KR20070097716A - Apparatus for collection carbon nano tube - Google Patents

Abstract

An apparatus for synthesizing carbon nanotubes is provided to discharge safely the gas within a reaction tube producing carbon nanotubes. An apparatus for synthesizing carbon nanotubes on a synthesis substrate includes: a reaction tube which provides a production space for carbon nanotubes; a gas supply part which supplies gas to the production space of the reaction tube; and an exhaust part which cools and discharges the gas within the reaction tube. The exhaust part comprises: an exhaust line(184) which is connected with the reaction tube and discharges the gas within the reaction tube into the outside; and a cooling member(150) which is installed on the exhaust line and cools the gas discharged through the exhaust line.

Description

Apparatus for synthesizing carbon nanotubes {APPARATUS FOR COLLECTION CARBON NANO TUBE}

1 is a configuration diagram for explaining the carbon nanotube synthesis apparatus according to the present invention.

FIG. 2 is a configuration diagram of the exhaust unit shown in FIG. 1.

3 is a configuration diagram of the catalyst coating unit of FIG. 1.

FIG. 4 is a plan view taken along the line AA ′ of FIG. 3.

5A to 5C are diagrams for explaining a catalyst application process step by step in the catalyst coating unit.

6 is a plan view illustrating the substrate storage unit and the first transfer device of FIG. 1.

7 is a side view of the substrate storage portion.

8 is a perspective view showing a cassette of the substrate storage portion;

9 is a perspective view of the first transfer device.

10 is a perspective view of a recovery part of FIG. 1.

11 is a plan view of the recovery part of FIG. 9;

12 is a view for explaining a carbon nanotube recovery process in the recovery unit.

13 is a process flow diagram in a system for carbon nanotube production.

* Explanation of symbols for the main parts of the drawings *

100: reaction chamber

200: station

300: first transfer device

400: substrate storage

500: catalyst coating unit

600: recovery unit

700: second transfer device

The present invention relates to a carbon nanotube synthesis apparatus.

Carbon nanotubes (carbon nanotubes) is formed by combining three carbon atoms adjacent to one carbon atom to form a hexagonal ring, and the hexagonal ring is a honeycomb-shaped plane is rolled to form a cylindrical or tube.

Carbon nanotubes are a material that can exhibit metallic conductivity or semiconducting conductivity depending on their structure, and thus can be widely applied in various technical fields. For example, carbon nanotubes are applicable to electrodes of electrochemical storage devices such as secondary cells, fuel cells or supercapacitors, electromagnetic shielding, field emission displays, or gas sensors.

Most of these carbon nanotubes consist of small quantities of hand-dependent production. In particular, a process of applying a catalyst to a synthetic substrate, loading / unloading a synthetic substrate into a reaction tube, and recovering carbon nanotubes from the synthetic substrate by unloading the synthetic substrate on which the carbon nanotubes are synthesized in the reaction tube It is difficult to carry out continuous process and mass production because the back is made by worker.

In addition, since many source gases (harmful / explosive gases) containing hydrogen are used in the tanno-nanotube synthesis process, gas removal in the reactor is required. If the gas remains inside the reaction tube after the carbon nanotube synthesis process is completed, the harmful gas may be exploded by reacting with oxygen while the harmful gas among the gas components remaining inside the reaction tube is exposed to the air. have. In particular, since the source gas is heated to a high temperature during the process, a means for safely evacuating the hot source gas is required.

An object of the present invention is to provide a carbon nanotube synthesis apparatus that can safely exhaust the gas in the reactor for producing carbon nanotubes.

In particular, it is an object of the present invention to provide a carbon nanotube synthesis apparatus that can safely perform high-temperature gas exhaust during the process without damaging the equipment.

Carbon nanotube synthesizing apparatus according to the present invention for achieving the above object is a reactor for providing a space for the production of carbon nanotubes, a gas supply unit for supplying gas to the production space of the reactor, and the gas in the reactor It includes the exhaust part which cools and exhausts.

According to an embodiment of the present invention, the exhaust unit is connected to the reactor and is installed on the exhaust line and the exhaust line for exhausting the gas in the reactor to the outside, and cools the gas exhausted through the exhaust line It includes a cooling member.

According to an embodiment of the present invention, the housing has a space surrounding the passage outside the passage and in which the cooling fluid is circulated, wherein the cooling fluid circulation line supplies the cooling fluid to the space.

According to an embodiment of the present invention, the cooling fluid may be at least one of ultrapure water and cooling gas.

Hereinafter, with reference to the accompanying drawings will be described in detail a carbon nanotube synthesis apparatus according to an embodiment of the present invention. Embodiment of the present invention may be modified in various forms, the scope of the present invention is not limited to the embodiments described below. This embodiment is provided to more completely explain the present invention to those skilled in the art. Accordingly, the shape of elements in the figures is exaggerated to emphasize clear explanation.

(Example)

An embodiment of the present invention will be described in more detail with reference to FIGS. 1 to 13. The present invention provides a carbon nanotube production system (1) capable of automated and mass production. 1 is a configuration diagram schematically showing an example of the carbon nanotube production system of the present invention, Figure 2 is a configuration diagram of the exhaust parts 150, 184 shown in FIG.

Referring to FIG. 1, the system 1 has a composite substrate 10, a reaction chamber 100, and a post-process chamber. The synthetic substrate 10 is used as a base plate on which carbon nanotubes (30 in FIG. 7) are synthesized. The composite substrate 10 on which the carbon nanotubes 30 are synthesized includes a silicon wafer, an induim tin oxide (ITO) substrate, coated glass (ITO-coated glass), soda-lime glass, corning glass, alumina, and the like. This can be used. However, if the carbon nanotube 30 has sufficient rigidity for synthesizing (growing, producing), various kinds of synthetic substrates may be used in addition to the above-described substrates.

The reaction chamber 100 performs a process of generating carbon nanotubes 30 on the composite substrate 10, and the pre- and post-processing chambers are used for the composite substrate 10 loaded / unloaded from / to the reaction chamber 100. Pretreatment and post-treatment processes are carried out. The pretreatment step and the post-treatment step include a step of applying the catalyst 20 to the substrate, a step of recovering the carbon nanotubes 30 generated on the synthetic substrate, and the like. The pre- and post-processing chamber includes a station unit 200, a first transfer device 300, a substrate storage unit 400, a catalyst coating unit 500, a recovery unit 600, and a second transfer device 700.

The station unit 200 prevents the composite substrate 10 unloaded from the reaction chamber 100 from being exposed to the atmosphere. The first transfer device 300 loads / unloads the composite substrate into / from the reaction chamber 100. Substrate storage 400 stores a composite substrate that is loaded or unloaded into / from reaction chamber 100. The catalyst applicator 500 performs a process of applying the catalyst 20 on the synthetic substrate 10 before the synthetic substrate 10 is loaded into the reaction chamber 100. The recovery unit 600 performs a process of recovering the carbon nanotubes 30 generated on the synthetic substrate 10 unloaded from the reaction chamber 100 from the synthetic substrate 10. The second transfer device 700 transfers the synthetic substrate 10 between the substrate storage unit 400, the catalyst application unit 500, and the recovery unit 600.

According to an example, the station unit 200 is disposed side by side with the reaction chamber 100 on one side of the reaction chamber 100. The station unit 200 has a first area 240 and a second area 260. The first region 240 is disposed adjacent to the reaction chamber 100, and the substrate storage 400 is positioned in the first region 240. The second region 260 is provided in a direction opposite to the reaction chamber 100 with respect to the first region 240 and the first transfer device 300 is located. The reaction chamber 100 and the second region 260 are disposed in the same direction in the first direction 42. The first region 240 has an upper region 242 and a lower region 244. The upper region 242 is a region located on the same line as the reaction chamber 100 and the second region 260, and the lower region 244 is a second perpendicular to the first direction 42 from the upper region 244. It is an area extending in the direction 44. The first region 240 and the second region 260 are generally rectangular in shape. Due to the above structure, the station 200 has a generally '-' shape. The catalyst applicator 500, the recovery part 600, and the second transfer device 400 are positioned adjacent to the station part 200, and have a lower area based on the upper area 242 of the first area 240. It is disposed side by side in a direction parallel to the first direction 42 at a position opposite to the (244). The second transfer device 400 is disposed at a position opposite to the first area 240 of the station unit 200. In addition, the second transfer device 400 is located between the catalyst applicator 500 and the recovery unit 600.

Next, each component of the system of the present invention will be described in detail.

Referring to FIG. 1, the reaction chamber 100 includes a reaction tube 120, first and second flanges 132 and 134, a heating member 140, and an exhaust unit ( exhaust member 150, and boat 160. The reactor 120 is made of a heat resistant material such as quartz or graphite. Reactor 120 may be provided in a substantially cylindrical shape. During the process, the reactor 120 may be maintained at approximately 500-1100 degrees Celsius by the heating unit 140.

The first flange 132 is disposed at the front end of the reactor 120. The first flange 132 is provided with at least one gas supply line 182 for supplying a source gas supplied from a gas supply unit (not shown) into the reactor 120. The gas supply line 182 supplies a source gas into the reactor 120 from a gas supply source (not shown) during the process. Here, at least one selected from the group consisting mainly of acetylene, ethylene, methane, benzene, xylene, carbon monoxide and carbon dioxide may be used as the source gas. The source gas is decomposed into radicals by pyrolysis, and these radicals react with a catalyst applied on a synthetic substrate to synthesize carbon nanotubes.

The second flange 134 is installed at the other end of the reactor 120. The second flange 134 is provided with a vacuum member for discharging the remaining gas in the reactor 120 after the reaction. Detailed description of the exhaust will be described later.

The heating unit 140 heats the inside of the reactor 120 to a process temperature. The heating unit 140 may be installed to surround the outer wall of the reactor 120, and the heating unit 140 may be a heating coil or a heating lamp.

The exhaust unit discharges gas such as a source gas and an inert gas supplied into the reactor 120 to the outside of the reactor 120. To this end, the exhaust portion has an exhaust line 184 and a cooling member 150.

The exhaust line 184 is installed in the second flange 134 in one embodiment. The exhaust line 184 may reduce the pressure inside the reactor 120 by discharging the gas in the reactor 120 during the process. To this end, the exhaust line 184 may be provided with a pressure reducing member such as a vacuum pump (vacuum pump). In the present exemplary embodiment, one exhaust line 184 is installed on the second flange 134 to discharge the gas inside the reactor 120 to the outside, but the exhaust line 184 is selectively provided in plurality. Can be provided, the installation position can be installed in a variety of locations.

Here, the gas in the reactor 120 exhausted through the exhaust line 184 is heated by the heating unit 140. Therefore, the exhaust line 184 and devices such as a vacuum pump installed in the exhaust line 184 may be damaged by hot gas. To prevent this, a cooling member 150 is provided on the exhaust line 184 to cool the discharged gas.

2, the cooling member 150 has a housing 152, a cooling fluid circulation line, a partition wall 158, and an inner tube 159. The housing 152 is installed on the exhaust line 184 in one embodiment. Here, the exhaust line 184 is divided into a first line 184a positioned at the front end of the housing 152 and a second line 184b positioned at the rear end of the housing 152 based on the housing 152.

The housing 152 has an inlet 152a and an outlet 152b. The inlet 152a is coupled to the first line 184a and the gas in the reactor 120 is introduced into the housing 152 through the inlet 152a. The outlet 152b is coupled to the second line 184b and discharges the gas cooled in the housing 152 to the second line 184b.

The housing 152 has a passage a through which gas flows from the inlet 152a to the outlet 152b. The passage (a) is provided inside the housing 152, and a first circulation line 154 to be described later is installed therein. In addition, the housing 152 has a space b surrounding the outer circumferential surface of the passage a. Passage a and space b are partitioned by partition wall 158. The space b receives a cooling fluid from the supply line 156a of the second circulation line 156 which will be described later. The cooling fluid introduced into the space b cools the gas moving along the passage a. Here, the cooling fluid may be, for example, ultrapure water and cooling gas. However, the cooling fluid is for efficient cooling of the gas moving inside the housing 152, and various fluids may be used.

The cooling fluid circulation line has first and second circulation lines 154 and 156. The first circulation line 154 has a supply line 154a, a heat exchange line 154b, and a recovery line 154c. Supply line 154a supplies cooling fluid from a cooling fluid source (not shown) to heat exchange line 154b. The supply line 154a is connected to one end of the heat exchange line 154b. The supply line 154a and the heat exchange line 154b may be fastened by a predetermined fastening member (not shown).

The heat exchange line 154b is disposed in the passage a. The heat exchange line 154b is a portion for directly cooling the gas moving along the passage (a). One end of the heat exchange line 154b is connected to the supply line 154a, and the other end of the heat exchange line 154b is connected to the recovery line 154c. Therefore, the cooling fluid is supplied to one end of the heat exchange line 154b by the supply line 154a, and is cooled through the recovery line 154c after cooling the gas in the passage a in the heat exchange line 154b. At this time, the heat exchange line 154b allows the supplied cooling fluid to efficiently exchange heat with the gas moving in the passage (a). To this end, the heat exchange line 154b is preferably manufactured in the shape of a coil to increase the area in contact with the gas in the passage a.

Here, the heat exchange line 154b may be damaged by the hot gas when it is in direct contact with the hot gas. Thus, it can optionally be protected by the inner tube 159. The inner tube 159 is provided to surround the heat exchange line 154b extending into the housing 152, thereby preventing the heat exchange line 154b from being damaged by the hot gas.

The recovery line 154c is connected to the other end of the heat exchange line 154b. The recovery line 154c recovers the cooling fluid that has undergone heat exchange in the heat exchange line 154b to a cooling fluid supply source (not shown).

The second circulation line 156 has a supply line 156a and a recovery line 156b. Supply line 156a supplies cooling fluid to space b, and recovery line 156b recovers cooling fluid from space b to a cooling fluid supply source (not shown). Therefore, the cooling fluid supplied to the space b is exchanged with the gas moving in the passage a and then discharged to the outside of the housing 110 through the recovery line 156b.

In the present embodiment, the recovery lines 154c and 156b have been described as an example of recovering the used cooling fluid to the cooling fluid supply source so as to be renewable. However, the recovery lines 154c may drain the cooling fluid out of the facility without recovering the cooling fluid. It may be.

The cooling member 150 having the above configuration cools the gas moved along the passage a and simultaneously cools the housing 152 heated by the hot gas.

As described above, the exhaust unit according to the present invention efficiently exhausts the source gas and the inert gas supplied into the reactor 120 during the process. In particular, the exhaust part according to the present invention is supplied to the reactor 120, and then efficiently cooled and exhausted the gas heated to a high temperature by the heating unit 140, thereby damaging the configuration of the exhaust part according to the high temperature gas exhaust prevent.

Only one boat 160 may be provided in the reactor 120, or a plurality of boats 160 may be provided. The boat 160 is provided with a sufficiently large size so that a plurality of synthetic substrates 10 may be placed in one boat 160 along the longitudinal direction of the reactor 120 (the first direction 42 described above). . Optionally, the boat 160 may have a size and a structure capable of supporting the plurality of composite substrates 10 in the vertical direction and the longitudinal direction, respectively. According to an example, the boats 160 have a size and a structure capable of supporting the composite substrate 10 two vertically and two longitudinally. The boats 160 may be fixedly installed in the reactor 120.

In addition, the boat 160 may be provided in a size capable of supporting one composite substrate 10. In this case, one or more boats 160 may be provided. When a plurality of boats 160 are provided, a plurality of boats 160 may be disposed along the longitudinal direction of the reactor 120 (first direction 42 described above), or optionally perpendicular to the first direction 42. It can be stacked in one vertical direction.

In the present embodiment, a reaction chamber 100 having a structure to which pyrolysis of hydrocarbon is applied by pyrolyzing hydrocarbons to produce carbon nanotubes 30 is described as an example, but this is only one example. In the system 100 of the present invention, a reaction chamber having a structure to which various generation methods such as laser deposition, plasma chemical vapor deposition, thermochemical vapor deposition, flame synthesis, and electric discharge is applied may be used.

The station unit 200 includes a chamber 200a isolated from the outside. A first gate valve 222 is installed between the station unit 200 and the reaction chamber 100 to open and close a passage through which the composite substrate 10 moves, and the station unit 200 and the second transfer device 700 are provided therebetween. The second gate valve 224, which opens and closes the passage through which the composite substrate 10 moves between them, is installed between them.

The station unit 200 is provided with a gas supply member 280 for supplying an inert gas such as nitrogen, argon, and the like into the station unit 200. The inert gas removes air (particularly oxygen) inside the station unit 200 and maintains an inert gas atmosphere inside the station unit 200. This prevents the hot carbon nanotubes 30 generated on the composite substrate 10 from contacting with oxygen when the composite substrate 10 is unloaded from the reaction chamber 100 in the station unit 200. The gas supply member 280 is preferably provided in the first region 240.

When the first gate valve 222 is disposed adjacent to the reaction chamber 100, the first gate valve 222 may be damaged by radiant heat in the reaction chamber 100. In order to prevent this, the length of the reaction chamber 100 may be sufficiently long so that the distance between the heating unit 140 and the first gate valve 222 is sufficiently maintained. In this case, however, the system 1 becomes larger due to the increase in the length of the reaction chamber 100.

According to the present embodiment, the heat between the first gate valve 222 and the reaction chamber 100 to prevent the system 1 from being enlarged and to prevent the first gate valve 222 from being damaged by radiant heat. The blocking member 190 is installed. As the heat blocking member 190, a blocking plate of a material having a low thermal conductivity such as alumina for blocking radiant heat transmitted from the reaction chamber 100 to the first gate valve 222 may be used. For example, when the barrier plate is used as a general metal material, cooling water may be supplied to increase thermal deformation and barrier efficiency of the barrier plate.

The blocking member 190 is positioned in front of the first gate valve 222 while the first gate valve 222 is closed. When the first gate valve 222 is opened, the blocking member 190 moves the movement path of the composite substrate 10. Move to a location that does not interfere.

Before the synthetic substrate 10 is loaded into the reaction chamber 160, the catalyst 20 (metal film) is applied to the upper surface of the reaction chamber 160 in the catalyst applying unit 500. 3 is a block diagram of the catalyst coating unit 500 shown in FIG. 1, and FIG. 4 is a plan view of the catalyst coating unit 500 viewed from the top after cutting along a line A-A 'of FIG. 2.

3 and 4, the catalyst applicator 500 includes a catalyst storage tank (hopper) 520, a metering supply 560, a brush unit 580, and a stage 590. During the process, the synthetic substrate 10 is placed on the stage 590. The catalyst storage tank 520 is disposed above the stage 590 and has a discharge port 526a for supplying a predetermined amount of the catalyst 20 to the upper surface of the synthetic substrate 10. The brush unit 580 spreads the catalyst 20 supplied to the upper surface of the synthetic substrate 10 to a uniform thickness on the upper surface of the synthetic substrate 10.

The stage 590 is installed to protrude inwardly to the side plates 592 and the respective side plates 592 which are arranged to face each other at a predetermined interval so that the composite substrate 10 is located therebetween, and thus the edge of the composite substrate 10. It has a plurality of support protrusions 594 supporting the area. A plurality of support protrusions 594 may be installed on each side plate 592.

The brush unit 580 includes a guide rail 584, an application brush 587, and a movable body 588. The guide rails 584 are installed in the longitudinal direction on both sides of the stage 590 on which the composite substrate 10 is placed. The movable body 588 is movably installed on the guide rail 584, and the movable body 588 is linearly moved by a known linear movement driver 586 such as a linear motor drive method, a cylinder drive method, and a motor drive method. The coating brush 587 is positioned above the stage 590, and spreads the catalyst 20 in a uniform thickness on the entire surface of the synthetic substrate 10. Both ends of the coating brush 587 are connected to the movable body 588 and are moved in a slide manner together with the movable body 588. The coating brush 587 may be provided in a plate shape of a metal or nonmetal material having a specific inclined surface with respect to the traveling direction.

The coating brush 587 is vertically moved by the vertical mover 589 so that the coating brush 587 can be adjusted in height according to the coating thickness of the catalyst 20 applied on the upper surface of the composite substrate 10. Is moved to. The vertical mover 589 includes an upper plate 589a fixedly coupled to the upper end of the movable body 588, a lower plate 589b fixedly coupled to the lower end of the movable body 588 to face the upper plate 589a, and an upper plate 589a and the lower plate 589b. ) Has a guide shaft 589c disposed vertically. The guide shaft 589c is linearly moved up and down along the guide shaft 589c by a driver (not shown), and a bracket 589d to which the application brush 587 is fixedly mounted is provided.

The catalyst storage tank 520 supplies the catalyst 20 stored therein onto the synthetic substrate 10. Catalyst storage tank 520 has an upper surface 522, a side 524, and a lower surface 526 with an outlet 526a formed therein. Side 524 has a generally vertical upper portion 524a, an intermediate side portion 524b extending downwardly therefrom and inclined inwardly downward, and a lower portion 524c extending generally vertically downwardly therefrom. . Due to the above-described structure, a large amount of catalyst 20 is stored in the space provided by the upper portion 524a in a region corresponding to the same height as compared to the space provided by the lower portion 524c. Due to the shape of the intermediate side portion 524b described above, the catalyst 20 in the space provided by the upper portion 524a is smoothly supplied into the space provided by the lower portion 524c.

The catalyst storage tank 520 is provided with a quantitative supply unit 560 for supplying the catalyst 20 by the amount set to the upper surface of the synthetic substrate 10. The metered feeder 560 has an upper barrier plate 564 and a lower barrier plate 562 that can provide a quantitative space 568 in which a set amount of catalyst 20 can be contained. The upper blocking plate 564 and the lower blocking plate 562 are provided at the lower side 524c. The metering space 568 is located above the outlet 526a of the catalyst storage tank 520, the upper blocking plate 564 is provided to the top of the metering space 568, the lower blocking plate 562 is the metering space ( 568). The upper block plate 564 and the lower block plate 562 are operated by driving means such as the cylinder 566. When the upper block 564 is closed while the lower block 562 is closed, the quantitative space 568 filled with the amount of catalyst 20 set between the lower block 562 and the upper block 564 is filled. Is provided again.

When the lower blocking plate 562 is opened, the catalyst 20 contained in the metering space 568 is supplied to the upper surface of the synthetic substrate 10 through the discharge port 526a. On the other hand, an agitator 540 for stirring the catalyst 20 is installed in the middle side portion 524b of the catalyst storage tank 520. The stirring blade 542 of the stirrer 540 rotates before the catalyst 20 is supplied to the quantitative space to remove the empty space inside the catalyst storage tank 520 and at the same time, the catalyst 20 naturally moves to the quantitative space 568. Has a role of inducing supply.

5A to 5C are diagrams for explaining the catalyst application process in the catalyst applying unit 500 step by step. 5A to 5C, when the composite substrate 10 is placed on the stage 590 by the second transfer device 700, the lower blocking plate 562 is operated by the cylinder 566 to move laterally. While moving, the lower portion of the quantitative space 568 is opened, and the set amount of the catalyst 20 contained in the quantitative space 568 falls to the upper surface of the synthetic substrate 10 (FIG. 5A). Catalyst 20 piled up on the upper surface of the synthetic substrate 10 is applied to the entire surface of the synthetic substrate 10 by a brush unit 580 in a uniform thickness (Figs. 5b, 5c). That is, the application brush 587 uniformly applies the catalyst 20 to the entire surface of the synthetic substrate 10 while slidingly moving from one end to the other end of the synthetic substrate 10 together with the moving body 588. In this case, a vibrator (not shown) may be additionally provided to apply a fine vibration to the application brush 587 or the synthetic substrate 10 for uniform application of the catalyst 20. Here, the catalyst 20 may be in the form of a powder in which transition metals such as iron, platinum, cobalt, nickel, and yttrium, and alloys thereof, and porous materials such as Mg0, Al203, and Si02 are mixed. Or it may be a liquid catalyst 20 containing such a material. When the catalyst 20 is in a liquid phase, it may include a catalyst storage tank, a supply line, a pump for quantitative supply installed on the supply line, and a supply nozzle for supplying the liquid catalyst 20 to the upper surface of the synthetic substrate.

In the above-described example, it has been described that the catalyst 20 is uniformly coated on the synthetic substrate 10 while the application brush 587 moves. Alternatively, the application brush 587 is fixed and the stage can be moved. However, in order to reduce the space of the catalyst coating unit 500, it is preferable that the coating brush 587 is moved as in the above-described example.

In addition, in the above-described example, the catalyst 20 is applied on the synthetic substrate 10 separately from the catalyst applying unit 500, and in the reaction chamber 100 on the synthetic substrate 10 to which the catalyst 20 is applied. It has been described as generating carbon nanotubes 30. Alternatively, however, the catalyst applicator may be removed, and the catalyst gas and the source gas may be supplied in the reaction chamber to apply the catalyst and generate carbon nanotubes on the synthetic substrate.

6 is a plan view of the substrate storage unit 400 and the first transfer device 300, Figure 7 is a side view of the substrate storage unit. 6 and 7, the substrate storage unit 400 includes a cassette 420 for storing the composite substrate 10, vertical rails 442, horizontal rails 444, and moving frames 446. Have The vertical rails 442 are disposed at corners of the first region 240, respectively. The vertical rails 442 have a long rod shape in the vertical direction and guide the vertical movement of the moving frame 446. Each vertical rail 442 is coupled with a bracket 448 that is moved up and down by a vertical drive (not shown) along the vertical rail 442. Each moving frame 446 is provided long along the first direction 42 and is disposed to face each other. The moving frame 446 is fixedly coupled to the bracket 448 and linearly moves up and down along the vertical rail 442 together with the bracket 448. Both ends of each moving frame 446 are fixed to brackets facing each other in the first direction 42, and the moving frames 446 are moved up and down together with the bracket 448. The horizontal rail 444 is fixedly installed on the moving frame 446. Each horizontal rail 444 is provided long along the second direction 44, and the horizontal rails 444 are disposed to face each other. The horizontal rail 444 is provided over the entire area of the first region 240, and the cassette 420 is mounted on the horizontal rail 444 to be movable in the second direction 44 along the horizontal rail 444.

As shown in Fig. 6, the cassette 420 is moved horizontally between the standby position indicated by the dotted line and the loading / unloading position X2 indicated by the solid line (just before the first gate valve 222 connected to the reaction chamber). do. The standby position X1 is a position in the lower region 244 of the first region 240 and the loading / unloading position X2 is a position in the upper region 242 of the first region 240. The cassette 420 is loaded / unloaded position (X2) when loading / unloading the composite substrate 10 into / from the reaction chamber 100 and when transferring the composite substrate 10 by the second transfer device 700. Is moved to, and when waiting to lower the temperature of the composite substrate 10 is moved to the standby position (X1).

8 is a perspective view of the cassette 420. The composite substrate 10 to be loaded into the reaction chamber 100 and the composite substrates 10 unloaded from the reaction chamber 100 are stored in the cassette 420. Referring to FIG. 8, the cassette 420 has supports 422, an upper plate 424 and a lower plate 426, and vertical axes 428. The upper plate 424 and the lower plate 426 are generally provided in a rectangular shape and are disposed to face each other up and down. The vertical axes 428 connect four corner portions of the upper plate 424 and the lower plate 426 facing each other. Support portions 422 supporting the composite substrate 10 are installed on the vertical axis 428 so that the composite substrate 10 is stacked and stored in the cassette 420. Each support 422 has four support blocks 423 for supporting the edge of the composite substrate 10. The supports 422 are grouped into two groups. The supports 422a (hereinafter referred to as the first support) belonging to the first group support the composite substrates 10 to be loaded into the reaction chamber 100, and the supports 422b (hereinafter referred to as the second support) belonging to the second group react. The unloaded composite substrates 10 are supported from the chamber 100. In an example, four first support parts 422a and four second support parts 422b are provided, and the first support parts 422a are provided to be positioned above the second support parts 422b.

The vertical space between the second supports 422b is wider than the vertical space between the first supports 422a. Due to the structure described above, the carbon nanotubes 30 (CNT) generated on the upper surface of the unloaded synthetic substrate 10 from the reaction chamber 100 are in contact with the adjacent composite substrate 10 while reducing the overall height of the cassette 420. It can provide enough space to prevent it.

Synthetic substrates 10 stored in the first supporting portions 422 of the cassette 420 are loaded into the reaction chamber 100 by the first transfer device 300. Four synthetic substrates 10 are placed in the boat 160 of the reaction chamber 100. The first transfer device 300 sequentially loads and unloads the composite substrate into / from the reaction chamber 100 one by one. When the loading of the synthetic substrates 10 is completed, a process for generating the carbon nanotubes 30 is performed in the reaction chamber 100. During the process in the reaction chamber 100, another four composite substrates 10 are waiting for the first support portion 422 of the cassette 420 after applying the catalyst in the catalyst coating portion 500. When the production process of the carbon nanotubes 30 in the reaction chamber 100 is completed, the synthetic substrate 10 in a high temperature state is unloaded from the reaction chamber 100 by the first transfer device 300 to draw the cassette 420. The second support portion 422b is stored in the high temperature synthetic substrate 10 undergoes a cooling process for a predetermined time in the second support portion 422b. Cooling is achieved by natural cooling. Optionally, forced cooling may be performed using a cooling means such as cooling water or the like. On the other hand, the composite substrates 10 on which the carbon nanotubes 30 have been generated are rapidly removed from the reaction chamber 100 without waiting for the temperature to drop to a certain temperature. When withdrawn, four synthetic substrates (synthetic substrates waiting for generation of the carbon nanotubes 30) 10 which are waiting at the first support 422a of the cassette 420 are loaded into the reaction chamber 100. As such, in the reaction chamber 100, the temperature increase process for increasing the process temperature of the reactor 120 may be omitted by rapidly loading the composite substrates 10 while the temperature of the reactor 120 maintains the process temperature. .

The composite substrates 10 on which the carbon nanotubes 30 are formed are waited at the second support portions 422b of the cassette 420 until they fall below a predetermined temperature. The cassette 420 on which the synthetic substrates 10 are located is located inside the station unit 200. Since the inside of the station part 200 is filled with inert gas, the synthetic substrates 10 waiting in the cassette 420 are not in contact with outside air (especially oxygen). For example, the synthesis substrate 10 that has been processed in the reaction chamber 100 may not be in a state where the temperature falls below a predetermined temperature. However, when the synthesis substrate 10 is exposed to the atmosphere at room temperature in a high temperature state, the surface of the synthesis substrate 10 The produced carbon nanotubes 30 react with oxygen in the atmosphere to cause deformation. In the present invention, in order to prevent such a problem, the unloaded synthetic substrate 10 in the reaction chamber 100 is provided with a station part 200 filled with an inert gas as described above so as not to come into contact with oxygen.

Meanwhile, the composite substrates 10 waited for a predetermined time in the second support parts 422b of the cassette 420 are transferred to the recovery part 600 by the second transfer device 700 through the second gate valve 224. Transferred. After the carbon nanotubes 30 have been recovered from the recovery part 600, the synthetic substrate 10 is coated with the catalyst 20 from the catalyst applicator 500, and again, the first support part 422a of the cassette 420. ) Is stored.

As described above, in the system of the present invention, a total of eight synthetic substrates are divided into two groups, and thus the carbon nanotube 30 synthesis process is continuously performed in the reaction chamber alternately, and thus the throughput can be expected to be improved, thereby allowing mass production. There is this.

9 is a perspective view of the first transfer device. Referring to FIG. 9, the first transfer apparatus 300 may include an arm 320 supporting the composite substrate 10, a blade 340, vertical rails 362, horizontal rails 364, and moving frames 366. ), And a moving block 368. The vertical rails 362 are disposed at corners of the second region 260, respectively. The vertical rails 362 have a long rod shape in the vertical direction and guide the vertical movement of the moving frame 366. Each vertical rail 362 is coupled with a bracket 365 which is moved up and down by a vertical drive (not shown) along the vertical rail 362. Each moving frame 366 is elongated along the second direction 44 and is disposed to face each other. The moving frame 366 is fixedly coupled to the bracket 365 and linearly moved up and down along the vertical rail 362 together with the bracket 365. Both ends of each of the moving frames 366 are fixed to brackets 365 facing each other in the second direction 44, and the moving frames 366 are moved up and down together with the brackets 365. Horizontal rails 364 are fixedly installed on the moving frames 366. Each horizontal rail 364 is provided elongated in the first direction 42. The horizontal rail 364 is provided over the entire area of the second region 260, and the movable block 368 is mounted on the horizontal rail 364 to be movable in the second direction 44 along the horizontal rail 364. . The movable block 368 is fixedly provided with an arm 320 installed along the first direction 42. The arm 320 is equipped with a blade 340 for supporting the composite substrate 10.

The composite substrates 10 that have been cooled for a predetermined time in the second support parts 444 of the cassette 420 are transferred to the recovery part 600 by the second transfer device 700 through the second gate valve 224. Transferred.

10 and 11 are respectively a perspective view and a plan view of the recovery portion, Figure 12 is a view for explaining the carbon nanotube 30 recovery process in the recovery portion.

10 to 12, the recovery unit 600 has a stage 620 on which the composite substrate 10 is placed. At the bottom of the stage 620 is a recovery container 660 in which the carbon nanotubes 30 recovered from the synthetic substrate 10 are stored. In addition, the stage 620 is provided with a recovery unit 640 for sweeping the carbon nanotubes 30 into the recovery container 660 on the upper surface of the synthetic substrate 10. The recovery unit 640 is provided with a guide rail 646 installed in the longitudinal direction of the composite substrate 10. The movable body 644 is installed in the guide rail 646, and the recovery brush 642 is installed in the movable body 644. The recovery brush 642 sweeps the carbon nanotubes 30 on the upper surface of the synthetic substrate 10 into the recovery container 660 while slidingly moving in one direction from one side of the synthetic substrate 10. The recovery brush 642 may be adjustable in height in the movable body 644.

In the above-described example, it has been described that the catalyst 20 is swept out on the synthetic substrate 10 while the recovery brush 642 is moved. Alternatively, however, the recovery brush 642 can be fixed and the stage can be moved. However, in order to reduce the space of the recovery unit 600, it is preferable that the recovery brush 642 is moved as in the above-described example.

The synthetic substrate 10 from which the carbon nanotubes 30 have been recovered is provided to the catalyst applying unit 500 by the second transfer device 700, and then passes through the aforementioned catalyst coating process. It is accommodated in 422a.

Referring to Figure 13, the process proceeds in the system for mass production of carbon nanotubes 30 having such a configuration is a catalyst coating step (S110), carbon nanotubes 30 production step (S120), cooling (standby) It has a step (S130), a recovery step (S140). In the catalyst application step S110, when the catalyst 20 corresponding to a single coating amount is supplied from the catalyst storage tank 520 to the upper surface of the synthetic substrate 10, the application brush 587 of the brush unit 580 is moved. The catalyst 20 is evenly distributed over the synthetic substrate 10. The composite substrate 10 having the catalyst 20 coated thereon is accommodated in the cassette 420 of the substrate storage unit 400 installed in the station unit 200 by the second transfer device 700. The composite substrate 10 accommodated in the first supporting portion 422a of the cassette 420 is formed by the first transfer device 300 immediately after the composite substrate 10 which has been processed from the reaction chamber 100 is unloaded. Loaded into boat 160 of 100. When the loading of the synthetic substrate 10 is completed, a process for generating the carbon nanotubes 30 is performed in the reaction chamber 100 (S120). Meanwhile, the synthetic substrates 10 unloaded from the reaction chamber 100 are accommodated in the second support part 422b of the cassette 420 and then cooled for a predetermined time (S130). After a certain time, the synthetic substrate 10 is drawn out of the station unit 400 and moved to the recovery unit 600 (S140). After the recovery of the carbon nanotubes 30 from the recovery unit 600, the synthetic substrate 10 is moved to the catalyst applying unit 500 again and is stored in the first support part 422a of the cassette 420 after the catalyst application. After completing the process in the reaction chamber 100, the synthetic substrates 10 are stored in the second support portion 422b of the cassette, and are then repeatedly performed.

As described above, the carbon nanotube synthesis apparatus according to the present invention efficiently cools and exhausts high-temperature gas in a reactor. Therefore, it is possible to prevent the damage caused by the high temperature gas exhaust in the reactor.

Claims (4)

Apparatus for synthesizing carbon nanotubes on a composite substrate: A reactor for providing a space for producing carbon nanotubes; A gas supply unit supplying gas to a generation space of the reactor; And an exhaust unit for cooling and exhausting the gas in the reactor. The method of claim 1, The exhaust unit, An exhaust line connected to the reactor and exhausting gas in the reactor to the outside; And a cooling member installed on the exhaust line and cooling the gas exhausted through the exhaust line. The method of claim 2, The cooling member, A housing in which a gas passage is formed, And a cooling fluid circulation line through which a cooling fluid for cooling the gas moving along the passage is circulated. The method of claim 3, wherein The housing, Has a space surrounding the passage outside the passage and in which a cooling fluid is circulated, The cooling fluid circulation line, Carbon nanotube synthesizing apparatus for supplying a cooling fluid to the space.

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