KR20070068544A - Loadlock chamber for manufacturing flat panel display device - Google Patents

Abstract

A loadlock chamber for manufacturing a flat panel display device is provided to improve reliability of processing by aligning exactly a substrate without an additional process using a side guider. A loadlock chamber for manufacturing a flat panel display device includes both sides for defining an inner spacer capable of mounting a substrate and at least two side guiders. The side guiders(70) are protruded from the both sides in order to support an edge portion of the substrate. The side guider is composed of a support plane(72) for loading stably the edge portion of the substrate and a tilted plane(74) at a peripheral portion of the support plane. The side guider contains polybenzimidazole, polyetheretherketone, fluorocarbon or metal.

Description

Loadlock chamber for manufacturing flat panel display device

1 is a block diagram of a cluster system for manufacturing a general flat panel display.

Figure 2 is an internal perspective view of a typical load lock chamber.

Figure 3 is an internal plan view of the load lock chamber according to the present invention.

Figure 4 is an enlarged perspective view of the side guider of the load lock chamber according to the present invention.

5 is a cross-sectional view taken along the line V-V of FIG.

FIG. 6 is a sectional view taken along line VI-VI of FIG. 4; FIG.

<Description of the symbols for the main parts of the drawings>

2: substrate 50: load lock chamber

52 shelf 54,56 both sides

58,60: front rear face 62,64: first and second gates

70: side guider 72: support surface

74: slope 78: upper surface

S: Boundary Line 80: Side Pin

82: center pin

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a loadlock chamber for manufacturing a flat panel display device. More specifically, the present invention relates to a substrate for loading and unloading by a robot. The present invention relates to a load lock chamber for manufacturing a flat panel display device having an aligner function capable of supporting the substrate at a predetermined height and aligning the substrate.

In response to the recent information age, the display field for displaying images through electrical signals has also been rapidly developed. As a flat panel display device having advantages of light weight, thinness, and low power consumption, the display field has been developed rapidly. Liquid Crystal Display Device (LCD), Plasma Display Panel Device (PDP), Field Emission Display Device (FED), Electroluminescence Display Device (ELD), etc. This introduction is rapidly replacing the existing Cathode Ray Tube (CRT).

These flat panel display devices have a flat panel display panel as an essential component for image realization in common, and shows a form in which the flat panel display panel is bonded to each other through a unique layer of fluorescent or polarizing material between a pair of substrates. Recently, an active matrix type, in which pixels, which are basic units of image expression, are arranged in a matrix manner, and then individually controlled by switching elements such as thin film transistors (TFTs), realize a video. It is widely used for its ability and color reproduction.

In order to manufacture such a flat panel display device, numerous processes are performed on a substrate, and as a specific example, a thin film deposition process of forming a thin film of a predetermined material on a surface of a substrate and exposing a selected portion of the thin film is performed. Photolithography (photo-lithography) process, including the etching process of removing the exposed portion of the thin film and patterning (patterning) in the desired form, including various processes such as cleaning and cutting.

In addition, the manufacturing process of these flat panel display devices is performed in a unique manufacturing equipment equipped with an optimal environment for each process, for example, chemical vapor deposition (CVD) or sputter, etc. The thin film deposition process is carried out in a process chamber which defines the reaction environment of the vacuum.

In addition, a general process chamber includes a so-called cluster system in which a plurality of process chambers are connected to a transfer chamber (20) defining a buffer area of a vacuum, in order to obtain a yield improvement effect by reducing an installation area and maintaining a vacuum environment. In this case, at least one loadlock chamber is connected to the transfer chamber to distinguish between an external atmospheric pressure environment and a vacuum environment inside the transfer chamber.

That is, FIG. 1 is a block diagram illustrating a cluster system for manufacturing a general flat panel display device, in which a plurality of process chambers P are connected to a transfer chamber T defining a vacuum buffer area, and a double transfer chamber T is provided. The first robot (R1) for transporting the substrate is provided inside. In addition, in the transfer chamber T, the transfer chamber T may not be damaged while the substrate is transferred and conveyed between the atmospheric environment and the transfer chamber T which is a vacuum environment. At least one load lock chamber L is connected together. The load lock chamber defines an enclosed interior space, and may change the interior space into atmospheric pressure or vacuum, and form a boundary with the transfer chamber T. A first gate G1 and a second gate G2 facing outward are provided.

In addition, a second second robot R2 is provided outside the second gate G2 of the load lock chamber L.

Accordingly, when the atmospheric pressure environment is created inside the load lock chamber L while both the first and second gates G1 and G2 are closed, the second gate G2 is opened while the first gate G1 is closed. When R2 loads the substrate into the load lock chamber L, and the first and second gates G1 and G2 are all closed, and a vacuum environment is formed inside the load lock chamber L, the second gate G2 is formed. ), The first gate G1 is opened while the first robot R1 unloads the substrate. The substrate is transferred to the process chamber P to perform a unique process. Subsequently, if a vacuum environment is formed in the load lock chamber L while both the first and second gates G1 and G2 are closed, the second gate G2 is closed and the first gate G1 is opened to open the second robot. When R2 loads the processed substrate into the load lock chamber L, and the first and second gates G1 and G2 are all closed, and the atmospheric pressure environment is formed inside the load lock chamber L, the first gate The second gate G2 is opened while G1 is closed, and the second robot R2 unloads the substrate.

In other words, the conventional load lock chamber L acts as a port for transferring substrates between the robots R1 and R2 while distinguishing different heterogeneous environments, and these robots R1 and R2. The substrate is supported at a predetermined height in the load lock chamber L so as to smoothly load and unload the substrate.

That is, Figure 2 is a perspective view showing the internal structure of the general load lock chamber (L), the upper and lower facing the upper and lower and the inner space sealed by four vertical planes are defined, for convenience the upper surface is omitted in the drawing, The lower surface is provided with a deck (shelf: 12), the four vertical surfaces of the first and second gate (G1, G2) through which both sides (14, 16) and the substrate (2) can pass It is divided into front and rear (18, 20) to provide.

In addition, a plurality of center pins 22 protrude upward from the double shelf 12, and a plurality of side pins 24 protrude from opposite sides 14 and 16 in a direction facing each other. There are usually about two, and a total of eight side pins 24, including two pairs corresponding to four corners of the substrate 2, four on each side 14 and 16, respectively. In this case, the side pins 24 may be divided into a main body 26 coupled to both sides 14 and 16 of the load lock chamber L and a support pin 28 protruding therefrom.

As a result, the substrate 2 is mounted on the side pins 24, more specifically, the support pins 28, at the same time both edges are mounted on the center pins 22, and supported by the shelf 12 at a certain height. A robot insertion space is provided between the 12 and the substrate 2.

However, the above-described general load lock chamber L exhibits some disadvantages during the process progression, one of which is that the alignment of the substrate 2 is impossible.

That is, in the general load lock chamber L, the substrate 2 is simply mounted on the side pin 24 including the center pin 22, for example, on the second robot R2 of FIG. When the substrate 2 transferred by the substrate 2 is misaligned from the aligned state, the substrate 2 is mounted on the side pin 24 including the center pin 22 as it is, and the first robot R1 also delivers the misaligned substrate 2. And feed into the process chamber (P).

Therefore, assuming that thin film deposition proceeds in the process chamber P, the thin film cannot be accurately deposited to a desired position on the substrate 2, and thus, the process reliability of the process chamber 2 is greatly reduced.

In addition, even while the substrate 2 processed in the process chamber P is transferred from the first robot R1 to the second robot R2 through the load lock chamber L, the substrate 2 is still removed from the alignment state. It is delivered incorrectly, and as a result, subsequent subsequent processes may be affected, thereby causing a decrease in the reliability of the overall flat panel display manufacturing process.

Accordingly, the present invention has been made to solve the above problems, the object of the present invention is to provide a load lock chamber with an aligner function for the exact position alignment of the substrate, in particular in implementing the aligner function The goal is to enable accurate substrate alignment with minimal configuration and cost, without the need for additional complex device additions and excessive costs.

In order to achieve the above object, the present invention, both sides and defining an internal space in which the substrate is mounted; At least two side guiders protruding from both sides to face each other and supporting the substrate edges, each having a support surface on which the edge is seated and an inclined surface obliquely raised from the support surface in the edge outward direction; Provided is a load lock chamber for manufacturing a flat panel display device including the same.

In this case, the side guider is made of polybenzimidazole (PBI), polyetheretherketone (PEEK), fluorocarbon or a metal material, and the side guider is the same on each of the both sides. It is provided with two in height, it characterized in that the four corners to support one-to-one correspondence.

The method may further include a plurality of side pins protruding from both sides to face each other and supporting the edge of the substrate, wherein the plurality of side pins are respectively coupled to the side surfaces of the load lock chamber. A main body; And a support pin protruding from the main body to support the edge of the substrate, wherein the side guider further includes a nut-shaped fixture through which the support pin is fixed. It is characterized by being fixed to the coupling.

In addition, the shelf having a lower height than the side guider; And at least one center pin protruding from the shelf to support the substrate. In this case, the shelf includes at least two upper and lower double layers in the inner space, and the side guides are formed on both sides of each layer. Characterized in that provided.

In addition, the upper and lower and front and rear surfaces connected to both sides to seal the inner space; It is provided in each of the front and rear surfaces further comprises a first and second gates for carrying in / out the substrate, wherein the inner space is characterized in that the composition is changed to the atmospheric environment and vacuum environment.

Hereinafter, the present invention will be described in more detail with reference to the drawings.

3 is a plan view showing the internal structure of the load lock chamber according to the present invention, and defines a separate internal space independent of the outside through the upper and lower surfaces and four vertical surfaces.

In this case, for convenience, the upper surface is omitted in the drawing, and the lower surface of the shelf 52 is provided as a substantial floor that provides a substrate seating area, and the four vertical surfaces respectively face both sides 54 and 56 and the front rear surface 58, respectively. 60, the first and second gates 62 and 64 are provided on the front and rear surfaces 58 and 60, respectively, so that the substrate 2 can be carried in and out.

As a result, the substrate 2 loaded into the load lock chamber 50 through the first gate 62 or the second gate 64 is seated on the shelf 52 and then the second gate 64 or the first gate ( 62. The loading and unloading of the substrate 2 is carried out by the robot, so that the substrate 2 is provided with a shelf 52 in the load lock chamber 50 so as to provide an insertion space for the robot. Maintain spaced distance from

To this end, from both sides 54 and 56 of the load lock chamber 50 according to the present invention, at least two side guiders 70 protrude in a direction facing each other to support the edges of the substrate 2, and Preferably, a plurality of side pins 80 protrude from opposite sides 54 and 56 in a direction facing each other to support an edge of the substrate 2, and at least one center pin 82 from the shelf 52. This upward protrusion protrudes from the back of the substrate 2.

As a result, the edges including the edges of the substrate 2 are mounted on the side guiders 70 and the side pins 80 and spaced apart from the shelf 52 by a predetermined distance, and the center pins 82 prevent the backing from being supported.

On the other hand, as the most essential content of the load lock chamber 50 according to the present invention, the side guider 70 for supporting the edge of the substrate 2 is characterized by having an aligner function that can align the substrate in position have.

To this end, a total of four side guiders 70 may be used, two on each side 54 and 56 of the load lock chamber 50 so as to support the four corners of the substrate in a one-to-one correspondence. 70 is a perspective view of FIG. 4. Referring to FIG. 3, the support surface 72 on which one edge of the substrate 2 is seated and the edge of the edge of the substrate 2 in the outer direction of the substrate 2 are described. The inclined surface 74 which is raised obliquely from the support surface 72 is provided.

More specifically, FIG. 5 is a cross sectional view taken along the line V-V of FIG. 4, and FIG. 6 is a cross sectional view taken along the line VI-VI of FIG. 4, and these drawings are referred to together with FIGS. 3 and 4 above.

As can be seen, the side guider 70 according to the present invention provides a support surface 72 for supporting one edge of the substrate 2, two of the support surfaces 72 corresponding to the outer edge of one edge of the substrate 2. The edges coincide with the edge end lines of the substrate 2, respectively, from which the inclined surfaces 74 which obliquely rise in the direction away from the substrate are connected.

That is, when a part of the side guider 70 according to the present invention connected to the load lock chamber 50 is arbitrarily referred to as a main body, the support surface 72 on which one edge of the substrate 2 is seated from the upper surface 78 of the main body ) Shows a step of a height lowered to a certain degree, the inclined surface 74 connecting the step represents an oblique angle, and the boundary line L between the support surface 72 and the inclined surface 74 is located at one corner of the substrate 2. Is in agreement.

In other words, the side surface 54 of the load lock chamber 50 with the inclined surface 74 surrounding the one edge of the substrate 2 raised obliquely from the support surface 72 on which one edge of the substrate 2 is seated. 56) may be combined.

On the other hand, the side guiders 70 according to the present invention are provided in four, two on each side (54, 56) of the load lock chamber 50 in total, one-to-one corresponding to the four corners of the substrate 2, these mounting It provides a support surface 72 for supporting the one edge of the substrate 2 and the inclined surface 74 which is obliquely raised from the support surface 72 in the outward direction of the edge, which are different from each other only in the direction. .

And the reason that the side guider 70 shows the shape is for the exact alignment of the substrate 2, when the substrate 2 is placed on the side guider 70 with the substrate 2 is twisted At least one edge rests on the inclined surface 74 of at least one of the four side guiders 70, and naturally descends along the inclined surface 74 due to the self-loading of the substrate 2 so that the four corners of the substrate 2 are each It coincides with the boundary line S between the support surface 72 and the inclined surface 74 of the side guider 70.

The substrate 2 is thereby aligned in position.

At this time, the side guider 70 may support the substrate 2 and at the same time may generate a certain amount of friction, and after the thin film deposition process or the like, the substrate 2 brought into the load lock chamber 50 may be 400. Since it is a state heated at high temperature more than C, it is preferable to consist of a material with high heat resistance and durability.

Accordingly, the side guider 70 may be made of polybenzimidazole (PBI), polyetheretherketone (PEEK), fluorocarbon, or the like, or may be coated with a corresponding material. Stainless steel, also referred to as su or steel, may be used.

Polybenzimidazole is a special thermoplastic polymer resin called sorazole, which is known as a material having excellent chemical resistance and heat resistance. Known as plastics, fluorocarbon resin, also known as Teflon, is also widely used as a material having excellent heat resistance.

Hereinafter, an operation process of the load lock chamber 50 according to the present invention will be described.

At this time, the load lock chamber 50 according to the present invention is also part of a general cluster system to distinguish the transfer chamber of the vacuum environment and the outside of the atmospheric pressure environment for the substrate transfer between the first robot in the transfer chamber and the second robot in the atmospheric pressure environment. It acts as a port, by means of a pressure control means such as a pump not shown in the interior space can be changed to a vacuum or atmospheric environment.

Accordingly, after the atmospheric pressure environment is established in the load lock chamber 50, the substrate 2 is loaded by an external second robot in a state where the first gate 62 is sealed and the second gate 64 is opened. After the second gate 64 is sealed, the inside is changed into a vacuum environment and the first gate 62 is opened. During the above process, the substrate 2 is aligned from the shelf 52 by the side guider 70, the side pin 80 and the center pin 82 while being aligned in position by the side guider 70 according to the present invention. It is supported at a predetermined distance and carried out to the first gate 62 by the first robot of the transfer chamber.

Subsequently, the substrate 2 is subjected to a thin film deposition process.

Subsequently, the substrate is processed by the first robot of the transfer chamber in a state where the first gate 62 is opened and the second gate 64 is closed after the vacuum environment is created inside the load lock chamber 50. (2) is loaded, and after the first gate 62 is closed, the inside is changed to an atmospheric pressure environment and the second gate is opened 64.

Even during the above process, the substrate 2 is aligned in position by the side guider 70 according to the present invention and at the same time from the shelf 52 by the side guider 70, the side pin 80 and the center pin 82. It is supported by a predetermined distance, and is carried out to the second gate 64 by an external second robot.

On the other hand, although not shown in the drawings, when referring to the above description at least two shelves 52 in the upper and lower layers in the load lock chamber 50 and the side pins (including side guides 70) for each layer ( It will be apparent to those skilled in the art that it is possible to implement the upper and lower loadlock chamber 50 by providing the 80 and the center pin 82.

In addition, the side guider 70 of the load lock chamber 50 according to the present invention can be implemented using the side pins provided in the existing load lock chamber, with reference to Figure 1, the existing side pin 24 is a load lock chamber It consists of a main body 26 connected to (L) and a support pin 28 protruding therefrom, the position is composed of a total of four pairs of eight, including two pairs corresponding to the four corners of the substrate (2). . Accordingly, the side guider 70 according to the present invention may represent a form fitted into two pairs of side pins 24 corresponding to four edges of the substrate 2, and as shown in FIG. One side of the guider 70 is provided with a nut-shaped fastener 76 to which the support pin 28 is fitted and fixed thereto, and the support pin 28 fixed therethrough fixes a part of the support surface 72 of the side guider 70. It consists.

In this case, in order to fix the fixture 76 and the support pin 28, a screw thread may be formed on the outer surface of the support pin 28 and the inner surface of the fixture 76, respectively, and may be fixed by a screw method. Welding and the like are also possible.

As described above, the load lock chamber according to the present invention has a function of aligning a substrate. When using the rod lock chamber, the load of the substrate can be corrected in the load lock chamber without any additional process. Process reliability of the subsequent process such as the deposition process can be greatly improved.

In addition, the side guider according to the present invention can be implemented by replacing the configuration of some of the side pins provided in the existing load lock chamber, and thus has the advantage of enabling more accurate substrate alignment through a minimum configuration and cost.

Claims (9)

Both sides defining an inner space in which the substrate is mounted; At least two side guiders protruding in opposite directions from both sides to support the edges of the substrate, each having a support surface on which the edge is seated and an inclined surface obliquely raised from the support surface in the outward corner direction; Load lock chamber for manufacturing a flat panel display device comprising a. The method of claim 1, The side guider may be a polybenzimidazole (PBI), a polyetheretherketone (PEEK), a load lock chamber for manufacturing a flat panel display device including a fluorocarbon or a metal. The method of claim 1, The side guiders are provided on each of the two sides of the same height, the load lock chamber for manufacturing a flat panel display device to support the four corners of the substrate in a one-to-one correspondence. The method of claim 1, A plurality of side pins protruding in opposite directions from both sides to support the substrate edge; Load lock chamber for manufacturing a flat panel display device further comprising. The method of claim 4, wherein The plurality of side pins, respectively A body coupled to the side of the load lock chamber; A support pin protruding from the main body to support the substrate edge Load lock chamber for manufacturing a flat panel display device comprising a. The method of claim 5, The side guider is a nut-shaped fixture through which the support pin is fixed Further comprising a load lock chamber for manufacturing a flat panel display device coupled to some of the plurality of side pins. The method according to any one of claims 1 to 6, wherein A shelf of lower height than the side guider; At least one center pin protruding from the shelf to support the substrate Load lock chamber for manufacturing a flat panel display device further comprising. The method of claim 7, wherein The shelf is at least two of the upper and lower duplex in the inner space, The side guider is a load lock chamber for manufacturing a flat panel display device provided on both sides of each floor. The method of claim 1, Upper and lower and front and rear surfaces connected to both sides to seal the internal space; First and second gates provided in each of the front and rear surfaces to which the substrate is loaded / exported Further comprising, The internal space is a load lock chamber for manufacturing a flat panel display device which is formed to change the atmosphere environment and vacuum environment.

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