KR20060090816A - Electrolyte for the galvanic deposition of aluminum-magnesium alloys - Google Patents
Electrolyte for the galvanic deposition of aluminum-magnesium alloys Download PDFInfo
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- KR20060090816A KR20060090816A KR1020067005934A KR20067005934A KR20060090816A KR 20060090816 A KR20060090816 A KR 20060090816A KR 1020067005934 A KR1020067005934 A KR 1020067005934A KR 20067005934 A KR20067005934 A KR 20067005934A KR 20060090816 A KR20060090816 A KR 20060090816A
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- electrolyte
- magnesium
- aluminum
- alkyl group
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- 239000003792 electrolyte Substances 0.000 title claims abstract description 62
- SNAAJJQQZSMGQD-UHFFFAOYSA-N aluminum magnesium Chemical group [Mg].[Al] SNAAJJQQZSMGQD-UHFFFAOYSA-N 0.000 title claims abstract description 31
- 230000008021 deposition Effects 0.000 title claims abstract description 23
- 229910000861 Mg alloy Inorganic materials 0.000 title claims abstract description 17
- 239000011777 magnesium Substances 0.000 claims abstract description 32
- 229910052749 magnesium Inorganic materials 0.000 claims abstract description 26
- 150000001875 compounds Chemical class 0.000 claims abstract description 25
- 238000000576 coating method Methods 0.000 claims abstract description 22
- 239000000203 mixture Substances 0.000 claims abstract description 17
- 229910052700 potassium Inorganic materials 0.000 claims abstract description 10
- 229910052708 sodium Inorganic materials 0.000 claims abstract description 10
- 229910052792 caesium Inorganic materials 0.000 claims abstract description 9
- 229910052701 rubidium Inorganic materials 0.000 claims abstract description 9
- 238000005868 electrolysis reaction Methods 0.000 claims abstract description 8
- 238000004519 manufacturing process Methods 0.000 claims abstract description 8
- 125000000008 (C1-C10) alkyl group Chemical group 0.000 claims abstract description 7
- -1 magnesium alkyl compound Chemical class 0.000 claims abstract description 7
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 claims description 36
- 238000000034 method Methods 0.000 claims description 26
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 claims description 22
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 claims description 21
- 239000011248 coating agent Substances 0.000 claims description 15
- 229910052782 aluminium Inorganic materials 0.000 claims description 14
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical group [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 13
- 239000011734 sodium Substances 0.000 claims description 13
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 claims description 10
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical group C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 9
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical group [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 claims description 9
- 239000011591 potassium Chemical group 0.000 claims description 9
- TVFDJXOCXUVLDH-UHFFFAOYSA-N caesium atom Chemical group [Cs] TVFDJXOCXUVLDH-UHFFFAOYSA-N 0.000 claims description 8
- IGLNJRXAVVLDKE-UHFFFAOYSA-N rubidium atom Chemical group [Rb] IGLNJRXAVVLDKE-UHFFFAOYSA-N 0.000 claims description 8
- 239000004020 conductor Substances 0.000 claims description 7
- 125000004178 (C1-C4) alkyl group Chemical group 0.000 claims description 6
- QWTDNUCVQCZILF-UHFFFAOYSA-N iso-pentane Natural products CCC(C)C QWTDNUCVQCZILF-UHFFFAOYSA-N 0.000 claims description 6
- 239000003960 organic solvent Substances 0.000 claims description 6
- 125000000217 alkyl group Chemical group 0.000 claims description 5
- 229930195733 hydrocarbon Natural products 0.000 claims description 5
- 150000002430 hydrocarbons Chemical class 0.000 claims description 5
- 150000002681 magnesium compounds Chemical class 0.000 claims description 5
- UHOVQNZJYSORNB-UHFFFAOYSA-N monobenzene Natural products C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 claims description 5
- 125000003837 (C1-C20) alkyl group Chemical group 0.000 claims description 4
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 claims description 4
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 claims description 4
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 4
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 claims description 4
- 239000008096 xylene Substances 0.000 claims description 4
- 239000004215 Carbon black (E152) Substances 0.000 claims description 3
- 239000003849 aromatic solvent Substances 0.000 claims description 3
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 3
- 125000005234 alkyl aluminium group Chemical group 0.000 claims description 2
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 claims description 2
- 239000003513 alkali Substances 0.000 claims 2
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- 229920006395 saturated elastomer Polymers 0.000 claims 1
- 229930195734 saturated hydrocarbon Natural products 0.000 claims 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 19
- 239000000243 solution Substances 0.000 description 9
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 8
- 238000011065 in-situ storage Methods 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 125000002734 organomagnesium group Chemical group 0.000 description 5
- 229910052786 argon Inorganic materials 0.000 description 4
- 230000003750 conditioning effect Effects 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 238000007689 inspection Methods 0.000 description 3
- 150000002901 organomagnesium compounds Chemical class 0.000 description 3
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 2
- AFABGHUZZDYHJO-UHFFFAOYSA-N dimethyl butane Natural products CCCC(C)C AFABGHUZZDYHJO-UHFFFAOYSA-N 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- QVGLDPPIMKSVBG-UHFFFAOYSA-N 2-methylbutane Chemical compound CCC(C)C.CCC(C)C QVGLDPPIMKSVBG-UHFFFAOYSA-N 0.000 description 1
- 229910000838 Al alloy Inorganic materials 0.000 description 1
- PWJAKLDKEZIGFV-UHFFFAOYSA-N CCC(C)[Mg] Chemical compound CCC(C)[Mg] PWJAKLDKEZIGFV-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- AZDRQVAHHNSJOQ-UHFFFAOYSA-N alumane Chemical class [AlH3] AZDRQVAHHNSJOQ-UHFFFAOYSA-N 0.000 description 1
- 239000010405 anode material Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- RYZCLUQMCYZBJQ-UHFFFAOYSA-H lead(2+);dicarbonate;dihydroxide Chemical compound [OH-].[OH-].[Pb+2].[Pb+2].[Pb+2].[O-]C([O-])=O.[O-]C([O-])=O RYZCLUQMCYZBJQ-UHFFFAOYSA-H 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 239000005486 organic electrolyte Substances 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/56—Electroplating: Baths therefor from solutions of alloys
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/42—Electroplating: Baths therefor from solutions of light metals
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
Abstract
Description
본 발명은 적어도 하나의 유기알루미늄 착화합물과 알킬마그네슘 화합물을 포함하는, 알루미늄-마그네슘 합금의 갈바닉 증착을 위한 전해질에 관한 것이다. 또한, 본 발명은 상기 전해질의 제조방법, 코팅방법, 전해질의 용도 및 전기분해 키트에 관한 것이다.The present invention relates to an electrolyte for galvanic deposition of an aluminum-magnesium alloy, comprising at least one organoaluminum complex and an alkylmagnesium compound. The present invention also relates to a method for preparing the electrolyte, a coating method, the use of the electrolyte and an electrolysis kit.
최근에 마그네슘-알루미늄-유기 착화합물은 알루미늄-마그네슘 합금의 전해 증착에 사용되어 왔으며, 이는 WO 00/32847 A1에 개시되어 있다. 알루미늄-마그네슘 층에 의한 탁월한 부식방지 및 그의 생태학적 안전성으로 인하여, 알루미늄-마그네슘 합금으로 금속 소재들을 전해 코팅하는 것에 대한 관심이 급격히 높아지고 있다. 이에 따라, 폐쇄계(closed system)에서 60 내지 150℃의 온도범위에서 마그네슘-알루미늄-유기 전해질을 이용한 전기도금법이 주요한 기술적 중요성을 가지게 되었다. Recently, magnesium-aluminum-organic complexes have been used for the electrolytic deposition of aluminum-magnesium alloys, which are disclosed in WO 00/32847 A1. Due to the excellent corrosion protection by the aluminum-magnesium layer and its ecological safety, interest in the electrolytic coating of metallic materials with aluminum-magnesium alloys is rapidly increasing. Accordingly, the electroplating method using magnesium-aluminum-organic electrolyte in the temperature range of 60 to 150 ℃ in a closed system has a major technical significance.
WO 00/32847 A1에서는 특히 적합한 전해질로서, 일반식 MAlR4로 나타내어지는 착화합물 및 알루미늄 알킬 AlR3와 조합된 그의 혼합물을 제시하고 있다. 이들은 액체 방향족 탄화수소에 용해된 용액 형태로 사용된다. 이때, M은 나트륨, 칼륨, 루비듐 및 세슘과 같은 알칼리 금속을, R은 1개, 2개 또는 4개 탄소를 가지는 알킬기를 각각 나타낸다. WO 00/32847 A1 discloses particularly suitable electrolytes, complexes represented by the general formula MAlR 4 and mixtures thereof in combination with aluminum alkyl AlR 3 . They are used in the form of solutions dissolved in liquid aromatic hydrocarbons. In this case, M represents an alkali metal such as sodium, potassium, rubidium and cesium, and R represents an alkyl group having 1, 2 or 4 carbons, respectively.
그러나, 이러한 전해 시스템을 사용할 경우에는 중대한 단점이 있다. 현재까지 알려진 시스템은 최초에 필요로 하는 유기마그네슘 착화합물이 전해질에 존재하지 않고, 전해질을 사용하는 시점에서 그의 복합적인 인 시츄(in situ) 전기화학적 생산공정이 요구된다. 그러므로, 즉시 사용가능한 출발 혼합물(starting mixture)들은 마그네슘 화합물을 포함하지 않고, 유기 알루미늄 화합물만을 포함한다. 예를 들면, 이러한 출발 혼합물들의 M2AlR4에 대한 M1AlR4의 몰비는 1:0.1 내지 0.1:1인 일반적 조성을 가진다: 상기 식에서, M1과 M2는 서로 다르며, 나트륨, 칼륨, 루비듐 및 세슘이고, 바람직하게는 나트륨 및 칼륨을 나타낸다. AlR3/(M1AlR4 + M2AlR4)/방향족 탄화수소의 모든 구성성분의 몰비는 1:0.1:1 내지 1:2:10, 바람직하게는 1:1:3 내지 1:1:5의 범위 내에 있다. However, there are significant drawbacks when using such electrolytic systems. The systems known to date do not require the first necessary organic magnesium complex in the electrolyte, and at the time of using the electrolyte, its complex in situ electrochemical production process is required. Therefore, ready-to-use starting mixtures do not contain magnesium compounds, only organoaluminum compounds. For example, in M 2 AlR 4 of these starting mixtures For M 1 AlR 4 The molar ratio has a general composition of 1: 0.1 to 0.1: 1: wherein M 1 and M 2 are different from each other and are sodium, potassium, rubidium and cesium, preferably sodium and potassium. AlR 3 / (M 1 AlR 4 + The molar ratio of all components of the M 2 AlR 4 ) / aromatic hydrocarbon is in the range of 1: 0.1: 1 to 1: 2: 10, preferably 1: 1: 3 to 1: 1: 5.
이러한 전해질에서, 상술한 마그네슘이 없는 출발 전해질(starting electrolyte)은 처음에 코팅에 적합한 전해조에 놓여 진다. 그런 다음, 전해질에 서 코팅에 필요한 마그네슘 착화합물의 농도에 도달할 때까지, 별도의 알루미늄과 마그네슘 양극 또는 알루미늄-마그네슘 혼합 전극을 이용하여, 전류를 공급함으로써 필요로 하는 유기 마그네슘 화합물이 즉시(in situ) 전기화학적으로 생성된다. In such electrolytes, the starting electrolyte described above without magnesium is initially placed in an electrolytic bath suitable for coating. Then, using the separate aluminum and magnesium anodes or the aluminum-magnesium mixed electrode until the concentration of the magnesium complex required for coating in the electrolyte is reached, the required organic magnesium compound is immediately in situ. ) Is produced electrochemically.
게다가, 시스템에서 알루미늄-마그네슘 층의 증착은 마그네슘 착화합물이 필요한 농도에 도달하기 전에 이미 일어나는데, 이는 알루미늄과 마그네슘의 적절한 조성을 갖지 못하기 때문에 바람직하지 못하다. 이러한 이유로, 증착된 알루미늄-마그네슘 층을 모으기 위해, 가금속판(dummy metal sheet)이 시스템에 있어야만 한다. 가금속판 위에서의 증착은 알루미늄-마그네슘 착화합물이 필요 농도에 도달할 때까지 진행된다. 그런 다음, 가금속판을 제거하고, 원하는 알루미늄-마그네슘 조성(예를 들면 알루미늄:마그네슘 조성이 75:25 몰%)을 갖는 원하는 층이 기질 위에 증착된다. 가금속판은 버리거나, 다음에 사용하기 위해 세척한다. In addition, the deposition of the aluminum-magnesium layer in the system already occurs before the magnesium complex reaches the required concentration, which is undesirable because it does not have the proper composition of aluminum and magnesium. For this reason, in order to collect the deposited aluminum-magnesium layer, a dummy metal sheet must be present in the system. Deposition on the metal plate proceeds until the aluminum-magnesium complex reaches the required concentration. Then, the metal plate is removed and the desired layer having the desired aluminum-magnesium composition (eg, aluminum: magnesium composition 75:25 mol%) is deposited on the substrate. The metal plate is discarded or washed for later use.
상술한 바와 같이, 이 공정은 상당히 복잡하고, 원하는 알루미늄-마그네슘 농도에 도달하기까지 긴 준비시간을 요구한다는 것을 쉽게 알 수 있다. 게다가, 사용된 가금속판의 적재, 제거 및 세척공정이 추가적 공정으로 발생된다. 이러한 이유로, WO 00/32847 A1에서 기술된 특별하게 효과적인 것으로 알려진 전해액은, 상기 언급한 모든 단점을 포함하는 실제 코팅에 앞선 조정단계(conditioning phase)에서 유기마그네슘 착화합물의 전기화학적 생성을 통해서만 사용될 수 있다. As mentioned above, it can be readily seen that this process is quite complex and requires a long preparation time to reach the desired aluminum-magnesium concentration. In addition, the loading, removing and cleaning of the used metal sheet takes place as an additional process. For this reason, the electrolytes known to be particularly effective described in WO 00/32847 A1 can only be used through the electrochemical generation of organomagnesium complexes in the conditioning phase prior to the actual coating, including all the disadvantages mentioned above. .
게다가, 전해질에 상응하는 양의 마그네슘 화합물을 직접적으로 가하면 상기 언급한 조정단계를 생략할 수 있다는 사실은 선행기술 문헌인 WO 00/32847 A1에서 도 잘 알려져 있다. 여기에서, 마그네슘-알루미늄 알킬 착화합물인 Mg[Al(Et)4]2가 전해질에 사용되었다. 이 방법은 실험실 규모로 수행될 수 있지만, 상기 착화합물이 산업적 유용성이 없고, 그것의 제조공정이 상당히 복잡하며, 많은 비용이 소요되기 때문에, 산업용으로 수행될 수 없다는 결점이 있다. In addition, it is also well known in the prior art document WO 00/32847 A1 that the direct adjustment of the magnesium compound in the corresponding amount to the electrolyte can be omitted. Here, Mg [Al (Et) 4 ] 2 , a magnesium-aluminum alkyl complex, was used for the electrolyte. This method can be carried out on a laboratory scale, but has the drawback that it cannot be carried out industrially because the complex is not industrially useful, its manufacturing process is quite complicated and expensive.
경제적이고 효율적으로, 알루미늄-마그네슘 합금으로 기질을 코팅하는 산업적 생산에 적절한 전해질은 현재까지 알려지지 않았다. 알루미늄-마그네슘 합금의 갈바닉 증착을 위한 전해질의 추가적인 개발은 매우 중요한 기술적 가치를 가지며, 경제적 및 생태학적 면에서 매우 관심이 높아지고 있다.Economically and efficiently, electrolytes suitable for industrial production of coating substrates with aluminum-magnesium alloys are unknown to date. Further development of electrolytes for galvanic deposition of aluminum-magnesium alloys is of great technical value and is of great interest in terms of economics and ecology.
본 발명의 기술적 목적은 결국, 유기 마그네슘 착화합물을 형성하기 위한 전술한 조정단계(conditioning phase)가 필요하지 않고, 알루미늄-마그네슘 코팅공정의 상업적 도입을 가능하게 하는, 저비용의 단순하고 효율적으로 제조될 수 있는 전해질을 제공하는 것이다. The technical object of the present invention, after all, does not require the above-mentioned conditioning phase for forming the organo magnesium complex, and can be produced simply and efficiently at low cost, which enables commercial introduction of the aluminum-magnesium coating process. To provide an electrolyte.
상기 기술적 목적은 적어도 하나의 일반식 MAlR4로 나타내어지는 유기알루미늄 착화합물 또는 그의 혼합물 및 알킬마그네슘 화합물을 포함하는 알루미늄-마그네슘 합금의 갈바닉 증착을 위한 전해질에 의해서 이루어진다: 상기 식에서, M은 나트륨, 칼륨, 루비듐 또는 세슘을 나타내고; 및, R은 C1-C10 알킬기, 바람직하게는 C1-C4 알킬기를 나타낸다. 특히 보다 바람직하게는, 전해질은 트리알킬알루미늄을 추가로 포함한다. The technical object is achieved by an electrolyte for galvanic deposition of an aluminum-magnesium alloy comprising at least one organoaluminum complex represented by the general formula MAlR 4 or a mixture thereof and an alkylmagnesium compound, wherein M is sodium, potassium, Rubidium or cesium; And R represents a C 1 -C 10 alkyl group, preferably a C 1 -C 4 alkyl group. Especially more preferably, the electrolyte further comprises trialkylaluminum.
가장 바람직하게는, AlR3, M1AlR4, M2AlR4 및 Mg(R1)x(R2)y를 포함하는 전해질이 사용된다: 상기 식에서, M1과 M2는 서로 다르며, 나트륨, 칼륨, 루비듐 또는 세슘을 나타내고; R은 C1-C10 알킬기, 바람직하게는 C1-C4 알킬기를 나타내며; R1과 R2는 독립적으로 각각 C1-C20 알킬기, 바람직하게는 C2-C10 알킬기를 나타내고; x는 0 내지 2이며; y는 0 내지 2이고; 및, x + y는 2이다. Most preferably, AlR 3 , M 1 AlR 4 , M 2 AlR 4 And an electrolyte comprising Mg (R 1 ) x (R 2 ) y wherein M 1 and M 2 are different from each other and represent sodium, potassium, rubidium or cesium; R represents a C 1 -C 10 alkyl group, preferably a C 1 -C 4 alkyl group; R 1 and R 2 are each independently C 1 -C 20 Alkyl groups, preferably C 2 -C 10 An alkyl group; x is 0 to 2; y is 0 to 2; And x + y is two.
놀랍게도, 본 발명의 전해질은 실제 코팅공정에 선행하는 시간과 비용이 많이 소요되는 조정단계에서, 유기마그네슘 착화합물의 인 시츄(in situ) 제조를 필요로 하지 않고, 알루미늄-마그네슘 합금으로 재료들을 코팅하는데 이용될 수 있다. Surprisingly, the electrolyte of the present invention does not require in situ production of organomagnesium complexes in the time and costly adjustment steps that precede the actual coating process, but rather to coat the materials with an aluminum-magnesium alloy. Can be used.
바람직하게는, 알킬마그네슘 화합물은 알루미늄 착화합물에 대하여, 0.01 내지 10 몰%, 바람직하게는 0.1 내지 1 몰%의 양으로 전해질에 포함된다. 특히, 전해질에 사용되는 바람직한 알킬마그네슘 화합물은 마그네슘부틸1 . 5옥틸0 .5 Preferably, the alkylmagnesium compound is included in the electrolyte in an amount of 0.01 to 10 mol%, preferably 0.1 to 1 mol% with respect to the aluminum complex. In particular, preferred alkylmagnesium compounds used in the electrolyte are magnesium butyl 1 . 5-octyl 0 0.5
(Mgbutyl1 .5octyl0 .5), 마그네슘부틸1 . 0에틸1 .0(Mgbutyl1 .0ethyl1 .0), 마그네슘sec-부틸1 .0 (Mgbutyl 1 .5 octyl 0 .5) , magnesium butyl-1. 0 ethyl 1.0 (Mgbutyl 1.0 ethyl 1.0), sec- butyl magnesium 1.0
n-부틸1 .0(Mgsec-butyl1 .0n-butyl1 .0) 및 그의 혼합물로 구성된 군으로부터 선택된다. It is selected from n- butyl 1 .0 (Mgsec-butyl 1 .0 n-butyl 1 .0) , and the group consisting of a mixture thereof.
유기알루미늄 착화합물과 알킬마그네슘 화합물은 바람직하게는 유기용매에 존재한다. 특히 바람직하게는, 유기용매는 벤젠, 톨루엔 또는 자일렌 또는 그의 혼합물과 같은 방향족 용매이다. The organoaluminum complex compound and the alkylmagnesium compound are preferably present in the organic solvent. Especially preferably, the organic solvent is an aromatic solvent such as benzene, toluene or xylene or mixtures thereof.
전술한 마그네슘-알루미늄 에틸 착화합물 Mg[Al(Et)4]2와 비교하면, 앞서 정의된 알킬마그네슘 화합물은 산업적 유용성과 용이하고도 저비용적 생산을 가능하게 하는 장점이 있다. 전해질은 다음과 같은 단계에 따라 제조된다. 먼저, 일반식 MAlR4로 나타내어지는 유기알루미늄 착화합물 또는 그의 혼합물을 선택적으로 트리알킬알루미늄과 조합하여 공급한다. 이 단계에 이어, 상술한 바와 같이 알킬마그네슘 화합물을 가한다. M과 R은 상기와 동일한 의미를 가진다. 전해질을 제조하는 동안 알킬마그네슘의 계량은 마그네슘과 알루미늄의 요구되는 농도를 직접적으로 조절할 수 있는 장점을 가져, 앞서 정의된 조정단계 없이 완전히 전해질을 제조할 수 있게 한다. 더욱이, 코팅에 필요한 적절한 마그네슘 농도를 유지하기 위해서 코팅공정 동안에도 알킬마그네슘 화합물을 가할 수 있다. Compared with the magnesium-aluminum ethyl complex Mg [Al (Et) 4 ] 2 described above, the alkylmagnesium compound defined above has the advantage of enabling industrial usefulness and easy and low cost production. The electrolyte is prepared according to the following steps. First, an organoaluminum complex represented by the general formula MAlR 4 or a mixture thereof is optionally fed in combination with trialkylaluminum. Following this step, an alkylmagnesium compound is added as described above. M and R have the same meaning as above. The metering of alkylmagnesium during electrolyte preparation has the advantage of directly controlling the required concentrations of magnesium and aluminum, making it possible to produce the electrolyte completely without the previously defined adjustment steps. Furthermore, alkylmagnesium compounds may be added during the coating process to maintain the appropriate magnesium concentrations needed for coating.
바람직한 실시예에 따르면, 알킬마그네슘 화합물은 일반식 Mg(R1)x(R2)y으로 나타내어지는 혼합된 알킬마그네슘 화합물이다: 상기 식에서, R1과 R2는 독립적으로 각각 C1-C20 알킬기, 바람직하게는 C2-C10 알킬기를 나타내고; x는 0 내지 2이며; y는 0 내지 2이고; 및, x + y는 2이다. 바람직한 실시예에 따르면, 알킬마그네슘 화합물은 탄화수소에 가해져 용해되고, 알킬알루미늄 착화합물은 방향족 탄화수소에 공급되어 용해된다. 알루미늄 화합물을 위한 탄화수소는 i-펜탄, n-펜탄, 헥산, n-헥산, 헵탄, n-헵탄, 톨루엔 및 자일렌이다. According to a preferred embodiment, the alkylmagnesium compound is a mixed alkylmagnesium compound represented by the general formula Mg (R 1 ) x (R 2 ) y wherein R 1 and R 2 are each independently C 1 -C 20 Alkyl groups, preferably C 2 -C 10 An alkyl group; x is 0 to 2; y is 0 to 2; And, x + y is two. According to a preferred embodiment, the alkylmagnesium compound is added to the hydrocarbon to dissolve and the alkylaluminum complex compound is fed to the aromatic hydrocarbon to dissolve. Hydrocarbons for aluminum compounds are i-pentane, n-pentane, hexane, n-hexane, heptane, n-heptane, toluene and xylene.
본 발명에 따른 전해질을 사용하여, 알루미늄과 마그네슘의 농도를 달리한 알루미늄-마그네슘 층은 유기마그네슘 화합물의 가해진 양을 단순하고도 자유롭게 선택함으로써 단일조작(single operation)으로 제조될 수 있다. 알루미늄-마그네슘의 적절한 농도는 유기마그네슘 화합물의 가해진 양에 의해서 조절될 수 있다. 또한, 본 발명의 전해질은 우수한 전도성과 균일 전착성(throwing power)의 장점을 가진다. Using the electrolyte according to the present invention, aluminum-magnesium layers with different concentrations of aluminum and magnesium can be produced in a single operation by simply and freely selecting the amount of organomagnesium compound applied. Appropriate concentrations of aluminum-magnesium can be controlled by the added amount of organomagnesium compound. In addition, the electrolyte of the present invention has the advantages of excellent conductivity and uniform throwing power.
본 발명의 전해질은 기하학적으로 복잡한 형태의 코팅 부분에 사용되는 불관양극(indifferent anodes)의 작업을 가능하게 한다. 불관전극은 알루미늄 또는 마그네슘 또는 그의 합금으로 구성되어 있지 않아서, 코팅공정 동안에 용해되지 않는다. 불관전극으로 코팅할 때, 유기마그네슘과 유기알루미늄 화합물들은 반드시 전해용액에서 계량되어야 한다. 적절한 알루미늄-마그네슘 농도는 가해진 유기마그네슘 화합물과 유기알루미늄 화합물의 양을 통해 조정된다. 선행기술에서는 원칙적으로, 단일조작으로 알루미늄-마그네슘 조성을 달리한 층의 제조에 응용될 수 있는 유기마그네슘 착화합물의 인 시츄(in situ) 생산에 불관전극으로 작업하는 것은 배제되었다. 이것은 전해질에서 마그네슘 농도를 제공하는 조정단계를 이용하는 상술한 인 시츄(in situ) 공정에서도 가능하지 않다. The electrolyte of the present invention allows the operation of indifferent anodes for use in geometrically complex shaped coatings. The irradiated electrode is not composed of aluminum or magnesium or an alloy thereof, and therefore does not dissolve during the coating process. When coated with a tube electrode, the organomagnesium and organoaluminum compounds must be metered in the electrolytic solution. Appropriate aluminum-magnesium concentration is adjusted via the amount of organomagnesium compound and organoaluminum compound applied. In the prior art, in principle, working as an irradiating electrode for the in situ production of organomagnesium complexes which can be applied to the production of layers with different aluminum-magnesium compositions in a single operation is excluded. This is not even possible in the in situ process described above using a tuning step to provide magnesium concentration in the electrolyte.
또한, 본 발명은 (i) 청구항 제 1항 내지 제 3항에 개시된 유기알루미늄 착화합물 또는 알킬알루미늄 화합물; 및, (ii) 청구항 제 1항, 제 3항, 제 5항 및 제 6항에 개시된 알킬마그네슘 화합물을 포함하는, 전기전도 물질 또는 전기전도 층 위에 알루미늄-마그네슘 합금의 갈바닉 증착을 위한 전기분해 키트를 제공한다. In addition, the present invention (i) an organoaluminum complex or alkylaluminum compound disclosed in claims 1 to 3; And, (ii) an electrolysis kit for galvanic deposition of an aluminum-magnesium alloy on an electrically conductive material or an electrically conductive layer comprising the alkylmagnesium compound as defined in claims 1, 3, 5 and 6. To provide.
바람직한 실시예에 따르면, (i) 및 (ii) 의 화합물은 유기용매에 용해된다. According to a preferred embodiment, the compounds of (i) and (ii) are dissolved in an organic solvent.
아울러, 본 발명은 마그네슘과 알루미늄의 원하는 농도를 조성 또는 유지하기 위해서 코팅단계 동안에, 청구항 제 1항, 제 3항, 제 5항 및 제 6항에 개시된 알킬마그네슘 화합물을 원하는 양으로 계량하면서, 청구항 제 1항 내지 제 9항에 개시된 전해질을 이용하여 알루미늄-마그네슘 합금으로 전기전도 물질 또는 층을 코팅하는 방법을 제공한다. In addition, the present invention provides a method for claiming, during the coating step, in order to formulate or maintain the desired concentrations of magnesium and aluminum, the desired amount of the alkylmagnesium compound as defined in claims 1, 3, 5 and 6, A method of coating an electrically conductive material or layer with an aluminum-magnesium alloy using the electrolytes disclosed in claims 1 to 9.
또한, 본 발명은 전기전도 물질 또는 전기전도 층 위에 알루미늄 합금 층을 제조하기 위한 발명에 개시된 전해질의 용도를 제공한다.The present invention also provides the use of an electrolyte disclosed in the invention for producing an aluminum alloy layer over an electrically conductive material or electrically conductive layer.
이하, 실시예를 통하여 본 발명을 더욱 상세히 설명하고자 한다. Hereinafter, the present invention will be described in more detail with reference to Examples.
실시예 1: 헵탄에 용해시킨 20% Mgbutyl1 .5octyl0 .5(Crompton 사의 BOMAG® 제품)의 사용 Example 1: Use of which 20% Mgbutyl 1 .5 0 .5 octyl (BOMAG Crompton Corporation ® products) dissolved in heptane
전체 반응은 아르곤 기체의 보호 하에서 수행되었다. The whole reaction was carried out under the protection of argon gas.
단계 1: 농축하여 헵탄을 제거한 다음, BOMAG®/헵탄 용액은 톨루엔을 이용하여 0.32mmol/g로 조정하였다.Step 1: Concentrated to remove heptane, then BOMAG ® / heptane solution was adjusted to 0.32 mmol / g with toluene.
단계 2: 0.8 K[Al(Et)4] + 0.2 Na[Al(Et)4] + 1.17 Al(Et)3 + 3.85 톨루엔이 포함된 전해질 55.4g을 BOMAG/톨루엔 용액 2.85g(전해질에 대하여 1.0 몰%)에 가하였다.Step 2: 0.8 K [Al (Et) 4 ] + 0.2 Na [Al (Et) 4 ] + 1.17 Al (Et) 3 + 3.85 55.4 g of an electrolyte containing toluene was added to 2.85 g of a BOMAG / toluene solution (1.0 for electrolyte). Mole%).
전해질 약 58g을 수득하였다.About 58 g of electrolyte was obtained.
코팅 검사: Coating inspection :
일반조건:General conditions:
모든 증착실험은 표준조건 하에서 수행되었다. 마그네슘 성분은 전해질에 피펫으로 직접 넣었다. All deposition experiments were performed under standard conditions. The magnesium component was pipetted directly into the electrolyte.
양극 물질: 2 합금 전극, 알루미늄-마그네슘, 25.55 x 10 x 5mmAnode material: 2 alloy electrode, aluminum-magnesium, 25.55 x 10 x 5 mm
음극: 6각 스크류, 8.8, M8 x 25Cathode: hexagonal screw, 8.8, M8 x 25
음극 선처리: 8% HCl이 포함된 초음파 배스(bath)에서 유지와 물때 제거. 물로 세척, 진공 건조 및 아르곤 기체 하에서 보관Cathode pretreatment: grease and descaling in an ultrasonic bath containing 8% HCl. Washed with water, vacuum dried and stored under argon gas
음극 침강 깊이: 완전히 잠김Cathode Settling Depth: Fully Locked
음극 회전: 60rpmCathode Rotation: 60rpm
양극까지의 거리: 10mmDistance to anode: 10 mm
실효 음극 표면: 10cm2 Effective cathode surface: 10 cm 2
배스 교반: 250rpm, 유리 자켓(jacket) 내 2cm 자석Bath agitation: 250 rpm, 2 cm magnet in glass jacket
배스 온도: 94 - 98℃Bath temperature: 94-98 ℃
증착은 0.05A/dm2의 전류밀도로 시작되었다. 몇분 후에 밝은 오버레이(overlay)가 코팅될 부분에서 보여졌다. 전류밀도를 점차 3.0A/dm2까지 높였다. 층 두께 5㎛에 상응하는 전류량이 1.499mF가 된 후에, 증착을 종료하였다. 층은 밝고 은백색을 띈다. Deposition began with a current density of 0.05 A / dm 2 . After a few minutes a bright overlay was seen in the area to be coated. The current density was gradually increased to 3.0 A / dm 2 . After the current amount corresponding to the layer thickness of 5 mu m became 1.499 mF, the deposition was finished. The layer is bright and silver white.
층의 RF 분석: 마그네슘 26.79 질량%, 알루미늄 73.21 질량% RF analysis of layer: magnesium 26.79 mass%, aluminum 73.21 mass%
실시예 2: 헵탄에 용해시킨 20% Mgethyl1 .0 butyl1 .0(Akzo-Nobel사의 BEM 제품)의 사용 Example 2: Use of which 20% Mgethyl 1 .0 butyl 1 .0 (Akzo-Nobel , Inc. BEM, Ltd.) dissolved in heptane
반응은 아르곤 기체의 보호 하에서 수행되었다. The reaction was carried out under the protection of argon gas.
단계 1: 농축하여 헵탄을 제거한 다음, BEM/헵탄 용액은 톨루엔을 이용하여 0.41mmol/g로 조정하였다.Step 1: Concentrated to remove heptane, then BEM / heptane solution was adjusted to 0.41 mmol / g with toluene.
단계 2: 0.8 K[Al(Et)4] + 0.2 Na[Al(Et)4] + 1.17 Al(Et)3 + 3.85 톨루엔이 포함된 전해질 60.6g을 BEM/톨루엔 용액 2ml(전해질에 대하여 0.9 몰%)에 가하였 다. 전해질을 약 62g을 수득하였다.Step 2: 0.8 K [Al (Et) 4 ] + 0.2 Na [Al (Et) 4 ] + 1.17 Al (Et) 3 + 3.85 60.6 g of an electrolyte containing toluene 2 ml of a BEM / toluene solution (0.9 mol to electrolyte) %). About 62 g of electrolyte was obtained.
코팅 검사: Coating inspection :
증착조건은 실시예 1에서와 같았다. 증착은 전체 전기분해 동안에 변하지 않고 유지되는 전류밀도 2.0A/dm2로 즉시 시작되었다. 알루미늄/마그네슘의 순간적인 밝은 증착이 진행되었다. 층 두께 11㎛에 상응하는 전류량이 3.38mF가 된 후에, 증착을 종료하였다. 결점 없는 매우 균일한 은백색의 층을 수득하였다. Deposition conditions were the same as in Example 1. Deposition began immediately with a current density of 2.0 A / dm 2 , which remained unchanged during the entire electrolysis. Instantaneous bright deposition of aluminum / magnesium proceeded. After the current amount corresponding to the layer thickness of 11 mu m became 3.38 mF, the deposition was finished. A very uniform silvery white layer was obtained without defects.
층의 RF 분석: 마그네슘 26.78 질량%, 알루미늄 73.22 질량%RF analysis of the layers: 26.78 mass% magnesium, 73.22 mass% aluminum
실시예 3: 아이소펜탄(isopentane)에 용해시킨 20% Mgethyl1 .0butyl1 .0 (Albemarle 사의 BEM 제품)의 사용 Example 3: use of iso-pentane (isopentane) was 20% Mgethyl 1 .0 butyl 1 .0 (Albemarle Corporation BEM, Ltd.) dissolved in
반응은 아르곤 기체의 보호 하에서 수행되었다. The reaction was carried out under the protection of argon gas.
단계 1: 1.85mmol/g의 마그네슘이 포함된 BEM/아이소펜탄 용액을 더 이상의 전처리없이 사용하였다. Step 1: A BEM / isopentane solution containing 1.85 mmol / g magnesium was used without further pretreatment.
단계 2: 0.85 K[Al(Et)4] + 0.15 Na[Al(Et)4] + 1.08 Al(Et)3 + 3.15 톨루엔이 포함된 전해질 70.04g을 BEM/아이소펜탄 용액 0.5g(전해질에 대하여, 0.8 몰%) 에 가하였다. Step 2: 0.85 K [Al (Et) 4 ] + 0.15 Na [Al (Et) 4 ] + 1.08 Al (Et) 3 + 3.15 70.04 g of an electrolyte containing toluene was added to 0.5 g of BEM / isopentane solution (for electrolyte , 0.8 mol%).
코팅 검사: Coating inspection :
증착조건은 실시예 1에서와 같았다. 증착은 전류밀도 1.0 내지 3.0A/dm2에서 수행되었다. 층 두께 20㎛에 상응하는 전류량이 6.8mF가 된 후에, 증착을 종료하였다. 매우 균일한 은백색의 층을 수득하였다. Deposition conditions were the same as in Example 1. Deposition was carried out at a current density of 1.0 to 3.0 A / dm 2 . After the current amount corresponding to the layer thickness of 20 m became 6.8 mF, the deposition was finished. A very uniform silvery white layer was obtained.
층의 RF 분석: 마그네슘 41.4%, 알루미늄 58.9% RF analysis of layers: magnesium 41.4%, aluminum 58.9%
비교실시예 1: 알루미늄-마그네슘 증착을 위한, 마그네슘-알킬 용액(조정 전해질)의 직접적인 추가없는, Albemarle사의 전해질을 사용 Comparative Example 1 : Using Albemarle's electrolyte without direct addition of magnesium-alkyl solution (regulated electrolyte) for aluminum-magnesium deposition
0.8 K[Al(Et)4] + 0.2 Na[Al(Et)4] + 1.17 Al(Et)3 + 3.85 톨루엔이 포함된 전해질 65.0g을 마그네슘-알킬 용액의 전첨가(previous addition)를 제외하고는 상술한 일반적 조건하에서 제조조정(preparatory conditioning)에 사용하여, 당업계에서 이전에 요구된 것처럼, 알루미늄-마그네슘 합금의 증착에 있어서 전해질을 사용하기 전에, 마그네슘 착화합물이 조정단계에서 전기화학적으로 생성되어야 한다.0.8 K [Al (Et) 4 ] + 0.2 Na [Al (Et) 4 ] + 1.17 Al (Et) 3 + 3.85 65.0 g of an electrolyte containing toluene, except for the previous addition of magnesium-alkyl solution Mg complexes must be electrochemically produced in the conditioning step before use of the electrolyte in the deposition of aluminum-magnesium alloys, as previously required in the art, using preparatory conditioning under the aforementioned general conditions. do.
조정단계 1: 전기분해는 최초 0.05A/dm2로 시작하여, 최대값인 1.0A/dm2까지 증가되는 전류밀도로 수행되었다. 전류밀도가 7.20mF 후에, 균일 전착성(throwing power)이 약한, 흐린 회색의 코팅을 얻었다. Adjustment Step 1: electrolysis starting with the first 0.05A / dm 2, was carried out at a current density is increased to a maximum of 1.0A / dm 2. After a current density of 7.20 mF, a pale gray coating was obtained, which had a weak uniform power.
조정단계 2: 양극을 교체한 후, 조정은 1.0 내지 1.2A/dm2에서 계속되었다. 전류밀도가 7.24mF 후에, 균일 전착성이 아주 약간 향상된, 뚜렷하게 밝고 약한 광택이 나는 부분을 얻었다. Adjustment step 2: After replacing the positive electrode, adjustment was continued at 1.0 to 1.2 A / dm 2 . After a current density of 7.24 mF, a distinctly bright and weakly glossed section was obtained with a slight improvement in uniform electrodeposition.
조정단계 3: 다시 양극을 교체한 후, 이때 최대허용 전류밀도 1.23A/dm2를 넘어 1.5A/dm2 내지 2.0A/dm2까지 증가시켜, 균일 전착성이 현저히 향상된, 균일한 광택의 코팅을 수득하였다. 전류량은 4.96mF을 사용하였다.Adjustment step 3: After changing the anode again, the maximum allowable current density is 1.23A / dm 2 and above 1.5A / dm 2 To 2.0 A / dm 2 to obtain a uniform glossy coating with significantly improved uniform electrodeposition. The amount of current was 4.96 mF.
조정단계 4: 마지막 조정에 도달하여, 조정단계 3과 비교하여 동일한 균일 전착성으로, 전류밀도 3.0A/dm2를 이용하여 광택의 코팅을 수득하였다. 전류량은 3.73mF을 사용하였다. Adjustment step 4: A final adjustment was reached, giving a glossy coating with a current density of 3.0 A / dm 2 with the same uniform electrodeposition as compared with adjustment step 3. The current amount was 3.73 mF.
전기분해는 이러한 과정이 지난 후에만 조절되고 조작된다. Electrolysis is controlled and manipulated only after this process.
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CN103334132B (en) * | 2013-07-17 | 2016-05-25 | 沈阳大学 | The method of almag film is prepared in room temperature electro-deposition |
CN103510136B (en) * | 2013-09-22 | 2015-08-19 | 电子科技大学 | A kind of method at ultra-fine tungsten wires surface electrical deposition of aluminum magnesium alloy film |
CN106435706B (en) * | 2015-08-04 | 2019-02-26 | 张无量 | The electrochemical polishing method of magnesium intravascular stent |
JP7179358B2 (en) * | 2017-06-01 | 2022-11-29 | ルミシールド テクノロジーズ インコーポレイテッド | Methods and compositions for electrochemical deposition of metal-rich layers in aqueous solutions |
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US4778575A (en) * | 1988-01-21 | 1988-10-18 | The United States Of America As Represented By The United States Department Of Energy | Electrodeposition of magnesium and magnesium/aluminum alloys |
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US7250102B2 (en) * | 2002-04-30 | 2007-07-31 | Alumiplate Incorporated | Aluminium electroplating formulations |
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