KR20070116703A - 비냉각형 적외선 센서 - Google Patents
비냉각형 적외선 센서 Download PDFInfo
- Publication number
- KR20070116703A KR20070116703A KR1020060050624A KR20060050624A KR20070116703A KR 20070116703 A KR20070116703 A KR 20070116703A KR 1020060050624 A KR1020060050624 A KR 1020060050624A KR 20060050624 A KR20060050624 A KR 20060050624A KR 20070116703 A KR20070116703 A KR 20070116703A
- Authority
- KR
- South Korea
- Prior art keywords
- infrared
- bolometer
- layer
- cantilever
- metal layer
- Prior art date
Links
- 229910052751 metal Inorganic materials 0.000 claims abstract description 33
- 239000002184 metal Substances 0.000 claims abstract description 33
- 238000010521 absorption reaction Methods 0.000 claims abstract description 22
- 230000003287 optical effect Effects 0.000 claims abstract description 9
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 14
- 238000000034 method Methods 0.000 claims description 11
- 239000000758 substrate Substances 0.000 claims description 11
- 238000000926 separation method Methods 0.000 claims description 6
- 239000010409 thin film Substances 0.000 abstract description 14
- XHCLAFWTIXFWPH-UHFFFAOYSA-N [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[V+5].[V+5] XHCLAFWTIXFWPH-UHFFFAOYSA-N 0.000 description 6
- 229910001935 vanadium oxide Inorganic materials 0.000 description 6
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 238000002955 isolation Methods 0.000 description 3
- 229910004205 SiNX Inorganic materials 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000005459 micromachining Methods 0.000 description 2
- 238000002161 passivation Methods 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 229910052681 coesite Inorganic materials 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000011540 sensing material Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 229910052682 stishovite Inorganic materials 0.000 description 1
- 238000002834 transmittance Methods 0.000 description 1
- 229910052905 tridymite Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F30/00—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors
- H10F30/10—Individual radiation-sensitive semiconductor devices in which radiation controls the flow of current through the devices, e.g. photodetectors the devices being sensitive to infrared radiation, visible or ultraviolet radiation, and having no potential barriers, e.g. photoresistors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J1/00—Photometry, e.g. photographic exposure meter
- G01J1/42—Photometry, e.g. photographic exposure meter using electric radiation detectors
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F71/00—Manufacture or treatment of devices covered by this subclass
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/10—Semiconductor bodies
- H10F77/16—Material structures, e.g. crystalline structures, film structures or crystal plane orientations
- H10F77/162—Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
- H10F77/166—Amorphous semiconductors
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
- G01J5/02—Constructional details
- G01J5/08—Optical arrangements
- G01J5/0853—Optical arrangements having infrared absorbers other than the usual absorber layers deposited on infrared detectors like bolometers, wherein the heat propagation between the absorber and the detecting element occurs within a solid
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Photometry And Measurement Of Optical Pulse Characteristics (AREA)
Abstract
Description
Claims (2)
- 내부회로와 전기적으로 연결되는 M×N 어레이의 접속단자(103)를 갖는 구동 기판(101);상기 구동기판과 일대일 대응되어 연결되는 M×N 어레이의 픽셀의 적외선 흡수 볼로미터;상기 구동 기판 위의 반사 거울(201);상기 반사 거울과 볼로미터 사이의 에어갭을 포함하여 비정질 실리콘층 표면의 금속 흡수층과의 광로가 적외선 중심파장의 1/4 이고;상기 M×N 어레이의 접속단자를 제1 금속 앵커로 제1층인 제1 지지교각이 연결되고;상기 제1 지지교각은 포스트를 통하여 캔틸레버가 연결되고, 상기 캔틸레버는 도핑된 비정질 실리콘과 적외선 흡수 금속층이 아래로부터 차례로 적층되어 있고, 상기 적외선 흡수 금속층은 동시에 전극이 되며 비정질 실리콘의 저항이 최소가 되도록 최소 선폭으로 분리되어 있다.
- 제 1항에 있어서 상기 적외선 흡수 금속층의 분리는 나노임프린트 공정으로 제작된다.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060050624A KR20070116703A (ko) | 2006-06-06 | 2006-06-06 | 비냉각형 적외선 센서 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1020060050624A KR20070116703A (ko) | 2006-06-06 | 2006-06-06 | 비냉각형 적외선 센서 |
Publications (1)
Publication Number | Publication Date |
---|---|
KR20070116703A true KR20070116703A (ko) | 2007-12-11 |
Family
ID=39142322
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020060050624A KR20070116703A (ko) | 2006-06-06 | 2006-06-06 | 비냉각형 적외선 센서 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR20070116703A (ko) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011139328A2 (en) * | 2010-04-28 | 2011-11-10 | L-3 Communications Corporation | Pixel-level optical elements for uncooled infrared detector devices |
CN103569946A (zh) * | 2012-07-31 | 2014-02-12 | 昆山光微电子有限公司 | 非制冷光读出红外成像焦平面陈列探测器制作方法 |
US9000373B2 (en) | 2010-04-28 | 2015-04-07 | L-3 Communications Corporation | Optically transitioning thermal detector structures |
WO2015130123A1 (ko) * | 2014-02-27 | 2015-09-03 | 한국과학기술원 | 적외선 검출기 |
KR101865889B1 (ko) * | 2016-11-30 | 2018-06-11 | 한국과학기술원 | 비냉각형 적외선 센서 픽셀의 3차원 구조 및 이를 포함하는 적외선 열화상 장치 |
WO2020171411A1 (ko) * | 2019-02-22 | 2020-08-27 | 엘지전자 주식회사 | 캘리브레이션 정확성 향상을 위한 멀티 윈도우가 구비된 적외선 열화상 이미지 센서 교정 장치 |
-
2006
- 2006-06-06 KR KR1020060050624A patent/KR20070116703A/ko not_active Application Discontinuation
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011139328A2 (en) * | 2010-04-28 | 2011-11-10 | L-3 Communications Corporation | Pixel-level optical elements for uncooled infrared detector devices |
WO2011139328A3 (en) * | 2010-04-28 | 2012-01-19 | L-3 Communications Corporation | Pixel-level optical elements for uncooled infrared detector devices |
GB2492920A (en) * | 2010-04-28 | 2013-01-16 | L 3 Comm Corp | Pixel-level optical elements for uncooled infrared detector devices |
US9000373B2 (en) | 2010-04-28 | 2015-04-07 | L-3 Communications Corporation | Optically transitioning thermal detector structures |
GB2492920B (en) * | 2010-04-28 | 2016-03-09 | L 3 Comm Corp | Pixel-level optical elements for uncooled infrared detector devices |
CN103569946A (zh) * | 2012-07-31 | 2014-02-12 | 昆山光微电子有限公司 | 非制冷光读出红外成像焦平面陈列探测器制作方法 |
WO2015130123A1 (ko) * | 2014-02-27 | 2015-09-03 | 한국과학기술원 | 적외선 검출기 |
KR101865889B1 (ko) * | 2016-11-30 | 2018-06-11 | 한국과학기술원 | 비냉각형 적외선 센서 픽셀의 3차원 구조 및 이를 포함하는 적외선 열화상 장치 |
WO2020171411A1 (ko) * | 2019-02-22 | 2020-08-27 | 엘지전자 주식회사 | 캘리브레이션 정확성 향상을 위한 멀티 윈도우가 구비된 적외선 열화상 이미지 센서 교정 장치 |
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