KR20040066539A - Slurry agitating apparatus for semiconductor manufacture - Google Patents

Abstract

PURPOSE: A slurry agitating apparatus is provided to minimize an effect caused by the angle of blades while agitating the slurry. CONSTITUTION: The slurry agitating apparatus comprises: an agitating tub(230) for agitating a slurry for a semiconductor manufacture; and an impeller shaft(240) located at the center of the agitating tub(230) upwardly, the impeller shaft(240) having a plurality of blade groups(225) in the direction of axis. The impeller shaft(240) extends out of the floor of the agitating tub(230) and connects to a rotation-driving member(200) to rotate in horizontal direction. Because many blade groups(225) are provided to agitate slurry, an agitation of the slurry is performed evenly and smoothly without any relations of the angle of the blades.

Description

Slurry agitating apparatus for semiconductor manufacture

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a slurry agitating apparatus for semiconductor manufacture, and in particular, an impeller shaft for performing a stirring operation is configured upwardly at the bottom central portion of the agitating vessel. It relates to a slurry stirring device for production.

The chemical mechanical polishing process (CMP process) is a process of planarizing the laminated surface of a wafer using chemical and mechanical methods. The process includes a slurry called polishing. mixtures of powder and water are used. Due to the nature of the mixture, the slurry requires a stirring process prior to use, in order to obtain uniform polishing characteristics during the process by making the density of the abrasive sand in the slurry uniform through the stirring process. The stirring process of the slurry is performed through a slurry stirring device. In the conventional slurry stirring device, one wing group is mechanically connected to an external rotating drive means and a rotating shaft on one side of the inside of the stirring tank where the slurry is stirred. It has a structure for performing a horizontal rotation operation, detailed structure and operation will be described with reference to the drawings below.

1 is a view schematically showing a conventional slurry stirring device for manufacturing a conventional semiconductor.

As shown in FIG. 1, in a conventional slurry manufacturing apparatus for manufacturing a semiconductor, a slurry inlet 133 is formed at one side of an upper side of a stirring vessel 130 where stirring is performed on the slurry 50, and a slurry outlet 136 is formed at the center of a lower portion thereof. ) Is configured. Another side of the upper portion of the stirring vessel 130 is configured with a rotation drive means 100, such as a motor (motor), the rotation drive means 100 is rotated shaft 120 is configured to enter one end into the stirring vessel 130 Is mechanically connected to the other end of the) is configured to obtain a rotational motion inside the stirring vessel (130). At one end of the rotating shaft 120 drawn into the stirring tank 130 is configured a wing group 125 is a group of a plurality of stirring blades, by using the wing group 125 agitating tank ( 130) the stirring operation of the slurry 50 supplied therein is performed.

In this conventional structure, since the vortex conditions of the slurry 50 are sensitively affected by the angle formed by each wing of the wing group 125 performing the stirring operation, the size and wing group of the stirring tank 130 are It was difficult to select the proper wing angle according to the configuration position of 125 and the like. Such a point not only makes it difficult to select a substitute when the wing group 125 is broken, but also has a problem of not obtaining a uniform stirring effect in the slurry 50 having high fluidity.

Accordingly, an object of the present invention is to provide a slurry stirring device for manufacturing a semiconductor configured to obtain a uniform stirring effect of the slurry in the stirring operation while minimizing the influence of the wing angle of the wing group performing the stirring operation.

1 is a schematic view showing a conventional slurry agitating apparatus for manufacturing a semiconductor (slurry agitating apparatus for semiconductor manufacture),

2 is a view showing a slurry stirring device for manufacturing a semiconductor according to a first embodiment of the present invention, and

3 is a view showing a slurry stirring device for manufacturing a semiconductor according to a second embodiment of the present invention.

<Explanation of symbols for the main parts of the drawings>

100, 200, 300: rotation drive means

120: rotation axis

130, 230, 330: stirring tank

50: slurry

133, 233, 333: slurry inlet

136, 236, 336: slurry outlet

240, 340: impeller shaft

125, 225, 325: wing group

250, 350: belt for power transmission

360: external structure for the support of the stirring tank

365: roller

In order to achieve the above object, the present invention is an agitating tank having a stirring action on the slurry for producing a semiconductor, and an impeller formed in the bottom center of the inside of the agitator upwards and a plurality of wing groups are formed on the outer peripheral surface at regular intervals up and down It provides a slurry stirring device for manufacturing a semiconductor comprising a shaft.

Hereinafter, a slurry stirring device for manufacturing a semiconductor according to the present invention will be described in detail with reference to the accompanying drawings.

2 is a view showing a slurry stirring device for manufacturing a semiconductor according to a first embodiment of the present invention.

As shown in FIG. 2, in the slurry stirring device for manufacturing a semiconductor according to the first exemplary embodiment of the present invention, a slurry inlet 233 is formed at an upper portion of a stirring vessel 230 in which stirring with respect to the slurry 50 is performed, and one side of the lower portion is provided. The slurry outlet 236 is configured. An impeller shaft 240 is formed upward in the bottom center portion of the stirring vessel 230, and the impeller shaft 240 has three wing groups 225 formed on the outer circumferential surface thereof at regular intervals up and down. The lower end of the impeller shaft 240 passes through the bottom center of the stirring tank 230 and is drawn out to the outside of the stirring tank 230, and the lower end of the impeller shaft 240 is provided with a rotation drive means 200 and a power transmission belt (outside). mechanically connected via a belt 250 to perform a horizontal rotational motion.

In such a structure, a plurality of wing groups 225 for agitating are formed on the impeller shaft 240 and the impeller shaft 240 is vertically formed at the center of the agitation tank 230 to perform a stirring operation through horizontal rotation. Therefore, the stirring operation for the slurry 50 can be performed more uniformly and smoothly as compared with the conventional structure while reducing the influence of the angle formed by each wing of the wing group 225.

3 is a view showing a slurry stirring device for manufacturing a semiconductor according to a second embodiment of the present invention.

As shown in FIG. 3, in the slurry stirring device for manufacturing a semiconductor according to the second exemplary embodiment of the present invention, an impeller shaft 340 is upwardly directed to the bottom center portion of the stirring vessel 330 where stirring is performed on the slurry 50. The impeller shaft 340 is formed on the outer circumferential surface three wing groups 325 are formed at regular intervals, the lower end of the stirring tank 330 through the bottom center portion of the stirring tank 330 to the outside It is withdrawn. The drawn impeller shaft 340 is fixed, the inside of which is a hollow pipe (pipe) structure, is formed of a Teflon (teflon) material. In the impeller shaft 340, a slurry outlet 336 connected to an internal pipe structure is formed at a portion of the impeller shaft 330 adjacent to the bottom of the stirring tank 330, and is used as a discharge passage of the stirred slurry 50. Stirring tank 330 is configured to perform a horizontal rotation operation is mechanically connected by using the rotary drive means 300 and the power transmission belt 350 configured on the outside, the outside of the stirring tank 330 for the support of the stirring tank The outer structure 360 is configured to perform the support of the stirring tank 330 during the rotation of the stirring tank 330. Between the stirring tank 330 and the external structure for supporting the stirring tank 360, a roller 365 that can rotate in response to the rotation direction of the stirring tank 330 is configured to see the rotation of the stirring tank 330 Smoothly, the slurry 50 is introduced into the stirring vessel 330 through the slurry inlet 333 formed on the upper portion of the external structure 360 for supporting the stirring vessel.

This structure also reduces the influence of the angle formed by each wing of the blade group 325, as in the first embodiment described above, while making the stirring operation on the slurry 50 more uniform than the conventional structure. You can proceed smoothly.

In the structure shown in the first embodiment or the second embodiment, the stirring effect may be further enhanced by forming a separate stirring blade on the inner side of the stirring vessel to perform the stirring operation together with the impeller shaft.

Although the present invention has been described as an example of the above, it is obvious that the present invention is not limited thereto, and there may be many examples of configurations that meet the intention of the present invention.

As described above, according to the structure of the slurry stirring device for manufacturing a semiconductor according to the present invention, a plurality of wing groups for agitating are formed on the impeller shaft, and the horizontal rotation of the impeller shaft or the stirring tank is performed in a state where the impeller shaft is formed perpendicular to the center of the stirring tank. Since the stirring operation is performed through, while reducing the influence of the angle formed by each wing of the wing group, it is possible to obtain an effect that the stirring operation for the slurry can be more uniformly and smoothly compared with the conventional structure.

Claims (4)

A stirring tank having a stirring action on a slurry for manufacturing a semiconductor; And An impeller shaft which is formed upward in a central portion of the bottom of the stirring tank and has a plurality of wing groups formed at regular intervals on the outer circumferential surface thereof; Slurry agitating apparatus for semiconductor manufacture, characterized in that it comprises a. The method of claim 1, wherein the impeller shaft has a lower end is drawn through the bottom center of the stirring vessel to the outside of the stirring vessel, the lower end is drawn is configured to be mechanically connected to the rotation drive means to perform a horizontal rotation operation A slurry stirring device for producing semiconductors. According to claim 1, wherein the impeller shaft is lowered through the bottom center portion of the stirring tank is drawn out and fixed, the stirring tank is configured to be mechanically connected to the rotation drive means to perform a horizontal rotation operation Slurry stirring device for semiconductor production. The slurry stirring device of claim 3, wherein the impeller shaft has a pipe structure inside thereof, and a slurry outlet for discharging the slurry is formed at a portion near the bottom of the stirring vessel.