KR200315157Y1 - A Mask with purification, sterilizing and self-cleansing action - Google Patents
A Mask with purification, sterilizing and self-cleansing action Download PDFInfo
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- KR200315157Y1 KR200315157Y1 KR20-2003-0004683U KR20030004683U KR200315157Y1 KR 200315157 Y1 KR200315157 Y1 KR 200315157Y1 KR 20030004683 U KR20030004683 U KR 20030004683U KR 200315157 Y1 KR200315157 Y1 KR 200315157Y1
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- mask
- photocatalyst
- purification
- self
- sterilizing
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- 230000001954 sterilising effect Effects 0.000 title abstract description 15
- 238000000746 purification Methods 0.000 title description 8
- 230000009471 action Effects 0.000 title description 2
- 239000011941 photocatalyst Substances 0.000 claims abstract description 31
- 229910052586 apatite Inorganic materials 0.000 claims description 5
- 238000004140 cleaning Methods 0.000 claims description 5
- VSIIXMUUUJUKCM-UHFFFAOYSA-D pentacalcium;fluoride;triphosphate Chemical compound [F-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O VSIIXMUUUJUKCM-UHFFFAOYSA-D 0.000 claims description 5
- 239000011248 coating agent Substances 0.000 claims description 2
- 238000000576 coating method Methods 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 230000000249 desinfective effect Effects 0.000 claims 1
- 241000894006 Bacteria Species 0.000 abstract description 6
- 230000003647 oxidation Effects 0.000 abstract description 5
- 238000007254 oxidation reaction Methods 0.000 abstract description 5
- 239000003344 environmental pollutant Substances 0.000 abstract description 4
- 239000004745 nonwoven fabric Substances 0.000 abstract description 4
- 231100000719 pollutant Toxicity 0.000 abstract description 4
- 239000000835 fiber Substances 0.000 abstract description 3
- 239000000356 contaminant Substances 0.000 description 8
- 238000004659 sterilization and disinfection Methods 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- -1 hydroxide ions Chemical class 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000012855 volatile organic compound Substances 0.000 description 2
- 241000588724 Escherichia coli Species 0.000 description 1
- 241000191967 Staphylococcus aureus Species 0.000 description 1
- 239000006227 byproduct Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000003760 hair shine Effects 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 229940088597 hormone Drugs 0.000 description 1
- 239000005556 hormone Substances 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 229910052588 hydroxylapatite Inorganic materials 0.000 description 1
- 208000015181 infectious disease Diseases 0.000 description 1
- 229910052500 inorganic mineral Inorganic materials 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011707 mineral Substances 0.000 description 1
- 235000019645 odor Nutrition 0.000 description 1
- 244000052769 pathogen Species 0.000 description 1
- XYJRXVWERLGGKC-UHFFFAOYSA-D pentacalcium;hydroxide;triphosphate Chemical compound [OH-].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[Ca+2].[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O.[O-]P([O-])([O-])=O XYJRXVWERLGGKC-UHFFFAOYSA-D 0.000 description 1
- 230000001699 photocatalysis Effects 0.000 description 1
- 238000013032 photocatalytic reaction Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 208000023504 respiratory system disease Diseases 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000013076 target substance Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- A—HUMAN NECESSITIES
- A62—LIFE-SAVING; FIRE-FIGHTING
- A62B—DEVICES, APPARATUS OR METHODS FOR LIFE-SAVING
- A62B18/00—Breathing masks or helmets, e.g. affording protection against chemical agents or for use at high altitudes or incorporating a pump or compressor for reducing the inhalation effort
- A62B18/02—Masks
- A62B18/025—Halfmasks
-
- A—HUMAN NECESSITIES
- A41—WEARING APPAREL
- A41D—OUTERWEAR; PROTECTIVE GARMENTS; ACCESSORIES
- A41D13/00—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches
- A41D13/05—Professional, industrial or sporting protective garments, e.g. surgeons' gowns or garments protecting against blows or punches protecting only a particular body part
- A41D13/11—Protective face masks, e.g. for surgical use, or for use in foul atmospheres
- A41D13/1192—Protective face masks, e.g. for surgical use, or for use in foul atmospheres with antimicrobial agent
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J35/00—Catalysts, in general, characterised by their form or physical properties
- B01J35/30—Catalysts, in general, characterised by their form or physical properties characterised by their physical properties
- B01J35/39—Photocatalytic properties
Landscapes
- Health & Medical Sciences (AREA)
- Chemical & Material Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Business, Economics & Management (AREA)
- Life Sciences & Earth Sciences (AREA)
- Zoology (AREA)
- Pulmonology (AREA)
- Textile Engineering (AREA)
- Emergency Management (AREA)
- Physical Education & Sports Medicine (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Respiratory Apparatuses And Protective Means (AREA)
- Catalysts (AREA)
Abstract
본 고안은 정화기능 및 살균기능을 갖춘 마스크에 관한 것으로, 일반 부직포 마스크의 외부 표면에 광촉매(Photo catalyst) 코팅 섬유를 입힌 것인바, 광촉매의 강력한 산화력에 의해 외부의 오염물질 및 기타 부유 세균을 깨끗하게 정화하도록 하여 마스크 착용자는 정화된 깨끗한 공기로 호흡할 수 있도록 하는 정화 및 살균기능을 갖는 마스크를 제공하려는 것이다.The present invention relates to a mask having a purifying function and a sterilizing function. The photocatalyst coated fiber is coated on the outer surface of a general nonwoven fabric mask to clean external pollutants and other suspended bacteria by the strong oxidation power of the photocatalyst. It is intended to provide a mask having a cleansing and sterilizing function that allows the mask wearer to breathe with clean clean air.
Description
본 고안은 정화기능 및 살균기능을 갖춘 마스크에 관한 것이다.The present invention relates to a mask having a purifying function and a sterilizing function.
보다 상세하게는 일반 부직포 마스크의 외부 표면에 광촉매(Photo catalyst) 코팅 섬유를 입혀서 광촉매의 강력한 산화력에 의해 외부의 오염물질 및 기타 부유 세균을 깨끗하게 정화하도록 하여 마스크 착용자는 정화된 깨끗한 공기로 호흡할 수 있도록 하는 정화 및 살균기능을 갖는 마스크를 제공하려는 것이다.More specifically, the photocatalyst coated fiber is coated on the outer surface of the general nonwoven fabric mask to clean the external pollutants and other suspended bacteria by the strong oxidizing power of the photocatalyst, so that the mask wearer can breathe with clean air. It is to provide a mask having a cleansing and sterilizing function.
종래의 마스크는 일종의 부직포로써 30마이크론 대의 커다란 먼지와 외부의 차가운 공기를 따뜻하게 바꾸어 주는 일종의 방한대 역할을 하였다.Conventional masks are a kind of non-woven fabric that acts as a cold protection zone that warms large dust of 30 microns and cold air outside.
즉, 현재 상용으로 판매되는 마스크는 가스 상의 물질과 냄새물질을 제거 할 수 없으며, 0.3마이크론 대의 미세한 먼지를 제거 할 수 없는 문제점이 지적되었다.In other words, the current commercially available masks can not remove the gaseous substances and odorous substances, it was pointed out that the problem that can not remove the fine dust of 0.3 microns.
또한 사람의 날숨에는 수분이 포한 되어 있어서 이 수분으로 말미암아 마스크 표면에 세균이 번식하고, 이로서 철저한 위생관리를 요구하며, 위생관리가 부실할 때에는 제2의 감염을 야기 시켜 건강에 치명적으로 작용할 수 있는 문제점이 지적되었다.In addition, the exhalation of a person contains moisture, which causes bacteria to multiply on the surface of the mask, which requires thorough hygiene control, and when hygiene management is inadequate, can cause a second infection and cause fatal effects on health. The problem was pointed out.
따라서 종래의 마스크는 방한대의 개념만 있을 뿐이었고, 위생관리를 위하여 자주 세탁해야 하는 번거로움이 있는 것이다Therefore, the conventional mask only had the concept of cold protection, and is a hassle that should be frequently washed for hygiene management
본 고안은 상기와 같은 문제점을 해소할 수 있도록 하는 정화, 살균 및 자정 기능을 갖는 마스크를 제공하려는 것이다.The present invention is to provide a mask having a purification, sterilization and self-cleaning function that can solve the above problems.
본 고안은 일반 부직포 마스크의 외부 표면에 광촉매(Photo catalyst) 코팅 섬유를 입혀서 광촉매의 강력한 산화력에 의해 외부의 오염물질 및 기타 부유 세균을 깨끗하게 정화하도록 하여 마스크 착용자는 정화된 깨끗한 공기로 호흡할 수 있도록 하는 정화 및 살균기능을 갖는 마스크를 제공하는데 목적이 있다.The present invention is to apply photocatalyst coated fiber on the outer surface of the general nonwoven fabric mask to clean the external pollutants and other suspended bacteria by the strong oxidation power of the photocatalyst so that the mask wearer can breathe with the clean air It is an object to provide a mask having a purification and sterilization function.
도 1은 본 고안에 따른 정화 및 살균기능을 갖는 마스크를 보인 예시도.1 is an exemplary view showing a mask having a purification and sterilization function according to the present invention.
도 2는 본 고안에 따른 정화 및 살균기능을 갖는 마스크에서2 is in the mask having a purification and sterilization function according to the present invention
광촉매의 반응 기구의 원리를 도식적으로 보인 예시도.Exemplary diagram schematically showing the principle of the reaction mechanism of the photocatalyst.
도 3 및 도 4는 본 고안에 따른 정화 및 살균기능을 갖는 마스크에서3 and 4 is a mask having a purification and sterilization function according to the present invention
광촉매의 표면에서 오염물질이 제거되는 원리와 광촉매의 표면에서The principle of removing contaminants from the surface of the photocatalyst and from the surface of the photocatalyst
오염물질이 제거되는 원리를 보인 예시도.An illustration showing the principle of removing contaminants.
본 고안의 상기목적들과 특징은 첨부도면에 의거한 다음의 상세한 설명에 의하여 더욱 명확하게 이해할 수 있을 것이다.The above objects and features of the present invention will be more clearly understood by the following detailed description based on the accompanying drawings.
첨부도면 도 1은 본 고안에 따른 정화 및 살균기능을 갖는 마스크를 보인 예시도이고, 도 2는 본 고안에 따른 정화 및 살균기능을 갖는 마스크에서 광촉매의 반응 기구의 원리를 도식적으로 보인 예시도이며, 도 3 및 도 4는 본 고안에 따른 정화 및 살균기능을 갖는 마스크에서 광촉매의 표면에서 오염물질이 제거되는 원리와 광촉매의 표면에서 오염물질이 제거되는 원리를 보인 예시도이다.1 is an exemplary view showing a mask having a purifying and sterilizing function according to the present invention, Figure 2 is a diagram showing a principle of the reaction mechanism of the photocatalyst in a mask having a purifying and sterilizing function according to the present invention. 3 and 4 are exemplary views showing the principle of removing contaminants from the surface of the photocatalyst and the principle of removing contaminants from the surface of the photocatalyst in a mask having a purification and sterilization function according to the present invention.
본 고안에 따른 마스크는 첨부도면 도 1에 도시한 바와 같이 통상의 부직포 마스크의 외부표면에 섬유상의 코팅 광촉매(Photo catalyst)를 입혀서 구성한 것으로, 마스크의 외부 표면에 광촉매 층을 형성 시킨 것이다.The mask according to the present invention is constructed by applying a fibrous coating photocatalyst on the outer surface of a conventional nonwoven mask as shown in FIG. 1, and forming a photocatalyst layer on the outer surface of the mask.
통상의 광촉매는 빛 이 있어야 그 반응을 하는 것으로 가장 보편적인 광촉매는 산화티탄(TiO2)광촉매이다. 상기 산화티탄은 빛이 없으면 광촉매는 그 역할을 할 수가 없지만, 본 고안에 따른 마스크에 입혀진 광촉매는 광촉매기능을 고도화한 인회석(燐灰石, Apatite)광촉매를 이용한 것이다.Conventional photocatalysts require light to react and the most common photocatalysts are titanium oxide (TiO2) photocatalysts. The titanium oxide can not play a photocatalyst without light, but the photocatalyst coated on the mask according to the present invention uses an apatite photocatalyst that has advanced photocatalytic function.
상기 인회석광촉매는 M10(ZO4)6X2의 조성을 가진 광물군의 총칭이고, 인공적으로 합성된 수산기 인회석(hydroxy apatite)은 생체 친화성이 극히 좋고 빛이 없어도 작용하는 것이 특징이다.The apatite photocatalyst is a generic term for a mineral group having a composition of M10 (ZO4) 6X2, and the artificially synthesized hydroxyl apatite is extremely biocompatible and works without light.
상기 광촉매는 빛을 에너지원으로 반응을 일으켜 활성산소와 활성수산기를 생성시키는 물질을 말하는 것으로, 반도체는 일정한 영역의 에너지가 가해지면 전자가 가전자대(Valence Band)에서 전도대(Conduction Band)로 여기 된다.The photocatalyst refers to a material that reacts light as an energy source to generate free radicals and active hydroxyl groups. In a semiconductor, electrons are excited from a valence band to a conduction band when energy of a predetermined region is applied. .
즉 전도대(Conduction Band)에는 전자(e-)들이 형성되고, 가전자대(Valence Band)에는 정공(h+)이 형성되며, 이렇게 형성된 전자와 정공은 각각 산화와 환원에 참여하게 된다.That is, electrons (e-) are formed in the conduction band, holes (h +) are formed in the valence band, and the electrons and holes thus formed participate in oxidation and reduction, respectively.
또한 첨부도면 도 2에 도시한 바와 같이 광촉매 반응할 때에 생성되는 정공(h+)은 공기 중에 있는 수산화 이온(OH-)으로부터 전자를 빼앗는데, 이때 전자를 놓친 수산화 이온(OH-)은 매우 불안정한 상태의 OH 라디칼(OH)이 된다.In addition, as illustrated in FIG. 2, holes (h +) generated during photocatalytic reactions deprive electrons from hydroxide ions (OH-) in the air, and the hydroxide ions (OH-) missed electrons are very unstable. Becomes the OH radical (OH).
또한 첨부도면 도 3에 도시한 바와 같이 상기 OH 라디칼(OH)은 높은 산화, 환원 전위를 가지고 있기 때문에 NOx, Sox, 휘발성 유기화합물(VOCs) 및 악취, 난분해성 오염물질, 환경호르몬 등을 완벽제거 할 수 있을 뿐만 아니라, 병원성 대장균, 황색포도상 구균, O-157 등 각종 병원균과 박테리아를 99.9%살균하는 등 모든 대상물질을 산화시키는 능력을 갖고 있다.In addition, as shown in FIG. 3, since the OH radical (OH) has a high oxidation and reduction potential, NOx, Sox, volatile organic compounds (VOCs) and odors, hardly decomposable pollutants, and environmental hormones are completely removed. In addition, it has the ability to oxidize all target substances, including 99.9% sterilization of various pathogens and bacteria such as Escherichia coli, Staphylococcus aureus and O-157.
또한 도 4에 도시한 바와 같이 빛(형광등빛 또는 태양광)이 조사되면 광촉매 표면에 친수기(-OH)가 생성 되어 표면은 오염물질의 부착을 방지하는 내 오염성을 갖게 되며, 부착된 오염물질은 물에 의해 쉽게 세척되는 자정성(Self-cleaning)을 갖는다.In addition, as shown in FIG. 4, when light (fluorescent light or solar light) is irradiated, hydrophilic groups (-OH) are generated on the surface of the photocatalyst, and the surface has contamination resistance to prevent adhesion of contaminants. Self-cleaning which is easily washed by water.
그러므로 영속적으로 재생이 가능하며 반응 후 부산물은 CO2로 환경에 무해하며 표면에서 생성된 OH 라디칼(OH)은 진행거리가 50마이크론 으로써 인체에는 전혀 해가 없는 것이다.Therefore, it can be permanently regenerated, and the by-products after the reaction are harmless to the environment with CO 2 .
또한 오염원을 흡착한 것은 일상생활 보통의 조건에서는 인회석으로부터 절대로 떨어지지 않고, 이후 빛을 조사하면 흡착된 오염원은 위의 광촉매와 같이 산화과정을 거쳐 완전히 산화되어 분리된다.In addition, the adsorbed contaminants never fall away from apatite under normal conditions of daily life, and when irradiated with light, the adsorbed contaminants are completely oxidized and separated through an oxidation process as in the photocatalyst.
본 고안에서는 구체적인 실시예에 대하여 설명했지만 본 고안의 기술사상범위 내에서 다양한 변형 및 수정이 가능함을 당업자에게 있어서 명백한 것이며, 이러한 변형 및 수정이 첨부된 실용신안등록청구범위에 속함은 당연한 것이다.Although the present invention has been described with respect to specific embodiments, it will be apparent to those skilled in the art that various changes and modifications can be made within the technical spirit of the present invention, and such modifications and modifications belong to the appended utility model registration claims.
본 고안에 따른 마스크는 광촉매 층을 마스크 외표면에 형성함으로서, 광촉매의 강력한 산화력에 의해 외부의 오염물질 및 기타 부유 세균을 깨끗하게 정화 및 살균을 하여 마스크 착용자는 항상 정화된 깨끗한 공기로 호흡할 수 있는 것이다.The mask according to the present invention forms a photocatalyst layer on the outer surface of the mask to clean and sterilize external contaminants and other suspended bacteria by the strong oxidizing power of the photocatalyst, so that the mask wearer can always breathe with clean air. will be.
또한 공장 내 또는 지하 환경에서도 인공조명 또는 자연광이 비춰지는 곳에서는 언제나 정화, 살균 및 자정작용이 일어나므로 보다 쾌적한 환경에서 근무할 수 있는 것이다.In addition, in the factory or underground environment, where artificial lighting or natural light shines, purification, sterilization, and self-cleaning always occur, so that the user can work in a more comfortable environment.
또한 광촉매에 의해 자정작용이 일어나므로 보다 위생적으로 마스크를 관리할 수 있는 것이고, 아울러 호흡기 질환을 현저하게 줄일 수 있는 것이다.In addition, since the self-cleaning action is caused by the photocatalyst, the mask can be more hygienically managed, and the respiratory disease can be significantly reduced.
Claims (2)
Priority Applications (1)
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KR20-2003-0004683U KR200315157Y1 (en) | 2003-02-18 | 2003-02-18 | A Mask with purification, sterilizing and self-cleansing action |
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KR20-2003-0004683U KR200315157Y1 (en) | 2003-02-18 | 2003-02-18 | A Mask with purification, sterilizing and self-cleansing action |
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KR1020030010037A Division KR20040074413A (en) | 2003-02-18 | 2003-02-18 | A Mask with purification, sterilizing and self-cleansing action |
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KR200315157Y1 true KR200315157Y1 (en) | 2003-06-09 |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160004782A (en) | 2014-07-04 | 2016-01-13 | 한국건설 주식회사 | Sheath with antifungal coating film for dealing with a viral acute infectious disease and manufacturing method of skin material with with antifungal coating film and manufacturing method of sheath with antifungal coating film for dealing with a viral acute infectious disease |
KR20200057509A (en) | 2018-11-16 | 2020-05-26 | (주)시쉴드코리아 | Method for manufacturing a shell material having an antibacterial coating film |
CN112153913A (en) * | 2017-08-03 | 2020-12-29 | 宝帝亚科技股份有限公司 | Gauze mask |
-
2003
- 2003-02-18 KR KR20-2003-0004683U patent/KR200315157Y1/en not_active IP Right Cessation
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20160004782A (en) | 2014-07-04 | 2016-01-13 | 한국건설 주식회사 | Sheath with antifungal coating film for dealing with a viral acute infectious disease and manufacturing method of skin material with with antifungal coating film and manufacturing method of sheath with antifungal coating film for dealing with a viral acute infectious disease |
CN112153913A (en) * | 2017-08-03 | 2020-12-29 | 宝帝亚科技股份有限公司 | Gauze mask |
EP3831232A4 (en) * | 2017-08-03 | 2021-09-15 | Protecart Co., Ltd. | Mask |
CN112153913B (en) * | 2017-08-03 | 2022-07-19 | 宝帝亚科技股份有限公司 | Gauze mask |
KR20200057509A (en) | 2018-11-16 | 2020-05-26 | (주)시쉴드코리아 | Method for manufacturing a shell material having an antibacterial coating film |
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