KR20060021990A - Surface treatment method of polyimide film using atmospheric plasma - Google Patents

Surface treatment method of polyimide film using atmospheric plasma Download PDF

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KR20060021990A
KR20060021990A KR1020040070731A KR20040070731A KR20060021990A KR 20060021990 A KR20060021990 A KR 20060021990A KR 1020040070731 A KR1020040070731 A KR 1020040070731A KR 20040070731 A KR20040070731 A KR 20040070731A KR 20060021990 A KR20060021990 A KR 20060021990A
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polyimide film
atmospheric pressure
surface treatment
plasma
pressure plasma
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KR100601308B1 (en
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박수진
이재락
진성열
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한국화학연구원
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12Chemical modification
    • C08J7/16Chemical modification with polymerisable compounds
    • C08J7/18Chemical modification with polymerisable compounds using wave energy or particle radiation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L79/00Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen or carbon only, not provided for in groups C08L61/00 - C08L77/00
    • C08L79/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08L79/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2379/00Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups C08J2361/00 - C08J2377/00
    • C08J2379/04Polycondensates having nitrogen-containing heterocyclic rings in the main chain; Polyhydrazides; Polyamide acids or similar polyimide precursors
    • C08J2379/08Polyimides; Polyester-imides; Polyamide-imides; Polyamide acids or similar polyimide precursors
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L2203/00Applications
    • C08L2203/16Applications used for films

Abstract

본 발명은 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법에 관한 것이다. The present invention relates to a surface treatment method of a polyimide film using atmospheric pressure plasma.

본 발명의 폴리이미드 필름의 표면처리방법은 폴리이미드 필름에 상압플라즈마 세기 150∼300W로 1∼5 분동안 표면처리된 것으로, 소수성의 폴리이미드 필름에 산소를 함유하는 극성 관능기를 도입시켜 친수성을 향상시키고, 표면 자유에너지를 증가시켜 폴리이미드 필름의 젖음성을 향상시킴으로써 폴리이미드 필름과 금속과의 접착력이 개선되도록 한 것이다.The surface treatment method of the polyimide film of the present invention is a surface treatment for 1 to 5 minutes at 150-300W atmospheric pressure strength on the polyimide film, and improves hydrophilicity by introducing a polar functional group containing oxygen into the hydrophobic polyimide film. In order to improve the wettability of the polyimide film by increasing the surface free energy, the adhesion between the polyimide film and the metal is improved.

상압플라즈마, 폴리이미드, 표면처리Atmospheric Plasma, Polyimide, Surface Treatment

Description

상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법{SURFACE TREATMENT METHOD OF POLYIMIDE FILM USING ATMOSPHERIC PLASMA} Surface treatment method of polyimide film using atmospheric pressure plasma {SURFACE TREATMENT METHOD OF POLYIMIDE FILM USING ATMOSPHERIC PLASMA}             

도 1은 본 발명의 상압플라즈마 장치의 개략도를 도시한 도면이고, 1 is a view showing a schematic diagram of an atmospheric pressure plasma apparatus of the present invention,

도 2는 본 발명의 상압플라즈마로 표면처리된 폴리이미드 필름의 FT-IR 결과이고, 2 is an FT-IR result of the polyimide film surface-treated with the atmospheric pressure plasma of the present invention,

도 3은 본 발명의 상압플라즈마로 표면처리된 폴리이미드 필름의 AFM 결과이고, 3 is an AFM result of the polyimide film surface-treated with the atmospheric pressure plasma of the present invention,

도 4는 본 발명의 상압플라즈마로 표면처리된 폴리이미드 필름의 접착강도를 나타내는 도면이다. 4 is a view showing the adhesive strength of the polyimide film surface-treated with the atmospheric pressure plasma of the present invention.

본 발명은 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법에 관한 것으로서, 보다 구체적으로는 최적의 조건으로 고정된 상압플라즈마 장치로부터 발생되는 상압플라즈마를 이용하여 폴리이미드 필름과 금속간의 접착력을 개선시킨 폴리이미드 필름의 표면처리방법에 관한 것이다. The present invention relates to a surface treatment method of a polyimide film using atmospheric pressure plasma, and more specifically, to improve the adhesion between a polyimide film and a metal by using an atmospheric pressure plasma generated from a fixed atmospheric pressure plasma apparatus at an optimal condition. It is related with the surface treatment method of a mid film.

폴리이미드는 우수한 기계적 성질, 내화학성, 내약품성, 고내열성 및 전기 절연성 등 우수한 물성을 지니고 있어서 전기ㆍ전자용 내열 필름, 액정 배향막, 반도체용 소재, 성형부품용 소재, 접착제 등으로 사용되고 있다. 특히, 최근에는 폴리이미드가 전기ㆍ전자용 내열 필름으로서 FPCB(Flexible Printed Circuit Board), TAB(Tape Automated Bondings), 내열전열피복재로서 각광받고 있다. 이중에서 FPCB는 구부릴 수 있고 움직이는 회로를 구성할 수 있으며, 3차원 회로구성 및 고밀도 배선을 할 수 있어 컴퓨터 및 주변기기, 통신장비, 의료장비, 항공우주용 전자장비 등에 널리 사용되고 있다. 이때, FPCB의 절연층으로 사용시 폴리이미드 필름과 도체는 일반적으로 에폭시 및 폴리이미드 등의 접착제를 이용하여 접착시킨다. Polyimides have excellent physical properties such as excellent mechanical properties, chemical resistance, chemical resistance, high heat resistance, and electrical insulation, and thus are used as electric / electronic heat-resistant films, liquid crystal alignment films, semiconductor materials, molded part materials, adhesives, and the like. In particular, recently, polyimides have been in the spotlight as flexible printed circuit boards (FPCBs), tape automated bondings (TABs), and heat-resistant heat-resistant coatings as heat-resistant films for electric and electronic applications. Among them, FPCB can be bent and moveable circuit, 3D circuit configuration and high-density wiring can be widely used in computers and peripherals, communication equipment, medical equipment, aerospace electronic equipment. At this time, when used as an insulating layer of the FPCB, the polyimide film and the conductor are generally bonded using an adhesive such as epoxy and polyimide.

그러나 하기 화학식 1로 표시되는 폴리이미드는 표면에 극성기가 없기 때문에 금속과의 접착력이 떨어져 결국 폴리이미드 필름과 금속간의 박리가 일어난다. However, since the polyimide represented by the following Chemical Formula 1 does not have a polar group on the surface, the adhesion force between the polyimide film and the metal is reduced, resulting in peeling between the polyimide film and the metal.

Figure 112004040209193-PAT00001
Figure 112004040209193-PAT00001

따라서, 폴리이미드 필름의 접착성향에 따른 내구성이 요구되고 있으며, 이러한 폴리이미드 필름의 접착성을 개선하기 위한 연구가 활발히 진행되어 왔다. 그의 일례로서, 대한민국 특허공개공보 제1995-0029297호에서는 아민 용액에 폴리이미드를 침지하는 아민 처리공정 및 아민 처리된 폴리이미드를 건조하는 건조 공정으로 수행하는 폴리이미드의 표면 처리방법을 공지하고 있다. 또한, 대한민국 특허공개공보 제1999-0045681호에서는 방향족 폴리이미드 필름의 접착성을 향상시키는 방법으로서, 방향족 폴리이미드 필름 및 이 필름 상에 형성된 금속 또는 금속 산화물 층으로 구성된 내열성 방향족 폴리이미드/금속(또는 금속 산화물) 복합판에 있어서, 폴리이미드 필름은 방향족 폴리이미드 수지, 및 폴리이미드 수지 내에 분산되어 있고 그 분산된 양이 폴리이미드 필름의 양에 대해 1 내지 1,000 ppm 인 알루미늄 함유물질로 구성되어 금속 또는 금속 산화물 층을 접착제없이 폴리이미드 필름 상에 형성시키는 방법을 개시하고 있다. 또한, 대한민국 특허공개공보 제2002-0077188호에서는 비페닐테트라카르복시산 성분을 갖는 폴리이미드 필름의 표면을 과망간산칼륨 및/또는 과망간산나트륨과 수산화칼륨 및/또는 수산화나트륨을 포함하는 용액에 접촉 처리한 후, 산 처리함으로써 금속과의 접착력을 개선하는 폴리이미드 필름의 표면 처리 방법을 제안한 바 있다.Therefore, durability according to the adhesiveness of the polyimide film is required, and studies for improving the adhesiveness of such polyimide films have been actively conducted. As an example, Korean Patent Laid-Open Publication No. 195-0029297 discloses a surface treatment method of a polyimide that is performed by an amine treatment step of dipping a polyimide in an amine solution and a drying step of drying an amine-treated polyimide. In addition, Korean Patent Laid-Open Publication No. 1999-0045681 discloses a method for improving the adhesion of an aromatic polyimide film, comprising a heat-resistant aromatic polyimide / metal (or an aromatic polyimide film and a metal or metal oxide layer formed on the film). Metal oxide) composite plate, the polyimide film is composed of an aromatic polyimide resin and an aluminum containing material dispersed in the polyimide resin and the dispersed amount is 1 to 1,000 ppm relative to the amount of the polyimide film. A method of forming a metal oxide layer on a polyimide film without adhesive is disclosed. In addition, in Korean Patent Laid-Open Publication No. 2002-0077188, a surface of a polyimide film having a biphenyltetracarboxylic acid component is subjected to contact treatment with a solution containing potassium permanganate and / or sodium permanganate and potassium hydroxide and / or sodium hydroxide, It has been proposed a surface treatment method of a polyimide film which improves adhesion to metal by acid treatment.

그러나 종래 폴리이미드 필름의 접착성을 개선하기 위한 방법들은 폴리이미드 필름의 표면 상을 화학처리하여 표면을 개질하는 방법이 주를 이루고 있다. However, the methods for improving the adhesion of the conventional polyimide film is mainly a method of modifying the surface by chemical treatment on the surface of the polyimide film.

이에, 본 발명자들은 폴리이미드 필름의 접착력을 향상시키는 방법의 일환으로 플라즈마의 세기, 처리시간, 처리속도, 전극과 폴리이미드 시편간의 거리를 최적의 조건으로 고정된 상압플라즈마 장치로부터 발생되는 상압플라즈마를 이용하여 폴리이미드 필름을 표면처리하고, 폴리이미드 필름의 접착력이 개선됨을 확인함으로써, 본 발명을 완성하였다.Therefore, the inventors of the present invention, as part of the method for improving the adhesion of the polyimide film, the atmospheric pressure plasma generated from the atmospheric pressure plasma apparatus is fixed to the optimum conditions of the plasma intensity, processing time, processing speed, the distance between the electrode and the polyimide specimen The present invention was completed by confirming that the polyimide film was used for surface treatment and the adhesion of the polyimide film was improved.

본 발명의 목적은 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법을 제공하는 것이다.An object of the present invention is to provide a surface treatment method of a polyimide film using atmospheric pressure plasma.

본 발명의 다른 목적은 플라즈마의 세기, 처리시간, 처리속도, 전극과 폴리이미드 시편간의 거리를 최적의 조건으로 고정된 상압플라즈마 장치로부터 발생되는 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법을 제공하는 것이다.
It is another object of the present invention to provide a method for surface treatment of polyimide film using atmospheric pressure plasma generated from an atmospheric pressure plasma device in which plasma intensity, processing time, processing speed, and distance between electrodes and polyimide specimens are fixed under optimum conditions. will be.

상기한 본 발명의 목적을 달성하기 위해서, 본 발명은 폴리이미드 필름에 상압플라즈마 세기 150∼300W로 1∼5 분동안 표면처리된 것으로, 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법을 제공한다.In order to achieve the above object of the present invention, the present invention is a surface-treated for 1 to 5 minutes at 150-300W atmospheric plasma strength to a polyimide film, to provide a surface treatment method of a polyimide film using atmospheric plasma.

상기에서 상압플라즈마는 아르곤 가스 98∼99% 및 산소 가스 1∼2%로 이루어진 혼합가스를 캐리어 가스로 사용한 상압플라즈마 발생장치로부터 발생된 것이며, 상기 상압플라즈마 발생장치는 1∼60 mm/min의 처리속도로 수행되고, 전극과 폴리이미드 시편간의 거리를 1∼10 mm로 고정된 것을 특징으로 한다.The atmospheric pressure plasma is generated from an atmospheric pressure plasma generator using a mixed gas composed of argon gas 98 to 99% and oxygen gas 1 to 2% as a carrier gas, and the atmospheric pressure plasma generator is treated at 1 to 60 mm / min. It is carried out at a speed, characterized in that the distance between the electrode and the polyimide specimen is fixed to 1 to 10 mm.

이하, 본 발명을 도면을 참조하여 상세히 설명하고자 한다.Hereinafter, the present invention will be described in detail with reference to the drawings.

본 발명은 폴리이미드 필름에 상압플라즈마 세기 150∼300W로 1∼5 분동안 표면처 리된 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법을 제공한다.The present invention provides a surface treatment method of a polyimide film using atmospheric pressure plasma treated on the polyimide film at atmospheric pressure intensity of 150 to 300 W for 1 to 5 minutes.

도 1은 본 발명의 상압플라즈마 장치의 개략도를 도시한 도면으로서, 주파수는 플라즈마를 안정적으로 형성시키는 13.56 MHz로 고정하였으며, 캐리어 가스의 주입량은 M.F.C (Mass folw controller)를 사용하여 일정하게 유지하였다. 1 is a schematic diagram of an atmospheric pressure plasma apparatus of the present invention, wherein the frequency is fixed at 13.56 MHz to stably form plasma, and the injection amount of carrier gas is kept constant using a mass folw controller (MFC).

본 발명의 상기 상압플라즈마 장치는 캐리어 가스로서, 아르곤 가스 98∼99% 및 산소 가스 1∼2%로 이루어진 혼합가스를 사용하고, 처리속도를 1∼60 mm/min로 수행하고, 전극과 폴리이미드 시편간의 거리를 1∼10 mm로 고정된 것을 특징으로 한다. The atmospheric pressure plasma apparatus of the present invention uses a mixed gas composed of 98 to 99% of argon gas and 1 to 2% of oxygen gas as a carrier gas, and performs a treatment speed at 1 to 60 mm / min. The distance between the specimens is characterized in that fixed to 1 to 10 mm.

도 2는 본 발명의 상압플라즈마로 표면처리된 폴리이미드 필름에 대한 FT-IR 결과로서, 카르복실산의 O-H 스트레칭에 의한 3,600∼3,200 cm-1 영역의 피크가 관찰된다. 따라서 본 발명의 제조방법으로 폴리이미드 필름이 상압플라즈마를 이용하여 표면처리됨으로써, 폴리이미드 필름의 표면에 산소를 함유하는 극성관능기가 도입된다. 따라서 폴리이미드 필름의 표면에 효과적으로 친수성이 부여되어 접착력이 개선될 수 있다. FIG. 2 is an FT-IR result of the polyimide film surface-treated with an atmospheric pressure plasma of the present invention, in which peaks of 3,600 to 3,200 cm −1 region due to OH stretching of carboxylic acid are observed. Therefore, the polyimide film is surface-treated using atmospheric pressure plasma by the manufacturing method of this invention, and the polar functional group containing oxygen is introduce | transduced into the surface of a polyimide film. Therefore, hydrophilicity can be effectively provided to the surface of the polyimide film, thereby improving adhesion.

도 3은 본 발명의 상압플라즈마로 표면처리된 폴리이미드 필름의 AFM 결과로서, 플라즈마 세기가 증가할수록 폴리이미드 필름의 표면 거칠기(Ra)가 증가되고 특히, 플라즈마 세기가 200 W일 때 표면 거칠기(Ra)의 최대값을 나타낸다. 따라서 폴리이미드 필름에 상압플라즈마를 이용하여 표면처리함으로써, 폴리이미드 필름의 표면 거칠기(Ra)가 증가되어 금속과의 접착력이 개선될 수 있다. 3 is an AFM result of the polyimide film surface-treated with the atmospheric pressure plasma of the present invention. As the plasma intensity increases, the surface roughness Ra of the polyimide film increases. In particular, when the plasma intensity is 200 W, the surface roughness Ra Represents the maximum value. Therefore, by surface treatment using atmospheric pressure plasma on the polyimide film, the surface roughness (Ra) of the polyimide film is increased to improve the adhesion to the metal.

또한, 본 발명의 상압플라즈마로 표면처리된 폴리이미드 필름의 표면처리방법은 상 기 표면의 자유에너지를 증가시키며, 이로부터 폴리이미드 필름의 젖음성을 향상시켜 금속과의 접착력을 향상시킬 수 있다.In addition, the surface treatment method of the polyimide film surface-treated with the atmospheric pressure plasma of the present invention increases the free energy of the surface, thereby improving the wettability of the polyimide film can improve the adhesion to the metal.

도 4는 본 발명의 상압플라즈마로 표면처리된 폴리이미드 필름의 접착강도를 나타내는 도면이다. 본 발명의 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법에서 상압플라즈마 세기가 증가할수록 박리 접착강도가 증가하는 결과를 확인함으로써, 폴리이미드 필름이 금속과의 접착력이 약한 종래의 문제점을 개선한 효과가 있다. 4 is a view showing the adhesive strength of the polyimide film surface-treated with the atmospheric pressure plasma of the present invention. In the surface treatment method of the polyimide film using the atmospheric pressure plasma of the present invention, by confirming the result that the peel adhesion strength increases as the pressure of the plasma pressure increases, the effect of the polyimide film has improved the conventional problem of weak adhesion with the metal. have.

또한 본 발명의 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법은 대기압 하에서 별도의 진공장치가 필요없이 상온ㆍ상압에서 수행하므로 공정의 안정성이 부여되고 연속적으로 공정을 수행함으로써, 제조원가를 낮출 수 있는 장점이 있다.In addition, the surface treatment method of the polyimide film using the atmospheric pressure plasma of the present invention is performed at room temperature and atmospheric pressure without the need for a separate vacuum apparatus under atmospheric pressure, so that the stability of the process is given and the process can be performed continuously, thereby reducing the manufacturing cost. There is this.

이하, 실시예를 통하여 본 발명을 보다 상세히 설명하고자 한다. Hereinafter, the present invention will be described in more detail with reference to Examples.

본 실시예는 본 발명을 보다 구체적으로 설명하기 위한 것이며, 본 발명의 범위가 이들 실시예에 한정되는 것은 아니다. This embodiment is intended to illustrate the present invention in more detail, and the scope of the present invention is not limited to these examples.

<실시예 1><Example 1>

상기 화학식 1로 표시되는 50 ㎛의 폴리이미드 필름(Du Pont 사, Kapton)을 25×100 mm의 크기로 잘라 메탄올이 들어있는 초음파기를 이용하여 3회 세척한 후 진공오븐에서 건조하여 전처리하였다. 이후, 전처리된 폴리이미드 필름의 표면을 플라즈마 처리하였다. 50 μm polyimide film (Du Pont Co., Kapton) represented by Chemical Formula 1 was cut to a size of 25 × 100 mm, washed three times using an ultrasonic wave containing methanol, and dried in a vacuum oven to be pretreated. Thereafter, the surface of the pretreated polyimide film was plasma treated.

상기 플라즈마 처리는 상압플라즈마(ATMOSTM-multi, Plasmart)를 사용하였으며(도 1), 산소를 1% 함유한 아르곤(99%) 가스를 캐리어 가스로 이용하였다. 주파수는 플라즈마를 안정적으로 형성시키는 13.56 MHz로 고정하였고, 전압은 150 W를 이용하였다. 캐리어 가스의 주입량은 매스 플로우 컨트롤러(Mass flow controller)를 사용하여 5 L/min으로 유지하였고, 전극과 폴리이미드 필름간의 거리는 아크가 발생하지 않는 4 mm로 고정하였다. 처리시간은 1 min이고, 처리속도는 60 mm/min로 1회 처리하였다. In the plasma treatment, atmospheric pressure plasma (ATMOSTM-multi, Plasmart) was used ( FIG. 1 ), and argon (99%) gas containing 1% oxygen was used as a carrier gas. The frequency was fixed at 13.56 MHz, which stably formed the plasma, and the voltage was 150 W. The injection amount of carrier gas was maintained at 5 L / min using a mass flow controller, and the distance between the electrode and the polyimide film was fixed at 4 mm without arcing. The treatment time was 1 min, and the treatment speed was treated once at 60 mm / min.

<실시예 2><Example 2>

상기 플라즈마 처리과정에서 산소를 1% 함유한 아르곤(99%) 가스를 캐리어 가스로 이용하였고, 플라즈마 주파수를 안정적인 13.56 MHz로 고정하였고, 전극과 폴리이미드 필름간의 거리 4 mm, 처리시간 1 min, 및 처리속도 60 mm/min로 고정한 후, 플라즈마 전압을 200 W로 조정하여 1회 표면처리한 것을 제외하고는, 상기 실시예 1과 동일하게 수행하였다.In the plasma treatment process, argon (99%) gas containing 1% oxygen was used as a carrier gas, and the plasma frequency was fixed at 13.56 MHz, the distance between the electrode and the polyimide film was 4 mm, the treatment time was 1 min, and After fixing at a treatment rate of 60 mm / min, it was carried out in the same manner as in Example 1 except that the surface treatment was performed once by adjusting the plasma voltage to 200 W.

<실시예 3><Example 3>

상기 플라즈마 처리과정에서 산소를 1% 함유한 아르곤(99%) 가스를 캐리어 가스로 이용하였고, 플라즈마 주파수를 안정적인 13.56 MHz로 고정하였고, 전극과 폴리이미드 필름간의 거리 4 mm, 처리시간 1 min, 및 처리속도 60 mm/min로 고정한 후, 플라즈마 전압을 300 W로 조정하여 1회 표면처리한 것을 제외하고는, 상기 실시예 1과 동일하게 수행하였다.In the plasma treatment, argon (99%) gas containing 1% oxygen was used as a carrier gas, and the plasma frequency was fixed at 13.56 MHz, the distance between the electrode and the polyimide film was 4 mm, the treatment time was 1 min, and After fixing at a treatment rate of 60 mm / min, it was carried out in the same manner as in Example 1, except that the surface treatment once by adjusting the plasma voltage to 300 W.

<비교예 1> Comparative Example 1

상기 플라즈마 처리과정에서 산소를 1% 함유한 아르곤(99%) 가스를 캐리어 가스로 이용하였고, 플라즈마 주파수를 안정적인 13.56 MHz로 고정하였고, 전극과 폴리이미드 필름간의 거리 4 mm, 처리시간 1 min, 및 처리속도 60 mm/min로 고정한 후, 플라즈마 전압을 0 W로 조정하여 1회 표면처리한 것을 제외하고는, 상기 실시예 1과 동일하게 수행하였다.In the plasma treatment process, argon (99%) gas containing 1% oxygen was used as a carrier gas, and the plasma frequency was fixed at 13.56 MHz, the distance between the electrode and the polyimide film was 4 mm, the treatment time was 1 min, and After fixing at a treatment rate of 60 mm / min, it was carried out in the same manner as in Example 1, except that the surface treatment once by adjusting the plasma voltage to 0 W.

<실험예 1> 표면특성 분석Experimental Example 1 Surface Characteristic Analysis

1. FT-IR을 이용한 표면특성 분석1. Surface Characteristic Analysis Using FT-IR

상기 실시예 1∼3 및 비교예 1에서 제조된 상압플라즈마 표면처리된 폴리이미드 필름 표면의 관능기의 변화를 확인하기 위하여 하기와 같은 방법으로 분석하였다.In order to determine the change of functional groups on the surface of the atmospheric pressure plasma surface-treated polyimide film prepared in Examples 1 to 3 and Comparative Example 1 was analyzed by the following method.

상기에서 처리된 폴리이미드 필름을 KRS-5 reflection element가 부착된 FT-IR 스펙트럼(Digilab FTS-165 spectrometer)를 이용해서 분석하였으며, 그 결과를 도 2에 나타내었다. The polyimide film treated above was analyzed using a FT-IR spectrum (Digilab FTS-165 spectrometer) to which a KRS-5 reflection element was attached, and the results are shown in FIG. 2 .

도 2에서 보는 바와 같이, 상압플라즈마가 미처리된 비교예 1의 필름에는 관찰되자 않은 카르복실산의 O-H 스트레칭에 의한 3,600∼3,200 cm-1 영역의 피크가 실시예 1∼3에서 표면처리된 필름에서 확인되었다.As shown in FIG. 2, in the film of Comparative Example 1 which was not treated with atmospheric plasma, a peak of 3,600 to 3,200 cm −1 region due to OH stretching of carboxylic acid not observed was observed in the film treated in Examples 1 to 3 Confirmed.

따라서 폴리이미드 필름 표면에 산소를 함유하는 극성관능기의 도입을 확인함으로써, 플라즈마 표면처리를 통해 표면을 효과적으로 친수화시킴으로써 우수한 접착성을 부여할 수 있다. Therefore, by confirming the introduction of oxygen-containing polar functional groups on the surface of the polyimide film, excellent adhesion can be imparted by effectively hydrophilizing the surface through plasma surface treatment.

2. AFM를 이용한 표면특성 분석2. Surface Characteristic Analysis Using AFM

상압플라즈마 처리된 폴리이미드 표면 형태(Morphology)를 AFM(Atomic Force Microscopy, Digital instruments Inc. Nanoscope III mocroscope)을 이용하여 분석하였다. AFM 측정은 상온ㆍ상압 하에서 실시하였으며, 프로파일을 이용하여 표면 거칠기(surface roughness, Ra)를 구하였다. 그 결과를 도 3에 나타내었다.Atmospheric plasma treated polyimide surface morphology (Morphology) was analyzed using AFM (Atomic Force Microscopy, Digital instruments Inc. Nanoscope III mocroscope). AFM measurement was performed at room temperature and normal pressure, and surface roughness (Ra) was calculated | required using the profile. The results are shown in Fig.

도 3에서 보는 바와 같이, 상압플라즈마 처리과정에서 전압 즉, 플라즈마 세기가 증가할수록 표면 거칠기(Ra)가 증가하는 것이 확인되었으며, 플라즈마 세기가 200 W일 때 폴리이미드 필름의 표면 거칠기(Ra)가 최대값을 보였다.As shown in FIG. 3, it was confirmed that the surface roughness Ra increases as the voltage, that is, the plasma intensity increases during the atmospheric pressure plasma treatment, and the surface roughness Ra of the polyimide film is maximum when the plasma intensity is 200 W. Value was shown.

<실험예 2> 표면 자유에너지 측정Experimental Example 2 Surface Free Energy Measurement

상기에서 실시예 1∼3 및 비교예 1에서 제조된 폴리이미드 필름의 표면 자유에너지 변화에 대하여 접촉각 측정 장치를 사용하여 확인하였다. 본 발명에서는 sessile drop 방법 (SEO 300A)을 사용하여 상온에서 폴리이미드 필름의 표면 자유에너지를 측정하였다. 이때, 접촉각 측정을 위해 사용된 접음액은 초증류수와 디아이도메탄(diiodomethane)을 사용하였으며 얻어진 측정값은 10회 실시한 평균값을 나타내었다. 그 결과를 하기 표 1에 기재하였다.The change in surface free energy of the polyimide films prepared in Examples 1 to 3 and Comparative Example 1 was confirmed using a contact angle measuring device. In the present invention, the surface free energy of the polyimide film was measured at room temperature using a sessile drop method (SEO 300A). At this time, the folding liquid used for measuring the contact angle was used as the distilled water and diiodomethane (diiodomethane) and the obtained measured value represents the average value of 10 times. The results are shown in Table 1 below.

플라즈마 처리된 폴리이미드 필름의 접촉각 특성 변화(단위: mJ/m2)Change in contact angle characteristic of plasma treated polyimide film (unit: mJ / m 2 ) 시험편Test piece 실시예 1Example 1 실시예 2Example 2 실시예 3Example 3 비교예 1Comparative Example 1 Specific component,

Figure 112004040209193-PAT00002
Specific component,
Figure 112004040209193-PAT00002
29.6229.62 32.2832.28 33.133.1 6.526.52 London dispersive component,
Figure 112004040209193-PAT00003
London dispersive component,
Figure 112004040209193-PAT00003
42.2642.26 43.1743.17 37.0937.09 40.0140.01
Surface free energy,
Figure 112004040209193-PAT00004
Surface free energy,
Figure 112004040209193-PAT00004
71.8871.88 73.4573.45 70.1970.19 46.5346.53

표 1에서 보는 바와 같이, 상압플라즈마 표면처리에 따라 표면자유에너지 중 비극성 요소는 큰 변화가 없는 반면에 극성요소가 크게 증가하는 것을 관찰할 수 있으며, 극성요소의 증가에 따라 표면자유에너지의 증가를 확인할 수 있다. 이는 상압플라즈마 처리에 따라 산소를 함유한 극성관능기의 증가함으로써, 소수성인 폴리이미드 필름 표면에 친수성이 크게 증가하여 표면자유에너지의 극성요소가 증가한다. 또한 출력 200W로 처리한 필름의 극성요소와 표면자유에너지가 가장 큰 값을 나타냄을 확인할 수 있었다. As shown in Table 1, it can be observed that the nonpolar elements of the surface free energy do not change significantly according to the atmospheric pressure plasma surface treatment, while the polar elements increase greatly, and the surface free energy increases with the increase of the polar elements. You can check it. This is due to the increase in the oxygen-containing polar functional group according to the atmospheric pressure plasma treatment, the hydrophilicity is greatly increased on the surface of the hydrophobic polyimide film to increase the polar component of the surface free energy. In addition, it was confirmed that the polar element and the surface free energy of the film treated with the output 200W showed the largest value.

<실험예 3> 필름의 성분 측정Experimental Example 3 Component Measurement of Film

상기에서 실시예 1∼3 및 비교예 1에서 제조된 폴리이미드 필름의 표면처리에 따른 필름의 화학적 성분을 XPS(ESCALAB MK-II)를 통하여 분석하였다. XPS 측정에 사용된 X-ray 소스는 Mg Kα를 사용하였으며, 챔버 내의 압력은 10-1∼10-9 torr로 조절하였다. The chemical composition of the film according to the surface treatment of the polyimide film prepared in Examples 1 to 3 and Comparative Example 1 was analyzed through XPS (ESCALAB MK-II). The X-ray source used for XPS measurement was Mg Kα, the pressure in the chamber was adjusted to 10 -1 to 10 -9 torr.

실험결과, 상압플라즈마 표면처리된 폴리이미드는 미처리된 필름에 비하여 플라즈마 세기가 증가함에 따라 산소특성의 피크가 크게 증가하였으며, 이는 C=O와 같은 산소를 함유한 관능기가 폴리이미드 필름 표면에 효과적으로 도입되었기 때문으로 판단된다. As a result, the peak of oxygen characteristics of the polyimide treated with atmospheric plasma surface treatment increased with the increase of plasma intensity compared to the untreated film. This means that oxygen-containing functional groups such as C = O are effectively introduced into the polyimide film surface. It is judged because

<실험예 4> 접착력Experimental Example 4 Adhesion 측정Measure

상기에서 실시예 1∼3 및 비교예 1에서 제조된 폴리이미드 필름의 잡착력을 측정하기 위하여 하기와 같은 방법으로 수행하였다.In order to measure the adhesion of the polyimide film prepared in Examples 1 to 3 and Comparative Example 1 was carried out by the following method.

상기 표면처리된 폴리이미드 필름의 접착력을 측정하기 위하여, 접착면으로 제공될 금속은 50㎛의 동박(Fukuda 사)을 사용하였으며, 접착제로는 에폭시 수지(DGEBA, 국도화학 (주), YD-128, E.E.W=185∼190 g/mol, d=1.16 g/cm3)를 사용하였고, 에폭시의 경화제로 4,4-다이아미노 다이페닐 메탄을 사용하였다.In order to measure the adhesion of the surface-treated polyimide film, a metal to be provided as an adhesive surface was used 50 μm copper foil (Fukuda), and as an adhesive an epoxy resin (DGEBA, Kukdo Chemical Co., Ltd., YD-128). , EEW = 185-190 g / mol, d = 1.16 g / cm 3 ), and 4,4-diamino diphenyl methane was used as a curing agent for epoxy.

이후, 상압플라즈마 표면처리에 따른 폴리이미드 필름 및 동박의 접착력은 만능재료 시험기(Universal Testing Machine, Lloyd LR5K)를 사용하여 ASTM 1876-72에 준하여 박리 접착강도를 측정하였다. 접착시편은 접착제인 에폭시 수지를 폴리이미드 필름과 동박 사이에 도입하여 120℃에서 2시간 경화시킨 후 측정하였다. 접착시편의 크기는 25×100 mm이며, constant head speed는 254 mm/min으로 측정하였다. 이에, 플라즈마 전압에 따른 폴리이미드/동박의 접착특성인 박리 접착강도(peel strengths)를 도 4에 나타내었다.Thereafter, the adhesive force of the polyimide film and the copper foil according to the atmospheric pressure plasma surface treatment was measured by using a universal testing machine (Universal Testing Machine, Lloyd LR5K) in accordance with ASTM 1876-72. Adhesive specimens were measured after the epoxy resin as an adhesive was introduced between the polyimide film and the copper foil and cured at 120 ° C. for 2 hours. The size of the adhesive specimen was 25 × 100 mm and the constant head speed was measured at 254 mm / min. Accordingly, peel strengths, which are adhesive properties of polyimide / copper foil according to plasma voltage, are shown in FIG. 4 .

도 4에서 보는 바와 같이, 플라즈마 전압 즉, 플라즈마 세기가 증가할수록 박리 접착강도가 증가하였으며, 특히 플라즈마 전압 200 W인 실시예 2에서 제조된 폴리이미드 필림이 최대 박리 접착강도를 보였다. As shown in FIG. 4, the peel adhesive strength increased as the plasma voltage, that is, the plasma intensity, increased, and in particular, the polyimide film prepared in Example 2 having a plasma voltage of 200 W showed the maximum peel adhesive strength.

상기에서 살펴본 바와 같이, As we saw above,

첫째, 본 발명의 상압플라즈마를 이용한 폴리이미드의 표면처리방법은 폴리이미드 필름의 소수성 표면에 극성관능기를 도입하고 표면 에칭을 통하여 친수화가 부여되 고 젖음성이 향상되어 금속과의 우수한 접착특성을 구현하는 폴리이미드 필름을 제공하였고,First, the surface treatment method of polyimide using the atmospheric pressure plasma of the present invention introduces a polar functional group to the hydrophobic surface of the polyimide film, gives hydrophilization through surface etching, improves the wettability, and implements excellent adhesion property with metal. Provided a polyimide film,

둘째, 본 발명의 폴리이미드의 표면처리방법은 진공이 필요없는 상온ㆍ상압에서 실시하는 상압플라즈마를 이용함으로써, 공정의 안정성이 부여되고, 상기 상압플라즈마 처리가 연속적으로 공정을 수행함으로써, 공정시간을 단축하고 제조원가를 낮출 수 있다.
Second, the surface treatment method of the polyimide of the present invention, by using the atmospheric plasma carried out at room temperature and atmospheric pressure without the need for vacuum, the stability of the process is imparted, and the atmospheric pressure plasma treatment is performed continuously, thereby reducing the process time It can shorten and lower the manufacturing cost.

이상에서 본 발명은 기재된 실시예에 대해서만 상세히 기술되었지만, 본 발명의 기술사상 범위내에서 다양한 변형 및 수정이 가능함은 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 특허청구범위에 속함은 당연한 것이다. Although the present invention has been described in detail only with respect to the embodiments described, it will be apparent to those skilled in the art that various modifications and variations are possible within the technical spirit of the present invention, and such modifications and variations belong to the appended claims. .

Claims (4)

폴리이미드 필름의 표면처리방법에 있어서, 상기 폴리이미드 필름에 상압플라즈마 세기 150∼300W로 1∼5 분동안 표면처리하는 것을 특징으로 하는 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법.The surface treatment method of a polyimide film, The surface treatment method of the polyimide film using atmospheric pressure plasma characterized by surface-treating the said polyimide film by 150-300 W of atmospheric pressure intensity for 1 to 5 minutes. 제1항에 있어서, 상기 상압플라즈마가 아르곤 가스 98∼99% 및 산소 가스 1∼2%로 이루어진 혼합가스를 캐리어 가스로 사용한 상압플라즈마 발생장치로부터 발생되는 것을 특징으로 하는 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법.The polyimide film using atmospheric pressure plasma according to claim 1, wherein the atmospheric pressure plasma is generated from an atmospheric pressure plasma generator using a mixed gas comprising argon gas 98 to 99% and oxygen gas 1 to 2% as a carrier gas. Surface treatment method. 제1항에 있어서, 상기 상압플라즈마가 1∼60 mm/min의 처리속도로 수행된 상압플라즈마 발생장치로부터 발생되는 것을 특징으로 하는 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법.The surface treatment method of a polyimide film using atmospheric pressure plasma according to claim 1, wherein the atmospheric pressure plasma is generated from an atmospheric pressure plasma generating apparatus performed at a treatment speed of 1 to 60 mm / min. 제1항에 있어서, 상기 상압플라즈마가 전극과 폴리이미드 시편간의 거리를 1∼10 mm로 고정한 상압플라즈마 발생장치로부터 발생되는 것을 특징으로 하는 상압플라즈마를 이용한 폴리이미드 필름의 표면처리방법.The surface treatment method of a polyimide film using atmospheric pressure plasma according to claim 1, wherein the atmospheric pressure plasma is generated from an atmospheric pressure plasma generator in which a distance between the electrode and the polyimide specimen is fixed at 1 to 10 mm.
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KR100752780B1 (en) * 2005-12-17 2007-08-29 (주) 플라즈닉스 Methods for Fabricating Polyimide Metal Laminates and Polyimide Metal Laminates Thereto
KR100845329B1 (en) * 2006-10-02 2008-07-10 주식회사 코오롱 Surface modified polyimide film using plasma, its manufacturing method and copper clad laminates
KR100928730B1 (en) * 2007-08-20 2009-11-27 전자부품연구원 Surface protection glass film formation method
EP2285876A1 (en) * 2008-05-27 2011-02-23 AO Technology AG Polymer surface modification

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KR101641537B1 (en) 2014-11-14 2016-07-21 충남대학교산학협력단 Surface Modification Method for Superamphiphilic Surface
KR20230060423A (en) 2021-10-27 2023-05-04 동우 화인켐 주식회사 A laminate structure, hardcoat film including the same, window and display device using the same

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JP4656783B2 (en) 2001-09-18 2011-03-23 積水化学工業株式会社 Method for hydrophilic treatment of polyimide substrate
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KR100752780B1 (en) * 2005-12-17 2007-08-29 (주) 플라즈닉스 Methods for Fabricating Polyimide Metal Laminates and Polyimide Metal Laminates Thereto
KR100845329B1 (en) * 2006-10-02 2008-07-10 주식회사 코오롱 Surface modified polyimide film using plasma, its manufacturing method and copper clad laminates
KR100928730B1 (en) * 2007-08-20 2009-11-27 전자부품연구원 Surface protection glass film formation method
EP2285876A1 (en) * 2008-05-27 2011-02-23 AO Technology AG Polymer surface modification

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