KR200158396Y1 - 반도체소자 제조 공정용 질소 박스의 자동 압력 조절장치 - Google Patents
반도체소자 제조 공정용 질소 박스의 자동 압력 조절장치 Download PDFInfo
- Publication number
- KR200158396Y1 KR200158396Y1 KR2019960049872U KR19960049872U KR200158396Y1 KR 200158396 Y1 KR200158396 Y1 KR 200158396Y1 KR 2019960049872 U KR2019960049872 U KR 2019960049872U KR 19960049872 U KR19960049872 U KR 19960049872U KR 200158396 Y1 KR200158396 Y1 KR 200158396Y1
- Authority
- KR
- South Korea
- Prior art keywords
- pressure
- nitrogen box
- nitrogen
- box
- semiconductor device
- Prior art date
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 title claims abstract description 115
- 229910052757 nitrogen Inorganic materials 0.000 title claims abstract description 52
- 239000004065 semiconductor Substances 0.000 title claims abstract description 13
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 12
- 229910001873 dinitrogen Inorganic materials 0.000 claims abstract description 11
- 238000001514 detection method Methods 0.000 claims abstract description 6
- 230000001105 regulatory effect Effects 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 6
- 230000005856 abnormality Effects 0.000 description 3
- 238000011109 contamination Methods 0.000 description 2
- 230000001276 controlling effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004148 unit process Methods 0.000 description 1
Classifications
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67242—Apparatus for monitoring, sorting or marking
- H01L21/67253—Process monitoring, e.g. flow or thickness monitoring
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
Claims (1)
- 웨이퍼가 수납되는 질소 박스 일측에 장착되어 상기 질소 박스 내부의 압력을 검출하는 압력센서와, 상기 질소 박스에 연결된 질소가스 공급관에 설치되어 관로의 개폐량을 직접 제어하는 자동압력제어밸브와, 상기 압력센서와 자동압력제어밸브사이에 설치되어 상기 압력센서의 검출 신호에 따라 질소 박스내의 압력이 일정압을 유지하도록 자동압력제어밸브에 제어 신호를 보내는 컨트롤러로 구성된 반도체소자 제조 공정용 질소 박스의 자동 압력 조절장치.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019960049872U KR200158396Y1 (ko) | 1996-12-16 | 1996-12-16 | 반도체소자 제조 공정용 질소 박스의 자동 압력 조절장치 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR2019960049872U KR200158396Y1 (ko) | 1996-12-16 | 1996-12-16 | 반도체소자 제조 공정용 질소 박스의 자동 압력 조절장치 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR19980036859U KR19980036859U (ko) | 1998-09-15 |
KR200158396Y1 true KR200158396Y1 (ko) | 1999-10-15 |
Family
ID=19479654
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR2019960049872U KR200158396Y1 (ko) | 1996-12-16 | 1996-12-16 | 반도체소자 제조 공정용 질소 박스의 자동 압력 조절장치 |
Country Status (1)
Country | Link |
---|---|
KR (1) | KR200158396Y1 (ko) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101040540B1 (ko) * | 2010-03-31 | 2011-06-16 | (주)이노시티 | 웨이퍼 저장 장치 |
-
1996
- 1996-12-16 KR KR2019960049872U patent/KR200158396Y1/ko not_active IP Right Cessation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR101040540B1 (ko) * | 2010-03-31 | 2011-06-16 | (주)이노시티 | 웨이퍼 저장 장치 |
Also Published As
Publication number | Publication date |
---|---|
KR19980036859U (ko) | 1998-09-15 |
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