KR20080033820A - Laminating film of teflon-silicon and method for preparing the same - Google Patents
Laminating film of teflon-silicon and method for preparing the same Download PDFInfo
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- KR20080033820A KR20080033820A KR1020060100034A KR20060100034A KR20080033820A KR 20080033820 A KR20080033820 A KR 20080033820A KR 1020060100034 A KR1020060100034 A KR 1020060100034A KR 20060100034 A KR20060100034 A KR 20060100034A KR 20080033820 A KR20080033820 A KR 20080033820A
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
- C09J7/24—Plastics; Metallised plastics based on macromolecular compounds obtained by reactions involving only carbon-to-carbon unsaturated bonds
- C09J7/241—Polyolefin, e.g.rubber
- C09J7/243—Ethylene or propylene polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/20—Adhesives in the form of films or foils characterised by their carriers
- C09J7/22—Plastics; Metallised plastics
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J7/00—Adhesives in the form of films or foils
- C09J7/30—Adhesives in the form of films or foils characterised by the adhesive composition
- C09J7/38—Pressure-sensitive adhesives [PSA]
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J2301/00—Additional features of adhesives in the form of films or foils
- C09J2301/40—Additional features of adhesives in the form of films or foils characterized by the presence of essential components
Abstract
Description
도 1은 플라즈마 처리를 거치기 이전의 테프론 표면의 접촉각을 나타나는 사진.1 is a photograph showing the contact angle of the surface of the Teflon before the plasma treatment.
도 2는 본 발명에 따른 플라즈마 처리를 거친 직후의 테프론 표면의 접촉각을 나타내는 사진.Figure 2 is a photograph showing the contact angle of the Teflon surface immediately after the plasma treatment according to the present invention.
도 3은 본 발명에 따른 플라즈마 처리를 거치고 24시간 방치한 후의 테프론 표면의 접촉각을 나타내는 사진.Figure 3 is a photograph showing the contact angle of the surface of the Teflon after leaving the plasma treatment according to the present invention for 24 hours.
본 발명은 테프론-실리콘 접착필름 및 그 제조방법에 관한 것으로서, 보다 상세하게는 테프론 기재의 표면을 플라즈마 처리를 통해 반응성 작용기를 활성시키고, 상기 반응성 작용기와 화학적 결합이 가능한 실란 커플링제를 실리콘 고무에 함유시킴으로써 상기 테프론 기재와 실리콘 고무 간의 결합강도를 향상시킬 수 있는 테프론-실리콘 접착필름 및 그 제조방법에 관한 것이다.The present invention relates to a Teflon-silicon adhesive film and a method for manufacturing the same, and more particularly, to a silicone rubber, a silane coupling agent capable of activating a reactive functional group through plasma treatment and chemically bonding the reactive functional group to a silicone rubber. The present invention relates to a Teflon-silicon adhesive film capable of improving the bonding strength between the Teflon substrate and the silicone rubber, and a method of manufacturing the same.
실리콘 고무는 내열성, 전기절연성 등이 우수하며 고무 특유의 탄성을 갖고 있어 LCD 및 PDP 패널(Panel) 제조시 상기 패널과 연성인쇄회로(Flexible Printed Circuit, FPC)와의 부착을 위한 본딩시트(bonging sheet)로 많이 사용되고 있다.Silicone rubber is excellent in heat resistance, electrical insulation, etc. and has elasticity peculiar to rubber. Bonding sheet for adhesion between the panel and flexible printed circuit (FPC) during LCD and PDP panel manufacturing It is used a lot in.
그러나, 이러한 본딩시트로 사용되는 실리콘 고무는 실리콘 특유의 이형성이 존재할 뿐만 아니라, 고무 표면의 약한 점착성에 의하여 패널(panel)과 연성인쇄회로(FPC)를 연결시키는 이방성 도전 필름(anisotropic conducting film, ACF)의 부착을 필요로 하나 이로 인해 불량의 원인이 되고 있다.However, the silicone rubber used as the bonding sheet not only has a silicone-specific release property, but also an anisotropic conducting film (ACF) that connects the panel and the flexible printed circuit (FPC) due to the weak adhesion of the rubber surface. ), But this is causing the defect.
이를 개선하기 위하여 이형성이 우수한 테프론 필름(Teflon film)을 사용하기도 하나, 이러한 테프론 필름은 열에 의한 변형이 심하여 사용 수명이 짧아지는 문제점이 있어, 통상 이형성이 우수한 테프론 필름을 하부에 장착하고 내열성 및 탄성이 우수한 실리콘 고무를 상부에 장착하여 각각 독립적으로 공급되는 본딩시트(bonding sheet)로 사용하고 있는 실정이다. 그러나 이 또한 실리콘 고무와 테프론이 상호 견고히 접착되지 않고 쉽게 박리되는 문제점이 여전히 존재한다.In order to improve this, a Teflon film having excellent release property may be used, but such a Teflon film has a problem of shortening the service life due to severe deformation due to heat, and is usually equipped with a Teflon film having excellent release property at the bottom and having heat resistance and elasticity. This excellent silicone rubber is mounted on top and used as a bonding sheet to be supplied independently of each other. However, there is still a problem that the silicone rubber and Teflon do not adhere firmly to each other and are easily peeled off.
본 발명자들은 종래 기술의 문제점을 해결하기 위하여 연구를 거듭한 결과, 테프론 기재의 표면에 플라즈마 처리를 통해 반응성 작용기를 생성시키고, 상기 반응성 작용기와 화학적 결합이 가능한 실란 커플링제를 함유하는 액상 실리콘 고무(LSR, Liquid Silicone Rubber)를 상기 테프론 기재에 도포하여 경화시킬 경우 상기 테프론 기재와 실리콘 고무간의 결합강도를 비약적으로 향상시킬 수 있음을 확인함으로써 본 발명에 이르게 되었다. The present inventors conducted a study in order to solve the problems of the prior art, and as a result, a liquid silicone rubber containing a silane coupling agent capable of chemically bonding with the reactive functional groups to generate a reactive functional group through the plasma treatment on the surface of the Teflon substrate ( When the LSR (Liquid Silicone Rubber) is applied to the Teflon substrate and cured, the present invention was confirmed by remarkably improving the bonding strength between the Teflon substrate and the silicone rubber.
따라서, 본 발명의 목적은 테프론 기재와 실리콘 고무 간의 결합강도를 비약 적으로 향상시킬 수 있는 테프론-실리콘 접착필름을 제공하는 데 있다.Accordingly, an object of the present invention is to provide a Teflon-silicon adhesive film that can significantly improve the bonding strength between the Teflon substrate and the silicone rubber.
본 발명의 또 다른 목적은 상기 테프론-실리콘 접착필름의 제조방법을 제공하는 데 있다.Another object of the present invention to provide a method for producing the Teflon-silicon adhesive film.
상기 목적을 달성하기 위하여, 본 발명은 In order to achieve the above object, the present invention
플라즈마 처리를 통해 표면에 반응성 작용기를 생성시킨 테프론 기재; 상기 반응성 작용기와 화학적 결합이 가능한 실란 커플링제; 및 상기 실란 커플링제를 함유하고 상기 테프론 기재에 도포되는 실리콘 고무;를 포함하는 것을 특징으로 하는 테프론-실리콘 접착필름을 제공한다.Teflon substrates that generate reactive functional groups on the surface through plasma treatment; Silane coupling agents capable of chemically bonding to the reactive functional groups; And a silicone rubber containing the silane coupling agent and applied to the Teflon base material.
또한, 본 발명은In addition, the present invention
ⅰ) 플라즈마 처리를 통해 테프론 기재의 표면에 반응성 작용기를 생성시키는 단계; 및Iii) generating reactive functional groups on the surface of the Teflon substrate via plasma treatment; And
ⅱ) 상기 반응성 작용기와 화학적 결합이 가능한 실란 거플링제를 함유한 액상실리콘 고무를 상기 테프론 기재 표면에 도포한 후 경화시키는 단계;Ii) applying a liquid silicone rubber containing a silane coupling agent capable of chemically bonding to the reactive functional group on the surface of the Teflon substrate and then curing it;
를 포함하는 것을 특징으로 하는 테프론-실리콘 접착필름의 제조방법을 제공한다.It provides a method for producing a Teflon-silicon adhesive film comprising a.
이하, 본 발명을 보다 각 단계에 따라 상세하게 설명한다.Hereinafter, the present invention will be described in detail with each step.
ⅰ) 플라즈마 처리를 통해 테프론 기재의 표면에 반응성 작용기를 생성시키는 단계Iii) generating reactive functional groups on the surface of the Teflon substrate via plasma treatment
본 단계에서는 테프론 기재와 상기 테프론 기재에 도포되어 경화되는 액상 실리콘 고무 간의 결합강도를 향상시키기 위하여, 상기 테프론 기재의 표면에 플라즈마 처리를 실시한다. 상기 플라즈마 처리를 통해 상기 테프론 기재의 표면에 반응성 작용기가 생성되는데, 상기 반응성 작용기는 -OH, -OOH, -COOH, -C-O-, -C=O, -O-C-O- 등의 산소 함유 반응성 작용기로 추정된다.In this step, a plasma treatment is performed on the surface of the Teflon substrate in order to improve the bonding strength between the Teflon substrate and the liquid silicone rubber which is applied to the Teflon substrate and cured. The plasma treatment generates a reactive functional group on the surface of the Teflon substrate, and the reactive functional group is assumed to be an oxygen-containing reactive functional group such as -OH, -OOH, -COOH, -CO-, -C = O, or -OCO-. do.
상기 플라즈마 처리에 있어서, 통상의 방법에 따라 플라즈마 처리를 실시할 수 있으나, 테프론 기재의 표면에 효과적인 반응성 작용기를 생성하기 위해 1× 10-3torr 이하의 압력 하에서 수행하는 것이 바람직하다. 상기 압력보다 높은 압력에서 플라즈마 처리를 하게 되면 불순물에 의한 아크방전이 일어나거나 산란에 의한 반응성 작용기의 발생밀도가 떨어지는 문제점이 발생할 수 있기 때문이다. In the plasma treatment, the plasma treatment may be performed according to a conventional method, but it is preferably performed under a pressure of 1 × 10 −3 torr or less to generate an effective reactive functional group on the surface of the Teflon substrate. This is because if the plasma treatment is performed at a pressure higher than the pressure, arc discharge may occur due to impurities or the density of generation of reactive functional groups due to scattering may occur.
상기 플라즈마 처리시 이온 건(ion gun)에 주입되는 산소와 아르곤 가스의 함량 역시 특별히 한정할 필요는 없으나, 산소 대 아르곤 중량비가 1:1 내지 4:1 인 것이 바람직하다.The content of oxygen and argon gas injected into the ion gun during the plasma treatment need not be particularly limited, but the oxygen to argon weight ratio is preferably 1: 1 to 4: 1.
또한, 플라즈마 발생시의 인가 전압이 증가할수록 플라즈마 방전 밀도가 높아져 테프론 기재의 표면에 상기 반응성 작용기의 생성이 증가하게 되는바, 인가 전압은 10 내지 4000 W이 바람직하며, 더욱 바람직하게는 100 내지 3000 W일 수 있다.In addition, as the voltage applied during plasma generation increases, the plasma discharge density increases to increase the generation of the reactive functional groups on the surface of the Teflon substrate. The applied voltage is preferably 10 to 4000 W, more preferably 100 to 3000 W. Can be.
통상적으로 플라즈마 처리를 하면 단순히 표면 식각이 발생할 것으로 예상되나, 상기 도 1 내지 도 3을 살펴보면, 플라즈마 처리 전(도 1), 플라즈마 처리한 직후(도 2) 및 플라즈마 처리 후 24시간 방치된 경우(도 3)에 대한 각각의 접촉각 이 109.46°, 24.25°, 47.37°인 것으로 표시되는데, 이는 본 발명에 따른 플라즈마 처리로 인해 테프론 기재의 표면에 반응성 작용기가 생성되었다가 시간이 경과하면서 상기 반응성 작용기가 대기 중의 물질과 반응되어 감소되었음을 의미하는 것으로서, 이를 통해 본 발명에 따른 테프론의 플라즈마 처리를 거치면 그 표면에 반응성 작용기가 발생함을 명확히 확인할 수 있다.In general, it is expected that the surface etching will simply occur when the plasma treatment is performed. However, referring to FIGS. 1 to 3, when the plasma treatment is left before the plasma treatment (FIG. 1), immediately after the plasma treatment (FIG. 2) and after the plasma treatment (24 hours) Each of the contact angles for FIG. 3) is shown to be 109.46 °, 24.25 °, 47.37 °, which results in the plasma treatment according to the invention creating reactive functional groups on the surface of the Teflon substrate and then over time. It means that the reaction with the material in the atmosphere has been reduced, through which the plasma treatment of the Teflon according to the present invention can clearly confirm that the reactive functional groups are generated on the surface.
또한 본 발명에 적용될 수 있는 테프론 필름은 테프론 필름 자체 뿐만 아니라 제조된 접착필름의 치수안정 및 인장력을 향상시키기 위하여 유리섬유(glass cloth)를 함유한 페브릭 쉬트(fabric sheet)일 수 있다.In addition, the Teflon film that can be applied to the present invention may be a fabric sheet containing glass cloth in order to improve the dimensional stability and tensile force of the prepared adhesive film as well as the Teflon film itself.
ⅱ) 실란 거플링제를 함유한 액상 실리콘 고무를 상기 테프론 기재 표면에 도포한 후 경화시키는 단계Ii) applying a liquid silicone rubber containing a silane coupling agent to the surface of the Teflon substrate and then curing it
본 단계에서는 상기 테프론 기재의 표면에 형성된 반응성 작용기와 화학적 결합이 가능한 실란 커플링제를 함유하는 액상 실리콘 고무를 상기 테프론 기재에 도포하여 경화시킨다. 상기 실란 커플링제는 테프론 기재와 실리콘 고무 간에 고분자 화합결합을 유도함으로써 접착강도를 증가시킨다. In this step, a liquid silicone rubber containing a silane coupling agent capable of chemically bonding with a reactive functional group formed on the surface of the Teflon substrate is applied to the Teflon substrate and cured. The silane coupling agent increases the adhesive strength by inducing a polymer compound bond between the Teflon substrate and the silicone rubber.
상기 실란 커플링제는 하기 화학식 1로 표시되는 화합물 중 1종 이상 선택하여 사용될 수 있다. The silane coupling agent may be used by selecting one or more of the compounds represented by the following formula (1).
(상기 식에서, R1은 수소 혹은 비닐기이며, R2 내지 R4는 탄소수가 1내지 18인 알킬기 혹은 말단에 에폭시기를 갖는 탄소수가 3내지 18인 알킬기이다.)(Wherein, R1 is hydrogen or vinyl group, R2 to R4 is an alkyl group having 1 to 18 carbon atoms or an alkyl group having 3 to 18 carbon atoms having an epoxy group at the terminal.)
상기 실란 커플링제의 함량은 실리콘 고무 100 중량부에 대하여 0.1 내지 30 중량부일 수 있으며, 바람직하게는 0.5 내지 15중량부일 수 있다.The content of the silane coupling agent may be 0.1 to 30 parts by weight, and preferably 0.5 to 15 parts by weight, based on 100 parts by weight of the silicone rubber.
상기 커플링제의 함량이 0.1 중량부 미만일 경우에는 접착력이 미약할 수 있고, 30 중량부 초과할 경우에는 부산물에 의한 기포발생으로 인해 접착력이 저하되는 문제점이 발생할 수 있다.When the content of the coupling agent is less than 0.1 parts by weight, the adhesive strength may be weak. When the content of the coupling agent is more than 30 parts by weight, the adhesive force may be deteriorated due to the bubble generation by the byproduct.
본 발명에서 상기 실란 커플링제가 상기 테프론 필름의 표면에 형성된 반응성 작용기와 용이하게 반응시키기 위하여 촉매인 주석 화합물을 사용할 수 있으며, 상기 주석 화합물은 하기 화학식 2로 표시되는 화합물일 수 있다.In the present invention, the silane coupling agent may use a tin compound which is a catalyst in order to easily react with the reactive functional groups formed on the surface of the Teflon film, and the tin compound may be a compound represented by the following Chemical Formula 2.
(상기 식에서, R5 내지 R8은 탄소수 1 내지 18인 알킬기이다.)(Wherein, R5 to R8 is an alkyl group having 1 to 18 carbon atoms.)
상기 촉매의 함량은 실리콘 고무 100 중량부 기준으로 0.05 내지 5 중량부일 수 있으며, 바람직하게는 0.1 내지 2 중량부일 수 있다.The content of the catalyst may be 0.05 to 5 parts by weight, based on 100 parts by weight of the silicone rubber, preferably 0.1 to 2 parts by weight.
상기 실리콘 고무는 상기 실리콘계 고무는 디메틸 실록산, 비닐기를 가지는 실록산 및 실록산계 가교제로 이루어진 원료로부터 제조될 수 있으나, 반드시 이에 한정되는 것은 아니다.The silicone rubber may be prepared from a raw material consisting of dimethyl siloxane, a siloxane having a vinyl group, and a siloxane-based crosslinking agent, but is not limited thereto.
상기 액상 실리콘 고무에는 경화제 및 필요에 따라 무기제 필러, 액상실리콘 경화촉매, 물성개량제 등이 추가로 더 함유될 수 있다.The liquid silicone rubber may further contain a curing agent and, if necessary, an inorganic filler, a liquid silicone curing catalyst, and a physical property improving agent.
이하, 하기의 실시예를 통하여 본 발명을 더욱 상세하게 설명하지만, 본 발명의 범위가 실시예에 한정되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to the following examples, but the scope of the present invention is not limited to the examples.
[실시예]EXAMPLE
실시예 1Example 1
산소와 아르곤의 중량비가 4:1이고, 1,500V / 0.2~1.0A (300~1,500W)의 전압이 인가되는 플라즈마 처리장치를 이용하여 테프론 필름의 표면에 반응성 작용기를 생성하였다.Reactive functional groups were generated on the surface of the Teflon film using a plasma treatment apparatus in which a weight ratio of oxygen to argon was 4: 1 and a voltage of 1,500 V / 0.2 to 1.0 A (300 to 1500 W) was applied.
비닐기로 마감된 액상실리콘[Poly(dimethyl siloxane) fluid] 55중량부, 경화제[Poly(methylhydro siloxane-co-dimethyl siloxane) fluid) 3중량부, 무기제 필러(alumina) 40중량부, 실란 커플링제 0.5중량부, 주석 화합물 촉매 0.1중량부, 백금계 액상실리콘 경화촉매 0.5중량부, 물성개량제인 실리카 나노입자 0.9중량부로 이루어진 액상 실리콘 고무 조성물을 상기 플라스마로 표면을 처리한 테프론 필름의 표면에 도포한 후 100℃에서 5분간 경화시켜 테프론-실리콘 접착필름을 제조하였다.55 parts by weight of poly (dimethyl siloxane) fluid finished with vinyl group, 3 parts by weight of poly (methylhydro siloxane-co-dimethyl siloxane) fluid as curing agent, 40 parts by weight of inorganic alumina, silane coupling agent 0.5 After applying the liquid silicone rubber composition consisting of parts by weight, 0.1 parts by weight of the tin compound catalyst, 0.5 parts by weight of a platinum-based liquid silicone curing catalyst, 0.9 parts by weight of silica nanoparticles as a physical modifier to the surface of the Teflon film treated with the plasma It was cured at 100 ℃ for 5 minutes to prepare a Teflon-silicon adhesive film.
실시예 2Example 2
비닐기로 마감된 액상실리콘 25.5중량부, 실란 커플링제 30중량부를 사용한 것 외에는 상기 실시예 1과 동일하게 실시하였다.The same procedure as in Example 1 was carried out except that 25.5 parts by weight of the liquid silicone finished with a vinyl group and 30 parts by weight of the silane coupling agent were used.
실시예 3Example 3
비닐기로 마감된 액상실리콘 40.5중량부, 실란 커플링제 15중량부를 사용한 것 외에는 상기 실시예 1과 동일하게 실시하였다.The same procedure as in Example 1 was carried out except that 40.5 parts by weight of the liquid silicone finished with a vinyl group and 15 parts by weight of the silane coupling agent were used.
실시예 4Example 4
비닐기로 마감된 액상실리콘 48.6중량부, 실란 커플링제 5중량부 및 주석 화합물 촉매 2 중량부를 사용한 것 외에는 상기 실시예 1과 동일하게 실시하였다.The same procedure as in Example 1 was carried out except that 48.6 parts by weight of the liquid silicone finished with a vinyl group, 5 parts by weight of the silane coupling agent, and 2 parts by weight of the tin compound catalyst were used.
[비교예][Comparative Example]
비교예 1Comparative Example 1
비닐기로 마감된 액상실리콘 40.5중량부, 경화제 3중량부, 무기제 필러 40중량부, 실란 커플링제 15중량부, 주석 화합물 촉매 0.1중량부, 액상실리콘 경화촉매 0.5중량부, 물성개량제 0.9중량부로 이루어진 액상 실리콘 고무 조성물을 플라스마로 처리하지 않은 테프론 필름의 표면에 도포한 후 100℃에서 5분간 경화시켜 테프론-실리콘 접착필름을 제조하였다.40.5 parts by weight of liquid silicone finished with vinyl, 3 parts by weight of hardener, 40 parts by weight of inorganic filler, 15 parts by weight of silane coupling agent, 0.1 parts by weight of tin compound catalyst, 0.5 parts by weight of liquid silicone curing catalyst, and 0.9 parts by weight of physical modifier. The liquid silicone rubber composition was applied to the surface of the Teflon film not treated with plasma, and then cured at 100 ° C. for 5 minutes to prepare a Teflon-silicon adhesive film.
비교예 2Comparative Example 2
비닐기로 마감된 액상실리콘 55.6중량부를 사용하고, 실란 커플링제는 사용하지 않은 것을 제외하고는 상기 실시예 1과 동일하게 실시하였다.55.6 parts by weight of liquid silicone finished with a vinyl group was used, and the same procedure as in Example 1 was conducted except that no silane coupling agent was used.
[실험예]Experimental Example
상기 실시예 1 내지 4 및 비교예 1 내 2에 따라 제조된 테프론-실리콘을 하기 표 1에 기재된 바와 같이 박리 여부를 실험하였다.Teflon-silicon prepared according to Examples 1 to 4 and Comparative Examples 1 to 2 was tested for peeling as described in Table 1 below.
플라즈마 처리를 하지 않은 테프론 필름을 사용한 비교예 1 및 플라즈마 처리는 하되 실란 커플링제가 함유되지 않은 비교예 2는 제조 후 24시간이 경과된 시점에서 박리되는 반면, 플라즈마 표면처리를 한 테프론 필름에 실란 커플링제를 함유한 액상 실리콘 고무를 도포하였던 실시예 1 내지 4는 제조 후 24시간 경과된 시점에서도 박리가 이루어지 않았으며, 120℃에서 500시간이 경과한 시점에서도 여전히 박리가 이루어지지 않았음을 확인할 수 있었다.Comparative Example 1 using a Teflon film without plasma treatment and Comparative Example 2, which was treated with plasma but did not contain a silane coupling agent, were peeled off at a time point of 24 hours after preparation, whereas silane was applied to the Teflon film subjected to plasma surface treatment. Examples 1 to 4 to which the liquid silicone rubber containing the coupling agent were applied were not peeled off even after 24 hours of manufacture, and were still not peeled off even after 500 hours at 120 ° C. I could confirm it.
본 발명에 따라 제조된 테프론-실리콘 접착필름은 플라즈마 처리를 통해 테프론 기재의 표면에 발생한 반응성 작용기와 실리콘 고무에 함유된 실란 커플링제의 화학적 결합으로 인해 상기 테프론 기재와 실리콘 고무간의 결합강도를 비약적으로 향상시킬 수 있는 효과가 있다.The Teflon-silicon adhesive film prepared according to the present invention dramatically reduces the bond strength between the Teflon substrate and the silicone rubber due to the chemical bonding between the reactive functional groups generated on the surface of the Teflon substrate and the silane coupling agent contained in the silicone rubber through plasma treatment. There is an effect that can be improved.
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EP07833286A EP2074188A1 (en) | 2006-10-13 | 2007-10-11 | Laminating film of plastic/teflon-silicon and method for preparing the same |
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KR101220518B1 (en) * | 2010-11-25 | 2013-01-10 | 주식회사 디엠티 | Manufacturing method for bellows expansion joint making of tefron |
US9362526B2 (en) | 2013-09-11 | 2016-06-07 | Samsung Display Co., Ltd. | Display device and method of manufacturing the same |
US10312215B2 (en) | 2016-02-29 | 2019-06-04 | Electronics And Telecommunications Research Instit | Electrode assembly and method for manufacturing same |
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CN107987303A (en) * | 2017-12-28 | 2018-05-04 | 江苏科麦特科技发展有限公司 | A kind of fluoro-containing plastic and its preparation method and application |
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JP2003225972A (en) * | 2002-02-04 | 2003-08-12 | Dow Corning Toray Silicone Co Ltd | Silicone rubber composite and its manufacturing method |
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KR101220518B1 (en) * | 2010-11-25 | 2013-01-10 | 주식회사 디엠티 | Manufacturing method for bellows expansion joint making of tefron |
US9362526B2 (en) | 2013-09-11 | 2016-06-07 | Samsung Display Co., Ltd. | Display device and method of manufacturing the same |
US10312215B2 (en) | 2016-02-29 | 2019-06-04 | Electronics And Telecommunications Research Instit | Electrode assembly and method for manufacturing same |
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