KR20010029227A - Apparatus for delivering liquid source - Google Patents

Abstract

PURPOSE: An apparatus for supplying liquid raw material is to increase a vaporizing efficiency in the apparatus, thereby increasing a processing speed for supplying gas raw material, and thus saving the raw material used in the process. CONSTITUTION: Liquid raw material is supplied from a storing tank(10) by a liquid pump(20). The liquid raw material is vaporized by a heating plate(35) disposed in a vaporizer(30). The vaporized raw material is supplied through a pipe to a reactor(50). A pipe controlling portion(120) is connected to a pipe extended from the vaporizer and the reactor to control a radius of the pipe. A gas raw material controlling portion(130) measures an amount of the gas raw material transferred through the pipe from the pipe controlling portion. And a controlling portion(110) controls the pipe controlling portion to gradually increase an opening level of the pipe. The heating plate is rotated by a rotating member(140). The rotating member is controlled by the controlling portion to be rotated in a predetermined rotating number corresponding to viscosity of the liquid raw material supplied from the storing tank.

Description

Liquid Raw Material Feeder {APPARATUS FOR DELIVERING LIQUID SOURCE}

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a manufacturing apparatus for a semiconductor device, and more particularly, to a liquid raw material supply apparatus capable of providing a liquid raw material or a raw material in which a solid is dissolved in a vapor phase.

As is well known, in the process of manufacturing a semiconductor device, a gas raw material is used in various processes such as a diffusion process, a deposition process, and an etching process.

For example, in the case of chemical vapor deposition (CVD), which is widely used for depositing an insulating film, a dielectric film, a conductive wire, or the like, a gas raw material is a reactor provided with reaction energy (eg, heat, plasma, ultraviolet light). The reactant is deposited on a substrate by supplying it to and chemically reacting the supplied gas raw material. In this case, although a gaseous raw material may be used depending on the type of film deposited on the substrate, when the raw material exists in a liquid phase or a solid phase, it is vaporized and provided to the reactor as a gaseous raw material.

Thus, the liquid raw material supply apparatus which is attached to a semiconductor manufacturing equipment and supplies a liquid or solid raw material as a gas raw material is demonstrated schematically with reference to FIG.

1 is a device configuration diagram showing a general liquid raw material supply device.

As shown in FIG. 1, a general liquid raw material supply device includes a storage container 10, a liquid pump 20, a vaporizer 30, and a transport gas supply part 40, and their respective functions are as follows. .

First, the storage container 10 stores a solid raw material dissolved in a liquid raw material or a solvent for providing as a gas raw material.

The liquid pump 20 adjusts the liquid raw material in the storage container 10 to a predetermined amount and supplies the vaporizer 30 at a constant speed.

The vaporizer | carburetor 30 is equipped with the heating plate 35 provided with the heating means, and vaporizes the liquid raw material supplied by the liquid pump 20 in a fixed amount. At this time, the surface of the heating plate 35 is provided with good thermal conductivity and chemically stable packing materials, and by increasing the contact area between the liquid raw material and the heating plate 35, the vaporization efficiency can be increased.

The transport gas supply unit 40 supplies a gas, for example, nitrogen (N ₂ ), to the vaporizer 30 to transport the gaseous gas vaporized in the vaporizer 30 to the reactor 50.

And between the above-mentioned components, it is connected by the pipe which has a predetermined radius, and a liquid raw material, a transport gas, or the vaporized gas raw material etc. move through this pipe.

Conventionally, although gaseous raw materials were supplied to the reactor 50 by the liquid raw material supply apparatus which consists of the above-mentioned structural members, the inefficient design caused the waste of raw materials or the fall of a process speed.

That is, in the conventional liquid raw material supply device, only the efficiency of the pumping device 60 has been considered without considering the conductance of the pipe connecting the vaporizer 30 and the reactor 50. Since there is a close relationship with the vaporization efficiency, even if the efficiency of the pumping device 60 is optimally designed, if the capacity of the pipe is inappropriate, the vaporization efficiency may be lowered.

In more detail, the rate of vaporization is proportional to the difference between the partial pressure and the equilibrium vapor pressure of the vaporized gaseous raw material. ), And as a result, the partial pressure of the gaseous raw material is increased to reduce the vaporization rate of the liquid raw material. In more severe cases, vaporization will not occur if the partial pressure of the gaseous feedstock and the equilibrium vapor pressure are in equilibrium.

By the way, even if the efficiency of the pumping device 60 is optimized, and if the capacity of the pipe is not optimized, even if the gaseous raw material is transported from the vaporizer 30 to correspond to the efficiency of the pumping device 60, Since the amount of gaseous raw material to be transported is limited, the transport rate of the actual gaseous raw material is limited by the capacity of the pipe. That is, the transport rate of the gaseous raw material is lower than the efficiency of the pumping device 60.

As a result, since the partial pressure in the vaporizer | carburetor 30 increases as mentioned above, the vaporization efficiency in the vaporizer | carburetor 30 falls.

As described above, when the vaporization efficiency is lowered, the amount of gaseous raw materials transported into the reactor 50 is reduced, so that the reaction rate in the reactor 50, for example, diffusion, etching or deposition, may be reduced. There was a problem of deterioration.

In addition, the amount of the liquid raw material provided from the storage container 10 to the vaporizer 30 by the liquid pump 20 is constant. When the vaporization efficiency in the vaporizer 30 is lowered, only a part of the liquid raw material provided is provided. Since the gaseous raw material is vaporized, the remaining liquid raw material which has not been vaporized cannot be used, resulting in waste of the raw material.

On the other hand, even though the efficiency of the pumping device 60 is optimized and the pipe capacity is designed to be optimized, the vaporization efficiency in the vaporizer 30 itself does not have a vaporization efficiency corresponding to the pumping device 60 and the pipe capacity. If this is not done, the amount of gaseous raw material provided to the reactor 50 is reduced, which not only leads to a decrease in the processing speed, but also wastes the liquid raw material provided from the storage container 10 by the liquid pump 20.

Thus, the vaporization efficiency in the vaporizer | carburetor 30 itself has a close relationship with the area which a liquid raw material contacts with the heating plate 35, The area which a liquid raw material contacts with the heating plate 35 by the viscosity of a liquid raw material etc. Since it is different, the liquid raw material having a large viscosity and small flowability has a problem in that the area of contact with the heating plate 35 is reduced, so that the vaporization efficiency is lowered.

In addition, the liquid raw material that has not been vaporized as described above may close the minute passages inside the vaporizer and cause equipment damage, or may be changed into contaminants to cause process defects.

SUMMARY OF THE INVENTION The present invention has been made in view of the above points, and an object thereof is to provide a liquid raw material supply device capable of maximizing vaporization efficiency.

In order to achieve the above object, in the present invention, the liquid raw material supply apparatus for vaporizing a liquid raw material provided from a storage container by a liquid pump by a heating plate provided in the vaporizer and providing it to the reactor through a pipe, wherein Opening and closing amount adjusting means mounted on the pipe connected to the reactor to adjust the radius of the pipe; Gas raw material amount measuring means for measuring the amount of gas raw material is passed through the opening and closing amount adjusting means to the pipe; And a control means for fixing the opening and closing amount adjusting means with reference to the measurement signal measured from the gas raw material amount measuring means and opening degree when there is no change in the measurement signal while controlling the opening degree of the opening and closing amount adjusting means to be gradually increased. To provide a liquid raw material supply device.

In addition, in the present invention, a number of additional means capable of enhancing the vaporization efficiency, for example, a rotating means for rotating the filling material mounted on the heating plate or the heating plate to increase the contact area between the liquid raw material and the heating plate, vaporizer by the transport gas Heating means for heating the transport gas provided to the vaporizer to prevent the internal temperature of the internal temperature from being reduced, a distributor for injecting the liquid raw material, which is provided at the outlet of the liquid pump and injected into the fine particles, to increase the surface area of the liquid raw material, or Provided is a liquid raw material supply apparatus having a plurality of auxiliary means such as a spray nozzle, a distributor attached to an outlet of a transport gas supply portion such that the transport gas is evenly spread in the vaporizer.

1 is a device configuration diagram showing a general liquid raw material supply device,

2 is a device configuration diagram showing a liquid raw material supply device according to the present invention.

<Description of the code | symbol about the principal part of drawing>

10 storage container 20 liquid pump

30: vaporizer 35: heating plate

40: transport gas supply unit 50: reactor

60: pumping device 110: control means

120: opening and closing amount adjusting means 130: gas raw material amount measuring means

140: heating plate rotating means 150: transport gas heating means

160: transport gas distributor 170: liquid material distributor or injection nozzle

Hereinafter, with reference to the accompanying Figure 2, it will be described in detail with respect to the liquid raw material supply apparatus according to a preferred embodiment of the present invention.

First, the core technical idea of the present invention is to “reduce the partial pressure in the vaporizer by adjusting the pipe capacity between the vaporizer and the reactor, which has not been considered in the past, thereby increasing the transport rate of gaseous raw materials transported from the vaporizer to the reactor. A number of auxiliary means for optimizing the vaporization efficiency and for further enhancing such vaporization efficiency, namely rotating means for rotating the filling material mounted on the heating plate or the heating plate to increase the contact area between the liquid raw material and the heating plate, transport gas Heating means for heating the transport gas provided to the vaporizer in order to prevent the temperature in the vaporizer from being locally reduced by heating, and for injecting the liquid raw material, which is provided at the outlet of the liquid pump, to the fine particles to increase the surface area of the liquid raw material. Distributor or spray nozzles, transport gas By further adding a plurality of auxiliary means, such as a distributor, attached to the outlet of the transport gas supply to spread, to achieve the effect of increasing the process speed, reducing the raw material, preventing contamination and damage in the carburetor, etc. It should be understood by the same core technical idea. Meanwhile, in the conventional liquid raw material supply device, in consideration of the efficiency of the pumping device, a pumping device having a necessary efficiency or more is provided. In this embodiment, the pumping device may be more effectively used when such a pumping device has an optimum efficiency. For the pumping device having the same efficiency, a more enhanced effect can be obtained.

2, which will be referred to in the following description, is a device configuration diagram showing a liquid raw material supply device according to the present invention, and the same reference numerals as those in FIG. The reference numerals of the constituent members added in accordance with the present invention are given reference numerals to facilitate differentiation between the constituent members mounted according to the present invention and the conventional constituent members.

2, the gas raw material supply apparatus according to the present invention, the liquid raw material supply apparatus according to the prior art control means 110, opening and closing amount adjusting means 120, gas raw material amount measuring means 130 and the heating plate rotation Means 140, heating means 150 and distributors or spray nozzles 160, 170 are further added, the individual configurations and functions of which are as follows.

The control means 110 generates a control signal for controlling the open / close amount adjusting means 120 based on the measurement signal provided from the gas raw material amount measuring means 130, and rotates the heating plate based on the rotation amount input from the outside. Drive control of the means 140.

The opening and closing amount adjusting means 120 is mounted on the pipe installed between the vaporizer 30 and the reactor 50, and adjusts the radius of the pipe based on the opening and closing amount control signal of the control means 120. At this time, the length of the pipe should be as short as possible, and the radius should be as wide as possible. In addition, according to a preferred embodiment of the present invention, the opening and closing amount adjusting means 120 may be used a throttling valve (neettling valve) or the like (needle valve).

Gas raw material amount measuring means 130 is mounted between the opening and closing amount adjusting means 120 and the reactor 50, the gaseous raw material transported from the vaporizer 30 to the reactor 50 through the opening and closing amount adjusting means 120 The amount is measured by the electrical signal S1 and the measurement signal S1 is provided to the control means 110.

The heating plate rotating means 140 rotates the heating plate 35 at a rotational speed based on the control of the control means 110. At this time, the speed of rotating the heating plate 35 will be determined based on the viscosity (or fluidity) of the liquid raw material, it is preferable that the rotational speed relative to the viscosity is determined by a number of experimental results. In addition, according to a preferred embodiment of the present invention, the surface of the heating plate 35 will be equipped with a filling material, the heating plate rotating means 140 is composed of a rotating means for rotating the heating plate 35 and a rotating means for stirring the filling material. will be.

The heating means 150 will be mounted in the transport gas supply 40 or in the connecting pipe between the transport gas supply 40 and the vaporizer 30, heating the transport gas supplied to the vaporizer 30 to a temperature similar to the temperature inside the vaporizer. I will. That is, the transport gas provided from the transport gas supply unit 40 is typically significantly lower than the internal temperature of the vaporizer 30. When such a low temperature transport gas is introduced into the vaporizer 30, the internal temperature of the vaporizer 30 is increased. Localize. Such local temperature reduction causes the vaporization efficiency of the vaporizer 30 to be deteriorated, and the heating means 150 heats the temperature of the transport gas provided to the vaporizer 30 to a degree similar to the internal temperature of the vaporizer 30. Let's do it.

The distributor 160 is mounted at an outlet at which the transport gas provided from the transport gas supply 40 is injected into the vaporizer 30, and distributes the transport gas provided from the transport gas supply 40 evenly in the vaporizer 30. That is, the transport gas performs a function of transporting the gaseous raw material vaporized in the vaporizer 30 to the reactor 50. When the transport gas is not evenly distributed in the vaporizer 30, the gaseous raw material in the vaporizer 30 is reactord. The efficiency of transporting to 50 falls, and such a decrease in transport efficiency causes a decrease in the vaporization efficiency of the vaporizer 30 as in the above-described conventional description. Thus, the distributor 160 allows the transport gas to be evenly distributed in the vaporizer 30 to prevent such a problem.

The distributor or spray nozzle 170 is mounted at an outlet through which the liquid raw material provided from the liquid pump 20 is injected into the vaporizer 30, and serves to make the liquid raw material injected from the liquid pump 20 into fine particles. . That is, the vaporization efficiency in the vaporizer 30 is proportional to the contact area between the liquid raw material and the heating plate 35. When the liquid raw material is made into fine particles, the surface area of the liquid raw material itself increases, and thus the liquid raw material decomposed into fine particles Compared with the conventional liquid raw material, the area in contact with the heating plate 35 becomes wider, and as a result, the vaporization efficiency in the vaporizer 30 is enhanced.

The operation process of the liquid raw material supply device which further added the above-mentioned structural member according to this invention is demonstrated as follows.

First, when the power is turned on, the liquid pump 20 provides the liquid raw material stored in the storage container 10 to the heating plate 35 provided in the vaporizer 30 at a constant speed by a predetermined amount.

At this time, if the type of the liquid raw material is selected based on the operation of the operator, the control means controls the heating plate rotating means 140 to rotate the heating plate 35 at a predetermined rotational speed corresponding to the type of the liquid raw material, The heating plate rotating means 140 rotates the heating plate 35 at a constant speed based on the control of the control means 110. At this time, according to a preferred embodiment of the present invention, the heating plate rotating means 140 may rotate the heating plate 35 and at the same time stir the filling material mounted on the heating plate 35.

As a result, the liquid raw material supplied from the liquid pump 20 is decomposed into fine particles by the distributor or the spray nozzle 170 and sprayed in the state in which the surface area thereof is increased, and falls on the upper portion of the heating plate 35. Since the heating plate 35 is rotated and the filling material is stirred by the process as described above, the liquid raw material decomposed into fine particles is spread evenly on the surface of the heating plate 35, that is, the surface of the filling material. At this time, the surface area of the liquid raw material itself is increased as it is decomposed into fine particles, the heating plate 35 is rotated by the rotating means 140, and the filling material mounted on the surface of the heating plate 35 is stirred, whereby the liquid raw material is Since it spreads evenly over the surface of the heating plate 35, the area in contact therewith becomes wider, and thus the vaporization efficiency will be remarkably improved compared to that of the liquid raw material falling on the heating plate 35 in a conventionally stopped state.

On the other hand, the liquid raw material vaporized in the vaporizer | carburetor 30, ie, a gas raw material, is conveyed through the pipe connected to the reactor 50 side by the transport gas (for example, nitrogen) supplied from the transport gas supply part 40. As shown in FIG. At this time, the transport gas provided from the transport gas supply part 40 will be heated to a temperature similar to the internal temperature of the vaporizer 30 by the heating means 150, and will be distributed evenly into the vaporizer 30 by the distributor 160. Will be.

On the other hand, initially, the gas raw material and the transport gas are transported from the vaporizer 30 to the reactor 50 in a state where the opening and closing amount adjusting means 120 is completely closed, so that the gas raw material amount measuring means 130 does not detect the gas raw material amount. Will not. That is, since the gas raw material amount measuring means 130 measures the amount of gas transported from the vaporizer 30 through the opening and closing amount adjusting means 120, the gas to be transported in the state in which the opening and closing amount adjusting means 120 is initially closed The amount of raw material will be measured as zero.

The control means 110 controls the opening and closing amount adjusting means 120 such that the opening and closing amount adjusting means 120 is gradually opened from the closed state, and at the same time, it controls the amount of gas transported from the gas raw material amount measuring means 130. A measurement signal is provided.

Then, with reference to the measurement signal, if the amount of gas raw material currently measured is larger than the amount of gas raw material previously measured, that is, the amount of gas raw material to be transported increases as the degree of opening is increased, the opening and closing amount adjusting means as described above. The process of increasing the opening degree of 120 and measuring the amount of gaseous raw material to be transported is repeated.

If there is no change in the amount of gas raw material transported for a predetermined number of times (for example, three times) during the above-described process, the opening and closing amount adjusting means 120 is fixed in that state. At this time, there is no change in the amount of gas raw material is a value neglected the fine range.

In the present invention has been described a process of automatically adjusting the radius of the pipe by the opening and closing amount adjusting means 120, when the gas raw material supply device is repeatedly used in a fixed process, based on the above-mentioned core technical idea, the appropriate pipe The radius and length of the can be calculated and fixedly installed.

According to the present invention described above, by increasing the vaporization efficiency in the liquid raw material supply apparatus, it is possible to increase the process speed of the process in which the gas raw material is supplied by the liquid raw material supply apparatus, it is possible to reduce the raw material used in the process By maximizing the vaporization efficiency, it is possible to prevent clogging of the vaporizer due to decomposition of the liquid raw material and to prevent contamination by the liquid raw material.

Claims (8)

In the liquid raw material supply apparatus which vaporizes the liquid raw material provided from a storage container by a liquid pump by the heating plate provided in a vaporizer, and supplies it to a reactor through a pipe, Opening and closing amount adjusting means mounted on a pipe connected to the reactor from the vaporizer to adjust the radius of the pipe; Gas raw material amount measuring means for measuring the amount of gas raw material is passed through the opening and closing amount adjusting means to the pipe; And a control means for fixing the opening and closing amount adjusting means with reference to the measurement signal measured from the gas raw material amount measuring means and opening degree when there is no change in the measurement signal while controlling the opening degree of the opening and closing amount adjusting means to be gradually increased. Liquid raw material feeder. The method of claim 1, The liquid raw material supply device further comprises a rotation means for rotating the heating plate, And the control means further performs a function of controlling rotation of the rotation means. The method of claim 2, Filling material is mounted on the surface of the heating plate, And said rotating means comprises rotating means for rotating said heating plate and rotating means for stirring said filling material. The method of claim 2 or 3, wherein the control means, And the rotating means is controlled to rotate at a predetermined rotational speed corresponding to the viscosity of the liquid raw material provided from the storage container by the liquid pump. The liquid pump according to any one of claims 1 to 3, wherein And a distributor or a spray nozzle for injecting the liquid raw material into fine particles at an outlet through which the liquid raw material is discharged from the liquid pump. The liquid raw material supply device according to any one of claims 1 to 3, wherein Further comprising a transport gas supply means for supplying a transport gas for transporting the gaseous raw material vaporized in the vaporizer to the reactor, And a distributor for distributing the transport gas evenly in the vaporizer at the outlet of the transport gas supply means from which the gaseous raw material is ejected. The method of claim 6, wherein the transport gas supply means, And a heating means for heating the transport gas to be supplied to the reactor to a temperature in the reactor. The method of claim 1, wherein the opening and closing amount adjusting means, A liquid raw material supply device, characterized in that it is a throttling valve or a needle valve.