KR20080061128A - Display substrate and display apparatus having the same - Google Patents

Abstract

A display substrate and a display device having the same are provided to form a light shield layer on the display substrate, thereby enhancing the light transmission rate and reducing the manufacturing cost. A TFT(Thin Film Transistor) layer includes a gate line. A data line is insulated and crossed with the gate line. A TFT is connected with the gate line and the data line. A storage line is formed on the same layer as the gate line. A passivation layer covers the TFT layer. A color filter layer is formed on the passivation layer. A pixel electrode(240) is formed on the color filter layer and corresponds to each pixel. The first light shielding layer is formed on the same layer as the gate line and arranged between adjacent pixel electrodes. A second light shielding layer(260) is formed on the same layer as the data line and arranged between the first light shielding layer and the gate line. The color filter layer includes color filters with different colors.

Description

DISPLAY SUBSTRATE AND DISPLAY APPARATUS HAVING THE SAME}

1 is a plan view illustrating a display device according to an exemplary embodiment of the present invention.

2 is a cross-sectional view taken along the line II ′ of FIG. 1;

3 is an enlarged view illustrating an enlarged portion A of FIG. 1.

4 is a plan view illustrating a display device according to another exemplary embodiment of the present invention.

5 is a plan view illustrating a display device according to still another embodiment of the present invention;

6 is a cross-sectional view taken along the line II-II 'of FIG. 5,

7 is an enlarged view illustrating an enlarged portion B of FIG. 5.

FIG. 8 is an enlarged view illustrating another embodiment of the light blocking unit illustrated in FIG. 7.

FIG. 9 is an enlarged view illustrating still another embodiment of the light blocking unit illustrated in FIG. 7.

<Description of the symbols for the main parts of the drawings>

100: display device 200: display substrate

210: thin film transistor layer 220: protective film

230: color filter layer 240: pixel electrode

250: first light blocking film 260: second light blocking film

300: opposing substrate 400: liquid crystal layer

The present invention relates to a display substrate and a display device having the same, and more particularly, to a display substrate and a display device having the same that can prevent light leakage at the boundary of the color filters.

One of the display devices for displaying an image includes a display substrate, an opposite substrate coupled to face the display substrate, and a liquid crystal layer disposed between the two substrates.

In general, the display substrate includes signal wirings, a thin film transistor, a pixel electrode, and the like formed on an insulating substrate to independently drive a plurality of pixels. The opposing substrate includes a color filter layer made of color filters of red (R), green (G), and blue (B), a black matrix positioned at the boundary of the curl filters, and a common electrode facing the pixel electrode.

Recently, in order to prevent quality deterioration due to misalignment between the display substrate and the opposite substrate, a liquid crystal display apparatus having a color filter on array (COA) structure in which a color filter layer is formed on the display substrate has been proposed.

However, in consideration of misalignment between the display substrate and the opposing substrate, there is a limit in reducing the width of the black matrix formed on the opposing substrate, which causes a problem that the light transmittance is reduced. In addition, since the overcoating layer for flattening should be formed on the counter substrate having the black matrix, the overcoating layer causes a problem that the light transmittance is further reduced and the cost is increased.

Accordingly, the present invention has been made in view of such a problem, and the present invention provides a display substrate and a display device having the same, which can improve light transmittance and prevent light leakage generated at the boundary of color filters.

A display substrate according to an aspect of the present invention includes a thin film transistor layer, a protective film, a color filter layer, a pixel electrode, a first light blocking film, and a second light blocking film. The thin film transistor layer includes a gate line, a data line that is insulated from and crosses the gate line through a gate insulating layer, a thin film transistor connected to the gate line and the data line, and a storage line formed on the same layer as the gate line. The passivation layer covers the thin film transistor layer. The color filter layer is formed on the protective film. The pixel electrode is formed to correspond to each size on the color filter layer. The first light blocking layer is formed on the same layer as the gate line and is disposed between the pixel electrodes adjacent to each other. The second light blocking film is formed on the same layer as the data line and is disposed between the first light blocking film and the gate line.

The color filter layer includes color filters having different colors, and the first light blocking film and the second light blocking film are disposed at the boundary of the color filters.

The first light blocking layer may be connected to the storage line to which a common voltage is applied. In contrast, the first light blocking layer may be spaced apart from the gate line and the storage line to maintain a floating state.

The second light blocking layer may be spaced apart from the data line to maintain a floating state or be connected to the data line.

According to another aspect of the present invention, a display substrate includes a thin film transistor layer, a protective layer, a color filter layer, a pixel electrode, and a light blocking unit. The thin film transistor layer includes a gate line, a data line that is insulated from and crosses the gate line through a gate insulating layer, a thin film transistor connected to the gate line and the data line, and a storage line formed on the same layer as the gate line. The passivation layer covers the thin film transistor layer. The color filter layer is formed on the protective film. The pixel electrode is formed to correspond to each size on the color filter layer. The light blocking unit is formed in the thin film transistor layer and is disposed between the pixel electrodes adjacent to each other to cover an area that the data line cannot cover.

The color filter layer includes color filters having different colors, and the data line and the light blocking part are disposed at boundaries of the color filters.

The light blocking unit may include a first light blocking layer formed on the same layer as the gate line and a first light blocking layer formed on the same layer as the data line.

A display device according to an aspect of the present invention includes a display substrate, an opposite substrate coupled to the display substrate and having a common electrode formed on the opposite surface, and a liquid crystal layer disposed between the display substrate and the opposite substrate. The display substrate includes a thin film transistor layer, a protective film, a color filter layer, a pixel electrode, a first light blocking film, and a second light blocking film. The thin film transistor layer includes a gate line, a data line that is insulated from and crosses the gate line through a gate insulating layer, a thin film transistor connected to the gate line and the data line, and a storage line formed on the same layer as the gate line. The passivation layer covers the thin film transistor layer. The color filter layer is formed on the protective film. The pixel electrode is formed to correspond to each size on the color filter layer. The first light blocking layer is formed on the same layer as the gate line and is disposed between the pixel electrodes adjacent to each other. The second light blocking film is formed on the same layer as the data line and is disposed between the first light blocking film and the gate line.

According to another aspect of the present invention, a display device includes a display substrate, an opposite substrate coupled to the display substrate and having a common electrode formed on the opposite surface, and a liquid crystal layer disposed between the display substrate and the opposite substrate. The display substrate includes a thin film transistor layer, a protective layer, a color filter layer, a pixel electrode, and a light blocking unit. The thin film transistor layer includes a gate line, a data line that is insulated from and crosses the gate line through a gate insulating layer, a thin film transistor connected to the gate line and the data line, and a storage line formed on the same layer as the gate line. The passivation layer covers the thin film transistor layer. The color filter layer is formed on the protective film. The pixel electrode is formed to correspond to each size on the color filter layer. The light blocking unit is formed in the thin film transistor layer and disposed between the pixel electrodes adjacent to each other to cover an area that the data line cannot cover.

According to the display substrate and the display device having the same, a light blocking film may be formed on the display substrate to improve light transmittance and to prevent light leakage at the boundary of the color filters.

Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.

1 is a plan view illustrating a display device according to an exemplary embodiment of the present invention, FIG. 2 is a cross-sectional view taken along the line II ′ of FIG. 1, and FIG. 3 is an enlarged view of portion A of FIG. 1 enlarged. .

1, 2, and 3, the display device 100 includes a display substrate 200, an opposing substrate 300, and a liquid crystal layer 400.

The display substrate 200 includes the thin film transistor layer 210, the passivation layer 220, the color filter layer 230, the pixel electrode 240, the first light blocking layer 250, and the second light blocking layer 260.

The thin film transistor layer 210 is formed on the transparent insulating substrate 270. Insulating substrate 270 is formed of, for example, glass or plastic.

The thin film transistor layer 210 is insulated from the gate line GL by the gate line GL and the gate insulating layer 211 and crosses the data line DL, the gate line GL, and the data line DL. The transistor TFT and a storage line SL formed on the same layer as the gate line GL.

The gate line GL is formed on the insulating substrate 270 and, for example, is formed to extend in the horizontal direction.

The gate line GL may include, for example, a first gate line part GL1 and a second gate line part GL2 to drive each pixel by dividing it into two regions. In this case, the second gate line part GL2 is formed between the first gate line part GL1 and the storage line SL. In contrast, the gate line GL may include only the first gate line part GL1.

The storage line SL is simultaneously formed of the same material on the same layer as the gate line GL. The storage line SL is formed to extend in the same direction as the gate lines GL, for example, between the gate lines GL. The storage line SL forms a storage capacitor Cst facing the pixel electrode 240 with the gate insulating layer 211, the passivation layer 220, and the color filter layer 230 interposed therebetween. On the other hand, by forming a hole in the area of the color filter layer 230 corresponding to the storage line SL, the capacitance between the storage line SL and the pixel electrode 140 may be reduced to increase the capacitance of the storage capacitor Cst. Can be. The data voltage applied to the pixel electrode 240 through the thin film transistor TFT is maintained for one frame by the storage capacitor Cst.

The gate insulating layer 211 is formed on the insulating substrate 270 on which the gate line GL and the storage line SL are formed. The gate insulating film 211 is an insulating film for protecting and insulating the gate line GL and the storage wiring SL, and is formed of, for example, silicon nitride (SiNx).

The data line DL is formed on the gate insulating layer 211. The data line DL is insulated from the gate line GL and the storage line SL through the gate insulating layer 211, and is formed to extend in a direction crossing the gate line GL, for example, in a vertical direction.

The thin film transistor TFT is connected to the gate line GL and the data line DL so that at least one thin film transistor TFT is formed in each pixel. The thin film transistor TFT applies a data voltage applied through the data line DL to the pixel electrode 240 in response to a gate voltage applied through the gate line GL.

The thin film transistor TFT may include, for example, a first thin film transistor unit TFT1 and a second thin film transistor unit TFT2 in order to drive each pixel into two zones. In this case, the first thin film transistor unit TFT1 is connected to the first gate line unit GL1 and the data line DL, and the second thin film transistor unit TFT2 is connected to the second gate line unit GL2 and the data line ( DL). In contrast, the thin film transistor TFT may include only the first thin film transistor unit TFT1.

The first thin film transistor TFT1 may include a first gate electrode 212, a first active layer 213, a first source electrode 214, and a first drain electrode 215. The first gate electrode 212 is connected to the first gate line part GL1 and constitutes a gate terminal of the first thin film transistor unit TFT1. The first active layer 213 is formed on the gate insulating layer 211 corresponding to the position of the first gate electrode 212. The first active layer 213 is, for example, a semiconductor layer 213a made of amorphous silicon (hereinafter, referred to as a-Si) and amorphous silicon (hereinafter, n + a-Si) doped with a high concentration of n-type impurities. Ohmic contact layer 213b. The first source electrode 214 is formed on the first active layer 213 to be connected to the data line DL and constitutes a source terminal of the first thin film transistor unit TFT1. The first drain electrode 215 is formed on the first active layer 213 to be spaced apart from the first source electrode 214 to form a drain terminal of the first thin film transistor unit TFT1. The first drain electrode 215 is electrically connected to the first pixel electrode part 241 through the first contact hole CNT1 formed in the passivation layer 220 and the color filter layer 230.

The second thin film transistor TFT2 may include a second gate electrode 216, a second active layer 217, a second source electrode 218, and a second drain electrode 219. In the second thin film transistor TFT2, the second gate electrode 216 is connected to the second gate line GL2, and the second drain electrode 219 is formed on the passivation layer 220 and the color filter layer 230. Since the structure is substantially similar to that of the first thin film transistor TFT1 except for being connected to the second pixel electrode 242 through the second contact hole CNT2, detailed descriptions thereof will be omitted.

The passivation layer 220 is formed on the thin film transistor layer 210 including the gate line GL, the data line DL, the thin film transistor TFT, and the storage line SL. The passivation layer 220 is an insulating layer for protecting and insulating the thin film transistor layer 210, and is formed of, for example, silicon nitride (SiNx).

The color filter layer 230 is formed on the passivation layer 220. The color filter layer 230 may have a structure including a pigment for realizing color in the photosensitive organic composition. For example, the color filter layer 230 includes red, green, and blue color filters in which a red, green, or blue pigment is included in the photosensitive organic composition, respectively. The red, green, and blue color filters are regularly formed on the passivation layer 220 to have a predetermined pattern. For example, the red, green, and blue color filters are sequentially arranged corresponding to each pixel.

The color filter layer 230 is formed to have a relatively thick thickness to planarize the display substrate 200. For example, the color filter layer 230 is formed to a thickness of about 2.5㎛ 3.5㎛.

As such, by forming the color filter layer 230 formed on the opposing substrate 300 on the display substrate 200, the organic insulating film formed for the planarization of the display substrate 200 is removed to improve transmittance by about 7%. Cost reduction can be achieved.

The boundary portion 232 of the color filters having different colors is preferably formed to have a concave shape. When color filters having different colors overlap at the boundary portion 232 to form a protrusion, a tilt of the liquid crystal is generated at the protrusion by the vertical alignment force of the liquid crystal included in the liquid crystal layer 400. The tilt of is transferred to the liquid crystal of the adjacent portion may cause light leakage. Therefore, when the color filters of different colors are formed to be spaced apart from the boundary part 132 to form a concave shape instead of a protruding part, the direction in which the tilt of the liquid crystal is transferred toward the center may reduce the intensity of light leakage.

The pixel electrode 240 is formed on the color filter layer 230 to correspond to each pixel. The pixel electrode 240 is made of a transparent conductive material through which light can pass. For example, the pixel electrode 240 is formed of indium zinc oxide (IZO) or indium tin oxide (ITO).

The pixel electrode 240 may be formed in a zigzag form along the arrangement direction of the gate line GL to improve transmittance. Accordingly, the pixel electrode 240 is formed to overlap the data line DL. The pixel electrode 240 forms the storage capacitor Cst to face the storage line SL with the passivation layer 220 and the gate insulating layer 212 interposed therebetween.

The pixel electrode 240 may include, for example, a first pixel electrode part 241 and a second pixel electrode part 242 in order to drive each pixel by dividing into two zones. In this case, the first pixel electrode part 241 is connected to the first drain electrode 215 of the first thin film transistor TFT in the first contact hole CNT1 region, and the second pixel electrode part 242 is formed in the first contact hole CNT1 region. The second drain electrode 219 of the second thin film transistor unit TFT2 is connected to the second contact hole CNT2.

Meanwhile, since the pixel electrode 240 is formed independently of each pixel, the color filter layer 230 may be exposed by opening between adjacent pixels. Since impurities may leak through the exposed areas of the color filter layer 230 to contaminate the liquid crystal, an inorganic insulating layer (not shown) may be further formed between the color filter layer 230 and the pixel electrode 240 to prevent impurities from leaking out. Can be.

The first light blocking layer 250 is formed on the same layer as the gate line GL to be disposed between the pixel electrodes 240 adjacent to each other. Therefore, the first light blocking layer 250 is positioned at the boundary portion 232 of the color filters corresponding to the boundary portion of each pixel to block light transmission and to improve the contrast ratio. For example, when the interval between the pixel electrodes 240 is about 8 μm, the first light blocking layer 250 may have a width of about 10 μm or less. When the black matrix is formed on the counter substrate 300, the width of the black matrix is formed to about 12 μm in consideration of misalignment. However, the first light blocking layer 250 is formed on the display substrate 200 in place of the black matrix. By forming, the opening ratio of about 2% can be improved. In addition, since there is no optical characteristic deviation between the left and right domains due to misalignment of the display substrate 200 and the counter substrate 300, the display characteristics according to the viewing angle are stabilized. In addition, as the black matrix formed on the counter substrate 300 is removed, the overcoating layer used for planarization may be removed, thereby further reducing cost and improving transmittance.

The first light blocking layer 250 should be basically spaced apart from the gate line GL, connected to the storage line SL to which a common voltage is applied, or spaced apart from the storage line SL. I can keep it.

When the gate line GL includes the first gate line part GL1 and the second gate line part GL2, the first light blocking layer 250 may include the first gate line part GL1 and the storage line SL. The first light blocking portion 251 formed between the second light blocking portion 252 and the first gate line portion GL1 and the second gate line portion GL2 and the storage wiring SL formed between the first and second gate line portions GL2 and the storage wiring SL. The light blocking part 253 may be formed between the two gate line parts GL2. In this case, one end of the first light blocking part 251 is spaced apart from the first gate line part GL1 by a predetermined distance, and the other end thereof is connected to the storage line SL. In addition, one end of the second light blocking part 252 is connected to the storage line SL, and the other end is spaced apart from the second gate line part GL2 by a predetermined distance. In addition, one end of the third light blocking part 253 is spaced apart from the second gate line part GL2 by a predetermined distance, and the other end is spaced apart from the first gate line part GL1 by a predetermined distance. As such, the first light blocking layer 250 covers most of the boundary portion 232 of the color filters, but does not cover some regions adjacent to the gate line GL.

Therefore, in the present exemplary embodiment, an area that the first light blocking film 250 does not cover among the boundary portions 232 of the color filters is covered by the second light blocking film 260 formed on a layer different from the first light blocking film 250. .

The second light blocking layer 260 is formed on the same layer as the data line DL formed on a layer different from the gate line GL with the gate insulating layer 211 interposed therebetween. Therefore, the second light blocking layer 260 is insulated from the first light blocking layer 250 and the gate line GL through the gate insulating layer 211. In addition, the second light blocking layer 260 may be connected to the data line DL or spaced apart from the data line DL to maintain a floating state.

The second light blocking layer 260 is disposed between the first light blocking layer 250 and the gate line GL at the boundary portion 232 of the color filters. For example, the second light blocking film 260 may include a fourth light blocking part 261 and a second gate line part GL2 disposed between the first gate line part GL1 and the first light blocking part 251. And a fifth light blocking portion 262 disposed between the second light blocking portion 252 and the second light blocking portion 263 disposed between the second gate line portion GL2 and the third light blocking portion 253. ) And a seventh light blocking portion 264 disposed between the first gate line portion GL1 and the third light blocking portion 253. In this case, the fourth light blocking layer 261 and the seventh light blocking layer 264 are spaced apart from the data line DL to maintain a floating state, and the fifth light blocking layer 262 and the sixth light blocking layer 263 are each a data line. (DL).

As such, by completely covering the boundary portion 232 of the color filters using the first light blocking portion 250 and the second light blocking portion 260, light leakage generated at the boundary portion 232 of the color filters may be completely prevented. Can be.

The opposite substrate 300 is coupled to face the display substrate 200 with the liquid crystal layer 400 therebetween. The opposite substrate 300 includes a common electrode 320 formed on an opposite surface of the insulating substrate 310 facing the display substrate 200. The common electrode 320 is formed of a transparent conductive material to transmit light. For example, the common electrode 320 is formed of the same indium zinc oxide (IZO) or indium tin oxide (ITO) as the pixel electrode 240. An opening pattern for implementing a wide viewing angle may be formed in the common electrode 320.

By forming the first light blocking layer 250 and the second light blocking layer 260 on the display substrate 200, the black matrix is not formed on the opposing substrate 300. As such, when the black matrix is removed, the overcoating layer used for the protection and planarization of the black matrix can be removed, thereby achieving further cost reduction and transmittance improvement.

The liquid crystal layer 400 has a structure in which liquid crystals having optical and electrical characteristics such as anisotropic refractive index and anisotropic dielectric constant are arranged in a predetermined form. In the liquid crystal layer 400, the arrangement of liquid crystals is changed by an electric field formed between the pixel electrode 240 and the common electrode 320, and the transmittance of light passing through the liquid crystal layer 400 is controlled according to the arrangement change of the liquid crystals.

4 is a plan view illustrating a display device according to another exemplary embodiment of the present invention. In FIG. 4, the rest of the components except for the first light blocking film and the second light blocking film are the same as those shown in FIG. 1, and thus detailed description thereof will be omitted.

Referring to FIG. 4, the first light blocking layer 250 may be spaced apart from the storage line SL by a predetermined distance to maintain a floating state. Therefore, the second light blocking layer 260 is further formed between the first light blocking layer 250 and the storage line SL to cover a spaced area between the first light blocking layer 250 and the storage line SL. Can be.

For example, the first light blocking unit 251 and the second light blocking unit 252 are spaced apart from the storage line SL by a predetermined distance. In this case, the second light blocking layer 260 may include the storage line SL and the first light blocking unit 251 to cover the spaced apart area between the second light blocking unit 252 and the storage line SL. The light blocking part 251 may further include an eighth light blocking part 265 formed between the first light blocking part 251 and a ninth light blocking part 266 formed between the storage wiring SL and the second light blocking part 252. Can be. The eighth light blocking unit 265 and the ninth light blocking unit 266 are spaced apart from, for example, the data line DL to maintain a floating state.

5 is a plan view illustrating a display device according to still another embodiment of the present invention, FIG. 6 is a cross-sectional view taken along the line II-II ′ of FIG. 5, and FIG. 7 is an enlarged view of portion B of FIG. 5 enlarged. to be. 5 and 6, the rest of the configuration except for the display substrate is the same as that illustrated in FIGS. 1 and 2, and thus the detailed description thereof will be omitted.

5, 6, and 7, the data line DL is basically disposed between the pixel electrodes 240 adjacent to each other. That is, the data line DL is formed in a zigzag form along the array direction of the gate line GL, similarly to the pixel electrode 240 formed in the zigzag form along the arrangement direction of the gate lines GL. For example, the data line DL is disposed at the boundary portion 232 of the color filters between the first gate line portion GL1 and the second gate line portion GL2 disposed on both sides of the storage line SL. . Therefore, the data line DL is disposed at the boundary portion 232 of the color filters corresponding to the boundary portion of each pixel to prevent light leakage.

However, the data line DL may not cover the boundary portion 232 of the color filters in some regions in order to form the thin film transistor TFT. For example, the data line DL may not cover the boundary portion 232 of the color filters in some regions adjacent to the first gate line portion GL1.

Therefore, in the present exemplary embodiment, the light blocking layer 280 covers an area that the data line DL does not cover among the boundary portions 232 of the color filters.

The light blocking layer 280 is formed in the thin film transistor layer 210 and is disposed between the pixel electrodes 240 adjacent to each other to cover an area that the data line DL cannot cover. For example, the light blocking film 280 is formed between the first gate line part GL1 and the data line DL. Therefore, the data line DL and the light blocking unit 280 are disposed at the boundary portion 232 of the color filters corresponding to the boundary portion of each pixel.

As such, by completely covering the boundary portion 232 of the color filters using the data line DL and the light blocking portion 280, light leakage generated at the boundary portion 232 of the color filters may be completely prevented.

As illustrated in FIG. 7, the light blocking portion 280 may be formed on the same layer as the gate line GL. In this case, the light blocking unit 280 is connected to the gate line GL and is insulated from the data line DL through the gate insulating layer 211.

FIG. 8 is an enlarged view illustrating another embodiment of the light blocking unit illustrated in FIG. 7.

Referring to FIG. 8, the light blocking unit 285 according to another embodiment may be formed on the same layer as the data line DL. In this case, the light blocking part 285 is connected to the data line and is insulated from the gate line GL through the gate insulating layer 211.

FIG. 9 is an enlarged view illustrating still another embodiment of the light blocking unit illustrated in FIG. 7.

Referring to FIG. 9, the light blocking portion 290 according to another embodiment may include a first light blocking layer 292 and a second light formed on the same layer as the data line DL. The blocking film 294 may be included. In this case, the first light blocking film 292 is connected to the gate line GL, the second light blocking film 294 is connected to the data line DL, and the first light blocking film 292 and the second light blocking film ( 294 is insulated through the gate insulating film 211.

As such, by covering the boundary portion 232 of the color filters that the data line DL does not cover by extending the gate line GL or the data line DL, light leakage that may be generated at the boundary portion 232 of the color filters. You can solve the problem completely.

According to such a display substrate and a display device having the same, a light blocking film made of a gate metal or a data metal is formed on the display substrate instead of the black matrix formed on the counter substrate, thereby preventing a light leakage problem occurring at the boundary of the color filters. have.

In addition, it is possible to reduce the cost and improve the transmittance by removing the black matrix and the overcoating layer formed on the counter substrate.

In the detailed description of the present invention described above with reference to the preferred embodiments of the present invention, those skilled in the art or those skilled in the art having ordinary skill in the art will be described in the claims to be described later It will be understood that various modifications and variations can be made in the present invention without departing from the scope of the present invention.

Claims (24)

A thin film transistor layer including a gate line, a data line insulated from and intersecting the gate line through a gate insulating layer, a thin film transistor connected to the gate line and the data line, and a storage line formed on the same layer as the gate line; A passivation layer covering the thin film transistor layer; A color filter layer formed on the protective film; A pixel electrode formed on the color filter layer so as to correspond to each expansion; A first light blocking layer formed on the same layer as the gate line and disposed between the pixel electrodes adjacent to each other; And And a second light blocking layer formed on the same layer as the data line and disposed between the first light blocking layer and the gate line. The display substrate of claim 1, wherein the color filter layer includes color filters having different colors, and the first light blocking layer and the second light blocking layer are disposed at a boundary between the color filters. The display substrate of claim 2, wherein the first light blocking layer is connected to the storage line to which a common voltage is applied. The display substrate of claim 2, wherein the first light blocking layer is spaced apart from the gate line and the storage line to maintain a floating state. The display substrate of claim 4, wherein the second light blocking film is further formed between the first light blocking film and the storage wiring. The display substrate of claim 2, wherein the second light blocking layer is spaced apart from the data line to maintain a floating state or connected to the data line. The display substrate of claim 2, wherein the pixel electrode is formed in a zigzag shape along an array direction of the gate line to overlap the data line. The method of claim 7, wherein The pixel electrode includes a first pixel electrode part and a second pixel electrode part electrically separated from each other. The thin film transistor includes a first thin film transistor part connected to the first pixel electrode part and a second thin film transistor part connected to the second pixel electrode part. The gate line may include a first gate line part connected to the first thin film transistor part and a second gate line part connected to the second thin film transistor part and disposed between the first gate line part and the storage wiring. Display substrate. The method of claim 8, wherein the first light blocking film A first light blocking portion formed between the first gate line portion and the storage wiring; A second light blocking portion formed between the second gate line portion and the storage wiring; And And a third light blocking portion formed between the first gate line portion and the second gate line portion. The method of claim 9, wherein the second light blocking film A fourth light blocking portion formed between the first gate line portion and the first light blocking portion; A fifth light blocking portion formed between the second gate line portion and the second light blocking portion; A sixth light blocking portion formed between the second gate line portion and the third light blocking portion; And And a seventh light blocking portion formed between the first gate line portion and the third light blocking portion. The method of claim 10, The fourth light blocking unit and the seventh light blocking unit are spaced apart from the data line to maintain a floating state, And the fifth light blocking part and the sixth light blocking part are connected to the data line. The method of claim 10, wherein the second light blocking film An eighth light blocking portion formed between the storage line and the first light blocking portion; And And a ninth light blocking portion formed between the storage line and the second light blocking portion. A thin film transistor layer including a gate line, a data line insulated from and intersecting the gate line through a gate insulating layer, a thin film transistor connected to the gate line and the data line, and a storage line formed on the same layer as the gate line; A passivation layer covering the thin film transistor layer; A color filter layer formed on the protective film; A pixel electrode formed on the color filter layer so as to correspond to each expansion; And And a light blocking portion formed on the thin film transistor layer and disposed between the pixel electrodes adjacent to each other to cover an area that the data line cannot cover. The display substrate of claim 13, wherein the color filter layer includes color filters having different colors, and the data line and the light blocking part are disposed at boundaries of the color filters. The display substrate of claim 14, wherein the light blocking portion is formed on the same layer as the gate line. The display substrate of claim 14, wherein the light blocking portion is formed on the same layer as the data line. The method of claim 14, wherein the light blocking unit A first light blocking layer formed on the same layer as the gate line; And And a second light blocking layer formed on the same layer as the data line. The display substrate of claim 17, wherein the first light blocking layer is connected to the gate line, and the second light blocking layer is connected to the data line. The display substrate of claim 14, wherein the pixel electrode is formed in a zigzag shape along an array direction of the gate line so as to overlap the data line. The method of claim 19, The pixel electrode includes a first pixel electrode part and a second pixel electrode part electrically separated from each other. The thin film transistor includes a first thin film transistor part connected to the first pixel electrode part and a second thin film transistor part connected to the second pixel electrode part. The gate line may include a first gate line part connected to the first thin film transistor part and a second gate line part connected to the second thin film transistor part and disposed between the first gate line part and the storage wiring. Display substrate. The display substrate of claim 20, wherein the data line is disposed at a boundary of the color filters between the first gate line part and the second gate line part disposed on both sides of the storage line. The display substrate of claim 21, wherein the light blocking portion is disposed between the first gate line portion and the data line. Display substrates; An opposite substrate coupled to the display substrate and having a common electrode formed on an opposite surface thereof; And A liquid crystal layer disposed between the display substrate and the opposing substrate, The display substrate, A thin film transistor layer including a gate line, a data line insulated from and intersecting the gate line through a gate insulating layer, a thin film transistor connected to the gate line and the data line, and a storage wiring formed on the same layer as the gate line; A protective film covering the thin film transistor layer, A color filter layer formed on the protective film, A pixel electrode formed on the color filter layer so as to correspond to each expansion; A first light blocking layer formed on the same layer as the gate line and disposed between the pixel electrodes adjacent to each other, and And a second light blocking layer formed on the same layer as the data line and disposed between the first light blocking layer and the gate line. Display substrates; An opposite substrate coupled to the display substrate and having a common electrode formed on an opposite surface thereof; And A liquid crystal layer disposed between the display substrate and the opposing substrate, The display substrate, A thin film transistor layer including a gate line, a data line insulated from and intersecting the gate line through a gate insulating layer, a thin film transistor connected to the gate line and the data line, and a storage wiring formed on the same layer as the gate line; A protective film covering the thin film transistor layer, A color filter layer formed on the protective film, A pixel electrode formed on the color filter layer so as to correspond to each expansion; And a light blocking portion formed on the thin film transistor layer and disposed between the pixel electrodes adjacent to each other to cover an area that the data line cannot cover.

Images