KR20060067163A - Valve system for preventing leakage - Google Patents

Abstract

A valve system is disclosed to prevent the diffusion of leaks from a valve body installed in piping for delivering process gas or chemical. The valve body for adjusting the pressure, flow rate or direction of the process fluid is provided with a housing surrounding the valve body to prevent diffusion of the leakage. The housing and the valve body are connected by connecting piping. The housing is equipped with an inlet port for supplying external air into the housing, and an outlet port for discharging a mixed fluid of the air supplied to the space and the leaked material. Since the mixed fluid is discharged to the exhaust duct through the outlet port, the contamination of the working environment by the leakage can be prevented in advance.

Description

Valve system for preventing leakage

1 is a schematic cross-sectional view for explaining a valve system for preventing leakage according to an embodiment of the present invention.

FIG. 2 is a front view of the valve system for preventing leakage shown in FIG. 1. FIG.

* Description of the symbols for the main parts of the drawings *

50: exhaust duct

100: valve system to prevent leakage

102a: first pipe 102b: second pipe

102b: third pipe 104: valve body

106: housing 106a: first internal piping

106b: second internal pipe 106c: third internal pipe

108: inlet port 110: outlet port

114: connection piping 116: filter

118a: first connecting member 118b: second connecting member

118c: third connecting member 120: opening and closing portion

122: pad 124: tightening part

The present invention relates to a valve for regulating the flow rate and pressure of a process fluid. More specifically, it relates to a valve system used in a semiconductor manufacturing process.

In general, a semiconductor device includes a Fab process for forming an electrical circuit on a silicon wafer used as a semiconductor substrate, an electrical die sorting (EDS) process for examining electrical characteristics of the semiconductor devices formed in the fab process; Each of the semiconductor devices is manufactured through a package assembly process for encapsulating and individualizing the semiconductor devices.

The fab process includes a deposition process for forming a film on a wafer, a chemical mechanical polishing process for planarizing the film, a photolithography process for forming a photoresist pattern on the film, and the photoresist pattern using the photoresist pattern. An etching process for forming the film into a pattern having electrical characteristics, an ion implantation process for implanting ions into a predetermined region of the wafer, a cleaning process for removing impurities on the wafer, and a drying process for drying the cleaned wafer And an inspection step for inspecting the defect of the film or pattern.

The manufacturing process of the semiconductor device as described above is performed in a clean room to which clean air is supplied. The ceiling of the clean room is equipped with a plurality of fan filter units for supplying clean air from the ceiling chamber (ceiling chamber) into the clean room, various process fluids used in the manufacturing process of the semiconductor device below the clean room A utility zone is arranged in which a process fluid supply system for supplying the air and a pressure control system for adjusting the internal pressure of the clean room and the internal pressures of the devices for performing the manufacturing process are disposed. Clean air supplied to the clean room through the fan filter unit is discharged to the utility zone through the bottom panel of the clean room, and circulated through an air circulation duct connecting the ceiling chamber and the utility zone.

The process fluid includes various process gases and chemicals used in the manufacturing process of a semiconductor device, and the process fluid supply system includes the process fluid between the pipes and the pipes for transferring various process fluids. It includes a valve to control the pressure, flow rate or direction of the.

When the process fluid leaks from the valve, the process fluid containing the harmful components is circulated through clean rooms, utility zones, air circulation ducts and ceiling chambers and acts as a contaminant contaminating the working environment. In addition, process defects may occur due to the increase of organic and ionic contamination in the clean room.

In particular, when the three-way valve used in the chemical vapor deposition apparatus has been shown to increase the particles in the clean room 7 to 50 times more than usual. Thus, there is a need for an improved valve system to prevent leakage of process fluids.

An object of the present invention for solving the above problems is to provide a valve system that does not leak the process fluid.

Valve system according to an aspect of the present invention for achieving the above object is connected between the valve body for adjusting the flow rate, pressure or direction of the fluid (fluid), and the pipes for delivering the fluid, the valve And a housing surrounding the valve body to prevent diffusion of leakage generated from the body, and a plurality of internal pipes for connecting the valve body and the pipes.

According to one embodiment of the invention, the valve body is a three-way control valve, and the housing is made of stainless steel.

The housing has an opening and closing portion for opening and closing the housing, and pads are provided for providing a seal between the opening and closing portions.

The housing is equipped with an inlet port for supplying external air to the space in the housing, and an outlet port for discharging the contaminated air in which the air supplied to the space and the leakage material are mixed through the exhaust duct. The outlet port is provided with a filter for filtering the leakage discharged to the exhaust duct. Hepa filter may be used as the filter.

Therefore, the contaminants leaked from the valve body between them do not diffuse into a working environment such as a clean room for performing the manufacturing process of the semiconductor device, and can be effectively removed through the exhaust duct.

Hereinafter, a preferred embodiment of a valve system for preventing leakage according to the present invention will be described in detail with reference to the accompanying drawings.                     

1 is a schematic cross-sectional view illustrating a valve system for preventing leakage according to an embodiment of the present invention, and FIG. 2 is a front view of the valve system for preventing leakage shown in FIG. 1.

1 and 2, the valve system 100 for preventing leakage is shown with a valve body 104 connected between piping 102a, 102b, 102c for delivering process fluid. In order to prevent the leakage of leakage generated from the valve body 104, the housing 106 for sealing the valve body 104, and the internal pipe connecting the valve body 104 and the housing 106 Fields 106a, 106b, and 106c.

The valve body 104 is installed on the pipes 102a, 102b, 102c and is a valve for controlling the flow rate, pressure, or direction of the process fluid. As shown, the valve body 104 connects the first pipe 102a, the second pipe 102b, and the third pipe 102c to each other, but the valve body 104 is a four-way control valve. As such, it may include a valve for controlling the flow rate between the plurality of pipes.

Here, the valve body 104 according to an embodiment of the present invention is a directional control valve. The direction control valve is a valve that controls the direction of the flow of the fluid and controls two or more kinds of process fluids and has two or more ports. In one example, the direction control valve is a three-way control valve used in a chemical vapor deposition apparatus and the like. The three-way control valve is a control valve having three ports, and there are a mixing type used when mixing two kinds of fluids and a dividing type that divides one fluid into two directions.                     

Since the body of a conventional three-way control valve has various connections therein, it is vulnerable to leakage of the process fluid controlled by the valve during operation. Accordingly, the valve system 100 for preventing leakage includes the valve body 104, the housing 106, and the inner pipes 106a, 106b, 106c connecting the housing 106 and the valve body 104. By being integrally formed, leakage from the valve body is prevented from spreading to the outside.

The first internal pipe 106a of the valve system 100 to prevent the leakage connects between the first port 104a and the first pipe 102a, and the second internal pipe 106b connects the second port ( It connects between 104b) and the 2nd piping 102b, and the 3rd internal piping 106c connects between the 3rd port 104c and the 3rd piping 102c.

In addition, the valve system 100 for preventing leakage includes an inlet port 108 for supplying external air to the space 107 between the housing 106 and the pipes 102a, 102b, 102c, And an outlet port 110 installed in the housing 106 for discharging the fluid mixed with the air supplied to the space 107 and the leaked material through the exhaust duct 50.

The space 107 is defined by an inner surface of the housing 106, an outer surface of the valve body 104, and outer surfaces of the inner pipes 106a, 106b, and 106c.

The outlet port 110 and the exhaust duct 50 are connected to each other through a connection pipe 114, and the connection pipe 114 enters the space 107 of the housing 106 through the inlet port 108. It serves as a passage for delivering the mixed gas of the air and the leaked contaminants.

The exhaust duct 50 is connected to not only the connecting pipe 114 but also devices (not shown) for performing a predetermined treatment process on a workpiece such as a silicon wafer or a glass substrate using the process fluid. And a gas scrubber system (not shown) for purifying the gas discharged from the devices.

For example, gas discharged from devices for performing a predetermined processing process on a silicon wafer used as a semiconductor substrate is transferred to the gas scrubber system through the exhaust duct 50 and purified by the gas scrubber system. Then discharged to the gas scrubber system.

Therefore, the diffusion of the leakage leaking from the valve body 104 is blocked by the housing 106, the leakage is discharged through the connecting pipe 114, exhaust duct 50 and the gas scrubber system, Contamination of the working environment, such as a clean room, can be prevented.

The outlet port 110 is provided with a filter 116 for filtering the leakage containing particles. The filter 116 is used to remove particles generated when the valve body 104 is operated. A high efficiency particulate air filter (HEPA filter) or an ultra low penetrating air filter (ULPA filter) may be used. have.

The housing 106 may have the shape shown in FIG. 1, but the present invention is not limited to the shape of the housing 106. The housing 106 may be formed of a stainless steel material.

In addition, the housing 106 is provided with an opening and closing portion 120 for opening and closing the housing 106 when the valve body 104 is maintained or inspected. The opening and closing part 120 may be opened and closed by the tightening part 124. Although not shown, the fastener 124 has a structure capable of easily closing the opening and closing portion 120 so that the process fluid leaked by the valve body 104 does not leak back to the opening and closing portion 120. It is preferable.

The valve system 100 for preventing leakage is a connecting member for connecting between the pipes (102a, 102b, 102c) and the inner pipes (106a, 106b, 106c) at both sides of the housing (106) It further includes the 118a, 118b, 118c. Specifically, the first connection member 118a for connecting the first pipe 102a and the first internal pipe 106a, the second pipe for connecting between the second pipe 102b and the second internal pipe 106b. A third connecting member 118c is provided for connecting between the connecting member 118b, the third pipe 102c, and the third internal pipe 106c.

The connecting members 118a, 118b, and 118c include various fitting members. In addition, although not shown, sealing members such as an O-ring may be interposed between the connecting members 118a, 118b, and 118c and the pipes 102a, 102b and 102c.

In addition, the opening and closing portion 120 is also provided with a pad 122 for providing a seal to the opening and closing portion 120. In this case, the pad 122 may be made of a silicon material. Accordingly, the leakage generated from the valve body 104 is not leaked from the housing 106 by the sealing members and the pad 122 to the exhaust duct 50 through the outlet port 110. May be discharged.

According to the present invention as described above, the valve system for preventing leakage is provided with a valve body for connecting the pipes to each other, and a housing surrounding the valve body, to prevent the diffusion of leakage generated from the valve and Leaks can be discharged through the exhaust duct.

Therefore, it is possible to prevent contamination of the process apparatuses and the clean room system and contamination of the semiconductor substrate by the leakage generated from the valve body installed on the pipe for delivering the process fluid or the exhaust gas.

Therefore, the process defect of the semiconductor device is prevented, and the working environment is contaminated so that workers can work in a comfortable environment, thereby contributing to the improvement of the productivity of the semiconductor device.

In the detailed description of the present invention described above with reference to the preferred embodiments of the present invention, those skilled in the art or those skilled in the art having ordinary skill in the art will be described in the claims to be described later It will be understood that various modifications and variations can be made in the present invention without departing from the scope of the present invention.

Claims (8)

A valve body for regulating the flow rate, pressure, or direction of the fluid; A housing connected between the pipes for delivering the fluid, the housing surrounding the valve body to prevent the diffusion of leakage generated from the valve body; And A valve system for preventing leakage comprising a plurality of internal piping for connecting the valve body and the piping. The valve system of claim 1, wherein the valve body is a three-way control valve. The valve system of claim 1, wherein the housing is made of stainless steel. 4. The valve system of claim 3, further comprising an opening and closing portion for opening and closing the housing. 5. The valve system of claim 4, further comprising pads for providing a seal between the openings and closing parts. The method of claim 1, wherein the housing, An inlet port for supplying outside air to the space in the housing; And And an outlet port for discharging the contaminated air in which the air supplied to the space and the leakage material are mixed through an exhaust duct. 7. The valve system of claim 6, further comprising a filter installed at the outlet port and for filtering the leakage discharged to the exhaust duct. 8. The valve system of claim 7, wherein the filter is a hepa filter.

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