KR20070040655A - Liquid crystal display and the method of fabricating the same - Google Patents

Abstract

A liquid crystal display device which prevents afterimages and improves transmittance is provided. The liquid crystal display includes a first substrate including a pixel electrode formed on the lower insulating substrate and a color filter formed on the pixel electrode, and a ridge line that divides the pixel into two or more portions on the upper insulating substrate facing the lower insulating substrate. And a second substrate including a pretilt film having an inclined structure that becomes thinner toward both sides or one side toward the center, and a liquid crystal layer interposed between the first substrate and the second substrate.

Liquid Crystal Display, Pretilt Film, COA

Description

Liquid crystal display and its manufacturing method {Liquid crystal display and the method of fabricating the same}

1 is a layout view of a first substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

2A is a layout view of a second substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

FIG. 2B is a cross-sectional view taken along the line IIb-IIb ′ of FIG. 2A.

3A is a layout view of a liquid crystal display according to an exemplary embodiment of the present invention.

3B is a cross-sectional view taken along the line IIIb-IIIb ′ of FIG. 3A.

4 is a layout view of a first substrate for a liquid crystal display according to another exemplary embodiment of the present invention.

5A is a layout view of a liquid crystal display according to an exemplary embodiment of the present invention.

FIG. 5B is a cross-sectional view taken along the line Vb-Vb ′ of FIG. 3a.

6 to 8B are cross-sectional views of steps of a first substrate in a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention.

9A and 9B illustrate step-by-step process cross-sectional views of a second substrate in a method of manufacturing a liquid crystal display according to another exemplary embodiment of the present invention.

10 through 11B are step-by-step process cross-sectional views of a first substrate in a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention.

(Explanation of symbols about main parts of drawing)

10: lower insulating substrate 22: gate line

26 gate electrode 30 gate insulating film

40: semiconductor layer 55, 56 resistive contact layer

62: data line 65: source electrode

66: drain electrode 70: protective film

80: pixel electrode 90, 92: color filter

210: upper insulating substrate 220: black matrix

230: common electrode 240: pretilt film

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a liquid crystal display device for preventing afterimages and improving transmittance and a method of manufacturing the same.

In general, a liquid crystal display device forms an electric field by injecting a liquid crystal material between a thin film transistor substrate having a pixel electrode or the like and a common electrode substrate having a common electrode or the like and applying different potentials to the pixel electrode and the common electrode. By changing the arrangement of the liquid crystal molecules of the liquid crystal layer, thereby adjusting the light transmittance through the device to display an image.

Among them, the vertical alignment mode liquid crystal display in which the long axes of the liquid crystal molecules are arranged perpendicular to the upper and lower substrates without an electric field applied thereto, has gained much attention due to its large contrast ratio and easy implementation of a wide reference viewing angle.

Means for implementing a wide viewing angle in a vertical alignment mode liquid crystal display include a method of forming a cutout in the field generating electrode and a method of forming a protrusion on the field generating electrode. In this method, a pixel is divided into a plurality of domains using an incision or a protrusion, and then a fringe field is used to adjust the direction in which the liquid crystal molecules are inclined to widen the viewing angle.

When the pixel electrode is divided into a plurality of domains in order to obtain a wide viewing angle as described above, the liquid crystal molecules around the cutout or the protrusion are inclined at a high speed, but the liquid crystal molecules positioned far from the cutout or the protrusion are at a slow inclination. In order to improve this problem, a method of providing a slope to the liquid crystal molecules by additionally forming a pretilt film on the common electrode has been sought.

However, the pretilt film is composed of a photosensitive organic material, so that the negative functional groups remain in the pretilt film while the photosensitive organic material is irradiated with ultraviolet rays and cured in the step of forming the pretilt film. As the negative functional groups are accumulated in the pretilt film, the absolute value of the voltage applied to the liquid crystal layer varies as the polarities of the voltages applied between the pixel electrode, which is the field generating electrode, and the common electrode, are alternately changed. Since the voltage applied to the liquid crystal layer is not constant, a residual voltage is generated and it is recognized as an afterimage in the liquid crystal display.

An object of the present invention is to provide a liquid crystal display device which prevents afterimages and improves transmittance.

Another object of the present invention is to provide a method for manufacturing a liquid crystal display device which prevents afterimages and improves transmittance.

The technical problems of the present invention are not limited to the above-mentioned technical problems, and other technical problems not mentioned will be clearly understood by those skilled in the art from the following description.

A first substrate including a pixel electrode formed on a liquid crystal display lower insulating substrate and a color filter formed on the pixel electrode according to an embodiment of the present invention, an upper insulating substrate facing the lower insulating substrate A second substrate including a sloping line dividing the pixel into two or more, and including a pretilt film having an inclined structure that becomes thinner toward both sides or one side with respect to the ridge line; and the first substrate and the second substrate. It includes a liquid crystal layer interposed between the substrate.

According to another aspect of the present invention, there is provided a method of manufacturing a liquid crystal display device, the method including forming a pixel electrode on a lower insulating substrate, coating a photosensitive resin on the pixel electrode, and forming the photosensitive resin. Patterning water to form a color filter, applying a photosensitive organic material onto the upper insulating substrate facing the lower insulating substrate, patterning the photosensitive organic material to divide the pixel into two or more, And forming a pretilt film having an inclined structure in which the thickness becomes thinner as the distance between the ridgeline and the both sides becomes, and forming a liquid crystal layer between the upper insulating substrate and the lower insulating substrate.

Specific details of other embodiments are included in the detailed description and the drawings.

Advantages and features of the present invention and methods for achieving them will be apparent with reference to the embodiments described below in detail with the accompanying drawings.

The spatially relative terms " below ", " beneath ", " lower ", " above ", " upper " It may be used to easily describe the correlation of a device or components with other devices or components. Spatially relative terms are to be understood as including terms in different directions of the device in use or operation in addition to the directions shown in the figures. For example, when flipping a device shown in the figure, a device described as "below" or "beneath" of another device may be placed "above" of another device. Thus, the exemplary term "below" can encompass both an orientation of above and below. The device can also be oriented in other directions, so that spatially relative terms can be interpreted according to orientation.

However, the present invention is not limited to the embodiments disclosed below, but may be implemented in various forms, and only the present embodiments make the disclosure of the present invention complete, and those skilled in the art to which the present invention pertains. It is provided to fully inform the person having the scope of the invention, which is defined only by the scope of the claims. Like reference numerals refer to like elements throughout.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to a preferred embodiment of the present invention will be described in detail with reference to the accompanying drawings. The liquid crystal display according to the exemplary embodiment of the present invention includes a first substrate, a second substrate facing the substrate, and a liquid crystal layer formed therebetween.

First, a first substrate will be described in detail with reference to FIGS. 1, 3A, and 3B.

FIG. 1 is a layout view of a first substrate for a liquid crystal display according to an exemplary embodiment. FIG. 3A is a layout view of a liquid crystal display according to an exemplary embodiment. FIG. 3B is IIIb-IIIb ′ of FIG. 3A. Sectional view cut along the line.

A plurality of gate wirings for transmitting a gate signal are formed on the lower insulating substrate 10 made of transparent glass or the like. The gate wires 22, 24, 26, 27, and 28 are connected to the ends of the gate line 22 and the gate line 22 extending in the horizontal direction, and receive gate signals from the outside and transfer them to the gate line. 24, a gate electrode 26 of the thin film transistor that is connected to the gate line 22 and is extended, a storage electrode line 27 and a storage electrode 28 formed in parallel with the gate line 22. The storage electrodes 28a, 28b, 28c, and 28d are connected to the storage electrode lines 27 extending parallel to the gate lines 22 at the edges of the pixel region. The storage electrodes 28a, 28b, 28c, and 28d overlap the vertical portions 28a and 28b connected to the storage electrode lines 27 and the cutouts 82 and 81 of the pixel electrode 80, respectively. And diagonal lines 28c and 28d connecting 28a and 28b. The shape and arrangement of the sustain electrode line 27 and the sustain electrode 28 may be modified in various forms, and may be omitted as necessary.

The gate wirings 22, 24, 26, 27, 28 are, for example, aluminum (Al), copper (Cu), silver (Ag), molybdenum (Mo), chromium (Cr), titanium (Ti), tantalum (Ta) or Or an alloy thereof. In addition, the gate wirings 22, 24, 26, 27, and 28 may have a multi-layer structure including two conductive films (not shown) having different physical properties. One of the conductive films may be formed of a low resistivity metal such as aluminum (or an alloy thereof) or silver (or a metal) so as to reduce signal delay or voltage drop of the gate wirings 22, 24, 26, 27, and 28. The alloy), copper (or the alloy), and the like. The other conductive film may be made of a material having excellent contact properties with one conductive film, such as molybdenum, chromium, titanium, tantalum or an alloy thereof. However, the present invention is not limited thereto, and the gate wirings 22, 24, 26, 27, and 28 may be made of various metals and conductors. In addition, the present invention is not limited to a double layer structure, and may have a multilayer structure of triple layer or more.

A gate insulating film 30 made of silicon nitride (SiNx) or the like is formed on the gate wirings 22, 24, 26, 27, and 28.

On the gate insulating film 30, a semiconductor layer 40 made of a semiconductor such as hydrogenated amorphous silicon is formed. The semiconductor layer 40 may have various shapes. For example, the semiconductor layer 40 may be formed in an island shape on the gate electrode 26 as in the present exemplary embodiment, and may be positioned below the data line 62 to form the gate electrode. (26) It may be formed linearly extending to the top.

The upper part of the semiconductor layer 40 is made of a material such as n + hydrogenated amorphous silicon doped with silicide or n-type impurities at a high concentration, and the upper source electrode 65 and the drain electrode 66 and the lower semiconductor layer 40 are formed. Resistive contact layers 55 and 56 are formed to lower the contact resistance. The ohmic contacts 55 and 56 of the present exemplary embodiment are island type ohmic contacts and are disposed under the drain electrode 66 and the source electrode 65.

The data lines 62, 65, 66, and 68 are formed on the ohmic contacts 55 and 56 and the gate insulating layer 30. The data lines 62, 65, 66, and 68 are formed in the vertical direction and branch to the data line 62 and the data line 62 crossing the gate line 22 and extend to the upper portion of the ohmic contact layer 55. Connected to one end of the source electrode 65, the data line 62, and separated from the data end 68 and the source electrode 65 to which an image signal from the outside is applied, and a channel of the gate electrode 26 or the thin film transistor. And a drain electrode 66 formed over the ohmic contact layer 56 opposite the source electrode 65.

The data wires 62, 65, 66, and 68 may be formed of, for example, aluminum (Al), copper (Cu), silver (Ag), molybdenum (Mo), chromium (Cr), titanium (Ti), tantalum (Ta), or a combination thereof. Alloy and the like. The data lines 62, 65, 66, and 68 may have a double layer or triple layer structure including two conductive layers (not shown) having different physical properties. However, the present invention is not limited thereto, and the data lines 62, 65, 66, and 68 may have a multilayer structure composed of various metals and conductors.

The source electrode 65 overlaps at least a portion of the semiconductor layer 40, and the drain electrode 66 faces the source electrode 65 around the gate electrode 26 and at least partially overlaps the semiconductor layer 40. do.

On the data lines 62, 65, 66, 68 and the upper part of the semiconductor layer 40 which is not covered by these, organic materials having excellent planarization characteristics and photosensitivity, a-Si: C: O, a-Si: O: F, and the like A protective film 70 made of a low dielectric constant insulating material, silicon nitride, or the like is formed. In the passivation layer 70, contact holes 76 and 78 are formed to expose the drain electrode 66 and the data line end 68, respectively, and the gate line end 24 is formed in the passivation layer 70 and the gate insulating layer 30. Exposed contact holes 74 are formed.

On the passivation layer 70, the contact electrode 76 is electrically connected to the drain electrode 66, and the pixel electrode 80 positioned for each pixel and the storage electrode 28a vertically neighboring through the contact holes 71 and 72. And a connection member 85 connecting the storage electrode line 27 to the storage electrode line 27, and the auxiliary gate end 84 connected to the gate end 24 and the data end 68 through the contact holes 74 and 78, respectively. And ancillary data end 88 is formed.

Cutouts 81a, 81b, and 81c are formed in the pixel electrode 80 to distort an electric field to control a direction of movement of the liquid crystal molecules 5. The cutouts 81a, 81b, and 81c are recessed in the left direction at positions halfway up and down the pixel electrode 80, and the horizontal cutouts 81b and the horizontal cutouts 81b in which the entrances are symmetrically extended. Diagonal cutouts 81a and 81c formed in diagonal directions, respectively, on the upper and lower portions of the pixel electrode 80 divided by half. The diagonal cuts 81a and 81c are formed perpendicular to each other to evenly distribute the fringe fields in four directions. The cutouts 81a, 81b, 81c of the pixel electrode 80 function as domain regulating means for splitting and aligning the liquid crystal molecules 5 together with the cutout of the upper common electrode.

The pixel electrode 80, the connection member 85, the auxiliary gates, and the data ends 86 and 88 may be made of a transparent conductive material such as ITO, or an excellent reflectivity such as aluminum (or an alloy thereof) or silver (or an alloy thereof). It is made of an opaque conductor.

The color filter 90 is formed on the pixel electrode 80 and the passivation layer 70. The color filter 90 may be alternately composed of red, green, and blue colors for each pixel, and selectively transmits only light having a predetermined wavelength. In addition, the color filter 90 generates a negative functional group generated during the formation of the color filter 90 to be described later, and due to the negative functional group, the negative functional group remaining in the pretilt film 240 causes the liquid crystal layer ( The voltage overcharged in 3) is canceled. Hereinafter, the color filter 90 will be described in detail.

An alignment layer 12 may be coated on the color filter 90 to align the liquid crystal layer.

Hereinafter, a second substrate of the liquid crystal display according to the exemplary embodiment of the present invention will be described with reference to FIGS. 2A to 3B.

2A is a layout view of a second substrate for a liquid crystal display according to an exemplary embodiment. FIG. 2B is a cross-sectional view taken along the line IIb-IIb ′ of FIG. 2A.

A black matrix 220 is formed on a lower surface of the upper insulating substrate 210 made of a transparent insulating material such as glass to prevent light leakage. The black matrix 220 improves image quality by preventing light leakage.

Under the black matrix 220, a common electrode 230 made of ITO, IZO, or the like is formed.

A pretilt film 260 is formed under the common electrode 230 to have an inclined surface in a tapered structure and includes an organic material. As shown in FIG. 2B, the pretilt film 240 is an inclined structure gradually thinning toward one side or both sides of the ridge line 242. The pretilt layer 240 faces the common electrode 230 from the ridge line 242. Adjacent to the cutouts 81a, 81b, 81c of 80, the thickness is gradually thinner. The pretilt film 240 may take various forms in order to improve display characteristics at both ends of the ridge line 242. Although the common electrode 230 does not have an incision, the incisions 81a, 81b, and 81c of the pixel electrode 80 and the liquid crystal molecules 310 are divided into a plurality of domains using the ridge line 242 of the pretilt film 240. can do. In the embodiment of the present invention, the common electrode does not include the cutout, but the cutout may be formed in the common electrode corresponding to the ridge line of the pretilt film.

The pretilt film 240 includes a negative functional group in the formation process described later. This is because when a voltage having an alternating polarity is applied between the pixel electrode 80 and the common electrode 230, such negative functional groups are accumulated in the pretilt film 240 so that the voltage applied to the liquid crystal layer 3 is a predetermined voltage. More is applied to generate a residual voltage. Here, the color filter 90 includes a PAC (Photo Activated Compound), a base polymer, and the like, wherein the polymer is produced through exposure, development, and curing in the process steps of the color filter 90 described later. In the production process, a large number of negative functional groups exist. At this time, the functional groups generated by the color filter 90 by forming the color filter 90 on the pixel electrode 80 may be applied to the liquid crystal even if a voltage having an alternating polarity is applied between the pixel electrode 80 and the common electrode 230. Each of the negative functional groups occurring on and under the layer 3 is canceled by the polarization polarized on the liquid crystal molecules 310. That is, the effect on the liquid crystal layer 3 due to the negative functional groups remaining in the pretilt film 240 can be reduced by the functional groups generated in the color filter 90. Therefore, even though the polarities of the voltages applied between the pixel electrode 80 and the common electrode 230 alternately change, residual voltages generated by charging a voltage larger than the voltage charged in the liquid crystal layer 3 do not occur. Therefore, no afterimage occurs.

An alignment layer 212 may be coated under the pretilt layer 240 to align the liquid crystal layer.

Liquid crystal molecules 310 are interposed between the first substrate 1 and the second substrate 1 to form the liquid crystal layer 3. The liquid crystal molecules 310 are aligned perpendicular to the pretilt film 240 and the color filter 90 having the alignment characteristic. In this case, when an electric field is formed between the pixel electrode 80 and the common electrode 230, the ridge lines 242 of the pretilt film 240 and the cutouts 81a, 81b, and 81c of the pixel electrode 80 form an electric field. By distorting, the direction of behavior of the liquid crystal molecules 310 is controlled. The region where the liquid crystal molecules 310 behave in the same direction by the electric field is called a domain, and the ridge lines 242 of the pretilt film 240 and the cutouts 81a, 81b, and 81c of the pixel electrode 80 are divided into domains. Means. Here, the liquid crystal molecules 310 have a pretilt angle in a direction in which the domain is divided due to the change of the equipotential line due to the cell gap difference caused by the alignment force inclined by the pretilt film 240 and the difference in the thickness of the pretilt film 240. I will lie down. Therefore, when an electric field is formed between the pixel electrode 80 and the common electrode 230, the lying direction of the liquid crystal molecules 310, which is not adjacent to the ridge line 242 of the pretilt film 240, is determined. The 310 are driven fast, resulting in a faster response.

The liquid crystal display is formed by disposing elements such as a polarizing plate, a backlight, and a compensation plate on the basic structures of the first substrate 1, the second substrate 2, and the liquid crystal layer 3.

Hereinafter, a liquid crystal display according to another exemplary embodiment of the present invention will be described with reference to FIGS. 4 to 5B.

FIG. 4 is a layout view of a first substrate for a liquid crystal display according to another exemplary embodiment. FIG. 5A is a layout view of a liquid crystal display according to an exemplary embodiment. FIG. 5B is Vb-Vb ′ of FIG. 5A. Sectional view cut along the line.

For convenience of description, members having the same functions as the members shown in the drawings of the embodiments described with reference to FIGS. 1 to 3B are denoted by the same reference numerals, and thus description thereof is omitted. 4 to 5B, the liquid crystal display of the present embodiment has the same structure as the liquid crystal display according to the exemplary embodiment of the present invention except for the following.

The color filter 92 has ridges at the cutouts 81a, 81b, and 81c of the pixel electrode 80, and gradually decreases in thickness in both or one directions with respect to the cutouts 81a, 81b, and 81c. Have As illustrated in FIG. 5B, the ridge lines of the color filter 92 are formed to correspond to the cutouts 81a, 81b, and 81c, and are alternately formed with the ridge lines 242 of the pretilt film 240 in the pixel.

In this case, the liquid crystal molecules 310 are inclined alignment force and pretilt film induced by the pretilt film 240 of the second substrate 2 and the pretilted color filter 92 of the first substrate 1 as described above. Due to the difference in the equipotential lines due to the cell gap difference caused by the difference in the thickness of the color filter 90 and the color filter 90, the pretilt angles lie in the direction in which the domain is divided, and the common electrode 230 and the lower pixel electrode 80 are disposed. When a voltage is applied, the lying direction of the liquid crystal molecules 310 that are not adjacent to the cutouts 81a, 81b, and 81c is determined. In this embodiment, unlike the other embodiment of the present invention, the color filter 90 of the first substrate 1 also has a pretilted structure, so that the liquid crystal molecules adjacent to the pretilt film 240 of the second substrate 2 are formed. The alignment force for pretilting not only the 310 but also the liquid crystal molecules 310 adjacent to the color filter 90 of the first substrate 1 is strong, so that the liquid crystal molecules between the first substrate 1 and the second substrate 2 are strong. The 310 have a pretilt angle as a whole. Therefore, the liquid crystal molecules 310 are driven faster, and the response speed is even faster.

Hereinafter, a method of manufacturing a liquid crystal display according to an exemplary embodiment of the present invention will be described with reference to FIGS. 6 to 10B.

First, referring to FIGS. 6 to 8B, a method of manufacturing a first substrate in one embodiment of the present invention will be described.

As shown in FIG. 6, first, aluminum (Al), copper (Cu), silver (Ag), molybdenum (Mo), chromium (Cr), or the like may be sputtered onto the lower insulating substrate 10. At least one of titanium (Ti), tantalum (Ta), or an alloy thereof is stacked and then patterned to form gate wirings 22, 24, and 26 including the gate electrode 26.

Subsequently, silicon nitride or the like is deposited on the entire surface of the substrate by, for example, chemical vapor deposition to form the gate insulating film 30.

Subsequently, intrinsic amorphous silicon and doped amorphous silicon are continuously deposited using, for example, chemical vapor deposition, and the intrinsic amorphous silicon layer and the doped amorphous silicon layer are photo-etched on the gate insulating layer 30 on the gate electrode 26. An island-like semiconductor layer 40 and a doped amorphous silicon layer are formed.

Subsequently, aluminum (Al) such as sputtering, copper (Cu), silver (Ag), molybdenum (Mo), and chrome (on the gate insulating film 30, the exposed semiconductor layer 40, and the ohmic contacts 55 and 56). At least one of Cr), titanium (Ti), tantalum (Ta), or an alloy thereof is stacked and patterned to include a source electrode 65 and a drain electrode 66 spaced apart from each other about the gate electrode 26. The data wirings 62, 65, 66, and 68 are formed.

Next, the doped amorphous silicon layer not covered by the data lines 62, 65, 66, and 68 is etched to form the ohmic contacts 55 and 56 spaced apart from each other about the gate electrode 26. The semiconductor layer 40 is exposed.

This completes a thin film transistor and the like.

Subsequently, as shown in FIG. 7, the passivation layer 70 is formed on the substrate, and the ITO or IZO or the like is stacked and patterned on the passivation layer 70 to include the cutouts 81a, 81b, and 81c. Form 80. The passivation layer 70 may include a low dielectric constant insulation such as a-Si: C: O, a-Si: O: F, or the like formed of inorganic or plasma enhanced chemical vapor deposition (PECVD) made of silicon nitride or silicon oxide. Material and the like.

Subsequently, as shown in FIGS. 8A and 8B, the red photosensitive resin material 94 of the pigment type is patterned to form a red color filter 90. In detail, as shown in FIG. 8A, after applying the pigment-type red photosensitive resin 94 using a spin coating method or the like, the mask 400 including the transmissive part 410 and the light blocking part 420 is provided. To be exposed. Subsequently, as shown in FIG. 8B, the photosensitive resin material 94 of the unexposed portion is removed by developing using a water-soluble alkaline developer or the like to form a red color filter 90.

Here, the pigment-type photosensitive resin 94 contains a pigment, a binder, a monomer, a photoinitiator, etc. The pigment type photosensitive resin 94 is exposed to generate radicals in the photopolymerization initiator to promote the chain polymerization reaction of monomo to the base polymer. The base polymer contains a plurality of negative polar functional groups through development and curing processes. As described above, the functional group cancels the residual voltage due to the negative functional group of the pretilt film 240. In addition, since the color filter 90 is formed on the lower insulating substrate 10, alignment defects do not occur when the first substrate 1 and the second substrate 2 are aligned, and thus, Improve transmittance.

Subsequently, although not shown in the drawing, a green photosensitive resin is coated on the entire surface of the lower insulating substrate 10, and exposed and developed to form a green color filter. The blue color filter also proceeds in such a process.

In the exemplary embodiment of the present invention, a color filter is formed using a negative photosensitive resin, but the color filter may be formed using a positive photosensitive resin. In this case, the transparent part and the light blocking part of the mask may be formed. The photosensitive resin material of an exposed part is formed by the color filter by changing the position of. Moreover, although red, green, and blue order was illustrated as a formation order of a color filter, it can form in another order.

Hereinafter, a method of manufacturing a second substrate in one embodiment of the present invention will be described with reference to FIGS. 9 to 10B.

As illustrated in FIG. 9, an opaque material such as chromium is deposited and patterned on the upper insulating substrate 210 to form a black matrix 220. Subsequently, ITO, IZO, or the like is sequentially stacked to form a common electrode 230.

Next, as shown in FIGS. 10A and 10B, the photosensitive organic material 242 is coated and a pretilt film 240 is formed using a mask. In detail, as illustrated in FIG. 10A, the photosensitive organic material 242 is deposited on the common electrode 230 to the front, and the mask 400 having a slit pattern is disposed on the photosensitive organic material 242. . Here, the slit pattern of the mask 400 includes the light blocking portion 410 having a dense portion and a small portion, and has a pattern that gradually decreases from the dense portion to the small portion. At this time, the dense area of the light blocking part 410 of the mask 400 is aligned to correspond to the ridge line 242 of the pretilt film 240. Next, it exposes using the mask 400.

As shown in FIG. 10B, the exposed photosensitive organic material 242 is developed using a water-soluble alkaline developer. Then, the remaining amount of the region corresponding to the slit pattern is changed depending on the density of the light blocking portion 420. That is, the light blocking part 420 is exposed to a relatively small amount of light corresponding to the dense area, so that a relatively large amount of the photosensitive organic material 242 remains, and the area corresponding to the small area is relatively small. Photosensitive organic material 242 remains. Accordingly, the portion where the photosensitive organic material 242 remains most forms the ridge line 242 to form a pretilt film 240 having an inclined structure that gradually becomes thinner on both sides of the ridge line 242.

In the exemplary embodiment of the present invention, the common electrode does not include the cutout, but the cutout may be formed on the common electrode to correspond to the ridge line of the pretilt film.

Subsequently, as illustrated in FIG. 3B, alignment layers 12 and 212 are formed on the color filter 90 of the lower insulating substrate 10 and the pretilt film 240 of the upper insulating substrate 210, and the first substrate. The liquid crystal layer 3 is formed by aligning (1) and the second substrate 2, bonding them using a seal material, and then injecting liquid crystal molecules 310. The liquid crystal display according to another exemplary embodiment of the present invention is formed by disposing elements such as a polarizing plate, a backlight, and a compensation plate on the basic structure of the liquid crystal display device thus formed.

A method of manufacturing a liquid crystal display according to another exemplary embodiment of the present invention will be described with reference to FIGS. 11A and 11B. Except for the manufacturing process of the color filter in the manufacturing method in one embodiment of the present invention is basically the same as the embodiment of the present invention.

As shown in FIG. 11A, a red photosensitive resin 94 is entirely coated on the pixel electrode 80. Next, a mask 400 having a slit pattern for forming the pretilted color filter 90 on the red photosensitive resin 94 is disposed. Here, the mask 400 of the slit pattern may use the mask described with reference to FIG. 8A. In this case, the regions where the light blocking portion 420 of the mask 400 is small correspond to the cutouts 81a, 81b, and 81c of the pixel electrode 80. Next, it exposes using the mask 400.

Subsequently, as shown in FIG. 11B, the exposed red photosensitive resin 94 is developed using an aqueous aqueous alkali solution. Unlike in FIG. 8B, the light blocking part 420 is exposed to a relatively small amount of light corresponding to a dense area, so that a relatively large amount of red photosensitive resin 94 remains, and the area corresponding to a small area. The relatively large amount of red photosensitive resin 94 remains. Therefore, the portion where the red photosensitive resin 94 most remains forms a ridgeline to form an inclined red color filter 92 that gradually becomes thinner on both sides or one side of the ridgeline. In this case, the ridge lines are alternately formed with the ridge lines 242 of the pretilt film 240 in the pixel. Although not shown in the figure, green and blue color filters also proceed in this process.

Even when the color filter 92 is formed according to another embodiment of the present invention, the photosensitive resin material 94 generates negative functional groups due to exposure, development, and curing.

As described above, the steps of manufacturing the first substrate and the second substrate and forming the liquid crystal layer therebetween as a manufacturing method of the liquid crystal display according to the exemplary embodiments of the present invention are described in sequence, but the present invention is not limited to this order. The second substrate may be manufactured first or simultaneously with the first substrate. In the case of the liquid crystal layer, the first substrate or the second substrate may be prepared first, and then the liquid crystal layer may be formed, and then, another substrate may be provided in the order of bonding. This is obvious to those skilled in the art and does not depart from the scope of the present invention.

Although embodiments of the present invention have been described above with reference to the accompanying drawings, those skilled in the art to which the present invention pertains may implement the present invention in other specific forms without changing the technical spirit or essential features thereof. I can understand that. Therefore, it should be understood that the embodiments described above are exemplary in all respects and not restrictive.

According to the liquid crystal display of the present invention and a method of manufacturing the same as described above has one or more effects.

By forming a color filter made of an organic material on the pixel electrode, the polarity is alternately changed between the pixel electrode and the common electrode due to the negative functionalities generated in the pretilt film made of the organic material under the common electrode, so that a positive voltage is applied. The afterimage can be prevented by canceling the negative polarities between the electrodes.

By forming the color filter on the pixel electrode, the misalignment may be reduced, the transmittance may be increased, and the transmittance may be increased when the substrates are bonded to each other in the manufacturing step than when the color filters are formed on the second substrate.

Claims (12)

A first substrate including a pixel electrode formed on the lower insulating substrate and a color filter formed on the pixel electrode; A second slit including a ridge line for dividing the pixel into two or more on the upper insulating substrate facing the lower insulating substrate, and including a pretilt film having an inclined structure in which a thickness becomes thinner toward both sides or one side with respect to the ridge line; Board; And And a liquid crystal layer interposed between the first substrate and the second substrate. According to claim 1, The pixel electrode includes a cutout that is a domain dividing means. The method of claim 2, And the cutout portion is formed between the ridge lines of the pretilt film that faces the pixel electrode. The method of claim 2, And the color filter is inclined to become thinner toward both sides or one side of the cutout. According to claim 1, The pretilt film is a liquid crystal display device made of an organic material. Forming a pixel electrode on the lower insulating substrate; Coating a photosensitive resin material on the pixel electrode and patterning the photosensitive resin material to form a color filter; Applying a photosensitive organic material on the upper insulating substrate facing the lower insulating substrate; Forming a pretilt film having an inclined structure including a ridge line for dividing the pixel into two or more by patterning the photosensitive organic material, the thickness of which becomes thinner as the distance from each side or one side of the ridge line is increased; And Forming a liquid crystal layer between the upper insulating substrate and the lower insulating substrate. The method of claim 6, The pixel electrode includes a cutout that is a domain dividing means. The method of claim 7, wherein And the cutout is formed between the ridge lines of the pretilt film facing the pixel electrode. The method of claim 7, wherein And the color filter is inclined to become thinner toward both sides or one side of the cutout. The method of claim 9, The forming of the color filter may include exposing and developing using a mask including a slit pattern. The method of claim 6, The said photosensitive resin material is a manufacturing method of the liquid crystal display device containing the photosensitive resin material of a pigment type. The method of claim 6, The forming of the pretilt film comprises exposing and developing using a mask including a slit pattern.

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