KR20040032514A - Optical diffuser for lcd using sterolithography and method for preparing the same - Google Patents
Optical diffuser for lcd using sterolithography and method for preparing the same Download PDFInfo
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- KR20040032514A KR20040032514A KR1020020061694A KR20020061694A KR20040032514A KR 20040032514 A KR20040032514 A KR 20040032514A KR 1020020061694 A KR1020020061694 A KR 1020020061694A KR 20020061694 A KR20020061694 A KR 20020061694A KR 20040032514 A KR20040032514 A KR 20040032514A
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133606—Direct backlight including a specially adapted diffusing, scattering or light controlling members
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/02—Diffusing elements; Afocal elements
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133606—Direct backlight including a specially adapted diffusing, scattering or light controlling members
- G02F1/133607—Direct backlight including a specially adapted diffusing, scattering or light controlling members the light controlling member including light directing or refracting elements, e.g. prisms or lenses
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- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
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- Mechanical Engineering (AREA)
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- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Liquid Crystal (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
Description
본 발명은 스테레오 리소그래피를 이용한 액정디스플레이용 광 확산판 및 그 제조 방법에 관한 것으로, 더욱 상세하게는 액정 디스플레이(LCD)의 셀 내부 또는 셀 외부에 위치하여 백 라이트 (Back Light) 또는 액정을 통과한 직진성의 광을 확산시켜주는 스테레오 리소그래피를 이용한 광 확산판 및 그 제조 방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light diffusing plate for liquid crystal display using stereo lithography and a method of manufacturing the same. More particularly, the present invention relates to a light diffusing plate for manufacturing a liquid crystal display and a method of manufacturing the same. A light diffusing plate using stereo lithography for diffusing linear light and a method of manufacturing the same.
최근 액정 디스플레이의 괄목한 성장과 함께 광 시야각이나 휘도 증가를 위한 광 확산판의 개발이 매우 중요한 실정이다. 도 1에 나타난 바와 같이 기존의 광 확산판은 주로 유리 기판의 상부에 모래 등을 강하게 투사시켜 입사되는 광이 확산판 표면에서 산란이 되도록 하는 광부품이다. 이때 광 확산판의 기본 미세 구조는 프리즘 형태의 삼각 모양을 나타내는데(도 2), 때때로 입사광의 편광이 깨지는 문제가 발생한다.In recent years, with the rapid growth of liquid crystal displays, the development of light diffusion plates for increasing the viewing angle and brightness is very important. As shown in FIG. 1, an existing light diffuser plate is an optical component that mainly projects sand or the like on the glass substrate so that incident light is scattered on the surface of the diffuser plate. At this time, the basic microstructure of the light diffusion plate exhibits a triangular prism shape (FIG. 2), which sometimes causes a problem in that polarization of incident light is broken.
이러한 문제를 해결하기 위해 포토 폴리머를 사용하여 마스크의 패턴을 바꾸어 줌으로써 원하는 방사각이 나오도록 하는 방법이 간략하게 제안된 바 있다(대한민국 특허공개 제2001-0059869호). 그러나, 이 방법은 포토 마스크의 제작이 용이하지 않고 노광 후, 현상 공정을 진행하고 다시 패턴을 둥글게 만들기 위해 가열 공정이 필요할 뿐 만 아니라, 가열 공정을 통한 패턴을 제어한다는 것이 매우 어려워 광의 조절이 난이하다.In order to solve this problem, a method of using a photopolymer to change the pattern of the mask to obtain a desired emission angle has been briefly proposed (Korean Patent Publication No. 2001-0059869). However, this method is not easy to manufacture a photo mask, and it is difficult to control the pattern through the heating process, as well as the heating process to proceed the development process after exposure and to make the pattern round again. Do.
최근에는 좀 더 정밀한 광의 제어를 위해서 홀로그램을 이용한 다층 확산판을 제조하는 방법이 제안되었다.(대한민국 특허공개 제2002-0054484호 및 제2002-0028131호) 그러나, 상기 방법들은 홀로그램 패턴이 형성된 니켈 스탬프를 이용하여 패턴을 기계적으로 전사하는 방식인데, 스탬프의 마모가 심하고 제작이 난이하다는 단점이 있다.Recently, a method of manufacturing a multilayer diffusion plate using holograms has been proposed for more precise light control. (Korean Patent Laid-Open Publication Nos. 2002-0054484 and 2002-0028131) However, these methods are nickel stamped with a hologram pattern. Using a method to transfer the pattern mechanically, there is a disadvantage that the wear of the stamp is severe and difficult to manufacture.
본 발명은 상기와 같은 종래 기술의 문제점을 고려하여, 광의 각도 및 방향을 정밀하게 제어할 수 있도록 하기 위해 3 차원 스테레오 리소그래피 방법을 이용하여 액정 디스플레이의 셀 내부 또는 외부에 적용될 수 있는 광 확산판 및 그 제조방법을 제공하는 것을 목적으로 한다.Disclosure of Invention The present invention provides a light diffusion plate that can be applied inside or outside a cell of a liquid crystal display by using a three-dimensional stereo lithography method in order to precisely control the angle and direction of light. It aims at providing the manufacturing method.
도 1은 일반적인 광 확산판을 나타낸 것이다.1 shows a general light diffuser plate.
도 2는 종래 기술에 따른 광 확산판의 단면구조를 나타낸 것이다.Figure 2 shows a cross-sectional structure of the light diffusion plate according to the prior art.
도 3은 본 발명에서 사용되는 스테레오리소그래피 장치를 나타낸 것이다.3 shows a stereolithography apparatus used in the present invention.
도 4는 본 발명의 바람직한 실시예에 따라 제조된 광 확산판의 단면을 나타낸 것이다.Figure 4 shows a cross section of the light diffuser plate manufactured according to a preferred embodiment of the present invention.
<도면의 주요 부분에 대한 부호의 설명><Explanation of symbols for the main parts of the drawings>
1 : 기판1: substrate
2 : 광 반응 조성물3 : 입사광2: photoreaction composition 3: incident light
4 : 방사광5 : 레이저4: radiation 5: laser
6 : 다이나믹 미러7 : 감광성 코팅 또는 필름6: dynamic mirror 7: photosensitive coating or film
8 : 스테이지9 : 패턴된 도메인8: Stage 9: Patterned Domain
상기 목적을 달성하기 위하여, 본 발명은 액정디스플레이용 광확산판에 있어서, 스테레오 리소그래피에 의해 굴절율이 다른 마이크로 도메인이 형성된 액정디스플레이용 광확산판을 제공한다.In order to achieve the above object, the present invention provides a light diffusing plate for liquid crystal display, in which the microdomains having different refractive indices are formed by stereo lithography in the light diffusing plate for liquid crystal display.
또한, 본 발명은In addition, the present invention
a) 투명한 유리 또는 플라스틱 기판위에 레이저에 의해 반응하는 감광성층을 형성하는 단계;a) forming a photosensitive layer reacted by a laser on a transparent glass or plastic substrate;
b) 스테레오 리소그래피 기술을 이용하여 상기 감광성층 위에 레이저를 조사하여 원하는 모양의 패턴을 형성하는 단계; 및b) irradiating a laser onto the photosensitive layer using stereolithography to form a pattern of a desired shape; And
c) 상기에서 형성된 패턴을 후처리하여 마이크로 도메인을 형성하는 단계c) post-processing the formed pattern to form a micro domain
를 포함하는 액정 디스플레이용 광 확산판의 제조 방법을 제공한다.It provides a method for producing a light diffusion plate for a liquid crystal display comprising a.
이하에서 본 발명을 상세하게 설명한다.Hereinafter, the present invention will be described in detail.
본 발명은 3 차원 스테레오 리소그래피 방법을 이용하여 종래 방법에 비해간단한 방법으로 액정 디스플레이의 셀 내부 또는 외부에 적용될 수 있는 광 확산판 및 그 제조방법을 제공하는 특징이 있다.The present invention is characterized by providing a light diffusion plate and a method of manufacturing the same, which can be applied to the inside or outside of a cell of a liquid crystal display by a simpler method than the conventional method using a three-dimensional stereo lithography method.
광의 진행에 관한 모듈레이션은 스테레오 리소그래피 기술에 의해 CAD (Computer Aided Design) 데이터에서 추출한 단면 형상에 따라 레이저를 조사하여 감광성 조성물에 광 화학 반응을 일으켜서 굴절율이 다른 패턴을 형성하게 하여 이루어진다.Modulation of light propagation is performed by irradiating a laser according to the cross-sectional shape extracted from CAD (Computer Aided Design) data by stereolithography technology to cause a photochemical reaction on the photosensitive composition to form patterns having different refractive indices.
본 발명의 확산판은 이러한 스테레오 리소그래피 기술을 이용하여 제작되어 정밀한 광의 제어에 필수적인 패턴 형성이 자유롭고, 기존의 복잡한 공정을 거치지 않는다는 장점이 있다.The diffusion plate of the present invention is manufactured using such a stereo lithography technique, and thus, there is an advantage in that pattern formation necessary for precise light control is free and does not go through a conventional complicated process.
또한, 본 발명의 광확산판은 액정의 셀 내부에 코팅을 하는 방식으로 적용하거나, 셀 외부에 필름 형태로 장착하는 것이 모두 용이하다.In addition, the light diffusing plate of the present invention is easy to apply in a coating method to the inside of the cell of the liquid crystal, or to be mounted in the form of a film on the outside of the cell.
이하, 본 발명의 바람직한 일실시예에 따른 광확산판의 제조방법에 대하여 첨부한 도면을 참조하여 설명한다.Hereinafter, a method of manufacturing a light diffusing plate according to an exemplary embodiment of the present invention will be described with reference to the accompanying drawings.
도 3은 본 발명에서 광확산판을 제조하기 위해 사용되는 스테레오 리소그래피 장치를 나타낸 것이다.Figure 3 illustrates a stereo lithographic apparatus used for manufacturing the light diffusing plate in the present invention.
도 3에 도시된 바와 같이, 본 발명에서 사용되는 스테레오 리소그래피 장치는 일반적으로 사용되는 가시광선 영역 또는 자외선 영역의 광 조사가 가능한 레이저를 한 개 이상 사용할 수 있다. 레이저(5)로부터 발생된 광은 다이나믹 미러(6)을 포함하는 광 부품을 통하여 광의 최대 작용 위치를 결정하면서 감광성 조성물 또는 필름(7)에 조사된다. 레이저 빔에 의해 광 화학 반응이 일어난 감광성층은일정 두께 만큼 CAD에 의해 정확히 형상이 전사되어 원하는 패턴을 직접 형성하게 된다. 형성되는 패턴의 크기는 수 마이크론에서 수십 마이크론 범위가 되며 이후의 열처리 또는 후 처리 공정을 거쳐 확산판이 제조된다. 이때, 레이저로 광 반응이 일어난 부분과 열 또는 후처리에 의해 형성된 부분은 상이한 굴절율을 갖게 되고 광의 입사각을 변화시켜 원하는 방사각으로 확산시키게 된다. 이러한 방법으로 제조되는 확산판은 감광성 조성물의 굴절율을 조절함으로써 더욱 정밀하게 방사각을 제어 할 수 있다.As shown in FIG. 3, the stereolithography apparatus used in the present invention may use one or more lasers capable of irradiating light in the visible or ultraviolet region. The light generated from the laser 5 is irradiated to the photosensitive composition or the film 7 while determining the maximum working position of the light through the optical component including the dynamic mirror 6. The photosensitive layer, which has undergone photochemical reaction by the laser beam, is accurately transferred by CAD by a certain thickness to directly form a desired pattern. The size of the pattern to be formed is in the range of several microns to several tens of microns, and the diffusion plate is manufactured through a subsequent heat treatment or post-treatment process. At this time, the portion where the light reaction is generated by the laser and the portion formed by heat or post-treatment have different refractive indices and change the incident angle of the light to diffuse to the desired radiation angle. The diffusion plate produced in this way can control the radiation angle more precisely by adjusting the refractive index of the photosensitive composition.
도 4는 본 발명의 바람직한 일실시예에 따라 제조되는 광 확산판의 단면을 나타낸 것이다. 도 4에서 보는 바와 같이, 본 발명에 따르면 원하는 모양의 패턴 도메인 9가 형성된다.Figure 4 shows a cross section of the light diffuser plate manufactured according to a preferred embodiment of the present invention. As shown in Fig. 4, according to the present invention, a pattern domain 9 of a desired shape is formed.
본 발명은 이러한 광확산판을 제조하기 위해, 투명한 유리 기판 위에 광 모노머를 포함하는 감광성 조성물을 스핀 코터를 이용하여 약 1 내지 20 ㎛의 두께로 도포하여 감광성 층을 형성한다.In order to manufacture such a light diffusion plate, the present invention is applied to a photosensitive composition including a photo monomer on a transparent glass substrate to a thickness of about 1 to 20 μm using a spin coater to form a photosensitive layer.
상기 기판 상에 광화학 반응을 일으키는 감광성층은 감광성 조성물을 일정두께로 스핀코팅하는 방법외에도, 필름형태의 감광성 재료를 점착시켜 형성할 수 있다. 상기 감광성 조성물은 통상적으로 액정디스플레이의 제조에 사용되는 모노머 형태 또는 폴리머 형태를 포함하며, 바람직하게는 굴절율이 1.3 내지 1.9으로 광에 의해 조절이 가능한 감광성 조성물을 사용하는 것이 좋다.The photosensitive layer causing the photochemical reaction on the substrate may be formed by adhering a photosensitive material in the form of a film, in addition to a method of spin coating the photosensitive composition to a predetermined thickness. The photosensitive composition usually includes a monomer form or a polymer form used in the manufacture of a liquid crystal display, and preferably, a photosensitive composition which can be controlled by light with a refractive index of 1.3 to 1.9 is preferable.
상기 감광성 조성물을 스핀 코팅할 때는 낮은 온도에서 전처리하는 것이 바람직하며, 보다 바람직하게는 전처리 온도는 50 내지 150 ℃이다. 또한, 필름으로형성된 감광성 재료를 사용할 때는 점착제 등을 이용하여 필름의 내부에 패턴이 이루어질 수 있는 감광성 폴리머, 또는 광굴절 폴리머 필름을 기판에 부착하여 사용한다.When spin coating the photosensitive composition, it is preferable to pretreat at a low temperature, more preferably the pretreatment temperature is 50 to 150 ℃. In addition, when using a photosensitive material formed of a film, a photosensitive polymer or a photorefractive polymer film that can be patterned inside the film using an adhesive or the like is attached to a substrate.
이후, 감광성 층이 형성된 기판을 50 내지 150 ℃의 온도에서 전 처리한 후, 도 3과 같은 스테레오 리소그래피를 이용하여 CAD 패턴을 전사한다. 레이저 빔의 조사로 인해 감광성 조성물에 광 화학 반응이 일어나고 주변과 광학적으로 상이한 마이크로 도메인이 형성되는 방식으로 패턴이 전사된다. 이때, 레이저 빔의 파장과 에너지 등은 사용되는 감광성 물질의 종류에 따라 결정된다.Thereafter, the substrate on which the photosensitive layer is formed is pretreated at a temperature of 50 to 150 ° C., and then the CAD pattern is transferred using stereo lithography as shown in FIG. 3. Irradiation of the laser beam causes photochemical reactions in the photosensitive composition and the pattern is transferred in such a way that microdomains that are optically different from the surroundings are formed. At this time, the wavelength and energy of the laser beam is determined according to the type of photosensitive material used.
마지막으로, 급격한 광 화학 반응이 일어난 기판을 150 내지 300 ℃의 온도에서 후 처리하여 레이저가 조사된 부분과 조사되지 않은 부분이 서로 상이한 굴절율을 갖는 마이크로 도메인이 최종 형성되도록 한다.Finally, the substrate subjected to the abrupt photochemical reaction is post-treated at a temperature of 150 to 300 ° C. so that the microdomains having the different refractive indices of the portions irradiated with the laser and the irradiated portions are finally formed.
이렇게 형성된 마이크로 도메인의 크기는 1 내지 100 ㎛인 것이 바람직하다. 상기 패턴 도메인의 크기와 방사각의 관계식은 회절 이론에 의해 입사되는 빛의 파장에 관계한다. CAD에 의한 패턴은 홀로그램 패턴을 이용할 수 있다.The size of the micro domain thus formed is preferably 1 to 100 ㎛. The relationship between the size of the pattern domain and the angle of radiation relates to the wavelength of light incident by diffraction theory. The pattern by CAD can use a hologram pattern.
이상에서 본 발명의 바람직한 일 실시예에 대하여 상세하게 설명하였지만 본 발명의 권리범위는 이에 한정되는 것은 아니며, 본 발명의 기본 개념을 이용한 당업자의 여러 변형 및 개량 형태 또한 본 발명의 권리범위에 속하는 것이다.Although one preferred embodiment of the present invention has been described in detail above, the scope of the present invention is not limited thereto, and various modifications and improvements of those skilled in the art using the basic concept of the present invention also belong to the scope of the present invention. .
이상에서 설명한 바와 같이, 본 발명에 따르면 종래의 광 확산판에 비해 공정이 간단하면서도 광을 매우 정밀하게 조절할 수 있고, 적용하고자 하는 액정 디스플레이의 모델에 따라 자유롭게 제어가 가능한 광확산판을 제공할 수 있다.As described above, according to the present invention, it is possible to provide a light diffusing plate which is simpler than the conventional light diffusing plate but can be controlled very precisely and can be freely controlled according to the model of the liquid crystal display to be applied. have.
Claims (7)
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2477828A (en) * | 2010-02-12 | 2011-08-17 | Univ Warwick | Three-Dimensional Optical and Material Structures manufactured using stereolithography |
| KR102119789B1 (en) | 2020-02-03 | 2020-06-05 | 김하무 | manufacturing methods diffuser plate for display by cars |
| ES2853373A1 (en) * | 2020-03-13 | 2021-09-15 | Barcelona Three Dimensional Printers S L | MACHINE FOR ADDITIVE MANUFACTURING AND RELATED ADDITIVE MANUFACTURING METHOD (Machine-translation by Google Translate, not legally binding) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0915404A (en) * | 1995-06-27 | 1997-01-17 | Katsuhiko Seki | Light diffusion filter by screen printing and its production |
| JP2001159703A (en) * | 1999-12-03 | 2001-06-12 | Dainippon Printing Co Ltd | Light diffusion film, surface light source system and liquid crystal display device |
| KR20010059869A (en) * | 1999-12-30 | 2001-07-06 | 구자홍 | method for fabricating optical diffuser |
| KR20020088395A (en) * | 2001-05-18 | 2002-11-27 | 다이니폰 인사츠 가부시키가이샤 | A protective diffusion film and method for manufacturing thereof |
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2002
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Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0915404A (en) * | 1995-06-27 | 1997-01-17 | Katsuhiko Seki | Light diffusion filter by screen printing and its production |
| JP2001159703A (en) * | 1999-12-03 | 2001-06-12 | Dainippon Printing Co Ltd | Light diffusion film, surface light source system and liquid crystal display device |
| KR20010059869A (en) * | 1999-12-30 | 2001-07-06 | 구자홍 | method for fabricating optical diffuser |
| KR20020088395A (en) * | 2001-05-18 | 2002-11-27 | 다이니폰 인사츠 가부시키가이샤 | A protective diffusion film and method for manufacturing thereof |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2477828A (en) * | 2010-02-12 | 2011-08-17 | Univ Warwick | Three-Dimensional Optical and Material Structures manufactured using stereolithography |
| KR102119789B1 (en) | 2020-02-03 | 2020-06-05 | 김하무 | manufacturing methods diffuser plate for display by cars |
| ES2853373A1 (en) * | 2020-03-13 | 2021-09-15 | Barcelona Three Dimensional Printers S L | MACHINE FOR ADDITIVE MANUFACTURING AND RELATED ADDITIVE MANUFACTURING METHOD (Machine-translation by Google Translate, not legally binding) |
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