KR100547251B1 - Antireflection and reflection coating using azobenzene compounds films and preparing method for the same - Google Patents

Abstract

The present invention relates to an anti-reflection film or a reflection film using an azobenzene film, and a method of manufacturing the same. More specifically, a wave having various gradient refractive indices in a single step of irradiating the surface of the film containing the azobenzene compound with light of the absorption region of azobenzene. Forming a fine surface concave-convex structure of a curved shape, and by using the molding method as a mold to transfer the large surface concave-convex structure simply formed into a silicone rubber, ultraviolet polymer material.

According to the present invention, molds are produced by a single exposure process that does not cause problems in high manufacturing cost, low environmental stability, incident angle dependence, and narrow wavelength range, which have been pointed out as disadvantages of conventional multi-stage anti-reflective coatings. It is possible to fabricate, mass production of a film having a microsurface concave-convex structure formed by the molding method, and to form a microsurface concave-convex structure of various shapes by using the superposition principle of the microstructure pattern, so as to optical devices, solar cells and displays It is possible to manufacture an antireflection film or a reflection film provided with an effect that can be easily applied to an antireflection film or an element that requires the reflection film.

Azobenzene, Molding, Silicone Rubber, Exposure, Antireflection Film, Reflective Film

Description

Antireflection and reflection coating using azobenzene compounds films and preparing method for the same}             

Figure 1 is a schematic diagram showing the anti-reflection film effect of the Motsu eye structure, (a) is the gradient refractive index of the two-layer staircase pattern, (b) is the gradient refractive index of the multi-layer staircase pattern, (c) is the gradient refractive index of the Motsu eye structure pattern It is shown.

2 is a schematic diagram of an exemplary optical test apparatus for holographic lithography of a photosensitive material.

3 is an atomic force microscope of an antireflection film prepared by superposing an argon ion laser on an azobenzene film.

Figure 4 is a schematic diagram showing the process of replicating and transferring the fine surface irregularities structure to the silicone rubber with the micro surface irregularities formed on the azobenzene film as a template, (a) is a substrate coated with an azobenzene film, (b) is (a) is an azobenzene template in which the fine surface irregularities are formed by exposure to (a), (c) and (d) is a process of transferring the fine surface irregularities into the silicone rubber with the azobenzene template in (b), and (e) the surface Figure shows the silicone rubber mold with microsurface irregularities transferred to it.

FIG. 5 is a diagram illustrating a process of transferring a microsurface concave-convex structure to an ultraviolet polymer using a microsurface concave-convex structure of a silicone rubber as a template, and depositing a metal material thereon.

Figure 6 shows the microsurface irregularities structure formed on the surface of the azobenzene film by atomic force microscopy (AFM).

FIG. 7 illustrates an atomic force microscope (AFM) photograph of the microsurface irregularities structure formed by transferring the microsurface irregularities structure formed on the surface of the azobenzene film to silicon rubber by a molding method.

8 is a graph showing the results of measuring the light transmission characteristics of the silicon rubber anti-reflection film prepared in Example 1.

9 is a graph showing the results of measuring the light transmission characteristics of the anti-reflection film and the reflective film prepared in Example 2.

10 is a schematic view showing an example in which the antireflection film and the reflection film prepared in Example 2 are applied to an optical device.

11 is a graph showing the results of measuring the performance of the solar cell to which the reflective film prepared in Example 2 is applied.

<Explanation of symbols for the main parts of the drawings>

01: refractive index of substrate medium

02: refractive index corresponding to the two-story staircase pattern

03: refractive index corresponding to one layer of multi-layered pattern

04: refractive index corresponding to two layers of multi-layered pattern

05: refractive index corresponding to three layers of multi-layered pattern

06: refractive index corresponding to 4 layers of multi-layered pattern

07: Gradient Refractive Index in Motsu-I Structure

10: wavelength light source 12: first lens

14 second lens 16 sample

18: mirror 22: substrate

24: fine surface uneven structure 26: silicone rubber

28: UV polymer 30: metal layer

32: azobenzene compound 34: ultraviolet light

36: metal powder used in a process such as sputtering or spin coating

37: Optical element configuration first layer 38: Optical element configuration second layer

39: incident light 40: light passing through the optical element

41: light reflected back into the optical device through the reflective film

The present invention relates to an anti-reflection film or a reflection film using an azobenzene film, and a method of manufacturing the same. More specifically, a wave having various gradient refractive indices in a single step of irradiating the surface of the film containing the azobenzene compound with light of the absorption region of azobenzene. Forming a fine surface concave-convex structure of the shape curved surface, and by using the molding method as a template to transfer the formed micro-surface concave-convex structure simply to the silicone rubber, ultraviolet polymer.

The anti-reflection film manufacturing, which is the most common technique in the art, has used a method of reducing the reflection phenomenon by coating a multi-layered thin film on materials having different refractive indices, but this multi-layer thin film process is not only expensive but can be used only in a narrow wavelength range, Depends. Recently, a technique generally used to manufacture an antireflection film having a wide wavelength range and an angle of incidence independence is manufactured by using a holographic lithography method using a photochemical reaction of a photosensitive material and a reactive ion etching process to produce a stepped antireflection film. The above method is manufactured in a multi-step complex process, and has a disadvantage of having to go through a wet process. In addition to the above-described method, a micro-pattern may be formed on the surface by a laser ablation method. However, since a laser beam with high energy is used, it is difficult to form a microstructure due to temperature diffusion by heat transfer.

The nanopore coating thin film method using powder coating and phase separation of two polymer mixtures, which have been recently studied, is a low cost micropattern method, but cannot be manufactured in a large area. There is a problem with stability.

Therefore, as the most ideal method of manufacturing the anti-reflection film, a micro surface uneven structure having a regular gradient refractive index is fabricated on a single layer film to control the refractive index and to increase the absorption of light at a low cost by using a micro pattern manufacturing technology using a single process. Development of a process for producing an antireflection film is urgently needed.

On the other hand, not only to increase the efficiency of the solar cell, but also to significantly increase the light transmission of the optical device, display, etc., and to minimize the light loss due to the multi-layer structure, the development of anti-reflection film material and manufacturing process is required. In addition, the anti-reflective coating process may not only cause energy waste due to light source loss, but also affect other parts of the equipment used, causing malfunction and damage to the device. It is required.

In a device using light such as a solar cell, the efficiency and performance of the device depend on how efficiently the light incident on the device is used. The light incident on the device is partially consumed and converted into required energy (eg, electricity), and the remaining light is consumed by flowing out of or inside the device. The counter electrode used in the conventional device has a flat surface, and in this structure, the reflective film can be re-reflected to increase the efficiency of the device because there is a limitation in reusing the unused light back into the device and reusing it. Development is required.

In the case of an optical device with a chemical reaction, the efficiency can be increased by increasing the surface area. However, the conventional planar electrode has a limitation in increasing the surface area. There is a need for development of technologies that can facilitate this.

Accordingly, the present inventors have made efforts to solve the above problems, and when the compound containing azobenzene is exposed to the light having the wavelength of the light absorption region of azobenzene, the inclination of the refractive index on the surface of the azobenzene due to the photophysical material movement principle of the azobenzene The microsurface concave-convex structure having a wave phenomenon is generated, and it is found that the same microsurface concave-convex structure can be formed on the surface of the silicon rubber by using it as a mold and transferring the silicon rubber to a large area by a molding method. Was completed.

Therefore, the present invention can produce a mold by a single process of exposure to shorten the manufacturing process, mass production is possible due to the application of the molding method, an element requiring an antireflection film or a reflective film, such as optical devices, solar cells and displays SUMMARY OF THE INVENTION An object of the present invention is to provide an antireflection film or a reflection film including an azobenzene compound which can be easily applied to the same, and a method of manufacturing the same.

The present invention comprises the steps of preparing an azobenzene mold to form a fine surface concavo-convex structure by exposing light to the surface of the azobenzene film; Manufacturing a silicone rubber mold by transferring a fine surface concavo-convex structure to the silicone rubber in a large area by the molding method with the azobenzene mold; And a method of manufacturing an anti-reflective coating comprising the silicone rubber mold and transferring the ultra-surface concavo-convex structure while irradiating an ultraviolet ray-polymerizing material to a large area by molding. .

In another aspect, the present invention includes a method for producing a reflective film comprising the step of depositing a material selected from metals, inorganic materials and polymers on the surface of the ultraviolet polymer material transferred to the microsurface irregularities structure prepared by the above method.

The present invention will be described in detail as follows.

The present invention forms a microsurface concave-convex structure of a wave-shaped curved surface having various gradients of refraction in a single process of irradiating the surface of the azobenzene film with the absorption region of the azobenzene film. Including the step of large-scale transfer of the formed micro-surface irregularities structure to the polymer material as a major technical configuration features, high manufacturing cost, low environmental stability, A large amount of antireflection film or reflective film can be produced by a single exposure process that does not cause a problem in the angle of incidence and a narrow wavelength region, and does not require a post-process step, and has a large surface irregularities structure formed by a molding method. It is possible to produce and use the superposition principle of microstructure pattern Therefore, the microsurface irregularities having various shapes can be formed, thereby providing an effect that can be easily applied to an antireflection film or a device requiring a reflection film such as an optical device, a solar cell, and a display.

The present invention employs a motheye or subwavelength structure as one approach to satisfy the high light transmittance requirement of the antireflection film.

"Motsuai structure" is a coined word created by a naturalist who observed the relationship between nature and the real world in the late 1960s and early 1970s. The eyes of nocturnal insects, such as moths, are irrespective of the angle of incidence and the wavelength of light. It is named after finding that it does not reflect light at all. Observation of the eyes of the moths by electron microscopy showed that the slanted projections were aligned, and the structure had the same refractive index, but the surface topographic effect produced an efficient gradient refractive index. .

The reflection of light indicates the discontinuity of the refractive index between the medium of the air and the medium of the optical substrate having different refractive indices, which is due to the reflection wavelength generated when the surface is irradiated with light. If a two-step staircase pattern is created with subwavelength periods, the structure will behave like a thin film of two layers of the same height, the refractive index of which is represented by the spatial average of the refractive indices of the substrate and the surrounding medium. will be. On this principle, a more complex anti-reflective film made on the same substrate is a thin film stacked in multiple layers, and the refractive index of the structure of each layer corresponding to each step should be lowered upward (Fig. 1). Reference).

On the other hand, the MOS eye structure behaves like a gradient refractive index that is sequentially changed continuously from the surrounding medium to the medium under the substrate. In principle, if light is irradiated to the MOS eye structure without discontinuity of the refractive index, Fresnel Reflex will not occur. In practice, the special period and depth of the surface irregularities, and the grating surface topography, characterize the antireflective effect, thereby determining the minimum and maximum wavelengths for creating the surface irregularities.

Hereinafter, the manufacturing method of the present invention will be described step by step based on the accompanying drawings.

First, a step of manufacturing an azobenzene mold in which a fine surface uneven structure is formed by exposing light to the surface of an azobenzene polymer film.

When the azobenzene material including an organic polymer and a single molecule is exposed to the light of the wavelength of the light absorption region of the azobenzene, a fine surface uneven structure similar to the Motsui structure is formed on the surface. The fine surface asperity structure is a unique characteristic that occurs only in the azobenzene compound, which is related to the optical properties of the azo chromophore. Azo compounds have optical properties due to optical anisotropy due to photoisomerization of azo chromophores by light, and these properties are again affected by the substituents of azo groups and the main chain properties of polymers.

It is generally accepted that the surface uneven structure is formed at a temperature much lower than the glass transition temperature of the polymer and is formed by mass transfer of the polymer chain due to photoisomerization of azo groups bound to the polymer.

As such, it is the academic interest of many researchers how the large movement of the polymer below the glass transition temperature is caused by light, and the study of the mechanism is largely dependent on the gradient force model [Kumar et al] and the volume change. Pressure models [Brrett et al], mean-field models [Pedersen et al], anisotropic diffusion models [Lefin et al], and extended hydrodynamic models [Sumaru et al] have been proposed.

The light beam applied upon exposure to the azobenzene polymer film is a light ray having a wavelength corresponding to the light absorption region of the azobenzene group, and is, for example, a wavelength in the range of 300 to 600 nm. By overlapping the above-mentioned light rays of the wavelength can be formed interference light that periodically changes the intensity of the light due to the reinforcement, destructive interference phenomenon and by irradiating the light to the azobenzene film it can form a regular fine iron structure on the film surface .

Specifically, for example, it may be irradiated with an argon ion laser beam, the optical device that can be used is the same as the optical device of the conventional holographic lithography of the photosensitive material shown in Figure 2, the light source is a conventional The laser beam of 488 nm and 514 nm of the argon ion laser which is an absorption area of an azobenzene group is used for this.

The argon ion laser beam controls polarization through a half wave plate (λ / 2 plate), and in most experiments p-polarized laser light is the p-polarized light because it was the most effective condition for forming surface irregularities. Was used as a light source, and the polarized light was irradiated to the sample in parallel through a spatial filter and a collimating lens. Since the incidence angle of the argon ion laser can be adjusted, the period of the desired pattern can be easily adjusted by Bragg's equation represented by nλ = 2dsinθ, and the depth of the pattern can be adjusted according to the exposure time.

Such a method may be applied by a novel photo-microfabrication method suitable for forming a surface microstructure for an antireflection film having a smaller structure than visible light or an infrared wavelength range required by the antireflection film. An antireflection film prepared by overlaying an argon ion laser on an azobenzene film was shown by atomic force micrograph.

In FIG. 3, (a) shows a linear microsurface irregularities structure, (b) shows a lattice-shaped microsurface irregularities structure, and (c) shows a hexagonal microsurface irregularities structure. In the case of c), it is expected to be similar to the Motsu-I structure, so that the antireflection effect is excellent.

In particular, the above-described method of forming the microsurface uneven structure by exposure is an original processing method that is attempted for the first time in the world. Since the microsurface uneven structure is formed by a single process called light irradiation, the method is a multi-step process in manufacturing an existing antireflection film. Can be improved dramatically, which is most suitable for practical use.

As described above, azobenzene molds having a microsurface concavo-convex structure having an oblique refractive index on the surface of the azobenzene film by exposing light rays to the surface of the azobenzene film can be used as molds for molding themselves, and molding without special surface treatment. It is easy to transfer to silicone rubber in large areas using the technique.

The cycle of the microsurface irregularities of the azobenzene template can be formed by using Bragg's method of superposition of the microstructured pattern to form microsurface irregularities of one-dimensional and two-dimensional structures (lattice, hexagonal).

Secondly, the azobenzene mold is a step of producing a silicone rubber mold by transferring a microsurface irregularities structure to the silicone rubber in a large area by a molding method.

In this step, the microsurface irregularities on the surface of the azobenzene film could be formed by a simple method using the photophysical properties of the azobenzene group.

However, the azobenzene group absorbs some of the light in the visible region, which may cause energy loss of sunlight. Also, when exposed to a temperature above the glass transition temperature of the used polymer, the microsurface irregularities formed on the surface of the azobenzene film are erased. When exposed to a long time, the stability of the antireflection effect is a problem, and in the case of the azobenzene polymer film may be pointed out that the low mechanical strength.

Therefore, in the present invention, in order to minimize light absorption of the material having the microsurface uneven structure and increase the mechanical stability, the azobenzene film having the microsurface uneven structure is formed as a mold, and molding to a material having low light absorption and high mechanical strength. The technique has a feature of technical construction in proposing a groundbreaking method of replicating the microsurface irregularities in a large area by the method. That is, since the azobenzene compound has an azobenzene group which absorbs in the visible light region, it is not suitable as an anti-reflection film in the visible light region, and thus the fine surface irregularities are replicated with a silicone rubber suitable for use in the solar wavelength region. It would be.

The process of duplicating the microsurface concave-convex structure formed on the surface of the azobenzene film into the silicone rubber layer is simply illustrated in FIG. 4. That is, (a) is a step of manufacturing a substrate 22 coated with an azobenzene film 32, (b) is a step of forming a fine surface uneven structure by exposing the interference light of argon ion laser to the azobenzene film, (c) and (d) are the steps of transferring the microsurface irregularities to the silicone rubber. It is shown simply by the silicon rubber layer (e) in which the fine surface concavo-convex structure is formed through the above steps.

Each manufacturing step will be described in detail based on the drawings. As shown in FIG. 3A, first, an azobenzene film 32 is coated on the substrate 22, and the interference light of the argon ion laser is exposed to fine. Forms surface irregularities. The method of duplicating the microsurface irregularities structure by molding using the azobenzene film 24 having the microsurface irregularities structure formed as a mold and coating the silicon rubber layer 26 coated on a separate substrate 22 by way of FIG. e) As shown in the process.

In the present invention, it is more preferable to use a silicone rubber having a transparent liquid property, and specifically, for example, silicone rubber containing polyorganosiloxane such as polydimethylsiloxane, polydiethylsiloxane, etc. as the main constituent may be used. . Since the process of duplicating the fine iron structure on the silicone rubber does not adversely affect the manufacturing environment and the worker, no mask is required directly, and the single iron process can replicate the fine iron structure from the azobenzene film mold. Silicone rubber, which has both hydrophobic and hydrophobic properties, can be reused as an excellent silicone mold, allowing mass replication of the microstructure.

In addition, it is possible to easily change the period of the microsurface concave-convex structure of the azobenzene mold by changing the exposed wavelength (see FIG. 7), and the microsurface concave-convex structure exhibiting the same share change as that of the azobenzene mold also in the silicone rubber to which it is transferred. The anti-reflection film effect of varying the area of the light that is antireflected by the microsurface irregularities of various cycles was confirmed (see FIG. 8). The relationship between the periodicity of the microsurface irregularities and the region of the antireflective light is shown in the paper Thin Solid Films 351 (1999) 73-78.

The silicone rubber mold in which the microsurface irregularities are formed on the surface in the same manner as described above may be used as an antireflection film.

Finally, it is a step of preparing a silicone rubber mold, by transferring the ultra-surface concavo-convex structure while irradiating ultraviolet light to the ultraviolet polymer material in a large area by a molding method to produce an ultraviolet polymer casting.

The above-mentioned ultraviolet polymer material is transparent in the visible region, and has good adhesion to a substrate made of metal, inorganic material, polymer material, etc., and any material having a low physical property during UV photopolymerization can be used. For example, an epoxy photopolymer, a cationic photopolymer, or the like may be used. In an embodiment of the present invention, a mixture of benzophenol is mixed with trimethylol-propane diaryl ether, trimethylol-propane tristyol, and isophorone diisocyanate ester. Although a material having a main component is used, it is not limited thereto. In this way, the microsurface irregularities are largely transferred by the molding method, and the material layer photopolymerized by UV irradiation may be used as an antireflection film.

Thus, the wave-shaped curved surface of the ultraviolet polymerization casting transferred from the silicone rubber mold has a large refractive index with a large antireflection film effect. The UV polymerization casting thus prepared is characterized in that the reflective film is easily formed by the diffraction phenomenon at a wavelength of light shorter than the period of the wave-shaped curved surface.

In addition, a reflective film may be prepared by depositing a material selected from a metal and a polymer on the surface of the ultraviolet polymerization casting having the microsurface irregularities structure transferred as described above.

The metals and polymers used are those used as electrodes. For example, Pt, ITO, which has high electrical conductivity as a metal and can be easily coated with vacuum deposition equipment (sputter, evaporation, e-beam, etc.). , Ag and Al may be used, and as the polymer, it has electrical conductivity and has a property of being easily coated by spin coating or dip coating, polyacetylene, polyaniline, polypyrrole, polypyrrole, poly One selected from among thiophene and poly sulfur nitride may be used.

FIG. 5 shows a molding process for transferring the micro-concave structure to an ultraviolet polymer by using a silicone rubber having a micro-convex structure as a mold [(b), (c)], in order to manufacture a reflective film by diffraction of light The processes ((d) and (e)) of depositing a material selected from metals, inorganic materials and polymers on the surface by sputtering or spin coating (dipping, etc.) are briefly shown.

The microsurface uneven structure manufactured by the above series of steps may be used in various fields as a mold for producing an antireflection film or a reflection film, and as an antireflection film or a reflection film. Application examples of the antireflection film or the reflection film are shown in FIG. 10. This can be applied to an optical device, a solar cell, and a display. As shown in FIG. 10, an antireflection film 28 is formed on a portion incident to the optical device, thereby increasing the amount of light transmitted to increase the efficiency of the optical device. The purpose of the antireflection film to be raised can be sufficiently achieved. As the reflective film, an electrode composed of the metal layer 30 in the optical device can be used as an example. The light 39 incident on the optical device is not exhausted in the optical device, and there is light 40 passing through the optical device. This light is reflected back into the optical device 41 through the reflective film to increase the efficiency of the optical device. I will.

Hereinafter, the present invention will be described in detail with reference to Examples, but the present invention is not limited by the following Examples.

Example 1

Azobenzene material (poly disperse orange 3; poly (disperse orange 3: PDO3)) is coated on a glass substrate to form a film layer, and the exposure angle of 100 mW / cm 2 argon ion laser is differently exposed The microsurface irregularities having different periodic intervals were formed on the azobenzene polymer film, and the results of observing the microsurface irregularities formed according to the periodicity with an atomic force microscope are shown in Fig. 6 [main interval of light; (a) : 300 nm, (b): 400 nm, (c): 500 nm, (d): 600 nm, (e): 700 nm, (f): 1000 nm intervals).

Silicon rubber (SYLGARD 184, main component polydimethylsiloxane, Dow Corning) was coated on a separate glass substrate, and then the microsurface irregularities were transferred using an azobenzene film formed with the microsurface irregularities as a template. Measured by a force microscope it is shown in Figure 7 attached.

When comparing the results shown in FIG. 6 and FIG. 7, it can be seen that the cycles and depths of the microsurface irregularities structure of the mold of the azobenzene film and the surface of the silicone rubber are almost the same. It was confirmed that the fine surface irregularities can be replicated.

The light transmission characteristics of the anti-reflection film prepared as described above were measured by UV-visible spectral method, and the result is shown in FIG. 8, and it is shown that the anti-reflection light zone changes according to the period of the microsurface irregularities. You can check. For example, in the case of the microsurface concave-convex structure having a period of 400 nm, the transmittance of light of about 550 nm or more increases. In addition, the present invention can easily change the period of the microsurface irregularities structure, it was able to confirm the anti-reflection film effect of the microsurface irregularities structure of various periods as shown in FIG.

Example 2

The silicone rubber template prepared in Example 1 was used, and on a separate substrate, an ultraviolet photopolymer (NOA 65, main component: trimethylol-propane diarylether, trimethylol-propane tristyol, isophorone isocyanate ester) After forming a thin film using a spin coater, a compound mixed with a wt% benzophenol photopolymerization initiator, Norland Products Inc., and then contacting the silicon rubber template with a large area in vacuum at a constant pressure to a substrate on which a thin film of ultraviolet photopolymer is formed. After the UV light was irradiated using an ultraviolet lamp to prepare an anti-reflection film.

Platinum was coated on the anti-reflection film prepared by sputtering to prepare a reflection film on which the platinum was deposited on the surface of the UV polymer (see FIG. 5).

The result of measuring the anti-reflection film light transmission characteristics manufactured by such a process is as shown in FIG. 9. The period and the antireflection effect of the microsurface irregularities are similar to those in FIG. 8. The change of the anti-reflective light band was confirmed by the change of the period of the microsurface irregularities structure, and the anti-reflective light band was almost the same. As a result, the anti-reflective coating effect was not changed even when the microsurface irregularities were used as a mold and transferred to the UV photopolymer, thereby confirming the possibility of mass production.

Example 3

An example of manufacturing a reflective film and applying it to the device is as shown in FIGS. 10 and 11. The optical device is a dye-sensitized solar cell, the optical device first layer is composed of TiO ₂ and the dye, the optical device second layer is composed of an electrolyte containing I- / I3- redox media (redox media). It is.

The reflective film prepared according to Example 2 was applied to the fuel-sensitized solar cell, and the performance of the dye-sensitized solar cell thus constructed was confirmed through a current-voltage curve, and the results are shown in FIG. 11.

As shown in FIG. 11, the photocurrent of the dye-sensitized solar cell constituting the reflecting film was higher than that of the dye-sensitized solar cell (dotted line) not forming the reflecting film, which could increase the efficiency of the dye-sensitized solar cell by 130%. In the experiment, only the reflective film 30 was formed without the anti-reflection film 28, and the light transmitted without being consumed by the inside was reflected back through the reflective film to increase the efficiency of the dye-sensitized solar cell. Increasing the surface area caused by the addition of a catalyst to the chemical reaction of the redox media (redox media) also played a role in increasing the efficiency.

As described above, the anti-reflection film and the reflection film using the azobenzene film according to the present invention, compared to the conventional method using a variety of processes, low production cost, high environmental stability, incidence angle independence and problems in a wide wavelength range In addition, molds can be produced by a single exposure process that does not require post-processing steps, such as the development step, which is the removal step of the stray reaction part, and the mass transfer is possible due to the transfer of the representative microsurface irregularities structure by the molding technique. In addition, by using the superposition principle of the pattern of the micro-structure pattern, it is possible to shape the micro-surface irregularities of various shapes to implement a device that requires an anti-reflection film such as optical devices, semiconductor devices, optical communication devices, solar cells and display devices It can be usefully applied to the process.

In particular, the present invention can be used simultaneously as a reflection film using light diffraction as well as an anti-reflection film, and by adding an effect of increasing the surface area of the electrode stacked on the fine surface concavo-convex structure, optical device, semiconductor device, optical communication device, solar It will act as a synergy to increase the light efficiency of optical devices such as batteries and display devices.

Claims (8)

Preparing an azobenzene mold in which a fine surface uneven structure is formed by exposing a light having a wavelength of 300 to 600 nm to the surface of the azobenzene film, Preparing a silicone rubber mold by transferring the microsurface concavo-convex structure to the silicone rubber in a large area by the molding method with the azobenzene mold, and Ultraviolet polymerization comprising the above silicone rubber template, the main component being trimethylol-propane diaryl ether, trimethylol-propane trithiol and isophorone diisocyanate ester in a large area by a molding method, and containing a benzophenol photopolymerization initiator Step of preparing an ultraviolet polymerization casting by transferring the fine surface concavo-convex structure while irradiating the ultraviolet light to the material Method of manufacturing an anti-reflection film comprising a. delete delete delete delete delete Preparing an azobenzene mold in which a surface of the azobenzene polymer film is exposed to light having a wavelength of 300 to 600 nm to form a microsurface irregularities structure; Manufacturing a silicone rubber mold by transferring the microsurface concavo-convex structure to the silicone rubber in a large area by the molding method with the azobenzene mold, Ultraviolet polymerization in which the benzophenol photopolymerization initiator is contained in a mixture containing the silicone rubber template and containing trimethylol-propane diaryl ether, trimethylol-propane trithiol, and isophorone diisocyanate ester as main components by a molding method. Preparing an ultraviolet polymerization casting by transferring a fine surface concavo-convex structure while irradiating the material with ultraviolet rays, and Depositing a material selected from a metal and a polymer on the surface of the UV polymerization casting Method for producing a reflective film comprising a. delete

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