KR20050108954A - 티타늄계 금속의 질화 방법 - Google Patents
티타늄계 금속의 질화 방법 Download PDFInfo
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- KR20050108954A KR20050108954A KR1020040034409A KR20040034409A KR20050108954A KR 20050108954 A KR20050108954 A KR 20050108954A KR 1020040034409 A KR1020040034409 A KR 1020040034409A KR 20040034409 A KR20040034409 A KR 20040034409A KR 20050108954 A KR20050108954 A KR 20050108954A
- Authority
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- South Korea
- Prior art keywords
- nitriding
- gas
- temperature
- titanium
- nitride
- Prior art date
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- 238000005121 nitriding Methods 0.000 title claims abstract description 102
- 238000000034 method Methods 0.000 title claims abstract description 52
- 229910001069 Ti alloy Inorganic materials 0.000 title abstract description 4
- 150000004767 nitrides Chemical class 0.000 claims abstract description 49
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims abstract description 40
- 239000007789 gas Substances 0.000 claims abstract description 35
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims abstract description 28
- 229910052719 titanium Inorganic materials 0.000 claims abstract description 28
- 239000010936 titanium Substances 0.000 claims abstract description 28
- 238000010926 purge Methods 0.000 claims abstract description 27
- 229910052751 metal Inorganic materials 0.000 claims abstract description 26
- 239000002184 metal Substances 0.000 claims abstract description 26
- 238000002294 plasma sputter deposition Methods 0.000 claims abstract description 26
- 229910001873 dinitrogen Inorganic materials 0.000 claims abstract description 18
- 230000000630 rising effect Effects 0.000 claims abstract description 18
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims abstract description 15
- 229910052757 nitrogen Inorganic materials 0.000 claims abstract description 11
- 238000001816 cooling Methods 0.000 claims abstract description 7
- 239000011261 inert gas Substances 0.000 claims abstract description 7
- 229910021529 ammonia Inorganic materials 0.000 claims abstract description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 7
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 claims description 6
- 239000000203 mixture Substances 0.000 claims description 4
- 229910052786 argon Inorganic materials 0.000 claims description 3
- 239000000356 contaminant Substances 0.000 abstract description 8
- 230000004913 activation Effects 0.000 abstract description 3
- 229910002651 NO3 Inorganic materials 0.000 abstract 1
- NHNBFGGVMKEFGY-UHFFFAOYSA-N Nitrate Chemical compound [O-][N+]([O-])=O NHNBFGGVMKEFGY-UHFFFAOYSA-N 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 25
- 150000002739 metals Chemical class 0.000 description 9
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 6
- 239000001301 oxygen Substances 0.000 description 6
- 229910052760 oxygen Inorganic materials 0.000 description 6
- 239000000463 material Substances 0.000 description 5
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 239000001257 hydrogen Substances 0.000 description 3
- 229910052739 hydrogen Inorganic materials 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000011068 loading method Methods 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 238000004381 surface treatment Methods 0.000 description 2
- 229910000975 Carbon steel Inorganic materials 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910001361 White metal Inorganic materials 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 229910021535 alpha-beta titanium Inorganic materials 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000010962 carbon steel Substances 0.000 description 1
- 231100000481 chemical toxicant Toxicity 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000012611 container material Substances 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000006356 dehydrogenation reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000002309 gasification Methods 0.000 description 1
- 238000011534 incubation Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- RYZCLUQMCYZBJQ-UHFFFAOYSA-H lead(2+);dicarbonate;dihydroxide Chemical compound [OH-].[OH-].[Pb+2].[Pb+2].[Pb+2].[O-]C([O-])=O.[O-]C([O-])=O RYZCLUQMCYZBJQ-UHFFFAOYSA-H 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 230000036651 mood Effects 0.000 description 1
- 125000004433 nitrogen atom Chemical group N* 0.000 description 1
- 229910017464 nitrogen compound Inorganic materials 0.000 description 1
- 150000002830 nitrogen compounds Chemical class 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- GECHUMIMRBOMGK-UHFFFAOYSA-N sulfapyridine Chemical compound C1=CC(N)=CC=C1S(=O)(=O)NC1=CC=CC=N1 GECHUMIMRBOMGK-UHFFFAOYSA-N 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000003440 toxic substance Substances 0.000 description 1
- 239000002351 wastewater Substances 0.000 description 1
- 239000010969 white metal Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C14/00—Alloys based on titanium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/02—Pretreatment of the material to be coated
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
- C23C8/24—Nitriding
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
- C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
- C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02365—Forming inorganic semiconducting materials on a substrate
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Abstract
Description
구 분 | 온도 (℃) | 시간 (hours) | 진공도 (mbar) | 분위기 가 스 | 플라즈마 (on/off) |
초기 퍼지단계 | 상온 | - | 0.1∼1000 | N2 또는 불활성 가스 | off |
1차 승온 | 300±50℃ | 0.5∼2 | 0.1∼10 | N2 + H2 | on 또는 off |
1차 플라즈마 | on | ||||
2차 승온 | 600±50℃ | 0.5∼2 | 0.1∼10 | N2 + Ar | on 또는 off |
2차 플라즈마 | on | ||||
3차 승온 | 750±50℃ | 5∼21 | 0.1∼1000 | N2 + NH3 | off |
3차 항온 (질화단계) | |||||
냉각단계 | 로냉 | - | - | N2 또는 불활성 가스 | off |
Claims (7)
- 티타늄계 금속부품의 질화방법에 있어서, 피질화물을 질화로에 장입한 상태에서 질소 가스 또는 불활성 가스 중의 어느 하나로 질화로 내부를 퍼지하는 초기 퍼지 단계(Ⅰ)와;초기 퍼지 상태에서 300±50℃까지 가열한 후 질소 가스와 수소 가스의 혼합가스로 질화로 내부를 퍼지하고 항온 상태에서 플라즈마 스퍼터링을 실시하는 1차 승온 및 플라즈마 스퍼터링 단계(Ⅱ)와;상기 1차 승온 및 플라즈마 스퍼터링 단계 직후 질소 가스와 아르곤 가스의 혼합가스로 질화로 내부를 퍼지한 상태에서 600±50℃까지 가열하여 항온을 유지하면서 플라즈마 스퍼터링을 실시하는 2차 승온 및 플라즈마 스퍼터링 단계(Ⅲ)와;상기 2차 승온 및 플라즈마 스퍼터링 단계 직후 질소와 암모니아의 혼합가스를 사용하여 질화로 내부를 퍼지한 상태에서 700∼800℃까지 가열하고 5∼21시간동안 항온을 유지시키는 3차 승온 및 질화 단계(Ⅳ)와;상기 3차 승온 및 질화 직후 질소 가스 또는 불활성 가스 중의 어느 하나를 사용하여 퍼지를 실시한 후 상온까지 로냉시키는 냉각 단계(Ⅴ)와; 를 포함하여 이루어짐을 특징으로 하는 티타늄계 금속의 질화 방법.
- 제 1항에 있어서, 상기 초기 퍼지 단계(Ⅰ)의 퍼지는 질화로의 내부를 0.01 mbar 이하로 진공 배기 한 후 내부의 압력이 0.1∼1000mbar가 되도록 이루어짐을 특징으로 하는 티타늄계 금속의 질화 방법.
- 제 1항에 있어서, 상기 1차 승온 및 플라즈마 스퍼터링 단계(Ⅱ)의 혼합 가스는 질소 가스와 수소 가스가 80∼20vol% : 20∼80vol%의 비율로 혼합된 가스임을 특징으로 하는 티타늄계 금속의 질화 방법.
- 제 1항에 있어서, 2차 승온 및 플라즈마 스퍼터링 단계(Ⅲ)의 혼합 가스는 질소 가스와 아르곤 가스가 80∼20vol% : 20∼80vol%의 비율로 혼합된 가스임을 특징으로 하는 티타늄계 금속의 질화 방법.
- 제 1항에 있어서, 3차 승온 및 질화 단계(Ⅳ)의 혼합 가스는 질소 가스와 암모니아 가스가 50∼90vol% : 50∼10vol%의 비율로 혼합된 가스임을 특징으로 하는 티타늄계 금속의 질화 방법.
- 제 1항에 있어서, 1차 승온 및 플라즈마 스퍼터링 단계(Ⅱ)와 2차 승온 및 플라즈마 스퍼터링 단계(Ⅲ)에서 각각 실시되는 퍼지는 질화로의 내부를 0.01 mbar 이하로 진공 배기 한 후 내부의 압력이 0.1∼10mbar가 되도록 이루어짐을 특징으로 하는 티타늄계 금속의 질화 방법.
- 제 1항에 있어서, 3차 승온 및 질화 단계(Ⅳ)에서 실시되는 퍼지는 질화로의 내부를 0.01 mbar 이하로 진공 배기 한 후 내부의 압력이 0.1∼1000mbar가 되도록 이루어짐을 특징으로 하는 티타늄계 금속의 질화 방법.
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100907922B1 (ko) * | 2006-10-10 | 2009-07-16 | 가부시키가이샤 히다치 고쿠사이 덴키 | 기판처리장치, 반도체장치의 제조방법 및 금속표면에의박막형성방법 |
KR20180076303A (ko) * | 2016-12-27 | 2018-07-05 | 도쿄엘렉트론가부시키가이샤 | 퍼지 방법 |
CN115404435A (zh) * | 2022-08-17 | 2022-11-29 | 无锡恒信北石科技有限公司 | 一种螺杆泵定子的氮化工装及工艺 |
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KR101892531B1 (ko) * | 2017-02-03 | 2018-08-30 | 한국생산기술연구원 | 철계 금속의 질화방법 |
KR20210026440A (ko) | 2019-08-30 | 2021-03-10 | 필로스 종호 고 | 금속 모재의 티타늄 표면처리 방법, 이 방법으로 제조된 장신구 및 건강패치 |
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JPH0663081B2 (ja) * | 1988-07-13 | 1994-08-17 | 住友金属工業株式会社 | TiまたはTi合金の窒化処理法 |
JP2931173B2 (ja) * | 1993-01-22 | 1999-08-09 | 株式会社ライムズ | 金属部材のイオン窒化法 |
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KR100308478B1 (ko) * | 1999-10-26 | 2001-09-26 | 김덕중 | 소결기어 표면의 질화방법 |
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Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
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KR100907922B1 (ko) * | 2006-10-10 | 2009-07-16 | 가부시키가이샤 히다치 고쿠사이 덴키 | 기판처리장치, 반도체장치의 제조방법 및 금속표면에의박막형성방법 |
KR20180076303A (ko) * | 2016-12-27 | 2018-07-05 | 도쿄엘렉트론가부시키가이샤 | 퍼지 방법 |
US10519542B2 (en) | 2016-12-27 | 2019-12-31 | Tokyo Electron Limited | Purging method |
CN115404435A (zh) * | 2022-08-17 | 2022-11-29 | 无锡恒信北石科技有限公司 | 一种螺杆泵定子的氮化工装及工艺 |
CN115404435B (zh) * | 2022-08-17 | 2023-09-05 | 无锡恒信北石科技有限公司 | 一种螺杆泵定子的氮化工装及工艺 |
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