KR20060067320A - Liquid crystal display device and method for manufacturing the same - Google Patents

Abstract

The present invention provides a liquid crystal display device and a method for manufacturing the same in which the shape of the mask is different for each part corresponding to the substrate, thereby manufacturing spacers having various shapes or various heights in one exposure to maintain cell gaps and improve touch defects. The liquid crystal display device of the present invention relates to a first substrate on which a TFT array is formed, a second substrate on which a color filter array having a step is formed on a surface of the first substrate opposite to the TFT array, and the second substrate. A first column spacer formed in a region having a low step height, a second column spacer formed in a region having a high step height on the second substrate, and having a rounded upper surface facing the first substrate, and the first and second It is characterized by including a liquid crystal layer filled between the substrate.

Column Spacers, Bad Touch, Cell Gap, Mask, Diffraction Exposure

Description

Liquid crystal display device and method for manufacturing the same

1 is a plan view showing a conventional liquid crystal display device

2 is a structural cross-sectional view taken along line II ′ of FIG. 1.

3 is a cross-sectional view showing a conventional column spacer and a mask forming the same.

FIG. 4 is a graph showing the degree of deformation of the column spacer according to an even pressure applied across the entire liquid crystal panel including the column spacer of FIG.

5A and 5B are a plan view and a cross-sectional view showing a state where a touch unevenness occurs in a conventional liquid crystal display.

6 is a schematic cross-sectional view showing a column spacer formed according to the size of the permeable portion of the mask.

7 is a plan view of the mask of FIG.

8 is a plan view illustrating a color filter array substrate of a liquid crystal display according to a first exemplary embodiment of the present invention.

9 is a structural cross-sectional view of the color filter array substrate taken along line III-III ′ of FIG. 8;

FIG. 10 is a graph showing a deformation degree of a column spacer according to pressure, and a correspondence degree of a color filter array substrate and a TFT array substrate in the liquid crystal display according to the first embodiment of the present invention.

11 is a plan view showing a case where the liquid crystal display of the present invention is applied to the transverse electric field mode;

12 is a cross-sectional view taken along line III-III ′ of FIG. 11;

13 is a plan view showing a case where the liquid crystal display of the present invention is applied to the twist nematic mode.

14 illustrates a column spacer and a method of manufacturing the same in a liquid crystal display according to a second exemplary embodiment of the present invention.

FIG. 15 is a plan view illustrating a mask used in FIG. 14.

16 is a graph illustrating a deformation degree of a column spacer according to pressure of a liquid crystal display according to a second exemplary embodiment of the present invention.

17 is a plan view illustrating a color filter array substrate of a liquid crystal display according to a second exemplary embodiment of the present invention.

18 is a cross-sectional view taken along line IV-IV 'of FIG.

* Description of symbols on the main parts of the drawings *

100 color filter array substrate 101 first column spacer

103: second column spacer 105: third column spacer

110: first substrate

111 black matrix layer 112 color filter layer

112a: first color film 112b: second color film

112c: third color film 113: overcoat layer / common electrode

120: second substrate 121: gate line

122: data line 123: pixel electrode

127a: common electrode 127: common electrode

150: mask 200: color filter array substrate

201: first column spacer 202: second column spacer

210: first substrate 220: second substrate

250: mask 260: TFT array substrate

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device. In particular, by varying the shape of a mask for each part corresponding to a substrate, a spacer having various shapes or various heights is manufactured in one exposure to maintain cell gaps and improve touch defects. A liquid crystal display device and a manufacturing method thereof, and a mask used therein.

As the information society develops, the demand for display devices is increasing in various forms, and in recent years, liquid crystal display devices (LCDs), plasma display panels (PDPs), electro luminescent displays (ELD), and vacuum fluorescent (VFD) Various flat panel display devices such as displays have been studied, and some of them are already used as display devices in various devices.

Among them, LCD is the most widely used as the substitute for CRT (Cathode Ray Tube) for mobile image display device because of its excellent image quality, light weight, thinness, and low power consumption. In addition to the use of the present invention has been developed in various ways such as a television and a computer monitor for receiving and displaying broadcast signals.

In order to use such a liquid crystal display as a general screen display device in various parts, it is a matter of how high quality images such as high definition, high brightness and large area can be realized while maintaining the characteristics of light weight, thinness and low power consumption. Can be.

Hereinafter, a liquid crystal display according to the related art will be described with reference to the accompanying drawings.

1 is a plan view illustrating a conventional liquid crystal display, and FIG. 2 is a structural cross-sectional view taken along line II ′ of FIG. 1.

As shown in FIGS. 1 and 2, a conventional liquid crystal display device includes a first substrate 1 and a second substrate 2 bonded to each other with a predetermined space, and the first substrate 1 and the second substrate 2. It consists of the liquid crystal layer (not shown) injected in between. In this case, all of the first and second substrates 2 and the liquid crystal layer (not shown) are referred to as a liquid crystal panel.

In the conventional liquid crystal display illustrated in the drawing, a column spacer 20 is formed to correspond to a wiring area on the first substrate 1 to support the first and second substrates 1 and 2. In a typical liquid crystal display device, a ball spacer (not shown in FIG. 1) instead of the column spacer functions to support the first and second substrates 1 and 2.

More specifically, in the array area on the first substrate 1 of the conventional liquid crystal display device, the gate line 4 and the data line 5 are arranged perpendicularly to each other so as to define the pixel area. A thin film transistor TFT is formed at a portion where each gate line 4 and the data line 5 cross each other, and a pixel electrode 6 is formed in each pixel area.

The thin film transistor corresponds to a gate electrode 4a protruding from the gate line 4, a semiconductor layer 17 having a shape covering the gate electrode 4a, and both sides of the semiconductor layer 17. A source electrode 5a protruding from the data line 5 and a drain electrode 5b spaced apart from the source electrode 5a by a predetermined interval are included.

The gate line 4 is formed on the first substrate 1 to insulate the metal lines, and a gate insulating film 15 is formed on the entire surface of the substrate including the gate line 4. A protective film 16 is formed on (15). A predetermined portion of the upper portion of the drain electrode 5b of the passivation layer 16 is removed to form a contact hole 16a that electrically connects the pixel electrode 16 and the drain electrode 5b.

On the second substrate 2 facing the first substrate 1, a black matrix layer 7 for covering non-pixel regions (gate lines, data lines, and thin film transistor regions) other than the pixel region, and The second substrate including the color filter layer 8 and the color filter layer 8 formed on the second substrate 2 including the black matrix layer 7 in correspondence with the R, G, and B pigments in order for each pixel region ( 2) The common electrode 14 formed on the front surface is formed. In addition, a plurality of column spacers 20 for maintaining a cell gap are formed in a predetermined portion above the common electrode 14.

Here, the column spacer 20 is formed to correspond to the upper portion of the gate line 4.

The plurality of formed column spacers 20 are equally spaced apart from each other, and after bonding, serve as a support function between the first and second substrates 1 and 2.

In the illustrated figure, the TFT array substrate 30 including the first substrate 1 and the TFT array formed on the first substrate 1 is referred to as the TFT array substrate 30, and is disposed on the second substrate 2 and the second substrate. It is referred to as a color filter array substrate 40 including a color filter array formed on the substrate.

3 is a cross-sectional view illustrating a conventional column spacer and a mask forming the same, and FIG. 4 is a graph illustrating a deformation degree of the column spacer according to an even pressure applied over the entire liquid crystal panel including the column spacer of FIG. 3.

The conventional column spacer 20 is formed in the following order.

First, as shown in FIG. 2, a color filter array substrate 40 having a black matrix layer 7, a color filter layer 8, and a common electrode 14 formed on the second substrate 2 is prepared.

Next, an organic insulating layer 20 and the same layer are coated on the color filter array substrate 40 at a predetermined height.

Subsequently, a photosensitive film 25 and the same layer are coated on the entire surface including the organic insulating film 20. Here, the photoresist film is a negative photoresist film, and the exposed portion has a property of remaining during development.

Subsequently, the mask 50 having the opening 50a defined in a predetermined portion is aligned on the photosensitive film.

Subsequently, the photoresist film is exposed using the mask 50 and then developed to form the photoresist pattern 25.

Next, the organic insulating layer 20 is selectively removed using the photosensitive film pattern 25 to form the column spacer 20.

In this case, the mask 50 is spaced apart from the photosensitive film pattern 25 by a predetermined distance A, and a side surface thereof is formed in a shape having a predetermined taper, and the photosensitive film for forming the column spacer 20 is formed. The taper is applied to the column spacer even when the organic insulating layer is patterned using the pattern 25.

In addition, the taper of the column spacer 20 may be controlled by adjusting the separation degree between the mask 50 and the photosensitive material. That is, if the mask 50 and the photosensitive material apart from the photosensitive material at the time of exposure are larger, the taper will be more gentle, and if the mask 50 and the photosensitive material are separated from the photosensitive material at the time of exposure, the taper will be perpendicular to the contact. Will be close.

As shown in FIGS. 2 and 3, the column spacer 20 formed for support between the color filter array substrate 40 and the TFT array substrate 30 is fixed to a predetermined portion so that the column spacer is formed on an external factor. When the pressure is applied to a portion where a predetermined column spacer is located, the position change is not performed.

When locally pressing the outer surface of the first substrate or the second substrate on which the bonded column spacer is formed, as the intensity of the pressure increases, the degree of deformation of the shape of the column spacer to a certain extent increases linearly proportionately, As the intensity increases, the degree of deformation of the column spacer gradually decreases. Thus, the deformation of the column spacer to some extent is considered to be due to the limit of elastic force or inherent restoring force of the material constituting the column spacer.

On the other hand, in the above-described liquid crystal display including the column spacer, a defect occurs in which light leakage occurs when touched as follows.

Hereinafter, touch unevenness (touch failure) will be described.

5A and 5B are a plan view and a sectional view showing a state where a touch spot occurs.

As shown in FIG. 5A, when the surface of the liquid crystal panel 10 is swung in a predetermined direction while being touched with a finger or a pen, the second substrate 2 of the liquid crystal panel 10 may have a finger as shown in FIG. 5B. The predetermined interval is shifted in the passing direction.

At this time, the columnar columnar spacer 20 is in contact with the first and second substrates 1 and 2, and the contact area is large, and the column spacer 20 and the opposing substrate (the first substrate, 1) are in contact with each other. Since the generated frictional force is large, after shifting in the touch direction, the second substrate 2 has not been restored to its original state for a long time. In this case, the liquid crystal in the spot where the finger or the pen passes is scattered, and a phenomenon in which the liquid crystal collects in the peripheral region of the passed spot occurs. In this case, the area where the liquid crystals 3 are collected has a higher cell gap h1 than the cell gap h2 of the other area defined by the height of the column spacer 20, and the place where the finger or the pen passes is where the liquid crystal is. Scattered, touch defects in which touch portions are observed as mura due to excessive and insufficient liquid crystal occur in the touch region and the touch peripheral region.

The reason why such a touch defect is observed in the liquid crystal display device in which the column spacer is formed is that the column spacer is fixed to one substrate and is in planar contact with the opposing substrate, so that the area of contact with the substrate is larger than that of the spherical ball spacer. Judging by

On the other hand, as described above, the cause of the touch unevenness, in addition to the viewpoint that the contact area is large, there is a view that the vacuum recovery between the contact surface of the substrate and the column spacer when the substrate is touched, the original recovery is slow. The ball spacer has a spherical shape, has a contact portion between the opposing substrate and the contact point, and can move freely in all directions, so that a vacuum state is not formed between the upper and lower substrates even under the condition of touching the liquid crystal panel surface. On the contrary, when the column spacer encounters a flat counter substrate and the upper surface of the column spacer, a vacuum state is easily formed at the contact portion thereof.

As such, whether the contact area between the column spacer and the counter substrate is large or because a vacuum is formed between the column spacer and the counter substrate, the touch failure is a problem mainly observed in the liquid crystal display device in which the column spacer is formed. .

The conventional liquid crystal display as described above has the following problems.                         

First, the column spacers having the same shape and the same height are formed over the entire liquid crystal panel, and there is a difference in the cell gaps uneven for each region due to the step difference between the layers formed under the column spacer.

Secondly, it acts as a frictional force due to the large area where the column spacers of the same shape and the same height and the opposing substrate is in contact with each other, resulting in a low resilience to return to the original state at a predetermined touch, which causes staining.

The present invention has been made to solve the above problems by varying the shape of the mask for each part corresponding to the substrate, to prepare a spacer of various shapes or spacers of various heights in a single exposure to maintain a stable cell gap SUMMARY OF THE INVENTION An object of the present invention is to provide a liquid crystal display and a method of manufacturing the same, which have improved touch failure.

According to an aspect of the present invention, there is provided a liquid crystal display device including: a first substrate on which a TFT array is formed; a second substrate on which a color filter array having a step is formed on a surface of the first substrate opposite to the TFT array; And a first column spacer formed in a region having a low step on the second substrate, a second column spacer formed in a region having a high step on the second substrate and having a rounded upper surface facing the first substrate. It is characterized by including a liquid crystal layer filled between the first and second substrates.

When pressurized at a uniform pressure to the surface of the first substrate or the second substrate, the second column spacer contacts the first substrate first compared to the first column spacer. The first column spacer and the second column spacer are formed at the same height from the surface of each second substrate.

The cross-sectional area of the top surface of the first column spacer opposite the first substrate is greater than the cross-sectional area of the top surface of the second column spacer.

At a point in time when both the first column spacer and the second column spacer are in contact with the first substrate, the contact area with the first substrate is larger than that of the second column spacer. .

The TFT array includes a gate line and a data line crossing each other on the first substrate and defining a pixel region, a thin film transistor formed at an intersection of the gate line and the data line, and a pixel electrode formed at the pixel region. The color filter array may include a black matrix layer formed on the second substrate to cover the gate line, the data line, and the thin film transistor, and on the second substrate including the black matrix layer in the direction of the data line. And a common electrode formed on the entire surface of the second substrate including the black filter layer and the color filter layer.

A black matrix layer, a color filter layer, and an overcoat layer are formed under the first and second column spacers. The color filter layer includes R, G, and B color films. The color filter layer has a different thickness for each color film. At this time, the maximum step which each said color film has is 4000 micrometers or less.

The first and second column spacers are formed to correspond to the gate lines or data lines.

The TFT array may further include a gate line and a data line crossing each other on the first substrate to define a pixel region, a common line formed in parallel with the gate line, and a thin film formed at an intersection region of the gate line and the data line. And a pixel electrode and a common electrode alternately formed in the pixel region, wherein the color filter array is formed on the second substrate so as to cover the gate line, the data line, and the thin film transistor. And a color filter layer formed on the second substrate including the black matrix layer in the direction of the data line, and an overcoat layer formed on the entire surface of the second substrate including the black matrix layer and the color filter layer.

A black matrix layer, a color filter layer, and an overcoat layer are formed under the first and second column spacers.

The color filter layer comprises an R, G, B color film. The color filter layer has a different thickness for each color film. The maximum step which each said color film has is 4000 micrometers or less.

The first and second column spacers are formed on any one of a gate line, a data line, and a common line.

The first and second column spacers are made of the same mask.

A third column spacer having a shape different from that of the first and second column spacers may be further formed at a predetermined portion on a second substrate having a step different from that of the portion where the first and second column spacers are formed.

In addition, the manufacturing method of the liquid crystal display device of the present invention for achieving the same object comprises the steps of forming a TFT array on the first substrate, forming a color filter array having a step on the second substrate, the color Applying a photocurable resin to the entire surface of the second substrate including the filter array; aligning a mask on the second substrate, the mask having defined transmissive portions and openings having different sizes according to the step on the second substrate; The photocurable resin is selectively removed through one exposure and development using the mask, and the first column spacer and the region having a high level on the second substrate correspond to a region having a low level on the second substrate. Forming a second column spacer having a corresponding rounded top surface, dropping liquid crystal onto the first or second substrate, and It is characterized in that it comprises the step of bonding the first and second substrate.

The photocurable resin may be made of a negative photocurable resin. In this case, the mask aligned on the photocurable resin has a first transmission portion having a first cross-sectional area corresponding to a region having a low level on the second substrate, and corresponds to a region having a high level on the second substrate. It has a 2nd transmission part of a 2nd cross-sectional area (<1st cross-sectional area) smaller than a cross-sectional area, and has a light shielding part in the remainder area.

The photocurable resin may be made of a positive photocurable resin. In this case, the mask has a first light blocking portion having a first cross-sectional area corresponding to a region having a low level on the second substrate, and a second cross-sectional area smaller than the first cross-sectional area due to a region having a high level on the second substrate. (<1st cross-sectional area) has a 2nd light shielding part, and the remainder area has a transmission part.

The first column spacer and the second column spacer are formed at the same height from the surface of each forming portion of the second substrate.

The forming of the color filter array may include forming a black matrix layer in a predetermined region of the second substrate, forming a color filter layer on the second substrate including the black matrix layer, and including the color filter layer. And forming a common electrode on the entire surface of the second substrate. Here, the color filter layer is formed by including the R, G, B color film, each color film has a different thickness. At this time, the maximum step which each said color film has is 4000 micrometers or less.

The forming of the color filter array may include forming a black matrix layer on a predetermined region of the second substrate, forming a color filter layer on the second substrate including the black matrix layer, and the color filter layer. It may also comprise the step of forming an overcoat layer on the front of the second substrate including. At this time, the color filter layer is formed by including the R, G, B color film, each color film has a different thickness. In this case, the maximum step which each said color film has is 4000 micrometers or less.

In addition, the manufacturing method of the liquid crystal display device of the present invention for achieving the same object comprises the steps of forming a TFT array on a first substrate, forming a color filter array on a second substrate, and the color filter array Front coating the photocurable resin on the second substrate including; aligning a mask in which the transmissive portion, the transflective portion, and the light shielding portion are all defined on the second substrate including the photocurable resin; Selectively removing the photocurable resin by the exposure and development in a manner such that a first column spacer having a first height and a second having a second height greater than the first height (> first height) on the second substrate Forming a column spacer; dropping liquid crystal onto the first substrate; and bonding the first and second substrates to each other. There.

Each portion of the second substrate on which the first and second column spacers are formed is a surface without a step.

The photocurable resin may be made of a negative photocurable resin. In this case, the mask has a transflective portion defined at the formation portion of the first column spacer, a transmissive portion is defined at the formation portion of the second column spacer, and the remaining region is a light shielding portion.

The photocurable resin may be made of a positive photocurable resin. In this case, the mask has a transflective portion defined at the formation portion of the first column spacer, a light shielding portion is defined at the formation portion of the second column spacer, and the remaining region is a transmissive portion.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to the present invention will be described in detail with reference to the accompanying drawings.

FIG. 6 is a view illustrating a column spacer according to the shape of a transmissive part of a mask, and FIG. 7 is a plan view illustrating a mask used in FIG. 6.

6 and 7, column spacers having various shapes may be patterned in proportion to the size of the permeable part of the mask.

The material that is patterned by the mask 150 used to form the column spacers 101, 103, and 105 is a negative photocurable resin, which is a material having a property in which an exposed part remains after development.

As illustrated in FIG. 7, the transmissive portions 150a, 150b, and 150c of the mask 150 may have a square shape, and various shapes such as rectangles, circles, and other polygons may be possible. The shape of the lower end surface (contact surface with the color filter array substrate 100) of the column spacers 101, 103, 105 is determined to correspond to the shape of the permeable portions 150a, 150b, 150c, and the permeate portions 150a, 150b. , The smaller the size of 150c is, the upper surface of the column spacers 101, 103, 105 has a rounded shape. In addition, the mask 150 may further include fourth to other transmissive portions (not shown) having other sizes in addition to the first to third transmissive portions 150a, 150b and 150c.

Hereinafter, a method of manufacturing column spacers having various shapes using the mask will be described with reference to FIGS. 6 and 7.

First, a mask 150 having a first transmission portion 150a, a second transmission portion 150b, and a third transmission portion 150c each having a size that is sequentially reduced in a predetermined portion is prepared. Here, the region except for the first through third transmission parts 150a, 150b, and 150c includes the light blocking part 150d.

Subsequently, a negative photocurable resin is completely coated on the color filter array substrate 100.

Subsequently, the mask 150 is corresponded on the color filter array substrate 100.

Subsequently, when the negative photocurable resin is exposed and developed using the mask 150, the negative photocurable resin remains after the exposed portions are exposed by the first to third transmission parts 150a, 150b, and 150c. First to third column spacers 101, 102, and 103 are formed. At this time, the exposed part shows a difference in shape depending on the exposure amount at the time of exposure. That is, the first column spacer 101 is formed to correspond to the first transmission portion 150a having a large area, and has a side profile close to the vertical, and each of the third column spacers corresponding to the second transmission portion 150b. The second column spacer 103 corresponding to the 105 and the third transmission part 150c is formed to have an upper surface of a narrower area and a taper that gradually becomes smoother.

The reason why the exposure is performed in a larger area than the actual size of each transmission part 150a, 150b, 150c during exposure is that the mask 150 is spaced apart from the negative photocurable resin to be patterned at a predetermined interval, and each transmission part 150a, This is because a diffraction phenomenon occurs at the edges of 150b and 150c, and light propagates slightly to the outside of each transmission portion 150a, 150b and 150c. In this case, the light traveling toward the outside of each of the transmission parts 150a, 150b, and 150c has a smaller amount of light than the light traveling straight from the center of the transmission parts 150a, 150b and 150c, and thus the transmission parts 150a. Portions of the column spacers 101, 103, 105 corresponding to the edges of the edges 150b, 150c have a small exposure amount, and after partial exposure is performed, the sides of the column spacers 101, 103, 105 are tapered at predetermined angles. Will have In addition, as the third transmission portion 150c positioned on the far right side of the mask 150 shown in FIG. 1, the smaller the size of the transmission portion is, the taper of the second column spacer 103 formed correspondingly becomes smoother, and almost It is formed to have a shape similar to the hemispherical shape.

In this case, the shapes of the first through third transmission parts 150a, 150b, and 150c of the mask 150 may be square, circular, or polygonal as shown in the drawing.

As described above, the liquid crystal display and the manufacturing method thereof according to the first exemplary embodiment of the present invention take advantage of the fact that the shape of the column spacer is different according to the size of the permeable part of the mask.

 First Embodiment

In the first embodiment described below, a liquid crystal display device including a first column spacer having a flat upper surface and a second column spacer rounded will be described. It may also be possible to include differently shaped column spacers as needed.

FIG. 8 is a plan view illustrating a color filter array substrate of a liquid crystal display according to a first exemplary embodiment of the present invention, and FIG. 9 is a cross-sectional view of the color filter array substrate on the line III-III ′ of FIG. 8.

As shown in FIG. 8, the color filter array substrate 100 of the liquid crystal display according to the first exemplary embodiment of the present invention may include a black matrix layer 111 formed on an area excluding the pixel area on the first substrate 110. The common electrode or overcoat layer 113 formed on the entire surface of the substrate including the color filter layer 112 and the color filter layer 112 that is partially overlapped with the black matrix layer 111 in a vertical direction. It is made to include.

In this case, whether the layer 113 formed on the front surface of the substrate is a common electrode or an overcoat layer is determined whether the liquid crystal display including the color filter array substrate is in twisted nematic (TN) mode or in-plane switching (IPS) mode. Is determined accordingly. In the case of TN mode, it is a common electrode, and in the case of IPS mode, it is an overcoat layer.

The color filter layer 112 may include R, G, and B color films 112a, 112b, and 112c, and the R, G, and B color films 112a, 112b, and 112c may each have a step. . In this case, the first color film 112a may be an R color film as shown, or may be another color film. Here, it is assumed that the step is sequentially increased from the first color film 112a to the third color film 112c. This step may be changed according to the properties of the material and material of the pigment (color pigment) included in the color films 112a, 112b, 112c, if necessary, the step is increased or decreased by adding or subtracting a specific component It is possible.

In the liquid crystal display according to the first exemplary embodiment of the present invention, the column spacers 101 and 103 are formed from the surface of the first substrate 110 after including the color filter layer 112 and the common electrode or the overcoat layer 113. To some extent, the step of the color filter layer 112 is applied to the surface of the common electrode or the overcoat layer 113 that is the surface to be formed. That is, the thickness of the common electrode or overcoat layer 113 is about 0.1 μm so that the leveling of the color filter layer 112 is not completely flattened, and the leveling of the color filter layer 112 is alleviated. .

In this case, the height from the first substrate 110 to the common electrode or overcoat layer 113 may have a step within a maximum of 4000 kPa over the entire area of the liquid crystal panel. That is, assuming that the portion where the first color film 112a is formed is a portion having the smallest thickness of the color film, and that the portion where the third color film 112c is formed is the portion having the largest thickness of the color film, The step difference between the site | part on which the 1st color film 112a was formed and the site | part on which the 3rd color film 112c was formed is at most 4000 kPa. At this time, after the color filter array process is performed, the step of the color film is applied to the surface of the color filter array substrate 100 as it is, and the upper portion (common electrode or overcoat layer) of the third color film 112c is applied. The surface is relatively high compared to the upper surface of the first color film 112a.

A first column spacer 101 having a flat top surface and a large horizontal cross section is formed on the first color film 112a, and the surface on which the third color film 112c is formed is rounded. The second column spacer 103 is formed with a relatively small area of the horizontal cross section.

Here, the heights H1 and H2 of the first column spacer and the second column spacer itself are the same or almost similar, so that the step difference between the color filters formed under each column spacer is formed by the first and second column spacers. As applied to the surface of the color filter array substrate, the second column spacer will have a higher top surface after the actual column spacers are formed. Therefore, when pressing the surface of one substrate after bonding the color filter array substrate and the TFT array substrate on which the first and second column spacers are formed, the second column spacer having a higher top surface is thinner than the first column spacer. Quick contact with the array substrate.

10 is a graph showing a deformation degree of a column spacer according to pressure in the liquid crystal display according to the first exemplary embodiment of the present invention.

As shown in FIG. 9, immediately after forming the column spacer on the surface of the color filter array substrate 100 after forming the color filter array, a portion corresponding to the second column spacer 103 is more than that of other regions. Has a high top surface.

Therefore, as shown in FIG. 10, when the color filter array of the color filter array substrate 100 and the thin film transistor array of the TFT array substrate 160 are opposed to each other and bonded to each other, the surface (back) of the color filter array substrate 100 is bonded. With respect to the initial pressure applied, the second column spacer 103 first comes into contact with the TFT array substrate 160 (see the lower cross section on the right side of the graph), and the second column spacer 103 alone is the TFT array substrate ( The support between the 160 and the color filter array substrate 100 is provided.

Here, it is assumed that the pressure applied to the surface of the color filter array substrate 100 is evenly applied over the entire surface of the substrate.

In addition, it is assumed that the pressure at the time of the bonding between the actual color filter array substrate 100 and the TFT array substrate 160 becomes a pressure less than P1 in the graph. Therefore, the column spacers supported by the two substrates at the time of bonding are only the second column spacers.

The initial pressure (pressure gradually increasing between 0 and less than P1) applied to the surface of the color filter array substrate 100 is predetermined between two substrates when the color filter array substrate 100 and the TFT array substrate 160 are bonded together. It is a pressure applied until the two substrates are fixed to each other by a seal pattern (not shown) formed on the outer side of one substrate having a cell gap of. In this case, the second column spacer 103 may function as a cell gap retention column spacer.

When the pressure is increased (below P1) in the initial state, the upper surface of the second column spacer 103 (the color filter array substrate 100 is inverted in the state of the drawing) of the TFT array substrate 160 (Viewed from the contact surface) is pressed in proportion to the pressure at the time of contact after the contact of the TFT array substrate, and the height of the second column spacer 103 is reduced accordingly. This means that a change in the shape of the second column spacer 130 has occurred by a decrease in height.

When the pressure is gradually increased to apply a pressure of P1 or more to the surface of the color filter array substrate 100, both the second column spacer 103 and the first column spacer 101 are applied to the TFT array substrate 160. Contact. At this time, the pressure at which the initial contact is made is P1. After the contact of the first column spacer 101, the deformation of the column spacer on the graph is remarkably reduced as the pressure increases. This is because the first column spacer 101 has a larger contact area with the TFT array substrate 160 than the second column spacer 103 and has a large force capable of supporting the TFT array substrate with a large area. to be. In addition, the first column spacer 101 has a relatively flat upper surface than the second column spacer 103, and a horizontal cross section of the first column spacer 101 is formed on the color filter array substrate 100. Since there is no significant difference depending on the height from the surface, less column spacers are used than only the second column spacer 103 having a rounded top shape at a pressure less than P1 alone was in contact with the TFT array substrate 160. You can expect variations. In this case, the degree of deformation of the column spacer generated when applying a pressure of P1 or more is very small compared to the degree of deformation occurring above a predetermined pressure (see FIG. 4) due to the limitation of the elastic force of the material forming the column spacer.

As described above, the liquid crystal display according to the first exemplary embodiment of the present invention performs an examination of the degree of deformation of the column spacer at a predetermined pressure or more, and the coating unevenness occurs when a predetermined external force is applied to a specific portion of the surface of the liquid crystal display. It can be seen that the poor poor) can be improved.

In the conventional liquid crystal display device, uneven coating occurs when a predetermined pressure or more is locally applied to a predetermined portion of the substrate back surface of the liquid crystal display device. The reason for the occurrence is that the supporting force of the column spacer of the corresponding portion is lower than that of the applied pressure. Because it is known.

The liquid crystal display according to the first exemplary embodiment of the present invention includes a first column spacer 101 having a lower upper surface and a flat upper surface than the second column spacer 103 maintaining a cell gap. Therefore, even if a predetermined pressure or more is applied, the support force between the two substrates of the column spacers is increased. Therefore, a certain degree of resistance is generated to the pressure for pressing the local predetermined site, so that the shape of the column spacers is maintained, thus minimizing the occurrence of paint stains. In this case, above the predetermined pressure, the first column spacer functions as a pressing failure preventing spacer.

On the other hand, the liquid crystal display according to the first embodiment of the present invention can also expect the effect that can prevent the touch failure.

When bonding, only the second column spacer 103 supports the color filter array substrate 100 and the TFT array substrate 160. The rounded top surface of the second column spacer 103 contacts the TFT array substrate 160 when the touch sweeps down the surface (back) of the color filter array substrate 100 or the TFT array substrate 160. Since the contact area between the two-column spacer and the TFT array substrate 160 is very small, and in this case, the frictional force due to the contact area is also small, it is easy to recover the shift between the TFT array substrate 160 and the color filter array substrate due to the touch. As a result, recovery of normal liquid crystal occurs within a short time, and touch failure is hardly observed. Here, the pressure applied to the TFT array substrate 160 or the color filter array substrate 100 at the time of touch is a very small pressure change compared to the bonding pressure, and the pressure at the touch is similar to the bonding pressure, and therefore, the touch The degree of deformation of the column spacer at the time may be observed at a pressure below P1 on the graph.

Meanwhile, the liquid crystal display according to the first exemplary embodiment of the present invention may be applied to both an in-plane switching mode or a twisted nematic mode.

First, a case in which the liquid crystal display according to the first exemplary embodiment of the present invention is applied to the transverse electric field mode will be described.

FIG. 11 is a plan view illustrating a case in which the liquid crystal display device of the present invention is applied to a transverse electric field mode, and FIG. 12 is a cross-sectional view taken along line III-III ′ of FIG. 11.

11 and 12, the liquid crystal display according to the first exemplary embodiment of the present invention includes a color filter array substrate 100 and a TFT array substrate 160 bonded to each other with a predetermined space, and the color filter array substrate 100. ) And a liquid crystal layer (not shown) formed between the TFT array substrate 160.

In more detail, the color filter array substrate 100 may include a black matrix layer on the first substrate 110 to block light of portions (gate lines and data line regions and thin film transistor regions) except for pixel regions. 111, a color filter layer 112 formed of R, G, and B color films 112a, 112b, and 112c having different heights is formed to correspond to each pixel area, and to form a color. On the black matrix layer 111 and the color filter layer 112, an overcoat layer 113 having a thin thickness is formed on the entire surface so that the step of the color filter layer 112 is maintained as it is.

A first column spacer 101 having a flat surface and a second column spacer 103 having a rounded surface are formed on the surfaces of the overcoat layer 113 having different heights. In this case, the first column spacer 101 is formed to correspond to a portion of the color filter layer 112 having a low level, and the second column spacer 103 is formed to correspond to a portion of a high level. This result results in the second column spacer 103 being in contact with the TFT array substrate relatively faster than the first column spacer 101 when bonded.

The first column spacer 101 and the second column spacer 103 may be formed of a photocurable resin such as photoacryl or a low dielectric constant (for example, having a dielectric constant of 2.0 or less) in which a pattern is formed by mainly reacting with light. Polyimide or the like (see the column spacer manufacturing method of FIGS. 6 and 7, except that FIG. 6 shows a manufacturing method of the column spacer when formed of a photocurable resin).

On the other hand, the TFT array substrate 160 facing the color filter array substrate 100 crosses vertically on the second substrate 120 to define a plurality of gate lines 121 and data lines 122. ) And pixel electrodes 123 and common electrodes 127a that alternate with each other to form a transverse electric field, are formed in each pixel area, and the gate line 121 and the data line 122 cross each other. Thin film transistors are formed. Further, a common line 127 disposed in the pixel parallel to the gate line 121 and a storage electrode 123a extending from the pixel electrode 123 and overlapping the common line 127 are further provided. .

Specifically, the common line 127 and the common electrode 127a are integrally formed and simultaneously formed with the gate line 121, and include copper (Cu), aluminum (Al), chromium (Cr), and molybdenum (Mo). ) And low resistance metals such as titanium (Ti).

The pixel electrode 123 is alternately formed with the common electrode 127a. The pixel electrode 123 may be formed at the same time as the data line 122 or may be formed on different layers (not shown in FIG. city).

In this case, the common electrode 127a and the pixel electrode 123 may cross each other in a straight line shape or may be formed in a zigzag shape as shown in the figure.

An insulating film is further provided between the two layers of the common electrode 127a and the pixel electrode 123, which is an insulating film such as the gate insulating film 125 or the protective film 126.

Hereinafter, the manufacturing method of the liquid crystal display device according to the first embodiment of the present invention applied to the transverse electric field mode will be described (see FIGS. 6 to 12).

First, the manufacturing method of the color filter array substrate 100 is demonstrated.

A black matrix layer 111 is formed on the first substrate 110 to cover a portion except the pixel region (a gate line, a data line region, and a thin film transistor region).

Subsequently, the color is partially overlapped with the black matrix layer 111, and a color is formed in a portion corresponding to each pixel area, and is formed of R, G, and B color films 112a, 112b, and 112c having different heights. The filter layer 112 is formed. At this time, the maximum step that the R, G, B color film (112a, 112b, 112c) can have is within 4000 kPa.

Subsequently, the overcoat layer formed on the first substrate 110 including the black matrix layer 111 and the color filter layer 112 to have a thin thickness of about 1000 μs so that the level difference of the color filter layer 112 can be maintained. 113 is formed entirely.

Subsequently, a material layer of photocurable resin or polyimide having a predetermined thickness is applied to the entire surface of the overcoat layer 113 having different heights.

Subsequently, the material layer is exposed and developed by using a mask 150 having a large transmissive portion 150a for a portion having a low level and a transmissive portion 150c having a small size for a portion having a high level. For the portion having a low step, the first column spacer 101 having a flat surface is formed, and for the portion having the high step, the second column spacer 103 with a rounded surface is formed. At this time, the exposure using the mask 150 is performed once.

The method of forming the first and second column spacers 101 and 103 may be a negative or positive photocurable resin or an organic insulating film having a low dielectric constant such as polyimide. Have a difference.

For example, when the material layer is a negative photocurable resin, the first and second column spacers may be formed by preparing a mask in which the second transmission part is omitted in the masks of FIGS. 6 and 7.

That is, the negative photocurable resin is entirely coated on the color filter array substrate 100 on which the color filter array process is completed with a predetermined thickness.

The first stepped portion 150a of the first cross-sectional area corresponds to a region where the level difference of the color filter array substrate 100 is low on the color filter array substrate 100, and corresponds to the area where the level difference is high on the second substrate. The mask 150 having the second transmissive portion 150c of the second cross-sectional area (<first cross-sectional area) and having the light shielding portion 150d in the remaining area is aligned.

Subsequently, the negative photocurable resin is exposed and developed by using the mask 150 to respectively correspond to the first column spacer 101 at a portion corresponding to the first transmission portion 150a and the second transmission portion 150c. The second column spacer 103 is formed at the site.

When the material forming the first and second column spacers 101 and 103 is formed of a positive photocurable resin, the patterns of the openings and the light blocking portions of the mask 150 are reversed, and the first and second column spacers are reversed. To form.

That is, in this case, the shape of the mask corresponds to a region having a low level on the color filter array substrate 100 and has a first light blocking portion 150a of a first cross-sectional area, and has a level on the second substrate. Corresponds to a region having a second light shielding portion (corresponding to the size of 150c) having a second cross-sectional area (<first cross-sectional area), and the remaining region has a transmission portion.

In addition, when the material layer is an organic insulating film such as polyimide, after applying a photoresist film on the material layer, patterning the photoresist film, and selectively removing the material layer by using the patterned photoresist film, Form two column spacers. In this case, the etching of the material layer is further performed in addition to the exposure and development processes.

On the other hand, the manufacturing process of the TFT array substrate 160 is performed as follows.

First, a metal material such as Mo, Al, or Cr is deposited on the second substrate 120 by sputtering, and then the metal material is patterned by a photolithography process to form a plurality of gate lines 121 and the gate lines 121. ) To form a gate electrode 121a. In the same process, the common line 127 is formed in parallel with the gate line 121, and the common electrode 127a protruding in a zigzag pattern from the common line 127 is formed in the pixel area.

Subsequently, an insulating material such as SiNx is deposited on the second substrate 120 including the gate line 121 to form a gate insulating film 125, and a semiconductor layer material (amorphous) is formed on the gate insulating film 125. The semiconductor layer 124 is formed on the gate insulating layer 125 on the gate electrode 121a by depositing and patterning a silicon layer and a doped silicon layer. The semiconductor layer 124 is formed by continuously depositing an amorphous silicon layer and a silicon layer doped with phosphorus (P) at a high concentration, and then simultaneously patterning the amorphous silicon layer and the doped silicon layer.

In addition, a metal material such as Mo, Al, or Cr is deposited on the entire surface by a sputtering method, and the metal material is patterned by a photolithography process to form the data line 122 in a direction perpendicular to the gate line 121. Source electrodes 122a and drain electrodes 122b are formed on both sides of the semiconductor layer 124. The source electrode 122a is formed to protrude from the data line 122. In a source / drain electrode patterning process, the doped silicon layer between the source electrode 122a and the drain electrode 122b is removed.

Subsequently, a passivation film 126 made of SiNx is deposited on the entire surface of the substrate including the source electrode 122a and the drain electrode 122b by chemical vapor deposition (CVD). An inorganic material such as SiNx is mainly used as a material of the protective film 126. In order to improve the opening ratio of a liquid crystal cell, an organic material having a low dielectric constant such as BCB (BenzoCycloButene), Spin On Glass (SOG), or Acryl is used. have.

A portion of the passivation layer 126 on the drain electrode 122b is selectively etched to form a contact hole exposing a portion of the drain electrode 122b and electrically connected to the drain electrode 122b through the contact hole. The transparent conductive film is sputtered and deposited on the passivation layer 126 to be removed, and then selectively removed to remain only in the pixel region to form a zigzag pattern pixel electrode 123 alternately with the common electrode 127.

Subsequently, although not shown in the drawing, an alignment layer is formed on the entire surface of the TFT array substrate 160 facing the color filter array substrate 100 on which the first and second column spacers 101 and 103 are formed, and rubbing. )

Subsequently, the color filter array substrate 100 including the TFT array substrate 160 and the first and second column spacers 101 and 103 on which the alignment process is completed is cleaned.

Subsequently, liquid crystal is dropped into the display area on one of the TFT array substrate 160 and the color filter array substrate 100. Subsequently, a seal pattern is formed on the outer periphery of the display area of the remaining substrate where the liquid crystal is not dropped by using a dispensing device. At this time, the liquid crystal can also be dropped on one of the two substrates, and a seal pattern can also be formed.

Subsequently, the substrate on which the liquid crystal is not dropped is inverted (inverted to face each other) (in FIG. 12, the color filter array substrate 100 is inverted), and the TFT array substrate and the color filter array substrate are pressed together and pressed together. The yarn pattern is cured.

Subsequently, the bonded substrate is cut and processed for each liquid crystal panel.

In addition, the liquid crystal display device is manufactured by inspecting appearance and electrical defects of the processed unit liquid crystal panel.

FIG. 13 is a plan view illustrating a liquid crystal display device in which a liquid crystal display device according to a first embodiment of the present invention is implemented in a TN mode, and a cross-sectional view of a gate line on which first and second column spacers are formed is the same as FIG. 12.

12 and 13, the liquid crystal display according to the first exemplary embodiment of the present invention according to the TN mode includes a color filter array substrate 100 and a TFT array substrate 160 bonded to each other with a predetermined space, and the color filter. It consists of a liquid crystal layer (not shown) formed between the array substrate 100 and the TFT array substrate 160.

In more detail, the color filter array substrate 100 may include a black matrix layer on the first substrate 110 to block light of portions (gate lines and data line regions and thin film transistor regions) except for pixel regions. 111, a color filter layer 112 formed of R, G, and B color films 112a, 112b, and 112c having different heights is formed to correspond to each pixel area, and to form a color. The common electrode (corresponding to 113 of FIG. 12) formed on a thin thickness is formed on the black matrix layer 111 and the color filter layer 112 so that the step of the color filter layer 112 is maintained.

A first column spacer 101 having a flat surface and a second column spacer 103 having a rounded surface are formed on the surfaces of the common electrode 113 having different heights. In this case, the first column spacer 101 is formed to correspond to a portion of the color filter layer 112 having a low level, and the second column spacer 103 is formed to correspond to a portion of a high level. This result results in the second column spacer 103 being in contact with the TFT array substrate relatively faster than the first column spacer 101 when bonded.

The first column spacer 101 and the second column spacer 103 may be formed of a photocurable resin such as photoacryl or a low dielectric constant (for example, having a dielectric constant of 2.0 or less) in which a pattern is formed by mainly reacting with light. Polyimide or the like (see the column spacer manufacturing method of FIGS. 6 and 7, except that FIG. 6 shows a manufacturing method of the column spacer when formed of a photocurable resin). Here, the heights of the first and second column spacers 101 and 103 themselves are the same, so that the heights of the first and second column spacers 101 and 103 are the same. The vertex of the contact surface with) is different.

Accordingly, in the TFT array substrate 160 facing the first and second column spacers 101 and 103, the second column spacer 103 first contacts the TFT array substrate 160 when pressed. The one-column spacer 101 is brought into contact with the TFT array substrate 160 only when the pressurization pressure is increased, that is, a predetermined pressure or more.

On the other hand, the TFT array substrate 160 facing the color filter array substrate 100 vertically intersects the second substrate 120 to define a plurality of gate lines 121 and data lines 122 defining pixel regions. The pixel electrode 123 is formed in each pixel area, and the thin film transistor is formed at a portion where the gate line 121 and the data line 122 cross each other.

In the liquid crystal display of the TN mode, the manufacturing process is performed in the transverse electric field mode except that the pixel electrode 123 is formed as one in the pixel region defined by the gate line 121 and the data line 122. Almost similar to the device.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to a second embodiment of the present invention will be described with reference to the drawings.

14 is a cross-sectional view illustrating a column spacer and a method of manufacturing the same according to a second exemplary embodiment of the present invention, and FIG. 15 is a plan view illustrating a mask used in FIG. 14.

As shown in FIGS. 14 and 15, the liquid crystal display according to the second exemplary embodiment may include first and second column spacers 201 and 202 having different heights on surfaces of the same height of the color filter array substrate 200. ) Is formed.

In the liquid crystal display according to the second embodiment of the present invention, the first and second column spacers 201 and 202 are formed to simultaneously form the first and second column spacers 201 and 202 having different heights. The transflective portion 250a and the transmissive portion 250b respectively align the corresponding mask 250. Here, the mask 250 defining the first and second column spacers 201 and 202 is defined as the transflective portion 250a, the transmissive portion 250b, and the remaining region as the light blocking portion 250c.

Here, it is assumed that the material forming the first and second column spacers 201 and 202 is a negative photocurable resin.

A plurality of minute slits are formed in the semi-transmissive portion 250a of the mask 250, and when exposing using the mask 250, diffraction exposure occurs when the semi-transmissive portion 250a corresponds to the semi-transmissive portion 250a of the mask 250. In this case, general exposure occurs at a portion corresponding to the transmissive portion 250b of the mask 250. Therefore, the exposure amount is relatively low as compared with the transmissive portion 250b of the mask 250. As a result, each of the portions of the negative photocurable resin corresponding to the semi-transmissive portion 250a and the transmissive portion 250b of the mask has a difference in exposure amount, and the portions corresponding to the portions having a small exposure amount have a negative photocurable resin of a certain height. Is removed to form a first column spacer 201 having a first height H3, and after the exposure and development, corresponding to the transmission portion 250b, the second height H4 > Resin remains to form the second column spacer 202.

On the other hand, when the material forming the first and second column spacers is formed of positive photocurable resin, the pattern of the opening of the light shielding portion in the mask is reversed to form the column spacers having the same shape. This is possible.

When the material constituting the first and second column spacers is an organic insulating film such as polyimide, the photosensitive film is coated on the organic insulating film, and then exposed to the photosensitive film by using a mask having the same shape as the above-described mask. After the development process is performed to form the photoresist pattern, the organic insulating layer may be patterned using the photoresist pattern to form first and second column spacers.

16 is a graph illustrating a deformation degree of a column spacer according to a pressure of a liquid crystal display according to a second exemplary embodiment of the present invention.

As shown in FIG. 16, in the liquid crystal display according to the second embodiment of the present invention, when the color filter array substrate 200 is inverted to face the TFT array substrate 260, an initial pressure is not applied between the two substrates. In the state of, only the second column spacer 202 having a high height is in contact with the TFT array substrate 260.

In this state, when the pressure is gradually applied to the surface of the color filter array substrate 200, the second column spacer 202 is pressed and the height of the second column spacer 103 is reduced by the amount of pressure. . This means that a change in the shape of the second column spacer 130 has occurred by a decrease in height. In this case, the deformation degree of the second column spacer 202 is a level proportional to the pressure applied to the surface of the color filter array substrate 200.

On the other hand, it is assumed that the pressure applied to the surface of the color filter array substrate 200 is evenly applied over the entire surface of the substrate.

In addition, it is assumed that the pressure at the time of bonding between the actual color filter array substrate 200 and the TFT array substrate 260 becomes less than P2 in the graph. Therefore, only the second column spacer 202 supports the two substrates at the time of bonding.

The initial pressure (pressure gradually increasing between 0 and less than P1) applied to the surface of the color filter array substrate 200 is predetermined between two substrates when the color filter array substrate 200 and the TFT array substrate 260 are bonded together. It is a pressure applied until the two substrates are fixed to each other by a seal pattern (not shown) formed on the outer side of one substrate having a cell gap of. In this case, the second column spacer 202 functions as a cell spacer for maintaining the cell gap.

When the pressure is gradually increased to apply a pressure of P2 or more to the surface of the color filter array substrate 200, both the second column spacer 202 and the first column spacer 201 are applied to the TFT array substrate 260. Contact. In this case, an initial pressure at which the first and second column spacers 201 and 202 are in contact is P2, and after contact of the first column spacer 201, the column spacer 201, The deformation of 202 is noticeably reduced. This is because the first column spacer 201 has a larger contact area with the TFT array substrate 260 than the second column spacer 202 and has a large force that can support the TFT array substrate as the area is larger. to be. In this case, the degree of deformation of the column spacer that occurs when a pressure of P2 or more is applied is very small compared to the degree of deformation occurring above a predetermined pressure (see FIG. 4) due to the limitation of the elastic force of the material forming the column spacer.

As described above, the liquid crystal display device according to the second exemplary embodiment of the present invention performs an examination of the degree of deformation of the column spacer at a predetermined pressure or more, and the coating unevenness generated when a predetermined external force is applied to a specific portion of the surface of the liquid crystal display device It can be seen that the poor poor) can be improved.

In the conventional liquid crystal display device, uneven coating occurs when a predetermined pressure or more is locally applied to a predetermined portion of the substrate back surface of the liquid crystal display device. It is known to be low.

Since the liquid crystal display according to the second exemplary embodiment of the present invention includes the first column spacer 201 having a relatively lower height than the second column spacer 202 holding the cell gap, the predetermined pressure P2 is achieved. When the above application, the separate first column spacers 201 increase the holding force between the two substrates 200 and 260. Therefore, a certain resistance is generated to the pressure for pressing the local predetermined site, so that the shape of the column spacers 201 and 202 is maintained, thereby minimizing the occurrence of paint stains. In this case, above the predetermined pressure, the first column spacer 201 functions as a deterioration preventing spacer.

Hereinafter, a liquid crystal display and a manufacturing method thereof according to the second embodiment will be described with reference to the drawings.

FIG. 17 is a plan view illustrating a color filter array substrate of a liquid crystal display according to a second exemplary embodiment of the present invention, and FIG. 18 is a cross-sectional view taken along line IV to IV ′ of FIG. 17.

As shown in FIGS. 17 and 18, the color filter array substrate 200 of the liquid crystal display according to the second exemplary embodiment of the present invention is a black matrix layer 211 formed on an area of the first substrate 210 except for the pixel region. And a common electrode or overcoat layer formed on the entire surface of the substrate including the color filter layer 212 and the color filter layer 212 overlapping the black matrix layer 211 in the vertical direction and having a stripe shape. 213).

In this case, whether the layer 213 formed on the front surface of the substrate is a common electrode or an overcoat layer may be determined whether the liquid crystal display including the color filter array substrate is in twisted nematic (TN) mode or in-plane switching (IPS) mode. Is determined accordingly. In the case of TN mode, it is a common electrode, and in the case of IPS mode, it is an overcoat layer.

The color filter layer 212 may include R, G, and B color films 212a, 212b, and 212c, and the R, G, and B color films 212a, 212b, and 212c may each have no step. It is assumed to be negligible due to the deposition of the common electrode or overcoat layer 213. Here, as shown in the drawing, the first color film 212a may be an R color film or another color film.

In the liquid crystal display and the manufacturing method thereof according to the second embodiment of the present invention, the transmissive part and the transflective part are defined together in one mask, and thus, the first and second column spacers are formed at different heights. Except for the above, the first and second column spacers are defined through a single exposure process using a mask, and other structures and manufacturing methods of the liquid crystal display and the manufacturing method thereof according to the first embodiment are described. Follow.

The liquid crystal display according to the second exemplary embodiment of the present invention includes the first and second column spacers 201 and 202 formed at different heights to control the holding force in step with respect to an external force applied to the liquid crystal panel. Therefore, touch failure and cell gap can be maintained stably. That is, when the bonding process is pressed or touched, only the second column spacer 202 is in contact with the TFT array substrate 260 with respect to the entire column spacer, so that the contact area can be reduced, thereby minimizing the frictional force to minimize the touch failure. In addition, when a predetermined pressure or more is applied to the panel, the first and second column spacers 201 and 202 increase the holding force for maintaining the cell gap, thereby resulting in resistance against external force and poor in-press. You can prevent it.

The liquid crystal display of the present invention as described above and a method of manufacturing the same have the following effects.

It is possible to form column spacers having different shapes or different heights through a single exposure and development process using one mask.

Each area of the mask has a different size, and the top surface is rounded and flat, so that the column spacers having different shapes can be formed. It can be different. This has the effect of reducing the contact area when the local area of the panel is pressed below a certain pressure, thereby improving touch defects, and increasing the resistance to pressing when the pressure is exceeded, so that the cell gap is spread over the entire area of the panel. It can be kept stable.

In addition, a pattern having a different pattern for each area of the mask, that is, a pattern having a simple opening pattern in one area and a plurality of micro slits in another area is formed so that general exposure is achieved through the simple opening pattern. In addition, diffraction exposure may be performed through the pattern having the plurality of micro slits. By using column spacers having different heights, the support force can be controlled step by step with respect to an external force applied to the panel, thereby improving both touch failure and depression failure.

As such, by reducing the degree of deformation of the column spacer to a predetermined pressure or more through column spacers having different shapes or column spacers having different heights, the cell gap can be more stably maintained over the entire panel.

Claims (37)

A first substrate on which a TFT array is formed; A second substrate on which a color filter array having a step is formed on a surface of the first substrate opposite to the TFT array; A first column spacer formed in a region having a low step height on the second substrate; A second column spacer formed in a region having a high level on the second substrate, the second column spacer having an upper surface rounded to face the first substrate; And And a liquid crystal layer filled between the first and second substrates. The method of claim 1, And the second column spacer contacts the first substrate first compared to the first column spacer when the pressure is applied to the surface of the first substrate or the second substrate at a uniform pressure. The method of claim 1, And the first column spacer and the second column spacer are formed at the same height from the surface of each second substrate. The method of claim 1, And a cross-sectional area of an upper surface of the first column spacer facing the first substrate is greater than a cross-sectional area of an upper surface of the second column spacer. The method of claim 1, At a point in time when both the first column spacer and the second column spacer are in contact with the first substrate, the contact area with the first substrate is larger than that of the second column spacer. A liquid crystal display device, characterized in that. The method of claim 1, The TFT array includes a gate line and a data line crossing each other on the first substrate and defining a pixel region, a thin film transistor formed at an intersection of the gate line and the data line, and a pixel electrode formed at the pixel region. Done, The color filter array may include a black matrix layer formed on the second substrate to cover the gate line, the data line, and the thin film transistor, and a color filter layer formed on the second substrate including the black matrix layer in the direction of the data line. And a common electrode formed on an entire surface of the second substrate including the black matrix layer and the color filter layer. The method of claim 6, And a black matrix layer, a color filter layer, and an overcoat layer are formed under the first and second column spacers. The method of claim 6, The color filter layer is a liquid crystal display comprising a R, G, B color film. The method of claim 8, The color filter layer has a different thickness for each color film. The method of claim 9, The maximum level | step difference which each said color film has is 4000 micrometers or less, The liquid crystal display device characterized by the above-mentioned. The method of claim 6, And the first and second column spacers are formed corresponding to the gate line or the data line. The method of claim 1, The TFT array may include a thin film transistor formed on a gate line and a data line crossing each other on the first substrate and defining a pixel area, a common line formed in parallel with the gate line, and an intersection area of the gate line and the data line. And a pixel electrode and a common electrode which are alternately formed in the pixel region. The color filter array may include a black matrix layer formed on the second substrate to cover the gate line, the data line, and the thin film transistor, and a color filter layer formed on the second substrate including the black matrix layer in the direction of the data line. And an overcoat layer formed on the entire surface of the second substrate including the black matrix layer and the color filter layer. The method of claim 12, And a black matrix layer, a color filter layer, and an overcoat layer are formed under the first and second column spacers. The method of claim 12, The color filter layer is a liquid crystal display comprising a R, G, B color film. The method of claim 14, The color filter layer has a different thickness for each color film. The method of claim 15, The maximum level | step difference which each said color film has is 4000 micrometers or less, The liquid crystal display device characterized by the above-mentioned. The method of claim 12, And the first and second column spacers are formed on any one of a gate line, a data line, and a common line. The method of claim 1, And the first and second column spacers are made of the same mask. The method of claim 1, And a third column spacer having a shape different from that of the first and second column spacers is formed at a predetermined portion on the second substrate having a step different from the portion where the first and second column spacers are formed. Forming a TFT array on the first substrate; Forming a color filter array having a step on a second substrate; Applying a photocurable resin to the entire surface of the second substrate including the color filter array; Aligning, on the second substrate, a mask in which openings and openings of different sizes are defined according to a step on the second substrate; The photocurable resin is selectively removed through one exposure and development using the mask, and the first column spacer and the region having a high level on the second substrate correspond to a region having a low level on the second substrate. Forming a second column spacer having a corresponding rounded top surface; Dropping liquid crystal onto the first or second substrate; And And bonding the first and second substrates together. The method of claim 20, Said photocurable resin is negative photocurable resin, The manufacturing method of the liquid crystal display device characterized by the above-mentioned. The method of claim 21, The mask has a first transmissive portion having a first cross-sectional area corresponding to a region having a low level on the second substrate, and a second cross-sectional area smaller than the first cross-sectional area (<first cross-sectional area) corresponding to a region having a high level on the second substrate. And a second light transmitting portion, and the remaining region has a light shielding portion. The method of claim 20, Said photocurable resin is positive photocurable resin, The manufacturing method of the liquid crystal display device characterized by the above-mentioned. The method of claim 23, wherein The mask has a first light blocking portion having a first cross-sectional area corresponding to a region having a low level on the second substrate, and has a second cross-sectional area smaller than the first cross-sectional area corresponding to a region having a high level on the second substrate (< And a second light shielding portion of one cross-sectional area, and the remaining region has a transmissive portion. The method of claim 20, And the first column spacer and the second column spacer are formed at the same height from the surface of each forming portion of the second substrate. The method of claim 20, Forming the color filter array Forming a black matrix layer on a predetermined region of the second substrate; Forming a color filter layer on the second substrate including the black matrix layer; And And forming a common electrode on the entire surface of the second substrate including the color filter layer. The method of claim 26, The color filter layer includes R, G, and B color films, and has a different thickness for each color film. The method of claim 27, The maximum level | step difference which each said color film has is 4000 micrometers or less, The manufacturing method of the liquid crystal display device characterized by the above-mentioned. The method of claim 20, Forming the color filter array Forming a black matrix layer on a predetermined region of the second substrate; Forming a color filter layer on the second substrate including the black matrix layer; And And forming an overcoat layer on the entire surface of the second substrate including the color filter layer. The method of claim 29, The color filter layer includes R, G, and B color films, and has a different thickness for each color film. The method of claim 30, The maximum level | step difference which each said color film has is 4000 micrometers or less, The manufacturing method of the liquid crystal display device characterized by the above-mentioned. Forming a TFT array on the first substrate; Forming an array of color filters on a second substrate; Applying a photocurable resin on the entire surface of the second substrate including the color filter array; Aligning a mask on which a transmissive part, a transflective part, and a light shielding part are defined on a second substrate including the photocurable resin; The photocurable resin is selectively removed by one exposure and development using the mask, so that a first column spacer having a first height on the second substrate and a second height greater than the first height Forming a second column spacer having a height); Dropping liquid crystal onto the first substrate; And And bonding the first and second substrates together. The method of claim 32, Wherein each portion of the second substrate on which the first and second column spacers are formed is a surface without a step. The method of claim 32, Said photocurable resin is negative photocurable resin, The manufacturing method of the liquid crystal display device characterized by the above-mentioned. The method of claim 34, The mask may have a transflective portion defined at a portion formed on the first column spacer, a transmissive portion may be defined at a portion formed at the second column spacer, and the remaining area may be a light blocking portion. The method of claim 32, Said photocurable resin is positive photocurable resin, The manufacturing method of the liquid crystal display device characterized by the above-mentioned. The method of claim 36, The mask may include a semi-transmissive portion defined at a forming portion of the first column spacer, a light blocking portion at a forming portion of the second column spacer, and a remaining portion may be a transmissive portion.

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