplied from the outside and the gas is delivered through the gas supply device 30, the amount of gas output from the flow controller 10 and the amount of gas supplied to the process chamber 14 are Different things happen. That is, gas leakage occurs in the gas line 12 of the gas supply device 30.

However, according to the related art, when a gas leakage situation occurs in the gas line 12, there is no system to detect or prevent the gas leakage situation, thereby preventing a process failure due to the gas leakage situation and increasing the operation efficiency of the gas supply device. I came up with a way.

Accordingly, an object of the present invention is to provide a gas leak detection system and a gas leak detection method of a gas supply device that can overcome the problems of the prior art as described above.

Another object of the present invention is to provide a gas leak detection system and a gas leak detection method of the gas supply device for preventing and minimizing the process failure.

Still another object of the present invention is to provide a gas leak detection system and a gas leak detection method of a gas supply device for increasing the operation efficiency of the gas supply device.

According to an aspect of the present invention for achieving some of the above technical problems, the gas leak detection system of the gas supply device according to the present invention, provides a passage for gas supply, a gas line having some transparent tube And a light emitter for irradiating light to the transparent tube of the gas line, a refraction sensor for detecting the refraction angle of the light passing through the transparent tube, and a refraction angle detected by the refraction sensor to determine whether the gas is leaked. And a comparator for generating an interlock signal when determining a gas leak in the gas line.

The gas supplied to the gas line may be H 2 O. The light irradiated from the light emitter may be disposed adjacent to the gas line at a position to vertically incident the gas line. The comparator compares the refraction angle input by the refraction angle sensed by the refraction detection sensor and the refraction angle input through the input unit with respect to the reference refraction angle, and when the refraction angle is different from the reference refraction angle, gas leakage occurs in the gas line. It may be provided with a comparison detecting unit for detecting and an output unit for outputting an interlock signal when the gas leak is recognized.

According to another aspect of the present invention for achieving some of the above technical problem, the gas leak detection method of the gas supply device according to the present invention is a) having a gas line having a portion of the transparent section and transparent of the gas line Irradiating light with a tube to sense an angle of refraction; b) recognizing that a gas leak occurs in the gas line when the angles of refraction are different from each other in comparison with the reference angles of refraction; And c) generating and outputting an interlock signal to the outside when the gas leak is recognized to block the gas supply in the gas line.

The step b) may further include the step of allowing the gas supply in the gas line to continue when the reference refractive angle and the refractive angle are the same.

According to the configuration of the present invention, it is possible to prevent and minimize the process failure of the semiconductor manufacturing equipment, and to increase the operation efficiency of the gas supply device.

Hereinafter, an embodiment of the present invention will be described in detail with reference to the accompanying drawings without any intention other than to provide a thorough understanding of the present invention to those skilled in the art.

2 is a structural diagram of a gas leak detection system 100 of a gas supply apparatus according to an embodiment of the present invention.

As shown in FIG. 2, the gas leak detection system 100 of the gas supply device includes a flow controller 102, a gas line 104, a process chamber 106, a light emitter 110, a refraction sensor 112, And a comparator 114.

The flow controller 102 controls the flow rate of the gas used in the process chamber 106 from the outside, and opens and closes the gas valve provided therein to supply gas to the process chamber 106. do. The flow controller 102 is provided in connection with the gas line 104 and the comparator 114.

For example, when H 2 O (B) in a liquid state is supplied to the flow controller 102, the flow controller 102 sets a high temperature through the temperature controller (not shown) to the H 2 O in the liquid state. It is applied to (B) to change the liquid H 2 O (B) to gaseous H 2 O (B '). As a result, the feed material is in the form of a gas, and the flow controller 102 opens a gas valve provided therein to output the gaseous H 2 O (B ′) to the gas line 104.

The gas line 104 is provided between the flow controller 102 and the process chamber 106, and a part of the gas line 104 is provided as a transparent tube 108. The gas line 104 is used as a passage for moving the gaseous H 2 O (B ′) output through the flow controller 102 to the process chamber 106. In particular, the transparent tube 108, which is a part of the gas line 104, allows the light irradiated through the light emitter 110 to pass through the gaseous H 2 O (B ′) flowing in the gas line 104. It is a transparent pipe.

The process chamber 106 is provided with one surface connected to an opposite surface of the gas line 104 connected to the flow controller 102. In addition, the process chamber 106 is a space where a process of spraying the gaseous H 2 O (B ′) supplied through the gas line 104 on a wafer is performed. A nozzle and a wafer connected to the gas line 104 are provided.

The light emitter 110 is provided to be adjacent to the gas line 104 at a position at which the irradiated light is incident perpendicularly to the gas line 104. The light emitter 110 serves to irradiate light to the transparent tube 108.

The refraction detection sensor 112 is provided in contact with the transparent tube 1018 while being symmetrical with the light emitter 110 with the transparent tube 108 interposed therebetween in the gas line 104. In addition, the refractive sensor 112 is also provided in connection with the comparator 114.

Hereinafter, the sensing process of the sensing unit 116 will be described in more detail with reference to FIG. 3.

The comparator 114 is provided between the flow controller 102 and the refractive sensor 112. The comparator 114 receives the refraction angle sensed by the refraction sensor 112 and determines this as the reference refraction angle. Thereafter, the difference between the reference refractive angle and the next sensed refractive angle is compared.

In this case, when the reference refractive angle and the next sensed refractive angle are different, the interlock signal ILS is recognized so that the gas leakage occurs in the gas line 104 and the gas is no longer supplied to the process chamber 106. Is generated and output to the flow controller 102.

Hereinafter, the sensing process of the gas leak detection system will be described in more detail.

3 is an enlarged structural diagram of the sensing unit of FIG. 2.

As shown in FIG. 3, when light is irradiated from the light emitter 110 to the gas line 104,

When the light is irradiated by using the light emitter 110 to a part of the transparent tube 108 of the gas line 104 in which gaseous H 2 O (B ′) flows, the light is emitted from the gas line 104. It is refracted through gaseous H 2 O (B ′). At this time, the light is different angles depending on the type of gas flowing in the gas line 104, that is, the refractive medium

Figure 112007028636668-PAT00001
Refract to The refraction sensor 112 is the angle of refraction of the light
Figure 112007028636668-PAT00002
Sensing.

At this time, through the Snell's law (Snell's law) the angle of refraction, each different depending on the type of gas in the gas line

Figure 112007028636668-PAT00003
This can be explained. Snell's law is as follows. 'sin
Figure 112007028636668-PAT00004
/ sin i = n 2 / n 1 '(where i is the angle of incidence,
Figure 112007028636668-PAT00005
Is the refractive angle, n 1 is the refractive index of the incident medium, and n 2 is the refractive index of the refractive medium.)

That is, when light is incident on the same incidence medium at the same incidence angle, the refractive angle is changed as the refractive medium is changed.

Figure 112007028636668-PAT00006
It can also be seen that the difference.

Therefore, when the leakage of the gaseous H 2 O (B ') from the outside to enter the gas line 104, the refractive medium (n 2 ) is different, the refractive angle

Figure 112007028636668-PAT00007
This is also different from before. Therefore the angle of refraction of the light
Figure 112007028636668-PAT00008
The change of the gas line 104 can determine whether the gas leaks. At this time, the external gas may be nitrogen.

Hereinafter, the comparator of the gas leak detection system will be described in more detail.

4 is a block diagram inside the comparator 114 of FIG.

As shown in FIG. 4, the comparator includes an input unit 111, a comparison detecting unit 113, and an output unit 115.

The input unit 111, the light irradiated from the light emitter is refracted through the H 2 O (B ') of the gas state in the gas line 104, the light of the sensed through the refractive sensor 112 Refraction angle

Figure 112007028636668-PAT00009
Receives it and outputs it to the comparison detecting unit 113. Refraction angle
Figure 112007028636668-PAT00010
For example, it is defined as "the reference refractive angle" (α).

The comparison detecting unit 113 receives the next sensed refraction angle β continuously from the input unit 111 to the input unit 111 and is transmitted to the comparison detecting unit 113. Therefore, the comparison detecting unit 113 compares the reference refractive angle (α) with the next refractive angle (β) to determine whether the difference.

If the reference refraction angle α and the next sensed refraction angle β are the same, it is recognized that no gas leak occurs in the gas line 104 and the gas supply is smoothly performed. Therefore, the refraction detection sensor 112 has a next refraction angle

Figure 112007028636668-PAT00011
Sensing and repeating the comparison with the reference refractive angle described above.

However, if the reference refraction angle α and the next sensed refraction angle β are different from each other, it is determined that the external gas in the gas line 104 has entered. That is, the gas line 104 detects that a gas leak occurs and generates a gas leak signal GLS and transmits it to the output unit 115.

The output unit 115 receives the gas leak signal GLS through the comparison detecting unit 113 to generate an interlock signal ILS for stopping gas supply, and transmits the interlock signal ILS to the flow controller 102. do.

Therefore, the flow controller 102 receiving the interlock signal ILS locks the gas valve provided therein so that no more gas is output through the flow controller 102.

5 is a flow chart of a gas leak detection method according to another embodiment of the present invention.

As shown in Figure 5, the gas leak detection method first opens the gas valve in the flow controller to supply gas to the gas line (S10). After gas is supplied to the gas line, light is scanned into the gas line (S12).

After injecting the light into the gas line, after sensing the refractive angle of the light, and outputs it (S14). After outputting the refraction angle, it is checked whether the refraction angle is equal to the reference refraction angle (S16).

When the refraction angle and the reference refraction angle are the same, the gas line is sensed that the gas is normally supplied, the next refraction angle is sensed (S14) and the operation is repeated to compare with the reference refraction angle (S16).

In this case, if the refractive angle and the reference refractive angle are different from each other, it is determined that a gas leak occurs in the gas line (S18). After the gas leak is determined, the gas valve in the flow controller is closed (S20).

Thus, by detecting whether a gas leak occurs in the gas line of the gas supply device, when the gas leakage occurs, the gas supply can be stopped.

As described above, in the gas leak detection system of the gas supply device, by adding the gas leak detection system to the gas supply device, it is possible to reduce process defects and increase the operation efficiency of the gas supply device.

The description of the above embodiments is merely given by way of example with reference to the drawings for a more thorough understanding of the present invention, and should not be construed as limiting the present invention. In addition, it will be apparent to those skilled in the art that various changes and modifications can be made without departing from the basic principles of the present invention.

As described above, according to the present invention, by adding a gas leak detection system to the gas supply device, it is possible to prevent and minimize the process defect of the semiconductor device manufacturing equipment, and to increase the operation efficiency of the gas supply device.

Claims (6)

In the gas leak detection system of the gas supply in the semiconductor manufacturing facility: A gas line providing a passage for gas supply, the gas line having a part of a transparent tube; A light emitter for irradiating light to a transparent section of the gas line; A refraction detection sensor for detecting a refraction angle of light passing through the transparent section; A gas leak of the gas supply apparatus comprising a comparator for generating an interlock signal when the gas leak is determined by comparing the refractive angle detected by the refractive sensor with a reference refractive angle to determine whether the gas is leaked in the gas line. Detection system. The method of claim 1, Gas leak detection system of the gas supply device, characterized in that the gas supplied to the gas line is H 2 O. The method of claim 1, The light emitted from the light emitter is a position to be perpendicular to the gas line, the gas leakage detection system of the gas supply device, characterized in that provided adjacent to the gas line. The method of claim 1, The comparator includes: an input unit configured to receive an angle of refraction detected by the refraction sensor; A comparison detecting unit which recognizes that a gas leak occurs in the gas line when the refractive angle is different from the reference refractive angle by comparing the refractive angle inputted through the input unit with a reference refractive angle; And a gas leak detection system for outputting an interlock signal when a gas leak is recognized. In the gas leak detection method of the gas supply device in the semiconductor manufacturing equipment: a) sensing a refractive angle by providing a gas line having a portion of a transparent section and irradiating light to the transparent section of the gas line; b) recognizing that a gas leak occurs in the gas line when the angles of refraction are different from each other in comparison with the reference angles of refraction; And and c) generating and outputting an interlock signal to the outside when the gas leak is recognized to cut off the gas supply in the gas line. The method of claim 5, The step b) further comprises the step of continuing to supply the gas in the gas line when the reference refractive angle and the refractive angle is the same as each other, the method of operating a gas leak detection system of the gas supply device.
KR1020070036763A 2007-04-16 2007-04-16 Gas leakage sensing system for gas supply device and method for gas leakage sensing KR20080093189A (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160004009U (en) 2015-05-13 2016-11-23 현대중공업 주식회사 The device for detecting a gas leakage

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20160004009U (en) 2015-05-13 2016-11-23 현대중공업 주식회사 The device for detecting a gas leakage

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