KR20050011212A - 태양전지 및 그의 제조방법 - Google Patents
태양전지 및 그의 제조방법 Download PDFInfo
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- KR20050011212A KR20050011212A KR1020030050215A KR20030050215A KR20050011212A KR 20050011212 A KR20050011212 A KR 20050011212A KR 1020030050215 A KR1020030050215 A KR 1020030050215A KR 20030050215 A KR20030050215 A KR 20030050215A KR 20050011212 A KR20050011212 A KR 20050011212A
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- solar cell
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- 239000010409 thin film Substances 0.000 claims abstract description 54
- 239000004065 semiconductor Substances 0.000 claims abstract description 34
- 239000000758 substrate Substances 0.000 claims abstract description 19
- 238000010521 absorption reaction Methods 0.000 claims abstract description 10
- 239000010408 film Substances 0.000 claims description 29
- 238000000034 method Methods 0.000 claims description 20
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 17
- 229910052751 metal Inorganic materials 0.000 claims description 14
- 239000002184 metal Substances 0.000 claims description 14
- 229910021419 crystalline silicon Inorganic materials 0.000 claims description 10
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 230000001681 protective effect Effects 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- 239000004020 conductor Substances 0.000 claims description 6
- 239000011521 glass Substances 0.000 claims description 5
- 239000012535 impurity Substances 0.000 claims description 4
- 238000002161 passivation Methods 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 238000000206 photolithography Methods 0.000 claims description 3
- 230000000694 effects Effects 0.000 abstract description 14
- 230000015556 catabolic process Effects 0.000 abstract description 4
- 238000006731 degradation reaction Methods 0.000 abstract description 4
- 238000000151 deposition Methods 0.000 abstract 1
- 230000006866 deterioration Effects 0.000 description 7
- 238000010438 heat treatment Methods 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- 238000013461 design Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- -1 ITO Substances 0.000 description 1
- 229910006404 SnO 2 Inorganic materials 0.000 description 1
- 239000006096 absorbing agent Substances 0.000 description 1
- 230000032683 aging Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000013508 migration Methods 0.000 description 1
- 230000005012 migration Effects 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/0248—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies
- H01L31/036—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes
- H01L31/0376—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors
- H01L31/03762—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic System
- H01L31/03767—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by their semiconductor bodies characterised by their crystalline structure or particular orientation of the crystalline planes including amorphous semiconductors including only elements of Group IV of the Periodic System presenting light-induced characteristic variations, e.g. Staebler-Wronski effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0216—Coatings
- H01L31/02161—Coatings for devices characterised by at least one potential jump barrier or surface barrier
- H01L31/02167—Coatings for devices characterised by at least one potential jump barrier or surface barrier for solar cells
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0224—Electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/04—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices
- H01L31/06—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier
- H01L31/075—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof adapted as photovoltaic [PV] conversion devices characterised by at least one potential-jump barrier or surface barrier the potential barriers being only of the PIN type
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
- H01L31/186—Particular post-treatment for the devices, e.g. annealing, impurity gettering, short-circuit elimination, recrystallisation
- H01L31/1864—Annealing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/548—Amorphous silicon PV cells
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
Description
Claims (14)
- 기판 상부에 제 1 전극, P형 반도체층, 흡수층, N형 반도체층과 제 2 전극이 순차적으로 적층된 태양전지 소자영역과;상기 제 2 전극 상부에 형성된 절연막과;상기 절연막 상부에 형성된 박막히터 패턴으로 구성된 태양전지.
- 제 1 항에 있어서,상기 절연막과 박막히터 패턴의 상부에는,상기 박막히터 패턴을 외부로부터 보호하는 보호막이 더 형성되어 있는 것을 특징으로 하는 태양전지.
- 제 1 항에 있어서,상기 흡수층은 도핑되지 않은 비정질 실리콘층이며,상기 P형과 N형 반도체층은 P형과 N형 불순물로 각각 도핑된 비정질 실리콘층인 것을 특징으로 하는 태양전지.
- 제 3 항에 있어서,상기 N형 반도체층과 제 2 전극의 사이에는,P형 결정질 실리콘층, 도핑되지 않은 결정질 실리콘층과 N형 결정질 실리콘층이 순차적으로 적층된 구조가 더 구비되어 있는 것을 특징으로 하는 태양전지.
- 제 4 항에 있어서,상기 P형 비정질 실리콘층, 도핑되지 않은 비정질 실리콘층과 N형 비정질 실리콘층 각각은,상호 대응되는 P형 결정질 실리콘층, 도핑되지 않은 결정질 실리콘층과 N형 결정질 실리콘층 각각의 두께보다 얇게 형성되어 있는 것을 특징으로 하는 태양전지.
- 제 1 항에 있어서,상기 박막 히터 패턴의 사이에는,상기 박막 히터 패턴에서 히팅된 온도를 측정할 수 있는 소자가 더 형성된 것을 특징으로 하는 태양전지.
- 제 6 항에 있어서,상기 온도를 측정할 수 있는 소자는,상호 이격된 두 전극단자를 갖는 서모커플인 것을 것을 특징으로 하는 태양전지.
- 제 1 항에 있어서,상기 기판은,플라스틱, 실리콘과 글래스(Glass) 중 어느 하나 것을 특징으로 하는 태양전지.
- 제 1 항에 있어서,상기 기판이 플라스틱 또는 실리콘이며,상기 제 1 전극은 금속이고, 상기 제 2 전극은 투명 전도성 산화막(Transparent Conducting Oxide, TCO)인 것을 특징으로 하는 태양전지.
- 제 1 항에 있어서,상기 기판이 글래스이며,상기 제 1 전극은 투명 전도성 산화막이고, 상기 제 2 전극은 금속인 것을 특징으로 하는 태양전지.
- 금속으로된 기판 상부에 P형 반도체층, 흡수층, N형 반도체층과 전극이 순차적으로 적층된 태양전지 소자영역과;상기 전극 상부에 형성된 절연막과;상기 절연막 상부에 형성된 박막히터와;상기 박막히터를 외부로부터 보호하는 보호막으로 구성된 태양전지.
- 기판 상부에 제 1 전극, P형 반도체층, 흡수층, N형 반도체층과 제 2 전극을 순차적으로 적층하는 단계와;상기 제 2 전극 상부에 절연막을 형성하는 단계와;상기 절연막 상부에 금속층을 형성하고, 사진식각공정을 수행하여 상기 금속층으로 이루어진 박막 히터 패턴을 형성하는 단계와;상기 절연막과 박막 히터 패턴의 상부에 보호막을 형성하는 단계와;상기 박막 히터 패턴의 양단 상부에 있는 보호막을 각각 제거하여 한 쌍의 컨택홀(Contact hole)들을 형성하는 단계와;상기 컨택홀들의 내부에 도전성 물질을 충진한 후, 상기 컨택홀들의 도전성 물질과 전기적으로 접촉되는 한 쌍의 전극패드들을 형성하는 단계로 구성된 태양전지의 제조 방법.
- 제 12 항에 있어서,상기 흡수층은 도핑되지 않은 비정질 실리콘층이며,상기 P형과 N형 반도체층은 P형과 N형 불순물로 각각 도핑된 비정질 실리콘층인 것을 특징으로 하는 태양전지의 제조 방법.
- 제 13 항에 있어서,상기 N형 반도체층과 제 2 전극의 사이에,P형 결정질 실리콘층, 도핑되지 않은 결정질 실리콘층과 N형 결정질 실리콘층이 순차적으로 적층된 구조를 더 형성하는 것을 특징으로 하는 태양전지의 제조 방법
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2003-0050215A KR100539639B1 (ko) | 2003-07-22 | 2003-07-22 | 태양전지 및 그의 제조방법 |
US10/733,261 US20050016582A1 (en) | 2003-07-22 | 2003-12-12 | Solar cell and method of manufacturing the same |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2003-0050215A KR100539639B1 (ko) | 2003-07-22 | 2003-07-22 | 태양전지 및 그의 제조방법 |
Publications (2)
Publication Number | Publication Date |
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KR20050011212A true KR20050011212A (ko) | 2005-01-29 |
KR100539639B1 KR100539639B1 (ko) | 2005-12-29 |
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KR10-2003-0050215A KR100539639B1 (ko) | 2003-07-22 | 2003-07-22 | 태양전지 및 그의 제조방법 |
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US (1) | US20050016582A1 (ko) |
KR (1) | KR100539639B1 (ko) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010042379A2 (en) * | 2008-10-09 | 2010-04-15 | Sunlight Photonics Inc. | Method and apparatus for manufacturing thin-film photovoltaic devices |
KR20110010225A (ko) * | 2009-07-24 | 2011-02-01 | 엘지전자 주식회사 | 태양 전지 및 태양 전지의 제조 방법 |
WO2013042965A1 (en) * | 2011-09-20 | 2013-03-28 | Lg Innotek Co., Ltd. | Solar cell |
KR101464001B1 (ko) * | 2008-12-15 | 2014-11-21 | 엘지전자 주식회사 | 태양 전지의 제조 방법 및 에칭 페이스트 |
KR101464002B1 (ko) * | 2008-12-15 | 2014-11-21 | 엘지전자 주식회사 | 태양 전지의 제조 방법 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101053790B1 (ko) * | 2007-07-10 | 2011-08-03 | 주성엔지니어링(주) | 태양 전지 및 그 제조 방법 |
US20090283145A1 (en) * | 2008-05-13 | 2009-11-19 | Kim Yun-Gi | Semiconductor Solar Cells Having Front Surface Electrodes |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US4555586A (en) * | 1984-08-06 | 1985-11-26 | Energy Conversion Devices, Inc. | Photovoltiac device having long term energy conversion stability and method of producing same |
US4599095A (en) * | 1984-10-22 | 1986-07-08 | Honeywell Inc. | Thin bed sorption/desorption apparatus and method for making the same |
US4892592A (en) * | 1987-03-26 | 1990-01-09 | Solarex Corporation | Thin film semiconductor solar cell array and method of making |
US5772431A (en) * | 1995-05-22 | 1998-06-30 | Yazaki Corporation | Thin-film solar cell manufacturing apparatus and manufacturing method |
DE19634580C2 (de) * | 1996-08-27 | 1998-07-02 | Inst Solar Technologien | Verfahren zur Herstellung einer CIS-Bandsolarzelle und Vorrichtung zur Durchführung des Verfahrens |
-
2003
- 2003-07-22 KR KR10-2003-0050215A patent/KR100539639B1/ko active IP Right Grant
- 2003-12-12 US US10/733,261 patent/US20050016582A1/en not_active Abandoned
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2010042379A2 (en) * | 2008-10-09 | 2010-04-15 | Sunlight Photonics Inc. | Method and apparatus for manufacturing thin-film photovoltaic devices |
WO2010042379A3 (en) * | 2008-10-09 | 2010-06-10 | Sunlight Photonics Inc. | Method and apparatus for manufacturing thin-film photovoltaic devices |
KR101464001B1 (ko) * | 2008-12-15 | 2014-11-21 | 엘지전자 주식회사 | 태양 전지의 제조 방법 및 에칭 페이스트 |
KR101464002B1 (ko) * | 2008-12-15 | 2014-11-21 | 엘지전자 주식회사 | 태양 전지의 제조 방법 |
KR20110010225A (ko) * | 2009-07-24 | 2011-02-01 | 엘지전자 주식회사 | 태양 전지 및 태양 전지의 제조 방법 |
WO2013042965A1 (en) * | 2011-09-20 | 2013-03-28 | Lg Innotek Co., Ltd. | Solar cell |
Also Published As
Publication number | Publication date |
---|---|
KR100539639B1 (ko) | 2005-12-29 |
US20050016582A1 (en) | 2005-01-27 |
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