KR20080075629A - Exposure apparatus using integrated optics - Google Patents

Exposure apparatus using integrated optics Download PDF

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Publication number
KR20080075629A
KR20080075629A KR1020070014787A KR20070014787A KR20080075629A KR 20080075629 A KR20080075629 A KR 20080075629A KR 1020070014787 A KR1020070014787 A KR 1020070014787A KR 20070014787 A KR20070014787 A KR 20070014787A KR 20080075629 A KR20080075629 A KR 20080075629A
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South Korea
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light
optical system
exposure
exposure apparatus
light source
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KR1020070014787A
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Korean (ko)
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KR100889954B1 (en
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김종수
이수진
김창식
최한섭
최성수
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주식회사 프로텍
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/201—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by an oblique exposure; characterised by the use of plural sources; characterised by the rotation of the optical device; characterised by a relative movement of the optical device, the light source, the sensitive system or the mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70991—Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Abstract

An exposure apparatus using an integrated optical system is provided to improve tact time compared with an exposure apparatus using a scanner, thereby enhancing productivity. An exposure apparatus using an integrated optical system comprises a UV light source(10) which radiates UV rays; a cube beam splitter(11) which splits the light from the UV light source into the light having uniform intensity; an integrated optical system(13) which comprises a specific dielectric multilayered thin film coating whose each reflected surface is pre-calculated and splits the light entered through the cube beam splitter into a certain number of light having uniform intensity; and an exposure head which carries out the exposure by the light having uniform intensity entered from the integrated optical system to the part where a code is located.

Description

집적 광학계를 이용한 노광장치{Exposure apparatus using integrated optics}Exposure apparatus using integrated optics

도 1은 본 발명에 의한 집적 광학계를 이용한 노광장치의 평면도이다.1 is a plan view of an exposure apparatus using an integrated optical system according to the present invention.

도 2는 도 1에 개시된 집적 광학계를 이용한 노광장치의 측면도이다.FIG. 2 is a side view of an exposure apparatus using the integrated optical system disclosed in FIG. 1.

도 3은 도 2에 개시된 노광 헤드의 개략 구성도이다.3 is a schematic configuration diagram of the exposure head disclosed in FIG. 2.

도4는 도 2에 개시된 노광 헤드의 평면도 및 노광 영역을 보인 도면이다.4 is a plan view and an exposure area of the exposure head disclosed in FIG. 2.

도 5는 종래의 노광장치에 의해 얻어진 OCR 코드와 VCR 코드의 예들이다.5 shows examples of an OCR code and a VCR code obtained by a conventional exposure apparatus.

도 6은 DMD의 부분 확대도이다.6 is a partially enlarged view of a DMD.

도 7a 및 도 7b는 도 6에 개시된 DMD의 동작상태를 보인 예시도이다.7A and 7B are exemplary views illustrating an operation state of the DMD disclosed in FIG. 6.

** 도면의 주요부분에 대한 부호의 설명 **** Explanation of symbols for main parts of drawings **

10: UV 광원 11: 큐브형 빛살 가르게10: UV light source 11: cube light

12, 17: 미러 13: 집적 광학계12, 17: mirror 13: integrated optical system

14: 노광 헤드 15: 회절 광학 소자14: exposure head 15: diffractive optical element

16: DMD 18: 프로젝션 광학계16: DMD 18: Projection Optics

19: 마이크로 미러 20: SRAM 셀19: micromirror 20: SRAM cell

본 발명은 LCD, PDP 패널 등에 OCR 코드와 VCR 코드를 노광시키는 집적 광학계를 이용한 노광장치에 관한 것이다. 특히 본 발명은 큐브형 빛살 가르게(cube beam spilltter)와 집적 광학계(integrated optics)를 이용하여 UV 광원의 광을 균일한 세기를 가지는 광으로 분리시킨 후 노광 헤드(exposure head) 상에 입사시켜 노광을 행할 수 있도록 하는 집적 광학계를 이용한 노광장치에 관한 것이다.The present invention relates to an exposure apparatus using an integrated optical system for exposing an OCR code and a VCR code to an LCD, PDP panel, or the like. In particular, the present invention uses a cube beam spilltter and integrated optics to separate the light of the UV light source into light having a uniform intensity, and then incident on an exposure head to expose the light. An exposure apparatus using an integrated optical system that can be performed.

최근에는 LCD, PDP, OLED 등과 같이 다양한 유형의 디스플레이 디바이스가 널리 상용화됨에 따라 이를 양산하기 위해 필요한 노광장치의 개발이 보다 활성화되고 있는데, 예를 들어 레이저 마킹 장치를 이용하는 방식의 노광장치 등을 예로 들 수 있다.Recently, as various types of display devices such as LCDs, PDPs, and OLEDs are widely commercialized, development of exposure apparatuses required to mass-produce them has been more active. For example, an exposure apparatus using a laser marking apparatus is an example. Can be.

상기 레이저 마킹 장치를 이용한 노광장치는 레이저 마킹 장치를 이용하여 각 코드(code)를 X, Y 두 축을 가지는 2차원 스캐너를 이용하여 마킹(Marking)하는 구조 또는 UV 광원(레이저)과 포토 마스크(Photo Mask)를 이용하여 노광시키는 방식을 일컫는다.The exposure apparatus using the laser marking apparatus has a structure for marking each code using a two-dimensional scanner having two axes of X and Y using a laser marking apparatus, or a UV light source (laser) and a photo mask (Photo). Refers to a method of exposing using a mask).

여기서, UV 광원과 포토 마스크를 이용하는 방식은 코드가 바뀜에 따라 여러 가지 마스크를 구비하고 실제 노광시 계속 바꾸어 주어야 하는 번거로움이 있어 현재에는 거의 사용되지 않고 있다.Here, the method using the UV light source and the photo mask has various masks as the code is changed, and it is cumbersome to continuously change it during the actual exposure, so it is rarely used at present.

상기한 레이저 마킹 장치를 이용한 노광장치는 UV 레이저에서 나온 광이 X, Y 스캐너를 통하여 LCD 또는 PDP 패널 상에 노광을 실시한다. 노광은 다중 헤드를 구성하여 행하거나 문형 스테이지(gantry stage) 위에 레이저와 광학계 그리고 X, Y 스캐너를 장착한 후 이것을 이동시키면서 행할 수 있다.In the exposure apparatus using the laser marking apparatus, the light emitted from the UV laser is exposed on the LCD or PDP panel through the X and Y scanners. The exposure may be performed by constructing multiple heads or by moving a laser, an optical system, and an X and Y scanner after mounting on a gantry stage.

상기한 바와 같은 종래의 레이저 마킹 장치를 이용한 노광장치는 2차원 스캐너의 주사속도 및 정확도에 문제가 일어나는 한편, 코드(code)의 크기가 더 작아질 경우 대응하기 힘들며, 택트 타임(tact time) 또한 길어지는 문제가 있다.While the exposure apparatus using the conventional laser marking apparatus as described above has problems in the scanning speed and accuracy of the two-dimensional scanner, it is difficult to cope when the code size is smaller, and the tact time also There is a problem.

또한 포토 마스크를 이용하는 경우는 제일 깨끗한 패턴을 얻을 수 있지만 위에서도 언급했듯이 여러 가지 마스크를 준비해야 하고, 노광 작업시마다 여러 가지 마스크를 계속해서 교환해 주어야 하는 번거로움이 있다.In addition, when using a photo mask, the cleanest pattern can be obtained. However, as mentioned above, it is difficult to prepare various masks and to continuously change various masks for each exposure operation.

특히 포토 마스크를 이용하는 경우 역시 레이저 마킹 장치를 이용하는 노광장치와 마찬가지로 코드의 수가 많아질수록 택트 타임이 길어지는 문제점이 있다.In particular, in the case of using a photo mask, like the exposure apparatus using a laser marking apparatus, there is a problem in that the tact time becomes longer as the number of codes increases.

상기한 바와 같은 종래의 문제점을 해결하기 위한 본 발명은 큐브형 빛살 가르게와 집적 광학계를 이용하여 UV 광원의 광을 균일한 세기를 가지는 광으로 분리시킨 후 노광 헤드 상에 입사시켜 노광을 행할 수 있도록 함으로써 스캐너를 이용하는 노광장치에 비해 더욱 빠른 택트 타임을 보이므로 생산성 향상을 도모할 수 있도록 하는데 그 목적이 있다.The present invention for solving the conventional problems as described above can be performed by separating the light of the UV light source into a light having a uniform intensity using a cube-shaped light filter and an integrated optical system and then incident on the exposure head to perform exposure. In order to improve productivity, the present invention provides faster tact time compared to an exposure apparatus using a scanner.

또한 본 발명은 DMD를 이용하는 노광 헤드를 사용할 경우 미러들의 최소 피치가 15㎛이므로 앞으로 산업계에서 요구하는 파인 피치 코드에도 충분히 대응할 수 있도록 하는데 그 목적 있다.In addition, the present invention has a minimum pitch of 15㎛ when using an exposure head using a DMD, so that the present invention can fully cope with the fine pitch code required by the industry.

상기한 바와 같은 목적을 달성하기 위한 본 발명에 의한 집적 광학계를 이용한 노광장치는, UV 광원을 발진하는 UV 광원; 상기 UV 광원에서 나온 광을 균일한 세기를 가지는 광으로 분리시키는 큐브형 빛살 가르게; 반사되는 각 면을 미리 계산된 특수한 유전체 다층 박막 코팅을 통하여 구성되고 상기 큐브형 빛살 가르게를 통해 입사된 광을 어떤 특정한 수의 균일한 세기를 가지는 광으로 분리시키는 집적 광학계; 및 상기 집적 광학계로부터 균일한 세기를 가지는 광이 코드가 위치하고 있는 부분에 입사되어 노광을 행하는 노광 헤드;를 포함하는 것을 특징으로 한다.An exposure apparatus using an integrated optical system according to the present invention for achieving the above object, the UV light source for oscillating a UV light source; A cube-shaped light beam that separates the light from the UV light source into light having a uniform intensity; An integrated optical system configured through each of the pre-calculated special dielectric multilayer thin film coatings to separate the reflected surfaces into light having a certain number of uniform intensities; And an exposure head in which light having a uniform intensity from the integrated optical system is incident on a portion where the code is located to perform exposure.

또한 본 발명에 있어서, 상기 UV 광원은 350∼410㎚의 파장을 가지는 광원으로서 레이저 또는 수은 램프 등이 사용될 수 있다.In the present invention, the UV light source may be a laser or a mercury lamp or the like as a light source having a wavelength of 350 ~ 410nm.

또한 본 발명에 있어서, 상기 노광 헤드는 입사된 UV 광을 균일한 세기와 직사각형 형태로 바꾸어 주는 회절 광학 소자(DOE ; Diffractive Optical Element); 상기 회절 광학 소자로부터 입사된 UV 광을 DMD 상에 반사시켜 주는 미러; 서로 다르게 움직이는 다수의 마이크로 미러들로 이루어지고 상기 미러를 통해 입사되는 UV 광을 반사하는 DMD; 및 상기 DMD의 각 마이크로 미러들에 의해 변조된 픽셀(pixel) 형태의 광을 피 노광물에 전달해 주는 프로젝션 광학계;로 구성될 수 있다.In the present invention, the exposure head is a diffractive optical element (DOE; Diffractive Optical Element) for converting the incident UV light into a uniform intensity and rectangular shape; A mirror for reflecting UV light incident from the diffractive optical element onto a DMD; A DMD consisting of a plurality of micro mirrors moving differently and reflecting UV light incident through the mirror; And a projection optical system configured to transmit light having a pixel shape modulated by the micromirrors of the DMD to an object to be exposed.

이하, 본 발명을 상세히 설명한다.Hereinafter, the present invention will be described in detail.

본 발명에 의한 집적 광학계를 이용한 노광장치는 도 1에 도시한 바와 같이, UV 광원(10)(source)으로부터 나온 광이 큐브형 빛살 가르게(cube beam splitter)(11)에 의해 균일한 세기를 가지는 광으로 분리되어 직접 혹은 미러(12)에 반사된 후 하나 혹은 두 개의 이상의 집적 광학계(integrated optics)(13)로 입사되게 된다.In the exposure apparatus using the integrated optical system according to the present invention, as shown in FIG. 1, the light emitted from the UV light source 10 is uniformly intensified by a cube beam splitter 11. The branches are split into light and reflected directly or on the mirror 12 and then incident on one or more integrated optics 13.

여기서, UV 광원(10)은 350∼410㎚의 파장을 가지는 광원으로 레이저 또는 수은 램프가 사용될 수 있다.The UV light source 10 may be a laser or a mercury lamp as a light source having a wavelength of 350 to 410 nm.

상기 집적 광학계(13)는 일반적으로 반사되는 각 면을 미리 계산된 특수한 유전체 다층 박막 코팅을 통하여 구성되고, 이는 입사된 광을 어떤 특정한 수의 균일한 세기를 가지는 광으로 분리시키는 기능을 갖는다. The integrated optical system 13 is generally constructed through a special, pre-calculated, special dielectric multilayer thin film coating, which has the function of separating the incident light into a certain number of uniform intensities of light.

이렇게 집적 광학계(13)에 의해 균일한 세기를 가지는 광으로 분리된 광은 도 2에서와 같이 각각 노광 헤드(exposure head)(14)에 입사된다.The light separated by the integrated optical system 13 into light having a uniform intensity is incident on the exposure head 14 as shown in FIG. 2.

즉, 균일한 세기를 가지는 광은 코드가 위치하고 있는 부분의 노광 헤드(14) 상에 입사되어 노광을 행하게 된다.That is, light having a uniform intensity is incident on the exposure head 14 in the portion where the cord is located to perform exposure.

도 3은 위에서 언급한 노광 헤드(14)를 보인 것으로서, 노광 헤드(14)는 입사된 UV 광을 균일한 세기와 직사각형 형태로 바꾸어 주는 회절 광학 소자(15)(DOE ; Diffractive Optical Element)와, 상기 UV 광을 DMD(17) 상에 조사시켜 주는 미러(16)와, 서로 다르게 움직이는 다수의 마이크로 미러들로 이루어지고 미러(16)를 통해 입사되는 UV 광을 반사하는 DMD(17)와, 이 DMD(17)의 각 마이크로 미러들에 의해 변조된 픽셀(pixel) 형태의 광을 피 노광물에 전달해 주는 프로젝션 광학계(18)로 구성되어 있다.3 shows the above-mentioned exposure head 14, which includes a diffractive optical element 15 (DOE) for converting incident UV light into a uniform intensity and a rectangular shape, A mirror 16 for irradiating the UV light onto the DMD 17, a DMD 17 composed of a plurality of micro mirrors moving differently and reflecting the UV light incident through the mirror 16; The projection optical system 18 is configured to transmit pixel-shaped light modulated by the micromirrors of the DMD 17 to the object to be exposed.

도 4는 본 발명에 의한 노광장치에서의 노광 헤드(14)들의 배치를 나타낸 것으로서, 노광 헤드(14)는 실제 조사되는 영역이 DMD(16)의 크기에 따라 달라지므로 노광 헤드(14) 자체를 서로 엇갈리게 배치함으로써 노광 영역 전체를 빠짐없이 노광시킬 수 있다.FIG. 4 shows the arrangement of the exposure heads 14 in the exposure apparatus according to the present invention. The exposure head 14 is used to expose the exposure head 14 itself since the area to be irradiated depends on the size of the DMD 16. By arranging them mutually, the whole exposure area can be exposed without missing.

도 5는 기존의 방법으로 노광시킨 VCR 코드와 OCR 코드의 실시예이다.5 is an embodiment of a VCR code and an OCR code exposed by a conventional method.

도 6은 노광 헤드(14)를 구성하는 DMD(16)를 확대한 것으로서, DMD(16)는 메모리 셀인 SRAM 셀(20) 상에 마이크로 미러(19)가 지주에 의해 지지되어 배치된 것으로서 픽셀을 구성하는 다수의 마이크로 미러(19)를 엇갈리게 배열하여 구성된 미러 장치이다.FIG. 6 is an enlarged view of the DMD 16 constituting the exposure head 14. The DMD 16 includes a pixel in which the micromirror 19 is supported and disposed by a support on the SRAM cell 20, which is a memory cell. It is a mirror device configured by arranging a plurality of micro mirrors 19 to be arranged alternately.

각 픽셀에는 최상부에 지주에 지지된 마이크로 미러(19)가 설치되어 있고, 마이크로 미러(19)의 표면에는 알루미늄 등의 반사율이 높은 재료가 증착되어 있다. 또한 마이크로 미러(19)의 반사율은 90% 이상이다. 그리고 마이크로 바로 밑에는 힌지 및 요크를 포함하는 지지를 통해서 통상의 반도체 메모리 제조라인에서 제조되는 실리콘 게이트의 CMOS의 SRAM 셀(20)이 배치되어 있고, 전체는 일체형으로 구성되어 있다.Each pixel is provided with a micromirror 19 supported at the top by a support, and a material having a high reflectance such as aluminum is deposited on the surface of the micromirror 19. In addition, the reflectance of the micromirror 19 is 90% or more. The SRAM cell 20 of the CMOS of a silicon gate manufactured in a conventional semiconductor memory manufacturing line is disposed below the micro via a support including a hinge and a yoke, and the whole is integrally formed.

DMD(16)의 SRAM 셀(20)에 디지털 신호가 기록되면 지주에 지지된 마이크로 미러(19)가 대각선을 중심으로 하여 DMD(16)가 배치된 기판 측에 대하여 ±10도의 범위에서 경사진다. When a digital signal is written to the SRAM cell 20 of the DMD 16, the micromirror 19 supported on the post is inclined in a range of ± 10 degrees with respect to the side of the substrate on which the DMD 16 is disposed about a diagonal line.

도 7a는 마이크로 미러(19)가 온 상태가 +10도로 경사진 상태를 나타내고, 도 7b는 마이크로 미러(19)가 오프상태인 -10도로 경사진 상태를 나타낸다. FIG. 7A shows a state in which the micromirror 19 is inclined at +10 degrees, and FIG. 7B shows a state in which the micromirror 19 is inclined at -10 degrees.

따라서 화상신호에 따라 DMD(16)의 각 픽셀에 있어서의 마이크로 미러(19)의 경사를 도 5에서와 같이 제어함으로써 DMD(16)에 입사된 광은 각각의 마이크로 미러(19)의 경사방향으로 반사된다.Accordingly, by controlling the inclination of the micromirror 19 at each pixel of the DMD 16 in accordance with the image signal as shown in FIG. 5, the light incident on the DMD 16 is in the inclination direction of each micromirror 19. Reflected.

따라서 본 발명에 의하면, 2차원 스캐너의 주사속도 및 정확도에 문제가 일어나고 코드(code)의 크기가 더 작아질 경우 대응하기 힘들며 택트 타임(tact time)이 길어지는 종래의 노광장치와는 달리 본 발명은 큐브형 빛살 가르게(cube beam spilltter)와 집적 광학계(integrated optics)를 이용하여 UV 광원의 광을 균일한 세기를 가지는 광으로 분리시킨 후 노광 헤드(exposure head) 상에 입사시켜 노광을 행할 수 있도록 함으로써 스캐너를 이용하는 노광장치에 비해 더욱 빠른 택트 타임을 보이므로 생산성 향상을 도모할 수 있는 효과가 있다.Therefore, according to the present invention, unlike the conventional exposure apparatus in which a problem occurs in the scanning speed and accuracy of the two-dimensional scanner and the size of the code becomes smaller, it is difficult to cope with a longer tact time. The light beam of the UV light source can be separated into light having a uniform intensity by using a cube beam spilltter and integrated optics, and then incident on an exposure head to perform exposure. By doing so, it shows a faster tact time than an exposure apparatus using a scanner, thereby improving productivity.

또한 본 발명은 DMD를 이용하는 노광 헤드를 사용할 경우 미러들의 최소 피치(pitch)가 15㎛이므로 앞으로 산업계에서 요구하는 파인 피치 코드(fine pitch code)에도 충분히 대응할 수 있는 효과가 있다.In addition, since the minimum pitch of the mirrors is 15 μm when the exposure head using the DMD is used, there is an effect that it can sufficiently cope with the fine pitch code required by the industry in the future.

Claims (3)

UV 광원을 발진하는 UV 광원;A UV light source that oscillates the UV light source; 상기 UV 광원에서 나온 광을 균일한 세기를 가지는 광으로 분리시키는 큐브형 빛살 가르게;A cube-shaped light beam that separates the light from the UV light source into light having a uniform intensity; 반사되는 각 면을 미리 계산된 특수한 유전체 다층 박막 코팅을 통하여 구성되고 상기 큐브형 빛살 가르게를 통해 입사된 광을 어떤 특정한 수의 균일한 세기를 가지는 광으로 분리시키는 집적 광학계; 및 An integrated optical system configured through each of the pre-calculated special dielectric multilayer thin film coatings to separate the reflected surfaces into light having a certain number of uniform intensities; And 상기 집적 광학계로부터 균일한 세기를 가지는 광이 코드가 위치하고 있는 부분에 입사되어 노광을 행하는 노광 헤드;An exposure head in which light having a uniform intensity from the integrated optical system is incident on a portion where a code is located to perform exposure; 를 포함하는 것을 특징으로 하는 직접 광학계를 이용한 노광장치.Exposure apparatus using a direct optical system comprising a. 제1항에 있어서,The method of claim 1, 상기 UV 광원은 350∼410㎚의 파장을 가지는 광원으로서 레이저 또는 수은 램프인 것을 특징으로 하는 집적 광학계를 이용한 노광장치.The UV light source is an exposure apparatus using an integrated optical system, characterized in that the light source having a wavelength of 350 ~ 410nm is a laser or a mercury lamp. 제1항에 있어서,The method of claim 1, 상기 노광 헤드는 입사된 UV 광을 균일한 세기와 직사각형 형태로 바꾸어 주 는 회절 광학 소자(DOE ; Diffractive Optical Element);The exposure head may include a diffractive optical element (DOE) for converting incident UV light into a uniform intensity and a rectangular shape; 상기 회절 광학 소자로부터 입사된 UV 광을 DMD 상에 반사시켜 주는 미러;A mirror for reflecting UV light incident from the diffractive optical element onto a DMD; 서로 다르게 움직이는 다수의 마이크로 미러들로 이루어지고 상기 미러를 통해 입사되는 UV 광을 반사하는 DMD; 및 A DMD consisting of a plurality of micro mirrors moving differently and reflecting UV light incident through the mirror; And 상기 DMD의 각 마이크로 미러들에 의해 변조된 픽셀(pixel) 형태의 광을 피 노광물에 전달해 주는 프로젝션 광학계;A projection optical system configured to transmit light in a pixel form modulated by the micromirrors of the DMD to an object to be exposed; 로 구성되는 것을 특징으로 하는 집적 광학계를 이용한 노광장치.Exposure apparatus using an integrated optical system, characterized in that consisting of.
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