JPS61156736A - Exposing device - Google Patents

Exposing device

Info

Publication number
JPS61156736A
JPS61156736A JP59280572A JP28057284A JPS61156736A JP S61156736 A JPS61156736 A JP S61156736A JP 59280572 A JP59280572 A JP 59280572A JP 28057284 A JP28057284 A JP 28057284A JP S61156736 A JPS61156736 A JP S61156736A
Authority
JP
Japan
Prior art keywords
luminous flux
filter
spectrum
lens
line spectrum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP59280572A
Other languages
Japanese (ja)
Inventor
Kazuhiro Takahashi
Masakatsu Oota
Akiyoshi Suzuki
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59280572A priority Critical patent/JPS61156736A/en
Publication of JPS61156736A publication Critical patent/JPS61156736A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • G03F7/70191Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarization, phase or the like
    • HELECTRICITY
    • H01BASIC ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
    • H01L21/18Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Abstract

PURPOSE:To reduce the adverse effect inflicted on a bright line spectrum and to obtain an exposing device having high resolving power by a method wherein a suitable filter is inserted into a part of the illumination system with which a projection optical system is illuminated, and a continuous spectrum is effectively cut. CONSTITUTION:The luminous flux emitted from a light source 2 is condensed on the field lens 3 arranged in the vicinity of the second focus by an oval mirror. The incidence angle of each luminous flux which is made incident on a filter element 5 is made small in such a manner that the center luminous flux in a field lens 3 becomes almost a parallel light by the first capacitor lens. After passing through a filter element 5, the luminous flux is introduced to an optical integrator 8. The filter element 5 is composed of a multilayer film which transmits the luminous flux having the narrow wavelength range of bright line spectrum necessary for projection and exposure, but it does not transmit other spectrum lights. As a result, a continuous spectrum can be cut effectively, and the adverse effect inflicting on the bright-line spectrum can be reduced.
JP59280572A 1984-12-27 1984-12-27 Exposing device Pending JPS61156736A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59280572A JPS61156736A (en) 1984-12-27 1984-12-27 Exposing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59280572A JPS61156736A (en) 1984-12-27 1984-12-27 Exposing device

Publications (1)

Publication Number Publication Date
JPS61156736A true JPS61156736A (en) 1986-07-16

Family

ID=17626896

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59280572A Pending JPS61156736A (en) 1984-12-27 1984-12-27 Exposing device

Country Status (1)

Country Link
JP (1) JPS61156736A (en)

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0233914A (en) * 1988-07-25 1990-02-05 Ushio Inc Lighting optical apparatus
JPH02260412A (en) * 1989-03-31 1990-10-23 Ushio Inc Aligner
JP2004358854A (en) * 2003-06-06 2004-12-24 Process Lab Micron:Kk Manufacturing method for metal mask, metal mask and metal mask printing form plate
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

Cited By (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0233914A (en) * 1988-07-25 1990-02-05 Ushio Inc Lighting optical apparatus
JPH0532900B2 (en) * 1988-07-25 1993-05-18 Ushio Electric Inc
JPH02260412A (en) * 1989-03-31 1990-10-23 Ushio Inc Aligner
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
JP2004358854A (en) * 2003-06-06 2004-12-24 Process Lab Micron:Kk Manufacturing method for metal mask, metal mask and metal mask printing form plate
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8854601B2 (en) 2005-05-12 2014-10-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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