KR20050054315A - Substrate for liquid crystal display device and method of the same - Google Patents

Abstract

The present invention relates to a liquid crystal display device, and more particularly, to a substrate for a liquid crystal display device.

In the conventional liquid crystal panel for a liquid crystal display, there is a liquid crystal region in which the liquid crystal is abnormally driven, and the light emitted through the region is not normal, so that a black matrix is formed on the color filter substrate to block it. have. However, some light passes through the area and is displayed as an image, causing light leakage.

The present invention forms a structure for reflecting or absorbing light inside a transparent substrate, which is a base substrate of an array substrate for a liquid crystal display device, thereby preventing or preventing light leakage by reflecting or absorbing light incident to the liquid crystal region for driving abnormally. It is to provide an excellent liquid crystal display device which can improve the contrast ratio.

Description

Substrate for Liquid Crystal Display Device and method of the same}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device, and more particularly, to a substrate for a liquid crystal display device having a structure therein for efficiently blocking or reflecting light passing through a liquid crystal layer region that is abnormally driven.

Recently, with the rapid development of the information society, the need for a flat panel display having excellent characteristics such as thinning, light weight, and low power consumption has emerged.

Such a flat panel display can be divided according to whether it emits light by itself or not. A light emitting display device displays light by itself and displays an image by using an external light source. It is called a display device. The light emitting display includes a plasma display panel, a field emission display, an electro luminescence display, and the light receiving display includes a liquid crystal display. display).

Dual liquid crystal display devices are being actively applied to notebooks and desktop monitors because of their excellent resolution, color display, and image quality.

The liquid crystal display device arranges two substrates on which electrodes are formed so that the surfaces on which the two electrodes are formed face each other, injects a liquid crystal between the two substrates, and then applies a voltage to the two electrodes to form a liquid crystal. It is a device that expresses an image by controlling light transmittance by moving molecules.

1 is a view schematically showing a general liquid crystal display device.

As shown, a general liquid crystal display device 1 includes a black matrix 12 formed between a color filter 14 and each of the color filters 14 on the transparent insulating substrate, and the color filter 14 and the black matrix ( 12) the upper substrate 10 having the common electrode 16 deposited below, the pixel region P, the pixel electrode 36 formed on the pixel region P, the switching element Tr, and the array wiring ( 22 and 24 are formed on the lower substrate 20, the liquid crystal 40 is filled between the upper substrate 10 and the lower substrate 20.

The lower substrate 20 may also be referred to as an array substrate, and the thin film transistor Tr, which is a switching element, may be disposed in a matrix type, and the gate line 22 may cross the plurality of thin film transistors Tr. ) And data wirings 24 are formed.

In this case, the pixel area P is an area defined by the gate line 22 and the data line 24 intersecting. A transparent pixel electrode 36 is formed on the pixel area P as described above. .

However, when the common electrode and the pixel electrode are vertically formed and the liquid crystal is driven by the vertical electric field generated above and below, the characteristics such as transmittance and aperture ratio are excellent, but the viewing angle characteristics are not good. In order to overcome these disadvantages, a liquid crystal driving method using an in-plane switching (IPS) using a horizontal electric field has been proposed.

2 is a cross-sectional view of a conventional liquid crystal display device, in which a common electrode and a pixel electrode are both formed on an array substrate.

As illustrated, the lower substrate array substrate 70 and the upper substrate color filter substrate 50 face each other, and the liquid crystal layer 90 is interposed between the two substrates 50 and 70. In the array substrate 70, a common electrode 72 having a predetermined width is disposed on the transparent substrate 71 at a predetermined interval, and a gate insulating film 74 is disposed on the front surface of the substrate 71 on the common electrode 72. It is formed in. The data line 76 and the pixel electrode 78 are formed on the gate insulating layer 74. In this case, in the horizontal electric field type liquid crystal display device 45, the common electrode 72 and the pixel electrode 78 formed on the same substrate 71 form a horizontal electric field to operate the liquid crystal, thereby allowing the common electrode 72 and the pixel electrode 78 to operate. ) Are alternately arranged. In addition, a data line 76 is formed on the same layer as the pixel electrode 78, and the data line 76 is positioned between the common electrode 72. The data line 76 serves as a reference for distinguishing pixels, and although not shown in the drawing, the common electrode 72 and the pixel electrode 78 are alternately disposed between the data line 76 and the line 76. It is characteristic.

Next, in the color filter substrate 50 facing the array substrate 70, a black matrix 52 is disposed below the transparent substrate 51 to prevent light leakage and the data wiring 76 and the data wiring below. It is formed in an area including the common electrode 72 located on both sides of the 76. Red, green, and blue color filters 54a, 54b (not shown) are formed below the substrate 51 including the black matrix 52 to correspond to the pixels of the lower array substrate 70, respectively. An overcoat layer 56 is formed below the green and blue color filters 54a and 54b to planarize the color filters 54a and 54b.

In the above-described liquid crystal display of FIG. 2, an arrow indicates that light emitted from a backlight unit (not shown) positioned below the array substrate 70 progresses.

The light (①, ②, ③) incident from the lower portion of the black matrix 52 and the data line 76 at an angle or perpendicular to the black matrix 52 and the data line 76 is well blocked by the black matrix 52 and the data line 76. It can be seen that. Since the liquid crystals operated by the common electrode 72 and the pixel electrode 78 move abnormally in the vicinity of the data line 76, the color filter substrate facing to block the light emitted through the abnormal liquid crystal layer AbLC ( 50, a black matrix 52 is formed. However, the light (4, 5) incident on the side, that is, the area between the data line 76 and the common electrode 72, prevents the black matrix 52 from blocking the liquid crystal layer AbLC. Since it passes through, the image adversely affects the image. As a result, the contrast ratio (CR) is also lowered, resulting in deterioration of display quality of the liquid crystal display.

In order to solve the above problems, the present invention improves the contrast ratio by providing a structure inside the array substrate which blocks or reflects the light incident to the abnormally operating liquid crystal layer to be incident into the normally operating liquid crystal layer. To provide a liquid crystal display device having excellent image quality.

In order to achieve the above object, a substrate for a liquid crystal display according to an exemplary embodiment of the present invention is provided with a groove having a predetermined width and depth therein, and the groove is filled with a dielectric material to reflect or absorb incident light. It characterized in that to form.

In this case, the structure formed by filling the dielectric material is characterized in that the interface with the substrate is coated with a metal material with excellent reflectivity, the dielectric material is an acrylic (acryl) or epoxy (epoxy) -based material or black resin desirable.

In addition, the height of the structure is characterized in that formed less than two thirds of the thickness of the substrate.

An array substrate for a liquid crystal display device according to an embodiment of the present invention includes a substrate having a groove having a predetermined width and depth therein, and a structure formed by filling a dielectric material in the groove; A data line and a gate line intersecting each other on one surface of the substrate; The thin film transistor includes a thin film transistor configured at an intersection point of the gate line and the data line and a pixel electrode connected to the thin film transistor.

At this time, one surface of the substrate, characterized in that further provided with a common electrode arranged to be alternated with the pixel electrode.

In addition, the structure is located below the data line, wherein the structure is preferably formed to be wider than half of the width of the upper data line and thinner than the width of the data line.

Alternatively, the structure is located under the gate wiring, wherein the structure is preferably formed to be wider than half of the width of the upper gate wiring and thinner than the width of the gate wiring.

In addition, the structure is preferably formed that the height is less than two thirds of the height of the transparent substrate.

In addition, it is characterized in that the metal film of high reflectance is further configured on the surface of the structure.

In addition, the dielectric material is preferably an acrylic or epoxy-based material or a black resin.

In addition, the groove is formed from the lower surface of the transparent substrate therein, or the groove is formed from the upper surface of the substrate therein.

According to an exemplary embodiment of the present invention, a liquid crystal panel includes a substrate including a groove having a predetermined width and depth therein, a structure formed by filling a dielectric material in the groove, data wiring formed by crossing each other on one surface of the substrate, and a gate wiring; An array substrate including a thin film transistor configured at an intersection point of the gate line and the data line and a pixel electrode connected to the thin film transistor; A color filter substrate comprising red, green, and blue color filter layers; It includes a liquid crystal layer interposed on the array substrate and the color filter substrate.

In this case, the array substrate may be further provided with a common electrode arranged to be alternate with the pixel electrode.

A method of manufacturing a substrate for a liquid crystal display device according to the present invention comprises the steps of forming a photoresist layer on a glass having a flat surface; Patterning the photoresist layer to expose the glass; Etching the exposed glass to form grooves; Removing the photoresist layer; Coating a metal material on the entire surface of the glass from which the photoresist layer is removed to form a metal film; Forming a coated dielectric material layer on the entire surface of the substrate on which the metal film is formed; Exposing the metal film by performing dry vision on the substrate to which the dielectric material is applied to remove the dielectric material layer except for the dielectric material filled in the groove; Etching away the exposed metal film.

Hereinafter, preferred embodiments of the present invention will be described with reference to the accompanying drawings.

First Embodiment

3 is a cross-sectional view of a transverse electric field type liquid crystal display device according to a first embodiment of the present invention.

As illustrated, the lower substrate is the array substrate 170 and the color filter substrate 150, which is the upper substrate, face each other, and the liquid crystal layer 190 is interposed between the two substrates 150 and 170.

The lower substrate is disposed on the array substrate 170, and the common electrode 172 having a predetermined width is disposed on the transparent substrate 171 at a predetermined interval, and the gate insulating layer 174 is disposed on the common electrode 172. 171 is formed on the front surface. The data line 176 and the pixel electrode 178 are formed on the gate insulating layer 174. In this case, the common electrode 172 and the pixel electrode 178 are alternately arranged alternately. In addition, a data line 176 is formed on the same layer as the pixel electrode 178 and is positioned between the common electrode 172.

In addition, an internal structure 187 is formed inside the substrate 171 in the transparent substrate 171 corresponding to the data line 176 of the array substrate 170. The structure 187 is formed as a groove on the surface of the substrate and is formed of a metal film 185 coated with a metal material on the inside of the groove, the inside of the metal film 184 is filled with a dielectric material 184 inside Characterized by reflecting the light incident to the structure 187. Alternatively, although not shown, a metal film is not formed on the surface and is made of only a black series dielectric material to block light incident to the structure.

 In addition, the width of the structure 187 is preferably formed to be larger than half of the width of the data line 176 and overlapping the upper portion of the structure 187 is smaller than the width of the data line 176.

Next, in the color filter substrate 150 facing the array substrate 170, a black matrix 152 is disposed on both sides of the data line 176 and the wiring to prevent light leakage under the substrate 151. It is formed corresponding to the common electrode 172. Red, green, and blue color filters 154a, 154b (not shown) are formed below the substrate 151 including the black matrix 152 to correspond to the pixels of the lower array substrate 170, respectively. An overcoat layer 156 is formed to planarize the red, green, and blue color filters 154a, 1574b, and the like.

In the liquid crystal display device formed at the lower portion of the structure 187 formed in the transparent substrate 171 which is the base of the array substrate 170, when the light incident from the lower portion is observed, the abnormality overlaps with the black matrix 152. The incident light (①`, ②`, ③`) perpendicular to the liquid crystal region AbLC to be driven is incident by the data wiring 176 or the black matrix 152 as in the prior art. `, ②`, ③`) are blocked, so no light leakage occurs, and the structure 187 formed inside the transparent substrate 171 of the array substrate 170 also with respect to the light ④` and ⑤` that is incident at an angle from the side. Or blocked by the black matrix 152 to prevent light leakage due to light passing through the liquid crystal layer region AbLC that is abnormally driven.

Next, the size and the internal configuration of the structure will be described in detail with reference to FIG.

 FIG. 4 is a cross-sectional view of the transverse electric field type liquid crystal display shown in FIG. 3 and shows an enlarged thickness of a transparent substrate on which a structure is formed.

As shown in the drawing, a groove is formed in the lower surface of the transparent substrate 171, which is the base for forming the array substrate 170, to coat the metal film 185 on the inner surface thereof, and the dielectric 184 is filled to fill the upper data line 176. In the structure 187 formed at a position corresponding to the height of the structure 187, the higher the height (t) of the structure 187 is, the more effective the effect is, but since the breakage of the substrate 171 is likely to occur, The thickness of the substrate 171 is preferably smaller than two thirds of the thickness tg.

In addition, the width w of the structure 187 may be thicker than half the line width wd of the upper data line 176 and thinner than the line width wd of the data line 176. Do.

Next, the internal structure and components of the structure will be described.

The structure 187 formed inside the transparent substrate 171 is coated with a metal material to form a metal film 185, and the inside of the structure 187 is filled with an acrylic or epoxy resin. It is characteristic. The substrate 171 is frequently moved when the device such as a thin film transistor is formed thereon by using the substrate 171. At this time, the inside of the groove is not filled with the dielectric 184, and the surface of the groove is If only the metal film 184 is coated, the thickness of the substrate 171 is very thin in the groove portion, so that a crack occurs even in a small impact, and this causes the substrate 171 to be easily broken, and thus the inside of the structure may be damaged. It is preferable to form and fill with dielectric material.

As a modification of the first embodiment, light leakage can be prevented even when a substrate having an internal structure formed of an array substrate is formed of a black resin that forms a black matrix, for example, a black matrix without coating a metal material. . However, when the structure is formed with only black resin without metal coating on the surface, light incident on the liquid crystal region that is abnormally driven by the structure of the black resin is absorbed to prevent light leakage, but the surface of the structure is coated with a metal material. In this case, since the incident light is reflected and then incident to the liquid crystal layer that is normally driven, the surface of the light is more efficient than the structure formed by coating the surface with a metal material and then filling the dielectric material.

FIG. 5 illustrates a modified example of the first embodiment, and shows that a groove in which a structure inside the substrate is formed in the liquid crystal display is formed inside the substrate from an upper surface of the transparent substrate.

As shown, the transparent substrate 271, which is the base of the array substrate 270 according to the modification of the first embodiment, is formed from a top surface on which gate wirings (not shown) and data wirings 276 including thin film transistors are formed. A groove is formed in the substrate 271, and an interface thereof is coated with a metal material to form a metal film 285, and a structure 287 filled with a dielectric material 284 is formed therein. The structure 287 is positioned at a lower portion corresponding to the upper data line 276, and the height t and the width w of the structure 287 are the same as those of the first embodiment described above. Omit.

Second Embodiment

In the second embodiment of the present invention, a pixel electrode is formed on an array substrate, and a common electrode is a structure formed inside an array substrate of a general liquid crystal display device having a common electrode formed on a color filter substrate.

6 is a cross-sectional view of a liquid crystal display device according to a second embodiment of the present invention.

As illustrated, in the array substrate 370, a gate wiring 372 is formed on the transparent substrate 371, and the gate insulating film 374 is formed on the entire surface of the substrate 371 including the gate wiring 372. ) Is formed, and a passivation layer 375 is formed on the gate insulating layer 374. In addition, a pixel electrode 378 is formed between the gate electrode 372 on the passivation layer 375.

Next, the color filter substrate 350 facing the array substrate 370 has a black matrix 352 formed under the transparent substrate 351 to correspond to the gate wiring 372 below, and the black matrix 352. Red, green, and blue color filters 354a, 354b, and 354c overlapping with the black matrix 352 are formed between the black matrix 352 and an overcoat under the red, green, and blue color filters 354a, 354b, and 354c. The layer 356 and the common electrode 358 are sequentially formed. In this case, the overcoat layer 356 may be omitted.

In addition, the liquid crystal layer 390 is interposed between the array substrate 370 and the color filter substrate 350.

Next, the transparent substrate which is the base of the array substrate on which the structure is formed will be described.

A groove having a predetermined depth is formed in a region corresponding to the gate wiring 372 on the substrate 371, and a metal material is formed on an inner wall of the groove. The coated metal film 385 is formed, and a structure 387 having a dielectric 384 is formed therein. In this case, the width w of the structure 387 is formed to have a length equal to 1/2 of the width tge of the gate wiring 372 on the structure 387 to a width tge of the gate wiring 372. It is desirable to be. In addition, the height of the structure 387 inside the substrate 371 is preferably smaller than 2/3 of the thickness of the substrate 371.

Looking at the propagation of light in the liquid crystal layer 390 and the substrate 371 in which the structure 387 is formed, the light incident from the backlight (not shown) between the structures 387 is totally reflected between the structures 387. Finally, the light passes through the array substrate 370. Since the angle of the light finally emitted by the structure 387 is controlled, that is, the angle of the light incident on the liquid crystal layer 390 is limited. Light leakage is also reduced, and the contrast ratio (CR) is improved.

Further, as a modification, in the above-described second embodiment, the structure 387 is formed under the gate wiring 372 in the array substrate 370, but the same effect is obtained even when the structure 387 is formed under the data wiring (not shown). Have

Further, as another modification of the second embodiment, the structure is the same as that shown in FIG. 6, and as shown in FIG. 5, which is a view of the first embodiment, only the structure is moved from the upper surface of the transparent substrate to the inside thereof. It may be formed.

--Method of forming structure inside transparent substrate--

Next, a method of forming a structure for blocking or reflecting light in the transparent substrate to form the array substrate will be described with reference to FIGS. 7A to 7F.

First, as shown in FIG. 7A, a photoresist is coated on the entire surface of the transparent substrate 171, and a mask process using a photolithography method is performed to form a portion where a gate wiring (not shown) or data wiring (not shown) is formed. The photoresist of the corresponding portion is removed. In this case, the remaining photoresist layer 192 functions as an etch stop mask 192.

Next, as illustrated in FIG. 7B, the transparent substrate 171 on which the etch stop mask 192 of FIG. 7A is formed is etched using an etching solution capable of etching the substrate, thereby forming a groove in the substrate 171. And form 194. For example, when the transparent substrate 171 is glass, the substrate 171 is exposed by exposing the exposed region by removing the etch preventing mask (192 in FIG. 7A) to a hydrofluoric acid (HF) solution as an etching solution for a suitable time. The exposed portions between the etching masks 192 of FIG. 7A are etched to form grooves 194 on the front surface of the substrate 171 to correspond to gate lines (not shown) or data lines (not shown). Thereafter, the anti-etch mask 192 of FIG. 7A is removed by stripping or ashing.

Next, as illustrated in FIG. 7C, a metal material having excellent reflectivity is deposited on the entire surface of the substrate 171 on which the grooves 194 are formed, and the metal film 195 is formed on the surface of the substrate 171 and the inner surface of the grooves 194. To form.

Next, as shown in FIG. 7D, the dielectric layer 196 is formed by applying an acrylic or epoxy-based dielectric material on the substrate 171 on which the metal film 195 is formed. At this time, the dielectric material is sufficiently coated to form the dielectric layer 196 so that the dielectric material is completely filled in the groove 194.

Next, as shown in FIG. 7E, dry etching is performed on the dielectric layer (196 of FIG. 7D) to remove the dielectric layer (196 of FIG. 7D) outside the groove 194. In this case, since the dielectric layer (196 of FIG. 7D) formed on the entire surface of the substrate 171 is etched by dry etching at the same time, the groove on the substrate 171 may be adjusted by adjusting the process time such that the dielectric layer 184 remains only in the groove 194. 194) only the dielectric layer (196 in FIG. 7D) in the region excluding the portion is removed. In this case, the metal layer 195 is exposed at the portion where the dielectric layer 196 of FIG. 7D is removed.

Next, as shown in FIG. 7F, the metal film (195 of FIG. 7E) exposed on the substrate 171 is etched, thereby remaining unetched by the dielectric layer 184 formed filling the groove 194. The metal layer 185 and the dielectric layer 184 form a structure 187 that absorbs or reflects light within the substrate 171. Thus, the transparent substrate 171 having the structure 187 therein can be formed.

As described above, using a transparent substrate having a structure in which a groove is formed therein, the surface of which is coated with a metallic material having excellent reflectivity, and the inside is filled with a dielectric material, by a conventional method on the upper or lower surface of the substrate. By manufacturing an array substrate and continuously forming a liquid crystal panel for a liquid crystal display device, a product excellent in light leakage prevention and contrast ratio can be provided.

As an example of a method of manufacturing a substrate having another structure, a method of manufacturing a substrate having a structure formed only of a black series dielectric without forming a coating film of a metal material will be briefly described without a drawing.

First, a photoresist is applied on the substrate and a mask process is performed to form a photoresist pattern on the entire region of the substrate except for the portion where the groove is to be formed.

A portion where the photoresist pattern is not formed is etched to form grooves. Subsequently, black resin is applied to the entire surface of the substrate as an example of a black series dielectric material on the grooved substrate. At this time, the groove is sufficiently filled with the black resin.

Subsequently, when the ashing process is performed, the surface of the substrate is exposed by simultaneously removing the black resin and the lower photoresist pattern with the same thickness as a whole, and the black resin remains in the groove portion. Thus, the transparent substrate having the structure of the dielectric layer of the black resin formed therein is completed.

The present invention is not limited to the above embodiments, and various changes and modifications can be made without departing from the spirit of the present invention.

As described above, according to the present invention, the surface of the transparent substrate is coated with a metal material on a portion corresponding to the data wiring or the gate wiring, and the structure is filled with a dielectric material or a structure made of a black-based dielectric material. By forming a liquid crystal panel using an array substrate, a light leakage phenomenon caused by light passing through the liquid crystal layer that is abnormally driven is prevented, and the angle of light incident on the substrate is reflected by the structure and is incident on the liquid crystal layer. Due to the limitation, it is possible to provide a liquid crystal display device having excellent contrast ratio.

1 is a view schematically showing a general liquid crystal display device.

2 is a cross-sectional view of a transverse electric field type liquid crystal display device in which both a common electrode and a pixel electrode are formed on an array substrate.

3 is a cross-sectional view of a transverse electric field type liquid crystal display device according to a first embodiment of the present invention.

FIG. 4 is a cross-sectional view of the transverse electric field type liquid crystal display device shown in FIG. 3, showing an enlarged view of a transparent substrate on which a structure is formed.

FIG. 5 is a cross-sectional view of a liquid crystal display device as a modification of the first embodiment, in which a structure is formed therein from an upper surface of a transparent substrate which is a base of an array substrate; FIG.

6 is a cross-sectional view of a liquid crystal display device according to a second embodiment of the present invention.

7A to 7F are cross-sectional views of a manufacturing process showing a method of manufacturing a transparent substrate having a structure therein.

<Description of the symbols for the main parts of the drawings>

145: liquid crystal panel 150: color filter substrate

151 and 171: transparent substrate 152: black matrix

154 (154a, 154b, not shown): red, green, blue color filter

156: overcoat layer 170: array substrate

172: common electrode 174: gate insulating film

176: data wiring 178: pixel electrode

180: protective layer 184: dielectric

185: metal film 187: structure

AbLC: Liquid Crystal Layer Area with Abnormal Driving

Claims (18)

And a groove having a predetermined width and depth therein, wherein the groove is filled with a dielectric material to form a structure for reflecting or absorbing incident light. The method of claim 1, The structure formed by filling the dielectric material is a liquid crystal display device substrate, characterized in that the interface with the substrate is coated with a metal material with excellent reflecting ability. The method of claim 2, The dielectric material is an acryl or epoxy-based material or a black resin substrate. The method of claim 1, And the height of the structure is lower than two-thirds of the thickness of the substrate. A substrate including a groove having a predetermined width and depth therein and a structure formed by filling a dielectric material in the groove; A data line and a gate line intersecting each other on one surface of the substrate; A thin film transistor configured at an intersection point of the gate line and the data line and a pixel electrode connected to the thin film transistor Array substrate for a liquid crystal display device comprising a. The method of claim 5, And a common electrode arranged on one surface of the substrate in a staggered manner with the pixel electrode. The method according to any one of claims 5 to 6, And the structure is located under the data line. The method according to any one of claims 5 to 6, And the structure is wider than half the width of the upper data line and thinner than the width of the data line. The method of claim 5, And the structure is disposed under the gate wiring. The method of claim 9, And the structure is wider than half the width of the upper gate wiring and thinner than the width of the gate wiring. The method of claim 5, And the structure is less than two-thirds the height of the transparent substrate. The method of claim 5, And a metal film having a high reflectance on the surface of the structure. The method of claim 5, The dielectric material is an acrylic or epoxy-based material or a black resin transparent substrate for a liquid crystal display device. The method of claim 5, And the groove is formed from the lower surface of the transparent substrate to the inside thereof. The method of claim 5, And the groove is formed from an upper surface of the substrate to the inside thereof. A substrate including a groove having a predetermined width and depth therein, a structure formed by filling a dielectric material in the groove, a data wiring formed on the surface of the substrate to cross each other, a gate wiring, and a gate wiring and a data wiring An array substrate including a thin film transistor configured at an intersection point and a pixel electrode connected to the thin film transistor; A color filter substrate comprising red, green, and blue color filter layers; Liquid crystal layer interposed on the array substrate and the color filter substrate Liquid crystal panel for a liquid crystal display device comprising a. The method of claim 16, And a common electrode on the array substrate, the common electrode intersecting the pixel electrode. Forming a photoresist layer on the glass having a flat surface; Patterning the photoresist layer to expose the glass; Etching the exposed glass to form grooves; Removing the photoresist layer; Coating a metal material on the entire surface of the glass from which the photoresist layer is removed to form a metal film; Forming a coated dielectric material layer on the entire surface of the substrate on which the metal film is formed; Exposing the metal film by performing dry vision on the substrate to which the dielectric material is applied to remove the dielectric material layer except for the dielectric material filled in the groove; Etching and removing the exposed metal layer Method of manufacturing a substrate for a liquid crystal display device comprising a.