KR20050004394A - New process for producing diphenylsulfone compounds - Google Patents

New process for producing diphenylsulfone compounds Download PDF

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KR20050004394A
KR20050004394A KR1020030044561A KR20030044561A KR20050004394A KR 20050004394 A KR20050004394 A KR 20050004394A KR 1020030044561 A KR1020030044561 A KR 1020030044561A KR 20030044561 A KR20030044561 A KR 20030044561A KR 20050004394 A KR20050004394 A KR 20050004394A
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South Korea
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compound
formula
water
solid
salt
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KR1020030044561A
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Korean (ko)
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백성인
김관희
김윤철
박호진
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주식회사 코오롱
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C315/00Preparation of sulfones; Preparation of sulfoxides
    • C07C315/04Preparation of sulfones; Preparation of sulfoxides by reactions not involving the formation of sulfone or sulfoxide groups
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C315/00Preparation of sulfones; Preparation of sulfoxides
    • C07C315/06Separation; Purification; Stabilisation; Use of additives
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C317/00Sulfones; Sulfoxides
    • C07C317/16Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton
    • C07C317/22Sulfones; Sulfoxides having sulfone or sulfoxide groups and singly-bound oxygen atoms bound to the same carbon skeleton with sulfone or sulfoxide groups bound to carbon atoms of six-membered aromatic rings of the carbon skeleton

Abstract

PURPOSE: A process for preparing a diphenylsulfone compound is provided to easily separate out by-products and unreacted biphenylsulfone compound from a salt of object compound by using an mixed solvent of water and tolunene and by pulverization. CONSTITUTION: The diphenylsulfone compound of the formula 1 is prepared by the process comprising reacting 4,4'-dihydroxydiphenylsulfone compound of the formula 2 with an isopropyl halide of the formula 3: R-X in the presence of a reaction solvent and a base, wherein the process comprises depositing a salt of object compound of the formula 4 in a form of solid by using a mixed solvent of water and toluene as the reaction solvent, followed by filtrating to separate out unreacted 4,4-dihydroxydiphenylsulfone compound and a by-product, diether compound of the formula 5 simultaneously, provided that water is employed in an amount of 0.25-3 parts by weight, with respect to 1 parts by weight of 4,4-dihydroxydiphenylsulfone and the filtrated salt of object compound is treated with an acid upon pulverizing. In the formulas 1-5, R represents isopropyl, X represents a halogen atom, and M represents an alkali metal or an alkali earth metal.

Description

디페닐술폰화합물의 제조방법{New process for producing diphenylsulfone compounds}New process for producing diphenylsulfone compounds

본 발명은 다음 화학식 1로 표시되고 감열기록지에 사용되는 백색안료(Leuco dye)의 현색제로서 유용한 디페닐술폰 화합물의 제조방법에 관한 것이다.The present invention relates to a method for preparing a diphenylsulfone compound represented by the following formula (1) and useful as a developer of a white pigment (Leuco dye) used in thermal recording paper.

화학식 1Formula 1

상기 식에서, R은 이소프로필기를 나타낸다.In the formula, R represents an isopropyl group.

상기 화학식 1로 표시되는 화합물을 포함하는 디페닐술폰 화합물의 제조방법은 일본 특허공개 소 58-20493호, 58-82788호, 60-13852호, 60-56949호, 일본 특허공개 평 4-210995호, 국제특허 공개 84/02882호, 국제특허 공개 91/11433호, 일본 특허 공개 2001-261633호, 대한민국 공개특허 제2002-0005619호, 대한민국 공개특허 제2002-0091140호 등에 개시되어 있는 바, 이 방법들은 다음 화학식 2로 표시되는 4,4’-디히드록시디페닐술폰 화합물과 다음 화학식 3으로 표시되는 할로겐화 알킬을 원료로 사용하여 디메틸포름아미드나 디메틸 술폭시드 및 알코올과 같은 극성용매 또는 물 용매 존재 하에 반응시켜 제조하는 방법이다.Method for producing a diphenyl sulfone compound containing a compound represented by the formula (1) is Japanese Patent Laid-Open No. 58-20493, 58-82788, 60-13852, 60-56949, Japanese Patent Publication No. 4-210995 , International Patent Publication No. 84/02882, International Patent Publication No. 91/11433, Japanese Patent Publication No. 2001-261633, Korean Patent Publication No. 2002-0005619, Korean Patent Publication No. 2002-0091140, etc. The presence of polar solvent or water solvent such as dimethylformamide or dimethyl sulfoxide and alcohol using 4,4'-dihydroxydiphenylsulfone compound represented by the following formula (2) and halogenated alkyl represented by the following formula (3) as raw materials It is a method of making it react under.

화학식 2Formula 2

화학식 3Formula 3

R-XR-X

상기 식에서, R은 이소프로필기를 나타내고, X는 할로겐 원소를 나타낸다.In the above formula, R represents an isopropyl group, and X represents a halogen element.

이와같이 4,4’-디히드록시디페닐술폰 화합물과 할로겐화 알킬을 용매와 염기의 존재 하에 반응시키는 경우 반응용액 안에는, 목적 화합물인 4-히드록시-4’-이소프로폭시디페닐술폰 화합물 뿐만 아니라 미반응된 4,4’-디히드록시디페닐술폰 화합물(이하, 간략히 BPS라고 호칭함) 및 부생성물인 다음 화학식 5로 표시되는 4,4’-디이소프로폭시디페닐술폰(이하, 간략히 디에테르라고 호칭함) 화합물이 섞여 있는 바, 따라서 이같은 미반응 물질 및 부생성물들로부터 목적화합물을 고순도로 효과적으로 분리해 내는 것이 매우 중요하다.As such, when the 4,4'-dihydroxydiphenylsulfone compound and the halogenated alkyl are reacted in the presence of a solvent and a base, the reaction solution includes not only the 4-hydroxy-4'-isopropoxydiphenylsulfone compound as the target compound. Unreacted 4,4'-dihydroxydiphenylsulfone compound (hereinafter referred to simply as BPS) and by-product 4,4'-diisopropoxydiphenylsulfone represented by the following formula (5) Since the compound is mixed, it is very important to effectively separate the target compound with high purity from these unreacted substances and by-products.

화학식 5Formula 5

상기 식에서, R은 이소프로필기를 나타낸다.In the formula, R represents an isopropyl group.

이를 위해, 일본 특허공개 평 3-258760호에서는 목적화합물인 4-알콕시-4’-히드록시디페닐술폰 화합물과 섞여 있는 BPS를 분리하는 방법으로 유기용제를 사용하여 이들 두 화합물을 수층으로부터 추출한 다음, 탄산수소염 수용액 등을 이용한 pH 조절을 통하여 BPS의 알칼리 금속염을 수층으로 이동시켜 분리하는 방법을 개시하였다.To this end, Japanese Patent Application Laid-Open No. 3-258760 extracts these two compounds from the aqueous layer by using an organic solvent to separate BPS mixed with the target compound 4-alkoxy-4'-hydroxydiphenylsulfone compound. And a method of separating an alkali metal salt of BPS by moving it to an aqueous layer through pH adjustment using an aqueous solution of hydrogen carbonate or the like.

일본 특허공개 평 5-255234호에서는 BPS를 용해한 알칼리성 물질 수용액 및 톨루엔 용매의 2상 용매계에 알킬할라이드를 첨가하고, 알칼리성 물질을 첨가해 pH를 7.5~9.5로 유지하는 방법을 개시하였다. 이 방법에서는 반응이 종결된 후 층분리시키면 미반응된 BPS의 염은 수층으로, 다음 화학식 4로 표시되는 4-알콕시-4’-히드록시디페닐술폰 화합물의 염과 디에테르는 톨루엔층으로 각각 분리되며, 이 톨루엔층을 따로 모아 결정화시킴으로써 목적화합물인 4-알콕시-4’-히드록시디페닐술폰 화합물만을 고체로 얻어내는 것으로 설명하고 있다. 그러나, 화학식 4로 표시되는 4-알콕시-4’-히드록시디페닐술폰의 염 화합물은 톨루엔과 같은 비극성 유기용매에 용해되기 어려울 뿐만 아니라, 별도의 pH 조절작업, 즉, 4-알콕시-4’-히드록시디페닐술폰의 염 화합물을 4-알콕시-4’-히드록시디페닐술폰 화합물로 바꾸어주기 위해 pH를 중성으로 조절하는 작업을 수행하지 않았을 경우에는 냉각, 정석했을 때 4-알콕시-4’-히드록시디페닐술폰의 염 화합물이 얻어지므로 발명의 목적에 반하는 문제가 있었다.Japanese Patent Laid-Open No. 5-255234 discloses a method in which an alkyl halide is added to a two-phase solvent system of an alkaline aqueous solution in which BPS is dissolved and a toluene solvent, and an alkaline substance is added to maintain the pH at 7.5 to 9.5. In this method, when the reaction is terminated and the layers are separated, the salt of the unreacted BPS is the aqueous layer, and the salt and the diether of the 4-alkoxy-4'-hydroxydiphenylsulfone compound represented by the following Chemical Formula 4 The toluene layer is separated and crystallized separately to explain that only 4-alkoxy-4'-hydroxydiphenylsulfone compound as the target compound is obtained as a solid. However, the salt compound of 4-alkoxy-4'-hydroxydiphenylsulfone represented by the general formula (4) is not only difficult to dissolve in a nonpolar organic solvent such as toluene, but also has a separate pH control operation, that is, 4-alkoxy-4 ' 4-Alkoxy-4 when cooled and crystallized, unless neutral pH adjustment is performed to convert the salt compound of hydroxydiphenylsulfone to 4-alkoxy-4'-hydroxydiphenylsulfone compound Since a salt compound of '-hydroxydiphenylsulfone was obtained, there was a problem contrary to the object of the invention.

화학식 4Formula 4

상기 식에서 R은 이소프로필기, M은 알칼리 금속 또는 알칼리 토금속을 나타낸다.In the formula, R is an isopropyl group, M represents an alkali metal or alkaline earth metal.

한편, 대한민국 공개특허 제2002-0091140호에서는 4-알콕시-4’-히드록시디페닐술폰 화합물과 섞여 있는 BPS를 분리하는 방법으로, 이들 화합물을 함유하는 수용액을 pH 8.4~8.7로 조절하고, 유기용매로 추출하여 유기층 및 수성층으로 분리한 다음, 물 또는 고정된 pH 값으로 조정된 물을 분리된 유기층에 첨가함으로써 수성층의 pH를 유기층 분리를 위한 pH 8.3~8.6의 범위로 조정하는 방법을 개시하였다.On the other hand, Korean Patent Laid-Open Publication No. 2002-0091140 is a method for separating the BPS mixed with the 4-alkoxy-4'-hydroxydiphenylsulfone compound, by adjusting the aqueous solution containing these compounds to pH 8.4 ~ 8.7, organic A method of adjusting the pH of an aqueous layer to a range of pH 8.3 to 8.6 for organic layer separation by extracting with a solvent, separating the organic layer and the aqueous layer, and then adding water or water adjusted to a fixed pH value to the separated organic layer is disclosed. .

상기한 제조방법들에서는 통상 값비싼 유기용매를 사용하여 미반응된 BPS를 분리하고 있으며, 부생성된 디에테르 화합물을 별도의 공정을 통하여 유기용매로 추출, 분리시키거나, 결정화 또는 재결정 공정을 통하여 분리시키는 방법을 이용하고 있어 경제적이지 못할 뿐만 아니라 공정이 길고 복잡한 단점이 있다.In the above production methods, an unreacted BPS is usually separated using an expensive organic solvent, and the by-produced diether compound is extracted and separated into an organic solvent through a separate process, or crystallized or recrystallized. The separation method is not only economical, but also has long and complicated disadvantages.

이에, 본 발명자들은 반응 중 생성되는 목적화합물의 염 화합물과 미반응 BPS 및 부생성물들을 용이하게 분리할 수 있으면서 목적화합물의 염 화합물을 후처리하는 데 있어서 보다 전환율을 높일 수 있는 방법을 모색하던 중, 반응용매로서물과 톨루엔 혼합용매를 사용하고 얻어진 목적화합물의 염 화합물을 산처리함에 있어서 분쇄를 수분하여 pH를 중성으로 조절한 결과, 상기 화학식 4로 표시되는 염 화합물을 용이하게 고체상태로 석출시켜 이를 여과하는 것만으로 미반응 BPS와 부생성된 디에테르 화합물을 동시에 분리시킬 수 있으면서 고체상태의 염 화합물을 목적화합물로 층분리 등을 수행하지 않고도 분쇄만으로도 전환시켜 여과를 통해 수득할 수 있음을 알게되어 본 발명을 완성하게 되었다.Accordingly, the present inventors are seeking a method for improving the conversion rate in post-treatment of the salt compound of the target compound while being able to easily separate the salt compound of the target compound and unreacted BPS and by-products generated during the reaction. When using a mixed solvent of water and toluene as a reaction solvent and acid-treating the salt compound of the target compound obtained, water was ground to adjust the pH to neutral to easily precipitate the salt compound represented by the above formula (4) in a solid state. It is possible to separate the unreacted BPS and the by-produced diether compound at the same time only by filtration and to convert the solid salt compound into the target compound by pulverization without performing layer separation or the like to obtain through filtration. The present invention has been completed.

따라서, 본 발명의 목적은 반응용매로서 물과 톨루엔의 혼합용매를 사용함으로써 목적화합물의 염 화합물의 석출을 용이하게 하여 이 염을 여과하는 것만으로 미반응 BPS와 부생성물과 분리할 수 있으면서, 분리된 목적화합물의 염을 분쇄만으로 전화시켜 여과를 통해 수득할 수 이는 디페닐술폰 화합물의 제조방법을 제공하는 데 있다.Accordingly, an object of the present invention is to facilitate the precipitation of a salt compound of a target compound by using a mixed solvent of water and toluene as a reaction solvent, and to separate it from the unreacted BPS and by-products only by filtering the salt. The salt of the desired compound can be converted through pulverization and obtained by filtration, which provides a method for preparing a diphenylsulfone compound.

상기와 같은 목적을 달성하기 위한 상기 화학식 1로 표시되는 디페닐술폰 화합물의 제조방법은 상기 화학식 2로 표시되는 4,4’-디히드록시디페닐술폰 화합물과 상기 화학식 3으로 표시되는 이소프로필 할로겐화물을 반응용매 및 염기 존재 하에 반응시키는 것을 포함하는 것으로서, 반응용매로서 물과 톨루엔의 혼합용매를 사용하여 다음 화학식 4로 표시되는 목적화합물의 염 화합물을 고체로 석출시켜 여과함으로써 미반응 4,4'-디히드록시디페닐술폰 화합물과 상기 화학식 5로 표시되는 부생성된 디에테르 화합물을 동시에 분리하고, 다음 화학식 4로 표시되는 목적화합물의 염 화합물을 분쇄를 수반하여 산처리하는 것을 그 특징으로 한다.Method for producing a diphenyl sulfone compound represented by the formula (1) to achieve the above object is 4,4'- dihydroxy diphenyl sulfone compound represented by the formula (2) and isopropyl halogen represented by the formula (3) It includes reacting the cargo in the presence of a reaction solvent and a base, using a mixed solvent of water and toluene as a reaction solvent to precipitate a salt compound of the target compound represented by the following formula (4) as a solid to filter the unreacted 4,4 The '-dihydroxydiphenyl sulfone compound and the by-produced diether compound represented by the formula (5) are separated at the same time, and the salt compound of the target compound represented by the following formula (4) with acid treatment accompanied by grinding do.

화학식 4Formula 4

상기 식에서, R은 이소프로필기, M은 알칼리 금속 또는 알칼리 토금속을 나타낸다.In the formula, R is an isopropyl group, M represents an alkali metal or alkaline earth metal.

이와같은 본 발명을 좀 더 상세히 설명하면 다음과 같다.The present invention will be described in more detail as follows.

본 발명에서와 같이 상기 화학식 2로 표시되는 BPS와 상기 화학식 3으로 표시되는 이소프로필 할로겐화물을 일정량의 물과 톨루엔의 2상 혼합용매를 용매로 사용하여 염기의 존재 하에 반응시키면 상기 화학식 4로 표시되는 4-히드록시-4’-이소프로폭시디페닐술폰 염 화합물이 생성되는 즉시 고체형태로 반응액 중에서 석출된다.As in the present invention, when BPS represented by Chemical Formula 2 and isopropyl halide represented by Chemical Formula 3 are reacted in the presence of a base using a predetermined amount of a two-phase mixed solvent of water and toluene as a solvent, As soon as the resulting 4-hydroxy-4'-isopropoxydiphenylsulfon salt compound is formed, it is precipitated in the reaction solution in solid form.

이 목적화합물의 염 화합물이 생성되는 즉시로 대부분 고체상태로 존재하도록 하기 위해서는 반응용매 중 물의 양을 원료물질인 BPS 화합물 1중량부에 대하여 0.25~3.0중량부, 바람직하게는 0.5~1.5중량부를 사용하는 것이 좋다. 반응용매 중 물의 양이 BPS 화합물 1중량부에 대하여 0.25중량부 보다 적으면 반응이 진행되면서 석출되는 고체로 인하여 교반이 어려운 문제가 있을 뿐만 아니라 이로 인해 반응시간이 매우 길어지고, 반응 전환율이 매우 낮은 문제가 발생한다. 한편, 3.0중량부보다 많이 사용하는 경우, 반응하여 생성되는 목적화합물의 염 화합물이 고체형태로 석출되는 비율이 50% 이하로 급격히 줄고 상당량이 반응액 중에 용해되어 있어 본 발명의 목적을 달성하기 어렵게 된다.In order for the salt compound of the target compound to be present in the solid state almost immediately, the amount of water in the reaction solvent is used in an amount of 0.25 to 3.0 parts by weight, preferably 0.5 to 1.5 parts by weight based on 1 part by weight of the BPS compound as a raw material. Good to do. If the amount of water in the reaction solvent is less than 0.25 parts by weight based on 1 part by weight of the BPS compound, the reaction proceeds as a result of the solid precipitated as the reaction proceeds, and as a result, the reaction time becomes very long and the reaction conversion rate is very low. A problem arises. On the other hand, when it is used more than 3.0 parts by weight, the proportion of the salt compound of the target compound produced by the reaction precipitates in solid form is drastically reduced to 50% or less and a considerable amount is dissolved in the reaction solution, making it difficult to achieve the object of the present invention. do.

본 발명에서 반응용매로서 톨루엔을 물과 함께 사용하는 바, 톨루엔은 반응 중 부생성물로 생성되는 상기 화학식 5로 표시되는 디에테르를 용해시켜, 상기 화학식 4로 표시되는 4-히드록시-4’-이소프로폭시디페닐술폰 염 화합물을 여과할 때 디에테르가 여액으로 수층에 녹아 있는 BPS의 염과 함께 분리되도록 하여, 여과만으로써 고순도의 4-히드록시-4’-이소프로폭시디페닐술폰 염 화합물을 고체로 얻을 수 있도록 하는 역할을 한다.When toluene is used together with water as a reaction solvent in the present invention, toluene dissolves the diether represented by Formula 5, which is produced as a by-product during the reaction, and 4-hydroxy-4'- represented by Formula 4 above. When the isopropoxydiphenylsulfone salt compound is filtered, the diether is separated with the salt of BPS dissolved in the aqueous layer as a filtrate, so that only 4-hydroxy-4'-isopropoxydiphenylsulfone salt of high purity is obtained by filtration alone. It serves to obtain the compound as a solid.

상술한 바와 같이, 일본 특허공개 평 5-255234호에 물과 톨루엔의 2상 용매를 사용한 예가 있으나, 여기서는 반응하여 생성된 4-히드록시-4’-이소프로폭시디페닐술폰 염 화합물을 추출하기 위한 목적으로 톨루엔을 사용한 것이다. 따라서, 본 발명에서와 같이 반응용매로서 물과 톨루엔의 혼합용매를 사용한 것과는 그 목적과 기술이 다르다. 즉, 본 발명에서는 톨루엔을 반응용매로서 이용하여 반응액 중에서 부생성된 디에테르 화합물을 용해시켜 미반응된 BPS의 염과 함께 동시에 분리시키고자 한 것이다.As described above, Japanese Patent Application Laid-open No. Hei 5-255234 has an example of using a two-phase solvent of water and toluene, but here, the 4-hydroxy-4'-isopropoxydiphenylsulfone salt compound produced by reaction is extracted. Toluene is used for the purpose. Therefore, the purpose and technique are different from those in which a mixed solvent of water and toluene is used as the reaction solvent as in the present invention. That is, in the present invention, toluene is used as the reaction solvent to dissolve the by-produced diether compound in the reaction solution to simultaneously separate the salt with unreacted BPS.

물론, 본 발명과 같이 반응용매로서 물과 톨루엔의 혼합용매를 사용하지 않고, 반응이 종결된 후에 반응액에 톨루엔 등의 비수혼화성 유기용매를 사용하여 부생성된 디에테르 화합물을 4-히드록시-4’-이소프로폭시디페닐술폰 염 화합물과 여과함으로써 분리시킬 수도 있다. 그러나, 디에테르 화합물은 고체입자로 반응 중에 석출되는 4-히드록시-4’-이소프로폭시디페닐술폰 염 화합물 내에 잘 세척되지 않고 남아 있기 때문에, 그 방법이 간단하기는 하지만 고순도의 목적화합물을 제조하는 데는 문제가 있다.Of course, 4-hydroxy is a by-produced diether compound using a non-water-miscible organic solvent such as toluene in the reaction solution after completion of the reaction, without using a mixed solvent of water and toluene as a reaction solvent as in the present invention. It can also isolate | separate by filtering with -4'-isopropoxydiphenyl sulfone salt compound. However, since the diether compound remains unwashed in the 4-hydroxy-4'-isopropoxydiphenylsulfone salt compound which precipitates during the reaction as solid particles, the method is simple, but the high purity of the target compound There is a problem in manufacturing.

상기한 바와 같은 역할을 하는 톨루엔의 사용량은 BPS 1중량부에 대하여 0.05~1.0중량부 되도록, 바람직하게는 0.1~0.5중량부 되도록 사용하는 것이 좋다.만일, 톨루엔의 양이 BPS 1중량부에 대하여 0.05중량부보다 적으면 디에테르 화합물을 충분히 제거시킬 수 없고, 통상 0.5 중량부 이내에서 충분하여 1.0중량부보다 많게 사용하면 경제성이 없게된다.The amount of toluene which plays a role as described above is preferably used so as to be 0.05 to 1.0 parts by weight, preferably 0.1 to 0.5 parts by weight, relative to 1 part by weight of BPS. If it is less than 0.05 part by weight, the diether compound cannot be sufficiently removed, and if it is usually used within 0.5 part by weight and more than 1.0 part by weight, the economic efficiency will be reduced.

반응에 사용되는 염기로는 통상적으로 알칼리금속 수산화물, 예를 들면, 수산화나트륨, 수산화칼륨; 알칼리토금속 수산화물, 예를 들면, 수산화마그네슘, 수산화칼슘 등을 들 수 있으며, 그 양은 원료물질인 BPS 1몰에 대하여 2.0~3.0몰비, 바람직하게는 2.0~2.5몰비인 것이 좋다. 염기의 양을 2.0~3.0몰비로 사용하게 되면 BPS의 이염 화합물이 용매인 물에 완전히 용해된 상태에서 반응을 시작하게 되어 반응이 종료된 후에도 물에 용해된 상태로 존재하는 반면, 염기의 양을 2.0몰비보다 적게 사용하게 되면 일부의 BPS 일염 화합물이 반응용매인 물에 용해되지 않은 상태로 있어서 반응이 잘 진행되지 않을 뿐만 아니라 반응이 종료된 후에도 고체형태를 유지하므로 생성되는 화학식 3으로 표시되는 염 화합물과 혼합되어 본 발명에서 이루고자 하는 여과방법으로 분리하기 어려운 문제가 발생한다.Bases used for the reaction are usually alkali metal hydroxides such as sodium hydroxide, potassium hydroxide; Alkaline earth metal hydroxides, for example, magnesium hydroxide, calcium hydroxide and the like, and the amount is preferably 2.0 to 3.0 molar ratio, preferably 2.0 to 2.5 molar ratio with respect to 1 mole of BPS as a raw material. When the amount of base is used in a 2.0 to 3.0 molar ratio, the BPS dichloride compound is completely dissolved in water, which is a solvent, and the reaction starts. The base is dissolved in water even after the reaction is completed. When used less than 2.0 molar ratio, some of the BPS monochloride compound is not dissolved in water as a reaction solvent, so that the reaction does not proceed well, and the salt represented by the formula (3) is produced because the solid is maintained after the reaction is completed. It is difficult to separate by the filtration method to achieve the present invention by mixing with the compound occurs.

이러한 문제를 해결하기 위하여 반응이 종결된 후 적절한 양의 염기를 가하여 BPS 일염 화합물을 BPS 이염 화합물로 바꾸어 반응액 중에 완전히 용해되도록 할 수는 있으나, 이를 위해서는 많은 양의 염기를 추가로 사용해야 하며, 이로 인해 반응액의 pH가 높아져 고체로 석출시키고자 하는 상기 화학식 4로 표시되는 염 화합물이 반응액 중에 상당량 용해되는 문제가 발생하는 문제가 있다.In order to solve this problem, after completion of the reaction, an appropriate amount of base can be added to convert the BPS monochloride compound into a BPS dichloride compound so that it can be completely dissolved in the reaction solution. However, a large amount of base must be additionally used. Due to the high pH of the reaction solution there is a problem that a significant amount of the salt compound represented by the formula (4) to be precipitated as a solid is dissolved in the reaction solution.

반응의 온도는 40~150℃에서, 바람직하게는 50~90℃의 범위에서 수행하는 것이 좋다.The temperature of the reaction is preferably carried out at 40 ~ 150 ℃, preferably in the range of 50 ~ 90 ℃.

반응이 완료된 후 반응액을 상온으로 냉각시키면 4-히드록시-4'-이소프로폭시디페닐술폰의 염 화합물을 고체상태로 얻을 수 있다. 이 석출된 고체형태의 4-히드록시-4’-이소프로폭시디페닐술폰 염 화합물(화학식 4)을 용이하게 여과할 수 있도록 임의 량의 물을 투입하여 반응액을 희석시킬 수 있는 바, 그 양에는 제한이 없다.After the reaction is completed, the reaction solution is cooled to room temperature to obtain a salt compound of 4-hydroxy-4'-isopropoxydiphenylsulfone in a solid state. The reaction solution can be diluted by adding an arbitrary amount of water so that the precipitated solid 4-hydroxy-4'-isopropoxydiphenylsulfone salt compound (Formula 4) can be easily filtered. There is no limit to the quantity.

여과된 고체를 물과 톨루엔으로 차례로 세척하여 BPS 이염 화합물과 상기 화학식 5로 표시되는 디에테르 화합물을 씻어낸다.The filtered solid is washed sequentially with water and toluene to wash away the BPS dichloride compound and the diether compound represented by Chemical Formula 5.

여액으로 분리된 BPS 이염 화합물은 염산이나 황산 등의 산을 처리하여 pH를 중성 이하로 조절하면 고체로 석출되며, 간단히 회수하여 BPS로서 재사용할 수 있다.The BPS dichloride compound separated into the filtrate is treated with an acid such as hydrochloric acid or sulfuric acid to adjust the pH to neutral or less, and precipitates as a solid, which can be easily recovered and reused as BPS.

상기한 방법으로 분리된 4-히드록시-4’-이소프로폭시디페닐술폰 염 화합물로부터 목적화합물인 4-히드록시-4’-이소프로폭시디페닐술폰 화합물을 제조하는 방법은 다음과 같다;The method for preparing 4-hydroxy-4'-isopropoxydiphenyl sulfone compound as a target compound from the 4-hydroxy-4'-isopropoxydiphenyl sulfone salt compound separated by the above method is as follows;

먼저, 여과로 분리된 고체를 물에 풀어 넣고, 분쇄를 수반하면서 염산 또는 황산과 같은 산을 가하여 혼합액의 pH를 중성으로 조절한다. 이때 산의 투입은 분쇄 이전에 미리 이루어질 수 있고 또는 분쇄하면서 적절히 나누어서 이루어질 수도있으며, 그 방법에는 제한이 없다.First, the solid separated by filtration is released into water, and the pH of the mixed solution is adjusted to neutral by adding an acid such as hydrochloric acid or sulfuric acid with grinding. In this case, the acid may be added before grinding or may be appropriately divided while grinding, and the method is not limited.

분쇄방법은, 예를 들면 볼밀 등의 밀링 분쇄방법, 균질기를 이용한 분쇄방법, 분쇄기를 이용한 습식분쇄방법, 혼합기를 이용한 분쇄방법 등 어떠한 형태의 분쇄방법 중에서도 선택하여 사용할 수 있다.The grinding method can be selected and used from any type of grinding method, such as a milling method such as a ball mill, a grinding method using a homogenizer, a wet grinding method using a grinder, or a grinding method using a mixer.

상기 화학식 4로 표시되는 4-히드록시4'-이소프로폭시디페닐술폰 염 화합물의 수분산액을 산처리함에 있어서 분쇄를 수반하게 되면 분쇄를 통해 염과 산의 반응효율이 높아져 분쇄만으로 목적화합물로의 전환이 이루어져 목적화합물의 고체화합물을 얻을 수 있다.When acid treatment of the aqueous dispersion of the 4-hydroxy4'-isopropoxydiphenylsulfone salt compound represented by the formula (4) involves pulverization, the reaction efficiency of the salt and the acid is increased through pulverization, and only the pulverization is used as the target compound. The conversion of to obtain a solid compound of the target compound.

반응전환이 완료되면 pH가 중성으로 조정되며, 이때 고체상태의 목적화합물을 여과하여 물로 세척하고, 건조하면 목적화합물을 얻을 수 있다. 입자의 크기가 작아 여과하는데 문제가 있을 경우에는 분산액을 교반하면서 40∼100℃로 승온하였다가 1∼12시간 교반을 유지한 다음 냉각하면 고체입자의 크기가 커져서 여과하는 데 있어서의 문제를 해결할 수 있다.When the reaction conversion is completed, the pH is adjusted to neutral. At this time, the target compound in the solid state is filtered, washed with water, and dried to obtain the target compound. If the particle size is small and there is a problem in filtration, the dispersion is heated to 40 to 100 ° C. while stirring, and then stirred for 1 to 12 hours before cooling to increase the size of the solid particles, thereby solving the problem of filtration. have.

이하, 본 발명의 이해를 돕기 위하여 바람직한 실시예를 제시하나, 하기 실시예는 본 발명을 예시하는 것일 뿐 본 발명의 범위가 하기 실시예에 한정되는 것은 아니다.Hereinafter, preferred examples are provided to help understanding of the present invention, but the following examples are merely to illustrate the present invention, and the scope of the present invention is not limited to the following examples.

실시예 1: 목적화합물인 4-히드록시-4’-이소프로폭시디페닐 술폰(화학식 1 화합물)의 제조Example 1: Preparation of 4-hydroxy-4'-isopropoxydiphenyl sulfone (Compound 1 compound) as a target compound

(1)2ℓ 플라스크에 물 250g, 톨루엔 50g 및 수산화칼륨 117.6g(2.1mole)을넣은 다음 BPS 250g(1.0mole)을 넣고 교반하여 완전히 용해시켰다. 내부온도를 70~80℃로 조정한 다음 이소프로필 브로마이드 184.5g을 12시간에 걸쳐 조금씩 적가하였다. 적가가 완료된 후 6시간 동안 동일한 온도범위를 유지한 다음 반응액을 상온으로 냉각시켰다. 반응액을 소량 취하여 진한 염산으로 pH를 중성으로 조절한 다음 초산에틸을 소량 첨가하여 추출한 유기층을 HPLC로 분석한 결과, 면적퍼센트로서 원료물질인 BPS가 17.2%, 목적화합물이 79.1%, 부생성물인 디에테르가 3.2%, 기타 부생성물들이 0.5%이었다. 이때, HPLC는 Waters사의 510 모델을 사용하였으며, 검출기의 UV 흡수파장은 262nm, 분석용 컬럼은 Waters사의 Nova-Pak C18을 사용하였고, 전개용매로는 아세토니트릴/인산을 부피비로서 60:40:0.1 혼합용매로 사용하였다.(1) 250 g of water, 50 g of toluene, and 117.6 g (2.1 mole) of potassium hydroxide were added to a 2 L flask, followed by 250 g (1.0 mole) of BPS, followed by stirring to dissolve completely. The internal temperature was adjusted to 70-80 ° C. and then 184.5 g of isopropyl bromide was added dropwise over 12 hours. After the addition was completed, the same temperature range was maintained for 6 hours, and then the reaction solution was cooled to room temperature. A small amount of the reaction solution was adjusted to neutral pH with concentrated hydrochloric acid, followed by HPLC analysis of the extracted organic layer with a small amount of ethyl acetate. The area percentage was 17.2% of the raw material BPS, 79.1% of the target compound, and the byproduct. Dieter was 3.2% and other byproducts were 0.5%. At this time, HPLC was used for Waters 510 model, the UV absorption wavelength of the detector was 262 nm, Analytical column was used Nova-Pak C18 of Waters, and acetonitrile / phosphoric acid was used as the developing solvent by volume ratio of 60: 40: 0.1 It was used as a mixed solvent.

(2)반응액에 물 100g을 가한 다음 고체를 여과하고, 여과된 고체를 물 250g과 톨루엔 100g으로 세척하였다. 이 고체를 소량 취하여 건조한 다음 전개용매에 녹여 상기의 조건으로 HPLC로 분석하였다. 그 결과는 면적퍼센트로서, 목적화합물이 99.23%, BPS가 0.25%, 디에테르가 0.02%, 기타 부생성물들이 0.5%로 분석되었다.(2) 100 g of water was added to the reaction solution, and the solid was filtered. The filtered solid was washed with 250 g of water and 100 g of toluene. A small amount of this solid was taken, dried and dissolved in a developing solvent, and analyzed by HPLC under the above conditions. The results were area percent, 99.23% for the target compound, 0.25% for BPS, 0.02% for diether, and 0.5% for other byproducts.

또한, 여액을 소량 취하여 진한 염산으로 pH를 중성으로 조절한 다음 초산에틸 소량을 가하여 추출한 다음 유기층을 HPLC로 동일한 조건 하에 분석한 결과, 목적화합물이 2.2%, BPS가 94.8%, 디에테르가 2.7%, 기타 부생성물들이 0.3%로 분석되었다.In addition, a small amount of the filtrate was adjusted to neutral pH with concentrated hydrochloric acid, extracted with a small amount of ethyl acetate, and the organic layer was analyzed by HPLC under the same conditions. And other byproducts were analyzed at 0.3%.

(3)계속해서, 여과된 고체를 물 250g에 넣고, 균질기(IKA사의 모델명Ultrarax T50 basic)을 설치한 다음 진한 염산 85g을 넣고 5,000rpm으로 6시간 동안 고체입자를 분쇄하였다. pH 조정이 완결된 다음 상온으로 냉각시켜 고체를 여과하고, 여과된 고체를 물 500g으로 세척한 다음 건조시켜 목적화합물 219.3g을 얻었다. 건조된 목적화합물을 동일한 HPLC로 분석한 결과, 면적퍼센트로서 목적화합물이 99.76%, 미반응된 BPS 0.03%, 부생성물인 디에테르 0.06%, 기타 부생성물들이 0.15%로 분석되었다.(3) Subsequently, the filtered solid was placed in 250 g of water, a homogenizer (IKA model model Ultraax T50 basic) was installed, 85 g of concentrated hydrochloric acid was added, and the solid particles were pulverized at 5,000 rpm for 6 hours. After pH adjustment was completed, the mixture was cooled to room temperature and the solid was filtered. The filtered solid was washed with 500 g of water and dried to obtain 219.3 g of the target compound. As a result of analyzing the dried target compound by the same HPLC, 99.76% of the target compound as an area percent, 0.03% of unreacted BPS, 0.06% of by-product diether and 0.15% of other byproducts were analyzed.

한편, 여액을 모아 진한염산을 가하여 pH를 중성으로 조절한 다음, 상온에서 2시간 동안 교반하고 여과하여 고체 38g을 얻었으며, 동일한 조건으로 HPLC로 분석한 결과, 면적퍼센트로써 BPS 97.60%, 목적화합물이 1.9%, 디에테르 0.30%, 기타 부생성물 0.20%로 분석되었다.Meanwhile, the filtrate was collected and concentrated pH was adjusted to neutral hydrochloric acid, followed by stirring at room temperature for 2 hours, followed by filtration to obtain 38 g of solid. The result was analyzed by HPLC under the same conditions, and BPS 97.60% as the target compound. This was analyzed as 1.9%, dieter 0.30%, and other byproducts 0.20%.

실시예 2 : 목적화합물인 4-히드록시-4’- 이소프로폭시디페닐 술폰(화학식 1 화합물)의 제조Example 2: Preparation of 4-hydroxy-4'-isopropoxydiphenyl sulfone (Compound 1 compound) as a target compound

(1)2ℓ 플라스크에 물 250g, 톨루엔 12.5g 및 수산화칼륨 117.6g(2.1mole)을 넣은 다음 BPS 250g(1.0mole)을 넣고 교반하여 완전히 용해시켰다. 내부온도를 70~ 80℃로 조정한 다음 이소프로필브로마이드 184.5g(1.5mole)을 12시간에 걸쳐 조금씩 적가하였다. 적가가 완료된 후 6시간 동안 동일한 온도범위를 유지한 다음 반응액을 상온으로 냉각시켰다. 반응액을 소량 취하여 진한 염산으로 pH를 중성으로 조절한 다음 초산에틸을 소량 첨가하여 추출한 유기층을 상기 실시예 1과 동일한 HPLC로 분석한 결과, 면적퍼센트로서 원료물질인 BPS가 15.8%, 목적화합물이80.0%, 부생성물인 디에테르가 3.7%, 기타 부생성물들이 0.5% 이었다.(1) 250 g of water, 12.5 g of toluene and 117.6 g (2.1 mole) of potassium hydroxide were added to a 2 L flask, followed by 250 g (1.0 mole) of BPS, followed by stirring to dissolve completely. The internal temperature was adjusted to 70-80 ° C. and 184.5 g (1.5 mole) of isopropyl bromide was added dropwise over 12 hours. After the addition was completed, the same temperature range was maintained for 6 hours, and then the reaction solution was cooled to room temperature. A small amount of the reaction solution was adjusted to neutral pH with concentrated hydrochloric acid, and then extracted with a small amount of ethyl acetate. The extracted organic layer was analyzed by the same HPLC as in Example 1, where the area percentage was 15.8% of the raw material BPS, and the target compound was obtained. 80.0%, by-product diether 3.7%, and other byproducts 0.5%.

(2)반응액에 물 100g을 가한 다음 고체를 여과하고, 여과된 고체를 물 250g과 톨루엔 100g으로 세척하였다.(2) 100 g of water was added to the reaction solution, and the solid was filtered. The filtered solid was washed with 250 g of water and 100 g of toluene.

(3)계속해서 여과된 고체를 상기 실시예 1과 동일한 방법으로 처리하여 목적화합물 216.2g을 얻었다. 목적화합물을 HPLC로 분석한 결과, 면적퍼센트로써 99.53%, 미반응된 BPS는 0.04%, 부생성물인 디에테르는 0.21%, 기타 부생성물들이 0.22%로 분석되었다.(3) Subsequently, the filtered solid was treated in the same manner as in Example 1 to obtain 216.2 g of the target compound. HPLC analysis of the target compound showed 99.53% as area percent, 0.04% as unreacted BPS, 0.21% as dietary byproduct, and 0.22% as other byproducts.

실시예 3 : 목적화합물인 4-히드록시-4’- 이소프로폭시디페닐 술폰(화학식 1 화합물)의 제조Example 3: Preparation of 4-hydroxy-4'-isopropoxydiphenyl sulfone (Compound 1 compound) as a target compound

(1)물 750g, 톨루엔 75g을 사용하여 실시예 1과 동일한 방법으로 반응시킨 다음, 반응액을 HPLC로 분석한 결과, 면적퍼센트로써 원료물질인 BPS가 33.6%, 목적화합물이 59.3%, 부생성물인 디에테르가 6.8%, 기타 부생성물들이 0.3% 이었다.(1) 750 g of water and 75 g of toluene were reacted in the same manner as in Example 1, and then the reaction solution was analyzed by HPLC. As a result, the area percentage was 33.6% of the raw material BPS, 59.3% of the target compound, and by-products. Phosphorus diether was 6.8% and other byproducts were 0.3%.

(2) 및 (3) 상기 실시예 1과 동일한 방법으로 처리하여 목적화합물 160.1g을 얻었다. 제조한 목적화합물을 HPLC로 분석한 결과, 면적퍼센트로써 99.57%, 미반응된 BPS는 0.15%, 부생성물인 디에테르는 0.08%, 기타 부생성물들이 0.20%로 분석되었다.(2) and (3) The same procedure as in Example 1 was carried out to obtain 160.1 g of the target compound. As a result of analyzing the target compound by HPLC, 99.57% as area percentage, 0.15% as unreacted BPS, 0.08% as dietary byproduct, and 0.00% as other byproducts.

비교실시예 1Comparative Example 1

2ℓ 플라스크에 물 62g, 톨루엔 50g 및 수산화칼륨 117.6g(2.1mole)을 넣은다음 BPS 250g(1.0mole)을 넣고 교반하여 완전히 용해시켰다. 내부온도를 70~80℃로 조정한 다음 이소프로필브로마이드 184.5g(1.5mole)을 조금씩 적가로 투입하였다. 6시간 후 반응액이 고체로 가득 차 교반이 불가능하여 더 이상 반응을 수행할 수 없었다.62 g of water, 50 g of toluene, and 117.6 g (2.1 mole) of potassium hydroxide were added to a 2 L flask, followed by 250 g (1.0 mole) of BPS, followed by stirring to completely dissolve it. The internal temperature was adjusted to 70-80 ° C., and 184.5 g (1.5 mole) of isopropyl bromide was added little by little. After 6 hours, the reaction solution was filled with a solid and stirring was impossible, so that the reaction could not be performed anymore.

비교실시예 2Comparative Example 2

450g의 BPS, 255㎖의 48% 수산화나트륨 수용액 및 120㎖의 물을 반응탱크에 넣고, 온도를 75℃로 상승시키면서 교반 하에 혼합하였다. 225g의 이소프로필 브로마이드를 55±5℃에서 적가 시작부터 총 20시간 동안 연속적으로 교반하였다. 235㎖의 온수를 반응용액에 첨가하고, 80℃에서 1시간 동안 가열하여, 미반응 이소프로필 브로마이드를 증발시켜 제거하였다.450 g of BPS, 255 ml of 48% aqueous sodium hydroxide solution and 120 ml of water were placed in a reaction tank and mixed under stirring while raising the temperature to 75 ° C. 225 g of isopropyl bromide was continuously stirred at 55 ± 5 ° C. for a total of 20 hours from the start of dropping. 235 ml of warm water was added to the reaction solution, and heated at 80 ° C. for 1 hour to remove unreacted isopropyl bromide by evaporation.

이어서 300㎖의 온수 및 250㎖의 톨루엔을 80℃에서 첨가하여, 충분히 교반하였다. 수성층을 분리하였다. 수득된 수성층에 1,100㎖의 톨루엔 및 200㎖의 물을 79℃에서 첨가하고, 동일 온도에서 30분간 교반하였다. 또한, 30% 희석 황산을 1시간 동안 82℃에서 교반 하에 조금씩 적가하여 반응용액의 수성층의 pH를 균일하게 8.4~8.7로 조정하였다. 수득된 용액을 82℃에서 30분간 방치하고, 톨루엔 층을 분리하였다. 수득된 톨루엔 층에 82℃에서 300㎖의 톨루엔 및 300㎖의 물을 첨가하고, 30% 희석 황산을 82℃에서 교반 하에 조금씩 적가하여 수성층의 pH를 균일하게 8.3~8.6으로 조정하였다. 수득된 용액을 82℃에서 30분간 방치하고, 톨루엔 층을 분리하였다. 톨루엔 층에 250㎖의 물을 82℃에서 첨가하고, 동일 온도에서 2시간동안 교반하였다. 이어서, 수득된 용액을 82℃에서 30분간 방치하고 톨루엔 층을 분리하였다. 수득된 톨루엔 층을 냉각시켜 결정을 침착시켰다. 결정을 여과 분리하고, 톨루엔으로 세척한 후 건조시켜, 목적화합물인 4-이소프로폭시-4’-히드록시디페닐술폰 350g을 분말로서 수득하였다.Then, 300 ml of warm water and 250 ml of toluene were added at 80 ° C. and sufficiently stirred. The aqueous layer was separated. To the obtained aqueous layer, 1,100 ml of toluene and 200 ml of water were added at 79 DEG C, and stirred for 30 minutes at the same temperature. In addition, 30% dilute sulfuric acid was added dropwise little by little with stirring at 82 ° C. for 1 hour to uniformly adjust the pH of the aqueous layer of the reaction solution to 8.4-8.7. The resulting solution was left at 82 ° C. for 30 minutes and the toluene layer was separated. To the obtained toluene layer, 300 ml of toluene and 300 ml of water were added at 82 DEG C, and 30% dilute sulfuric acid was added dropwise little by little under stirring at 82 DEG C to adjust the pH of the aqueous layer uniformly to 8.3 to 8.6. The resulting solution was left at 82 ° C. for 30 minutes and the toluene layer was separated. 250 ml of water was added to the toluene layer at 82 ° C. and stirred at the same temperature for 2 hours. The solution obtained was then left at 82 ° C. for 30 minutes and the toluene layer was separated. The toluene layer obtained was cooled to deposit crystals. The crystals were separated by filtration, washed with toluene and dried to obtain 350 g of 4-isopropoxy-4'-hydroxydiphenylsulfone as a target compound as a powder.

생성물을 HPLC로 분석한 결과, 목적화합물이 97.8면적%, 디에테르 1.83면적%, BPS 0.23면적%, 기타 부생성물 0.14면적% 이었다.HPLC analysis of the product showed that the target compound was 97.8 area%, diether 1.83 area%, BPS 0.23 area%, and other byproducts 0.14 area%.

이상에서 상세히 설명한 바와 같이, 본 발명에 따라 BPS와 이소프로필 할로겐화물을 물과 톨루엔의 2상 혼합용매 및 염기의 존재 하에 반응시켜 목적화합물의 염을 얻은 다음 이를 분쇄를 수반하여 산처리시켜 상기 화학식 1로 표시되는 디페닐술폰 화합물을 제조하는 경우 반응액 중에 4-히드록시-4’-이소프로폭시디페닐술폰의 알칼리 또는 알칼리토금속 염 화합물이 고체로 석출되어 이 고체화합물을 여과하는 것만으로 미반응 원료물질인 BPS와 부생성물인 디에테르 화합물을 간단히 분리시킬 수 있고, 여과된 목적화합물의 염을 수분산시킨 후 분쇄를 수반하여 산처리하면 향상된 전환율로 목적화합물을 얻을 수 있을 뿐만 아니라 목적화합물을 여과를 통해 수득할 수 있게 되어 값비싼 유기용매를 이용하면서도 까다로운 pH 조절을 수행하여 층분리로 분리하는 과정을 적어도 수 회 반복하여야 하는 기존의 복잡한 제조방법에 비하여 매우 단순하여 경제적일 뿐만 아니라 공업적으로 용이하게 적용될 수 있는 제조방법이다.As described above in detail, according to the present invention, BPS and isopropyl halides are reacted in the presence of a two-phase mixed solvent of water and toluene and a base to obtain a salt of the target compound, followed by acid treatment with pulverization. When preparing the diphenyl sulfone compound represented by 1, alkali or alkaline earth metal salt compound of 4-hydroxy-4'-isopropoxydiphenyl sulfone is precipitated as a solid in the reaction solution, and this solid compound is simply filtered. The reaction raw material BPS and the by-product diether compound can be easily separated, and the salt of the filtered target compound is dispersed and acid treated with pulverization to obtain the target compound with improved conversion. Can be obtained through filtration, and the separation of the layers by performing a difficult pH control while using an expensive organic solvent A very simple method by which not only more economical but also be readily applied on an industrial scale than the process of separating the conventional complicated production process can be repeated at least once.

Claims (6)

다음 화학식 2로 표시되는 4,4’-디히드록시디페닐술폰 화합물과 다음 화학식 3으로 표시되는 이소프로필 할로겐화물을 반응용매 및 염기 존재 하에 반응시켜 다음 화학식 1로 표시되는 디페닐술폰 화합물을 제조하는 방법에 있어서,The 4,4'-dihydroxydiphenyl sulfone compound represented by the following formula (2) and the isopropyl halide represented by the following formula (3) are reacted in the presence of a reaction solvent and a base to prepare a diphenyl sulfone compound represented by the following formula (1) In the way, 상기 반응용매로서 물과 톨루엔의 혼합용매를 사용하여 다음 화학식 4로 표시되는 목적화합물의 염 화합물을 고체로 석출시켜 여과함으로써 미반응 4,4'-디히드록시디페닐술폰 화합물과 다음 화학식 5로 표시되는 부생성된 디에테르 화합물을 동시에 분리하되, 다만 물을 4,4’-디히드록시디페닐 술폰 1중량부에 대하여 0.25~3중량부 되도록 사용하고, 여과된 상기 목적화합물의 염 화합물을 분쇄를 수반하여 산처리하는 것을 특징으로 하는 디페닐술폰 화합물의 제조방법.By using a mixed solvent of water and toluene as the reaction solvent to precipitate a salt compound of the target compound represented by the following formula (4) as a solid to filter the unreacted 4,4'-dihydroxydiphenyl sulfone compound and the following formula (5) Simultaneously separate the by-produced diether compound to be expressed, except that water is used to 0.25 to 3 parts by weight based on 1 part by weight of 4,4'-dihydroxydiphenyl sulfone, and the filtered salt compound of the target compound A method for producing a diphenylsulfone compound, characterized in that the acid treatment is accompanied by grinding. 화학식 1Formula 1 상기 식에서, R은 이소프로필기를 나타낸다.In the formula, R represents an isopropyl group. 화학식 2Formula 2 화학식 3Formula 3 R-XR-X 상기 식에서, R은 이소프로필기를 나타내고, X는 할로겐 원소를 나타낸다.In the above formula, R represents an isopropyl group, and X represents a halogen element. 화학식 4Formula 4 상기 식에서, R은 이소프로필기, M은 알칼리 금속 또는 알칼리 토금속을 나타낸다.In the formula, R is an isopropyl group, M represents an alkali metal or alkaline earth metal. 화학식 5Formula 5 상기 식에서, R은 이소프로필기를 나타낸다.In the formula, R represents an isopropyl group. 제 1 항에 있어서, 톨루엔을 4,4’-디히드록시디페닐 술폰 1중량부에 대하여 0.05~1.0중량부 되도록 사용하는 것을 특징으로 하는 디페닐술폰 화합물의 제조방법.The method for producing a diphenyl sulfone compound according to claim 1, wherein toluene is used in an amount of 0.05 to 1.0 parts by weight based on 1 part by weight of 4,4'-dihydroxydiphenyl sulfone. 제 1 항에 있어서, 염기로는 알칼리금속 수산화물 또는 알칼리토금속 수산화물을 사용하는 것을 특징으로 하는 디페닐술폰 화합물의 제조방법.The method for producing a diphenyl sulfone compound according to claim 1, wherein an alkali metal hydroxide or an alkaline earth metal hydroxide is used as the base. 제 1 항 또는 제 3 항에 있어서, 염기를 4,4’-디히드록시디페닐 술폰 1몰에 대하여 2.0~3.0몰비 되도록 사용하는 것을 특징으로 하는 디페닐술폰 화합물의 제조방법.The method for producing a diphenyl sulfone compound according to claim 1 or 3, wherein the base is used in an amount of 2.0 to 3.0 molar ratio with respect to 1 mol of 4,4'-dihydroxydiphenyl sulfone. 제 1 항에 있어서, 반응이 완료된 후 반응액을 상온으로 냉각시켜 상기 화학식 3으로 표시되는 4-히드록시-4’-이소프로폭시디페닐술폰 염 화합물을 포함하는 고체를 석출하는 단계;The method of claim 1, further comprising: cooling the reaction solution to room temperature after the reaction is completed to precipitate a solid including the 4-hydroxy-4'-isopropoxydiphenylsulfone salt compound represented by Chemical Formula 3; 상기 석출된 고체를 여과하여 4,4'-디히드록시디페닐술폰 화합물의 이염 화합물과 상기 화학식 5로 표시되는 디에테르 화합물을 분리하는 단계;Filtering the precipitated solid to separate the di-chloride compound of 4,4'-dihydroxydiphenylsulfone compound and the diether compound represented by Formula 5; 여액으로 분리된 4,4'-디히드록시디페닐술폰 화합물의 이염을 산처리하여 pH를 중성 이하로 조절하여 고체로 석출하여 미반응 4,4'-디히드록시디페닐술폰 화합물을 회수하는 단계;Acid treatment of the dichloride salt of the 4,4'-dihydroxydiphenylsulfone compound separated by the filtrate to adjust the pH below neutral to precipitate as a solid to recover the unreacted 4,4'-dihydroxydiphenylsulfone compound. step; 이와는 별도로 상기 여과된 고체를 물에 넣고 분쇄를 수반하여 산처리하여 pH를 중성으로 조절하여 고체상태의 목적화합물로 전환시키는 단계; 및Separately, the filtered solid is put in water and acid treatment with pulverization to adjust the pH to neutral to convert the target compound into a solid state; And pH가 중성으로 조정된 후 고체상태의 목적화합물을 여과하여 물로 세척하고, 건조하는 단계를 포함하는 것을 특징으로 하는 디페닐술폰 화합물의 제조방법.After the pH is adjusted to neutral, the method for producing a diphenylsulfone compound comprising the step of filtering the target compound in the solid state, washing with water, and drying. 제 1 항 또는 제 5 항에 있어서, 분쇄는 산을 투입하기 전이나 산을 투입한 후 수반되는 것을 특징으로 하는 디페닐술폰 화합물의 제조방법.The method for producing a diphenylsulfone compound according to claim 1 or 5, wherein the grinding is accompanied before or after the addition of acid.
KR1020030044561A 2003-07-02 2003-07-02 New process for producing diphenylsulfone compounds KR20050004394A (en)

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