KR100749542B1 - Apparatus for collection carbon nano tube - Google Patents

Abstract

An apparatus for collecting carbon nano-tube is provided to automatically recover the carbon nano-tube and to precisely calculate a produced amount of the nano-tube. An apparatus includes a collecting tank for storing carbon nano-tubes recovered from a synthetic substrate; a stage disposed over the collecting tank for receiving the synthetic substrate; and a recovering unit for brushing up the carbon nano-tubes on the surface of the synthetic substrate on the stage to the collecting tank. The recovering unit includes a brush sliding over the surface of the synthetic substrate to brush up the nano-tubes to the collecting tank. The recovering unit includes a guide rail installed in the longitudinal direction of the stage and a moving body capable of moving along the guide rail and equipped with the brush.

Description

A device for carbon nanotube recovery {APPARATUS FOR COLLECTION CARBON NANO TUBE}

1 is a configuration diagram illustrating a production system of carbon nanotubes according to the present invention.

FIG. 2 is a diagram illustrating the catalyst coating of FIG. 1.

3 is a plan view taken along the line AA ′ of FIG. 2.

4A to 4C are diagrams for explaining the catalyst application process step by step in the catalyst coating unit.

5 is a plan view illustrating the substrate storage part and the first transfer device of FIG. 1.

6 is a side view of the substrate storage portion.

7 is a perspective view showing a cassette of the substrate storage portion.

8 is a perspective view of the first transfer device.

9 is a perspective view of a recovery part of FIG. 1.

10 is a plan view of the recovery part of FIG.

11 is a view for explaining a carbon nanotube recovery process in the recovery unit.

12 is a process flow diagram in a system for carbon nanotube production.

13 is a block diagram of a catalyst coating unit for explaining the modified catalyst supply unit.

* Explanation of symbols for the main parts of the drawings *

100: reaction chamber

200: station

300: first transfer device

400: substrate storage

500: catalyst coating unit

600: recovery unit

700: second transfer device

The present invention relates to a carbon nanotube production automation system by mass production of carbon nanotubes, and more particularly, to a carbon nanotube recovery apparatus for automatically recovering carbon nanotubes from a synthetic substrate.

Carbon nanotubes (carbon nanotubes) is formed by combining three carbon atoms adjacent to one carbon atom to form a hexagonal ring, and the hexagonal ring is a honeycomb-shaped plane is rolled to form a cylindrical or tube.

Carbon nanotubes have properties that can exhibit metallic conductivity or semiconductor conductivity depending on their structure. As a material, it can be widely applied to various technical fields, and it is attracting attention as a new material of the future. For example, carbon nanotubes are applicable to electrodes of electrochemical storage devices such as secondary cells, fuel cells or supercapacitors, electromagnetic shielding, field emission displays, or gas sensors.

Most of these carbon nanotubes consist of small quantities of hand-dependent production. In particular, a process of applying a catalyst to a synthetic substrate, loading / unloading a synthetic substrate into a reaction tube, and recovering carbon nanotubes from the synthetic substrate by unloading the synthetic substrate on which the carbon nanotubes are synthesized in the reaction tube It is difficult to carry out continuous process and mass production because the back is made by worker.

It is an object of the present invention to provide a carbon nanotube recovery apparatus capable of automatically recovering carbon nanotubes synthesized on a substrate.

In addition, an object of the present invention is to provide a carbon nanotube recovery apparatus capable of accurate production calculation.

It is another object of the present invention to provide an automated carbon nanotube recovery apparatus.

According to a feature of the present invention for achieving the above object, the system for mass production of carbon nanotubes provides a carbon nanomaterial production space and the reaction is made of the synthesis of carbon nanotubes on the synthetic substrates supplied to the production space chamber; A first transfer device for loading / unloading composite substrates from the reaction chamber; A substrate storage unit for storing the composite substrates unloaded from the reaction chamber; A recovery unit for extracting the synthesized substrate from the substrate storage unit to recover the carbon nanotubes synthesized on the synthesized substrate; A catalyst coating unit for applying a catalyst to a surface of the synthetic substrate supplied to the reaction chamber; And a second transfer device for transferring a synthetic substrate between the recovery unit, the catalyst applying unit, and the substrate storage unit.

According to an embodiment of the present invention, the catalyst coating unit comprises: a stage on which a synthetic substrate is placed; A catalyst storage tank (hopper) disposed above the stage and having a discharge port for supplying a predetermined amount of catalyst to an upper surface of a synthetic substrate; And it may include a brush unit for spreading the catalyst supplied to the upper surface of the synthesis substrate to a uniform thickness on the front surface of the synthesis substrate.

According to an embodiment of the present invention, the brush unit comprises a guide rail installed in the longitudinal direction of the composite substrate; A movable body installed to be movable along the guide rail; It is disposed on the stage to spread the catalyst in a uniform thickness on the front surface of the synthetic substrate and comprises a coating brush which is slid by the movable body, the coating brush is adjustable in height in the movable body.

According to an embodiment of the present invention, the catalyst storage tank may include a quantitative supply unit for supplying a single supply amount to the upper surface of the synthetic substrate.

According to an embodiment of the present invention, the fixed-quantity supply unit is located above the discharge port of the catalyst storage tank, and provided with a quantitative space in which a single supply of catalyst can be contained by the upper blocking plate and the lower blocking plate, and the lower blocking When the plate is opened, the catalyst contained in the quantitative space may be supplied to the synthetic substrate upper surface through the discharge port.

According to an embodiment of the present invention, the catalyst storage tank is installed inside the agitator for stirring the catalyst, and the catalyst coating unit vibrator for applying vibration to the synthetic substrate or the brush unit so that the catalyst is uniformly applied to the synthetic substrate It may further include.

According to an embodiment of the present invention, the recovery unit comprises: a stage on which a synthetic substrate is placed; A recovery container installed at one side of the stage and storing carbon nanotubes recovered from the synthetic substrate; It may include a recovery unit for sweeping the carbon nanotubes into the recovery container in the upper surface of the synthetic substrate placed on the stage.

According to an embodiment of the invention, the recovery unit is a guide rail which is installed in the longitudinal direction of the composite substrate; A movable body installed to be movable along the guide rail; It may include a recovery brush for sweeping the carbon nanotubes on the upper surface of the synthetic substrate while the slide moves by the moving body.

According to an embodiment of the present invention, the recovery brush can be adjusted in height in the movable body.

According to an embodiment of the present invention, the substrate storage unit may include first support parts for receiving composite substrates to be loaded into the reaction chamber; It may include a cassette having a second support portion for receiving the composite substrate unloaded from the reaction chamber.

According to an embodiment of the present invention, the spacing of the second supports is wider than the spacing of the first supports.

According to an embodiment of the present invention, the cassette is movable from the standby position to the loading / unloading position where the composite substrate is loaded / unloaded by the first transfer device, and the height can be adjusted.

According to an embodiment of the present invention, the system further includes a station part connected with the reaction chamber; The first transfer device and the substrate storage part may be disposed in the station part so that the composite substrate, which is unloaded from the reaction chamber, may block contact with external air.

According to a feature of the present invention for achieving the above object, a system for mass production of carbon nanotubes comprises a catalyst coating unit for applying a catalyst to the surface of the synthetic substrate; A reaction chamber in which a synthesis process of carbon nanotubes is performed on a synthetic substrate coated with a catalyst; A substrate storage unit configured to wait for composite substrates for loading into the reaction chamber and synthetic substrates unloaded from the reaction chamber; It may include a recovery unit for extracting the cooled synthetic substrate from the substrate storage unit to recover the carbon nanotubes synthesized on the synthetic substrate.

According to an embodiment of the present invention, the substrate storage part is installed inside the station part isolated from the outside so that the composite substrate unloaded from the reaction chamber does not come into contact with oxygen.

According to an embodiment of the present invention, the station part is filled with an inert gas inside.

According to an embodiment of the present invention, the catalyst coating unit includes a catalyst storage tank having a discharge port for supplying a predetermined amount of catalyst to the upper surface of the synthetic substrate; And it may include a brush unit for spreading the catalyst supplied to the upper surface of the synthesis substrate to a uniform thickness on the front surface of the synthesis substrate.

According to an embodiment of the present invention, the recovery unit includes a recovery container for storing the carbon nanotubes recovered from the synthetic substrate; It may include a recovery unit for sweeping the carbon nanotubes to the recovery container in the upper surface of the synthetic substrate.

According to an embodiment of the present invention, the recovery unit may include a recovery brush for sweeping the carbon nanotubes on the upper surface of the synthetic substrate while slidingly moving from one end of the upper surface of the synthetic substrate to the other end.

According to an embodiment of the present invention, the substrate storage unit may include first support parts for receiving composite substrates for loading into the reaction chamber; It may include a cassette in which the unloaded composite substrates from the reaction chamber are received and having second supports that are wider than the gap of the first supports.

According to a feature of the present invention for achieving the above object, a method for mass production of carbon nanotubes comprises the steps of applying a catalyst to the surface of the synthetic substrate; Loading a catalyst-coated synthetic substrate into a reaction chamber to synthesize carbon nanotubes on the synthetic substrate; Drawing the finished synthetic substrate from the reaction chamber and cooling the synthetic substrate to a predetermined temperature or less in an inert gas atmosphere; Recovering the carbon nanotubes from the cooled synthetic substrate.

According to the exemplary embodiment of the present invention, immediately after the synthesized substrate is unloaded from the reaction chamber, a catalyst-coated synthetic substrate is loaded into the reaction chamber so that the carbon nanotube synthesis process is rapidly performed in the reaction chamber.

According to an embodiment of the present invention, the synthetic substrate unloaded from the reaction chamber is stored in a cassette disposed in a station part of an inert gas atmosphere, and a catalyst is applied during the synthesis process of carbon nanotubes in the reaction chamber. The synthetic substrate is held in the cassette.

According to an embodiment of the present invention, the catalyst applying step may include supplying a predetermined amount of catalyst to the synthetic substrate upper surface, and spreading the catalyst supplied to the synthetic substrate upper surface with a uniform thickness on the entire surface of the synthetic substrate.

According to an embodiment of the present invention, the recovering step may include a step of sweeping the carbon nanotubes from the upper surface of the synthetic substrate and storing them in a recovery container.

For example, embodiments of the present invention may be modified in various forms, and the scope of the present invention should not be construed as being limited by the embodiments described below. This example is provided to more completely explain the present invention to those skilled in the art. Accordingly, the shapes of elements in the drawings and the like are exaggerated to emphasize clearer explanations.

Hereinafter, an embodiment of the present invention will be described in more detail with reference to FIGS. 1 to 13. The present invention provides a carbon nanotube production system 1 capable of automated and mass production. 1 is a schematic view showing an example of a carbon nanotube production system of the present invention. Referring to FIG. 1, the system 1 has a composite substrate 10, a reaction chamber 100, and a post-process chamber.

The synthetic substrate 10 is used as a base plate on which carbon nanotubes (30 in FIG. 7) are synthesized. The composite substrate 10 on which the carbon nanotubes 30 are synthesized includes a silicon wafer, an induim tin oxide (ITO) substrate, an ITO-coated glass, soda-lime glass, corning glass, a transition metal. This deposited substrate, alumina or the like can be used. However, if the carbon nanotube 30 has sufficient rigidity for synthesizing (growing, producing), various kinds of synthetic substrates may be used in addition to the above-described substrates.

The reaction chamber 100 performs a process of generating carbon nanotubes 30 on the composite substrate 10, and the pre- and post-processing chambers are used for the composite substrate 10 loaded / unloaded from / to the reaction chamber 100. Pretreatment and post-treatment processes are carried out. The pretreatment step and the post-treatment step include a step of applying the catalyst 20 to the substrate, a step of recovering the carbon nanotubes 30 generated on the synthetic substrate, and the like. The post-processing chamber includes a station part 200, a first transfer device 300, a substrate storage part 400, a catalyst coating device (hereinafter referred to as a catalyst application part) 500, a recovery part 600, and a second transfer device 700. )

The station unit 200 prevents the composite substrate 10 unloaded from the reaction chamber 100 from being exposed to the atmosphere. The first transfer device 300 loads / unloads the composite substrate into / from the reaction chamber 100. Substrate storage 400 stores a composite substrate that is loaded or unloaded into / from reaction chamber 100. The catalyst applicator 500 performs a process of applying the catalyst 20 on the synthetic substrate 10 before the synthetic substrate 10 is loaded into the reaction chamber 100. The recovery unit 600 performs a process of recovering the carbon nanotubes 30 generated on the synthetic substrate 10 unloaded from the reaction chamber 100 from the synthetic substrate 10. The second transfer device 700 transfers the synthetic substrate 10 between the substrate storage unit 400, the catalyst application unit 500, and the recovery unit 600.

According to an example, the station unit 200 is disposed side by side with the reaction chamber 100 on one side of the reaction chamber 100. The station unit 200 has a first area 240 and a second area 260. The first region 240 is disposed adjacent to the reaction chamber 100, and the substrate storage 400 is positioned in the first region 240. The second region 260 is provided in a direction opposite to the reaction chamber 100 with respect to the first region 240 and the first transfer device 300 is located. The reaction chamber 100 and the second region 260 are disposed in the same direction in the first direction 42. The first region 240 has an upper region 242 and a lower region 244. The upper region 242 is a region located on the same line as the reaction chamber 100 and the second region 260, and the lower region 244 is a second perpendicular to the first direction 42 from the upper region 244. It is an area extending in the direction 44. The first region 240 and the second region 260 are generally rectangular in shape.

The catalyst applicator 500, the recovery part 600, and the second transfer device 400 are positioned adjacent to the station part 200, and have a lower area based on the upper area 242 of the first area 240. It is disposed side by side in a direction parallel to the first direction 42 at a position opposite to the (244). The second transfer device 400 is disposed at a position opposite to the first area 240 of the station unit 200. In addition, the second transfer device 400 is located between the catalyst applicator 500 and the recovery unit 600.

Next, each component of the system of the present invention will be described in detail.

Referring to FIG. 1, the reaction chamber 100 has a reaction tube 120 made of a heat resistant material such as quartz or graphite. Reactor 120 may be provided in a substantially cylindrical shape. At the front and bottom of the reactor 120, flanges 132 and 134 for sealing the inside of the reactor 120 from the outside are installed. In the reactor 120, a boat 160 on which the synthetic substrates 10 are placed is installed. Outside the reactor 120, a heating unit 140 for heating the reactor 120 to the process temperature is installed. As the heating part 140, a heating wire having a coil shape may be used to surround the outer wall of the reactor 120. Reactor 120 during the process may be maintained at approximately 500-1100 degrees Celsius (℃).

Only one boat 160 may be provided in the reactor 120, or a plurality of boats 160 may be provided. The boat 160 is provided with a sufficiently large size so that a plurality of synthetic substrates 10 may be placed in one boat 160 along the longitudinal direction of the reactor 120 (the first direction 42 described above). . Optionally, the boat 160 may have a size and a structure capable of supporting the plurality of composite substrates 10 in the vertical direction and the longitudinal direction, respectively. According to an example, the boats 160 have a size and a structure capable of supporting the composite substrate 10 two vertically and two longitudinally. The boats 160 may be fixedly installed in the reactor 120.

In addition, the boat 160 may be provided in a size capable of supporting one composite substrate 10. In this case, one or more boats 160 may be provided. When a plurality of boats 160 are provided, a plurality of boats 160 may be disposed along the longitudinal direction of the reactor 120 (first direction 42 described above), or optionally perpendicular to the first direction 42. It can be stacked in one vertical direction.

The flange 132 installed at the front end of the reactor 120 is equipped with a gas inlet port 182 into which source gas supplied from a gas supply unit (not shown) is injected. As the source gas, at least one selected from the group consisting mainly of acetylene, ethylene, methane, benzene, xylene, carbon monoxide and carbon dioxide may be used. The source gas is decomposed into radicals by pyrolysis, and the radicals react with a catalyst applied on a synthetic substrate to synthesize carbon nanotubes.

The flange 134 installed at the other end of the reactor 120 is equipped with a gas exhaust port 184 for discharging residual gas inside the reactor 120 after the reaction.

In the present embodiment, a reaction chamber 100 having a structure to which pyrolysis of hydrocarbon is applied by pyrolyzing hydrocarbons to produce carbon nanotubes 30 is described as an example, but this is only one example. In the system 100 of the present invention, a reaction chamber having a structure to which various generation methods such as laser deposition, plasma chemical vapor deposition, thermochemical vapor deposition, and flame synthesis can be applied may be used.

The station unit 200 includes a chamber 200a isolated from the outside. A first gate valve 222 is installed between the station unit 200 and the reaction chamber 100 to open and close a passage through which the composite substrate 10 moves, and the station unit 200 and the second transfer device 700 are provided therebetween. The second gate valve 224, which opens and closes the passage through which the composite substrate 10 moves between them, is installed between them.

The station unit 200 is provided with a gas supply member 280 for supplying an inert gas such as nitrogen, argon, and the like into the station unit 200. The inert gas removes air (particularly oxygen) inside the station unit 200 and maintains an inert gas atmosphere inside the station unit 200. This prevents the high temperature carbon nanotubes 30 generated on the composite substrate 10 from contacting with oxygen when the composite substrate 10 is unloaded from the reaction chamber 100 in the station unit 200. The gas supply member 280 is preferably provided in the first region 240.

When the first gate valve 222 is disposed adjacent to the reaction chamber 100, the first gate valve 222 may be damaged by radiant heat in the reaction chamber 100. In order to prevent this, the length of the reaction chamber 100 may be sufficiently long so that the distance between the heating unit 140 and the first gate valve 222 is sufficiently maintained. In this case, however, the system 1 becomes larger due to the increase in the length of the reaction chamber 100.

According to the present embodiment, the heat between the first gate valve 222 and the reaction chamber 100 to prevent the system 1 from being enlarged and to prevent the first gate valve 222 from being damaged by radiant heat. The blocking member 190 is installed. As the heat blocking member 190, a blocking plate of a material having a low thermal conductivity such as alumina for blocking radiant heat transmitted from the reaction chamber 100 to the first gate valve 222 may be used. When the barrier plate is used as a general metal material, cooling water can be supplied to increase the thermal deformation and the barrier efficiency of the barrier plate.

The blocking member 190 is positioned in front of the first gate valve 222 while the first gate valve 222 is closed. When the first gate valve 222 is opened, the blocking member 190 moves the movement path of the composite substrate 10. Move to a location that does not interfere.

Before the synthetic substrate 10 is loaded into the reaction chamber 100, the catalyst 20 (metal film) is coated on the upper surface of the reaction chamber 100 in the catalyst applying unit 500. FIG. 2 is a configuration diagram of the catalyst applicator 500 shown in FIG. 1, and FIG. 3 is a plan view of the catalyst applicator 500 viewed from the top after cutting along the line A-A 'of FIG. 2.

2 and 3, the catalyst applicator 500 includes a stage 590, a catalyst supply part 520, and a brush unit 580. They are installed inside the sealed transparent case 510.

 During the process, the composite substrate 10 is placed on the stage 590 through an outlet 512 formed at one side of the case 510. The stage 590 is installed to protrude inwardly on the two side plates 592 and the respective side plates 592 which are spaced apart from each other so as to face each other so that the composite substrate 10 is located therebetween. It has a plurality of support protrusions 594 supporting the edge region of the. A plurality of support protrusions 594 may be installed on each side plate 592.

The catalyst feeder 520 includes a catalyst storage tank 521 and a metered feeder 560.

The catalyst storage tank 521 is disposed above the stage 590 and has a discharge port 526a for supplying a predetermined amount of the catalyst 20 to the upper surface of the synthetic substrate 10. The brush unit 580 spreads the catalyst 20 supplied to the upper surface of the synthetic substrate 10 to a uniform thickness on the upper surface of the synthetic substrate 10.

The brush unit 580 includes a guide rail 584, an application brush 587, and a movable body 588. The guide rails 584 are installed in the longitudinal direction on both sides of the stage 590 on which the composite substrate 10 is placed. The movable body 588 is movably installed on the guide rail 584, and the movable body 588 is linearly moved by a known linear movement driver 586 such as a linear motor drive method, a cylinder drive method, and a motor drive method. The coating brush 587 spreads the catalyst 20 in a uniform thickness on the entire surface of the synthetic substrate 10. The coating brush 587 is positioned above the stage 590 to be spaced apart from the synthetic substrate 10 by a thickness of a catalyst coating. Both ends of the coating brush 587 are connected to the movable body 588 and are moved in a slide manner together with the movable body 588. The application brush 587 may be provided in a plate shape having a specific inclined surface with respect to the advancing direction.

The coating brush 587 is installed to adjust the height on the movable body 588 according to the coating thickness of the catalyst 20 applied on the upper surface of the composite substrate 10, and the height adjusting of the coating brush 587 is performed by the vertical mover. (589). The vertical mover 589 includes an upper plate 589a fixedly coupled to the upper end of the movable body 588, a lower plate 589b fixedly coupled to the lower end of the movable body 588 to face the upper plate 589a, and an upper plate 589a and the lower plate 589b. ) Has a guide shaft 589c disposed vertically. The guide shaft 589c is linearly moved up and down along the guide shaft 589c by a normal driver (not shown), and a bracket 589d to which the application brush 587 is fixedly mounted is provided.

The catalyst storage tank 521 supplies the catalyst 20 stored therein onto the synthetic substrate 10. The catalyst storage tank 521 has a lid top surface 522, a side surface 524, and a bottom surface 526 on which an outlet 526a is formed. Side 524 is a generally vertical upper portion 524a, a middle side portion 524b extending downwardly therefrom and inclined inwardly downward, and a lower portion extending generally vertically downwardly therefrom and providing a narrow passageway. Has 524c. Due to the above-described structure, a large amount of catalyst 20 is stored in the space provided by the upper portion 524a in a region corresponding to the same height as compared to the space provided by the lower portion 524c. Due to the shape of the intermediate side portion 524b described above, the catalyst 20 in the space provided by the upper portion 524a is smoothly supplied into the space provided by the lower portion 524c.

The catalyst storage tank 521 is provided with a quantitative supply unit 560 for supplying the catalyst 20 by an amount set to the upper surface of the synthetic substrate 10. The metered feeder 560 has an upper barrier plate 564 and a lower barrier plate 562 that can provide a quantitative space 568 in which a set amount of catalyst 20 can be contained. The upper blocking plate 564 and the lower blocking plate 562 are provided at the lower side 524c. The metering space 568 is located above the discharge port 526a of the catalyst storage tank 521, the upper blocking plate 564 is provided to the top of the metering space 568, the lower blocking plate 562 is the metering space ( 568). The upper block plate 564 and the lower block plate 562 are operated by driving means such as the cylinder 566. When the upper blocking plate 564 is closed while the lower blocking plate 562 is closed, the amount of the catalyst 20 that is set between the lower blocking plate 562 and the upper blocking plate 564 enters the metering space 568. Is filled.

When the lower blocking plate 562 is opened, the catalyst 20 contained in the metering space 568 is supplied to the upper surface of the synthetic substrate 10 through the discharge port 526a. On the other hand, an agitator 540 is provided in the middle side portion 524b of the catalyst storage tank 521 to stir the catalyst 20. The stirring blade 542 of the stirrer 540 rotates before the catalyst 20 is supplied to the quantitative space to remove the empty space inside the catalyst storage tank 521 and the catalyst 20 naturally moves to the quantitative space 568. Has a role of inducing supply.

4A to 4C are diagrams for explaining the catalyst application process in the catalyst applying unit 500 step by step. 4A to 4C, when the composite substrate 10 is placed on the stage 590 by the second transfer device 700, the lower blocking plate 562 is operated by the cylinder 566 to move laterally. While moving, the lower part of the quantitative space 568 is opened, and the set amount of the catalyst 20 contained in the quantitative space 568 falls to the upper surface of the synthetic substrate 10 (FIG. 4A). Catalyst 20 stacked on the upper surface of the synthetic substrate 10 is applied to the entire surface of the synthetic substrate 10 by a brush unit 580 in a uniform thickness (Figs. 4b, 4c). That is, the application brush 587 uniformly applies the catalyst 20 to the entire surface of the synthetic substrate 10 while slidingly moving from one end to the other end of the synthetic substrate 10 together with the moving body 588. In this case, a vibrator 599 such as a vibration motor for uniform application of the catalyst 20 may be additionally installed. The vibrator 599 is preferably installed where it can apply vibration to the application brush 587 or the composite substrate 10. In this embodiment, the vibrator 599 is installed in the side plate 592 of the stage 590. The vibration generated from the vibrator 599 is transmitted to the composite substrate through the support protrusions 594.

Here, the catalyst 20 may be in the form of a powder in which transition metals such as iron, platinum, cobalt, nickel, and yttrium, and alloys thereof, and porous materials such as Mg0, Al203, and Si02 are mixed. Or it may be a liquid catalyst 20 containing such a material.

As shown in FIG. 13, when the catalyst 20 is in the liquid phase, the catalyst supply part 520 ′ is fixed on the catalyst storage tank 530, the supply line 532, and the supply line 532 in which the liquid catalyst is contained. It may include a supply pump 534 and a supply nozzle 536 for supplying the liquid catalyst 20 to the upper surface of the synthetic substrate, the supply nozzle 536 has a length corresponding to the width of the synthetic substrate 10 It consists of a slit type nozzle. The supply nozzle 536 may apply the catalyst to the synthetic substrate 10 with a uniform thickness while moving from one side to the other side of the synthetic substrate along the guide rail 538, in which case the supply nozzle 536 may be a synthetic substrate ( The brush unit can be omitted by uniformly applying the catalyst directly to 10).

In the above-described example, it has been described that the catalyst 20 is uniformly coated on the synthetic substrate 10 while the application brush 587 moves. Alternatively, the application brush 587 is fixed and the stage can be moved. However, in order to reduce the space of the catalyst coating unit 500, it is preferable that the coating brush 587 is moved as in the above-described example.

In addition, in the above-described example, the catalyst 20 is applied on the synthetic substrate 10 separately from the catalyst applying unit 500, and in the reaction chamber 100 on the synthetic substrate 10 to which the catalyst 20 is applied. It has been described as generating carbon nanotubes 30. Alternatively, however, the catalyst coating may be removed, and the catalyst and source gas may be supplied in the reaction chamber to apply the catalyst and generate carbon nanotubes on the synthetic substrate.

5 is a plan view of the substrate storage unit 400 and the first transfer device 300, Figure 6 is a side view of the substrate storage unit. 5 and 6, the substrate storage unit 400 includes a cassette 420 for storing the composite substrate 10, vertical rails 442, horizontal rails 444, and moving frames 446. Have The vertical rails 442 are disposed at corners of the first region 240, respectively. The vertical rails 442 have a long rod shape in the vertical direction and guide the vertical movement of the moving frame 446. Each vertical rail 442 is coupled with a bracket 448 that is moved up and down by a vertical drive (not shown) along the vertical rail 442. Each moving frame 446 is provided long along the first direction 42 and is disposed to face each other. The moving frame 446 is fixedly coupled to the bracket 448 and linearly moves up and down along the vertical rail 442 together with the bracket 448. Both ends of each moving frame 446 are fixed to brackets facing each other in the first direction 42, and the moving frames 446 are moved up and down together with the bracket 448. The horizontal rail 444 is fixedly installed on the moving frame 446. Each horizontal rail 444 is provided long along the second direction 44, and the horizontal rails 444 are disposed to face each other. The horizontal rail 444 is provided over the entire area of the first region 240, and the cassette 420 is mounted on the horizontal rail 444 to be movable in the second direction 44 along the horizontal rail 444.

As shown in Fig. 5, the cassette 420 is moved horizontally between the standby position indicated by the dotted line and the loading / unloading position X2 indicated by the solid line (just before the first gate valve 222 connected to the reaction chamber). do. The standby position X1 is a position in the lower region 244 of the first region 240 and the loading / unloading position X2 is a position in the upper region 242 of the first region 240. The cassette 420 is loaded / unloaded position (X2) when loading / unloading the composite substrate 10 into / from the reaction chamber 100 and when transferring the composite substrate 10 by the second transfer device 700. Is moved to, and when waiting to lower the temperature of the composite substrate 10 is moved to the standby position (X1).

7 is a perspective view of the cassette 420. The composite substrate 10 to be loaded into the reaction chamber 100 and the composite substrates 10 unloaded from the reaction chamber 100 are stored in the cassette 420. Referring to FIG. 7, the cassette 420 has supports 422, an upper plate 424 and a lower plate 426, and vertical axes 428. The upper plate 424 and the lower plate 426 are generally provided in a rectangular shape and are disposed to face each other up and down. The vertical axes 428 connect four corner portions of the upper plate 424 and the lower plate 426 facing each other. Support portions 422 supporting the composite substrate 10 are installed on the vertical axis 428 so that the composite substrate 10 is stacked and stored in the cassette 420. Each support 422 has four support blocks 423 for supporting the edge of the composite substrate 10. The supports 422 are grouped into two groups. The supports 422a (hereinafter referred to as the first support) belonging to the first group support the composite substrates 10 to be loaded into the reaction chamber 100, and the supports 422b (hereinafter referred to as the second support) belonging to the second group react. The unloaded composite substrates 10 are supported from the chamber 100. In an example, four first support parts 422a and four second support parts 422b are provided, and the first support parts 422a are provided to be positioned above the second support parts 422b.

The vertical space between the second supports 422b is wider than the vertical space between the first supports 422a. Due to the structure described above, the carbon nanotubes 30 (CNT) generated on the upper surface of the unloaded synthetic substrate 10 from the reaction chamber 100 are in contact with the adjacent composite substrate 10 while reducing the overall height of the cassette 420. It can provide enough space to prevent it.

The composite substrates 10 stored in the first supporting portions 422a of the cassette 420 are loaded into the reaction chamber 100 by the first transfer device 300. Four synthetic substrates 10 are placed in the boat 160 of the reaction chamber 100. The first transfer device 300 sequentially loads and unloads the composite substrate into / from the reaction chamber 100 one by one. When the loading of the synthetic substrates 10 is completed, a process for generating the carbon nanotubes 30 is performed in the reaction chamber 100. While the process is performed in the reaction chamber 100, another four synthetic substrates 10 are waited at the first supporting portions 422a of the cassette 420 after the catalyst is applied at the catalyst applying unit 500. When the production process of the carbon nanotubes 30 in the reaction chamber 100 is completed, the synthetic substrate 10 in a high temperature state is unloaded from the reaction chamber 100 by the first transfer device 300 to draw the cassette 420. The second support portion 422b is stored in the high temperature synthetic substrate 10 undergoes a cooling process for a predetermined time in the second support portion 422b. Cooling is achieved by natural cooling. Optionally, forced cooling may be performed using a cooling means such as cooling water or the like. On the other hand, the composite substrates 10 on which the carbon nanotubes 30 have been generated are rapidly removed from the reaction chamber 100 without waiting for the temperature to drop to a certain temperature. When withdrawn, four synthetic substrates (synthetic substrates waiting for generation of the carbon nanotubes 30) 10 which are waiting at the first support 422a of the cassette 420 are loaded into the reaction chamber 100. As such, in the reaction chamber 100, the temperature increase process for increasing the process temperature of the reactor 120 may be omitted by rapidly loading the composite substrates 10 while the temperature of the reactor 120 maintains the process temperature.

The composite substrates 10 on which the carbon nanotubes 30 are formed are waited at the second support portions 422b of the cassette 420 until they fall below a predetermined temperature. The cassette 420 on which the synthetic substrates 10 are located is located inside the station unit 200. Since the inside of the station part 200 is filled with inert gas, the synthetic substrates 10 waiting in the cassette 420 are not in contact with outside air (especially oxygen). For example, the synthesis substrate 10 that has been processed in the reaction chamber 100 may not be in a state where the temperature falls below a predetermined temperature. However, when the synthesis substrate 10 is exposed to the atmosphere at room temperature in a high temperature state, the surface of the synthesis substrate 10 The produced carbon nanotubes 30 react with oxygen in the atmosphere to cause deformation. In the present invention, in order to prevent such a problem, the unloaded synthetic substrate 10 in the reaction chamber 100 is provided with a station part 200 filled with an inert gas as described above so as not to come into contact with oxygen.

Meanwhile, the composite substrates 10 waited for a predetermined time in the second support parts 422b of the cassette 420 are transferred to the recovery part 600 by the second transfer device 700 through the second gate valve 224. Transferred. After the carbon nanotubes 30 have been recovered from the recovery part 600, the synthetic substrate 10 is coated with the catalyst 20 from the catalyst applicator 500, and again, the first support part 422a of the cassette 420. ) Is stored.

As described above, in the system of the present invention, a total of eight synthetic substrates are divided into two groups, and thus the carbon nanotube 30 synthesis process is continuously performed in the reaction chamber alternately, and thus the throughput can be expected to be improved, thereby allowing mass production. There is this.

8 is a perspective view of the first transfer device. Referring to FIG. 8, the first transfer apparatus 300 includes an arm 320 supporting the composite substrate 10, a blade 340, vertical rails 362, a horizontal rail 364, and moving frames 366. ), And a moving block 368. The vertical rails 362 are disposed at corners of the second region 260, respectively. The vertical rails 362 have a long rod shape in the vertical direction and guide the vertical movement of the moving frame 366. Each vertical rail 362 is coupled with a bracket 365 which is moved up and down by a vertical drive (not shown) along the vertical rail 362. Each moving frame 366 is elongated along the second direction 44 and is disposed to face each other. The moving frame 366 is fixedly coupled to the bracket 365 and linearly moved up and down along the vertical rail 362 together with the bracket 365. Both ends of each of the moving frames 366 are fixed to the brackets 365 facing each other in the second direction 44, respectively, and the moving frames 366 are moved up and down together with the brackets 365. Horizontal rails 364 are fixedly installed on the moving frames 366. Each horizontal rail 364 is provided elongated in the first direction 42. The horizontal rail 364 is provided over the entire area of the second region 260, and the movable block 368 is mounted on the horizontal rail 364 to be movable in the second direction 44 along the horizontal rail 364. . The movable block 368 is fixedly provided with an arm 320 installed along the first direction 42. The arm 320 is equipped with a blade 340 for supporting the composite substrate 10.

The composite substrates 10 that have been cooled for a predetermined time in the second support parts 422b of the cassette 420 are transferred to the recovery part 600 by the second transfer device 700 through the second gate valve 224. Transferred.

9 and 10 are respectively a perspective view and a plan view of the recovery unit, Figure 11 is a view for explaining the carbon nanotube 30 recovery process in the recovery unit.

9 to 11, the recovery part 600 has a case 602 with an open top surface. The stage 620 on which the composite substrate 10 is placed is located on the upper surface of the case. At the bottom of the stage 620 (below the open top surface of the case), a recovery container 660 in which the carbon nanotubes 30 recovered from the synthetic substrate 10 are stored is located. And a recovery unit 640 is installed on the upper surface of the case. The recovery unit 640 is for sweeping the carbon nanotubes 30 from the upper surface of the synthetic substrate 10 into the recovery container 660. The recovery unit 640 is provided with a guide rail 646 installed in the longitudinal direction of the composite substrate 10. The movable body 644 is installed in the guide rail 646, and the recovery brush 642 is installed in the movable body 644. The recovery brush 642 sweeps the carbon nanotubes 30 on the upper surface of the synthetic substrate 10 into the recovery container 660 while slidingly moving in one direction from one side of the synthetic substrate 10. The recovery brush 642 may be adjustable in height in the movable body 644. On the other hand, the bottom of the recovery container may be provided with an electronic balance 690 for measuring the weight of the carbon nanotubes recovered by the recovery container, the value measured in the electronic balance 690 through the monitor 692 installed outside The cumulative amount and the current recovery amount are displayed. The operator can see the value displayed on the monitor and calculate the exact yield.

In the above-described example, it has been described that the catalyst 20 is swept out on the synthetic substrate 10 while the recovery brush 642 is moved. Alternatively, however, the recovery brush 642 can be fixed and the stage can be moved. However, in order to reduce the space of the recovery unit 600, it is preferable that the recovery brush 642 is moved as in the above-described example.

The synthetic substrate 10 from which the carbon nanotubes 30 have been recovered is provided to the catalyst applying unit 500 by the second transfer device 700, and then passes through the aforementioned catalyst coating process. It is accommodated in 422a.

Process progress in the system for mass production of carbon nanotubes 30 having such a configuration is a catalyst coating step (S110), carbon nanotubes 30 generating step (S120), cooling (waiting) step (S130), recovery step (S140). In the catalyst applying step S110, when the catalyst 20 corresponding to a single coating amount is supplied from the catalyst storage tank 521 to the upper surface of the synthetic substrate 10, the application brush 587 of the brush unit 580 moves. The catalyst 20 is evenly distributed over the synthetic substrate 10. The composite substrate 10 having the catalyst 20 coated thereon is accommodated in the cassette 420 of the substrate storage unit 400 installed in the station unit 200 by the second transfer device 700. The composite substrate 10 accommodated in the first supporting portion 422a of the cassette 420 is formed by the first transfer device 300 immediately after the composite substrate 10 which has been processed from the reaction chamber 100 is unloaded. Loaded into boat 160 of 100. When the loading of the synthetic substrate 10 is completed, a process for generating the carbon nanotubes 30 is performed in the reaction chamber 100 (S120). Meanwhile, the synthetic substrates 10 unloaded from the reaction chamber 100 are accommodated in the second support part 422b of the cassette 420 and then cooled for a predetermined time (S130). After a certain time, the synthetic substrate 10 is drawn out of the station unit 400 and moved to the recovery unit 600 (S140). After the recovery of the carbon nanotubes 30 from the recovery unit 600, the synthetic substrate 10 is moved to the catalyst applying unit 500 again and is stored in the first support part 422a of the cassette 420 after the catalyst application. After completing the process in the reaction chamber 100, the synthetic substrates 10 are stored in the second support portion 422b of the cassette, and are then repeatedly performed.

According to the present invention, carbon nanotubes can be automatically recovered from the synthetic substrate.

In addition, according to the present invention, accurate and reliable carbon nanotube recovery is possible.

In addition, according to the present invention, it is possible to accurately calculate the production amount of carbon nanotubes, the daily production amount and the like.

In addition, according to the present invention, the utilization rate of the equipment can be improved by automating the recovery process of the carbon nanotubes.

In addition, according to the system for producing carbon nanotubes to which the present invention is applied, carbon nanotubes can be produced in large quantities.

In addition, according to the system for producing carbon nanotubes to which the present invention is applied, since the process temperature of the reaction chamber can be continuously maintained, the carbon nanotube synthesis of the composite substrate can be continuously performed, thereby improving facility utilization rate.

In addition, according to the system for producing carbon nanotubes to which the present invention is applied, it is possible to secure process reliability through accurate and reliable automatic catalyst supply.

In addition, according to the system for producing carbon nanotubes to which the present invention is applied, accurate production can be calculated through automatic recovery of carbon nanotubes.

Claims (5)

Apparatus for recovering carbon nanotubes synthesized on a synthetic substrate: A recovery container in which carbon nanotubes recovered from the synthetic substrate are stored; A stage positioned on the recovery container and on which the synthetic substrate is placed; And And a recovery unit for sweeping the carbon nanotubes into the recovery container on the upper surface of the synthetic substrate placed on the stage. The method of claim 1, The recovery unit is And a recovery brush for sweeping the carbon nanotubes on the synthetic substrate upper surface into the recovery container while slidingly moving from the upper surface of the synthetic substrate. The method of claim 2, The recovery unit is A guide rail installed in the longitudinal direction of the stage; Carbon nano tube recovery apparatus further comprises a moving body is installed to be movable along the guide rail and the recovery brush is mounted. The method of claim 3, The recovery brush is carbon nanotube recovery apparatus, characterized in that the height can be adjusted in the moving body. The method according to any one of claims 1 to 4, The carbon nanotube recovery apparatus further comprises an electronic balance for checking the weight change of the recovery container in order to check the recovery amount of the carbon nanotubes recovered in the recovery container.

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