KR20070064707A - Illumination system of exposing equipment for semiconductor manufacturing - Google Patents

Abstract

An illumination device for exposure equipment for fabricating a semiconductor device is provided to improve a processing speed of the equipment by performing the exposure for minimum exposing time using plural filter units. A filter unit includes plural optical filters(51) having different transmittance, a body(52) supporting the optical filters, and driving unit(53) rotating the body. The body is rotated by the driving unit to conveniently select the optical filters according to necessary exposure. Two optical filters are combined by arranging an optical filter of one filter unit and an optical filter of another filter unit in an overlapped relation to select various illuminations.

Description

Lighting system of exposure equipment for semiconductor manufacturing {Illumination system of exposing equipment for semiconductor manufacturing}

1 is a schematic view showing a lighting device of the exposure apparatus according to the prior art,

Figure 2 is a front view showing the configuration of a filter unit according to the prior art,

Figure 3 is a front view showing the configuration of the filter unit according to an embodiment of the present invention.

* Explanation of symbols for main parts of drawings *

10: lamp 20, 90: reflector

30: shutter 40: input lens

50 filter unit 51 optical filter

52 filter body 53 filter drive unit

60: fly's eye 70: reticle blind

80: relay lens 100: condenser lens

110: reticle 120: projection lens

130: wafer

The present invention relates to a lighting device of the exposure equipment for semiconductor manufacturing, and more particularly, to a minimum exposure when using a high sensitivity photosensitive agent in the lighting device of the stepper equipment for performing an exposure process on the wafer of the photolithography process for semiconductor manufacturing The present invention relates to a lighting apparatus for exposure equipment for manufacturing a semiconductor capable of improving the processing speed of equipment by performing exposure at an exposure time.

In general, a semiconductor exposure equipment is an equipment that performs an exposure process, which is one of semiconductor manufacturing processes, wherein the exposure process includes placing a reticle having a circuit pattern on an upper side of a wafer coated with a photosensitive agent and moving the wafer by a constant pitch. It refers to a process of implanting a pattern by irradiating the wafer with light passing through the reticle from the lighting device.

A stepper or scanner used in such an exposure process is a kind of exposure equipment, and is a device that reduces and projects a pattern of a reticle onto a wafer using an optical lens. That is, the exposure apparatus includes a reticle stage for mounting a reticle at a predetermined distance below the lighting device, a wafer stage installed to seat the wafer on the lower side of the reticle stage, and an illumination device for irradiating light with the reticle. It is configured by.

1 is a schematic view showing a lighting apparatus of the exposure equipment according to the prior art.

As shown in FIG. 1, the lighting apparatus of the exposure apparatus according to the related art includes a lamp 10, a reflector 20, a shutter 30, an input lens 40, a filter unit 50, and a fly's eye. The lens 60, the reticle blind 70, the relay lens 80, the reflector 90, the condenser lens 100, the reticle 110, and the projection lens 120.

Therefore, the light generated by the lamp 10 is incident to the input lens 40 through the reflector 20. The shutter 30 is positioned between the input lens 40 and the reflector 20 to determine an exposure time. Light incident on the input lens 40 passes through a fly's eye lens 60 to maintain uniform light intensity. In addition, the reticle blind 70 serves to cover the edge of the reticle 110, which is an area where no exposure is required, and thus the size of the beam that is finally incident is determined.

Thereafter, the beam passing through the relay lens 80 is reflected by the reflector 90 to be incident on the condenser lens 100, and the condenser lens 100 increases brightness by collecting light in one place. Play a role. Light passing through the condenser lens 100 passes through the reticle 110 and is incident on the projection lens 120. The projection lens serves to project the circuit pattern of the reticle 110 onto the wafer 130 according to a predetermined reduction ratio.

2 is a front view showing the configuration of a filter unit according to the prior art.

In the lighting device as described above, the filter unit 50 is positioned between the input lens 40 and the fly's eye lens 60, and is adapted to the transmittance of the optical filter 51 installed in the filter unit 50. Therefore, it plays a role in determining the intensity of illumination.

However, as shown in FIG. 2, the filter unit 50 is equipped with four optical filters 51 having transmittances of 100%, 80%, 60%, and 40%. If necessary, since the exposure is performed using an optical filter of 80%, there is a problem of reducing the processing time of the equipment.

In other words, the amount of energy required for exposure decreased with the use of high sensitivity photosensitizer. Since the minimum exposure time of the equipment is limited to 30 msec, the illuminance of the light is lowered by using a filter unit to adjust the exposure energy. If the corresponding optical filter is required, 80% of the optical filter is used, and thus the exposure process is performed with an exposure time longer than the minimum exposure time of the exposure equipment, thereby increasing the processing time of the equipment.

Accordingly, the present invention has been made to solve the above-mentioned problems, and in particular, when the exposure using a high sensitivity photosensitive agent, the exposure apparatus for semiconductor manufacturing exposure equipment that can improve the processing speed of the equipment by performing the exposure with a minimum exposure time The purpose is to provide.

The lighting apparatus of the exposure apparatus for manufacturing a semiconductor of the present invention for achieving the above object is a lamp, a reflector, a shutter, an input lens, a filter unit, a fly's eye lens, a reticle blind, a relay lens, a reflector, An illuminating device for exposure equipment for manufacturing a semiconductor comprising a condenser lens, a reticle, and a projection lens sequentially arranged, characterized in that a plurality of filter units are provided.

In addition, the plurality of filter units may include an optical filter having a plurality of different transmittances; A main body supporting the optical filter; It is characterized by consisting of a drive unit for rotating the main body.

The light filter of the one filter unit and the light filter of the other filter unit are arranged to overlap each other.

Hereinafter, the configuration and operation of the preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings.

The lighting apparatus of the exposure apparatus for manufacturing a semiconductor according to an embodiment of the present invention, the lamp 10, the reflector 20, the shutter 30, the input lens 40, the filter unit 50, the fly's eye lens 60 ), Including the reticle blind 70, the relay lens 80, the reflector 90, the condenser lens 100, the reticle 110, the projection lens 120, the lamp 10, the reflector 20 , Shutter 30, input lens 40, fly's eye lens 60, reticle blind 70, relay lens 80, reflector 90, condenser lens 100, reticle 110, projection lens Since the configuration of the 120 is the same as the related art, a detailed description will be omitted in order to avoid duplication of description, and will be described in detail with reference to the operation of the newly added components.

3 is a front view showing the configuration of a filter unit according to an embodiment of the present invention.

As shown in FIG. 3, the lighting apparatus of the exposure apparatus for manufacturing a semiconductor according to the exemplary embodiment of the present invention is formed by installing a plurality of filter units 50.

Therefore, it is to have a more various light filter 51 than the conventional lighting device using one filter unit 50.

In addition, the plurality of filter units 50 may include a plurality of optical filters 51 having a plurality of different transmittances; A main body 52 supporting the optical filter; It consists of a drive unit 53 for rotating the body portion.

That is, the optical filter 51 has a plurality of different transmittances can be installed to selectively use the optical filter 51 according to the required illuminance.

Since the main body 52 is configured to rotate by the drive unit 53 by employing a revolver type switching mechanism, the optical filter 51 necessary for exposure can be conveniently selected.

In addition, the optical filter 51 of the one filter unit 50 and the optical filter 51 of the other filter unit 50 are arranged to overlap each other, so that the combination of the two optical filters 51 is combined. It is possible to choose various illuminance according to.

In other words, as shown in FIG. 3, when a 45% optical filter is required, a combination of 90% optical filter in one filter unit and 50% optical filter in another filter unit is used. It becomes a filter.

It will be apparent to those skilled in the art that the present invention is not limited to the above embodiments and can be practiced in various ways within the scope not departing from the technical gist of the present invention. will be.

As described above in detail, according to the lighting apparatus of the exposure apparatus for manufacturing a semiconductor according to the present invention, by providing a plurality of filter units, when the exposure using a high sensitivity photosensitive agent is performed, the exposure is performed with a minimum exposure time to increase the equipment processing speed. There is an effect that can be improved.

Claims (3)

Illumination apparatus for exposure equipment for manufacturing semiconductors, comprising a sequence of lamps, reflectors, shutters, input lenses, filter units, flyeye lenses, reticle blinds, relay lenses, reflectors, condenser lenses, reticles, and projection lenses to manufacture semiconductors The illuminating device of the exposure apparatus for semiconductor manufacture characterized by the above-mentioned. The optical filter of claim 1, wherein the plurality of filter units comprise: an optical filter having a plurality of different transmittances; A main body supporting the optical filter; Illumination apparatus for exposure apparatus for manufacturing a semiconductor, characterized in that the drive unit for rotating the main body portion. The illuminating device according to claim 1, wherein the optical filter of the one filter unit and the optical filter of the other filter unit are arranged to overlap each other.

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