KR20010082602A - Liquid tank and weir member - Google Patents

Abstract

PURPOSE: To provide a liquid tank having one or two or more overflow boxes to allow impurities afloat on an upper layer portion of the liquid stored in the liquid tank to flow over a weir part together with the liquid which is free from any considerable change in quantity of the liquid flowing into the overflow box over the gate part, enables stable liquid filteration accordingly, allows not only the floatable impurities afloat on the liquid surface but also the easily movable impurities in a lower layer to flow into the overflow box, and to be collected and efficiently filtered in spite of vertical change in the liquid level in the liquid tank, and a gate member therefor. CONSTITUTION: Each of liquid tanks 11-15 has the overflow boxes B1, B2 to allow the impurities afloat on an upper layer portion in the liquid stored in the liquid tanks to overflow from gate parts 21 and 22 together with the liquid, each of weir parts 21 and 22 forms notches 20 for overflow on upper edge portions of partition walls w1 and w2 between the overflow boxes and the liquid tanks, or provided with weir members 8, 8' having a notch 80 for overflow in an attachable/detachable manner.

Description

LIQUID TANK AND WEIR MEMBER

The present invention relates to an article processing apparatus using a liquid that requires filtration of a processing liquid, such as an article processing apparatus that performs processing with a liquid, in particular, an article processing apparatus such as a p1ating apparatus, a photo developing apparatus, and a dyeing apparatus; The present invention relates to a liquid tank that can be employed in a liquid treatment apparatus for filtering a liquid such as water without carrying an article processing, and a weir member that can be mounted and used in such a liquid tank.

The treatment of the article with the treatment liquid is variously known as plating treatment of the article with a plating solution, development of photographs with a developer, dyeing of cloth and silk with a dye solution, washing of the article, and the like. It is performed in the field.

The treatment of the article by the treatment liquid may be carried out in various ways, such as by spraying the liquid onto the article or by causing the liquid to flow down in contact with the article. As one representative example, the treatment liquid may be accommodated in the liquid tank and, if necessary, described above. The case where the target object is performed by immersing the to-be-processed object in the process liquid in the said liquid tank, managing the liquid quality of a liquid, liquid composition, the quantity of the process liquid in a liquid tank, filtration amount, temperature, etc. are mentioned. The plating treatment, photo development treatment, dyeing treatment and the like described above are usually carried out in this manner.

Although the treatment involving such immersion may be performed using only one liquid tank, in many cases, a plurality of liquid tanks are employed to bulk-process or multi-variate the articles.

In any case, in the case of employing an article processing liquid tank as an article processing apparatus using liquid, the treatment liquid in the liquid tank is caused by deterioration of the treatment liquid such as impurities brought by the object to be processed and deterioration of the treatment liquid during repeated use. Since impurities such as impurities and impurities that may fall from the outside into the liquid in the liquid tank increase, it is widely used to filter such a treatment liquid with a filtration device including a pump and a filter. As a representative example, the treatment liquid may be circulated filtered by a circulating filtration device including a liquid circulation pump and a filter.

Moreover, the process which removes the impurity in a liquid is not performed with an article process. A representative example thereof is water filtration treatment.

In any case, impurities in the liquid in the liquid tank move along the complex flow in the liquid tank, but from the smallest ones to the largest ones, floating in the upper layer of the liquid to floating in the middle layer, and also having a large specific gravity and Floating in the lower layer tends to be divided into sedimentation at or near the bottom of the bath. In addition, aeration is often performed in which air is blown from the bottom of the tank into the liquid. At this time, impurities of medium specific gravity are affected by the upward flow of the air in the liquid tank between the upper and lower sides of the tank. Some are floating to draw an ellipse.

Therefore, in the filtration of the liquid, the liquid in the liquid tank is sucked from the bottom of the liquid tank by a pump, and a overflow box is provided in the upper portion of the liquid tank via a liquid overflow bank, and a floating material is introduced into the box together with the liquid. The liquid is aspirated from the pump, and the aspirated liquid is filtered through a filter. The liquid after filtration is normally returned to a liquid tank and reused by the article processing apparatus etc. by liquid.

However, as the weaving section facing the overflow box, a weaving section (so-called rectangular weir) in which the upper edge extends horizontally and linearly is conventionally employed, which has the following problems.

That is, according to the rectangular embankment generally adopted widely, the amount of liquid exceeding this embankment accelerates remarkably and increases only when the liquid level of the processing liquid in the tank rises slightly above the upper edge of the embankment. As the length increases, the amount of liquid overflowing increases remarkably.

In order to perform appropriate filtration of the processing liquid in a liquid tank, it is basic to set each of the liquid absorption amount from the bottom part in a liquid layer, and the liquid absorption amount from the overflow box beforehand according to the capability of a filter and a pump. However, if the amount of liquid flowing from the processing tank into the overflow box overflows, the ratio of the amount of liquid absorbed by the pump from the box relative to the excess liquid amount decreases relatively, and finally with time. The liquid level in the liquid layer and the liquid level in the box are the same height, resulting in the inflow of the treatment liquid into the box without dropping.

In the state where the liquid inflow into the overflow box based on the drop is eliminated as described above, the flow rate of the inflow liquid from the tank to the overflow box is extremely reduced, and the inflow of impurities in the liquid into the overflow box is also reduced.

In other words, in the conventional rectangular embankment, the floating impurities floating near the upper layer portion of the processing liquid in the liquid tank together with the liquid inflow into the box based on the drop on the liquid level in the liquid tank and the overflow box, and also the liquid The flow rate is pulled into the box while being pulled, but in the absence of such a drop, the amount of processing liquid flowing into the box is significantly reduced and the amount of impurities is also drastically reduced. As a result, the impurity concentration of the treatment liquid in the liquid tank increases with time, resulting in the generation of defective products.

When the amount of the processing liquid in the liquid tank to process the article gradually decreases due to evaporation due to the working temperature of the processing liquid in the liquid tank and the scooping of the processing liquid due to the transfer of the processed article to the next step, the liquid level is lowered. The amount of liquid flowing into the overflow box is reduced. In this way, the ratio of the liquid absorption in the box by the pump for circulation filtration increases as a result relative to the amount of inflow into the box, so that the amount of the liquid in the box gradually decreases with time. If left unchecked, the liquid in the box becomes dry, and eventually the pump sucks air and stops the operation of the pump, and thus the operation of the entire circulation filtration operation is stopped.

In addition, in the so-called rectangular embankment where the upper edge extends horizontally in a straight line, floating impurities mainly floating in the liquid flow into the box overflowing the embankment, but it is difficult to pass the embankment in the case of impurities floating in the lower layer. In other words, most of the impurities exceeding the banks are only floating on the liquid level in the liquid tank, and the concentration of impurities remaining in the liquid tank increases with time, making it difficult to sufficiently filter such impurities.

Accordingly, an object of the present invention is to provide a liquid tank having one or two or more overflow boxes for causing impurities floating in an upper layer portion of the liquid stored in the liquid tank to flow from the bank together with the liquid. Shall be.

(1) Even if the position of the liquid level in the liquid tank fluctuates up and down, no significant change in the amount of liquid flowing into the overflow box over the bank is caused.

(2) Not only the floating impurities that are liable to float on the liquid level in the liquid tank, but also the impurities that are liable to float in the lower layer can flow into the overflow box to be efficiently recovered.

(3) Therefore, the amount of impurities remaining in the liquid tank can be reduced by that much.

(4) When the liquid is absorbed by the pump from both the bottom of the liquid tank and the overflow box, and the liquid is filtered, the filtration can be performed efficiently.

(5) Therefore, when the article is processed by the treatment liquid in the liquid tank, the influence of impurities can be reduced to improve the quality of the article after the treatment.

(6) Setting of amount of liquid flowing into overflow box can be easily accomplished.

In addition, the present invention provides a bank member for providing the bank of the liquid tank having one or two or more overflow boxes for pouring impurities floating in the upper layer portion of the liquid stored in the tank together with the liquid from the bank. It is a subject to provide what has an advantage.

(1) In the case where it is attached to the liquid tank and used as a weir, the position of the liquid level in the liquid tank does not cause a significant fluctuation in the amount of liquid flowing into the overflow box even if it changes up and down.

(2) Not only the floating impurities which are liable to float on the liquid level in the liquid tank, but also those which are liable to float in the lower layer can flow into the overflow box to be efficiently recovered.

(3) Therefore, the amount of impurities remaining in the liquid tank can be reduced by that much.

(4) When the liquid is absorbed by the pump from both the bottom of the liquid tank and the overflow box, and the liquid is filtered, the filtration can be performed efficiently.

(5) Therefore, when the article is treated with the treatment liquid in the bath, the influence of impurities can be reduced to improve the quality of the article after the treatment.

(6) We can easily set, change quantity of liquid flowing into overflow box.

BRIEF DESCRIPTION OF THE DRAWINGS It is a schematic plan view of the plating process apparatus which is an example of the article processing apparatus by the liquid which employ | adopted the liquid tank which concerns on this invention.

2 is an enlarged plan view of a part of the liquid tank and its peripheral portion,

3 is an enlarged side view of one liquid tank and its peripheral portion in the liquid tank shown in FIG. 2;

4 is a partial perspective view of the liquid tank,

5A is a perspective view of an anode case and the like,

5b is a perspective view of the anode bag,

Figure 5c is a perspective view of a cathode busbar (cathode busbar), hangers and locking members,

6A is a plan view of the first suction head,

6B is a side view of the first suction head,

6C is a cross-sectional view of the bottom groove in the liquid tank and the overflow box bottom portion and the parts related thereto;

7 is a side view of the second suction head,

8 is a perspective view of another example of the second suction head,

9 is a side view showing a part of a manifold having two branch pipes in cross section;

10 is a side view showing a part of a manifold having five branch pipes in cross section;

11A is a block diagram of a control circuit of the plating apparatus shown in FIG. 1;

11B is a diagram showing a schematic configuration of a liquid level position detecting device;

12A is a view showing an example of a conventional rectangular webbing member;

12B is a view showing an example of a weir member having a rectangular notch for liquid overflow;

12C and 12D each show an example of a weir member having an inverted triangular notch for liquid overflow;

13A is a perspective view of an example of a detachable weir member according to the present invention;

FIG. 13B is a cross-sectional view taken along the line X-X of FIG. 13A showing a state of use of the weir member;

14A is a perspective view of another example of the removable weir member according to the present invention;

14B is a cross-sectional view along the Y-Y line in FIG. 14A showing a state of use of the weir member;

Fig. 15 is a side view showing a conventional manifold example in a partial cross section;

16 is a schematic perspective view of a conventional liquid tank and its peripheral portion.

※ Explanation of symbols for main parts of drawing

11, 12, 13, 14, 15: plating treatment tank (example of article processing solution tank)

16: pretreatment washing tank 1: plating solution

W: washing water D1, D2, D3, D4: working deck

101: inner bottom of the liquid tank 102: inner bottom groove installed in the liquid tank

103: aeration device 103a: bubble

104: first suction head 104a: connection portion

104b: suction hole 105: air barrier wall plate

105a: support piece 105b: support plate

106: second suction head 106a: connection port

106b: suction hole 106c: support piece

106d: support plate 107: suction head

107a: Port portion 107b: Suction hole

107c: leg 108: third suction head

B1, B2: overflow box

w1, w2: partition wall between the liquid tank and the overflow box

21, 22: bank 20: notch of the bank

A: positive busbar C: negative busbar

H: Hanger S: Locking member

m ': anode material CS: anode case

CSb: anode bag a1, a2: plated article

3: circulating filtration apparatus 31: filter

32: circulation pump (centrifugal pump in this example)

33: manifold for liquid confluence v11 to v15: manual on-off valve

v16: Check valve 4A, 4B: Circulation filtration device

41 filter 42 circulating pump (centrifugal pump in this example)

430, 431, 432: manifold for liquid flow 433: manifold for liquid distribution

v41 to v45: manual shut-off valve v46: check valve

45: temperature control circuit 451: heat exchanger

va ', vb': Manual open / close valve V: Flow control valve

452: manifold for liquid distribution 51: empty liquid tank replacement device

v51, v52, v61 to v64, v71: manual closing valve

511: empty replacement tank v53: foot valve

401: manifold body 402, 403: branch pipe

401a: main opening of the manifold body 401

401b: the other end of the manifold body 401

9: conventional manifold 91: manifold body

91a: main opening 91b: hole

92: branch pipe 90: flow control valve

6: Device for liquid mixing and liquid level control

60 filter 61 circulating pump (centrifugal pump in this example)

62 liquid level position detection device 621 to 625 electrode

63: liquid outlet Vo: check valve

J1, J2, J3: Manifold for liquid flow J4, J5, J6: Manifold for liquid distribution

Va: Electric valve for liquid discharge Vb: Electric valve for liquid supply

7: control unit 71: operation panel

600: manifold body 601 to 605: branch pipe

600a: main opening of the manifold main body 600

600b: the other end of the manifold body 600

200: conventional rectangular weave 201 to 203: weir

N1, N2, N3: notch 8, 8 ': bank member

80: rectangular notch for liquid overflow

81: plate 82: bent plate portion of the L-shape

82a: long hole for bolt penetration 83: reinforcement rib

84, 84 ': Bolt 800: wall insert

840: liquid sealing material LN: liner

W ': Rising Wall 10': Liquid Tank

L ': liquid BL', B2 ', B3': overflow box

2L ', 22', 23 ': rectangular weir

v1 'to v7', v1 ", v7", v8 ', v9': manual shut-off valve

V ': Foot valve 1b, 1b': Fluid port

F: Filter P: Circulation Pump

H: heat exchanger 100 ': liquid return port

511v: Foot valve 511 ': Liquid discharge port

In order to solve the above problems, the present invention has one or two or more overflow boxes for overflowing the impurity floating in the upper part of the liquid stored in the liquid tank from the bank together with the liquid. Provided is a liquid tank, characterized in that the overflow notch is formed at the upper edge portion of the partition wall between the liquid tanks, or that the bank member formed with the overflow notch is detachably attached.

According to the liquid tank according to the present invention, in the filtration of the liquid in the liquid tank, the liquid in the liquid tank can be sucked from the bottom of the liquid tank with the impurities accumulated therein with a pump, while the liquid from the bank portion flows into the overflow box with the floating impurities. Can be drawn in and draw them from the box to the pump, and these aspirated liquids can be provided to the filtration. In this way, the impurities can be sucked together with the liquid and filtered.

In the liquid tank which concerns on this invention, the part which formed the notch for liquid overflow acts as a recess, and liquid flows from this notch to the overflow box.

Therefore, even if the liquid level in the tank rises slightly above the liquid level for the desired liquid overflow, as long as the rising liquid level faces the notch, the amount of overflow overflows over the entire length of the upper edge of the bank as in the case of the conventional rectangular bank. Therefore, the overflow amount of the whole does not increase remarkably, and the overflow amount only increases by the increase of the liquid flow cross-sectional area by the rise of the liquid level in this notch. Also, even if the liquid level in the tank is lowered, the amount of overflow is reduced all at once over the entire length of the upper edge of the bank as in the case of the conventional rectangular bank, so that the amount of overflow is not significantly reduced. The amount of overflow only decreases by the decrease in the cross-sectional area of the liquid distribution due to the lowering of. Therefore, even if there is a vertical fluctuation of the liquid level in the liquid tank, the overflow amount is very gently increased or decreased as compared with the conventional rectangular weir. In other words, even if there is a vertical fluctuation of the liquid level in the liquid tank, the fluctuation of the overflow amount is very small compared with the conventional rectangular weir.

In this way, the amount of liquid absorbed from the bottom of the liquid tank (e.g., approximately 70% of the amount of the circulating fluid in the case of the circulating filtration) set in accordance with the amount of the filtration liquid such as the circulating filtration suitable for the filtration pump ability for proper filtration of the liquid Appropriate filtration of the liquid is achieved by maintaining the amount of liquid absorption from the overflow box (eg approximately 30% of the amount of circulating liquid in the case of circulating filtration).

Moreover, the liquid tank which concerns on this invention employ | adopts the embankment which provided the notch for liquid overflow, and liquid flows from this notch to the overflow box, and this notch extends in the depth direction of the liquid before passing the embankment. Therefore, not only the floating impurities which are liable to float on the liquid level in the liquid tank, but also those which are more susceptible to floating in the lower layer are more likely to flow from the notch into the overflow box, and the impurities that are suspended in the lower layer than the liquid level can be recovered and filtered. have.

It also has the advantage that the amount of overflow can be easily set by selecting the shape or number of notches.

The number of the overflow part and the overflow box combined with this can be one or two or more depending on the amount of liquid in a liquid tank, the shape of a liquid tank, etc., and can be provided in a suitable position.

The overflow box may be provided on the outer circumferential side of the upper edge of the liquid tank peripheral wall, on the inner circumferential side, or on both the outer circumferential side and the inner circumferential side.

The number of the notches for liquid overflow in one recess can be provided in multiple numbers as needed. A plurality of notches are disposed over a wide range, more preferably, uniformly dispersed, and flows all of the floating impurities that are liable to float on the liquid surface and impurities that are more likely to float below the liquid throughout the liquid in the tank. It is preferable to flow into the overflow box.

As the shape of such a notch, various shapes such as an inverted triangle shape (in other words, a V shape), a U shape, and a rectangular shape can be adopted. Among them, an inverted triangular notch in which an opening width is gradually narrowed from the top of the notch to the bottom, and a rectangular notch having a narrow opening width should have advantages such as easy setting of a desired overflow amount and easy making. It is preferable to provide a plurality of them.

In the case of employing the inverted triangle notch, the lower vertex angle of the inverted triangle is not limited thereto, but may be about 40 ° to 90 °, more preferably about 50 ° to 60 °.

In any case, the embankment may be formed by detachably attaching the embankment member having the overflow notch formed on the upper edge of the partition wall between the overflow box and the liquid tank, or the overflow member formed with the overflow notch.

In addition, in the case of detachably attaching and installing a bank member which forms a notch for overflow in the upper edge portion of the partition wall between the box overflowing the tank and the liquid tank, an appropriate bank member among the bank members for which the overflow amount is variously set It is possible to easily set the amount of overflow by selecting and insert a liner of appropriate thickness between the upper edge of the partition wall and the weir member, for example, to easily set the height of attachment of the weir member. The amount of overflow can be easily changed by changing or replacing the dam member.

Accordingly, the present invention also relates to a weir member for providing the weir of a liquid tank having one or two or more overflow boxes for allowing impurities floating in the upper layer of the liquid stored in the liquid tank to flow along with the liquid from the weir. There is also provided a weiring member, characterized in that a notch for overflow is formed and detachable from the top edge of the partition wall between the overflow box and the liquid tank.

The number, shape, and the like of the notches in the bank member can also be the same as those of the bank described in connection with the liquid tank.

The inner tank may be provided with an inner bottom groove formed by dropping one or two or more along the circumferential edge portion of the bottom of the liquid tank in order to collect impurities that tend to accumulate at the bottom of the liquid tank and to facilitate smooth suction. In addition, if such an inner bottom groove is provided, the liquid or cleaning liquid originally contained in the liquid tank can flow therein at the time of cleaning the liquid tank, so that the cleaning can be performed smoothly. Such inner bottom grooves may be 1 or 2 or more depending on the amount of liquid in the liquid tank, the shape of the liquid tank, and the like. Such an inner bottom groove may be installed along an appropriate portion of the peripheral edge of the bottom of the tank, for example.

The inner bottom groove may be provided with a first suction head which extends along the longitudinal direction of the groove and has a plurality of suction holes so that impurities accumulated in the inner bottom groove can be sucked from the entire inner bottom groove as much as possible. In this way, by installing the first suction head in the inner bottom groove, even when the aeration device is installed at the bottom of the tank, the first suction of the air blown out of the aeration device is suppressed so as to suppress the intake of air, which is the worst condition in the filter. Inhalation to the head can be suppressed, and impurities can be sucked and filtered smoothly.

The tank further includes a suction head (third suction head, which will be described later) for sucking impurities which are likely to accumulate in the bottom of the tank, to a portion other than the inner bottom groove in the peripheral edge of the bottom of the tank. You may install above.

When the first suction head or the third suction head is in communication with a centrifuga pump pumped for liquid filtration, the diameter of each suction hole of those suction heads is impeller in the centrifugal pump. It is preferable that the height of the blade is equal to or smaller than the height of the blade. In this way, the diameter of each suction hole is set so that a part of the object to be processed or a miscellaneous material that comes out from the outside may be sucked into the centrifugal pump to reduce the amount of liquid absorbed, or to engage the blade of the impeller. The failure of the pump can be suppressed, for example.

However, the processing liquid flowing into the overflow box together with impurities is sucked by the pump from the outlet (flow port) of the processing liquid installed in the bottom of the box and sent to the filter, or the processing liquid flowing into the box beyond the bank. In the volume and particle size of the inorganic and organic impurities in the product, the small to large, and the articles falling from the outside into the box are blocked by the outlet of the box bottom, and the liquid absorption from the pump from the box is significantly inhibited. It often happens, causing great hindrance to filtration.

Therefore, another suction head (second suction head) having a plurality of suction holes may be provided in the inner bottom portion of the overflow box. This second suction head allows the liquid in the box to be sucked upwards once, thereby avoiding the formation and clogging of a liquid outlet (passing port) at the bottom of a conventional box.

When the second suction head is in communication with a centrifugal pump for sucking the liquid, the diameter of each suction hole of the second suction head is also equal to or smaller than the height of the blade of the impeller in the pump. You may leave it.

An aeration apparatus is provided on the inner bottom of the liquid tank to agitate the liquid, thereby achieving homogenization of the respective liquid portions. In addition, when the article processing by the liquid in a liquid tank is followed, the adhesion of the suspended impurities in a liquid with respect to a to-be-processed object by the blowing air from an aeration apparatus can be suppressed.

When an aeration apparatus is installed, an air blocking wall (air blocking wall) is disposed between the aeration apparatus and the first suction head provided in the inner bottom groove, whereby the first suction head causes the air to blow out from the aeration apparatus. It is desirable to suppress inhalation. Also in the case where the third suction head is provided, it is preferable to arrange an air blocking wall for suppressing the air suction to the suction head between the third suction head and the aeration apparatus adjacent to the third suction head.

The first suction head is in a predetermined angle range (for example, within a range of approximately 90 degrees or less) from the lower end of the suction head around the central axis of the suction head in the suction head longitudinal direction to the side opposite to the air blocking wall, and also to the lower end of the suction head. The suction holes are dispersedly formed within a predetermined angle range (for example, within a range of about 45 degrees or less) from the side of the air barrier wall to the air barrier walls, and the suction holes are equally distributed in the respective parts extending in the longitudinal direction of the first suction head. It is preferable to disperse | distribute and to be able to absorb a liquid. Thereby, it is difficult to suck air, and the impurities which tend to settle on the bottom of the inner bottom groove can be sucked as smoothly as possible from the whole of the inner bottom groove as possible.

Also in the case where the third suction head and the air blocking wall facing the same are provided, the suction hole of the head is mutually arranged with respect to the air blocking wall with the suction hole of the first suction head and the air blocking wall thereto. It is good to install in the same relationship. Moreover, it is preferable to disperse | distribute so that equal amount can be sucked in each part which extends along the longitudinal direction of a 3rd suction head.

The second suction head is also extended along the longitudinal direction of the inner bottom portion of the overflow box so as to smoothly suck impurities from the entirety of the overflow box as smoothly as possible, and the suction hole of the second suction head. It is preferable to disperse | distribute toward the box bottom surface so that an equal amount of liquid may be sucked in each part extended along the longitudinal direction of the said 2nd suction head.

In addition, in the case where the main suction head that sucks from the bottom of the tank is the first suction head (therefore the head is larger than the third head), the first suction head is the inner bottom of the tank. In the case where the air blocking wall (air blocking wall) is provided with respect to the first suction head, or when the liquid tank is a processing liquid tank (for example, a plating liquid tank), 1 In many cases, the liquid level of the processing liquid in the liquid tank must be increased to correspond to the height of the suction head or the air barrier wall. Because the locking member immersed in the processing liquid, the plated object suspended on the locking member, and the like are caught by the upper edge of the first suction head or the air barrier wall plate, the plating target or the locking member may fall into the processing liquid. Because. When such a falling object occurs, the removal operation sometimes stops the production of the plated article including the repair of the plating apparatus, which requires a large expense. Therefore, the liquid level must be increased by making the height (depth) of the liquid tank the height (depth) which added the height equivalent of the said 1st suction head or the air shielding wall.

At this time, the increase of the liquid amount by raising the height of the liquid tank is a large amount equivalent to the height of the suction head or the air blocking wall with respect to the liquid tank area. In addition, the cost of producing the processed article increases significantly due to the cost of manufacturing the liquid tank for the increased amount of liquid, the cost of increasing the amount of liquid, the cost of improving the performance of the filter and the circulating pump, and the administrative cost to them.

Therefore, it can be said that it is preferable to provide an inner bottom groove in the bottom of the liquid tank as described above and to provide a first suction head or an air barrier wall so as not to cause such a large amount of treatment liquid increase.

In addition, the liquid bath according to the present invention can be applied to an article processing liquid tank in an article processing apparatus using various liquids. For example, a plating treatment apparatus using a plating solution of an article, a dyeing apparatus using a dye solution, a developer using a photograph The present invention can be applied to an article processing liquid tank in a developing apparatus, an article cleaning apparatus, or the like, and also to a liquid tank of a liquid processing apparatus for filtering a liquid such as water without the article processing.

EMBODIMENT OF THE INVENTION Hereinafter, embodiment of this invention is described with reference to drawings.

1 shows a plating apparatus which is an example of an article processing apparatus using a liquid employing a liquid tank according to the present invention.

The plating apparatus shown in FIG. 1 includes five article processing liquid tanks 11, 12, 13, 14, and 15. Each liquid tank is a plating liquid tank in which an article is plated here. Each bath may contain a different amount of plating liquid, for example, a different amount of plating liquid of the same liquid quality, but each bath here has a volume accommodating the same amount of plating liquid.

These five liquid baths are divided into three groups. That is, a first group including one liquid tank 11, a second group including two liquid tanks 12 and 13, and a third group including liquid tanks 14 and 15. A predetermined plating liquid L is accommodated in each liquid tank. In the figure, the pretreatment washing tank 16 is located on the left side of the liquid tank 11, and the washing water W is accommodated therein so as to clean the plated article as needed before the plating treatment. Further to the left of the liquid tank 16 is a deck D1 for work.

Moreover, the work deck D2 is provided between the liquid tanks 11 and 12, the work deck D3 is provided between the liquid tanks 13 and 14, and the work deck D4 is provided in the outer side of the liquid tank 15, respectively. .

Each bath is of substantially the same structure. The structure of a liquid tank is demonstrated with reference to FIGS. 1-4 by taking the liquid tanks 12 and 13 as an example. 2 is an enlarged plan view of the liquid tanks 12 and 13 and its peripheral portion, and FIG. 3 is an enlarged side view of the liquid tank 12 and its peripheral portion. 3 also shows an empty liquid tank replacement apparatus 51, which will be described later. 4 is a partial perspective view of the liquid tank 12.

Each liquid tank is rectangular in plan view (viewed in plan) and has a liquid overflow box B1 along one long side of the rectangle and a liquid spill box B2 along one short side of the rectangle. have.

Box B1 is formed shallower than box B2, and box B2 is formed deeper than box B1. The box B1 communicates with the upper part of the box B2 so that the liquid flowing therein flows into the box B2, and the bottom of the box B1 is inclined downward toward the box B2. In addition, the bottom of the box B1 does not necessarily have to be inclined in this way.

The box B1 is provided via the bank 21 provided along the long side direction of a liquid tank, and the box B2 is provided through the bank 22 provided along the short side direction of a liquid tank. Each recess 21 and 22 is demonstrated in detail later.

As shown to FIG.2, FIG.3 and FIG.6 (c), the inner bottom groove 102 is integrally dropped in one place of the circumferential edge part of the inner bottom 101 of a liquid tank, and is formed. The inner bottom groove 102 extends over the length of the short side here along one short side direction of the bath.

An anode busbar (A) is hypothesized parallel to each other in the upper side of the longitudinal direction of the bath, and a cathode busbar (C) in parallel to the anode busbar above the center of the bath. Is hypothesized.

In plating the article, for example, as shown in Figs. 2, 3 and 5, one or two or more conductive hangers H (see Fig. 5 (c)) are prescribed to the cathode bus bar C. The electrolytic anode case CS (refer to FIG. 5 (a)), which is held at intervals of and held in the anode material m 'at a predetermined position of each anode bus bar A, is suspended. L) is immersed in (e.g., the plated articles a1 and a2) are held on the locking member S (see FIG. 5 (c)), and the locking member S is suspended on the hanger H. It may be immersed in the plating liquid L together with a1 and a2. CSb shown in Fig. 5 (b) is an anode bag made of a filter cloth, and an anode case for preventing leakage of impurities generated on the anode side into the plating liquid. It is deposited on (CS).

There are many plating treatments such as plating of copper, nickel, zinc, tin, alloys thereof, etc. in the plating treatment of the workpiece. For example, when plating with nickel, the plating solution L is used as the nickel plating solution and the anode case ( The case where CS) is made into a corrosion-resistant titanium box and the nickel chip is accommodated as an anode material m 'can be illustrated.

An aeration device 103 is provided on the inner bottom 101 of each liquid tank. This is constituted by successively installing perforated pipes for blowing air, and is connected to a compressed air supply device (not shown) to blow bubbles 103a into each part of the processing liquid L, so-called aeration. The treatment liquid L is agitated by this aeration, and the liquid temperature is uniform at each part in terms of liquid composition, and the liquid temperature is also uniform. In addition, impurities in the liquid are appropriately moved so as to be sucked smoothly from the respective portions of the processing liquid in the circulating filtration described later. In addition, adhesion of impurities in the liquid to the articles a1 and a2 is also suppressed by aeration.

The inner bottom groove 102 of each liquid layer is provided such that the first suction head 104 shown in FIG. 6 extends in the longitudinal direction of the inner bottom groove 102. The suction head 104 is a cylindrical body which has the connection part 104a at one end, and the other end was closed, and the some suction hole 104b was laid out.

An air barrier wall plate 105 is provided between the first suction head 104 and the aeration device 103. The air blocking wall plate 105 is slightly lifted from the bottom of the inner bottom groove 102 by the support piece 105a, and the liquid can flow under the wall plate 105 as well. And the support plate 105b is provided across the support piece 105a and the air blocking wall plate 105, and this supports the 1st suction head 104. As shown in FIG.

The first suction head 104 is also slightly lifted from the bottom of the inner bottom groove 102 by the support piece 105a, and the liquid can also flow under the suction head 104.

The suction hole 104b of the first suction head 104 is in the angular range θ1 of 90 degrees or less from the lower end of the suction head around the central axis in the suction head longitudinal direction to the side opposite to the air blocking wall plate 105. Dispersion is formed in the range of the center angle [θ (θ1 + θ2) = 135 °] in the angular range θ2 of 45 degrees or less from the lower end of the head to the blocking wall plate 105 side. The angle θ is an angle range for directing the suction hole so as to smoothly suck out the precipitated impurities accumulated in the inner bottom groove 102 and to be difficult to suck air from the aeration apparatus 103, It is approximately 135 degrees here.

In addition, the suction hole 104b of the first suction head 104 is distributedly formed so as to absorb an equal amount in each of the portions extending in the longitudinal direction of the suction head.

In order to make it possible to absorb an equal amount in each of the suction heads, the number of the suction holes is such that all of the cross-sectional areas of the suction holes in the portion close to the suction port portion of the suction head are smaller than all of the cross-sectional areas of the suction holes in the farther portions. And (or) the diameter may be adjusted to form dispersions of the liquid absorbing holes. Here, the diameter of each suction hole is the same, and the portion closer to the connection port portion 104a and the portion farther from the suction hole 104b are sparse than the portion farther from the portion closer to the connection port 104a. Densely dispersed.

According to this first suction head 104, it is difficult to suck air, and the impurities easily liable to settle in the bottom of the inner bottom groove 102 can be sucked smoothly from the whole as much as possible of the inner bottom groove.

In addition, in addition to the first suction head 104, a portion of the bottom 101 in the liquid tank other than the inner bottom groove 102, for example, the inner bottom 101, in order to suction the impurities easily accumulated in the bottom of the tank more efficiently. One or two or more third suction heads may be provided on a part of a peripheral edge of the substrate. In FIG. 3, the example which attaches the 3rd suction head 108 to the circumferential edge part along the longitudinal direction of the bottom of the tank 101 is shown by the broken line.

The third suction head 108 may have the same structure as that of the first suction head 104, and the suction holes may be dispersed and formed so as to absorb an equal amount in each portion extending in the longitudinal direction of the suction head. An air blocking wall plate 109 may be provided between the third suction head 108 and the aeration device 103.

In addition, about each suction port of the 3rd suction head 108 in the angular range (theta) 1 of 90 degrees or less from the lower end of a suction head around the central axis of the suction head longitudinal direction to the opposite side to the air blocking wall plate 109, What is necessary is just to disperse | distribute within the range of the center angle [(theta) ((theta) 1+ (theta) 2) = 135 degrees) in the angle range (theta) 2 of 45 degrees or less from the lower end of the head.

A second suction head 106 (not shown in FIGS. 1 and 4) is provided on the inner bottom portion of the deep overflow box B2 in FIG. 6 (c), FIG. 7, and the like.

The second suction head 106 is supported via the support piece 106c and the support plate 106d mounted thereon, and the liquid can also flow down the suction head 106. The suction head 106 extends substantially in parallel with the short side of the liquid tank, has a connecting port portion 106a at one end, a cylinder closed at the other end, and has a plurality of suction holes 106b. The suction holes 106b are dispersedly formed so as to absorb an equal amount in each of the sections extending in the longitudinal direction of the suction head 106.

The sum of the cross-sectional area of the suction holes at the portion close to the connection port of the suction head is further distant so that the second suction head provided in the overflow box B2 can be evenly sucked in the respective portions of the suction head. The number and / or diameter of the suction holes may be adjusted so as to be smaller than the sum of the cross-sectional area of the suction holes in the site, and the suction holes may be dispersedly formed. Here, the diameters of the liquid intake holes 106b are the same, and the portion closer to the connection port portion 106a and the portion farther from the portion are more sparse in the liquid absorption hole than in the portion farther from the portion farther away. Dispersion

According to the second suction head 106, the liquid and impurities can be sucked from the entire overflow box B2 as smoothly as possible.

In the past, when a liquid was sucked from the overflow box, an external liquid passage was provided at the bottom of the overflow box, and a liquid pipe was connected to the liquid passage in succession to suck the liquid downward from the liquid pipe. Impurities in the liquid are easily clogged in the liquid passage or the connecting portion thereof, and this causes a significant problem in the filtration operation. However, in this case, the suction tube of the second suction head 106 can suck upward from the bottom of the box. Clogging caused by impurities in the head 106 and the liquid absorbing pipe connected thereto is sufficiently suppressed.

This point is explained again. 16 shows a conventional example (an example of a plating treatment liquid tank). 16 (a) and 16 (b), 10 'denotes a liquid tank, B1', B2 ', and B3' denote a overflow box attached to the liquid tank, and 21 ', 22', and 23 'face the overflow box. The conventional rectangular weir, V ', is a conventional foot valve installed at the bottom of the liquid tank.

In Fig. 16A, the overflow box B1 'is a groove-shaped box, and the processing liquid L' introduced therein flows into the box B2 '. A liquid passage Lb is provided at the bottom of the overflow box B2 'shown in FIG. 16A, and this is the liquid of the liquid filter F via the valves v1' and v2 'and the pump P. FIG. Piping is connected to the inlet port. The foot valve V 'in the liquid tank is connected to the liquid inlet of the liquid filter F via the valves v7' and v2 'and the pump P. The liquid discharge port of the filter F passes through the valves v3 ', v4', and v5 'to the heat exchanger H for liquid heating, and then returns to the liquid tank 10' via the valve v6 '. Is connected to the liquid discharge port 511 'through the valve V8' between the valves v3 'and v4'. Further, a liquid suction foot valve 511v is provided at the bottom of the empty replacement liquid tank 511, which is connected to the suction port of the pump P via the valve v9 '.

A liquid passage 1b 'is provided at the bottom of the overflow box B3' shown in FIG. 16 (b), which passes through the valve v1 ", and the foot valve V 'in the liquid tank has a valve v7. Are connected to the same valve v2 'as shown in Fig. 16A through " Other points are the same as those in the liquid circuit of Fig. 16A.

In addition, the circuit for the pre-coat of the filter aid in a filter is abbreviate | omitted in figure.

Opening and closing of each valve is as follows.

valve Normal plating When transferring liquid to an empty replacement bath (511) for replacement filtration When returning the liquid from the empty replacement liquid tank 511 to 10 'for replacement filtration Pump driving driving driving v1 ' Opening Opening Closure v2 ' Opening Opening Closure v3 ' Opening Opening Opening v4 ' Opening Closure Opening v5 ' Opening Closure Opening v6 ' Opening Closure Opening v7 ' Opening Opening Closure v1 " Opening Opening Closure v7 " Opening Opening Closure v8 ' Closure Opening Closure v9 ' Closure Closure Opening

Further, in the plating treatment operation, when the amount of overflow liquid to the overflow box B2 '(B3') occurs and the liquid in the box becomes dry, the valve [V1] is prevented to prevent air intake from the pump P. '(V1 ")] is closed.

As described above, when the liquid is sucked from the overflow box B2 'or B3' as illustrated in Fig. 16, the liquid is sucked from the liquid passages 1b and 1b 'at the bottom of the overflow box. Although impurities in the liquid were likely to be clogged at the piping connection portion, it was a cause of remarkable problems in the filtration operation, but the suction pipe of the second suction head 106 here can suck upward from the bottom of the box. Clogging due to impurities in the 106 and the liquid absorbing pipe connected thereto is sufficiently suppressed.

Go back to the beginning and explain.

The diameter of each of the suction holes 104b of the first suction head 104, each of the suction holes 106b of the second suction head 106, and each of the suction holes of the third suction head 108 is equal to the suction head. Is set equal to or smaller than the height of the impeller blade in the liquid circulation centrifugal pump for filtration connected via a manifold or the like described later.

In this way, by reducing the diameter, a part or part of the plated article which may drop out in the liquid tank, and other miscellaneous goods introduced from the outside are sucked into the centrifugal pump and engaged with the impeller blade. Can be suppressed.

Instead of the second suction head 106, another type of suction head may be employed. For example, the suction head 107 shown in FIG. 8 may be employed.

The suction head 107, which can be called a vibration damper, has a small box shape, has a connection port 107a at the top, and a plurality of suction holes 107b at the side wall and the bottom wall. It is dispersion. A leg 107c is attached and stands at the bottom of the overflow box B2 by this. Each suction hole 107b may have a diameter equal to or smaller than the height of the impeller blade in the liquid circulation centrifugal pump.

The first suction head 104, the second suction head 106 (or 107), or the third suction head 108 described above become components of the circulating filtration apparatus described below.

A circulating filtration device is provided for each of the first group including one liquid tank 11, the second group including two liquid tanks 12 and 13, and the third group including the liquid tanks 14 and 15. It is installed. Moreover, the circulation filtration apparatus for the 4th group containing all the liquid tanks from the liquid tank 11 to the liquid tank 15 is also provided.

In Fig. 1, the circulating filtration device for the liquid tank 11 is code 3, the circulating filtration device for the liquid tanks 12 and 13 is 4A, and the circulating filtration device for the liquid tanks 14 and 15 is 4B. , The circulating filtration device for all the liquid tanks 11 to 15 is indicated by reference numeral 6.

In the circulating filtration device, the circulating filtration device 3 of the first group is a single circulating filtration device of one liquid tank by one liquid circulation pump (here, centrifugal pump), and the circulating filtration device 4A and the second group of the second group. Each of the three groups of circulating filtration devices 4B is a circulating filtration device by one liquid circulation pump (here, centrifugal pump) for two treatment liquid tanks. The circulating filtration device 6 serving as the fourth group is a circulating filtration device by one liquid circulation pump (here, a centrifugal pump) for all five treatment liquid tanks.

The filtration apparatus 4A of the 2nd group and the filtration apparatus 4B of the 3rd group are two circulating filtration apparatuses of one liquid circulation pump, respectively, and the process liquid in two liquid tanks in each group is circulating filtration. In the course of, the liquid flow in the circuit is slightly weakened, and as time passes, the liquid level drops in one of the two liquid tanks, while the liquid in the liquid tank in the other liquid tank drops. Increasing inflow of the liquid amount of the weight loss occurs, and eventually the processing liquid flows from the other liquid tank, and the liquid level of the processing liquid in one of the liquid tanks drops too much, so that both liquid tanks cannot be plated by the processing liquid. There is a case.

Therefore, in this case, the circulating filtration device 6 which performs circulation filtration simultaneously with one liquid circulation pump for all five tanks is installed and operated, thereby controlling the liquid level so as to suppress the up and down of the liquid level between the tanks. Simultaneously, liquid mixing is performed, and circulation filtration is performed while making the composition and liquid temperature of the liquid in each liquid tank uniform. That is, the circulation filtration device 6 is not only a circulation filtration device but also a device for liquid mixing and liquid level control.

In addition, the apparatus for liquid mixing and liquid level position control can perform circulation filtration while performing liquid mixing and liquid level position control in each liquid tank even when the capacity of each liquid tank is different.

The circulating filtration device 3 for the liquid tank 11 includes a filter 31 and a circulating pump 32 for liquid circulation (in this example, a centrifugal pump is employed). The liquid tank 11 can communicate with the suction port of the circulation pump 32 via the suction circuit. The filter 31 can communicate with the liquid tank 11 via a liquid feeding circuit.

As shown in FIG. 1, the liquid absorption circuit

The first suction head 104 and the second suction head 106 (not shown in FIG. 1, see FIGS. 2, 6, 7, etc.) in the liquid tank 11,

Manifold 33 for liquid confluence,

Piping for connecting the connecting port portions 104a (see Fig. 6, 106a; Fig. 6, Fig. 7) of the suction heads 104 and 106 to the branch pipe of the manifold 33 via the manual opening / closing valves v11 and v12, respectively. and,

The main opening part of the manifold 33 is connected to the suction port of the circulation pump 32 (here, centrifugal pump) via the manual opening / closing valve v13.

When employing the third suction head 108, a valve or the like is mixed so that the liquid sucked by this is finally mixed with the liquid sucked through the valves v11 and v12 described above and flows into the pump 32. It is connected to the pump 32 via a pipe.

The liquid feeding circuit includes a pipe for branching the liquid feeding port of the filter 31 to two places of the liquid tank 11 through the manual opening / closing valve v14 and the temperature control circuit 45 and two manual opening / closing valves v15. Doing. In addition, the communication with the liquid tank 11 may not be two places in this way, but may be one place or three or more places.

The discharge port of the circulation pump 32 is connected to the liquid supply port of the filter 31 via the check valve v16.

The filter 31 may employ various types corresponding to the type of liquid and the amount of the filtrate. Here, the liquid pressurized into the filter passes through a filter floor having a pre-coating layer made of a suitable filter aid, whereby impurities are filtered out and purified. The filtration unit 4A, 4B described later also has the same type of filter in the apparatus 6 for liquid mixing and liquid level position control.

In addition, the liquid feeding circuit is provided with an empty liquid tank replacing apparatus 51 (see FIGS. 1 and 3) for restoring the liquid structure that changes due to deterioration and consumption of the plating liquid in one liquid tank and performing filtration to remove accumulated impurities. It is.

The temperature control circuit 45 and the empty liquid tank replacing apparatus 51 in the circulation filtration device 3 replace the temperature control circuit 45 and the empty liquid tank in the circulation filtering apparatuses 4A and 4B described below. Since the basic structure is the same as that of the device 51, the circuit 45 and the device 51 will be described later in the filtering device 4A, and the temperature control circuit 45 and the device 51 will be described later. Is omitted.

Since the circulating filtration device 4A and the circulating filtration device 4B are of the same structure and function, only the device 4A is described, and the description of the device 4B is omitted. In the apparatus 4A and 4B, the same code | symbol is attached | subjected about the same component in drawing.

As shown in FIG. 1, the circulation filtration device 4A includes a filter 41 and a circulating pump 42 for liquid circulation (here, a centrifugal pump). The liquid tanks 12 and 13 can communicate with the suction port of the circulation pump 42 via the liquid absorption circuit. The filter 41 can communicate with the liquid tanks 12 and 13 via a liquid feeding circuit.

The liquid absorption circuit,

A first suction head 104 and a second suction head 106 (not shown in FIG. 1, see FIG. 2, etc.) in each of the liquid tanks 12, 13, and

Liquid manifolds (431, 432, 430),

One pipe manifold (v), one through the opening and closing valves (v41, v42) of the suction port (104a; see Fig. 6, 106a; see Figs. 6, 7) of the suction head (104, 106) of one liquid tank (12), respectively. Piping connected to the branch pipe of 431);

The manifold portions 432 of the suction heads 104 and 106 of the other liquid tank 13 pass through the same manual opening and closing valves v41 and v42 as those of the liquid tank 12, respectively. Piping connected to the branch pipe)

Pipes connecting the main openings of the manifolds 431 and 432 to the branch pipes of the manifold 430, and the main openings of the manifold 430 to the suction port of the circulation pump 42 through the manual opening / closing valve v43. Contains piping.

When the third suction head 108 is employed in the liquid tanks 12 and 13, the liquid sucked by this is finally mixed and joined to the liquid sucked through the valves v41 and v42, and the pump 42 The pipe 42 is connected to the pump 42 via a valve, a manifold, or the like so as to flow into the pump.

Remittance circuit,

Piping for connecting the liquid supply port of the filter 41 to the main opening of the liquid distribution manifold 433 via the manual shut-off valve v44 and the temperature control circuit 45;

A pipe for branching one branch pipe of the manifold 433 to two places of the liquid tank 12 via two manual on / off valves v45;

A pipe for branching the other branch pipe of the manifold 433 to two places of the liquid tank 13 via two manual open / close valves v45 similar to the case of the liquid tank 12 is included.

The discharge port of the pump 42 is connected to the liquid supply port of the filter 41 via the check valve v46.

The filter 41 is of the same type as the filter 31 in the circulation filter 3. Other types may also be used.

In the liquid feeding circuit, one liquid tank is selected from the two liquid tanks 12 and 13, and an empty liquid tank for restoring the liquid structure that changes due to deterioration and consumption of the plating liquid in the liquid tank, and performing filtration to remove accumulated impurities. The device 51 (refer FIG. 3) is attached.

As shown in FIG. 3, the temperature control circuit 45 connects the flow regulating valve V in parallel to the circuit which connected the manual switching valve (va '), the heat exchanger (451), and the manual switching valve (vb') in series. The inlet of the heat exchanger inlet valve (va ') and the inlet of the flow rate adjusting valve (V) are connected to the valve (v44) (filter on the filter outlet side) through the liquid distribution manifold 452, The outlet of the valve vb 'and the outlet of the flow regulating valve V are connected to the above-described liquid distribution manifold 433 through the liquid tank.

The temperature control circuit 45 in the circulation filter 3 is basically the same structure as the temperature control circuit 45 in the circulation filter 4A, 4B. However, in the temperature control circuit 45 in the circulation filtration device 3, the outlet of the valve corresponding to the valve vb 'and the valve corresponding to the flow rate adjusting valve V are connected to one pipe without intervening the manifold. And two branch openings of the liquid tank 11 via two manual on / off valves v15.

As shown in FIG. 3, the empty liquid tank changer 51 pipes the liquid supply port of the filter 41 so as to communicate with the empty replacement liquid tank 511 via the manual opening / closing valve v51, and at the same time, the pump 42. ) Is connected to a conventional foot valve (v53) provided at the bottom of the empty replacement liquid tank (511) via a manual opening / closing valve (v52).

The empty liquid tank replacing apparatus 51 in the circulation filtration device 3 is also basically the same structure as the empty liquid tank replacing apparatus 51.

When the "manifold" of the said and late term mentioned in this specification is demonstrated here, a manifold includes the closed manifold main body of which the one end was closed, and the some branch pipe connected to this. And a circulating filtration device using the manifold in a liquid absorption circuit from a liquid tank by a circulation pump and a liquid feeding circuit from a filter to a liquid tank, each of a plurality of branch pipes each having the same or different cross-sectional area provided in the body of the manifold. The amount of liquid passed through the liquid absorption or the liquid supply from the liquid crystal is determined by the cross-sectional area of the branch pipe.

In other words, in each of the plurality of branch pipes, the amount of liquid per unit cross-sectional area is markedly blocked, for example, by the precoating layer of the filtration aid of the filter beyond the allowable range for removing impurities, and the pressure difference before and after the precoating layer, in other words, the filter. Unless there is a flaw in the pressure difference between the stock solution chamber and the filter chamber, the amount is substantially the same, and each branch pipe obtains the required amount of liquid flow based on the same amount of liquid flow per unit cross-sectional area. Has a cross-sectional area. The manifold body has the same cross-section over approximately the entire length in the cylinder constituting this, and has a cross-sectional area slightly larger than the total cross-sectional area of a plurality of manifolds. The pressure in the manifold body is placed under the same negative pressure or positive pressure under the same cross-sectional area over approximately the entire length in the cylinder, so that a predetermined amount of liquid flow for each branch pipe can be obtained without being insufficient.

Returning to the beginning again and continuing the explanation, the manifold not shown in the liquid-flow manifold 33 and the temperature control circuit 45 in the circulating filtration device 3 described above, and the circulating filtration devices 4A and 4B. The manifolds 431, 432, 430, the liquid distribution manifold 433, and the manifold 452 of the temperature control circuit 45 all have basically the same structure as the manifold shown in FIG. 9. The material is made of vinyl chloride resin (PVC), and the material of the manifold shown in FIG. 10 described later is the same. These manifolds may also be made of other materials, for example, other synthetic resins or metals.

That is, the manifold 33 for liquid flow in the circulation filtration device 3, the manifold not shown in the temperature control circuit 45, and the manifolds for liquid flow in the circulating filtration devices 4A and 4B 431, 432. 430, the manifold 433 for the liquid distribution and the manifold 452 of the temperature control circuit 45 is not limited to any of them as shown in Figure 9, but here the manifold body 401 of the cross-section circular and It is not limited to the two connected, but here, it consists of the branch pipes 402 and 403 of a circular cross section. The manifold main body 401 is a closed cylinder having a main opening 401a for connecting the other tube to one end and having a substantially uniform inner diameter (a substantially uniform cross-sectional area of liquid flow) in which the other end 401b is closed.

The cross-sectional areas of the openings 401a of the manifold body 401 under positive or negative equal pressure with respect to the branch pipes 402 and 403 are respectively given to the branch pipes 402 and 403 which give a desired amount of liquid flow. It has a cross-sectional area corresponding to the total cross-sectional area.

In addition, the cross-sectional area of the manifold main body 401 has a cross-sectional area slightly larger than the opening portion 401a as a cross-sectional area with a margin relative to the total cross-sectional area of the plurality of branch pipes.

The branch pipes 402 and 403 protrude into the manifold body from the direction orthogonal to the longitudinal direction of the manifold body in two places in the longitudinal direction of the manifold body 401, and each of the branch pipes 402 and 403. The projection degree (protrusion insertion height) (alpha) to the manifold main body of the said manifold is in the range of about 1/2 or more and 3/5 or less of the inner diameter R of the main body 401.

The protruding insertion height of the branch pipes 402 and 403 into the manifold body 401 is equal to the pressure (negative or negative pressure) in the manifold body under the suction pressure (negative pressure) or the liquid supply pressure (negative pressure) of the pump applied to the manifold body. Positive pressure).

The manifold body 401 is connected to the two branch pipes 402 and 403 in a liquid-tight manner by adhesive, welding, or the like.

In addition, the basic structure of the manifold shown in FIG. 10 demonstrated later, the manifold main body 600, and branch pipe | tubes 601-605 is the same as the manifold demonstrated above.

In any of the manifolds, the connecting portion of the branch pipe to the manifold main body is not particularly limited and can be connected to any site around the manifold main body depending on the configuration of the liquid circuit. In addition, the angle of the branch pipe in the connection may not necessarily be a direction orthogonal to the longitudinal direction of the manifold body.

According to the manifold having such a structure, when the suction port of the liquid circulating pump is connected to the main opening 401a of the manifold main body 401 and used as a manifold for liquid flow, that is, the suction pressure (negative pressure) of the pump, that is, within the manifold body The hydraulic pressure (suction pressure) is equalized at each part in the manifold body, so the amount of liquid absorbed from each branch pipe 402, 403 into the manifold body 401 depends on the liquid flow cross-sectional area of each branch pipe.

In addition, when the discharge port of the pump is connected to the main opening 401a of the manifold body 401 and used as a liquid distribution manifold, the discharge pressure (negative pressure) of the pump, that is, the hydraulic pressure (positive pressure) in the manifold body, is defined in each part of the manifold body. In this way, the amount of discharged liquid from each branch pipe 402, 403 is in accordance with the liquid flow cross-sectional area of the branch pipe.

Here, the manifold having such a structure is the manifold 33 in the circulating filtration device 3 and the manifold not shown in the temperature control circuit 45 and the manifold for liquid flow in the circulating filtration devices 4A and 4B ( 431, 432, 430, the liquid distribution manifold 433, and the manifold 452 of the temperature control circuit 45, so that the liquid from the inner bottom groove 102 and the overflow box B2 of the liquid tank by a predetermined amount In the circulating filtration device 3, the liquid after the filtration can be returned to the liquid tank 11, and the plural liquids for the circulating filtration devices 4A and 4B provided for the plural liquid tanks. The liquid after filtration can be returned to the tank by a predetermined amount, and in each of the temperature control circuits 45, as shown in FIG. 3, a manifold 452 is provided, and any heat exchanger set by the flow regulating valve V is provided. The flow can be easily sent to the heat exchanger.

Moreover, the manifold 9 employ | adopted conventionally has the liquid opening main opening part 91a in one place, as shown in FIG. 15, and branch pipe | tube 92 in several places except the position of this main opening part 91a. ) Is connected. The branch pipe 92 is connected by connecting one end of the branch pipe to the hole 91b provided in the wall of the manifold body 91.

However, in such a conventional manifold, the hydraulic pressure does not act uniformly at each part of the entire length of the manifold body, and in particular, when the filtration pressure in the filter has risen with the removal of impurities, for example, the filtration pressure is allowed in the filter itself. Even in the range, the hydraulic pressure does not act uniformly in each part. For example, when a liquid is introduced into the manifold main body 91 under positive pressure from the main opening 91a by a pump, the branch pipe close to the main opening 91a is applied to the branch pipe. A large amount of liquid flows out, and at each position sequentially away from the main opening portion 91a, the liquid pressure decreases due to the outflow of the liquid into the branch pipe at a position before it, and only a small amount of liquid flows out into the branch pipe at that position. I never do that.

On the other hand, in the case where liquid is introduced from the outside into the branch pipe 92 under the liquid absorption pressure (negative pressure) by the pump, and the liquid is sucked from the main opening 91a, a large amount of liquid comes from the branch pipe close to the main opening 91a. However, as the sequential distance from the main opening 91a decreases, the liquid suction action of the pump decreases, and only a small amount of liquid can be sucked from the branch pipe 92 at that position.

Such a manifold may be employed in a liquid circuit for filtration of the processing liquid, a liquid circuit for homogeneously holding the processing liquid in a plurality of liquid tanks described later, and a liquid circuit for controlling the liquid surface position in each liquid tank. This will impair the filtration treatment, the maintenance of the treated liquid quality and the liquid level control.

In order to solve such a problem, a flow control valve 90 must be provided in each branch pipe. However, this increases the cost and reduces the amount of filtration and the pipe resistance which decrease with the passage of time depending on the amount of filtration removal of impurities. In order to equalize the reduction of the amount of the liquid to each of the liquid absorbing pipes and the liquid feeding pipes, and the like, it is necessary to pay attention to the adjustment of the opening degree and the throttle degree of the flow regulating valve 90.

In this regard, according to the manifold having the structure shown in FIG. 9, it is not necessary to provide a flow rate adjusting valve 90 for adjusting the flow rate in each branch pipe as shown in FIG. It can be obtained easily and inexpensively.

Next, the above-described filtration device and the like will be described from the convenience filtration device 4A in the description.

According to the circulating filtration device 4A, in a normal circulating filtration,

The valves v41 to v45 described above are opened,

The valves va ', vb', and V in the temperature control circuit 45 are each set to any predetermined opening degree (may be left open at all times),

The manual shut-off valves v51 and v52 leading to the empty liquid tank replacement device 51 are closed.

Then, by operating the circulation pump (centrifugal pump in this example) 42, the precipitant impurities are mainly transferred from the inner bottom grooves 102 of the liquid tanks 12 and 13 to the first suction head 104 via the valves v43. When the plating liquid to be contained is sucked and the third suction head 108 is also provided at another portion of the bottom of the tank as shown by the broken line in FIG. 3, the bottom of the tank and the vicinity of the bottom of the tank are also removed from the third suction head. A part which sucks the plating liquid containing an impurity, flows with the plating liquid beyond the banks 21 and 22 to the overflow boxes B1 and B2 in each of the liquid tanks 12 and 13, and collects in the box B2. Oily impurities are sucked together with the plating liquid in the box B2 by the second suction head 106, and these impurities are filtered by the filter 41, and the plating liquid after filtration is returned to two places of the respective liquid tanks 12 and 13 again. Can be. Thus, since the liquid after filtration is returned to several places instead of one place of each liquid tank, the cleanliness of a liquid improves in each part of the said liquid tank by that much.

During this circulation filtration, the plating liquid is controlled to a predetermined temperature by the heat exchanger 451 in the temperature control circuit 45.

When the plating treatment device starts operating immediately after a holiday, holiday, or the like, and when the temperature of the plating liquid deviates significantly from the predetermined temperature, the flow rate regulating valve in the temperature control circuit 45 until the temperature reaches or approaches the predetermined temperature. The predetermined plating liquid working temperature can be quickly obtained by throttling or closing (V) and intensively flowing the plating liquid to the heat exchanger 451.

By the way, in general, in the case of an article processing liquid tank, impurities in the treatment liquid which are attached to the object to be treated from the beginning, impurities which are attached to the object to be treated as impurities generated during the pretreatment of the object to be treated, and in the treatment liquid Impurities generated by electrolysis, deterioration, etc. increase during the treatment of the object, and impurities accumulate day by day, which causes frequent cleaning restoration of the filter floor and replacement of empty liquid tanks and filtration that incur high costs. You must do it.

For example, an article plating solution tank may include impurities impregnated and introduced into the object to be treated from the beginning, impurities impregnated and introduced into the object as impurities generated during the pretreatment of the object, and Impurities caused by electrolysis of the anode during the treatment of the object to be treated, deterioration of the processing liquid, impurities that may fall into the liquid tank from the outside, etc. rise, resulting in the accumulation of impurities day by day. Washing restoration work and empty liquid tank replacement filtration must be carried out. In addition, for these operations, the production of plated products, the increase of overtime, the increase of labor costs, the loss of expensive plating solution, the increase of the management cost of various chemicals and drainage, the excessive consumption of energy such as electricity, The price of plated products will increase significantly.

Taking the empty liquid tank replacement filtration as an example, the frequency of performing the empty liquid tank replacement filtration depends greatly on the quality of the liquid, the type of the product, and the like, but it is approximately 1 to 3 months. Empty liquid bath replacement filtration is used to perform treatment such as activated carbon treatment and inorganic filtration to remove inorganic and organic impurities, thereby restoring and restoring the liquid composition and returning the restored liquid to the original liquid bath.

In the plating process tanks 11-15 demonstrated now, the empty liquid tank replacement filtration process is performed as follows.

That is, when performing empty liquid tank replacement filtration of the plating liquid in the liquid tank 12, in the circulating filtration apparatus 4A,

The valve v42 on the side of the liquid tank 12, the valves v41 and v42 on the side of the liquid tank 13, the valve v44 leading to the inlet of the temperature control circuit 45, and the valve v52 of the empty liquid tank replacement device 51. ),

The valve v51 in the empty liquid tank replacing apparatus 51 is opened together with the valve v41 on the side of the liquid tank 12 and the valve v43 leading to the suction port of the pump 42,

The pump 42 is operated.

Thereby, the valve v41 on the side of the liquid tank 12, the manifold 431, the manifold 430 (not shown in FIG. 3, see FIG. 1), the valve v43 on the pump suction side, the pump 42, the check valve ( v46), the plating liquid in the liquid tank 12 can be collect | recovered to the empty replacement liquid tank 511 via the filter 41 and the valve v51. The liquid recovered by the empty replacement liquid tank 511 is subjected to activated carbon filtration treatment, liquid composition restoration processing, and the like.

For reflux from the empty replacement liquid tank 511 of the processed liquid to the liquid tank 12,

The valve v51 of the empty liquid tank replacing apparatus 51, the valve v43 leading to the suction port of the pump 42, and the valve v45 on the liquid tank 13 side are closed,

Open the valve v52 of the empty liquid tank replacement device, the valve v44 leading to the temperature control circuit 45, the valve V of the temperature control circuit 45, and the valve v45 on the liquid tank 12 side,

The pump 42 is operated.

As a result, the plating liquid recovered from the foot valve v53 at the bottom of the empty replacement liquid tank 511 is sucked, and the valve v52, the pump 42, the check valve v46, and the filter 41 of the empty liquid tank replacement device are ), The valve v44, the manifold 452 of the temperature control circuit 45, the valve V, and the manifold 433 are returned to the liquid tank 12 from the valve v45 on the liquid tank 12 side.

On the other hand, when performing empty liquid tank replacement filtration of the plating liquid in the liquid tank 13, in the circulation filtration apparatus 4A,

The valve v42 on the liquid tank 13 side, the valves v41 and v42 on the liquid tank 12 side, the valve v44 leading to the temperature control circuit 45, and the valve v52 of the empty liquid tank replacement device 51 are Close it,

The valve v51 in the empty liquid tank replacing apparatus 51 is opened together with the valve v41 on the side of the liquid tank 13 and the valve v43 leading to the suction port of the pump 42,

The pump 42 is operated.

Thereby, the valve v41, the manifold 432, the manifold 430, the valve v43 on the pump suction side, the pump 42, the check valve v46, the filter 41, and the valve The plating liquid in the liquid tank 13 can be recovered to the empty replacement liquid tank 511 via v51). The liquid recovered by the empty replacement liquid tank 511 is subjected to filtration treatment and the like.

For liquid return from the empty replacement liquid tank 511 to the liquid tank 13,

The valve v51 of the empty liquid tank replacing apparatus 51, the valve v43 leading to the suction port of the pump 42, and the valve v45 on the liquid tank 12 side are closed,

Open the valve v52 of the empty liquid tank replacement device, the valve v44 leading to the temperature control circuit 45, the valve V of the temperature control circuit 45, and the valve v45 on the liquid tank 13 side,

The pump 42 is operated.

As a result, the plating liquid recovered from the foot valve v53 at the bottom of the empty replacement liquid tank 511 is sucked in, so that the valve v52, the pump 42, the check valve v46, and the filter of the empty liquid tank replacement device 51 are sucked. Returning from the valve v45 on the side of the liquid tank 13 to the liquid tank 13 via the valve 41, the valve v44, the manifold 452 of the temperature control circuit 45, the valve V, and the manifold 433. do.

In this way, the empty liquid bath replacement filtration of the plating liquid of the liquid tanks 12 and 13 can perform the empty liquid tank replacement filtration of the whole amount of each plating liquid of each liquid tank individually.

The empty liquid bath replacement filtration treatment of the plating liquids of the liquid tanks 12 and 13 can be performed separately, so that when the two tanks are liquid exchanged, the empty replacement liquid tank 511 must be made larger in capacity. This is because the space for the installation of the 511 is large, and it is connected at a high cost, and the reason why the empty liquid tank replacement filtration is required is that it often occurs for each tank.

In addition, in the case where there is a space for installing the large capacity empty replacement liquid tank 511, the empty liquid tank replacement filtration may be performed at once for two tanks.

Also in the circulation filtration device 4B, the plating liquids of the liquid tanks 14 and 15 can be circulated filtered similarly to the case of the filtration device 4A. Moreover, temperature control of a plating liquid can also be performed. In addition, the plating liquids of the liquid tanks 14 and 15 can each be completely replaced by the empty liquid tank replacement filtration.

According to the circulating filtration device 3, in the normal circulating filtration, the above-mentioned valves v11 to v15 are opened, and the on-off valve and the flow regulating valve in the temperature control circuit 45 are set to predetermined opening degrees, respectively, and are empty. The on-off valve leading to the liquid tank replacement device 51 is closed. Then, by operating the circulation pump 32, the precipitant impurities are mainly sucked together with the plating liquid from the inner bottom groove 102 of the liquid tank 11 to the second suction head 104, and as shown by the chain lines in FIG. When the 3rd suction head 108 is also provided in the other part of the bottom of a tank, the 3rd suction head also sucks in the plating liquid containing the impurity of the bottom part and its vicinity in a liquid tank.

On the other hand, the second suction head in the box B2 is a floating impurity that flows with the plating liquid beyond the weirs 21 and 22 to the overflow boxes B1 and B2 attached to the liquid tank 11 and collects in the box B2. At 106, these impurities are sucked together with the plating liquid, and these impurities are filtered by the filter 31, and the plating liquid after the filtration can be returned to two places of the liquid tank 11 again. Thus, since the liquid after filtration is returned to several places instead of one place of the liquid tank 11, the cleanliness of a liquid improves in each part of the liquid tank 11 by that much.

During this circulation filtration, the plating liquid may be controlled at a predetermined temperature by the temperature control device 45.

When the plating treatment device starts to operate during the holidays and immediately after holidays, etc., when the temperature of the plating liquid deviates greatly from the predetermined temperature, the flow rate regulating valve V in the temperature control circuit 45 is set until the predetermined temperature is approached or close to the predetermined temperature. The desired plating solution temperature is quickly obtained by throttling or closing to intensively flow the plating solution into the heat exchanger.

When performing empty liquid tank replacement filtration of the plating liquid in the liquid tank 11, the valve v11 on the side of the liquid tank 11 is changed in the filtration apparatus 3 similarly to the empty liquid tank replacement apparatus 51 of the liquid tanks 12 and 13 mentioned above. To open and close the valve v12, and also close the valve v44 leading to the temperature control circuit 45 and the valve v52 of the device 51, and open / close valve v51 for feeding the empty replacement liquid tank 511. ), The plating liquid in the liquid tank 11 can be recovered to the empty replacement liquid tank by the operation of the pump 32.

The plating liquid recovered and regenerated and recovered can be returned to the liquid tank 11 in the same manner as the liquid tanks 12 and 13 by the empty liquid tank replacement device 51.

The above-described plating apparatus further includes an apparatus for liquid mixing and liquid level control for controlling the liquid level in each liquid tank to a predetermined position while recovering and mixing the plating liquid from each of the liquid tanks 11 to 15 to return to each liquid tank again. (6) is provided. This will be described below.

The apparatus 6 for liquid mixing and liquid level control, as shown in FIG.

From each overflow box B2 of the liquid tanks 11 to 15, the manual on / off valve v71, the first manifold J1 for liquid flow and the second manifold J2 for liquid flow, and also the manual on / off valve v62 A circuit for inducing liquid to the suction port of the pump 61 via

The third manifold for liquid flow from the overflow box B2 of the liquid tanks 11 to 15 via a manual open / close valve v61 and a liquid discharge valve Va (for all five) corresponding to each liquid tank. (J3), a circuit capable of inducing liquid from the third manifold J3 to the suction port of the pump 61 via the second manifold J2 and the manual opening / closing valve v62;

From the discharge port of the pump 61, through the check valve Vo and the filter 60, it passes through the manual on-off valve v63, the 4th manifold J4 for liquid distribution, and the 5th manifold J5 for liquid distribution, respectively. 11, 12, 13, 14, and 15) to induce the liquid,

Corresponding to the valve v63, the fourth manifold J4, the sixth manifold J6 for liquid distribution, and each of the liquid tanks through the check valve Vo and the filter 60 described above from the discharge port of the pump 61. The circuit which can guide | induce liquid to each liquid tank 11, 12, 13, 14, 15 through the liquid supply electric valve Vb (all five are provided), and the manual opening / closing valve v64 is provided.

The apparatus 6 for liquid mixing and liquid level control again includes a liquid level position detecting device 62 installed in the overflow box B2 of each liquid tank.

The liquid discharge electric valve Va and the liquid supply electric valve Vb are all valves provided with a valve opening / closing drive motor here.

In addition, the illustrated plating apparatus includes a control unit 7 for controlling the operation of the entire apparatus as shown in Fig. 11A, and a part of the control unit 7 performs the liquid mixing and liquid surface position control described now. A part of the apparatus 6 for this is comprised.

The operation panel 71 is connected to the control unit 7, and a switch or the like for starting or stopping each pump is mounted therein.

As shown in Fig. 11A, each of the pumps 32, 42, 42, and 61 is connected to the control unit, operates on the basis of the instruction from the control unit, and is liquid mixed and liquid level. A liquid discharge electric valve Va, a liquid supply electric valve Vb, and a liquid level position detection device 62 corresponding to each liquid tank in the apparatus 6 for position control are also connected to the control unit.

Each of the liquid level position detecting devices 62 has the same structure, and all of the five electrode bars 621 inserted into the overflow box B2 by hanging from the top as shown in the schematic configuration in FIG. To 625).

These electrodes are long in the order of the electrodes 621, 622, 623, and 624, and are inserted into the box B2 deep in this long order. The electrode 625 is an earth electrode, and is inserted into the box B2 approximately equal to or deeper than the electrode 624.

In the overflow box B2 of each liquid tank, the electrode rod 621 is an electrode rod for detecting the upper limit of the abnormal liquid level, and the electrode rod 622 is an electrode rod for detecting this when the liquid level position reaches the upper limit of the allowable range. The electrode rod 623 is an electrode rod that detects the liquid level when the liquid level reaches the lower limit of the allowable range, and the electrode rod 624 is an electrode rod that detects that the liquid is dried in the overflow box.

In any of the tanks 11 to 15, when the liquid level of the liquid contained in the box overflows beyond the weirs 21 and 22 in this tank, that is, within the range of the predetermined upper and lower limits, that is, the box ( When the liquid level in B2) is located below the lower end of the electrode rod 622 and above the lower end of the electrode rod 623, the liquid drain valve (Va) corresponding to the liquid tank, the electric valve for liquid supply Vb continues to be discharged and supplied to the liquid tank while all of them are opened under the direction of the control unit 7.

However, in any one of the tanks, if the liquid level of the liquid contained in the box B2 beyond the weirs 21 and 22 in this tank increases beyond a predetermined range and comes into contact with the lower end of the electrode rod 622, the control unit. Under the instruction of (7), the liquid supply electric valve Vb, which is in communication with the liquid tank via the valve v64 (normally open), is closed so that the liquid supply to the liquid tank is stopped, while the liquid is discharged. The electric valve Va is opened and the liquid is discharged from the liquid tank via the valve v61 (normally open).

At this time, the liquid discharged through the valve v71 (normally open) and the manifold J1 separately from the discharge circuit via the electric valve Va is provided in the manifold J2. The condensate with the discharge liquid from J3 is sucked into the pump 61 via the valve v62.

In any of the liquid tanks, when the liquid level in the tank falls and falls from the lower end of the electrode rod 623, the liquid discharge electric valve Va is closed under the instruction of the control unit 7, while the liquid supply electric valve Vb is closed. ) Is opened and fed to the liquid tank via a valve v64. At this time, the liquid is pumped from the pump 61 through the check valve Vo, the filter 60, and the branch pipe J6, the electric valve Vb, by one of the branch pipes of the two branch pipes of the manifold J4, While returning to the liquid tank via the valve v64, it is returned to the manifold J5 from the other branch pipe of the manifold J4, and to the liquid outlet 63 to the liquid tank again.

And ① in the circulation filtration device 6, the amount of discharged liquid from the valve v61 in the suction circuit of the pump 61 via the electric valve Va and the valve v71 without passing through the electric valve Va. ), The total discharge amount of the liquid discharged through the manifolds J1 and J2, ② the amount of liquid returned to the liquid tank via the electric valve Vb and the valve v64 in the pumping circuit of the pump, and electric It is initially set so that the total liquid supply amount of the liquid amount returned from the liquid outlet port 63 to the liquid tank via the manifolds J4 and J5 without passing through the valve Vb will be approximately the same value.

In addition, operation of the pump 61 is continued in the meantime.

In the overflow box B2, when the liquid level of the processing liquid is lower than the predetermined height due to an unexpected situation or the like and the liquid level falls from the electrode rod 624, or the liquid level of the processing liquid is higher than the predetermined height, the liquid level is increased. In contact with the electrode rod 621, not only the pump 61 but also all the pumps are emergency-stopped under the direction of the control unit 7 in both the former and the latter cases. For safety management, an alarm may be provided in this case.

The manifolds J1 to J3 have liquid absorbing spaces for absorbing liquid and at the same time exclude the manifold body having a liquid flow main opening in communication with the liquid absorbing space, and the main opening position of the manifold body. The branch pipes are provided in succession in a plurality of predetermined places, and the liquid flows into the branch pipes, joins in the manifold body, and flows out from the main opening.

The above-described liquid distributing manifolds J4 to J6 include a manifold main body having a liquid dispensing space for feeding liquid and having a liquid dispensing main opening in one place, and a position of the main opening of the manifold main body. Branch pipes are provided in succession at a plurality of predetermined positions to be removed, and the liquid flows into the main opening and flows away from each branch pipe.

Each of the first manifold J1 and the third manifold J3, and also the fifth manifold J5 and the sixth manifold J6, is provided with the same number of branch pipes as the number of liquid tanks (here, five). , Two branch pipes are provided for the second manifold J2 and the fourth manifold J4. The manifold J2 and the liquid distribution manifold J4 employed in the apparatus 6 have the same basic structure as the manifold of the structure shown in FIG. 9 employed in the circulating filtration apparatus, It is possible to obtain the amount of liquid passing through the liquid distribution cross section. In addition, both the liquid-flow manifolds J1 and J3 and the liquid-distribution manifolds J5 and J6 employed in the apparatus 6 have the same structure as that of the manifold shown in FIG. 10, and the fabrication material is made of vinyl chloride resin (PVC). Is due. These manifolds may be made of other materials, for example, other synthetic resins or metals, depending on the quality of the treatment liquid.

That is, each of the manifolds J1, J3, J5, J6 is not limited to that, as shown in Fig. 10, but here, the manifold body 600 having a cross section and five connected to it are Although not limited, it is made of the branch pipes 601, 602, 603, 604 and 605 of the cross section here.

The manifold main body 600 has a main opening 600a for connecting the other pipe to one end, and is a closed cylinder having a substantially uniform inner diameter (approximately uniform liquid flow cross-sectional area) in which the other end 600b is closed.

And the cross-sectional area of the opening part 600a of the manifold main body 600 under positive or negative equal pressure with respect to branch pipe | tube 601-605 is branch pipe | tube 601-605 which respectively provide the predetermined | prescribed amount of liquid flow required. ) Has a cross-sectional area corresponding to the total cross-sectional area. The liquid flow cross sectional area of each branch pipe is the same here. In addition, the cross-sectional area of the manifold main body 600 has a slightly larger cross-sectional area than the opening portion 600a in terms of the cross-sectional area of the plurality of branch pipes with an allowable cross-sectional area.

The branch pipes 601 to 605 are inserted into the manifold body from the direction orthogonal to the longitudinal direction of the manifold body at five locations in the longitudinal direction of the manifold body 600, respectively, and into the manifold body of each branch pipe. The projecting degree (protrusion insertion height) of is in the range of about 1/2 or more and 3/5 or less of the inner diameter R 'of the main body 600.

The protruding insertion height of each of the branch pipes 601 to 605 into the manifold body 600 is equal to or lower than the suction pressure (negative pressure) or the liquid supply pressure (positive pressure) of the pump 61 that affects the manifold body. The pressure (negative or positive pressure) is kept under uniform pressure.

The manifold main body 600 is connected to the branch pipes 601 to 605 liquid-tightly by adhesive, welding, or the like.

Also in the manifold of this structure, when the suction port of the pump 61 is connected to the main opening 600a of the manifold main body 600 and used as a manifold for liquid flow, the hydraulic pressure (negative pressure) in the manifold main body becomes In this case, the amount of liquid absorbed from each branch pipe 601 to 605 into the manifold body 600 depends on the liquid flow cross-sectional area of the branch pipe. Here, the same liquid absorption amount is obtained.

In addition, when the discharge port of the pump 61 is connected to the main opening 600a of the manifold main body 600 and used as a liquid distribution manifold, the hydraulic pressure (positive pressure) in the manifold main body becomes uniform in each part of the manifold main body, and therefore, each part The amount of discharged liquid from the engines 601 to 605 is in accordance with the liquid flow cross sectional area of the branch pipe. Here, the same discharge liquid amount is obtained.

As described above, as the manifolds J1 to J6 (refer to FIG. 1), manifolds are adopted in each branch pipe to obtain the amount of liquid flow corresponding to the liquid flow cross-sectional area, whereby mutual liquid mixing of each liquid tank is continued. The control of the liquid surface position in each of the liquid tanks 11 to 15 performed while being performed can be performed appropriately in a state suitable for the liquid level height in each liquid tank, whereby the valves Va and Vb for liquid surface position control ( It is possible to reduce the number of open / close cycles (see FIG. 1), and to prolong the open / close cycle for that long time, and to prolong the durability of the electric valves Va and Vb.

According to the apparatus 6 for liquid mixing and liquid level control described above, when the liquid level in the overflow box B2 of each liquid tank is in the normal position, the valves Va and Vb are opened and the liquid circulation pump ( By operating 61, the liquid is sucked from the overflow boxes B2 of the plurality of liquid tanks 11 to 15 via the valves v61 and v71, and the liquid of each tank is the first manifold J1 for liquid flow. And each branch pipe of the third manifold J3, flows into and joins the main pipe of the manifold from the branch pipe, and flows from the manifold body to the branch pipe of the second manifold J2 for liquid flow again. The liquid is pumped into the liquid circulating pump 61 in a state where the liquids of the respective tanks are mixed through the main body.

Then, the liquid sucked into the liquid circulation pump 61 is discharged from the pump, filtered by the filter 60, and then flows into the main body of the fourth manifold J4 for liquid distribution, and again the fifth manifold for liquid distribution from the manifold. It flows into the main body of J5 and 6th manifold J6, and returns to each liquid tank 11-15 through each branch pipe of the said manifold.

In this way, the plating liquids sucked from the respective liquid tanks are joined in the manifolds J1 and J3, and again joined in the manifold J2, sucked into the liquid circulation pump 61, discharged, and again passed through the filter 60 to the fourth manifold. In the process of distributing to J4 and again in the fifth manifold J5 and the sixth manifold J6, the plating liquids from the plurality of liquid tanks 11 to 15 are mixed, and it is carried out continuously, whereby each liquid The plating liquid composition of the bath is kept homogeneous.

As described above, the liquid level position of each liquid tank is controlled.

In this way, the processing liquids in the respective liquid tanks can be mixed to continuously carry out production work under a uniform liquid composition. These liquid mixing and liquid level control are also achieved by one liquid circulation pump 61.

In this way, the processing liquid can be held homogeneously between the tanks, while the complexity, size, and cost of the device structure can be suppressed, and the fluctuation of the liquid level in each tank can be suppressed.

Also, as with the apparatus 6 for liquid mixing and liquid level control described above, at least for each of the circuits for introducing the liquid to the liquid circulation pump 61 and the liquid level position detecting device 62, the box B2 overflows. By providing it, plating with few obstacles can be performed in the part which accommodates the liquid before passing the bank part of a liquid tank. Moreover, in the overflow box which takes a large fluctuation of the liquid level with respect to the fluctuation of the liquid level in the whole liquid tank, the fluctuation of the liquid level position in a liquid tank can be detected more finely, and proper liquid level position control can be performed.

The filter 60 is smaller than the original filters 31 and 41 for circulating filtration which can cope with the amount of liquid flowing into the overflow box. As described above, one filter 60 may be sufficient.

Circulation filtration by the circulating filtration devices 3, 4A, and 4B of the plating liquid in the plating apparatus shown in FIG. 1 is about 3 for a liquid capacity of, for example, 1 liquid tank per hour according to the conventional method. Can be cycle filtered. In other words, the filtration amount may be about three times the capacity. In addition, the liquid treatment amount for liquid mixing and liquid level control by the circulating filtration device 6 may be, for example, an amount that circulates about 0.5 times per hour with respect to the liquid capacity of one liquid tank. That is, the filtration amount may be about 0.5 times the capacity as a standard.

For example, 5 m3 of normal liquid capacity in each of the five liquid tanks shown in FIG. In this case, the filtration amount per minute can be set as shown in the following table.

Filtration Recovery × Liquid Recovery × Liquid Tank ÷ Filtration Time = 1 Minute Filtration Filtration Device 3 3 × 5㎥ × 1 ÷ 60 minutes = 0.25㎥ / minute Filtration Unit 4A 3 × 5㎥ × 2 ÷ 60 minutes = 0.5㎥ / minute Filtration Unit 4B 3 × 5㎥ × 2 ÷ 60 minutes = 0.5㎥ / minute Filtration Unit 6 0.5 × 5㎥ × 5 ÷ 60 minutes = 0.208㎥ / minute

Next, the banks 21 and 22 (refer also FIG. 4) which face the overflow boxes B1 and B2 in each liquid tank 11-15 are demonstrated.

Since the banks 21 and 22 are the same for any of the tanks, the explanation will be given here as representative of what is provided in the tank 12. As for other liquid tanks, the following description is appropriate for the point of the recess.

The weir part 21 forms and installs the notch 20 for overflowing in the upper edge part of the partition wall w1 (refer FIG. 4) between the liquid tank 12 and the overflow box B1. The weir part 22 is provided by forming the notch (cutout part) 20 for overflow in the upper edge part of the partition wall w2 (refer FIG. 4) between the liquid tank 12 and the overflow box B2. . Here, the overflow notches 20 in the weirs 21 and 22 have the same shape and size.

Each notch 20 is an inverted triangular shape here, and multiple notches 20 are formed also in both of the recess parts 21 and 22. As shown in FIG.

Since the banks 21 and 22 in which the notches 20 for spilling are formed are adopted in this way, the liquid flows from the notches 20 into the overflow boxes B1 and B2. The liquid from 22) can flow into the overflow boxes B1 and B2 together with the floating impurities, and they can be sucked from the box to the pump as described above, and these aspirated liquids can be provided for filtration.

And since the liquids 21 and 22 which formed the notch 20 for liquid overflow were employ | adopted, and the liquid flowed from the said notch 20 to the overflow boxes B1 and B2, the liquid level in the liquid tank 12 was carried out. As long as the rising liquid level faces the notch 20 even if it rises slightly above the liquid level position for the desired liquid overflow, the overflow amount suddenly flows all at once over the entire length of the upper edge of the bank, as in the conventional rectangular bank. There is no case that the total amount of overflow overflows remarkably increases, and only the amount of overflow overflows by the increase of the liquid flow cross-sectional area by the rise of the liquid level in the said notch 20.

Moreover, even if the liquid level in the liquid tank 12 descends, as long as the lowered liquid level faces the notch 20, the amount of overflow is reduced all at once over the entire length of the upper edge of the bank, as in the conventional rectangular bank. The amount of overflow does not significantly decrease, and the amount of overflow only decreases by the decrease in the liquid flow cross-sectional area due to the lowering of the liquid level in the notch 20.

Therefore, even if there is a vertical fluctuation of the liquid level in the liquid tank 12, compared with the conventional rectangular weir, the amount of overflow overflows very gently or decreases. In other words, even if there is a vertical fluctuation of the liquid level in the liquid tank 12, compared with the conventional rectangular weir, the fluctuation of the overflow amount is very small.

In this way, the amount of liquid absorbed from the bottom of the liquid tank 12 (for example, about 70% of the amount of the circulating filtrate) set in accordance with the amount of circulation filtration appropriate to the filtration pump capacity for proper filtration of the liquid, and from the overflow box Proper filtration of the liquid is achieved by maintaining a liquid absorption amount (for example, about 30% of the circulating filtrate amount).

Moreover, we employ the banks 21 and 22 which formed the notch 20 for liquid overflow, and liquid flows from the said notch 20 to the overflow boxes B1 and B2, and the said notch 20 is a bank Since it extends in the depth direction of the liquid before exceeding (21, 22), not only the floating impurity which tends to float on the liquid level in the liquid tank 12, but also the impurity which floats in the lower layer more easily than that flows from the said notch 20. It is easy to flow into the overflow boxes B1 and B2, and it is also possible to collect and filter impurities that float in the lower layer than the liquid level.

In addition, there is also an advantage that the amount of overflow can be easily set by selecting the shape of the notch 20 (in particular, the angle of the bottom vertex angle and the depth of the notch) of the inverted triangle of the notch. In addition, the notch 20 shown may be an inverted triangle shape, a rectangular shape, or other shapes, such as a U-shape.

As shown in the figure, in the case of employing the inverted triangle notch, the lower vertex angle of the inverted triangle is not limited thereto, but may be about 40 ° to 90 °, more preferably about 50 ° to 60 °.

As shown in Fig. 12 (A), there is a conventional rectangular weir 200 having a width of 500 mm, and the standard liquid level of the liquid tank is at a position where h = 10 mm higher than the upper end of the rectangular weir 200. The standard liquid amount (predetermined liquid amount) flowing over 200) is about 55.2 L / min, and the liquid level of the liquid tank rises to h = 15 mm, 20 mm, and 25 mm, respectively. As shown in the table, it becomes 101.4 L / min, 156.1 L / min, and 218.2 L / min.

Here, instead of the rectangular weir 200, a rectangular notch N1 having a width of 40 mm as shown in FIGS. 12B, 12C, and 12D, a notch N2 having a lower vertex angle of 90 degrees, and an inverted triangle inverse When employing weirs 201, 202, and 203 having notches N3 each having a triangular bottom vertex angle of 60 degrees, to obtain the same standard overflow liquid 55.2 l / min as the rectangular weir 200, As

With respect to the weir part 201, when the number P of notches N1 is five, what is necessary is just to make the height h1 of the liquid flow cross section of each notch N1 into 18.4 mm.

With respect to the weir 202, if the number P of notches N2 is five, what is necessary is just to make the height h2 of the liquid flow cross section of each notch N2 to 28 mm.

In the case of the weir 203, if the number P of the notches N3 is four, the height h3 of the liquid flow cross section of each notch N3 may be 38.1 mm.

That is, in any of the weirs 201, 202, and 203 having a notch for liquid overflow, the notch extends in the depth direction of the liquid, so that the height from the upper end of the rectangular weir 200 to the liquid level (h = 10 mm) It is deeply cut out. As a result, it can be seen that not only the floating impurities which are liable to float on the liquid level, but also those which are liable to float in the lower layer can overflow from the notch.

In addition, when the liquid level of the liquid tank rises as h = 15 mm, 20 mm, and 25 mm, respectively, from the upper end of the rectangular weir 200, the amount of overflow liquid equal to the overflow liquid beyond the weir 200 is obtained. In other words, the number P of notches in each of the notched weaving portions 201, 202, and 203 and the heights h1, h2, and h3 of the liquid flow cross section in the notches are as shown in the following table. That is, even if the height of the liquid level changes from 5 mm (for h = 15 mm), 10 mm (for h = 20 mm), and 15 mm (for h = 25 mm) than the normal liquid position, In (201, 202, 203), it can be seen that the fluctuation of the overflow liquid amount can be suppressed smaller than that of the rectangular weir (200).

In the following table, M represents the amount of overflow liquid [l / min] in the rectangular weir 200, m represents the amount of overflow liquid [l / min] in each notch, and P represents the number of notches. . The unit of h, h1, h2, and h3 is [mm].

500 mm wide rectangular weir (200) Welded part 201 with a rectangular notch (N1) of width 40mm Wedged portion (202) with notch (N2) with bottom corner angle 90 degrees Wedged portion (203) with notch (N3) of bottom corner angle 60 degrees h M h1 m P h2 m P h3 m P 10 55.215 101.420 156.125 218.2 18.4 11.0 527.6 20.3 536.8 31.2 546.0 43.6 5 28.0 11.0 539.0 25.2 446.5 39.2 453.0 54.3 4 38.1 13.8 448.6 25.2 457.9 39.2 466.0 54.3 4

In addition, according to the so-called rectangular embankment where the upper edge extends in a horizontal straight line, even if the amount of liquid absorbed from the bottom of the liquid tank and the amount of liquid absorbed from the overflow box are set at a predetermined ratio according to the capacity of the filtration pump, Even with a slight increase, the overflow volume greatly increases, and the amount of liquid in the overflow box exceeds the liquid absorption capacity from the overflow box in the pumping capacity so that the liquid level in the liquid tank and the liquid level in the overflow box are near the same position. It has already been explained that there is a case that the drop becomes small, and eventually, it cannot be sufficiently recovered by the box overflowing the floating impurities. This point is explained further.

For example, in the electroplating solution treatment of articles, the circulating filtration amount of the plating liquid in the plating solution tank is different depending on the plated product, but it is regarded as a standard that the filtrate amount is approximately three times the amount of the treatment liquid in the solution tank per hour. Therefore, the circulating filtration amount of the liquid tank provided with the overflow boxes B1 and B2 as mentioned above which overflows a plating process liquid from the conventional so-called rectangular bank is as follows.

Width within tank Length in tank and length of bank Height (liquid depth) Amount Liquid 1.0m 10 m 1.1m Liquid level in liquid tank 11㎥ Box B1 0.2 m 10 m 0.3m Box B1 liquid 0.6㎥ Box B2 0.4 m 1m 0.5m Box B2 Liquid Level 0.2㎥ Total 11.8㎥

The circulation total filtration amount per hour with respect to the said liquid amount 11.8m <3>,

11.8 m 3 × 3 times = 35.4 m 3 / hr.

Then, the filtration amount of the processing liquid in the liquid tank and the overflow box is set to 70% and 30% of the total filtration amount, respectively, as follows.

Filtration amount of liquid in liquid tank 35.4㎥ / hr × 7O% = 24.8㎥ / hr Filtration amount of liquid in overflow box 35.4㎥ / hr × 30% = 10.6㎥ / hr Total 35.4㎥ / hr

By the way, the amount of overflow by the conventional rectangular weir is as follows when the height h (refer FIG. 12 (a)) from the top of a weir to a liquid surface is set to an average of h = 10 mm.

When h = 10 mm, when the weir width is 500 mm as described above, the overflow amount is approximately 55.2 l / min as described above, and the weft width is 10 m of the length of the box B1 and the length of the box B2. As it is 11m in total of 1m,

55.2 L / min ÷ 500 mm × 11 m × 60 minutes = 72.86 m 3 / hr, which greatly exceeds the amount of circulating filtrate 10.6 m 3 / hr set for the overflow box described above.

This is because the amount of liquid in the overflow box exceeds the liquid absorption capacity from the overflow box in the pumping capacity, and the liquid level in the liquid tank and the liquid level in the overflow box rapidly become near the same position, so that there is no drop, so that floating impurities are removed. This means that the overflow box cannot recover enough. As a result, a significant problem arises that the defective product increases, such as insufficient liquid filtration, resulting in adhesion of impurities to the surface of the plated product, resulting in roughness or the like.

In addition, since the liquid level in the liquid tank fluctuates due to the inflow of the liquid attached to the object in the pretreatment of the object to be processed, the extraction of the treatment liquid by the object, and the evaporation of water during the heating of the liquid by the heat exchanger. The adjustment of the level of liquid level in each tank and the amount of liquid inflow into the overflow box were frequently and cumbersome and important.

On the other hand, in the present invention, by adopting the embankment provided with the above-mentioned notch for liquid overflow, even if there is a vertical fluctuation of the liquid level in the liquid tank, the fluctuation of the overflow amount is small compared with the conventional rectangular weir, By maintaining the amount of liquid absorbed from the bottom of the tank and the amount of liquid absorbed from the overflow box, which are set according to the amount of circulating filtration suitable for the filtration pump capacity, proper filtration of the liquid is achieved, and further, the generation of defective products can be greatly reduced. Can be.

The banks 21 and 22 are fixedly formed by forming the notches 20 at the upper edges of the partition walls w1 and w2 between the liquid tank and the overflow boxes B1 and B2. For further convenience, a bank member that can be detachably installed on the upper edge of the partition wall between the liquid tank and the overflow box may be employed as the bank. FIG. 13 shows an example of such a detachable weir member, and FIG. 14 similarly shows another example of a detachable weir member.

13A is a perspective view of the weir member 8. Fig. 13 (b) shows the use state of the weir member, and is shown in cross section along the X-X line in Fig. 13 (a). The weir member 8 integrally forms the wall insertion portion 800 of the cross-sectional door shape (or U-shape) on the plate body 81 on which four rectangular notches 80 for liquid overflow are formed. The reinforcing ribs 83 are also integrally formed to avoid 80.

Although not limited thereto, the wall insertion portion 800 here is in the form of a concave portion, and is formed by integrally providing an L-shaped curved plate portion 82 in the middle portion of one surface of the plate body 81. Longer holes 82a for bolt penetration in the vertical direction are provided at the lower portion of the bending plate 82 and the plate 81 at the position overlapping with each other. The weiring member 8 is not limited thereto, but is formed here integrally with synthetic resins (for example, vinyl chloride resin (PVC) when the treatment liquid is an electroplating solution) with respect to the treatment liquid in the liquid tank. Doing.

This bank member 8 is inserted into the partition walls of the liquid tanks 11, 12, 13, 14, and 15 and the overflow boxes B1 and B2 from the upper side. FIG. 13 (b) shows a state in which the bank member 8 is inserted into the partition wall w2 between the liquid tank 11 and the overflow box B2 from the wall insertion portion 800 described above. 1 or 2 or more are used for the bank member 8 by balance of the liquid amount in a liquid tank, the size of the notch 80, etc. In the case where two or more are used, adjacent weir members 8 are brought into contact with each other and inserted into the partition wall w2. Although not shown, the same bank member as that of the bank member 8 is inserted into the partition wall w1 between the liquid tank and the overflow box B1.

As shown in Fig. 13A, when the weir member 8 is inserted into the partition wall w2, a height adjustment liner LN may be disposed in the upper inner side of the wall insertion portion 800 as necessary. The weir member 8 can be placed on top of the partition wall w2 either directly or via this liner Lin.

In the bank member 8 inserted into the partition wall w2 in this manner, for example, the bolt-hole long hole 182a and the wall w2 therefrom are formed from the L-shaped bending plate portion 82 side. The bolt 84 passes through the bolt hole of the inner diameter through which the installed bolt 84 can penetrate correctly, and the bolt hole long hole 82a of the plate body 81, and is tightly tightened with a nut. At this time, if necessary, the liquid sealing member 840 fitted to the bolt 84 is fixed to the outer surface of each of the bending plate portion 82 and the plate body 81, whereby the long hole 182a for bolt penetration is opened. Close part tightly.

In this way, the bank member 8 is attached to the partition wall between the liquid tank and the overflow box at a predetermined height, in other words, by setting the height position of the notch 80 at a height position to obtain a predetermined liquid overflow amount.

According to this bank member 8, since the notch 80 for liquid overflow is formed, there exists the same advantage as the bank part 21 or 22 which provided the notch 20 mentioned above.

Moreover, according to this weiring member 8, it is possible to easily set the overflowing amount by selectively adopting an appropriate weiring member among the weiring members 8 having various overflowing amounts, and the liner LN having a different height. The amount of overflow can be easily changed by changing the height of attachment of the weir member 8 or by replacing the weir member 8, for example.

The partition wall w2 or w1 is made of, for example, a metal material having low corrosion resistance with respect to the treatment liquid, and when the corrosion resistant synthetic resin or the like is coated on the surface thereof, the metal material exposed when the hole for passing the bolt 84 is provided. The back portion may be protected by inserting a corrosion resistant sealant into the bolt hole.

Fig. 14A is a perspective view of the weir member 8 '. Fig. 14 (b) shows the use state of the weir member, and is shown in cross section along the Y-Y line in Fig. 14 (a). The weiring member 8 'is a modification of the weiring member 8 described above, and the following points differ from the weiring member 8. Other points are the same as those of the weir member 8, and the same reference numerals are attached to the same parts as the weir member 8.

In this bank member 8 ', the long hole 82a for bolt penetration is formed also in the upper part of the board body 81 in which the rectangular notch 80 for liquid overflow was formed. Such long hole 82a is formed in the upper part of the both ends of the plate body 81 here. And the bent plate portion 82 of the L-shape is the horizontal portion of the upper portion at the outer position of the reinforcing ribs 83 at both ends of the plate body 81 is deleted.

Like the weir member 8, this weir member 8 'is also inserted into the partition wall w2 by the wall insertion part 800 as shown in FIG.14 (b). At this time, the rising wall W 'integrally extending upward from the upper end of the partition wall w2 in advance to correspond to the erased portion of the upper horizontal portion of the L-shaped curved plate portion 82 penetrates the plate body ( 81) Overlap both ends. Although not shown, the same bank member as the bank member 8 'is also inserted into the partition wall w1 between the liquid tank and the overflow box B1.

As in the case of the weir member 8, the weir member 8 'is not only bolted to the partition wall w2 at the lower portion of the plate body, but also bolted to the rising wall W' at the upper portion of the plate body 81. The nut (bo1t-nut) is fixed. That is, the bolt 84 'passes through the bolt hole of the inner diameter through which the bolt 84' pre-installed in the rising wall W 'can penetrate accurately, and the long hole 82a for the bolt-through of the plate body 81. Tighten tightly with nuts. At this time, if necessary, the liquid sealing member 840 fitted to the bolt 84 'is held close to the plate body 81, whereby the part where the long hole 82a for bolt penetration is opened is hermetically closed. In this way, the bank member 8 'is attached to the partition wall between the liquid tank and the overflow box at a predetermined height, in other words, by setting the height position of the notch 80 to a height position to obtain a predetermined liquid overflow amount.

This dam member 8 'also has the same advantages as the dam member 8. In addition, since the wall W 'corresponding to a part of the partition wall w2 is fixedly overlapped with a part of the bank member 8', the bank member 8 causes a dam to be damaged even when a large hydraulic pressure in the liquid tank is applied. In the member 8 'there is no such concern.

In the bank members 8 and 8 'described with reference to FIGS. 13 and 14, the notch 80 for the liquid overflow is a rectangular notch, but the notch for the liquid overflow also occurs in the bank members 8 and 8'. An inverted triangle notch in one weir 21 or 22 may be used, or another notch may be used.

In addition, in order to fix the dam members 8 and 8 'to the partition walls w1 and w2, the partition walls w1 and w2 are screwed into the dam members 8 and 8' instead of the through bolts 84 described above. Fixing the weir member to the partition wall may be employed by contacting the wall surface of the wall.

As described above, the present invention can provide a liquid tank having one or more overflow boxes for causing impurities floating in the upper layer portion of the liquid stored in the liquid tank to flow from the bank together with the liquid. have.

(1) Even if the position of the liquid level in the liquid tank fluctuates up and down, it does not cause significant fluctuations in the amount of liquid flowing into the overflow box over the bank like the conventional rectangular banks.

(2) Not only the floating impurities which are liable to float on the liquid level in the liquid tank, but also those which are liable to float in the lower layer can flow into the overflow box to be recovered efficiently.

(3) Therefore, the amount of impurities remaining in the liquid tank can be reduced by that much.

(4) When the liquid is absorbed by the pump from both the bottom of the liquid tank and the overflow box, and the liquid is filtered, the filtration can be performed efficiently.

(5) Therefore, when the article is processed by the treatment liquid in the liquid tank, the influence of impurities can be reduced to improve the quality of the article after the treatment.

(6) The setting of the amount of liquid flowing into the overflow box can be simplified.

Further, according to the present invention, the following advantages are provided as a weir member for providing the weir of a liquid tank having one or two or more overflow boxes for allowing impurities floating in the upper layer portion of the liquid stored in the liquid tank to flow along with the liquid from the weir. It can provide something to have.

(1) In the case where it is attached to a liquid tank and used as a recess, even if the liquid level position in a liquid tank fluctuates up and down, it does not cause the remarkable fluctuation of the amount of liquid which flows into a overflow box.

(2) Not only the floating impurities which are liable to float on the liquid level in the liquid tank, but also those which are liable to float in the lower layer can flow into the overflow box to be recovered efficiently.

(3) Therefore, the amount of impurities remaining in the liquid tank can be reduced by that much.

(4) When the liquid is absorbed by the pump from both the bottom of the liquid tank and the overflow box, and the liquid is filtered, the filtration can be performed efficiently.

(5) Therefore, when the article is processed by the treatment liquid in the liquid tank, the influence of impurities can be reduced to improve the quality of the article after the treatment.

(6) We can simplify setting, change of quantity of liquid flowing into overflow box.

Claims (8)

It has one or more overfow boxes for overflowing the impurity floating in the upper part of the liquid stored in the tank from the bank together with the liquid, The weir is formed by forming a notch for overf1ow at the upper edge of the partition wall between the overflow box and the liquid tank, or detachably attaching a weir member having a overflow notch. Tank made with. The method of claim 1, A plurality of notches providing the weir are provided, each notch is an inverted triangle or rectangular notch. A weiring member for providing the weir of a liquid tank having one or two or more overflow boxes for overflowing an impurity floating in an upper layer portion of a liquid stored in a liquid tank with a liquid, wherein a notch for overflowing is formed; Weft member, characterized in that removable from the upper edge portion of the partition wall between the overflow box and the liquid tank. The method of claim 3, wherein And a plurality of the notches, each notch being an inverted triangular or rectangular notch. The method of claim 1, It has an inner bottom groove formed by dropping one or two or more at the peripheral edge portion of the bottom in the liquid tank, characterized in that the inner bottom groove is provided with a first suction head for sucking from the inner bottom groove Tank made with. The method of claim 5, An aeration device is provided at the bottom of the liquid tank, and an air barrier wall is provided between the aeration device and the first suction head. The method according to any one of claims 1 and 5 or 6, A second suction head for sucking the liquid from the inner bottom part is provided in the inner bottom part of the overflow box. The method of claim 7, wherein A liquid tank, characterized in that the second suction head is connected upwardly from the second suction head and out of the overflow box, and at the same time, a suction pipe having an on / off valve near the upper end of the box.