KR20050069528A - Cleaning device with heating system for removing a water drop - Google Patents
Cleaning device with heating system for removing a water drop Download PDFInfo
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- KR20050069528A KR20050069528A KR1020030101670A KR20030101670A KR20050069528A KR 20050069528 A KR20050069528 A KR 20050069528A KR 1020030101670 A KR1020030101670 A KR 1020030101670A KR 20030101670 A KR20030101670 A KR 20030101670A KR 20050069528 A KR20050069528 A KR 20050069528A
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H01L21/67051—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
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- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Cleaning Or Drying Semiconductors (AREA)
Abstract
본 발명은 반도체 제조공정 중 카셋트를 세정하는 장치에 관한 것이다.The present invention relates to an apparatus for cleaning a cassette during a semiconductor manufacturing process.
본 발명의 물방울 제거용 히팅 시스템이 구비된 세정장치는 카셋트를 트레이에 세팅하는 로더부, 1차 세정을 수행하는 초음파세정 탱크, 상부노즐과 하부노즐을 구비하여 순수 세정과 CDA 건조처리를 수행하는 챔버, 상기 챔버의 벽에 장착된 히팅 시스템 및 상기 카셋트를 상기 트레이에서 제거하는 언로더부를 포함하여 이루어짐에 기술적 특징이 있다.The cleaning device equipped with a heating system for removing water droplets of the present invention includes a loader unit for setting a cassette in a tray, an ultrasonic cleaning tank for performing primary cleaning, an upper nozzle and a lower nozzle to perform pure water cleaning and CDA drying treatment. Technical features include a chamber, a heating system mounted to the wall of the chamber, and an unloader for removing the cassette from the tray.
따라서 본 발명의 물방울 제거용 히팅 시스템이 구비된 세정장치는 카셋트 세정시 건조불량에 의한 물방울 발생 방지가 가능하고, 물방울이 웨이퍼에 전이되어 제조공정시 손상되는 것을 방지할 뿐만 아니라 건조불량으로 인해 작업자가 발견시 재작업을 해야 하는 문제를 없애므로 시간단축 등의 효과 및 장점이 있다. Therefore, the cleaning device equipped with a heating system for removing water droplets of the present invention can prevent the generation of water droplets due to poor drying when cleaning the cassette, and prevent the water droplets from being transferred to the wafer to be damaged during the manufacturing process, and also due to poor drying. Since it eliminates the problem of reworking when found, there are effects and advantages such as time savings.
Description
본 발명은 제조공정에서 사용되는 카셋트를 세정하는 장치에 관한 것으로, 보다 자세하게는 카셋트를 트레이에 세팅하는 로더부, 1차 세정을 수행하는 초음파 세정 탱크, 상부노즐과 하부노즐을 구비하여 순수 세정과 CDA 건조처리를 수행하는 챔버, 상기 챔버의 벽에 장착된 히팅 시스템 및 상기 카셋트를 상기 트레이에서 제거하는 언로더부를 포함하여 이루어짐을 특징으로 하는 물방울 제거용 히팅 시스템이 구비된 세정장치에 관한 것이다.The present invention relates to an apparatus for cleaning cassettes used in a manufacturing process, and more particularly, to a loader section for setting a cassette in a tray, an ultrasonic cleaning tank for performing primary cleaning, an upper nozzle and a lower nozzle, It relates to a cleaning apparatus equipped with a heating system for removing water droplets, comprising a chamber for performing a CDA drying treatment, a heating system mounted on the wall of the chamber and an unloader for removing the cassette from the tray.
도 1은 대한민국 공개실용신안공보 제0039867호에 기재된 종래의 기술로서, 반도체 웨이퍼 세정장치는 상측에 개구되며 케미컬(11)이 수납되는 일정크기의 공간부를 갖는 인너 베스(12)와, 그 인너 베스(12)의 양측 외부에 설치되는 아우터 베스(13)와, 상기 인너 베스(12)의 내측에 설치되며 웨이퍼(14)들이 탑재되는 보트(15)와, 상기 아우터 베스(13)와 인너 베스(12)가 연결되도록 설치되는 제1/제2 순환라인(16, 16')과, 그 제1/제2 순환라인(16, 16') 상에 각각 설치되는 펌프(17), 필터(18), 밸브(19)로 구성되어 있다. 1 is a conventional technique described in Korean Utility Model Publication No. 0039867, in which a semiconductor wafer cleaning apparatus has an inner bath 12 having an opening of an upper side and having a predetermined size of a space in which the chemical 11 is accommodated, and an inner bath thereof. An outer bath 13 installed on both sides of the outer side 12, a boat 15 installed inside the inner bath 12, on which wafers 14 are mounted, and an outer bath 13 and an inner bath ( 12, the first / second circulation line (16, 16 ') is installed to be connected, the pump 17, the filter 18 is installed on the first / second circulation line (16, 16'), respectively And a valve 19.
그리고, 상기 보트(15)의 양측에는 일정간격을 두고 노즐(20)이 각각 설치되어 있고, 그 각각의 노즐(20) 후단부에는 필터(18)와 밸브(19) 사이의 제1/제2 순환라인(16, 16') 상에 연결되도록 제1/제2 바이패스라인(21, 21')이 연결되어 있으며, 그 제1/제2 바이패스라인(21, 21') 상에는 각각 밸브(23)가 설치되어서 구성된다.In addition, nozzles 20 are provided at both sides of the boat 15 at predetermined intervals, respectively, and the first / seconds between the filter 18 and the valve 19 are provided at the rear end of each nozzle 20. The first and second bypass lines 21 and 21 'are connected to be connected to the circulation lines 16 and 16', and the valves are formed on the first and second bypass lines 21 and 21 ', respectively. 23) is installed and configured.
상기와 같이 구성되어 있는 반도체 웨이퍼 세정장치에서 세정작업이 진행되는 동작을 설명하면 다음과 같다.Referring to the operation of the cleaning operation in the semiconductor wafer cleaning apparatus configured as described above are as follows.
먼저, 인너 베스(12)의 내측에 케미컬(11)을 수납한다. 그런 다음, 제1/제2 순환라인(16, 16') 상에 설치되어 있는 밸브(19)를 닫고, 제1/제2 바이패스라인(21, 21') 상에 설치된 밸브(23)를 연다. 그런 다음, 펌프(17)를 이용하여 케미컬(11)을 펌핑하고, 제1/제2 바이패스라인(21, 21')을 통하여 순환된 케미컬(11)이 노즐(20)을 통하여 보트(15)의 양측에서 보트(15)에 분사되도록 하여 보트(15)에 부착되어 있는 공기방울들을 제거한다.First, the chemical 11 is stored inside the inner bath 12. Then, the valve 19 installed on the first / second circulation lines 16 and 16 'is closed and the valve 23 installed on the first / second bypass lines 21 and 21' is closed. Open. Then, the chemical 11 is pumped using the pump 17, and the chemical 11 circulated through the first and second bypass lines 21 and 21 ′ is passed through the nozzle 20 through the boat 15. By spraying the boat 15 on both sides of the) to remove the air bubbles attached to the boat (15).
상기와 같은 공기방울 제거작업을 일정시간 실시한 다음, 다시 제1/제2 바이패스라인(21, 21')에 설치된 밸브(23)를 닫고, 제1/제2 순환라인(16, 16')에 설치된 밸브(19)를 연 다음, 펌프(17)로 펌핑하여 케미컬(11)이 인너 베스(12)에서 아우터 베스(13)로, 또 제1/제2 순환라인(16, 16')으로 순환하며 웨이퍼(14)들의 식각 및 세정이 이루어지도록 한다. After the air bubble removing operation is performed for a predetermined time, the valve 23 installed in the first and second bypass lines 21 and 21 'is closed again, and the first and second circulation lines 16 and 16' are closed. Open the valve 19 and then pump it with the pump 17 so that the chemical 11 moves from the inner bath 12 to the outer bath 13 and to the first and second circulation lines 16 and 16 '. It is circulated to allow etching and cleaning of the wafers 14.
그러나, 건조시에 카셋트에 잔존하고 있는 미세한 물방울이 완벽하게 제거되지 않고, 구조상 상기 프로세스를 완료한 후에도 간헐적으로 물방울이 챔버에 달려 있는 상태로 언로딩되면 상기 카셋트에 떨어져 건조불량이 발생한다. 이후 상기 카셋트에 물방울이 묻어 있는 상태에서 웨이퍼가 처리되면 심각한 손상을 유발시키는 문제가 있었다. However, the fine water droplets remaining in the cassette during drying are not completely removed, and if the water droplets are unloaded intermittently in the chamber even after completing the process in the structure, drying defects occur in the cassette. Thereafter, if the wafer is processed in a state where water droplets are on the cassette, there is a problem causing serious damage.
따라서 본 발명은 상기와 같은 종래 기술의 문제점을 해결하기 위한 것으로, 건조시 미세한 물방울을 제거할 수 있도록 하드웨어적으로 보완하여 카셋트 세정시 건조불량에 의한 물방울이 발생되지 않도록 하고, 물방울이 웨이퍼에 전이되어 제조공정시 손상되는 것을 방지하며, 건조불량으로 인한 손실을 최소화하는 물방울 제거용 히팅 시스템을 제공함에 본 발명의 목적이 있다. Therefore, the present invention is to solve the problems of the prior art as described above, to compensate for the hardware to remove the fine water droplets during drying to prevent the generation of water droplets due to poor drying during cassette cleaning, the water droplets transferred to the wafer It is an object of the present invention to provide a heating system for removing water droplets to prevent damage during the manufacturing process, to minimize the loss due to poor drying.
본 발명의 상기 목적은 카셋트를 트레이에 세팅하는 로더부, 1차 세정을 수행하는 초음파 세정 탱크, 상부노즐과 하부노즐을 구비하여 순수 세정과 CDA(Clean Dry Air) 건조처리를 수행하는 챔버, 상기 챔버의 벽에 장착된 히팅 시스템 및 상기 카셋트를 상기 트레이에서 제거하는 언로더부를 포함하여 이루어짐을 특징으로 하는 물방울 제거용 히팅 시스템이 구비된 세정장치에 의해 달성된다.The object of the present invention is to provide a loader for setting the cassette in the tray, an ultrasonic cleaning tank for performing the first cleaning, the upper nozzle and the lower nozzle having a chamber for performing pure cleaning and clean dry air (CDA) drying treatment, the And a heating system mounted on the wall of the chamber and an unloader for removing the cassette from the tray.
본 발명의 상기 목적과 기술적 구성 및 그에 따른 작용효과에 관한 자세한 사항은 본 발명의 바람직한 실시예를 도시하고 있는 도면을 참조한 이하 상세한 설명에 의해 보다 명확하게 이해될 것이다. Details of the above object and technical configuration of the present invention and the effects thereof according to the present invention will be more clearly understood by the following detailed description with reference to the drawings showing preferred embodiments of the present invention.
도 2는 본 발명에 따른 물방울 제거용 히팅 시스템이 구비된 세정장치의 개략도이고, 도 3은 본 발명에 따른 물방울 제거용 히팅 시스템이 구비된 세정장치의 챔버를 나타낸 것이다. 로더부(110)에서 트레이(170)로 세팅된 카셋트(160)는 1차적으로 초음파 세정 탱크(130)로 이송되어 1차 세정을 하고, 챔버(150)에서 세정 및 CDA로 건조를 한다. 또한, 순수 공급관(100)에서 분출된 순수로 세정이 이루어지고 세정이 끝난 순수는 배수관(140)으로 배출된다. Figure 2 is a schematic diagram of a cleaning device equipped with a heating system for removing water droplets according to the present invention, Figure 3 shows a chamber of the cleaning device equipped with a heating system for removing water droplets according to the present invention. The cassette 160 set as the tray 170 in the loader unit 110 is primarily transferred to the ultrasonic cleaning tank 130 to perform the first cleaning, and the chamber 150 is cleaned and dried by CDA. In addition, the cleaning is performed with the pure water spouted from the pure water supply pipe 100, the pure water is discharged to the drain pipe 140.
상기의 챔버(150)는 로울러(171)가 좌우로 움직이면서 상기 카셋트(160)를 좌우로 움직여 주고 상부노즐(151)과 하부노즐(152)에서 분사된 순수로 세정을 실시하고 이후 90℃의 고온의 CDA로 최종 건조를 하게 된다.The chamber 150 moves the cassette 160 left and right while the roller 171 moves to the left and right and cleans with pure water sprayed from the upper nozzle 151 and the lower nozzle 152 and then a high temperature of 90 ° C. Final drying is achieved with CDA.
상기 순수 세정 후 CDA로 건조하는 과정에서 상기 챔버(150)의 내벽에 붙어 있는 물방울들이 남아 있게 된다. 이 현상을 개선하기 위해서 상기 챔버(150)의 안쪽에 별도의 히팅 시스템(180)을 설치한다. 상기 히팅 시스템(180)은 두 개의 평판형 플레이트를 상기 챔버의 내측에 장착하는 것이 바람직하다. The water droplets attached to the inner wall of the chamber 150 remain in the process of drying with CDA after pure water cleaning. In order to improve this phenomenon, a separate heating system 180 is installed inside the chamber 150. The heating system 180 preferably mounts two flat plates inside the chamber.
또한, 상기 히팅 시스템(180)은 상기 챔버에서 발생되는 공정이 시작되는 시점부터 끝나는 시점까지 소정의 온도로 계속 히팅되어 있으며, 미세한 물방울들이 잔존해 있지 않고 열에 의해 건조가 되어 상기 공정의 완료 후 이동과정에서 떨어져 상기 카셋트(160)에 묻는 현상은 사라지게 된다. 상기 히팅 시스템(180)의 온도는 50℃~70℃로, 바람직하게는 50℃로 조정한다.In addition, the heating system 180 is continuously heated to a predetermined temperature from the start of the process generated from the chamber to the end of the process, the fine water droplets do not remain and are dried by heat to move after completion of the process The phenomenon of contacting the cassette 160 apart from the process disappears. The temperature of the heating system 180 is adjusted to 50 ° C to 70 ° C, preferably 50 ° C.
모든 공정은 로울러(171)에 의해 독립적으로 이동되는 상기 트레이(170)가 이동하며 이루어지고, 공정이 끝나면 언로더부(120)에 의해 상기 트레이(170)에서 상기 카셋트(160)가 제거되며 완료된다. All processes are made by moving the tray 170 that is independently moved by the roller 171, and when the process is completed, the cassette 160 is removed from the tray 170 by the unloader 120 and is completed. do.
상세히 설명된 본 발명에 의하여 본 발명의 특징부를 포함하는 변화들 및 변형들이 당해 기술 분야에서 숙련된 보통의 사람들에게 명백히 쉬워질 것임이 자명하다. 본 발명의 그러한 변형들의 범위는 본 발명의 특징부를 포함하는 당해 기술 분야에 숙련된 통상의 지식을 가진 자들의 범위 내에 있으며, 그러한 변형들은 본 발명의 청구항의 범위 내에 있는 것으로 간주된다. It will be apparent that changes and modifications incorporating features of the invention will be readily apparent to those skilled in the art by the invention described in detail. It is intended that the scope of such modifications of the invention be within the scope of those of ordinary skill in the art including the features of the invention, and such modifications are considered to be within the scope of the claims of the invention.
따라서 본 발명의 물방울 제거용 히팅 시스템이 구비된 세정장치는 카셋트 세정시 건조불량에 의한 물방울 발생 방지가 가능하고, 물방울이 웨이퍼에 전이되어 제조공정시 손상되는 것을 방지할 뿐만 아니라 건조불량으로 인해 작업자가 발견시 재작업을 해야 하는 문제를 없애므로 시간단축 등의 효과 및 장점이 있다. Therefore, the cleaning device equipped with a heating system for removing water droplets of the present invention can prevent the generation of water droplets due to poor drying when cleaning the cassette, and prevent the water droplets from being transferred to the wafer to be damaged during the manufacturing process, and also due to poor drying. Since it eliminates the problem of reworking when found, there are effects and advantages such as time savings.
도 1은 종래기술에 의한 반도체 웨이퍼 세정장치.1 is a semiconductor wafer cleaning apparatus according to the prior art.
도 2는 본 발명에 따른 물방울 제거용 히팅 시스템이 구비된 세정장치의 개략도.Figure 2 is a schematic diagram of a cleaning device equipped with a heating system for removing water droplets according to the present invention.
도 3은 본 발명에 따른 물방울 제거용 히팅 시스템이 구비된 세정장치의 챔버의 구성도. Figure 3 is a block diagram of a chamber of the cleaning device equipped with a heating system for removing water droplets according to the present invention.
<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>
11 : 케미컬 12 : 인너 베스11: Chemical 12: Inner Bath
13 : 아우터 베스 14 : 웨이퍼13: outer bath 14: wafer
15 : 보트 16,16' : 제1/제2 순환라인15: boat 16,16 ': first / second circulation line
17 : 펌프 18 : 필터17: pump 18: filter
19 : 밸브 20 : 노즐19: valve 20: nozzle
21,21' : 제1/제2 바이패스라인 23 : 밸브21,21 ': 1st / 2nd bypass line 23: valve
100 : 순수 공급관 110 : 로더부 100: pure water supply pipe 110: loader
120 : 언로더부 130 : 초음파 세정 탱크120: unloader 130: ultrasonic cleaning tank
140 : 배수관 150 : 챔버140: drain pipe 150: chamber
160 : 카셋트 180 : 히팅 시스템 160: cassette 180: heating system
Claims (4)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020030101670A KR100869221B1 (en) | 2003-12-31 | 2003-12-31 | Cleaning device with heating system for removing a water drop |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| KR1020030101670A KR100869221B1 (en) | 2003-12-31 | 2003-12-31 | Cleaning device with heating system for removing a water drop |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20050069528A true KR20050069528A (en) | 2005-07-05 |
| KR100869221B1 KR100869221B1 (en) | 2008-11-18 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020030101670A KR100869221B1 (en) | 2003-12-31 | 2003-12-31 | Cleaning device with heating system for removing a water drop |
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| Country | Link |
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| KR (1) | KR100869221B1 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100697630B1 (en) * | 2004-10-28 | 2007-03-20 | 주식회사 실트론 | A Barrel Drying Apparatus |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR920020611A (en) * | 1991-04-19 | 1992-11-21 | 김광호 | Wafer Cleaner |
| KR970023784A (en) * | 1995-10-16 | 1997-05-30 | 김광호 | Semiconductor wafer dryer |
| US6146469A (en) * | 1998-02-25 | 2000-11-14 | Gamma Precision Technology | Apparatus and method for cleaning semiconductor wafers |
| JP3378543B2 (en) * | 1999-11-26 | 2003-02-17 | 株式会社半導体先端テクノロジーズ | Wafer carrier cleaning method |
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2003
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100697630B1 (en) * | 2004-10-28 | 2007-03-20 | 주식회사 실트론 | A Barrel Drying Apparatus |
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| KR100869221B1 (en) | 2008-11-18 |
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