KR20010058397A - Inhibitor device for accumulating impurity in exhausting pipe - Google Patents

Inhibitor device for accumulating impurity in exhausting pipe Download PDF

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Publication number
KR20010058397A
KR20010058397A KR1019990062670A KR19990062670A KR20010058397A KR 20010058397 A KR20010058397 A KR 20010058397A KR 1019990062670 A KR1019990062670 A KR 1019990062670A KR 19990062670 A KR19990062670 A KR 19990062670A KR 20010058397 A KR20010058397 A KR 20010058397A
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exhaust pipe
foreign matter
temperature
residual gas
heating
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KR1019990062670A
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Korean (ko)
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KR100347137B1 (en
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정상신
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박종섭
주식회사 하이닉스반도체
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67098—Apparatus for thermal treatment

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE: An apparatus for preventing particles from being deposited in an exhaust pipe is provided to prevent residual gas from being accumulated in the exhaust pipe, by installing a heat generation control unit in the exhaust pipe so that the exhaust pipe is heated to a predetermined temperature and the temperature of the exhaust pipe is maintained. CONSTITUTION: An exhaust pipe(13) is connected to a vacuum pump to exhaust residual gas inside a chamber to the exterior so that particles are prevented from being accumulated. A heat generation control unit heats the exhaust pipe to a predetermined temperature, and maintains the temperature of the exhaust pipe.

Description

배기관 이물축적 방지장치{INHIBITOR DEVICE FOR ACCUMULATING IMPURITY IN EXHAUSTING PIPE}Exhaust pipe foreign matter accumulation prevention device {INHIBITOR DEVICE FOR ACCUMULATING IMPURITY IN EXHAUSTING PIPE}

본 발명은 배기관 이물축적 방지장치에 관한 것으로서, 보다 상세하게는 본 발명은 진공장치에서 챔버내부의 잔여가스를 통과시키는 도전성 배기관에 소정온도까지 유도전류로 가열하고 일정하게 유지시키는 발열조절수단을 설치함으로써, 상기 배기관의 내부에 잔여가스 등이 축적되는 것을 방지할 수 있는 배기관 이물축적 방지장치에 관한 것이다.The present invention relates to an exhaust pipe foreign matter accumulation prevention device, and more particularly, the present invention is installed in the conductive exhaust pipe for passing the residual gas inside the chamber in the vacuum apparatus by heating current to a predetermined temperature to maintain a constant temperature to install a heating control means The present invention relates to an exhaust pipe foreign matter accumulation preventing device capable of preventing accumulation of residual gas and the like in the exhaust pipe.

도 1은 일반적인 진공장치에서 배기계통의 개요도로서, 주입된 공정가스가 웨이퍼 등과 진공상태에서 반응하여 소정의 물리적 또는 화학적 반응을 일으키고 잔여가스를 발생시키는 챔버(1)와, 상기 챔버(1)의 내부를 진공으로 유지시키는 진공펌프(2)와, 상기 챔버(1)와 진공펌프(2)를 연통하여 상기 잔여가스를 유동시키는 배기관(3)과, 상기 배기관(3)의 중간에 구비되어 상기 잔여가스를 가열하여 내측에 축적되는 것을 방지하는 가열부(4)와, 상기 가열부(4)의 연결되어 온도를 조절하는 온도제어부(5)와, 상기 배기관(3)의 내측에서 상기 잔여가스의 압력을 제어하는 압력밸브(6)를 포함하여 구성된다.1 is a schematic diagram of an exhaust system in a general vacuum apparatus, in which an injected process gas reacts with a wafer or the like in a vacuum to generate a predetermined physical or chemical reaction, and generates residual gas. A vacuum pump 2 for maintaining the inside of the vacuum, an exhaust pipe 3 for communicating the chamber 1 and the vacuum pump 2 to allow the residual gas to flow, and a middle of the exhaust pipe 3 A heating unit 4 for heating residual gas to prevent accumulation inside, a temperature control unit 5 connected to the heating unit 4 to control a temperature, and the residual gas inside the exhaust pipe 3. It comprises a pressure valve 6 for controlling the pressure of the.

상기 가열부(4)는 확대되어 도시된 바와 같이, 외부전원과 연결되어 상기 배기관(3)의 외주를 감아 가열하는 가열패드(4a)와, 상기 배기관(3)의 온도를 측정하는 열전대(4b)와, 상기 가열된 배기관(3)을 보온하는 단열재(4c)로 구성된다.As shown in an enlarged manner, the heating unit 4 is connected to an external power source, and includes a heating pad 4a for winding and heating the outer circumference of the exhaust pipe 3 and a thermocouple 4b for measuring the temperature of the exhaust pipe 3. ) And a heat insulator 4c for insulating the heated exhaust pipe 3.

상기와 같이 구성된 종래 진공장치에서 이물축적을 방지하는 작용을 설명하면 다음과 같다.Referring to the action of preventing foreign matter accumulation in the conventional vacuum device configured as described above are as follows.

도 1에서, 상기 챔버(1)의 내부에서는 전기에너지에 의한 프라즈마 또는 열에너지를 이용하는 배치로 등에 의하여 소정의 물리적 또는 화학적 반응을 일으켜 잔여가스를 발생시키고, 상기 잔여가스는 배기관(3)과 상기 챔버(1)의 내부를 진공으로 유지시키는 진공펌프(2)를 통하여 외부로 배출된다.In FIG. 1, the chamber 1 generates a residual gas by causing a predetermined physical or chemical reaction by an arrangement using plasma or thermal energy by electric energy, and the residual gas generates exhaust gas 3 and the chamber. It discharges to the outside through the vacuum pump 2 which keeps the inside of (1) vacuum.

그리고 상기 배기관(3)의 중간에는 가열부(4)와 온도제어부(5)가 구비되어 유동되는 잔여가스를 가열하여 내측면에 축적되는 것을 방지하는 바 이를 상세히 설명하면 다음과 같다.And in the middle of the exhaust pipe (3) is provided with a heating unit 4 and the temperature control unit 5 to prevent the accumulation of the remaining gas flowing in the inner surface to be described in detail as follows.

상기 가열부(4)의 가열패드(4a)는 외부전원과 연결되어 상기 배기관(3)의 외주부를 가열하고, 상기 가열패드(4a)의 외주에는 단열재(4c)가 포장되어 상기 가열된 배기관(3)을 보온한다. 그리고, 상기 가열패드(4a)와 단열재(4c)의 사이에는 열전대(4b)가 구비되어 상기 배기관(3)의 온도를 측정하여 상기 배기관(3) 내부의 잔여가스가 배기관(3) 내측면에 축적되지 않도록 상기 온도제어부(5)에서 가열 온도를 조절한다.The heating pad 4a of the heating unit 4 is connected to an external power source to heat the outer circumferential portion of the exhaust pipe 3, and a heat insulating material 4c is wrapped on the outer circumference of the heating pad 4a to heat the heated exhaust pipe ( Keep warm 3). In addition, a thermocouple 4b is provided between the heating pad 4a and the heat insulator 4c to measure the temperature of the exhaust pipe 3 so that residual gas inside the exhaust pipe 3 is disposed on the inner surface of the exhaust pipe 3. The temperature is controlled by the temperature control unit 5 so as not to accumulate.

따라서, 상기 챔버(1)내의 공정조건이 변화되어 발생되는 잔여가스의 성분이 변하더라도 상기 배기관(3)의 온도를 적정하게 조절할 수 있도록 구성된다.Therefore, the temperature of the exhaust pipe 3 can be properly adjusted even if the components of the residual gas generated by changing the process conditions in the chamber 1 change.

그러나, 상기 가열패드(4a)로 가열하고 단열재(4c)로 보온하는 가열방식은 가열된 열이 상기 배기관(3)의 외부에서 내부로 전달되므로 일반적인 열전달의 방향과는 반대로 전달되는 바, 그 효율이 저하되어 상기 배기관(3) 내부의 온도를 제어하기 곤란하였으며, 상기 배기관(3)의 온도를 상기 열전대(4b)로 측정하여 피드백하고 온도제어부(5)로 가열온도를 제어하므로 구조가 복잡한 문제점이 있었다.However, in the heating method of heating with the heating pad 4a and keeping the heat insulating material 4c, the heated heat is transferred from the outside of the exhaust pipe 3 to the inside, so that the heat is transferred to the opposite direction of the general heat transfer. Due to this decrease, it was difficult to control the temperature inside the exhaust pipe 3, and the temperature of the exhaust pipe 3 was measured and fed back to the thermocouple 4b, and the heating temperature was controlled by the temperature control part 5, thereby causing a complicated structure. There was this.

본 발명은 상기와 같은 종래기술의 문제점을 해결하기 위하여 안출된 것으로써, 본 발명의 목적은 진공장치에서 챔버내부의 잔여가스를 통과시키는 배기관에 구조가 단순하고 열전달의 방향성에 따른 효율저하가 없으며, 온도제어가 용이한 가열수단을 채택함으로써, 배기관의 내부에 잔여가스 등이 축적되는 것을 방지할 수 있는 배기관 이물축적 방지장치를 제공하는 데 있다.The present invention has been made to solve the problems of the prior art as described above, the object of the present invention is a simple structure in the exhaust pipe for passing the residual gas inside the chamber in the vacuum apparatus and there is no efficiency decrease according to the direction of heat transfer In addition, the present invention provides an exhaust pipe foreign matter accumulation preventing device capable of preventing accumulation of residual gas and the like inside the exhaust pipe by adopting a heating means with easy temperature control.

도 1은 일반적인 진공장치에서 배기계통의 개요도.1 is a schematic diagram of an exhaust system in a general vacuum apparatus.

도 2는 본 발명에 따른 배기관 이물축적 방지장치가 도시된 진공장치의 개요도.Figure 2 is a schematic diagram of a vacuum apparatus showing the exhaust pipe foreign matter accumulation prevention apparatus according to the present invention.

도 3은 본 발명에 따른 배기관 이물축적 방지장치의 확대단면도.Figure 3 is an enlarged cross-sectional view of the exhaust pipe foreign matter accumulation prevention apparatus according to the present invention.

도 4는 자극의 극성변화에 따라 와류가 발생되는 상태도.4 is a state in which the vortex is generated in accordance with the polarity change of the magnetic pole.

도 5는 온도와 자기장의 세기를 나타낸 상관도.Figure 5 is a correlation diagram showing the strength of the temperature and the magnetic field.

< 도면의 주요부분에 대한 부호의 설명 ><Description of Symbols for Major Parts of Drawings>

11 : 챔버 12 : 진공펌프11 chamber 12 vacuum pump

13 : 배기관 14 : 압력밸브13 exhaust pipe 14 pressure valve

20 : 발열조절수단 21 : 자성체20: heating control means 21: magnetic material

22 : 교류전원22: AC power

상기 목적을 달성하기 위하여, 본 발명에 의한 배기관 이물축적 방지장치는 챔버내부의 잔여가스를 외부로 배출토록 진공펌프와 연통된 배기관에 이물이 축적되는 것을 방지하는 배기관 이물축적 방지장치에 있어서, 상기 배기관을 소정온도로 가열후, 일정하게 유지시키는 발열조절수단이 포함되어 구성된 것을 특징으로 한다.In order to achieve the above object, the exhaust pipe foreign matter accumulation prevention apparatus according to the present invention in the exhaust pipe foreign matter accumulation prevention device for preventing the accumulation of foreign matter in the exhaust pipe in communication with the vacuum pump to discharge the residual gas in the chamber to the outside, After heating the exhaust pipe to a predetermined temperature, it characterized in that it comprises a heat generating means for maintaining a constant.

상기 발열조절수단은 도전성을 갖는 배기관에 설치되어 소정온도의 퀴리점까지 자성을 갖는 자성체와, 상기 자성체의 극성을 변화시키는 전원으로 구성된다.The heat generating control means is installed in a conductive exhaust pipe is composed of a magnetic body having a magnet to a Curie point of a predetermined temperature, and a power source for changing the polarity of the magnetic body.

바람직하게는 상기 배기관은 특정온도의 퀴리점까지 자성을 갖도록 구성된 다.Preferably, the exhaust pipe is configured to have magnetism up to a Curie point at a specific temperature.

이하, 본 발명의 바람직한 실시례를 첨부도면에 의거하여 설명한다.Best Mode for Carrying Out the Invention Preferred embodiments of the present invention will now be described based on the accompanying drawings.

도 2는 본 발명에 따른 배기관 이물축적 방지장치가 도시된 진공장치의 개요도로서, 상기 진공장치는 주입된 공정가스가 웨이퍼 등과 진공상태에서 반응하여소정의 물리적 또는 화학적 반응을 일으키고 잔여가스를 발생시키는 챔버(11)와, 상기 챔버(11)의 내부를 진공으로 유지시키는 진공펌프(12)와, 상기 챔버(11)와 진공펌프(12)를 연통하여 상기 잔여가스를 유동시키는 배기관(13)과, 상기 배기관(13)의 내측에서 상기 잔여가스의 압력을 제어하는 압력밸브(14)와, 상기 배기관(13)에 구비되어 상기 잔여가스를 가열하여 내측면에 축적되는 것을 방지하는 배기관 이물축적 방지장치로 구성된다.FIG. 2 is a schematic view of a vacuum apparatus in which an exhaust pipe foreign matter accumulation prevention apparatus according to the present invention is shown, wherein the vacuum apparatus reacts in a vacuum state with an injected process gas to generate a predetermined physical or chemical reaction and generate residual gas. A chamber 11, a vacuum pump 12 for maintaining the interior of the chamber 11 in vacuum, an exhaust pipe 13 for communicating the chamber 11 and the vacuum pump 12 to flow the residual gas, A pressure valve 14 for controlling the pressure of the residual gas inside the exhaust pipe 13 and an exhaust pipe foreign material accumulation prevention provided at the exhaust pipe 13 to prevent the residual gas from being accumulated on the inner surface thereof. It consists of a device.

도 3은 본 발명에 따른 이물축적 방지장치의 확대도로서, 도시된 바와 같이, 챔버내부의 잔여가스를 외부로 배출토록 진공펌프(12)와 연통된 배기관(13)에 이물이 축적되는 것을 방지하는 장치로서, 상기 배기관(13)을 소정온도로 가열후, 일정하게 유지시키는 발열조절수단(20)이 형성된다.3 is an enlarged view of the foreign matter accumulation prevention apparatus according to the present invention, as shown in the figure, to prevent foreign matter from accumulating in the exhaust pipe 13 in communication with the vacuum pump 12 to discharge the residual gas in the chamber to the outside. As an apparatus for heating, the heat generating control means 20 for maintaining a constant after heating the exhaust pipe 13 to a predetermined temperature is formed.

상기 발열조절수단(20)은 도전성을 갖는 배기관(13)에 설치되어 소정온도의 퀴리점까지 자성을 갖는 자성체(21)와, 상기 자성체(21)의 극성을 변화시키는 교류전원(22)으로 구성된다.The heat generating control unit 20 is composed of a magnetic body 21 having magnetic properties up to a Curie point of a predetermined temperature and installed in the exhaust pipe 13 having a conductivity, and an AC power source 22 for changing the polarity of the magnetic body 21. do.

상기와 같이 구성된 본 발명에 따른 배기관 이물축적 방지장치의 작용을 설명하면 다음과 같다.Referring to the operation of the exhaust pipe foreign matter accumulation prevention apparatus according to the present invention configured as described above are as follows.

도 3에서, 상기 챔버(11)의 내부에서는 전기에너지에 의한 프라즈마 또는 열에너지를 이용하는 배치로 등에 의하여 소정의 물리적 또는 화학적 반응을 일으켜 잔여가스를 발생시키고, 상기 잔여가스는 배기관(13)과 상기 챔버(11)의 내부를 진공으로 유지시키는 진공펌프(12)를 통하여 외부로 배출된다.In FIG. 3, inside the chamber 11, a residual physical gas is generated by a predetermined physical or chemical reaction by an arrangement using plasma or thermal energy by electric energy, and the residual gas is generated in the exhaust pipe 13 and the chamber. It discharges to the outside through the vacuum pump 12 which keeps the inside of 11 in vacuum.

그리고 상기 배기관(13)에는 상기 잔여가스를 소정온도로 가열후, 일정하게유지시키기 위하여 소정온도의 퀴리점까지 자성을 갖는 자성체(21)와, 상기 자성체(21)의 극성을 변화시키는 교류전원(22)이 형성되어 있는 바, 이를 설명하면 다음과 같다.The exhaust pipe 13 includes a magnetic body 21 having magnetism up to a Curie point of a predetermined temperature and a AC power source for changing the polarity of the magnetic body 21 in order to maintain the constant gas after heating the residual gas to a predetermined temperature. 22) is formed, it will be described as follows.

도 4는 자극의 극성변화에 따라 와류가 발생되는 상태도로서, 도시된 바와 같이 자력선(B)을 갖는 자석의 자성이 N극,S극으로 전환되면 패러데이의 전자기 유도법칙에 의하여 그 사이에 있는 전도체(A)에는 와류(C: Eddy Current)가 발생되고, 이는 자기장의 세기에 비례하고 도체의 저항에 의하여 열을 발생시킨다.4 is a state diagram in which vortices are generated according to a change in polarity of a magnetic pole. As shown in FIG. 4, when a magnet of a magnet having a magnetic field line B is converted to an N pole and an S pole, a conductor in between is formed by Faraday's law of electromagnetic induction. Eddy current (C) is generated in (A), which is proportional to the strength of the magnetic field and generates heat by the resistance of the conductor.

한편, 도 5는 온도와 자기장의 세기의 상관관계를 나타내 보인 관계도로서, 자성을 갖는 물체의 자기장의 세기(M)는 물체의 온도(T)가 퀴리점(TC)까지는 상기 도시된 바와 같이 감소되며, 상기 퀴리점 이상에서는 자성을 잃게된다.On the other hand, Figure 5 is a relationship diagram showing the relationship between the temperature and the strength of the magnetic field, the intensity (M) of the magnetic field of the magnetic object is as shown above to the temperature (T) of the object to the Curie point (T C ) As a result, the magnetism is lost above the Curie point.

따라서, 상기 자성체(21)에 교류전원(22)이 연결되면 극성이 주기적으로 반복하여 변화되므로 자기장의 세기가 변화되어 전도성을 갖는 상기 배기관(13)에는 도 4에 도시된 바와 같이 와류가 형성되며, 상기 와류에 의하여 배기관(13)은 퀴리점(TC)까지 가열되어 상기 배기관(13) 내부에 이물이 축적되는 것을 방지한다.Therefore, when the AC power source 22 is connected to the magnetic body 21, since the polarity is periodically changed repeatedly, the strength of the magnetic field is changed, so that the eddy current is formed in the exhaust pipe 13 having conductivity, as shown in FIG. The exhaust pipe 13 is heated to the Curie point T C by the vortex to prevent foreign matter from accumulating in the exhaust pipe 13.

또한, 상기 배기관(13)이 퀴리점 이상으로 가열되면 도 5에 도시된 바와 같이, 자성을 잃게 되어 자기장을 형성하지 않으므로 별도의 항온유지 장치를 사용하지 않아도 그 이상으로는 가열되지 않고 일정한 온도를 유지한다.In addition, when the exhaust pipe 13 is heated above the Curie point, as shown in FIG. 5, the magnetic field is lost and does not form a magnetic field. Therefore, even if a separate thermostat is not used, the exhaust pipe 13 is not heated beyond that. Keep it.

일반적으로 자성체의 퀴리점은 성분조성을 조정하여 -50℃~1330℃ 사이에서 조절될 수 있다.In general, the Curie point of the magnetic material can be controlled between -50 ℃ ~ 1330 ℃ by adjusting the composition of the composition.

이상에서 설명한 바와 같이, 본 발명에 의한 배기관 이물축적 방지장치는 진공장치에서 챔버내부의 잔여가스를 통과시키는 도전성 배기관에 소정온도의 퀴리점까지 자성을 갖는 자성체와, 상기 자성체의 극성을 변화시키는 전원으로 이루어진 발열조절수단을 설치함으로써, 단순한 구조로 배기관의 자체에서 발열되므로 열전달의 방향성에 따른 효율저하 없이 소정온도까지 유도전류로 가열하고 그 온도를 일정하게 유지시켜 배기관의 내부에 잔여가스 등이 축적되는 것을 방지하는 효과가 있다.As described above, the exhaust pipe foreign matter accumulation prevention apparatus according to the present invention is a magnetic body having magnetic properties up to a Curie point of a predetermined temperature in a conductive exhaust pipe through which residual gas in the chamber passes in a vacuum apparatus, and a power source for changing the polarity of the magnetic body. By installing the heating control means consisting of a simple structure, because the heat is generated in the exhaust pipe itself, heating with induction current to a predetermined temperature without deterioration of efficiency according to the direction of heat transfer, and keeps the temperature constant to accumulate residual gas in the exhaust pipe. There is an effect to prevent it.

Claims (3)

챔버내부의 잔여가스를 외부로 배출토록 진공펌프와 연통된 배기관에 이물이 축적되는 것을 방지하는 배기관 이물축적 방지장치에 있어서,In the exhaust pipe foreign matter accumulation prevention device for preventing the accumulation of foreign matter in the exhaust pipe communicating with the vacuum pump to discharge the residual gas in the chamber to the outside, 상기 배기관을 소정온도로 가열후, 일정하게 유지시키는 발열조절수단이 포함되어 구성된 것을 특징으로 하는 배기관 이물축적 방지장치.Exhaust pipe foreign matter accumulation prevention device, characterized in that configured to include a heating control means for maintaining a constant after heating the exhaust pipe to a predetermined temperature. 제 1항에 있어서, 상기 발열조절수단은 도전성을 갖는 배기관에 설치되어 소정온도의 퀴리점까지 자성을 갖는 자성체와, 상기 자성체의 극성을 변화시키는 전원으로 구성된 것을 특징으로 하는 배기관 이물축적 방지장치.2. The exhaust pipe foreign matter accumulation preventing device according to claim 1, wherein the heat generating control means comprises a magnetic body which is installed in a conductive exhaust pipe and has magnetic properties up to a Curie point of a predetermined temperature, and a power source for changing the polarity of the magnetic body. 제 1항 또는 제 2항에 있어서, 상기 배기관은 특정온도의 퀴리점까지 자성을 갖도록 구성된 것을 특징으로 하는 배기관 이물축적 방지장치.The exhaust pipe foreign matter accumulation preventing device according to claim 1 or 2, wherein the exhaust pipe is configured to have magnetism up to a Curie point at a specific temperature.
KR1019990062670A 1999-12-27 1999-12-27 Inhibitor device for accumulating impurity in exhausting pipe KR100347137B1 (en)

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100905128B1 (en) * 2008-07-29 2009-06-30 주식회사 나노텍 Contamination preventing apparatus and method of self plasma chamber
CN114300386A (en) * 2021-12-17 2022-04-08 北京北方华创微电子装备有限公司 Reaction chamber tail gas pressure control device and semiconductor process equipment

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KR100252462B1 (en) * 1997-09-30 2000-04-15 김충섭 Process for prparing o-(chloromethyl)benzoic acid ester derivatives

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100905128B1 (en) * 2008-07-29 2009-06-30 주식회사 나노텍 Contamination preventing apparatus and method of self plasma chamber
CN114300386A (en) * 2021-12-17 2022-04-08 北京北方华创微电子装备有限公司 Reaction chamber tail gas pressure control device and semiconductor process equipment

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