KR20050000491A - Flat display device - Google Patents

Abstract

PURPOSE: A flat display device is provided to prevent contraction of pixels caused due to the gas generated from a flattening film, by improving the structure of the flattening film formed at the edge of a first electrode. CONSTITUTION: A flat display device comprises a substrate(81); a plurality of first electrodes(61) formed on the substrate; an insulation film(86) formed on the substrate; a second electrode(62) opposed to the first electrode and insulated from the first electrode; and an organic light emitting film(63) interposed between the first electrode and the second electrode such that the organic light emitting film emits light by the first and second electrodes. A region(87) with the insulation film and an open region(88) without the insulation film are formed between the first electrodes or at outsides of the first electrodes.

Description

Flat display device

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a flat panel display, and more particularly, to a flat panel display having an improved planarization insulating film.

In general, a flat displat device may be classified into a light emitting type and a light receiving type. The light emitting type includes a flat cathode ray tube, a plasma display panel, an electroluminescent device, a light emitting diode, and the like. The light-receiving type includes a liquid crystal display. Among them, the electroluminescent device has attracted attention as a next-generation display device because of its advantages of having a wide viewing angle, excellent contrast, and fast response speed. . The electroluminescent device is classified into an inorganic electroluminescent device and an organic electroluminescent device according to a material forming the light emitting layer.

Among these, the organic electroluminescent device is a self-luminous display that electrically excites fluorescent organic compounds to emit light, which can be driven at a low voltage, is easy to thin, and is a problem in liquid crystal displays such as wide viewing angle and fast response speed. The organic electroluminescent device has a light emitting layer made of an organic material between the anode electrode and the cathode electrode. In the organic electroluminescent device, as the anode and cathode voltages are applied to these electrodes, holes injected from the anode electrode move to the light emitting layer via the hole transport layer, and electrons are transferred from the cathode electrode via the electron transport layer. The electrons and holes recombine in the emission layer to generate excitons.

As the excitons change from the excited state to the ground state, the fluorescent molecules in the light emitting layer emit light to form an image. In the case of a full color organic electroluminescent device, a full color is realized by providing a pixel emitting three colors of red (R), green (G), and blue (B).

On the other hand, thin film transistors (hereinafter referred to as TFTs) used in flat panel display devices such as electroluminescent devices and liquid crystal displays are used as switching elements for controlling the operation of each pixel and as driving elements for driving the pixels. Has a semiconductor active layer having a drain region and a source region doped with a high concentration of impurities on a substrate, and a channel region formed between the drain and source regions, the gate insulating film formed on the semiconductor active layer, and an upper portion of the channel region of the active layer. It is composed of a gate electrode formed on.

The thin film transistor is used as a switching element or a driving element of a pixel in a flat panel display device. An active matrix organic light emitting display (AMOLED) of an active driving method is used for each pixel. At least two TFTs are provided. U.S. Patent Nos. 5,742,129, 6,194,837B1, 6,373,453B1, and 6,380,672B1 disclose such active matrix organic electroluminescent devices.

The conventional active matrix organic electroluminescent device 10 is as shown in FIG. In this case, the active matrix organic electroluminescent device 10 is a case where all portions except the pixel emission region around the first electrode 11 are covered with the organic planarization film 12.

Referring to the drawings, the active matrix organic EL device 10 includes a second electrode (not shown) which covers the entire light emitting area in common after forming a light emitting layer made of an organic material on the first electrode 11. When forming, the height difference between the area | region where various data and drive wiring are formed on a board | substrate, and the area | region other than that is shown by a 2nd electrode as it is.

That is, since the curved structure of the lower portion of the second electrode is projected onto the electrode, the electrode does not become a flattened form, and thus, an electric unstable phenomenon is practically seen during driving. Therefore, the active matrix organic electroluminescent device 10 has a planarization film 12 formed of an organic material.

The planarization film 12 is formed of a film whose thickness is thicker than the height of the wiring so as to overcome the height difference due to the wiring. This photoresist is removed to expose the first electrode 11 and covers the rest of the rest. The planarization film 12 generally covers the edge of the first electrode 11.

However, the conventional active matrix organic electroluminescent device 10 has a fatal effect on the organic light emitting layer while the organic gas inside the planarization film 12 required for stability of the second electrode escapes during driving. The gas remaining in the planarization film 12 is generated by the photoreaction during the patterning process of the planarization film 12, and is mainly due to a photoactive compound (PAC) component. As the remaining gas, benzaldeyde, benzyl alcohol, toluene which is a benzene compound, silane, and the like are observed.

In particular, when the external temperature is even a little high, as shown in FIG. 2, the luminance decreases toward the edge A of the pixel in contact with the planarization film 12, and gradually becomes darker than the center B. The area of the area decreases with time.

This phenomenon is more severe as the area of the planarization film 12 around the pixel is larger. That is, when the planarization film 12 around the pixel is formed narrower than the pixel area, the phenomenon progresses later, and when the planarization film 12 is formed relatively wider than the pixel area, the progress state is further increased. fast.

SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems, and in the flat panel display device, a flat panel display device capable of preventing the pixel shrinkage due to the gas generated from the planarization film by improving the structure of the planarization film formed on the edge of the first electrode. The purpose is to provide.

1 is a schematic diagram illustrating a conventional organic light emitting display device;

2 is a photo illustrating a conventional organic light emitting display device;

3 is a plan view of an organic light emitting display device according to a first embodiment of the present invention, FIG. 4 is a schematic view of the organic light emitting display device of FIG.

5 is a schematic diagram illustrating a first electrode part of an organic light emitting display device according to a first embodiment of the present invention;

6 is a schematic diagram illustrating a first electrode part of an organic light emitting display device according to a second embodiment of the present invention;

7 is a schematic diagram illustrating a first electrode part of an organic light emitting display device according to a third embodiment of the present invention;

8 is a schematic diagram illustrating a first electrode part of an organic light emitting display device according to a fourth embodiment of the present invention;

9 is a schematic diagram illustrating a first electrode portion of an organic light emitting display device according to a fifth embodiment of the present invention;

10 is a schematic diagram illustrating a first electrode portion of an organic light emitting display device according to a sixth embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

60 organic electroluminescent element 61 first electrode

62 second electrode 63 organic light emitting film

64 Pixel Opening 81 Substrate

82 Buffer layer 83 Gate insulating film

84 intermediate film 85 protective film

86.Insulation film 86a ... First insulating film

86b ... second insulating film 87 ... planarization area

87a ... first area 87b ... second area

88 ... opening area

In order to achieve the above object, the present invention,

Board;

A plurality of first electrodes formed on the substrate;

An insulating film formed on the substrate;

A second electrode opposed to the first electrode to be insulated; And an organic light emitting layer interposed between the first and second electrodes and emitting light by the first and second electrodes.

A flat panel display device is provided between an area between the first electrodes or outside the first electrodes, and an opening region in which the insulating layer is formed and an opening region in which the insulating layer is not formed.

The region in which the insulating layer is formed may include a first region having a first insulating layer overlapping at least a portion of the first electrode of the insulating layer.

An area of the first area may be smaller than an area of the non-light emitting area except for the light emitting area emitted by the organic light emitting film.

The opening region may be located outside the first region.

The region in which the insulating layer is formed may include a second region having a second insulating layer that does not overlap with the first electrode.

The sum of the area of the first area and the area of the second area may be smaller than the area of the non-light emitting area excluding the light emitting area emitted by the organic light emitting film.

The opening area may be located between the first area and the second area.

The first region may be in a closed curve surrounding the first electrode.

The width of the first region may be approximately 1 to 15 micrometers.

The width of the opening area may be approximately 1 to 15 micrometers.

The first region and the second region may be separated from each other.

At least a portion of the first region and the second region may be connected to each other.

The opening region may be located between the first electrode and the second region.

The opening area may be located outside the first area and the second area.

The opening region may be located outside the second region.

The insulating layer may be formed of an organic material. The present invention also provides a

Board; And

A display area formed on the substrate and having a plurality of pixels; Including,

The display area,

A plurality of select driving circuits provided in each pixel;

A protective film formed of an insulator to cover the selection driving circuits;

A plurality of pixel electrodes provided in the pixels and formed on the passivation layer; And

An insulating film formed on the protective film; Equipped with

A flat panel display device is provided between an area in which the insulating film is formed and an opening area in which the insulating film is not formed between the pixel electrodes or outside the display area.

The region in which the insulating layer is formed may include a first region having a first insulating layer overlapping at least a portion of the pixel electrode of the insulating layer.

The area of the first area may be smaller than the area of the non-light emitting area of the display area except for the light emitting area in which light emission occurs.

The opening region may be located outside the first region.

The region in which the insulating layer is formed may include a second region having a second insulating layer that does not overlap the pixel electrode.

The sum of the area of the first area and the area of the second area may be smaller than the area of the non-light emitting area except for the light emitting area in which the light emission occurs.

The opening area may be located between the first area and the second area.

The first region may be in a closed curve surrounding the pixel electrode.

The width of the first region may be approximately 1 to 15 micrometers.

The width of the opening area may be approximately 1 to 15 micrometers.

The first region and the second region may be separated from each other.

At least a portion of the first region and the second region may be connected to each other.

The opening region may be located between the pixel electrode and the second region.

The opening area may be located outside the first area and the second area.

The opening region may be located outside the second region.

The insulating layer may be formed of an organic material.

Each pixel has an organic electroluminescent element,

The pixel electrode may be any electrode of the organic EL device.

Hereinafter, a flat panel display device according to an exemplary embodiment of the present invention will be described in detail with reference to the accompanying drawings.

3 illustrates a structure of one pixel of an active matrix organic electroluminescent display device according to a first embodiment of the present invention.

Referring to the drawings, each pixel of the organic electroluminescent device is provided such that red, green, and blue pixels are repeatedly arranged, and the configuration of the pixels is not limited thereto. It can be arranged in a variety of patterns, such as mosaic, grid. A plurality of such pixels are arranged in a display area (not shown) of the organic light emitting display device to implement a predetermined image, and each pixel of the display area includes the TFTs 30 and 40 as shown in FIG. And a selective driving circuit having a capacitor 50 and the like, and an organic electroluminescent element 60 which is a light emitting element. Although not shown outside the display area, various driving circuits and terminals connected to external power sources and electronic components are positioned. This display area is sealed to block outside air.

3 is an enlarged view of one of red, green, and blue pixels as one driving unit of the organic light emitting display device.

Each pixel of the active matrix type organic light emitting display device includes a switching TFT 30 for switching, two thin film transistors for driving TFT 40 for driving, a selection driving circuit having a capacitor 50, and one The organic electroluminescent element 60 is included. The number of thin film transistors and capacitors of the selection driving circuit is not necessarily limited thereto, and of course, a larger number of thin film transistors and capacitors may be provided according to a desired device design. It is driven by a scan signal applied to the gate wiring 71 to transfer a data signal applied to the data wiring 72. The driving TFT 40 determines the amount of current flowing into the organic EL device 60 according to the data signal transmitted through the switching TFT 30, that is, the voltage difference Vgs between the gate and the source. The capacitor 50 stores a data signal transmitted through the switching TFT 30 for one frame.

The source electrode 31 of the switching TFT 30 is connected to the driving circuit by the data wiring 72, and the gate electrode 32 of the switching TFT 30 is connected to the other driving circuit by the gate wiring 71. It is. The drain electrode 33 of the switching TFT 30 is connected to the first capacitor electrode 51 of the capacitor 50 and the gate electrode 42 of the driving TFT 40.

The second capacitor electrode 52 of the capacitor 50 and the source electrode 41 of the driving TFT 40 are connected to the driving wiring 73, and the drain electrode 43 of the driving TFT 40 is organic electroluminescent. It is connected to the first electrode 61 of the device 60.

As shown in FIG. 4, the organic electroluminescent device 60 includes a first electrode 61 serving as a pixel electrode and a second electrode serving as a common electrode formed to face the first electrode 61 at a predetermined gap. An organic light emitting film 63 is formed between the first and second electrodes 61 and 62 to emit light by the first and second electrodes 61 and 62. This will be described in more detail as follows.

Referring to FIG. 4, a substrate 81 is provided in the active mattress type organic light emitting display device 40. The substrate 81 may be formed of a transparent material such as glass or plastic. The buffer layer 82 is formed on the substrate 81 as a whole.

On the buffer layer 82, a switching TFT 30, a driving TFT 40, a capacitor 50, and an organic EL device 60 as shown in FIG. 3 are formed. In FIG. The region in which the TFT 40 and the organic electroluminescent element 60 are formed is shown.

An active layer 44 arranged in a predetermined pattern is formed on an upper surface of the buffer layer 82. The active layer 44 is buried by the gate insulating film 83. The active layer 44 may be formed of a p-type or n-type semiconductor.

The gate electrode 42 of the driving TFT 40 is formed on the top surface of the gate insulating layer 83 to correspond to the active layer 44. The gate electrode 42 is buried by an intermediate insulating film 84. After the intermediate insulating film 84 is formed, the gate insulating film 83 and the intermediate insulating film 84 are etched by an etching process such as dry etching to form contact holes 83a and 84a to form the active layer 44. Revealing part of

The exposed portion of the active layer 44 is connected to the source electrode 41 and the drain electrode 43 of the driving TFT 40 formed in a predetermined pattern on both sides through contact holes 83a and 84a, respectively. . The source electrode 41 and the drain electrode 43 are buried in the protective film 85. After the passivation layer 85 is formed, a portion of the drain electrode 43 is exposed through an etching process.

The passivation layer 85 may be formed of an insulator, and may be formed of an inorganic layer such as silicon oxide or silicon nitride, or an organic layer such as acrylic or BCB. In addition, an additional insulating layer may be further formed on the passivation layer 85 to planarize the passivation layer 85.

On the other hand, the organic electroluminescent device 60 is to display predetermined image information by emitting red, green, and blue light according to the flow of current, and the first electrode 61 is formed on the passivation layer 85. Formed. The first electrode 61 is electrically connected to the drain electrode 43 of the driving TFT 40.

An insulating film 86 is formed to cover the first electrode 61. After the predetermined opening 64 is formed in the insulating film 86, the organic light emitting film 63 is formed in the region defined by the opening 64. The second electrode 62 is formed on the organic emission layer 63.

As shown in FIG. 5, the insulating layer 86 is a pixel defining layer that divides each pixel. The insulating layer 86 is formed of an organic material and has a surface of a substrate on which a first electrode 61 is formed, in particular, a protective layer ( 85) planarize the surface. A more detailed description of the insulating film 86 will be described later.

On the other hand, the organic EL device 60 emits red, green, and blue light in accordance with the flow of current to display predetermined image information. The organic light emitting diode 60 is connected to the drain electrode 43 of the driving TFT 40. An organic light emitting diode disposed between the first electrode 61, the second electrode 62 serving as an opposite electrode provided to cover the entire pixel, and the first electrode 61 and the second electrode 62 to emit light; Film 63.

The first electrode 61 and the second electrode 62 are insulated from each other, and light is emitted by applying voltages of different polarities to the organic light emitting layer 63.

The organic light emitting layer 63 may be a low molecular weight or high molecular organic material. When the low molecular weight organic material is used, a hole injection layer (HIL), a hole transport layer (HTL), and an emission layer (EML) are emitted. ), An electron transport layer (ETL), an electron injection layer (EIL), or the like, may be formed by stacking a single or a complex structure, and the usable organic material may be copper phthalocyanine (CuPc). , N, N-di (naphthalen-1-yl) -N, N'-diphenyl-benzidine (N, N'-Di (naphthalene-1-yl) -N, N'-diphenyl-benzidine: NPB), Various applications are possible, including tris-8-hydroxyquinoline aluminum (Alq3). These low molecular weight organics can be formed by vacuum deposition.

In the case of the polymer organic material, the structure may include a hole transporting layer (HTL) and a light emitting layer (EML). In this case, PEDOT is used as the hole transporting layer, and PPV (Poly-Phenylenevinylene) and polyfluorene are used as the light emitting layer. Polymer organic materials such as (Polyfluorene) are used and can be formed by screen printing or inkjet printing.

The organic light emitting film as described above is not necessarily limited thereto, and various embodiments may be applied. The first electrode 61 functions as an anode electrode, and the second electrode 62 is a cathode. Although it can function as an electrode, of course, the polarity of these 1st electrode 61 and the 2nd electrode 62 may be reversed. The first electrode 61 may be patterned to correspond to the area of each pixel, and the second electrode 62 may be formed to cover all pixels.

The first electrode 61 may be provided as a transparent electrode or a reflective electrode, and when used as a transparent electrode, may be formed of ITO, IZO, ZnO, or In 2 O 3, and when used as a reflective electrode, Ag, Mg, After forming the reflective layer with Al, Pt, Pd, Au, Ni, Nd, Ir, Cr, or a compound thereof, the transparent electrode layer may be formed thereon with ITO, IZO, ZnO, or In 2 O 3. The second electrode 62 may also be provided as a transparent electrode or a reflective electrode. When the second electrode 62 is used as a transparent electrode, the second electrode 62 is used as a cathode electrode, and thus a metal having a small work function, that is, Li and Ca , LiF / Ca, LiF / Al, Al, Ag, Mg, and compounds thereof are deposited to face the organic light emitting film 63, and thereafter, the auxiliary electrode layer is formed of ITO, IZO, ZnO, or In2O3. Bus electrode lines can be formed. When used as a reflective electrode, Li, Ca, LiF / Ca, LiF / Al, Al, Ag, Mg, and compounds thereof are formed by depositing the entire surface.

In the present invention, a region 87 in which the insulating film 86 is formed and an opening region in which the insulating film 86 is not formed between each of the first electrodes 61 or outside of the first electrodes 61. 88 is provided. Hereinafter, in the present specification, the region 87 in which the insulating layer 86 is formed is referred to as a planarized area for convenience. However, it is not necessarily limited to the meaning of this term, and of course, the insulating film 86 does not have to have a planarization function. Of course, after the first electrode 61 is formed on the protective film 85, Each pattern of the switching TFT 30, the driving TFT 40, and the capacitor 50 formed on the substrate 81 except for the region in which the pixel opening 64 of the organic EL device 60 is formed. In order to smooth the height difference due to this, the insulating film 86 may be formed. The insulating layer 86 may be formed using an organic material such as acrylic or BCB, but is not limited thereto, and may use an inorganic material.

Here, the planarization region 87 in which the insulating layer 86 is formed includes a first region 87a having the first insulating layer 86a. The first insulating layer 86a overlaps at least a portion of an edge of the first electrode 61, and according to an exemplary embodiment of the present invention as shown in FIG. 5, an edge of the first electrode 61 is provided. Therefore, it may be formed in a closed curve forming a strip of thin width.

According to the first preferred embodiment of the present invention, as shown in FIG. 5, the first region 87a having the first insulating film 86a formed along the edge of the first electrode 61 and the first region. An opening free from the insulating layer formed between the first and second regions 87a and 87b, the second region 87b having the second insulating film 86b spaced apart from the region 87a by a predetermined interval. Area 88 is included.

The first region 87a may be formed to have a width of about 1 to 15 micrometers. The first region 87a is the first electrode 61 and the second electrode 62 when the organic emission layer 63 and the second electrode 62 are sequentially formed on the first electrode 61. It is possible to prevent the short circuit between) and can play a role of preventing a so-called white spot or dark spot. The opening region 88 formed along the edge of the first region 87a allows gas generated from the insulating layer 86 to be discharged during driving, thereby minimizing damage to the organic light emitting layer 63 by the gas. have.

In particular, as in the first embodiment as shown in FIG. 5, when the opening region 88 is formed only in part along the edge of the first electrode 61, it is possible to discharge the gas generated from the insulating film 86. Acts as a buffer area for

As a result, it is possible to delay the advancing speed at which the pixels shrink with time as compared with the case where the opening region 88 does not exist. This opening region 88 is preferably formed to have a width of approximately 1 to 15 micrometers.

On the other hand, a second region 87b having a second insulating film 86b is formed outside the opening region 88. The second insulating film 86b is made of substantially the same material as the first insulating film 86a.

The second region 87b has a function of flattening the surface of the substrate, in particular, the protective layer 85, in order to prevent a defect caused by a step between the first electrode 61 and the peripheral wiring in the active matrix type display device. Is doing. As such, the insulating layer 86 is formed with a first region 87a having a first insulating layer 86a having a predetermined width along the edge of the first electrode 61 of the organic electroluminescent element 60. The non-opening region 88 forms a first region 87a in which the first insulating film 86a is formed and a second region 87b in which the second insulating film 86b is not continuous.

The sum of the areas where the insulating film 86 is formed as described above, for example, the area of the first region 87a and the second region 87b is due to the opening region 88 in which the insulating film 86 is not formed. It can be said that it is smaller than the area of the non-opening part of the active mattress type organic electroluminescent display device except the pixel opening 64 except the area | region other than the area | region light-emitted by 62).

The insulating film 86 can be variously modified depending on the state of the substrate on which the insulating film 86 is to be formed or the surface of the protective layer 85.

The second embodiment shown in FIG. 6 has a first region 87a in which a first insulating film 86a is formed along the edge of the first electrode 61, and the entirety of the rest is an opening region in which no insulating film is formed. It may be formed of (88).

That is, the insulating film is formed in a thin band along the edge of the first electrode 61 of the organic electroluminescent device, and the remaining region is formed in order to prevent damage to the organic light emitting film due to the gas discharge from the insulating film. Unopened openings 88 can be formed.

In addition, according to the third preferred embodiment of the present invention as shown in FIG. 7, the first insulating film 86a is discontinuously formed to form the first region 87a, and the height difference of the substrate or the protective layer is large. The second insulating layer 86b may be formed in the second region 87b. According to this third embodiment, the damage of the gas generated from the insulating film can be minimized by minimizing the insulating film. In addition, according to the fourth embodiment of the present invention as shown in FIG. A first region 87a having a first insulating film 86a discontinuously formed at an edge thereof; an opening region 88 provided outside the first electrode 61; and outside the opening region 88. A second region 87b having a second insulating film 86b is provided. At this time, one portion of the discontinuous first region 87a and the second region 87b are connected to each other.

According to the fourth exemplary embodiment of the present invention, the insulating film hardly touches the first electrode 61, and only the outside of the first electrode 61 is covered. Therefore, gas penetration to the region where light emission occurs is blocked.

FIG. 9 shows a fifth embodiment of the present invention, in which a first insulating film 86a is formed in a closed curve at the edge of the first electrode 61 to form a first region 87a. Outside the 87a), the second insulating film 86b is formed in the portion where the height difference between the substrate or the protective layer is large, thereby forming the second region 87b. The first region 87a and the second region 87b are connected to each other, and an opening region 88 without an insulating film is formed outside the first region 87a and the second region 87b. This prevents an electrical short between the first electrode 61 and the second electrode (not shown) by the first insulating film 86a in the first region 87a, and prevents the second insulating film 86b in the second region 87b. As a result, the surface of the substrate or the protective layer is planarized. By forming the opening region 88 wide, the pixel can be protected from the gas of the insulating film.

10 shows a sixth embodiment of the present invention, the basic structure of which is the same as that of the first embodiment according to FIG. However, the first insulating film 86a in the first region 87a is deformed according to the surface state of the substrate or the protective layer to planarize the substrate or the protective layer.

The structure of the insulating film as described above is applicable not only to the active matrix organic electroluminescent display device including the selection driving circuit for each pixel as described above, but also to the passive matrix organic electroluminescent display device without the selection driving circuit. Of course it is possible.

In addition, the above description is applied to an active mattress type organic electroluminescent display device, but the present invention is not limited thereto, and a structure including a TFT circuit such as a liquid crystal display device, an inorganic electroluminescent display device, and a TFT circuit. Of course, it can also be applied to a flat panel display device that does not include.

As described above, the flat panel display of the present invention can obtain the following effects.

First, damage to the organic light emitting film due to the discharge of the gas generated from the insulating film can be minimized.

Second, the phenomenon in which the pixel is reduced can be delayed by the opening region in which the insulating film is not formed as a buffer region.

Third, as the first insulating film is formed at the edge of the first electrode, a short circuit between the first electrode and the second electrode can be prevented.

Fourth, the insulating film can planarize the surface of the substrate or the protective layer.

Although the present invention has been described with reference to one embodiment shown in the drawings, this is merely exemplary, and those skilled in the art will understand that various modifications and equivalent other embodiments are possible therefrom. Therefore, the true technical protection scope of the present invention will be defined by the technical spirit of the appended claims.

Claims (41)

Board; A plurality of first electrodes formed on the substrate; An insulating film formed on the substrate; A second electrode opposed to the first electrode to be insulated; And an organic light emitting layer interposed between the first and second electrodes and emitting light by the first and second electrodes. And a region in which the insulating film is formed and an opening region in which the insulating film is not formed, between each of the first electrodes or outside the first electrodes. The method of claim 1, And the region in which the insulating layer is formed includes a first region having a first insulating layer overlapping at least a portion of the first electrode of the insulating layer. The method of claim 2, The area of the first area is smaller than the area of the non-light emitting area except for the light emitting area emitted by the organic light emitting film. The method of claim 2, And the opening area is outside the first area. The flat panel display of claim 2, wherein the region where the insulating layer is formed includes a second region having a second insulating layer that does not overlap with the first electrode. The method of claim 5, wherein The sum of the area of the first area and the area of the second area is smaller than the area of the non-light emitting area except for the light emitting area emitted by the organic light emitting film. The method of claim 5, wherein And the opening area is located between the first area and the second area. The method of claim 7, wherein And the first region is in a closed curve surrounding the first electrode. The method of claim 7, wherein And the width of the first region is approximately 1 to 15 micrometers. The method of claim 7, wherein And the width of the opening area is approximately 1 to 15 micrometers. The method of claim 5, wherein And the first area and the second area are separated from each other. The method of claim 5, wherein And at least a portion of the first region and the second region are connected to each other. The method of claim 5, wherein And the opening area is located between the first electrode and the second area. The method of claim 5, wherein And the opening area is located outside the first area and the second area. The method of claim 2, And the width of the first region is approximately 1 to 15 micrometers. The method of claim 1, And the region in which the insulating film is formed includes a second region having a second insulating film which does not overlap with the first electrode. The method of claim 16, And the opening area is located between the first electrode and the second area. The method of claim 16, And the opening area is outside the second area. The method of claim 1, And the width of the opening area is approximately 1 to 15 micrometers. The method according to any one of claims 1 to 19, And the insulating layer is formed of an organic material. Board; And A display area formed on the substrate and having a plurality of pixels; Including, The display area, A plurality of select driving circuits provided in each pixel; A protective film formed of an insulator to cover the selection driving circuits; A plurality of pixel electrodes provided in the pixels and formed on the passivation layer; And An insulating film formed on the protective film; And an area in which the insulating film is formed and an opening area in which the insulating film is not formed, between each pixel electrode or outside the display area. The method of claim 21, And the region in which the insulating layer is formed includes a first region having a first insulating layer overlapping at least a portion of the pixel electrode of the insulating layer. The method of claim 22, And the area of the first area is smaller than that of the non-light emitting area except for the light emitting area in which the light is emitted. The method of claim 22, And the opening area is outside the first area. The method of claim 22, And the region in which the insulating layer is formed includes a second region having a second insulating layer which does not overlap the pixel electrode. The method of claim 25, The sum of the area of the first area and the area of the second area is smaller than the area of the non-light emitting area except for the light emitting area in which light emission occurs in the display area. The method of claim 25, And the opening area is located between the first area and the second area. The method of claim 27, And the first area is in a closed curve surrounding the pixel electrode. The method of claim 27, And the width of the first region is approximately 1 to 15 micrometers. The method of claim 27, And the width of the opening area is approximately 1 to 15 micrometers. The method of claim 25, And the first area and the second area are separated from each other. The method of claim 25, And at least a portion of the first region and the second region are connected to each other. The method of claim 25, And the opening area is located between the pixel electrode and the second area. The method of claim 25, And the opening area is located outside the first area and the second area. The method of claim 22, And the width of the first region is approximately 1 to 15 micrometers. The method of claim 21, And the region in which the insulating film is formed includes a second region having a second insulating film which does not overlap the pixel electrode. The method of claim 36, And the opening area is located between the pixel electrode and the second area. The method of claim 36, And the opening area is outside the second area. The method of claim 21, And the width of the opening area is approximately 1 to 15 micrometers. The method according to any one of claims 21 to 39, And the insulating layer is formed of an organic material. The method according to any one of claims 21 to 39, Each pixel has an organic electroluminescent element, And the pixel electrode is one electrode of the organic electroluminescent element.