KR20050038236A - System for real-time measuring the degree of cure of uv curable polymer - Google Patents
System for real-time measuring the degree of cure of uv curable polymer Download PDFInfo
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- 229920000642 polymer Polymers 0.000 title 1
- 229920005989 resin Polymers 0.000 claims abstract description 63
- 239000011347 resin Substances 0.000 claims abstract description 63
- 238000000034 method Methods 0.000 claims abstract description 28
- 238000005033 Fourier transform infrared spectroscopy Methods 0.000 claims abstract description 22
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 claims abstract description 15
- 230000003287 optical effect Effects 0.000 claims abstract description 12
- 238000001514 detection method Methods 0.000 claims abstract description 3
- 230000005540 biological transmission Effects 0.000 claims description 18
- IOLCXVTUBQKXJR-UHFFFAOYSA-M potassium bromide Chemical group [K+].[Br-] IOLCXVTUBQKXJR-UHFFFAOYSA-M 0.000 claims description 14
- 238000006243 chemical reaction Methods 0.000 claims description 10
- 238000005259 measurement Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 9
- 238000002834 transmittance Methods 0.000 claims description 7
- 239000011248 coating agent Substances 0.000 claims description 6
- 238000000576 coating method Methods 0.000 claims description 6
- 230000001678 irradiating effect Effects 0.000 claims description 5
- 239000000463 material Substances 0.000 claims description 5
- 238000004528 spin coating Methods 0.000 claims description 4
- 230000002452 interceptive effect Effects 0.000 abstract description 2
- 238000001723 curing Methods 0.000 description 29
- 238000004458 analytical method Methods 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000001127 nanoimprint lithography Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 230000009977 dual effect Effects 0.000 description 1
- 238000000609 electron-beam lithography Methods 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N21/3577—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light for analysing liquids, e.g. polluted water
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/33—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using ultraviolet light
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N33/00—Investigating or analysing materials by specific methods not covered by groups G01N1/00 - G01N31/00
- G01N33/44—Resins; Plastics; Rubber; Leather
- G01N33/442—Resins; Plastics
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
- G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
- G01N21/31—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry
- G01N21/35—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light
- G01N2021/3595—Investigating relative effect of material at wavelengths characteristic of specific elements or molecules, e.g. atomic absorption spectrometry using infrared light using FTIR
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Abstract
본 발명은 UV 나노임프린트(nanoimprint) 공정에서 사용되는 UV경화성수지에 대한 실시간 경화도 측정시스템에 관한 것으로, 적외광을 방출하는 IR광원과, IR광원으로부터 방출된 적외광을 간섭시키는 간섭계와, UV경화성수지 시료를 통과한 적외광을 검출하는 검출기와, 검출기의 검출결과를 연산처리하여 출력하는 디지털 프로세서로 구성되며, 검출기 다음의 광로상에 시료를 장착하여 분석하는 FT-IR분광기; 자외광을 방출하는 UV광원과, UV광원으로부터 방출된 자외광을 FT-IR분광기내에 장착된 시료에 조사되도록 안내하는 광가이드로 구성되는 UV조사장치부;를 포함한다.The present invention relates to a real-time curing degree measuring system for the UV curable resin used in the UV nanoimprint process, the IR light source for emitting infrared light, the interferometer for interfering the infrared light emitted from the IR light source, UV A FT-IR spectrometer comprising a detector for detecting infrared light that has passed through the curable resin sample, and a digital processor for calculating and outputting a detection result of the detector; It includes; UV irradiation device unit consisting of a UV light source for emitting ultraviolet light, and an optical guide for guiding the ultraviolet light emitted from the UV light source to the sample mounted in the FT-IR spectrometer.
Description
본 발명은 UV 나노임프린트(nanoimprint) 공정에서 사용되는 UV경화성수지의 실시간 경화도 측정시스템에 관한 것으로써, 더욱 상세하게는 종래의 푸리에 변환 적외선 분광기(FT-IR ; Fourier Transform Infrared Spectroscopy)에 UV조사장치부를 부가하여, UV조사에 의해 UV경화성수지를 경화시키면서 실시간으로 그 경화도의 변화를 파악할 수 있도록 하는 UV경화성수지의 실시간 경화도 측정시스템에 관한 것이다.The present invention relates to a system for measuring the real-time curing degree of the UV curable resin used in the UV nanoimprint process, and more particularly, UV irradiation on a conventional Fourier Transform Infrared Spectroscopy (FT-IR). The present invention relates to a system for measuring the real-time curing degree of a UV-curable resin by adding a device unit and allowing the UV-curable resin to be cured by UV irradiation to grasp the change in the degree of curing in real time.
일반적으로, 나노기술(nano technology)은 현재 전세계적으로 주목받고 있으며, 이 기술에 대한 많은 연구가 진행되고 있다.In general, nanotechnology is currently attracting attention around the world, and much research is being conducted on this technology.
그리고, 나노기술중의 하나인 나노임프린트 리소그래피(nanoimprint lithography)에 관한 연구도 활발한데, 나노임프린트 리소그래피 기술은 수~수십 나노급의 선폭을 가지는 스탬프(stamp)를 전자빔 리소그래피(electron beam lithography)를 이용하여 제작한 후, 스탬프에 형성된 패턴과 동일한 형상을 원하는 곳에 모사하는 기술로서, 그 장점은 기존의 반도체 노광공정에서 빛의 회절현상에 의해 필연적으로 발생되는 선폭의 한계를 해결할 수 있고, 경제적으로 나노구조물을 비교적 빠른 속도로 제작할 수 있다는 것이다.In addition, research on nanoimprint lithography, which is one of nanotechnology, is also active. Nanoimprint lithography uses electron beam lithography for stamps having a line width of several tens to several tens of nanoscales. After the fabrication process, the same shape as the pattern formed on the stamp is simulated where desired. The advantage is that it can solve the limitation of the line width inevitably generated by the diffraction phenomenon of light in the conventional semiconductor exposure process, and economically nano The structure can be manufactured at a relatively high speed.
이러한 나노임프린트 리소그래피 기술은 크게 열을 가하는 방식과 UV경화성수지를 이용하는 방식이 있는데, 열을 가하는 방식은 열경화성수지를 이용하여 고온조건에서 스탬프를 고압으로 눌러 원래의 형상을 모사하며, 한편 UV 나노임프린트 방식은 광경화반응을 이용하여 UV경화성수지를 경화시켜 모사한다. 이중 UV를 이용하는 방식은 상온, 저압에서 모사가 가능한 장점으로 인해 크게 부각되고 있는 실정이다.The nanoimprint lithography technology uses large heat and UV curable resins. The heat applying method simulates the original shape by pressing the stamp at a high pressure under high temperature conditions using a thermosetting resin, while UV nanoimprint The method is simulated by curing the UV curable resin using a photocuring reaction. The dual UV method has been highlighted due to the advantages that can be simulated at room temperature and low pressure.
UV 나노임프린트 공정의 핵심은 나노단위의 형상정밀도를 가지는 스템프를 정확하게 제작하는 것과 이러한 스탬프를 이용하여 패턴형상을 정확하게 모사하는 것으로, 모사된 패턴이 원래의 형상을 잘 반영하기 위해서는 UV조사에 의한 UV경화성수지의 경화특성을 파악하는 것이 필수적이다.The core of the UV nanoimprint process is to accurately produce stamps with nanoscale shape accuracy, and to accurately simulate the pattern shape using these stamps. In order for the simulated pattern to reflect the original shape well, It is essential to understand the curing characteristics of curable resins.
즉, 수십 나노급의 스탬프를 만든 후, UV경화성수지로 스탬프의 빈 공간을 채우고, UV의 광에너지로 UV경화성수지를 경화시키는 일련의 프로세스를 갖는 나노임프린트 공정에서 스탬프 내부에 충전된 UV경화성수지는 UV조사에 의한 경화가 진행됨에 따라 그 물성이 변하게 되므로, 경화에 필요한 최적의 UV 조사시간을 밝히는 것은 공정의 생산성 향상에 큰 영향을 미친다. 또한, 나노임프린트 공정에서는 UV경화성수지에 UV를 조사한 후 UV조사를 중지한다 하더라도 UV경화성수지 내부에서는 이와 관계없이 경화가 계속적으로 진행되므로, 만약 경화도를 실시간으로 측정하지 않는다면 UV조사가 멈춘 후에 진행된 경화가 추가적으로 더해져서 경화도의 최종값은 실제값보다 크게 관찰될 것이므로, 정확한 경화도의 측정을 위해서는 실시간으로 측정한 데이터가 필요하다.In other words, after making dozens of nano-grade stamps, the UV-curable resin filled inside the stamp in the nanoimprint process having a series of processes to fill the empty space of the stamp with UV-curable resin, and curing the UV-curable resin with UV light energy Since the physical properties change as the curing by UV irradiation proceeds, clarifying the optimal UV irradiation time required for curing has a great effect on improving the productivity of the process. In addition, in the nanoimprint process, even if the UV irradiation is stopped after irradiating the UV curable resin, the curing proceeds continuously regardless of the inside of the UV curable resin. In addition, since the final value of the degree of curing will be observed to be larger than the actual value, the data measured in real time is necessary for accurate measurement of the degree of curing.
그러나, 지금까지 경화도를 실시간으로 측정할 수 있는 기술은 제공된 바가 없다.However, until now, there is no technology that can measure the degree of curing in real time.
본 발명은 상기와 같은 제반 문제점을 해결하기 위하여 창안된 것으로써, 종래의 푸리에 변환 적외선 분광기(FT-IR ; Fourier Transform Infrared Spectroscopy)에 UV조사장치부를 부가하여, UV조사에 의해 UV경화성수지를 경화시키면서 실시간으로 그 경화도의 변화를 파악할 수 있도록 하는 UV경화성수지의 실시간 경화도 측정시스템 및 그 방법을 제공하는데 그 목적이 있다.The present invention was devised to solve the above problems, by adding a UV irradiation unit to a conventional Fourier Transform Infrared Spectroscopy (FT-IR), curing the UV-curable resin by UV irradiation It is an object of the present invention to provide a real-time curing degree measuring system and method of UV-curable resin that can grasp the change in the degree of curing in real time.
그리고, 본 발명의 다른 목적은 점성이 낮은 UV경화성수지에 대하여 실시간 경화도 측정이 가능하도록 스핀코팅(spin coating)방식을 이용하여 시편을 제작하는 방법을 제공하는데 있다.In addition, another object of the present invention is to provide a method for fabricating a specimen using a spin coating method to measure the real-time curing degree for a low viscosity UV curable resin.
상술한 목적을 달성하기 위한 본 발명은, 적외광을 방출하는 IR광원과, 상기 IR광원으로부터 방출된 상기 적외광을 간섭시키는 간섭계와, UV경화성수지 시료를 통과한 상기 적외광을 검출하는 검출기와, 상기 검출기의 검출결과를 연산처리하여 출력하는 디지털 프로세서로 구성되며, 상기 검출기 다음의 광로상에 상기 시료를 장착하여 분석하는 FT-IR분광기; 자외광을 방출하는 UV광원과, 상기 UV광원으로부터 방출된 상기 자외광을 상기 FT-IR분광기내에 장착된 상기 시료에 조사되도록 안내하는 광가이드로 구성되는 UV조사장치부;를 포함하는 UV경화성수지의 실시간 경화도 측정시스템을 제공한다.The present invention for achieving the above object is an IR light source for emitting infrared light, an interferometer for interfering the infrared light emitted from the IR light source, a detector for detecting the infrared light passing through the UV curable resin sample; And an FT-IR spectrometer comprising a digital processor for calculating and outputting a detection result of the detector, and mounting and analyzing the sample on an optical path next to the detector; UV curable resin comprising a UV light source for guiding the ultraviolet light source for emitting ultraviolet light and the ultraviolet light emitted from the UV light source to the sample mounted in the FT-IR spectrometer; It provides a real-time curing degree measurement system.
바람직하게, 상기 UV조사장치부는, 상기 UV광원에서 상기 자외광과 함께 방출되는 적외광을 제거시키기 위해 상기 UV광원의 전방 광로상에 구비되는 콜드미러와, 상기 광가이드의 끝단측에 구비되어 상기 광가이드에서 나오는 상기 자외광의 직진성을 강화시키는 집광렌즈와, 상기 UV광원에서 방출되는 상기 자외광을 선택적으로 진행 또는 차단시키기 위해 상기 콜드미러 다음의 광로상에 구비되는 셔터와, 상기 광가이드의 위치를 조절하여 상기 자외광이 상기 시료에 정확히 조사되도록 하는 X-Y 변환 스테이지를 더 구비할 수 있다.Preferably, the UV irradiator unit, a cold mirror provided on the front optical path of the UV light source to remove the infrared light emitted from the UV light source with the ultraviolet light, and is provided on the end side of the light guide A condenser lens for enhancing the linearity of the ultraviolet light emitted from the optical guide, a shutter provided on the optical path following the cold mirror to selectively advance or block the ultraviolet light emitted from the UV light source, and It may be further provided with an XY conversion stage to adjust the position so that the ultraviolet light is accurately irradiated to the sample.
또한, 상술한 목적을 달성하기 위한 본 발명은, 측정대상의 UV경화성수지 시료를 양측의 적외선투과창 사이에 도입한 시편을 준비하는 단계; 상기 시편의 UV경화성수지 시료에 자외광을 일정시간 조사하여 시간경과에 따라 상기 UV경화성수지 시료를 경화시키는 단계; 상기 자외광의 조사전부터 조사후까지의 일정시간 동안 상기 시편의 UV경화성수지 시료에 적외광을 조사하여 적외광 투과율의 변화를 측정하는 단계;를 포함하는 UV경화성수지의 실시간 경화도 측정방법을 제공한다.In addition, the present invention for achieving the above object comprises the steps of preparing a specimen in which the UV curable resin sample to be measured between the infrared transmission window on both sides; Irradiating the UV-curable resin sample of the specimen with ultraviolet light for a predetermined time to cure the UV-curable resin sample according to time; Providing a method for measuring the real-time curing degree of the UV-curable resin comprising a; irradiating the infrared light to the UV-curable resin sample of the specimen for a predetermined time from before the irradiation of the ultraviolet light; do.
나아가, 상술한 다른 목적을 달성하기 위한 본 발명은, 적외광이 흡수되지 않는 재료를 틀에 넣고 압축하여 얇은 적외선투과창을 두장 준비하는 제 1 단계; 한장의 상기 적외선투과창상에 UV경화성수지 시료를 코팅하는 제 2 단계; 다른 한장의 상기 적외선투과창으로 코팅된 상기 UV경화성수지 시료를 덮는 제 3 단계;를 포함하는 실시간 경화도 측정을 위한 저점도 UV경화성수지 시편의 제작방법을 제공한다.Furthermore, the present invention for achieving the above-mentioned other object, the first step of preparing two thin infrared transmission window by compressing a material that is not absorbed by infrared light into the mold; A second step of coating a UV curable resin sample on one infrared transmission window; The third step of covering the UV curable resin sample coated with the infrared transmission window of another sheet; provides a method for producing a low-viscosity UV curable resin specimen for real-time curing degree comprising a.
바람직하게, 상기 제 2 단계에서, 스핀코팅방식으로 코팅하며, 상기 적외선투과창의 재료는 브롬화칼륨(KBr)이고 원형판 형태일 수 있다.Preferably, in the second step, the coating by spin coating, the material of the infrared transmission window is potassium bromide (KBr) and may be in the form of a circular plate.
본 발명의 상기 목적과 여러가지 장점은 이 기술분야에 숙련된 사람들에 의해 첨부된 도면을 참조하여 아래에 기술되는 발명의 바람직한 실시예로부터 더욱 명확하게 될 것이다.The above objects and various advantages of the present invention will become more apparent from the preferred embodiments of the invention described below with reference to the accompanying drawings by those skilled in the art.
이하, 첨부된 도면을 참조로 본 발명의 바람직한 실시예를 상세히 설명하기로 한다.Hereinafter, exemplary embodiments of the present invention will be described in detail with reference to the accompanying drawings.
도 1은 본 발명에 따른 UV경화성수지의 실시간 경화도 측정시스템에 대한 개략도이다.1 is a schematic diagram of a system for measuring the real-time curing degree of the UV curable resin according to the present invention.
종래의 푸리에 변환 적외선 분광기(FT-IR ; Fourier Transform Infrared Spectroscopy, 이하 "FT-IR분광기"라 함.)는 통상적으로 특정시료의 분자구조를 파악하는데 사용되는 장치로, 그 작동을 살펴보면, 내부의 적외광 광로상에 시료(20)를 장착한 후 작동시키면, IR광원(10)에서 적외광이 방출되어 렌즈(12)를 거쳐 마이켈슨 간섭계(Michelson interferometer)(14)로 대표되는 간섭계에서 간섭된 후, 시료(20)를 투과하게 되며, 투과된 적외광이 검출기(detector)(16)에 검출된 후, 퍼스널컴퓨터와 같은 데이터 프로세서(data processor)(18)에서 검출기(16)의 출력신호에 따라 연산처리를 행하고 그 분석결과를 도표 등으로 표시함으로써, 사용자로 하여금 분석결과를 용이하게 파악하도록 한다.Conventional Fourier Transform Infrared Spectroscopy (FT-IR) is commonly used to determine the molecular structure of a particular sample. When the sample 20 is mounted on the infrared light path and operated, the infrared light is emitted from the IR light source 10 to interfere with the interferometer represented by the Michelson interferometer 14 through the lens 12. Thereafter, the sample 20 is transmitted, and the transmitted infrared light is detected by the detector 16, and then transmitted to the output signal of the detector 16 by a data processor 18 such as a personal computer. By performing arithmetic processing accordingly and displaying the analysis result in a chart or the like, the user can easily grasp the analysis result.
이러한 FT-IR분광기의 기본원리를 살펴보면, 분자내의 원자는 항상 기본진동을 하고 있고, 원자의 기본진동수는 적외선영역에 걸쳐 있으므로, 분자에 그 기본진동수와 같은 진동수(즉, 주파수)를 가진 적외광을 조사하면, 이 분자는 적외광에너지를 흡수하여 기본진동의 진폭이 증가하게 되므로, 시료(20)를 통과한 적외광 투과율의 변화로부터 시료(20)의 분자구조를 파악가능하게 한다.Looking at the basic principle of the FT-IR spectrometer, since the atoms in a molecule are always in fundamental vibration and the fundamental frequency of the atom is in the infrared region, infrared light with the same frequency (ie, frequency) in the molecule In this case, since the molecule absorbs infrared light energy and the amplitude of the fundamental vibration increases, it is possible to grasp the molecular structure of the sample 20 from the change of the infrared light transmittance passing through the sample 20.
본 발명에 따르면, 이러한 FT-IR분광기에 UV조사장치부를 부가하여 UV조사에 의해 UV경화성수지를 경화시키면서 실시간으로 그 경화도의 변화를 파악하도록 하는 측정시스템이 제공된다.According to the present invention, there is provided a measurement system which adds a UV irradiation apparatus to such an FT-IR spectrometer to cure the UV-curable resin by UV irradiation and grasp the change in the degree of curing in real time.
즉, FT-IR분광기 내부에 장착된 UV경화성수지 시료(20)에 UV조사장치부로 자외광을 계속적으로 조사하면, UV경화성수지(20)는 경화반응을 일으키게 되고, 이는 UV경화성수지(20) 내부의 분자구조의 변화를 야기시켜, 그 변화량을 실시간으로 FT-IR분광기로 측정함으로써 그 경화정도를 파악할 수 있다.That is, when UV light continuously irradiates the UV curable resin sample 20 mounted inside the FT-IR spectrometer with the UV irradiator, the UV curable resin 20 causes a curing reaction, which is the UV curable resin 20. The degree of hardening can be determined by causing a change in the internal molecular structure and measuring the change amount in real time with an FT-IR spectrometer.
상기한 UV조사장치부를 살펴보면, UV광원(30)에서 방출되는 자외광은 전송손실이 적은 광가이드(light guide)(38)를 통해 안내되어 FT-IR분광기 내부에 장착된 UV경화성수지 시료(20)에 조사되게 되는데, 광가이드(38) 끝단측에는 집광렌즈(42)가 부설되어 광가이드(38)에서 나오는 자외광의 직진성을 강화시켜 조사강도가 저하되는 것을 방지한다. 그리고, 측정시간동안 자외광을 정확한 위치에 조사하도록 광가이드(38)의 위치를 조절하는 X-Y 변환 스테이지(X-Y stage)(40)가 구비되며, X-Y 변환 스테이지(40)에는 마이크로미터가 부착되어 정밀제어를 가능하게 한다.Looking at the UV irradiator unit, ultraviolet light emitted from the UV light source 30 is guided through a light guide (38) with a low transmission loss, UV curable resin sample 20 mounted inside the FT-IR spectrometer ), The condenser lens 42 is disposed at the end of the light guide 38 to enhance the straightness of the ultraviolet light emitted from the light guide 38 to prevent the irradiation intensity from being lowered. In addition, an XY conversion stage (XY stage) 40 for adjusting the position of the light guide 38 to irradiate the ultraviolet light to the correct position during the measurement time is provided, the micrometer is attached to the XY conversion stage 40 Enable control.
상기 UV광원(30)으로는 반도체공정에서 사용하는 UV램프가 사용될 수 있는데, UV램프에서는 자외광뿐만 아니라 적외광도 방출되므로, 이 적외광이 FT-IR분광기에서 조사되는 적외광과 합해져 FT-IR분광기의 분석결과에 오류를 발생시킬 수 있으므로, UV광원(30)의 전방 광로상에는 자외광과 함께 방출되는 적외광을 차단시키기 위한 콜드미러(cold mirror)(34)가 구비된다.As the UV light source 30, a UV lamp used in a semiconductor process may be used. Since the UV lamp emits not only ultraviolet light but also infrared light, the infrared light is combined with the infrared light irradiated from the FT-IR spectrometer to make the FT- Since an error may be generated in the analysis result of the IR spectrometer, a cold mirror 34 is provided on the front optical path of the UV light source 30 to block infrared light emitted together with the ultraviolet light.
나아가, 콜드미러(34)의 전방 광로상에는 그 개폐를 통해 UV광원(30)으로부터 방출되는 자외광을 선택적으로 진행 또는 차단시키는 셔터(shutter)(36)가 구비될 수 있다.Furthermore, a shutter 36 may be provided on the front optical path of the cold mirror 34 to selectively proceed or block the ultraviolet light emitted from the UV light source 30 through the opening and closing of the cold mirror 34.
덧붙여, 미설명 도면부호 32는 통상적인 렌즈를 나타낸다.In addition, reference numeral 32 denotes a conventional lens.
한편, 종래에는 UV 나노임프린트를 위해서 UV경화성수지의 경우 괘속조형(rapid prototyping)을 위한 수지가 사용되었으나 높은 점성 때문에 스탬프의 형상을 빠른 시간내에 모사하는데 한계가 있어, 최근에는 UV 파장영역에서 빠른 경화속도를 갖는 저점도의 UV경화성수지가 활발히 개발되고 있다.On the other hand, in the conventional UV curable resin for the UV nanoimprint resin for the rapid prototyping (rapid prototyping) resin is used, but due to the high viscosity has a limit in simulating the shape of the stamp in a short time, in recent years fast curing in the UV wavelength range Low viscosity UV curable resins with speed have been actively developed.
따라서, 본 발명에 따르면, 저점도의 UV경화성수지를 분석할 수 있도록 하는 시편 제작법이 제공된다.Therefore, according to the present invention, there is provided a method for producing a specimen to analyze the low-viscosity UV curable resin.
즉, 점성이 낮아 잘 흘러내리는 UV경화성수지 시료(20)에 대해서도 경화도 변화의 측정이 가능하도록 적외광이 흡수되지 않는 재료인 브롬화칼륨(KBr)을 이용하여 시편을 제작하게 된다. 그 제작과정은 먼저 KBr 분말을 압축기로 압축하여 얇은 원형판 형태로 두장의 적외선투과창(IR transmitting window)(22)을 만든 후, 한장의 적외선투과창(22)상에 반도체공정용 스핀코팅(spin coating)장비를 이용하여 측정대상인 액상의 UV경화성수지 시료(20)를 코팅한 후, 다른 적외선투광창(22)을 코팅된 시료(20)위에 덮어 양측의 적외선투과창(22)을 압축함으로써 시편을 제작하게 된다. 만약, 한장의 적외선투과창(22)을 이용하여 그 위에 시료를 묻힐 경우, 시편이 수직으로 장착되어야 하는 FT-IR분광기 내부의 구조상, 저점도 시료의 경우 흘러내려 잘못된 측정결과를 도출시킬 것이다.That is, the specimen is manufactured by using potassium bromide (KBr), which is a material that does not absorb infrared light, so that the change in curing degree can be measured even for the UV curable resin sample 20 having low viscosity. The fabrication process first compresses KBr powder with a compressor to make two IR transmitting windows 22 in the form of a thin circular plate, and then spin coating the semiconductor process onto one infrared transmission window 22. After coating the liquid UV curable resin sample 20 to be measured using a coating device, the other infrared transmission window 22 is covered on the coated sample 20 to compress the infrared transmission windows 22 on both sides. Will be produced. If a sample is buried thereon using a single infrared transmission window 22, in the structure inside the FT-IR spectrometer in which the specimen is to be mounted vertically, the low viscosity sample will flow down and lead to an incorrect measurement result.
이상과 같은 구성을 갖는 본 발명에 따른 UV경화성수지의 실시간 경화도 측정시스템의 작동에 대해 이하 간략히 설명한다.The operation of the real-time curing degree measuring system of the UV curable resin according to the present invention having the above configuration will be briefly described below.
먼저, 측정대상의 UV경화성수지 시료(20)를 양측의 적외선투과창(22)사이에 도입한 시편을 FT-IR분광기내에 장착시킨 후, UV조사장치부의 X-Y 변환 스테이지(40)를 조작하여 광가이드(38)를 약 45° 각도로 고정시켜 시편에 자외광이 정확하게 조사되도록 설치하고, 최종적으로 FT-IR분광기와 UV광원(30)을 동시에 작동시킨다.First, the specimen in which the UV-curable resin sample 20 to be measured is introduced between the infrared transmission windows 22 on both sides is mounted in the FT-IR spectrometer, and then the XY conversion stage 40 of the UV irradiation unit is operated to operate the light. The guide 38 is fixed at an angle of about 45 ° so that ultraviolet light can be accurately irradiated onto the specimen. Finally, the FT-IR spectrometer and the UV light source 30 are operated simultaneously.
이에 따라, UV조사장치부를 통해 자외광이 일정시간 동안 시편에 조사되어 UV경화성수지(20)는 시간경과에 따라 경화되게 되며, 이와 동시에 FT-IR분광기는 계속적으로 시편에 적외광을 조사하여 UV조사 전부터 후까지 시간에 따른 UV경화성수지(20)에 대한 적외광 투과율의 변화를 측정하고, 데이터 프로세서(18)를 통해 도표 등으로 표시함으로써, 사용자로 하여금 해당 UV경화성수지(20)에 대한 경화특성 즉, UV 나노임프린트를 위한 최적의 조사시간을 확인할 수 있도록 한다.Accordingly, the ultraviolet light is irradiated onto the specimen for a predetermined time through the UV irradiator, and the UV-curable resin 20 is cured according to the time. At the same time, the FT-IR spectrometer continuously irradiates the specimen with UV By measuring the change in the infrared light transmittance of the UV curable resin 20 with time before and after the irradiation, and by displaying in a chart or the like through the data processor 18, the user to cure the UV curable resin 20 This allows the identification of optimal irradiation time for UV nanoimprint.
참고로, 얻어지는 적외광 투과율 데이터로부터 경화도를 판단하기 위한 변환식은 다음과 같다.For reference, the conversion equation for determining the degree of curing from the obtained infrared light transmittance data is as follows.
여기서, A0는 UV조사를 시작하기 전의 적외광 투과율, At는 조사시간 t에서의 적외광 투과율, Amax는 경화가 완료된 후의 적외광 투과율이다.Here, A 0 is an infrared light transmittance before starting UV irradiation, A t is an infrared light transmittance at irradiation time t, and A max is an infrared light transmittance after completion of curing.
이와 같은 변환식을 이용하면, 예컨대 경화도가 95% 되었을 때 소요된 UV조사 시간을 알 수 있다.Using such a conversion equation, for example, the UV irradiation time required when the degree of curing reaches 95% can be known.
이상, 상기 내용은 본 발명의 바람직한 일 실시예를 단지 예시한 것으로 본 발명의 당업자는 본 발명의 요지를 변경시킴이 없이 본 발명에 대한 수정과 변경을 가할 수 있음을 인지해야 한다.In the foregoing description, it should be understood that those skilled in the art can make modifications and changes to the present invention without changing the gist of the present invention as merely illustrative of a preferred embodiment of the present invention.
본 발명에 따르면, 특정 UV경화성수지에 대한 최적의 UV조사시간을 정확하게 측정할 수 있어, 종국적으로 UV 나노임프린트 공정의 생산성을 향상시키는 효과가 달성될 수 있다.According to the present invention, it is possible to accurately measure the optimum UV irradiation time for the specific UV-curable resin, and finally the effect of improving the productivity of the UV nanoimprint process can be achieved.
도 1은 본 발명에 따른 UV경화성수지의 실시간 경화도 측정시스템의 구성에 대한 개략도이다.1 is a schematic diagram of the configuration of a system for measuring the real-time curing degree of the UV curable resin according to the present invention.
<도면의 주요부분에 대한 부호의 설명><Description of the symbols for the main parts of the drawings>
10 : IR광원 12 : 렌즈10 IR source 12 lens
14 : 마이켈슨 간섭계(Michelson interferometer)14 Michelson interferometer
16 : 검출기 18 : 데이터 프로세서16: detector 18: data processor
20 : 시료(UV경화성수지)20: Sample (UV curable resin)
22 : 적외선투과창(IR transmitting window)22: IR transmitting window
30 : UV광원 32 : 렌즈30: UV light source 32: lens
34 : 콜드미러(cold mirror) 36 : 셔터(shutter)34: cold mirror 36: shutter
38 : 광가이드(light guide) 40 : X-Y 변환 스테이지(X-Y stage)38: light guide 40: X-Y conversion stage (X-Y stage)
42 : 집광렌즈42 condensing lens
Claims (9)
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| KR1020050070326A Division KR20050088948A (en) | 2005-08-01 | 2005-08-01 | Method for manufacturing work piecess of cure of uv curable polymer |
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| KR100547279B1 KR100547279B1 (en) | 2006-01-31 |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116559118A (en) * | 2023-07-11 | 2023-08-08 | 广东工业大学 | Polymer curing monitoring method, system and device based on light attenuation coefficient change |
| CN117907259A (en) * | 2024-03-20 | 2024-04-19 | 深圳市聚芯源新材料技术有限公司 | Epoxy structural adhesive curing detection device and detection method |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR100763553B1 (en) | 2006-11-16 | 2007-10-04 | 삼성전자주식회사 | Apparatus and method of analyzing photoresist |
| KR20210080680A (en) | 2019-12-20 | 2021-07-01 | 삼성디스플레이 주식회사 | Display device including bonding member |
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Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN116559118A (en) * | 2023-07-11 | 2023-08-08 | 广东工业大学 | Polymer curing monitoring method, system and device based on light attenuation coefficient change |
| CN116559118B (en) * | 2023-07-11 | 2023-09-22 | 广东工业大学 | Polymer curing monitoring method, system and device based on light attenuation coefficient change |
| CN117907259A (en) * | 2024-03-20 | 2024-04-19 | 深圳市聚芯源新材料技术有限公司 | Epoxy structural adhesive curing detection device and detection method |
| CN117907259B (en) * | 2024-03-20 | 2024-05-14 | 深圳市聚芯源新材料技术有限公司 | Epoxy structural adhesive curing detection device and detection method |
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| KR100547279B1 (en) | 2006-01-31 |
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