KR20040026358A - Producing method for stamper for light quide panel - Google Patents
Producing method for stamper for light quide panel Download PDFInfo
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- KR20040026358A KR20040026358A KR1020020057797A KR20020057797A KR20040026358A KR 20040026358 A KR20040026358 A KR 20040026358A KR 1020020057797 A KR1020020057797 A KR 1020020057797A KR 20020057797 A KR20020057797 A KR 20020057797A KR 20040026358 A KR20040026358 A KR 20040026358A
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/0001—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems
- G02B6/0011—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings specially adapted for lighting devices or systems the light guides being planar or of plate-like form
- G02B6/0065—Manufacturing aspects; Material aspects
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/346—Working by laser beam, e.g. welding, cutting or boring in combination with welding or cutting covered by groups B23K5/00 - B23K25/00, e.g. in combination with resistance welding
- B23K26/348—Working by laser beam, e.g. welding, cutting or boring in combination with welding or cutting covered by groups B23K5/00 - B23K25/00, e.g. in combination with resistance welding in combination with arc heating, e.g. TIG [tungsten inert gas], MIG [metal inert gas] or plasma welding
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/55—Working by transmitting the laser beam through or within the workpiece for creating voids inside the workpiece, e.g. for forming flow passages or flow patterns
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/57—Working by transmitting the laser beam through or within the workpiece the laser beam entering a face of the workpiece from which it is transmitted through the workpiece material to work on a different workpiece face, e.g. for effecting removal, fusion splicing, modifying or reforming
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133524—Light-guides, e.g. fibre-optic bundles, louvered or jalousie light-guides
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133615—Edge-illuminating devices, i.e. illuminating from the side
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- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- Chemical & Material Sciences (AREA)
- Plasma & Fusion (AREA)
- Nonlinear Science (AREA)
- Mechanical Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- General Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Liquid Crystal (AREA)
- Moulds For Moulding Plastics Or The Like (AREA)
- Planar Illumination Modules (AREA)
Abstract
Description
이 발명은 도광판 제조용 스탬퍼 분야에 관한 것으로서, 좀더 세부적으로 말하자면 레이저를 이용하여 미세패턴을 기록함으로써 제작비용은 낮추면서도 제품의 품질을 고도화 및 정밀화시킬 수 있는, 도광판 제조용 스탬퍼의 제작방법에 관한 것이다.BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to the field of stampers for manufacturing light guide plates, and more particularly, to a method of manufacturing stampers for manufacturing light guide plates, which can improve the quality of products while lowering manufacturing costs by recording fine patterns using lasers.
액정표시소자(LCD, Liquid Crystal Display)는, 조도가 높은 밝은 곳에서는 빛을 차단하는 부분과 투과시키는 부분이 뚜렷이 생기게 됨으로써 문자가 선명하게 보이게 되지만, 조도가 낮은 어두운 곳에서는 문자의 식별이 잘 안되는 특성이 있다. 따라서, 액정표시소자는 외부 광원이 없는 장소에서도 음극선관처럼 화면 표시상태가 시각적으로 분명하게 인식될 수 있도록 시인성을 고려하여 액정 표시소자의 후면에 백라이트 유니트(BLU, Back Light Unit)를 설치하는 구조로 이루어진다.In liquid crystal display (LCD), characters are clearly visible because the light blocking part and the transmitting part are made clear in bright places with high illuminance, but the characters are difficult to distinguish in dark places with low illumination. There is a characteristic. Therefore, the liquid crystal display device has a structure in which a backlight unit (BLU, Back Light Unit) is installed on the rear side of the liquid crystal display device in consideration of visibility so that the screen display state can be visually clearly recognized like a cathode ray tube even in a place without an external light source. Is made of.
도 1은 일반적인 액정표시소자의 분해 구조도로서, 도 1에 도시되어 있는 바와 같이 일반적인 액정표시소자는, 광원으로서 형광램프(190)가 측면에 위치하고 있고, 형광램프(190)에서 발산된 빛을 LCD판넬(180)로 반사시켜주기 위해 도광판(130)으로 입사되며, 도광판(130)의 하단에는 반사시트(120)와 케이스(110)가 형성되며, 반사시트(120)는 손실되는 빛을 반사시켜 주어 광의 손실을 최소화 시켜주며, 도광판(130)의 상단에는 LCD판넬(180)로 입사되는 빛을 확산시켜주는 1차 확산시트(140)가 있고, 확산된 빛을 집광하는 수직 및 수평 프리즘 시트(150, 160)가 있으며, 프리즘 시트(160)의 상단에는 프리즘 시트(160)에서 집광되어 출사된 빛을 소정의 각도로 확산시켜 주는 2차 확산시트(170)가 배치되며, 상기 2차 확산시트(170)의 상단에는 LCD판넬(180)이 형성되는 구조로 이루어진다.FIG. 1 is an exploded structure diagram of a general liquid crystal display device. As shown in FIG. 1, a general liquid crystal display device includes a fluorescent lamp 190 positioned at a side of a light source and displays light emitted from the fluorescent lamp 190. The light is incident on the light guide plate 130 to reflect the light to the panel 180, and a reflective sheet 120 and a case 110 are formed at the lower end of the light guide plate 130, and the reflective sheet 120 reflects the lost light. It minimizes the loss of light, and has a primary diffusion sheet 140 for diffusing light incident on the LCD panel 180 at the top of the light guide plate 130, vertical and horizontal prism sheet for condensing the diffused light ( 150 and 160, and a second diffusion sheet 170 is disposed at an upper end of the prism sheet 160 to diffuse light emitted from the prism sheet 160 at a predetermined angle. The LCD panel 180 is formed on the top of the structure 170 Eojinda.
상기한 바와 같이 액정표시소자에서는 도광판이 매우 중요한 역할을 하게 되는데, 상기한 도광판을 제조하기 위한 방법은 여러 가지 방법이 있다.As described above, the light guide plate plays a very important role in the liquid crystal display device. There are various methods for manufacturing the light guide plate.
인쇄 방식의 경우, 광산란 잉크를 도광판 하부에 스크린 인쇄하여 입사된 빛을 수직산란시켜 출광시키는 방식이다.In the printing method, the light scattering ink is screen-printed on the lower part of the light guide plate to vertically scatter incident light and emit light.
그러나 상기한 인쇄방식은 광효율과 고온, 고습에서 안정성 문제를 가지고 있으며, 또한 도광판을 성형한 후 인쇄 작업을 다시 수행해야 한다는 번거러움이 있어서 생산 효율이 매우 낮다는 문제점이 있다.However, the printing method has a problem of stability at light efficiency, high temperature, and high humidity, and also has a problem in that production efficiency is very low due to the inconvenience of having to perform the printing operation again after molding the light guide plate.
무인쇄 방식의 경우 많은 제조 방법들이 연구 개발되어 있는데, 가장 대표적인 방법으로서는 에칭(Etching) 방식이 있다.In the case of the non-printing method, many manufacturing methods have been researched and developed, and the most representative method is an etching method.
상기한 에칭 방식은 감광수지(Photoresist)를 도포한 후 패턴 필름을 부착, 노광한 후 현상하여 화학적으로 에칭하는 방법이다.The etching method is a method of applying a photoresist, attaching and exposing a pattern film, and then developing and chemically etching the photoresist.
그러나 상기한 에칭 방식은 패턴을 구현하기는 용이하나 동일 패턴 작업시 에칭 농도와 반응시간 제어가 까다로워 재현성에 문제점이 있으며, 또한 패턴면을 원하는 규격으로 형성하는 전사성에 결함이 있는 문제점이 있다.However, the etching method is easy to implement a pattern, but difficult to control the etching concentration and reaction time during the same pattern, there is a problem in the reproducibility, and also there is a problem in the transferability to form the pattern surface to the desired standard.
도광판의 광효율을 개선시킨 대표적인 도광판 제조 방법으로서는, 샌드블라스트(Sand Blast) 방식, 브이-커트(V-Cut) 방식, 스탬퍼(Stamper) 방식 등이 있다.Representative methods for manufacturing a light guide plate having improved light efficiency of the light guide plate include a sand blast method, a V-cut method, a stamper method, and the like.
그러나, 상기한 샌드 블라스트 방식은 사출조건의 변화에 따라 휘도분포가 변하기 쉬운 단점이 있고, 상기한 브이-커트 방식은 광효율이 우수하고 재현성이 뛰어나지만 세척공정과 긴 작업시간을 갖고 있어 양산용으로는 부적합하며, 상기한 스탬퍼 방식의 경우 광효율이 좋고 사출성이 좋지만 패턴의 밀도 조절을 간격변화로 제어하고 있어 부분적인 수정이 어렵고 선형으로 패턴을 성형하므로 패턴의 균일성에 문제를 갖고 있다.However, the sand blast method has a disadvantage in that the brightness distribution is easily changed according to the change of the injection conditions. The V-cut method has excellent light efficiency and excellent reproducibility, but has a washing process and a long working time for mass production. In the case of the stamper method, the light efficiency is good and the injection property is good, but the density control of the pattern is controlled by the change of the interval, so that partial modification is difficult and the pattern is molded in a linear shape, thereby having a problem in pattern uniformity.
상기한 방법중에서 스탬퍼 방식에 사용되는 스탬퍼의 제조방법에 대하여 구체적으로 설명하기로 한다.Among the above methods, a method of manufacturing a stamper used in a stamper method will be described in detail.
종래의 스탬퍼 방식의 도광판 제조 공정은 도 2a 내지 도 2g에 도시되어 있는 바와 같다.The conventional stamper-type light guide plate manufacturing process is as shown in Figures 2a to 2g.
먼저 도 2a에 도시되어 있는 바와 같이 글래스(210)의 위에 감광수지(220)를 도포한 후, 도 2b에 도시되어 있는 바와 같이 패턴이 기록되어 있는 포토마스크(Photo Mask)(230)를 감광수지(220)의 위에 장착한다. 포토마스크(230)를 감광수지(220)의 위에 장착한 후, 도 2c에 도시되어 있는 바와 같이 자외선(240)을 조사하여 패턴을 기록한다. 이어서 도 2d에 도시되어 있는 바와 같이 현상공정을 거치고, 도 2e에 도시되어 있는 바와 같이 대전막(250)을 형성시킨 후, 도 2f에 도시되어 있는 바와 같이 전주 공정을 거쳐 메탈 글래스(260)를 만들고, 도 2g에 도시되어 있는 바와 같이 박리하여 스템퍼(270)를 얻게 된다.First, as shown in FIG. 2A, the photoresist 220 is coated on the glass 210, and then the photomask 230 in which the pattern is recorded is shown in FIG. 2B. (220) is mounted on. After mounting the photomask 230 on the photoresist 220, as shown in Figure 2c is irradiated with ultraviolet light 240 to record the pattern. Subsequently, as shown in FIG. 2D, the developing process is performed. As shown in FIG. 2E, the charging film 250 is formed, and then the metal glass 260 is subjected to the electroplating process as shown in FIG. 2F. Are made and peeled as shown in FIG. 2G to obtain a stamper 270.
그러나 상기한 종래의 스탬퍼 방식의 도광판 제조 공정은, 포토마스크(230)를 제작하기 위하여 별도의 작업을 수행하여야 하는 문제점이 있고, 일반적인 포토마스크(230)의 가격은 수백에서 수천만원 정도로 고가이며, 또한 포토마스크(230)의 위의 패턴 폭과 현상 후의 감광수지(220)의 폭이 일치하지 않아 편차가 발생하는 문제점이 있고, 광식각 기술(Photo lithography)을 이용하여 작업을 수행함으로써 감광수지(220)의 조성이나 감도에 의해 재현성의 쉽게 변한다는 단점이 있다.However, the conventional stamper-type light guide plate manufacturing process has a problem of performing a separate operation in order to manufacture the photomask 230, the price of the general photomask 230 is a high price of several hundred to tens of thousands of won, In addition, there is a problem in that a deviation occurs because the width of the pattern on the photomask 230 and the width of the photoresist 220 after development do not match, and the photoresist (photo lithography) is used to perform the operation. The reproducibility is easily changed by the composition and the sensitivity of the 220.
이 발명의 목적은 이와 같은 종래의 문제점을 해결하기 위한 것으로서, 레이저를 이용하여 미세패턴을 기록함으로써 제작비용은 낮추면서도 제품의 품질을 고도화 및 정밀화시킬 수 있는, 도광판 제조용 스탬퍼의 제작방법을 제공하는 데 있다.SUMMARY OF THE INVENTION An object of the present invention is to solve such a conventional problem, and to provide a manufacturing method of a light guide plate manufacturing stamper which can improve and refine the product quality while lowering the manufacturing cost by recording a fine pattern using a laser. There is.
도 1은 일반적인 액정표시소자의 분해 구조도이다.1 is an exploded structure diagram of a general liquid crystal display device.
도 2a 내지 도 2g는 종래의 도광판 제조용 스탬퍼의 제작방법의 전체 공정도이다.2A to 2G are general process diagrams of a manufacturing method of a stamper for manufacturing a light guide plate according to the related art.
도 3은 이 발명의 일실시예에 따른 도광판 제조용 스탬퍼의 제작방법의 감광수지 도포 공정도이다.Figure 3 is a photosensitive resin coating process of the manufacturing method of the stamper for manufacturing a light guide plate according to an embodiment of the present invention.
도 4는 이 발명의 일실시예에 따른 도광판 제조용 스탬퍼의 제작방법의 미세패턴 기록 공정도이다.4 is a fine pattern recording process diagram of a method of manufacturing a light guide plate manufacturing stamper according to an embodiment of the present invention.
도 5a 내지 도 5f는 이 발명의 일실시예에 따른 도광판 제조용 스탬퍼의 제작방법의 전체 공정도이다.5A to 5F are overall process diagrams of a method of manufacturing a light guide plate manufacturing stamper according to an embodiment of the present invention.
* 도면의 주요 부분에 대한 부호의 설명 *Explanation of symbols on the main parts of the drawings
510 : 글래스 520 : 감광수지510 glass 520 photoresist
530 : 레이저 550 : 스탬퍼530: laser 550: stamper
이하, 이 발명이 속하는 기술분야에서 통상의 지식을 가진 자가 이 발명을 용이하게 실시할 수 있을 정도로 상세히 설명하기 위하여, 이 발명의 가장 바람직한 실시예를 첨부된 도면을 참조로 하여 상세히 설명하기로 한다. 이 발명의 목적, 작용, 효과를 포함하여 기타 다른 목적들, 특징점들, 그리고 동작상의 이점들이 바람직한 실시예의 설명에 의해 보다 명확해질 것이다.DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Hereinafter, the present invention will be described in detail with reference to the accompanying drawings in order to describe in detail enough to enable those skilled in the art to easily carry out the present invention. . Other objects, features, and operational advantages, including the object, operation, and effect of the present invention will become more apparent from the description of the preferred embodiment.
참고로, 여기에서 개시되는 실시예는 여러가지 실시가능한 예중에서 당업자의 이해를 돕기 위하여 가장 바람직한 실시예를 선정하여 제시한 것일 뿐, 이 발명의 기술적 사상이 반드시 이 실시예에만 의해서 한정되거나 제한되는 것은 아니고, 본 발명의 기술적 사상을 벗어나지 않는 범위내에서 다양한 변화와 부가 및 변경이 가능함은 물론, 균등한 타의 실시예가 가능함을 밝혀 둔다.For reference, the embodiments disclosed herein are only presented by selecting the most preferred embodiment in order to help those skilled in the art from the various possible examples, the technical spirit of the present invention is not necessarily limited or limited only by this embodiment Rather, various changes, additions, and changes are possible within the scope without departing from the spirit of the present invention, as well as other equivalent embodiments.
이 발명의 일실시예에 따른 도광판 제조용 스탬퍼의 제작방법의 구성은, 도 3 및 도 4 및 5a 내지 도 5f에 도시되어 있는 바와 같이, 글래스(510)를 턴테이블(310)의 위에 장착한 후 턴테이블(310)과 함께 회전을 시키면서 니들(Niddle) (330)을 이용하여 글래스(510)의 위에 감광수지(520)를 도포하는 단계와, 입력될 패턴의 이미지 파일(450)을 신호제어 컴퓨터(460)를 이용하여 레이저(530)를 온/오프(On/Off)하는 방식으로 제어함으로써 이미지 파일(450)에 있는 이미지 데이터를 감광수지(520)에 기록하는 단계와, 레이저(440)에 의해 노광된 감광수지(520)를 현상공정에 의해 제거하는 단계와, 이온 에칭방식으로 글래스(510)에 패턴을 식각하는 단계와, 세척공정을 수행하여 감광수지(520)를 제거하고 전주공정을 수행하는 단계와, 글래스(510)에서 박리하여 도광판용 스템퍼(550)를 얻는 단계를 포함하여 이루어진다.The configuration of the manufacturing method of a light guide plate manufacturing stamper according to an embodiment of the present invention, as shown in Figs. 3 and 4 and 5a to 5f, the glass 510 is mounted on the turntable 310 and then the turntable Applying the photoresist 520 on the glass 510 using the needle 330 while rotating together with the 310, and a signal control computer 460 for the image file 450 of the pattern to be input. Recording the image data in the image file 450 to the photoresist 520 by controlling the laser 530 in an on / off manner, and exposing by the laser 440. Removing the photosensitive resin 520 by a developing process, etching a pattern on the glass 510 by an ion etching method, and performing a washing process to remove the photosensitive resin 520 and perform a pole casting process. Step, peeling off the glass 510, the light guide plate stamper 550 ) Is obtained.
상기한 구성에 의한, 이 발명의 일실시예에 따른 도광판 제조용 스탬퍼의 제작방법의 과정은 다음과 같다.The process of the manufacturing method of the stamper for manufacturing the light guide plate according to the embodiment of the present invention by the above configuration is as follows.
먼저 도 5a에 도시되어 있는 바와 같이 글래스(510)의 위에 감광수지(520)를 도포한다. 본 발명의 실시예에서는 원판을 글래스(510)로 예시하였으나 반드시 글래스(510)에 국한되지 않으며, 다른 예로서 실리콘이나 금속물질을 사용할 수도 있다.First, as shown in FIG. 5A, the photosensitive resin 520 is coated on the glass 510. In the exemplary embodiment of the present invention, the original plate is illustrated as the glass 510, but is not necessarily limited to the glass 510. As another example, silicon or a metal material may be used.
글래스(510)의 위에 감광수지(520)를 도포하는 방법은, 도 3에 도시되어 있는 바와 같이, 글래스(510)를 턴테이블(310)의 위에 장착한 후 턴테이블(310)과 함께 회전을 시키면서, 니들(Niddle) (330)을 이용하여 글래스(510)의 위에 감광수지(520)를 도포하게 되는데, 이 경우에 턴테이블(310)을 저속회전에서 고속회전을 시키는 방식으로, 감광수지(520)의 균일한 두께 편차를 얻게된다. 이와 같이 얻어진 감광수지(520)의 두께는 300~3000 이상이다. 상기한 감광수지(520)의 두께의 선택은 미세패턴 기록에 이용되는 레이저 파장에 의해 달라지게 되는데, 크립톤 레이저는 413nm의 파장을 갖고 있으며, 이와 같은 크립톤 레이저의 기록에 가장 알맞은 감광수지(520)의 두께는 약 1,000~1,800 이다. 본 발명의 실시예에서는 감광수지(520)의 두께를 1000~1800 으로 예시하고 있으나 반드시 1000~1800 에 국한되는 것이 아니라, 레이저의 강도, 작업거리 등에 의해 수백~수만 까지 사용할 수도 있다.In the method of applying the photoresist 520 on the glass 510, as shown in FIG. 3, the glass 510 is mounted on the turntable 310 and then rotated together with the turntable 310. The photosensitive resin 520 is coated on the glass 510 by using a needle 330. In this case, the turntable 310 is rotated at a high speed from a low speed rotation, so that the photoresist 520 of the photoresist 520 is coated. A uniform thickness deviation is obtained. The thickness of the photosensitive resin 520 obtained in this way is 300-3000 or more. The selection of the thickness of the photoresist 520 is dependent on the laser wavelength used for recording the fine pattern. The krypton laser has a wavelength of 413 nm, and the photoresist 520 is most suitable for the recording of the krypton laser. The thickness of about 1,000 ~ 1,800. In the exemplary embodiment of the present invention, the thickness of the photosensitive resin 520 is exemplified as 1000 to 1800. However, the thickness of the photoresist 520 is not limited to 1000 to 1800, but may be used up to several hundreds to tens of thousands depending on the intensity and working distance of the laser.
다음에, 도 5b에 도시되어 있는 바와 같이 레이저(530)를 이용하여 미세패턴을 기록한다. 이와 같이 레이저(530)를 이용하여 미세패턴을 기록하는 경우에 회전방식을 이용하게 된다.Next, as shown in FIG. 5B, the fine pattern is recorded using the laser 530. As such, when the fine pattern is recorded by using the laser 530, a rotation method is used.
미세패턴의 기록은, 도 4에 도시되어 있는 바와 같이, 입력될 패턴의 이미지 파일(450)을 신호제어 컴퓨터(460)를 이용하여 레이저(530)를 온/오프(On/Off)하는 방식으로 제어함으로써 이루어지게 되는데, 신호제어 컴퓨터(460)는 레이저(530)의 제어를 반복 수행함으로써 이미지 파일(450)에 있는 이미지 데이터를 감광수지(520)에 기록한다.The recording of the fine pattern is performed by turning on / off the laser 530 using the signal control computer 460 with the image file 450 of the pattern to be input as shown in FIG. By controlling, the signal control computer 460 writes the image data in the image file 450 to the photoresist 520 by repeating the control of the laser 530.
이와 같이 레이저(440)에 의해 노광된 감광수지(520)는 현상공정에 의해 제거된다. 현상공정에서는 레이저(440)가 조사된 부분의 감광수지(520)를 제거함으로써 에칭시 에칭효율과 에칭면의 균일도를 얻을 수 있게 하여 준다.Thus, the photosensitive resin 520 exposed by the laser 440 is removed by a developing process. In the developing process, the photoresist 520 of the portion irradiated with the laser 440 is removed to obtain the etching efficiency and the uniformity of the etching surface during etching.
현상공정이 완료된 글래스(510)는, 도 5c에 도시되어 있는 바와 같이, 이온 에칭방식으로 글래스(510)에 가로 5㎛ 세로 5㎛ 깊이 5㎛ 의 패턴을 식각하게 된다.As shown in FIG. 5C, the glass 510 in which the developing process is completed is etched into the glass 510 by a pattern of 5 μm in length and 5 μm in depth by 5 nm in an ion etching method.
식각되어지는 글래스(510)의 면의 균일도와 각의 추이에 따라 도광판용 스탬퍼의 품질이 달라지게 된다. 이 경우에 얻어진 글래스(510)의 면의 균일도는 각 패턴간의 편차는 약 3%이고, 얻을 수 있는 각의 추이는 45 ~135 의 범위를 갖는다.The quality of the light guide plate stamper varies according to the uniformity and angle of the surface of the glass 510 to be etched. The uniformity of the surface of the glass 510 obtained in this case is about 3%, and the difference of the angle which can be obtained has the range of 45-135.
에칭이 완료된 글래스(510)에, 도 5d에 도시되어 있는 바와 같이 세척공정을 수행하여 감광수지(520)를 제거하고, 도 5e에 도시되어 있는 바와 같이 전주공정을 수행한다. 상기한 전주공정은 전주액의 수소이온농도(pH)와 전류밀도 등에 의해 제어된다. 전주공정이 완료된 후, 도 5f에 도시되어 있는 바와 같이 글래스(510)에서 박리하게 되면 도광판용 스템퍼(550)를 얻게 된다.The glass 510 which has been etched is removed by performing a washing process as shown in FIG. 5D to remove the photoresist 520 and performing a pole casting process as shown in FIG. 5E. The above electroforming step is controlled by the hydrogen ion concentration (pH) and current density of the electroforming solution. After the electroplating process is completed, as shown in FIG. 5F, when the glass 510 is peeled off, the stamper 550 for the light guide plate is obtained.
이상의 실시예에서 살펴 본 바와 같이 이 발명은, 레이저를 이용하여 미세패턴을 기록함으로써 제작비용은 낮추면서도 제품의 품질을 고도화 및 정밀화시킬 수 있는 효과를 갖는다.As described in the above embodiments, the present invention has the effect of improving the quality of the product by improving the quality of the product while lowering the manufacturing cost by recording the fine pattern using a laser.
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KR100658369B1 (en) * | 2004-07-19 | 2006-12-15 | 태산엘시디 주식회사 | A stamper/light guide plate manufacturing apparatus by the principle of dot printer |
KR100671804B1 (en) * | 2004-12-14 | 2007-01-19 | 제일모직주식회사 | Light guide munufacturing apparatus |
KR100676073B1 (en) * | 2004-12-07 | 2007-01-30 | 태산엘시디 주식회사 | Producing method for stamper for light guide plate |
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KR950015613A (en) * | 1993-11-26 | 1995-06-17 | 가나이 쓰토무 | Pattern Forming Method and Manufacturing Method of Semiconductor Device Using the Same |
JPH11312463A (en) * | 1998-04-28 | 1999-11-09 | Hitachi Ltd | Wiring board and gas discharge display device using it |
KR100295505B1 (en) * | 1999-06-25 | 2001-07-12 | 김우연 | Light guide panel of flat panel display and method for fabricating the same |
JP2001033634A (en) * | 1999-07-16 | 2001-02-09 | Nippon Columbia Co Ltd | Manufacture of stamper |
JP2003071849A (en) * | 2001-08-30 | 2003-03-12 | Columbia Music Entertainment Inc | Stamper manufacturing method |
KR100465014B1 (en) * | 2002-05-11 | 2005-01-06 | 주식회사 엘에스텍 | Pattern forming apparatus for light guide panel |
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KR100658369B1 (en) * | 2004-07-19 | 2006-12-15 | 태산엘시디 주식회사 | A stamper/light guide plate manufacturing apparatus by the principle of dot printer |
KR100676073B1 (en) * | 2004-12-07 | 2007-01-30 | 태산엘시디 주식회사 | Producing method for stamper for light guide plate |
KR100671804B1 (en) * | 2004-12-14 | 2007-01-19 | 제일모직주식회사 | Light guide munufacturing apparatus |
KR100701522B1 (en) * | 2005-02-24 | 2007-03-29 | 주식회사 그레인 | Light diffusing sheet manufacturing stamp, manufacturing method for the stamp, light diffusing plate and light diffusing sheet made by the method |
CN114063206A (en) * | 2021-10-22 | 2022-02-18 | 昆山锦林光电材料有限公司 | Front light plate with micro dot structure and manufacturing process thereof |
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