KR20040108420A - Reflective film for CRT panel - Google Patents

Abstract

PURPOSE: A reflection film for a CRT(Cathode Ray Tube) panel is provided to form a reflecting layer by forming a transfer film on the reflecting layer and transferring the reflecting layer, thereby simplifying a CRT panel fabricating process. CONSTITUTION: A reflecting film for a CRT panel includes a base film(11), a release layer(12), an aluminum deposition layer(13), and an adhesive layer(14). The release layer is formed of a resin including graphite and silica having the grain size of 0.1 to 50 micrometer. The aluminum deposition layer has the optical density of 3.0 to 7.0. The adhesive layer is 1.5 to 4.0 micrometer in thickness.

Description

Reflective film for CRT panel {Reflective film for CRT panel}

The present invention relates to a reflective film for a CRT panel, and more particularly, to improve the formation of the metal reflective film of the CRT panel by evaporation in a conventional batch method, thereby making a transfer film having a reflective film, thereby enabling low temperature transfer. The present invention relates to a reflective film for a CRT panel which simplifies the manufacturing process and changes the thickness of the adhesive layer to enable transfer at a low temperature.

In the formation of a CRT screen, the conventional technique of forming a reflective film on the back of the phosphor forms a black matrix on the glass of the panel, followed by red, green, and blue phosphors. The films are formed through the processes of coating, drying, exposure and development, respectively. Then, to smooth the reflective film, a thin resin layer such as PVA or acrylic is applied and dried, and each panel is deposited by a batch method, and the organic materials are burned by decomposition at a temperature of 450 ° C. or higher, and the graphite component, phosphor and The screen of the panel was completed, leaving only the aluminum reflective film.

However, in case of using the conventional technology, the aluminum layer has severe diffused reflections and thus lacks in brightness, and should be subjected to a primer treatment and a process for forming micropores in aluminum, and have to be deposited in a batch manner so that the process time and cost are reduced. There were many disadvantages, such as a lot of defects occur.

Therefore, the inventors of the present invention, while trying to solve the problem of forming the metal reflective film of the conventional CRT panel by the deposition method, forming a metal reflective film on the film and changing the thickness of the adhesive layer as a result of the existing transfer temperature It has been found that transfer is possible at lower temperatures to complete the present invention.

Accordingly, an object of the present invention is to form a reflective film of a CRT panel by a batch type, to make a transfer film having a reflective film, and to transfer the reflective film, thereby simplifying the manufacturing process of the CRT panel while allowing a transfer at a lower temperature. It is to provide a transfer film.

CRT panel transfer film of the present invention for achieving the above object is a base film; A release layer made of a resin containing graphite and silica having a particle size of 0.1 to 50 µm; An aluminum deposition layer having a light density of 3.0 to 7.0; It is characterized by having a structure in which an adhesive layer having a thickness of 1.5 to 4.0 µm is sequentially laminated.

1 is a cross-sectional view of a reflective film for a CRT panel according to the present invention.

* Detailed description of the main symbols in the drawings *

11-base film 12-release layer

13-metal deposition layer 14-adhesive layer

The present invention will be described in more detail as follows.

The structure of the CRT panel reflective film of the present invention is as shown in FIG.

The base film 11 is a film for coating processing, and mostly uses a polyester film.

The release layer 12 assists in forming the aluminum deposition layer and ultimately releases the base film and the deposition layer. As the release layer resin, an acrylic resin that decomposes at a temperature of 400 ° C. or higher and a glass transition temperature of 60 to 130 ° C. is used. If the glass transition temperature of the acrylic resin is less than 60 ° C., the polyester film is transferred from the transfer film by a transfer roll. When the transfer becomes difficult and higher than 130 ° C., a problem occurs in adhesion to the metal deposition layer. In the release layer composition, graphite is used for the secondary electron discharge and the increase of the contrast, and when the film is transferred, the particle size is 0.1 to 5 μm, so that micropores can be formed by the bending of the phosphor and the bending of the particles. It is preferable to add the silica particle which is 0.5-2 micrometers to 3-15 weight part with respect to 100 weight part of resin. When the content of silica having such a particle size exceeds 15 parts by weight with respect to 100 parts by weight of resin, the number of fine pores becomes too large, resulting in a decrease in brightness after completion of the product. On the other hand, if the amount is less than 3 parts by weight, the number of pores is small, and when the decomposition is performed at 400 ° C. or more, adhesion and the emission of organic decomposition gas of the phosphor layer are not smooth, resulting in swelling of the reflective film. It is preferable that the thickness of a mold release layer is 1-2 micrometers.

Meanwhile, the metal deposition layer 13 is formed by depositing a metal such as aluminum to express metal gloss. Specifically, the metal deposition layer 13 is formed by depositing aluminum in a high vacuum on a release layer. The optical density of the metal deposition layer is 3.0 to 7.0, and it is preferable that 111 faces of the metal crystal structure be 50% or more with respect to 200 faces. This light density and the amount of 111 planes has the effect of increasing the brightness.

When the adhesive layer 14 is formed on the metal deposition layer as described above, the adhesive layer preferably forms an acrylic resin having a glass transition temperature of 30 to 80 ° C. so as to have a thickness of 1.5 to 4.0 μm. If the thickness of the adhesive layer is thinner than 1.5 μm, the surface is not transferred or partially transferred to the surface of the CRT panel. If the thickness is thicker than 4.0 μm, swelling occurs during transfer and sintering occurs. This happens.

Reflective film having a structure as described above can be transferred at a temperature of 30 ~ 120 ℃ of the transfer roll.

As described above, silica is used in the release layer to induce fine pores of the metal layer, and graphite is added to improve secondary electron emission and contrast, form a thickness of the metal layer appropriately, increase luminance, and change the thickness of the adhesive layer than before. It can transfer at low temperature, shorten the process and reduce the process time, reduce defects, improve productivity in CRT panel manufacturing, and reduce cost.

Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited by the Examples.

Example 1

95.5 parts by weight of polymethyl methacrylate, 4.5 parts by weight of silica and graphite were diluted in a solvent such as methyl ethyl ketone and toluene and coated to a thickness of 2.3 μm on a polyester film having a glass thickness of 80 ° C. on a polyester film having a thickness of 25 μm. Appropriate time was dried to form a release layer. The silica used at this time is in the particle size of 0.5 ~ 2㎛ range. Then, aluminum was deposited to a thickness of 4.5 using a vacuum evaporator to form a metal layer. An adhesive layer was formed on the metal layer using a polyethyl methacrylate having a glass transition temperature of 45 ° C. to a thickness of 2.3 μm to prepare a reflective film for a CRT panel.

Example 2

A reflective film for a CRT panel was manufactured in the same manner as in Example 1, except that the thickness of the adhesive layer was 3.0 μm.

Example 3

95.5 parts by weight of polymethyl methacrylate, 4.5 parts by weight of silica and graphite were diluted in a solvent such as methyl ethyl ketone and toluene, coated on 2.3 μm thick polyester film to a thickness of 2.3 μm, dried at 100 ° C. for a suitable time, and released. A layer was formed. At this time, the size of the graphite particles used is 1.0㎛, silica is a particle size of 0.5 ~ 2㎛ range. Then, aluminum was deposited at a thickness of 4.5 using a vacuum evaporator to form a metal layer. 70 parts by weight of a polyamide copolymer having a glass transition temperature of 5 ° C. and 30 parts by weight of polymethyl methacrylate having a glass transition temperature of 60 ° C. were mixed on the metal layer to form an adhesive layer having a thickness of 2.0 μm to prepare a reflective film for a CRT panel. It was.

Example 4

A reflective film for a CRT panel was manufactured in the same manner as in Example 3, except that an adhesive layer was formed to have a thickness of 3.0 μm.

Comparative Example 1

A reflective film for a CRT panel was manufactured in the same manner as in Example 1, except that the thickness of the adhesive layer was 5.0 μm.

Comparative Example 2

A reflective film for a CRT panel was manufactured in the same manner as in Example 1, except that the thickness of the adhesive layer was 1.0 μm.

Comparative Example 3

A reflective film for a CRT panel was manufactured in the same manner as in Example 3, except that an adhesive layer was formed to have a thickness of 5.0 μm.

The conditions of the examples and comparative examples are summarized in Table 1 below.

Adhesive layer resin composition ratio (part by weight) Adhesive layer thickness (㎛) Adhesive resin glass transition temperature (℃) Polyethyl methacrylate Polyamide Polymethyl methacrylate Polyethyl methacrylate Polyamide Polymethyl methacrylate Example One 100 - - 2.3 45 - - 2 100 - - 3.0 45 - - 3 - 70 30 2.0 - 5 60 4 - 70 30 3.0 - 5 60 Comparative example One 100 - - 5.0 45 - - 2 100 - - 1.0 45 - - 3 - 70 30 5.0 - 5 60

In the description of Table 1, the light density was measured by white light, Macbeth's product, and the glass transition temperature was measured by increasing the temperature rising rate of the Perkin Elmer's DSC at room temperature to 10 ℃ / min.

The CRT panel reflective films obtained according to the above Examples and Comparative Examples were evaluated for the transferability by measuring the temperature of the roll to be transferred when the pressure of the laminator was 5 kg / cm 2, and visually confirmed the degree of swelling during sintering. The results are shown in Table 2 below.

Example Comparative Example One 2 3 4 One 2 3 Degree of swelling during sintering none none none none Severe none Severe Transferable temperature (℃) 115 105 70 50 80 Partial transcription 90

As described above in detail, according to the present invention, silica is used in the release layer to induce micropores of the metal layer, and graphite is added to improve secondary electron emission and contrast, and to appropriately form the thickness of the metal layer to increase luminance. When changing the thickness of the adhesive layer to transfer at a lower temperature than before, the process can be shortened, the process time can be reduced, and the defect rate can be reduced, thereby improving the productivity of CRT panel manufacturing and reducing the cost. have.

Claims (4)

Base film; A release layer made of a resin containing graphite and silica having a particle size of 0.1 to 50 µm; An aluminum deposition layer having a light density of 3.0 to 7.0; Reflective film for CRT panel having a structure in which an adhesive layer having a thickness of 1.5 ~ 4.0㎛ is sequentially laminated. According to claim 1, wherein the release layer comprises an acrylic resin having a glass transition temperature of 60 to 130 ℃, silica particles are 0.1 to 5.0㎛ size, silica content in the entire release layer is characterized in that 3 to 15 parts by weight. Reflective film for CRT panels. The reflective film for a CRT panel according to claim 1, wherein the adhesive layer is made of an acrylic resin having a glass transition temperature of 30 to 80 ° C. The CRT panel according to claim 1, wherein the adhesive layer comprises 5 to 70% by weight of an amide resin having a glass transition temperature of 3 to 50 ° C and 95 to 30% by weight of an acrylic resin having a glass transition temperature of 40 to 80 ° C. Reflective film.