KR20030020348A - Saturated polyester with excellent crystalization property for molding - Google Patents

Saturated polyester with excellent crystalization property for molding Download PDF

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KR20030020348A
KR20030020348A KR1020030007973A KR20030007973A KR20030020348A KR 20030020348 A KR20030020348 A KR 20030020348A KR 1020030007973 A KR1020030007973 A KR 1020030007973A KR 20030007973 A KR20030007973 A KR 20030007973A KR 20030020348 A KR20030020348 A KR 20030020348A
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saturated polyester
weight
molding
range
chip
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KR1020030007973A
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Korean (ko)
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KR100392101B1 (en
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김순식
조덕재
이진우
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주식회사 새 한
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    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47FSPECIAL FURNITURE, FITTINGS, OR ACCESSORIES FOR SHOPS, STOREHOUSES, BARS, RESTAURANTS OR THE LIKE; PAYING COUNTERS
    • A47F3/00Show cases or show cabinets
    • A47F3/08Show cases or show cabinets with arrangements for continuously or intermittently moving the merchandise
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47FSPECIAL FURNITURE, FITTINGS, OR ACCESSORIES FOR SHOPS, STOREHOUSES, BARS, RESTAURANTS OR THE LIKE; PAYING COUNTERS
    • A47F3/00Show cases or show cabinets
    • A47F3/12Clamps or other devices for supporting, fastening, or connecting glass plates, panels or the like
    • A47F3/125Doors for show cases
    • AHUMAN NECESSITIES
    • A47FURNITURE; DOMESTIC ARTICLES OR APPLIANCES; COFFEE MILLS; SPICE MILLS; SUCTION CLEANERS IN GENERAL
    • A47FSPECIAL FURNITURE, FITTINGS, OR ACCESSORIES FOR SHOPS, STOREHOUSES, BARS, RESTAURANTS OR THE LIKE; PAYING COUNTERS
    • A47F7/00Show stands, hangers, or shelves, adapted for particular articles or materials
    • A47F7/0071Show stands, hangers, or shelves, adapted for particular articles or materials for perishable goods

Abstract

PURPOSE: Provided is a saturated polyester resin excellent in crystallinity, which has improved productivity and mechanical properties such as tensile strength and flexural strength and can be used for forming. CONSTITUTION: The saturated polyester is produced by an interesterification or an esterification, a polycondensation, and a solid state polymerization using an aromatic dicarboxylic acid and a diol, wherein 5ppm-30wt%(based on the last saturated polyester) of inorganic particles are added to the process for producing the saturated polyester. The saturated polyester has a thermal cooling crystallization temperature(Tcc) of 185-245deg.C and a thermal heating crystallization temperature(Thc) of 90-150deg.C. The inorganic particle is one or at least two selected from silica, calcium carbonate, aluminum, alumina, china clay, and titanium oxide and has an average particle size of 3-100nm.

Description

결정성이 우수한 성형용 포화 폴리에스테르 수지 {SATURATED POLYESTER WITH EXCELLENT CRYSTALIZATION PROPERTY FOR MOLDING}Saturated polyester resin for molding with excellent crystallinity {SATURATED POLYESTER WITH EXCELLENT CRYSTALIZATION PROPERTY FOR MOLDING}

본 발명은 강도, 내마모성, 내열성 등이 뛰어나 기계용품, 전기전자용품, 항공기 구조재, 가정용품, 일반잡화 등 각종 성형품에 사용되고 있는 포화 폴리에스테르에 관한 것으로서, 특히 폴리에스테르 폴리머내에 나노 크기의 입자를 존재시켜 결정화온도 범위를 확장시키고 결정화속도를 빠르게 하여 성형 공정성의 향상, 기계적 물성의 향상 등의 장점을 얻는 방법에 관한 것이다.The present invention relates to saturated polyesters having excellent strength, abrasion resistance, heat resistance, and the like, which are used in various molded articles such as machinery, electrical and electronic products, aircraft structural materials, household products, general goods, and the like, and particularly, nano-sized particles are present in the polyester polymer. By extending the crystallization temperature range and increasing the crystallization rate to improve the molding processability, mechanical properties, and the like.

포화 폴리에스테르는 폴리에틸렌테레프탈레이트(PET), 폴리부틸렌테레프탈레이트(PBT),폴리트리메틸렌테레프탈레이트(PTT)등과 같이 주쇄에 에스테르 결합을 갖는 직쇄상의 열가소성 폴리머로서, 치수 안정성, 내후성, 표면 평활성 등이 우수하고 투명하며, 광택이 있는 외관을 지녀 엔지니어링플라스틱,합성섬유, 필름, 용기, 하우징류 등의 성형품으로 널리 사용되고 있다.Saturated polyester is a linear thermoplastic polymer having an ester bond in the main chain, such as polyethylene terephthalate (PET), polybutylene terephthalate (PBT), polytrimethylene terephthalate (PTT), etc., and has dimensional stability, weather resistance, and surface smoothness. It is widely used for molded products such as engineering plastics, synthetic fibers, films, containers, and housings because of its excellent appearance, transparency, and glossy appearance.

그러나, 이러한 포화 폴리에스테르는 높은 융점과 좁은 결정화 온도 범위 및 느린 결정화 속도를 지니고 있으며, 특히 폴리에틸렌테레프탈레이트(PET)는 폴리부틸테레프탈레이트(PBT)보다도 이러한 성질이 강해 성형 가공상의 어려움과 물성 편차의 증대 등으로 인해 사용상에 많은 문제점을 지니고 있다.However, these saturated polyesters have a high melting point, a narrow crystallization temperature range and a slow crystallization rate. In particular, polyethylene terephthalate (PET) is stronger than polybutyl terephthalate (PBT), and thus has difficulty in molding and physical property variation. There are many problems in use due to the increase.

일반적으로 합성수지의 결정화 속도를 향상시켜 기계적 물성을 향상시키는 방법으로는 기본 수지를 합성한 후 이를 용융 압출시 또는 사출시에 결정화 온도범위와 속도를 향상시키는 핵제를 첨가하는 방법을 주로 사용한다. 예를들어 미국특허 USP 6,319,576호 등에서는 용융압출시 핵제인 유기물을 사용하여 결정화 속도를 빠르게 하는 방법이 제안되어 있으나, 이 경우에는 다른 유기물이 혼합되기 때문에 수지의 고유특성이 나빠질 수 있는 단점이 있다.또한 미국특허 USP 5,730,913호 등에서는 사출성형시 온도제어를 통해서 결정화도를 높이는 방법이 제안되어 있는데, 이 경우에는 수지의 기본 물성은 비교적 양호하나 생산성이 떨어지고 품질편차가 커지는 단점을 갖고 있다.In general, the method of improving the crystallization rate of the synthetic resin to improve the mechanical properties is mainly used to synthesize the base resin and then add a nucleating agent to improve the crystallization temperature range and speed during melt extrusion or injection. For example, U.S. Pat.No. 6,319,576 proposes a method of increasing the crystallization rate by using an organic material, which is a nucleating agent during melt extrusion, but in this case, there is a disadvantage that the intrinsic properties of the resin may worsen because other organic materials are mixed. In addition, US Pat. No. 5,730,913 proposes a method of increasing the degree of crystallinity through temperature control during injection molding. In this case, the basic physical properties of the resin are relatively good, but the productivity is low and the quality deviation is large.

본 발명의 목적은 나노 크기의 무기입자를 포화 폴리에스테르 수지 합성시에 첨가하여 폴리머내에 존재시키므로서 결정화온도 범위를 넓히고 결정화속도를 증대시켜 성형시 생산성 향상과 물성의 향상을 도모하기 위한 새로운 방법을 제공하는데 있다.An object of the present invention is to add a nano-sized inorganic particles in the synthesis of saturated polyester resins to present in the polymer, thereby widening the crystallization temperature range and increasing the rate of crystallization, thereby improving productivity and physical properties in molding. To provide.

본 발명은 에스테르 교환반응 (또는 에스테르화 반응) 및 축중합반응 및 고상중합에 의해 포화 폴리에스테르 제조시, 임의의 단계에서 나노 크기의 입자를 5ppm∼30 중량% 범위로 첨가하여 반응시키는 것을 특징으로 하는 포화 폴리에스테르 제조방법 및 이에 의해 얻어진 포화 폴리에스테르에 관한 것으로서, 이하에서 본 발명을 구체적으로 설명한다.The present invention is characterized in that in the production of saturated polyesters by transesterification (or esterification), condensation polymerization and solid phase polymerization, nano sized particles are added at an arbitrary step in the range of 5 ppm to 30% by weight to react. The present invention relates to a saturated polyester production method and a saturated polyester obtained thereby, specifically below.

본 발명에서 포화 폴리에스테르는 방향족디카르본산 또는 에스테르 형성 유도체와 에틸렌글리콜 또는 부탄디올 등 디올 성분을 주요 출발원료로 하여 만들어지지만, 또 다른 제 3의 성분을 포함할 수 있다. 이때 방향족 디카르본산 성분으로는 이소프탈산, 테레프탈산, 2,6-나프탈렌디카르본산, 프탈산, 아디프산, 세바신산 등에서 선택된 1종 또는 2종 이상의 혼합물이 사용될 수 있고, 글리콜 성분으로는 주요성분인 에텔렌글리콜, 프로필렌글리콜, 부탄디올, 1,4-사이클로헥산디메탄올, 네오펜틸글리콜 등이 사용될 수 있다. 이와 같이 얻어지는 포화 폴리에스테르로는 폴리에틸렌테레프탈레이트, 폴리부틸렌테레프탈레이트, 폴리트리메틸렌테레프탈레이트 등이 있다.In the present invention, the saturated polyester is made of an aromatic dicarboxylic acid or ester forming derivative and a diol component such as ethylene glycol or butanediol as a main starting material, but may include another third component. At this time, one or two or more kinds selected from isophthalic acid, terephthalic acid, 2,6-naphthalenedicarboxylic acid, phthalic acid, adipic acid, sebacic acid, etc. may be used as the aromatic dicarboxylic acid component. Phosphorus ethylene glycol, propylene glycol, butanediol, 1,4-cyclohexanedimethanol, neopentylglycol and the like can be used. The saturated polyester thus obtained includes polyethylene terephthalate, polybutylene terephthalate, polytrimethylene terephthalate and the like.

본 발명에 사용되는 포화 폴리에스테르에는 필요에 따라 열안정제, 브로킹방지제, 산화방지제, 대전방지제, 자외선흡수제, 난연제 등과 같은 첨가제가 포함될 수 있다.The saturated polyester used in the present invention may include additives such as heat stabilizers, anti-broking agents, antioxidants, antistatic agents, ultraviolet absorbers, flame retardants, etc., if necessary.

본 발명에서는 상기와 같은 출발 원료들을 사용해 포화 폴리에스테르를 합성시 나노크기의 무기입자를 첨가하는데, 나노크기의 무기입자는 반응물내에서 나노크기의 상태로 유지되어야 한다. 이때 나노크기의 무기입자는 대략 3∼100nm 범위의 크기를 지닌 것을 사용하는 것이 좋은데, 3nm 미만의 것을 사용하면 입자의 표면장력 등으로 인해 분산이 어려운 등의 문제점이 있고, 100nm를 초과하면 수지의투명성이 나빠지는 문제점이 있다.In the present invention, when the saturated polyester is synthesized using the starting materials as described above, nano-sized inorganic particles are added, and the nano-sized inorganic particles should be kept in the nano-sized state in the reactant. In this case, it is preferable to use nano sized inorganic particles having a size in the range of about 3 to 100 nm, but when using less than 3 nm, there is a problem such that dispersion is difficult due to the surface tension of the particles. There is a problem of poor transparency.

또한 상기 무기입자는 폴리머내에 대략 5ppm∼30 중량%(더욱 바람직하게는 50ppm∼20 중량%) 되도록 투입하는 것이 바람직한데, 5ppm 미만이 되도록 투입되면 물성 향상이 거의 이루어지지 않으며, 30 중량% 초과 투입시는 입자가 폴리머내에 균일하게 분산되기 어려운 문제가 있다. 본 발명에 사용 가능한 무기입자로는 실리카, 칼슘카보네이트, 알루미늄, 알루미나, 차이나클레이, 산화티탄 등이 있으며, 이들을 단독으로 또는 2 이상을 혼합하여 사용하는 것이 가능하다.In addition, the inorganic particles are preferably added to about 5ppm to 30% by weight (more preferably, 50ppm to 20% by weight) in the polymer, but when added to less than 5ppm almost no improvement in physical properties, more than 30% by weight City has a problem that particles are difficult to uniformly disperse in the polymer. Inorganic particles usable in the present invention include silica, calcium carbonate, aluminum, alumina, china clay, titanium oxide, and the like, and these may be used alone or in combination of two or more thereof.

이와 같이 본 발명에 따라 나노크기의 무기입자가 첨가된 포화폴리에스테르는 용융냉각결정화온도(Thermal Cooling Crystalization temperature)(Tcc)가 185∼245℃, 승온결정화온도(Thermal heating cryctalization temperature)(Thc)가 90∼150℃ 범위로 확장되고, 결정화속도를 향상시킬 수 있다.Thus, according to the present invention, the saturated polyester to which the nano-sized inorganic particles are added has a thermal cooling crystallization temperature (Tcc) of 185 to 245 ° C and a thermal heating cryctalization temperature (Thc). It can be extended to the range of 90 to 150 DEG C, and the crystallization rate can be improved.

일반적으로 입자의 개수는 다음과 같은 식으로 표현할 수 있다.In general, the number of particles can be expressed by the following equation.

Nn = Mp / (Dp ×Vn)Nn = Mp / (Dp × Vn)

상기 식에서 Nn은 입자의 개수, Mp는 입자 비중, Vn은 입자 1개의 체적을 의미한다.Where Nn is the number of particles, Mp is the specific gravity of the particle, and Vn is the volume of one particle.

즉, 상기 식에서 확인되듯이 입자의 크기가 나노미터 단위까지 내려가면 입자 갯수(결정핵의 수)가 크게 증대됨을 의미하며, 따라서 결정화 온도 범위가 넓어지고 결정화 속도가 빠르게 되는 것이다.In other words, as confirmed by the above equation, when the particle size decreases to the nanometer unit, it means that the number of particles (number of crystal nuclei) is greatly increased.

전술한 바와 같이 나노 크기의 무기입자의 분산성 향상을 위해 입자를 물, 에틸렌글리콜 혹은 부탄디올 등의 단독 물질이나 2가지 이상의 혼합물에 분산시킨슬러리 상태로 투입하는 것이 좋으며, 슬러리중의 나노 무기입자 농도는 1 중량% 내지 30 중량% 범위가 좋으며, 더욱 좋기로는 5 중량% 내지 20 중량% 범위이다. 1 중량% 미만이 되면 너무 많은 양의 슬러리가 투입되어 부반응이 많으며, 30 중량% 초과시는 입자의 분산성이 나빠지며 이 때문에 조대입자가 많이 형성된다. 분산성 향상을 위해 일반적으로 입자 크기가 작으면 작을수록 낮은 농도의 슬러리로 만드는 것이 좋으며, 입자 크기가 커지면 슬러리 중의 입자 농도를 올릴 수 있다.As described above, in order to improve the dispersibility of nano-sized inorganic particles, it is preferable to add the particles in a slurry state dispersed in a single substance such as water, ethylene glycol or butanediol, or a mixture of two or more, and the concentration of nano inorganic particles in the slurry Is preferably in the range of 1% to 30% by weight, more preferably in the range of 5% to 20% by weight. When the amount is less than 1% by weight, too much slurry is added, so that there are a lot of side reactions, and when it exceeds 30% by weight, the dispersibility of the particles is deteriorated. In general, the smaller the particle size is, the better it is to make the slurry at a lower concentration, and the larger the particle size, the higher the particle concentration in the slurry can be.

본 발명에서는 상기 나노 크기의 입자 첨가시, 예를 들어, 인산, TMP(Tri Methy Phosphate), TEP(Tri Ethyl Phosphate), TPP(Tri Phenyl Phosphate)등과 같은 인계 화합물을 함께 첨가하는 것도 가능하며, 이러한 경우 인계화합물은 수지의 색상을 향상시키는 효과를 얻을 수 있다. 이러한 인계 화합물의 첨가량은 금속 이온과의 당량비를 감안해 첨가량을 조절하는 것이 좋은데, 대략 최종 폴리머내 인원소의 함유량 기준으로 200 ~ 10,000ppm 범위가 바람직하다.In the present invention, when adding the nano-sized particles, for example, it is also possible to add a phosphorous compound such as phosphoric acid, Tri Methy Phosphate (TPM), Tri Ethyl Phosphate (TEP), Tri Phenyl Phosphate (TPP), etc. In this case, the phosphorus compound may obtain an effect of improving the color of the resin. The addition amount of such a phosphorus compound is preferably adjusted in consideration of the equivalence ratio with the metal ions, but is preferably in the range of 200 to 10,000 ppm based on the content of phosphorus in the final polymer.

나노 크기의 무기 입자 슬러리를 폴리에스테르 합성시 첨가하는 경우 그 첨가방법은 나노 크기의 입자가 응집되지 않도록 하는 것이 중요하다. 본 발명에서는 에틸렌글리콜(EG)과 테레프탈산(TPA) 혹은 디메틸테레프탈레이트(DMT)의 몰비(E/T)를 DMT공법에서는 1.8∼2.5 정도로 하는 것이 좋으며, TPA공법에서는 1.3∼2.5 정도로 하는 것이 좋다. 입자 분산성을 향상시키기 위해 특별히 본 발명에서 별도로 제한은 두지 않으나, DMT(Dimethylterephthalate)공법의 경우에는 수분산 상태의 슬러리가 투입되면 반응에 큰 문제가 생기므로 에틸렌글리콜(EG)이나 부탄디올(BD)와 같은 액체로 분산시키는 것이 바람직하다. TPA(Terephthalic Acid)공법에서는일반적으로 슬러리 내에 물이 일부 함유되어도 반응상에 큰 문제는 없다. 하지만 기본적으로는 입자 분산에 있어서 TPA공법은 DMT공법에 비해 분산성이 떨어진다.When the nano-size inorganic particle slurry is added during the synthesis of the polyester, it is important that the addition method is such that the nano-sized particles do not aggregate. In the present invention, the molar ratio (E / T) of ethylene glycol (EG) and terephthalic acid (TPA) or dimethyl terephthalate (DMT) may be about 1.8 to 2.5 in the DMT method, and about 1.3 to 2.5 in the TPA method. In order to improve particle dispersibility, there is no particular limitation in the present invention, but in the case of DMT (Dimethylterephthalate) method, when a slurry is dispersed in water, a large problem occurs in the reaction, such as ethylene glycol (EG) or butanediol (BD). It is preferable to disperse it into a liquid such as In the TPA (Terephthalic Acid) process, even if some water is contained in the slurry, there is no big problem in the reaction. However, in terms of particle dispersion, the TPA method is inferior in dispersibility to the DMT method.

이하에서 실시예 및 비교예를 들어 본 발명을 좀 더 구체적으로 설명하되, 이들에 의해 본 발명이 제한되는 것은 아니다.Hereinafter, the present invention will be described in more detail with reference to Examples and Comparative Examples, but the present invention is not limited thereto.

[실시예1]Example 1

100중량부의 디메틸테레프탈레이트(DMT), 64중량부의 글리콜(EG)을 반응기에 넣어 교반시키면서 안티모니트리옥사이드 0.03 중량부, 망간아세테이트4수화물 0.06 중량부를 에틸렌글리콜 3중량부에 분산시켜 반응기에 투입한 다음, 가열하여 130℃에서 230℃로 승온시키며 4시간동안 에스테르 교환반응을 실시하여 BHT(B-1)를 만들었다. 평균입경 50 nm 크기의 실리카 입자가 10 중량% 함유된 에틸렌글리콜 슬러리를 0.5 ㎛ 여과 구멍 크기의 필터로 여과한 슬러리(S-1)를 만들었다.(B-1)BHT의 온도가 235℃ 정도에서 최종 폴리머 대비하여 트리메틸포스페이트(TMP) 0.03중량부를 에틸렌글리콜 2 중량부에 희석시켜 투입한다. 트리메틸포스페이트 투입 종료 5분후 반응물의 온도가 235℃로 되게한 다음 준비한 (S-1)슬러리 20 중량부를 온도를 235℃ 유지하면서 서서히 투입을 하였다. 그 뒤 상압 상태에서 잔유 에틸렌글리콜을 유출시켜 에틸렌글리콜과 디메틸렌테레프탈레이트의 몰비를 1.4가 되게하였다. 이 BHT를 3 ㎛ 여과 구멍을 갖는 필터로 여과한 다음 가열하면서 60분간에 걸쳐 1.0 TORR까지 감압함과 동시에 50분에 걸쳐 235℃에서 285℃까지 승온한 상태에서 3시간동안 축중합 반응을 실시하여 반응물의 온도가 285℃가 되고 고유점도(IV)가 0.63이 되는 폴리머를 만들고 이를 절단기로 개당 0.013 g에서 0.23 g이 되게 절단하였다(P-1-1).이 때 칩내에 함유된 나노입자 함량은 약 2.0 중량% 이었다.100 parts by weight of dimethyl terephthalate (DMT) and 64 parts by weight of glycol (EG) were added to the reactor while stirring and 0.03 parts by weight of antimony trioxide and 0.06 parts by weight of manganese acetate tetrahydrate were dispersed in 3 parts by weight of ethylene glycol and added to the reactor. Next, the mixture was heated to 130 ° C. to 230 ° C., and subjected to transesterification for 4 hours, thereby making BHT (B-1). A slurry (S-1) was produced by filtering an ethylene glycol slurry containing 10 wt% silica particles having an average particle diameter of 50 nm with a filter having a size of 0.5 μm filtration pore. (B-1) At a temperature of BHT at about 235 ° C. 0.03 parts by weight of trimethyl phosphate (TMP) is diluted to 2 parts by weight of ethylene glycol relative to the final polymer. 5 minutes after the end of the trimethyl phosphate addition, the temperature of the reactant was brought to 235 ° C, and 20 parts by weight of the prepared (S-1) slurry was slowly added while maintaining the temperature at 235 ° C. Thereafter, the residual oil ethylene glycol was distilled off at atmospheric pressure to bring the molar ratio of ethylene glycol and dimethylene terephthalate to 1.4. The BHT was filtered through a filter having a 3 μm filtration hole, and while heating, the mixture was decompressed to 1.0 TORR over 60 minutes and subjected to a condensation polymerization reaction for 3 hours while heating up from 235 ° C. to 285 ° C. over 50 minutes. A polymer with a reactant temperature of 285 ° C. and an intrinsic viscosity (IV) of 0.63 was made and cut with a cutter from 0.013 g to 0.23 g per piece (P-1-1). Was about 2.0% by weight.

이 칩(CHIP)을 일반고상중합기에 넣고 고유점도(IV)가 0.80 이 되게 고상중합을 실시하였다(P-1-2). 이 칩을 2축용융압출기에서 운전온도 250℃∼285℃ 범위에서 시편을 제작하였다.This chip (CHIP) was placed in a general solid-state polymerizer and subjected to solid-phase polymerization so that the intrinsic viscosity (IV) was 0.80 (P-1-2). The chip was fabricated in a twin screw melt extruder at an operating temperature of 250 ° C to 285 ° C.

[실시예 2]Example 2

실시예 1에서와 같은 방법으로 얻어진 나노입자 슬러리(S-1) 1 중량부를 235℃의 BHT에 투입하여 축중합을 실시하여 칩을 만들었다. 이 때 칩내에 함유된 나노입자 함량은 약 1,000 ppm이었다(P-2-1). 이 칩을 실시예 1과 동일한 방법으로 고상중합을 하였다(P-2-2). 이 칩으로 실시예1과 같은 방법으로 2축용융압출기에서 운전온도 250℃∼285℃ 범위에서 시편을 제작하였다.1 part by weight of the nanoparticle slurry (S-1) obtained in the same manner as in Example 1 was added to BHT at 235 ° C to carry out condensation polymerization to make a chip. At this time, the nanoparticle content contained in the chip was about 1,000 ppm (P-2-1). This chip was subjected to solid phase polymerization in the same manner as in Example 1 (P-2-2). Using this chip, a specimen was prepared in the same manner as in Example 1 in a twin screw melt extruder at an operating temperature of 250 ° C to 285 ° C.

[실시예 3]Example 3

실시예 1에서 나노입자 즉 평균입경 15 ㎚ 크기의 구형실리카 입자를 사용하여 에틸렌글리콜에 10 중량%로 하여 슬러리를 만들고 0.5㎛ 구멍크기를 갖는 필터로 여과하여 슬러리(S-2)를 만든 것 이외에는 실시예1과 동일하게 실시하여 액상칩(P-3-1)을 제조하였다. 이 때 칩내에 함유된 나노입자 함량은 약 2.0 중량% 이었으며, 같은 방법으로 2축용융압출기에서 운전온도 250℃∼285℃ 범위에서 시편을 제작하였다.In Example 1, except that 10 wt% of ethylene glycol was used as nanoparticles, spherical silica particles having an average particle size of 15 nm, and the slurry was filtered through a filter having a pore size of 0.5 μm. The liquid chip (P-3-1) was prepared in the same manner as in Example 1. At this time, the nanoparticle content contained in the chip was about 2.0% by weight, and in the same manner, the specimens were manufactured at the operating temperature of 250 ° C to 285 ° C in the biaxial melt extruder.

[실시예 4]Example 4

평균입경 15 ㎚ 크기의 실리가 입자를 1,000 ppm함유된 액상칩(P-4-1)을 사용한 것 외에는 실시예 1과 동일하게 실시하여 고상칩(P-4-2), 그리고 시편을 제작하였다.Solid chips (P-4-2) and specimens were prepared in the same manner as in Example 1 except that liquid chips (P-4-1) containing silicium particles having an average particle diameter of 15 nm were used. .

[실시예 5]Example 5

100중량부의 테레프탈산, 75중량부의 에틸렌글리콜을 반응기에 넣어 교반하면서 가열하여 30℃에서 230℃로 승온시키며 6시간 동안 에스테르화 반응을 실시하여 BHT(Bis-β-Hydroxyethylene Terephthalate)를 만든 후 EG와 TPA의 몰비가 1.3 인 슬러리 148.6중량부를 2시간에 걸쳐 투입을 하고 난 다음 1시간 30분 동안 온도를 230℃로 유지하면서 추가반응을 시켰다. 이후에 생성된 BHT 148.6 중량부를 3.0 ㎛ 여과 구멍을 갖는 필터로 여과하여 축중합 반응기로 이액하였다. 이액이 종료 후 최종 폴리머 대비 0.02중량%의 인산을 투입하고, 투입종료 5분후 최종 폴리머 대비 0.015중량%의 안티모니트리옥사이드를 소량의 에틸렌글리콜에 희석하여 투입한 후 평균입경 15 ㎚ 크기의 구형실리카 입자를 사용하여 에틸렌글리콜에 10 중량% 슬러리를 만들고 0.5㎛ 구멍크기를 갖는 필터로 여과하여 만든 슬러리(S-2)를 실시예 1과 같이 230℃의 BHT에 20 중량부 투입하며,60분간에 1.0 TORR까지 감압하고, 동시에 50분에 걸쳐 230℃에서 285℃까지 승온하였다. 이 상태에서 3시간동안 축중합 반응을 실시하여 반응물의 온도가 285℃가 되고 고유점도(IV)가 0.63이 되는 폴리머를 만들고 이를, 절단기로 개당 0.013 g에서 0.23 g이 되게 절단하였다(P-5-1).이 때 칩내에 함유된 나노입자 함량은 약 2.0 중량% 이었다.100 parts by weight of terephthalic acid and 75 parts by weight of ethylene glycol were added to the reactor and heated with stirring to raise the temperature from 30 ° C to 230 ° C, followed by esterification for 6 hours to form BHT (Bis-β-Hydroxyethylene Terephthalate), followed by EG and TPA. 148.6 parts by weight of the slurry having a molar ratio of 1.3 was added over 2 hours, followed by further reaction while maintaining the temperature at 230 ° C. for 1 hour and 30 minutes. Subsequently, 148.6 parts by weight of the produced BHT was filtered through a filter having a 3.0 μm filtration hole and transferred to a condensation polymerization reactor. After completion of this solution, 0.02% by weight of phosphoric acid was added to the final polymer, and after 5 minutes, 0.015% by weight of antimony trioxide was diluted with a small amount of ethylene glycol and then spherical silica with an average particle size of 15 nm. A slurry (S-2) prepared by making a 10 wt% slurry in ethylene glycol using a particle and filtered through a filter having a 0.5 μm pore size was added to 20 parts by weight of BHT at 230 ° C. as in Example 1, in 60 minutes. The pressure was reduced to 1.0 TORR, and at the same time, the temperature was raised from 230 ° C to 285 ° C over 50 minutes. In this state, a polycondensation reaction was carried out for 3 hours to produce a polymer having a temperature of 285 ° C. and an intrinsic viscosity (IV) of 0.63, which was cut from 0.013 g to 0.23 g per piece (P-5). At this time, the content of nanoparticles contained in the chip was about 2.0% by weight.

이 칩(CHIP)을 일반고상중합기에 넣고 고유점도(IV)가 0.78이 되게 고상중합한(P-5-2) 후, 이 칩을 2축용융압출기에서 운전온도 250℃∼285℃ 범위에서 시편을제작하였다.This chip (CHIP) was placed in a general solid-state polymerizer and subjected to solid-phase polymerization (P-5-2) with an intrinsic viscosity (IV) of 0.78. Then, the chip was tested in a twin screw melt extruder at an operating temperature of 250 ° C to 285 ° C. Was produced.

[실시예 6]Example 6

평균입경 15 ㎚ 크기의 실리가 입자를 폴리머 대비 1,000 ppm함유시켜 BHT를 만든 다음 인계난연제를 폴리머 대비하여 인원소 기준으로 3000 ppm 투입한 것 외에는 실시예 5와 동일하게 하여 액상칩(P-6-1), 고상칩(P-6-2) 및 시편을 제작하였다.Silica having an average particle size of 15 nm contains 1,000 ppm of the particles, making BHT, and then adding the phosphorus-based flame retardant in the amount of 3000 ppm based on the number of people. 1), a solid chip (P-6-2) and a specimen were produced.

[실시예 7]Example 7

평균입경 3 ㎚ 크기의 실리가 입자를 30 중량% 함유된 액상칩(P-7-1)을 제조한 것 외에는 실시예 5와 동일하게 하여 고상칩(P-7-2), 그리고 시편을 제작하였다.A solid chip (P-7-2) and a specimen were fabricated in the same manner as in Example 5 except that the liquid chip (P-7-1) containing 30 wt% of silicide particles having an average particle diameter of 3 nm was prepared. It was.

[실시예 8]Example 8

평균입경 3 ㎚ 크기의 실리가 입자를 5 ppm 함유된 액상칩(P-8-1)을 제조한 것 외에는 실시예 5와 동일하게 하여 고상칩(P-8-2)과 시편을 제작하였다.A solid chip (P-8-2) and a specimen were prepared in the same manner as in Example 5, except that a liquid chip (P-8-1) containing 5 ppm of silicide particles having an average particle diameter of 3 nm was prepared.

[실시예 9]Example 9

평균입경 100 ㎚ 크기의 실리가 입자를 5 중량% 함유된 액상칩(P-9-1)을 제조한 것 외에는 실시예 5와 동일하게 하여 고상칩(P-9-2), 그리고 시편을 제작하였다.A solid chip (P-9-2) and a specimen were prepared in the same manner as in Example 5 except that the liquid chip (P-9-1) containing 5% by weight of silicide particles having an average particle diameter of 100 nm was manufactured. It was.

[실시예 10]Example 10

100중량부의 테레프탈산, 75중량부의 부탄디올을 반응기에 넣어 교반하면서 가열하여 30℃에서 230℃로 승온시키며 4시간 동안 에스테르화 반응을 실시하여BHBT(Bis―β―Hydroxybuthylene Terephthalate)를 만들었다. 이 때 촉매는 최종 폴리머 대비 모노부틸틴옥사이드(MBTO) 0.04 중량%와 폴리머 대비 테트라부틸티탄네이트(TBT) 0.02 중량%를 사용하였다. 이 후에 생성된 BHBT(Bis-β-Hydroxybuthylene Terephthalate) 175 중량부를 3.0 ㎛ 여과 구멍을 갖는 필터로 여과하여 축중합 반응기로 이액 후 폴리머 대비 0.02중량%의 인산을 투입하고, 투입종료 5분후 폴리머 대비 0.02중량%의 TBT를 소량의 부탄디올에 희석하여 투입하고 실시예 5에서와 같이 3㎚ 크기의 실리카입자를 부탄디올에 희석하여 폴리머 대비 0.5 중량% 되도록 첨가하였다. 그 후 60분간에 1.0 TORR까지 감압하고, 동시에 50분에 걸쳐 230℃에서 245℃까지 승온하였다. 이 상태에서 3시간동안 축중합 반응을 실시하여 반응물의 온도가 248℃가 되고 고유점도(IV)가 0.90이 되는 폴리머를 만들고 이를 절단기로 개당 0.013 g에서 0.23 g이 되도록 절단하였다(P-11-1). 그리고 이 칩을 사용하여 2축 용융압출기에서 운전온도 225℃내지 250℃범위에서 시편을 제작하였다.100 parts by weight of terephthalic acid and 75 parts by weight of butanediol were added to a reactor, heated with stirring, and heated to 30 ° C. to 230 ° C., followed by an esterification reaction for 4 hours to produce BHBT (Bis-β-Hydroxybuthylene Terephthalate). At this time, the catalyst used 0.04% by weight of monobutyl tin oxide (MBTO) relative to the final polymer and 0.02% by weight of tetrabutyl titanate (TBT) relative to the polymer. Thereafter, 175 parts by weight of Bis-β-Hydroxybuthylene Terephthalate (BHBT) produced was filtered with a filter having a 3.0 μm filtration hole, and then 0.02% by weight of phosphoric acid was added to the polymer after condensation polymerization. The TBT was added to dilute a small amount of butanediol, and the 3 nm-sized silica particles were diluted in butanediol and added to 0.5 wt% of the polymer as in Example 5. Thereafter, the pressure was reduced to 1.0 TORR in 60 minutes, and at the same time, the temperature was raised from 230 ° C to 245 ° C over 50 minutes. In this state, a polycondensation reaction was conducted for 3 hours to produce a polymer having a temperature of 248 ° C. and an intrinsic viscosity (IV) of 0.90, which was cut from 0.013 g to 0.23 g per piece (P-11-). One). Using this chip, the specimen was fabricated in the twin screw melt extruder at the operating temperature of 225 ℃ to 250 ℃.

[비교예 1]Comparative Example 1

100중량부의 테레프탈산, 75중량부의 에틸렌글리콜을 반응기에 넣어 교반하면서 가열하여 30℃에서 230℃로 승온시키며 6시간 동안 에스테르화 반응을 실시하여 BHT를 만든 후 EG와 TPA의 몰비가 1.3 인 슬러리 148.6중량부를 2시간에 걸쳐투입을 하고 난 다음 1시간 30분동안 온도를 230℃로 유지하면서 추가반응을 시켰다. 이후에 생성된 BHT 148.6 중량부를 3.0 ㎛ 여과 구멍을 갖는 필터로 여과하여축중합 반응기로 이액하였다. 이액이 종료된 후 최종 폴리머 대비 0.02중량%의 인산을 투입하고, 투입종료 5분후 폴리머 대비 0.015중량%의 안티모니트리옥사이드를 소량의 에틸렌글리콜에 희석하여 투입한 후 60분간에 1.0 TORR까지 감압하고, 동시에 50분에 걸쳐 230℃에서 285℃까지 승온하였다. 이 상태에서 3시간동안 축중합 반응을 실시하여 반응물의 온도가 285℃가 되고 고유점도(IV)가 0.63이 되는 폴리머를 만들고 이를 절단기로 개당 0.013 g에서 0.23 g이 되게 절단하였다(P-11-1).100 parts by weight of terephthalic acid and 75 parts by weight of ethylene glycol were added to the reactor and heated with stirring to raise the temperature from 30 ° C. to 230 ° C., followed by esterification for 6 hours to produce BHT, followed by 148.6 weight slurry of EG and TPA molar ratio of 1.3. After the addition of the unit over 2 hours, the reaction was carried out while maintaining the temperature at 230 ° C. for 1 hour 30 minutes. Thereafter, 148.6 parts by weight of the produced BHT was filtered through a filter having a 3.0 µm filtration hole, and the solution was transferred to a condensation polymerization reactor. After completion of this solution, 0.02% by weight of phosphoric acid was added to the final polymer. After 5 minutes, 0.015% by weight of antimony trioxide was diluted in a small amount of ethylene glycol, and then decompressed to 1.0 TORR in 60 minutes. At the same time, the temperature was raised from 230 ° C to 285 ° C over 50 minutes. In this state, a polycondensation reaction was conducted for 3 hours to produce a polymer having a reaction temperature of 285 ° C. and an intrinsic viscosity (IV) of 0.63, which were cut from 0.013 g to 0.23 g per piece (P-11-). One).

이 칩(CHIP)을 일반고상중합기에 넣고 고유점도(IV)가 0.80이 되게 고상중합한 후(P-11-2) 이 칩을 2축용융압출기에서 운전온도 250℃∼285℃ 범위에서 시편을 제작하였다.This chip (CHIP) was placed in a general solid-state polymerizer and subjected to solid-phase polymerization so that the intrinsic viscosity (IV) was 0.80 (P-11-2) .The chip was then placed in a twin-screw melt extruder at an operating temperature of 250 ° C to 285 ° C. Produced.

[비교예 2]Comparative Example 2

평균입경 15nm 크기의 실리카 입자대신에 평균입경 200nm 크기의 실리카입자를 사용해 슬러리를 만든것 이외에는 실시예 5와 동일하게 실시하였으며, 이때 칩내에 함유된 나노 실리카의 함량은 5.0중량%가 되도록 하였다.A slurry was prepared using silica particles having an average particle diameter of 200 nm instead of an average particle size of 15 nm, and the same procedure as in Example 5 was carried out, wherein the content of the nano silica contained in the chip was 5.0 wt%.

[비교예 3]Comparative Example 3

실리카 입자를 투입하지 않은 것 외에는 실시예 10과 동일하게 실시하여 액상칩(P-13-1) 및 시편을 제작하였다.A liquid chip (P-13-1) and a specimen were prepared in the same manner as in Example 10 except that silica particles were not added.

[비교예 4][Comparative Example 4]

실시예 5에서 실시한 방법 중에서 평균입경 2 ㎚ 크기의 실리카 입자를 100 ppm 사용한 것 외에는 동일한 방법으로 액상칩을 제조하였으나 심한 응집으로 칩(chip)내에 3 mm 정도 크기의 이물로 존재하여 고상중합을 실시하지 않았다.The liquid chip was prepared in the same manner as in Example 5 except that 100 ppm of silica particles having an average particle size of 2 nm were used, but solid phase polymerization was carried out due to the presence of foreign matter having a size of about 3 mm in the chip. Did not do it.

상기 실시예 및 비교예에서 얻어진 폴리머의 물성을 측정하여 하기의 「표1」과 「표2」에 나타내었다.The physical properties of the polymers obtained in the above examples and comparative examples were measured and shown in the following "Table 1" and "Table 2".

상기의 표에서 보는 바와 같이 나노 크기의 입자가 폴리머내에 분산되어 있으면 DSC 분석의 결과가 일반 폴리머의 결정화 온도 범위(Thc - Tcc)가 20℃정도인데 비해 결정성 폴리머의 결정화 온도범위가 최대 145℃까지 넓어진다는 것을 알 수 있다.As shown in the above table, when the nano-sized particles are dispersed in the polymer, the result of DSC analysis shows that the crystallization temperature range of the crystalline polymer is up to 145 ° C while the crystallization temperature range (Thc-Tcc) of the general polymer is about 20 ° C. You can see that it extends to.

상기 실시예 및 비교예에서도 확인되듯이 본 발명은 포화 폴리에스테르 폴리머 내에 나노 크기의 무기입자를 분산 존재시킴으로써 폴리머의 결정화 온도 범위를 확장시키고 결정화 속도를 빠르게 하여 생산성과 기계적 물성을 향상시키는 효과를 얻을 수 있다. 따라서 본 발명에 따라 얻어진 포화 폴리에스테르는 결정성이 우수하고 물리적 특성이 우수하여, 사출, 압출 등 각종 성형법에 의해 우수한 특성을 지닌 각종 성형품을 제조할 수 있다.As can be seen from the above examples and comparative examples, the present invention obtains the effect of expanding the crystallization temperature range of the polymer by increasing the crystallization temperature of the polymer and increasing the crystallization rate by improving the productivity and mechanical properties by dispersing the nano-sized inorganic particles in the saturated polyester polymer. Can be. Therefore, the saturated polyester obtained in accordance with the present invention is excellent in crystallinity and physical properties, it is possible to produce a variety of molded articles having excellent properties by various molding methods such as injection, extrusion.

Claims (4)

방향족 디카르본산 및 디올을 주요 성분으로 하여 에스테르 교환반응 또는 에스테르화 반응을 거쳐 축중합 반응 및 고상중합을 통하여 제조되는 포화 폴리에스테르에 있어서, 상기 제조공정중 임의의 단계에서 평균입경이 3㎚ ∼ 100㎚ 크기의 범위에 있는 무기입자를 최종 포화폴리에스테르에 5 ppm ~ 30 중량% 함유되도록 첨가 반응시켜 얻어지며, 용융냉각결정화온도(Tcc)가 185℃ ~ 245℃ 범위에 있고 승온결정화온도(Thc)가 90℃ ~ 150℃ 범위에 있는 것을 특징으로 하는 결정성이 우수한 포화 폴리에스테르.Saturated polyesters produced by aromatic dicarboxylic acid and diol as main components through transesterification or solidification polymerization through transesterification or esterification reaction, in which the average particle size is 3 nm to It is obtained by adding and reacting inorganic particles in the range of 100 nm size so as to contain 5 ppm to 30% by weight in the final saturated polyester, and the melt cooling crystallization temperature (Tcc) is in the range of 185 ° C to 245 ° C and the elevated temperature crystallization temperature (Thc ) Is in the range of 90 ℃ ~ 150 ℃ saturated polyester excellent in crystallinity. 제1항에 있어서, 무기입자는 실리카, 칼슘카보네이트, 알루미늄, 알루미나, 차이나클레이, 산화티탄 중 단독성분 또는 2개 이상의 복합성분임을 특징으로 하는 결정성이 우수한 성형용 포화 폴리에스테르.The saturated polyester for molding having excellent crystallinity according to claim 1, wherein the inorganic particles are a single component or two or more composite components of silica, calcium carbonate, aluminum, alumina, china clay, and titanium oxide. 제1항에 있어서, 인계난연제를 포화폴리에스테르내 인원소 함량기준으로 200ppm 내지 10,000ppm 범위에서 함유한 것을 특징으로 하는 결정성이 우수한 성형용 포화 폴리에스테르.The saturated polyester for molding having excellent crystallinity according to claim 1, wherein the phosphorus-based flame retardant is contained in a range of 200 ppm to 10,000 ppm based on the content of phosphorus in the saturated polyester. 제1항에 있어서, 포화 폴리에스테르는 폴리에틸렌테레프탈레이트, 폴리부틸렌테레프탈레이트 및 폴리트리메틸렌테레프탈레이트 중에서 선택된 것임을 특징으로 하는 결정성이 우수한 성형용 포화폴리에스테르.The saturated polyester for molding having excellent crystallinity according to claim 1, wherein the saturated polyester is selected from polyethylene terephthalate, polybutylene terephthalate and polytrimethylene terephthalate.
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100616185B1 (en) * 2004-04-27 2006-08-25 주식회사 코오롱 Fire retardant Polyester resin composite for wig-hair
KR100783250B1 (en) * 2006-12-29 2007-12-06 주식회사 효성 Manufacturing method for flame retardant and antimicrobial polyester fiber and polyester fiber thereof
KR101319236B1 (en) * 2011-12-07 2013-10-16 도레이첨단소재 주식회사 Polyester resin containing the nanoparticles and the preparing process thereof
KR101361299B1 (en) * 2012-09-27 2014-02-11 롯데케미칼 주식회사 Thermoplastic polyester resin composition having good crystallization property

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KR101048823B1 (en) * 2005-12-30 2011-07-12 주식회사 효성 Method for producing F-pitty fiber with reduced smoke generation during combustion

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100616185B1 (en) * 2004-04-27 2006-08-25 주식회사 코오롱 Fire retardant Polyester resin composite for wig-hair
KR100783250B1 (en) * 2006-12-29 2007-12-06 주식회사 효성 Manufacturing method for flame retardant and antimicrobial polyester fiber and polyester fiber thereof
KR101319236B1 (en) * 2011-12-07 2013-10-16 도레이첨단소재 주식회사 Polyester resin containing the nanoparticles and the preparing process thereof
KR101361299B1 (en) * 2012-09-27 2014-02-11 롯데케미칼 주식회사 Thermoplastic polyester resin composition having good crystallization property

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